CN1762873B - 玻璃涂层 - Google Patents
玻璃涂层 Download PDFInfo
- Publication number
- CN1762873B CN1762873B CN2005100516548A CN200510051654A CN1762873B CN 1762873 B CN1762873 B CN 1762873B CN 2005100516548 A CN2005100516548 A CN 2005100516548A CN 200510051654 A CN200510051654 A CN 200510051654A CN 1762873 B CN1762873 B CN 1762873B
- Authority
- CN
- China
- Prior art keywords
- layer
- coating
- zno
- silver
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 72
- 239000011248 coating agent Substances 0.000 title claims abstract description 61
- 239000011521 glass Substances 0.000 title claims abstract description 19
- 150000002500 ions Chemical class 0.000 claims abstract description 35
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 28
- 229910052709 silver Inorganic materials 0.000 claims description 28
- 239000004332 silver Substances 0.000 claims description 28
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 3
- -1 oxygen ions Chemical class 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 230000005865 ionizing radiation Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 60
- 239000010410 layer Substances 0.000 description 49
- 239000011787 zinc oxide Substances 0.000 description 30
- 239000000758 substrate Substances 0.000 description 23
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910003087 TiOx Inorganic materials 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 229910001120 nichrome Inorganic materials 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910003134 ZrOx Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000005328 architectural glass Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47C—CHAIRS; SOFAS; BEDS
- A47C7/00—Parts, details, or accessories of chairs or stools
- A47C7/36—Supports for the head or the back
- A47C7/40—Supports for the head or the back for the back
- A47C7/46—Supports for the head or the back for the back with special, e.g. adjustable, lumbar region support profile; "Ackerblom" profile chairs
- A47C7/462—Supports for the head or the back for the back with special, e.g. adjustable, lumbar region support profile; "Ackerblom" profile chairs adjustable by mechanical means
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47C—CHAIRS; SOFAS; BEDS
- A47C7/00—Parts, details, or accessories of chairs or stools
- A47C7/36—Supports for the head or the back
- A47C7/40—Supports for the head or the back for the back
- A47C7/42—Supports for the head or the back for the back of detachable or loose type
- A47C7/425—Supplementary back-rests to be positioned on a back-rest or the like
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47C—CHAIRS; SOFAS; BEDS
- A47C7/00—Parts, details, or accessories of chairs or stools
- A47C7/36—Supports for the head or the back
- A47C7/40—Supports for the head or the back for the back
- A47C7/44—Supports for the head or the back for the back with elastically-mounted back-rest or backrest-seat unit in the base frame
- A47C7/441—Supports for the head or the back for the back with elastically-mounted back-rest or backrest-seat unit in the base frame with adjustable elasticity
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47C—CHAIRS; SOFAS; BEDS
- A47C7/00—Parts, details, or accessories of chairs or stools
- A47C7/36—Supports for the head or the back
- A47C7/40—Supports for the head or the back for the back
- A47C7/44—Supports for the head or the back for the back with elastically-mounted back-rest or backrest-seat unit in the base frame
- A47C7/443—Supports for the head or the back for the back with elastically-mounted back-rest or backrest-seat unit in the base frame with coil springs
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3423—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings comprising a suboxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0055—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
本发明涉及玻璃涂层和生产这种玻璃涂层的方法。玻璃涂层包含第一层ZnO层和沉积在其上的Ag第二层。在ZnO层涂敷ZnO层之前，后者用离子照射。
Description
技术领域
本发明涉及玻璃涂层及其制造方法。
背景技术
建筑玻璃的涂层用作反射或吸收某些波长或波长范围的日光，致使通过窗户进入室内的光不同于室外的光。
这种涂层的重要功能在于反射热辐射，以便在夏季不让室内的温度升得太高，而在冬季使室温降得太低。但是可见光的透射不应当显著地降低，也就是说，应当使涂层在可见光范围内高度透射，而对于热或红外线辐射应当强反射。
满足这种功能要求的涂层系统被称作低-E涂层系统，其中“E”代表“辐射率”。
低-E涂层系统是早已知道的，该系统包括作为衬底的矿物质玻璃的玻璃板，在该板上配置5种独立层，一层在另一层的上面(DE 42 113 63 A1)。配置在这样衬底上的ZnO第一层厚度为400
。在该第一层上涂敷厚度为90
的Ag第二层。沉积在第二层上的第三层，由厚度约为15
的金属T i或NiCr中的一种组成。在第三层上涂敷由ZnO且厚度为320组成的第四层。在第四层即最后一层上，涂上TiO2的第五层，即厚度为70
的银的薄涂层，其主要是反射红外线的涂层。
另外一种对可见光是透明的并且反射红外线的涂层公开于WO95/29883中。这种涂层涂敷在玻璃衬底上，并且还至少由5层组成。氧化物作为第一层涂在这种玻璃衬底上，例如氧化锌、氧化锡、氧化铟等。第二层由银膜制成，而第三层是金属层，它在溅射过程中保护下面的银膜。接下来是另外的一种金属氧化物层，它防止银膜氧化。第五层且为最后一层由氮化硅构成。
另外，已知的是热绝缘涂层系统，这种系统适合用于弧形板(DE 198 50023 A1＝US 618 02 47 B1)。这种涂层系统包含至少一种含在保护层中的贵金属涂层，具体地说这样的一种涂层系统包含TiO2-NiCrOx-TiO2-Ag-NiCrOx-Si3Ni4。
热绝缘的改进至今只能通过复杂的双层银或组合银涂层系统实现。
本发明的目的在于改进具有高可见光透射性而无须提高反射热辐射涂层厚度的衬底涂层的热绝缘性。
该目的可以根据专利的权利要求1的特征达到。
本发明涉及玻璃涂层以及生产这种玻璃涂层的方法。该玻璃涂层包含ZnO第一层和沉积于第一层上的Ag第二层。在Ag层涂敷于ZnO层上前，先用离子照射ZnO层。
特别是，本发明所取得的优点在于因为涂敷银的涂层特殊预处理，影响了反射热辐射的涂层外延生长，致使其表面电阻最高下降20％，而无须涂敷更多的材料。反射热辐射的涂层优选银和在其上涂敷银的涂层，优选是ZnO。这种ZnO的预处理优选通过离子轰击来完成。
银中可以混有少量-低于10重量％的Cu、Al、Nd、In、Yt、Sb、V等。换句话说，对于ZnO或ZnO:Al，可以使用适合于外延生长的例如NiCr、NiCrOx、TiOx、TiO2、W、WO、WOx、Zr、ZrOx、ZrO。
与双层银或分散银的低-E涂层系统比较，本发明允许更快的生产，因为所须专用层少，工艺复杂程度低。因为需要的靶材料和阳极少，所以生产的成本效益更高些。总的来说花费在涂敷装置上的钱少了。简单的涂敷系统产生的废物少，因而需要的维护工作少，花费少，材料消耗也少。与纯银的低-E涂层系统比较，本发明所生产的产物具有更好的功能度。回火的涂层系统中，表面电阻最高降低15％。因此，热辐射系数ε<0.040是可能的，特别是透射可达到约88％以上。
以附图形式描述本发明的实施例并在下面予以详细地说明。
附图说明
图1是涂敷装置的示意图；
图2是衬底上的涂层结构。
发明内容
图1中用图解法描述涂敷装置。该涂敷装置1包括向中心传送的固定室(lock chamber)2、第一涂敷室3、第二涂敷室4、加工室5、第三涂敷室6、第四涂敷室7和第五涂敷室8。
衬底9通过传送装置(未画出)从向中心传送的固定室2向第一涂敷室3移动，在该室TiO2通过AC源10溅射。陶瓷TiOx还可以在此通过DC溅射。相应的TiO2靶具有的参考号11。在可以是玻璃板的衬底9的后面，可以配置上TiO2层，将衬底9送入第二涂敷室4，借助于DC源12使ZnO靶溅射。一旦所要求的ZnO层沉积在TiO2层上，则将衬底9送入加工室5。在处置时，离子源14以离子轰击衬底9的ZnO层。随后，将衬底送入第三涂敷室6，在那里通过DC源15使银靶16溅射。
用银下面的ZnO涂层作底阻断剂(bottom bloker)。它对银涂层的性能有强烈的影响。例如，它可以降低银的层电阻，这相当于改进电导率。
因为涂层系统的发射能力与表面电阻具有直接关系，所以，可以改进银反射光的能力。表面电阻越低，涂层的热绝缘性越好。
已知银的表面电阻经由下面的ZnO涂层会降低，故按照本发明借助于离子束照射ZnO涂层可进一步改进。由此可以在可见光区波长范围内同样高透射时改进银涂层的发射能力。
ZnO表面通过离子的改进，对于下面的银涂层的外延生长具有强有力的影响。银的表面电阻最高可降低20％，而无须涂敷更多的银。
离子束源14的离子可以是氩和/或氧离子。离子的穿透深度不得过大，为的是ZnO涂层下的涂层不受冲击。基于该理由，其它类型的辐射，例如电子束或X-射线用于ZnO处理是不合适的。
通过调节离子束源14的气体流量，或通过变化衬底9在离子束源14下的移动速度改变离子的剂量。通过加速电压设定照射到ZnO涂层上的离子所具有的能量。
特别是借助于设定能量，可以改变ZnO涂层的表面形态。这样既可以改变粗度也可以影响密度。表面还可以进行另外的化学活化或钝化处理。在ZnO涂层的表面上插入少量的氩和/或氧原子也是可能的。
特别是，在涂层表面上加速离子电流，例如是恒定的并且可以通过气体的种类及其数量(例如35sccm Ar)、加速电压(例如U＝1kV到U＝3kV)、电流(I＝0.5A)、离子源和衬底的距离(130mm)加以测定。上述sccm指的是(60mbar l)/秒，其中l表示升。
因此，应设定气体的种类、单位时间该气体的数量和加速电压。按这些技术要求确定由电源输出的电流输出量。衬底9与离子源14间的几何距离总是保持恒定的。
通过测量装置可以得到能源的电流和电压。离子电流的实际能量未测出。
衬底9的速度决定了离子束照射衬底9的每一表面要素的平均时间。因为离子的平均穿透深度是未知的，所以，转化成体积要素也是不可能的。但对体积的影响没有公开。关键性的是对表面的影响。很明显，表面粗度对低E-涂层的发射能力具有间接的影响。
假若离子电流保持恒定并且将衬底的速度减半，则平均有两倍的离子以相同的平均能量冲击相同的表面要素。因此，离子剂量成2倍。因此，施加在样品上的能量也成2倍。假若加速电压为3倍，则最初的平均离子能量也大致成3倍。
因此，该能量为加速电压和衬底速度的倒数值的乘积。
在将银层溅射到处理过的ZnO层上后，将衬底转移至涂层室7，在那里，通过DC源17，使NiCrOx靶溅射。接着，在涂层室8中，通过AC源19使Si3N4靶20溅射。
图2示出完全涂敷的衬底9。明显的是在较厚的TiO2层21上，沉积较薄的ZnO层22。在该加工过的ZnO层22上涂敷较薄的Ag层23。在后者上再涂敷上很薄的NiCrOx层24。较厚的Si3N4层25形成最终层。
尽管图2中显示的是5种不同的涂层21～25，但在本发明中关键的基本上仅是22和23层。因此，试验是用玻璃-ZnO-Ag的两层系统完成的，其结果汇总于下表1中。银的涂层厚度在所有的试验中都精确的相同，并且约为7.6nm。
表1
| 试验系列 | 气体 | U(离子)kV | Ar流[sccm] | V(离子)[m/min] | 剂量[a.u.] | 能量[a.u.] | R/sq[Ohm]在7.6nm Ag | 与参考的不同 |
| 参考 | 10.8 | |||||||
| 离子7 | Ar | 3 | 41 | 1 | 41 | 123 | 8.3 | 24.00％ |
| 离子1 | Ar | 3 | 41 | 2 | 21 | 62 | 8.5 | 21.00％ |
| 离子3 | Ar | 3 | 20 | 1 | 20 | 60 | 8.4 | 22.00％ |
| 离子2 | Ar | 3 | 20 | 2 | 10 | 30 | 9.9 | 8.00％ |
| 离子6 | Ar | 1 | 41 | 0.5 | 82 | 82 | 7.9 | 27.00％ |
| 离子5 | Ar | 1 | 41 | 1 | 41 | 41 | 8.8 | 19.0％ |
| 离子4 | Ar | 1 | 41 | 2 | 21 | 21 | 9.9 | 9.00％ |
指定的剂量和能量可以用“任意单位”。为简化起见，所有的数据都以能量为1进行参考试验加以规范化。剂量的SI单位为库仑/公斤，而按牛顿/米计的能量SI单位没有测量。Ion7、Ion1等表示完成的试验号。R/sq是表面电阻。
在所有7个试验中都使用氩气。加速电压为1或3kV，而气体流量为20或41sccm。移动衬底9所使用的速度V(Ion)，每分钟为1～2米。离子剂量为10～82单位，动能为21～123单位。
当具有未处理过ZnO的银层的表面电阻为10.8欧姆时，在处理过ZnO的情况下，表面电阻下降至少8％～27％。
还可以使用含5层涂层进行试验。将相对于色值和表面电阻的这些试验结果汇总于表2中。
表2
按CIE LAB DIN6174(1976)所示，表中：
Ty＝在可见光范围内的平均透射，％
a*＝红-绿轴上的色值
b*＝黄-蓝轴上的色值
Rgy＝样品的玻璃一侧在可见光范围内的平均反射，％
Rfy＝样品的涂层一侧在可见光范围内的平均反射，％
Haze＝不透明性
上述数据涉及回火前的涂敷衬底。基于这些数据，证明离子处理后的层电阻比未用离子处理的层电阻显著降低。类型1、类型2和类型3是离子能量，类型1较高，类型2介于中间而类型3是低能量的。
回火后获得的数据，记载在下列表3中。
表3
在所有情况下，发现用离子处理ZnO层后的层电阻都下降。从反射颜色时的最小色偏差可以了解到ZnO层厚度的变化。
汇综于下列表4中的试验系列的结果还证实，ZnO层通过离子处理不但改进了透射而且还改进了表面电阻。
表4
应该理解的是，本发明不限于所描述的实施例。例如，代替列出的氧化物，金属也可以进行反应性溅射，当供应氧时仅形成氧化物。
Claims (4)
1.一种玻璃涂层，其包含：
a)第一层，该第一层包含ZnO或ZnO:Al，其中该第一层用包含Ar离子、或包含氧离子、或包含O2和Ar的混合物的离子辐射处理；和
b)第二红外线辐射-反射涂层，该层包含具有至少50％的银组分的材料，所述第二层置于所述第一层之上；
其中该玻璃涂层对可见光基本上是透明的。
2.按权利要求1所述的玻璃涂层，其特征在于，所述第二红外线辐射-反射涂层由纯银组成。
3.按权利要求1所述的玻璃涂层，其特征在于，所述第一层包含具有至少50％的ZnO组分的材料。
4.按权利要求1所述的玻璃涂层，其特征在于，所述第一层由纯ZnO组成。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04024814.8 | 2004-10-19 | ||
| EP04024814A EP1650173A1 (de) | 2004-10-19 | 2004-10-19 | Glasbeschichtung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1762873A CN1762873A (zh) | 2006-04-26 |
| CN1762873B true CN1762873B (zh) | 2012-07-18 |
Family
ID=34927025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005100516548A Expired - Fee Related CN1762873B (zh) | 2004-10-19 | 2005-02-22 | 玻璃涂层 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7651774B2 (zh) |
| EP (1) | EP1650173A1 (zh) |
| JP (1) | JP2006117501A (zh) |
| KR (1) | KR100668091B1 (zh) |
| CN (1) | CN1762873B (zh) |
| TW (1) | TWI273032B (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1967501A1 (de) * | 2007-03-08 | 2008-09-10 | Applied Materials, Inc. | Temperbare Glasbeschichtung |
| US8133589B2 (en) * | 2007-03-08 | 2012-03-13 | Applied Materials, Inc. | Temperable glass coating |
| US7901781B2 (en) * | 2007-11-23 | 2011-03-08 | Agc Flat Glass North America, Inc. | Low emissivity coating with low solar heat gain coefficient, enhanced chemical and mechanical properties and method of making the same |
| US9434640B2 (en) * | 2012-12-04 | 2016-09-06 | Guardian Industries Corp. | Method of making heat treated coated article with carbon based coating and protective film |
| DE102013108218B4 (de) * | 2013-07-31 | 2021-03-04 | VON ARDENNE Asset GmbH & Co. KG | Verfahren zur Herstellung eines transparenten IR-reflektierenden Schichtsystems |
| KR102545820B1 (ko) | 2021-03-10 | 2023-06-21 | 동의대학교 산학협력단 | 광 제어 코팅을 이용하는 스마트 온실 시스템 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4211363A1 (de) * | 1992-04-04 | 1993-10-07 | Leybold Ag | Verfahren zum Herstellen von Scheiben mit hohem Transmissionsverhalten im sichtbaren Spektralbereich und mit hohem Reflexionsverhalten für Wärmestrahlung sowie durch das Verfahren hergestellte Scheiben |
| WO1995029883A1 (en) * | 1994-05-03 | 1995-11-09 | Cardinal Ig Company | Transparent article having protective silicon nitride film |
| CN1126182A (zh) * | 1994-05-12 | 1996-07-10 | 格拉沃贝尔公司 | 在玻璃基体上形成银涂层的方法 |
| CN1134921A (zh) * | 1995-01-17 | 1996-11-06 | 加迪安工业公司 | 双银层、低辐射率玻璃涂层系统和用其制造的绝热玻璃构件 |
| US6180247B1 (en) * | 1998-10-30 | 2001-01-30 | Leybold Systems Gmbh | Thermally-insulating coating system |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2699164B1 (fr) | 1992-12-11 | 1995-02-24 | Saint Gobain Vitrage Int | Procédé de traitement de couches minces à base d'oxyde ou de nitrure métallique. |
| FR2801684B1 (fr) * | 1999-11-26 | 2002-04-26 | Commissariat Energie Atomique | Filtre anticalorique et procede de fabrication de ce filtre |
| FR2809388B1 (fr) * | 2000-05-23 | 2002-12-20 | Saint Gobain Vitrage | Vitrage comprenant au moins une couche a proprietes thermochromes |
| US6596399B2 (en) | 2000-12-04 | 2003-07-22 | Guardian Industries Corp. | UV absorbing/reflecting silver oxide layer, and method of making same |
| US6936347B2 (en) | 2001-10-17 | 2005-08-30 | Guardian Industries Corp. | Coated article with high visible transmission and low emissivity |
-
2004
- 2004-10-19 EP EP04024814A patent/EP1650173A1/de not_active Withdrawn
- 2004-12-13 US US11/012,085 patent/US7651774B2/en not_active Expired - Fee Related
- 2004-12-28 TW TW093140927A patent/TWI273032B/zh not_active IP Right Cessation
-
2005
- 2005-01-21 JP JP2005013604A patent/JP2006117501A/ja active Pending
- 2005-02-22 CN CN2005100516548A patent/CN1762873B/zh not_active Expired - Fee Related
- 2005-03-08 KR KR1020050019111A patent/KR100668091B1/ko not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4211363A1 (de) * | 1992-04-04 | 1993-10-07 | Leybold Ag | Verfahren zum Herstellen von Scheiben mit hohem Transmissionsverhalten im sichtbaren Spektralbereich und mit hohem Reflexionsverhalten für Wärmestrahlung sowie durch das Verfahren hergestellte Scheiben |
| WO1995029883A1 (en) * | 1994-05-03 | 1995-11-09 | Cardinal Ig Company | Transparent article having protective silicon nitride film |
| CN1126182A (zh) * | 1994-05-12 | 1996-07-10 | 格拉沃贝尔公司 | 在玻璃基体上形成银涂层的方法 |
| CN1134921A (zh) * | 1995-01-17 | 1996-11-06 | 加迪安工业公司 | 双银层、低辐射率玻璃涂层系统和用其制造的绝热玻璃构件 |
| US6180247B1 (en) * | 1998-10-30 | 2001-01-30 | Leybold Systems Gmbh | Thermally-insulating coating system |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI273032B (en) | 2007-02-11 |
| TW200613128A (en) | 2006-05-01 |
| CN1762873A (zh) | 2006-04-26 |
| KR100668091B1 (ko) | 2007-01-11 |
| US7651774B2 (en) | 2010-01-26 |
| KR20060043516A (ko) | 2006-05-15 |
| EP1650173A1 (de) | 2006-04-26 |
| JP2006117501A (ja) | 2006-05-11 |
| US20060083932A1 (en) | 2006-04-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20210032159A1 (en) | Deposition methods for high quality reflectance coatings | |
| AU2004225545B2 (en) | Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal | |
| JP5722346B2 (ja) | 高品質放射制御コーティング、放射制御ガラスおよび製造方法 | |
| KR100654483B1 (ko) | 아연-주석 합금 스퍼터링 타깃, 스퍼터 코팅된 물품 및 자동차용 투명 용품의 제조 방법 | |
| EA011247B1 (ru) | Подложка, покрытая слоем диэлектрика, и способ и устройство для её изготовления | |
| CN101321708A (zh) | 沉积高品质反射涂层的方法和设备 | |
| CN1747907A (zh) | 载有涂层叠层的玻璃板 | |
| CZ466599A3 (cs) | Způsob výroby tenkovrstvého systému s transparentní stříbrnou vrstvou, sklo opatřené takovým tenkovrstvým systémem, dvousklo ho obsahující a způsob povlékání skla | |
| CN1330615A (zh) | 不使用金属底漆层制造银基低发射率涂层的方法和设备以及用其制造的制品 | |
| CN102555330A (zh) | 具有多层功能层的低辐射镀膜玻璃 | |
| CN103619771A (zh) | 可回火和非可回火透明纳米复合材料层 | |
| Tachibana et al. | TiO2− X sputter for high rate deposition of TiO2 | |
| CN104230182A (zh) | 高透过率可钢化低辐射镀膜玻璃的制备方法 | |
| CN104995149A (zh) | 具有优化的基础层材料和层堆叠的改进的低发射率涂层 | |
| CN101296876B (zh) | 处理基底的方法 | |
| CN107117832A (zh) | 低反低透可钢化单银低辐射镀膜玻璃及其制造方法和应用 | |
| CN106242313A (zh) | 一种耐磨耐高温低辐射镀膜玻璃的镀膜方法 | |
| CN110573468A (zh) | 低发射率涂层，包括其的玻璃表面，及其制备方法 | |
| JP5118999B2 (ja) | 焼戻し可能なガラスコーティング | |
| CN1762873B (zh) | 玻璃涂层 | |
| JP2011173764A (ja) | 低放射膜 | |
| CN106966608A (zh) | 一种高透光率低辐射镀膜玻璃的制作方法 | |
| CN106746730A (zh) | 一种用于增强低辐射镀膜玻璃耐钢化性能的方法 | |
| CN109689586A (zh) | 减反射玻璃基板及其制造方法 | |
| CN202448402U (zh) | 具有多层功能层的低辐射镀膜玻璃 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20060426 |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120718 Termination date: 20140222 |