CN1751813A - Wet treater - Google Patents

Abstract

The object of the present invention is to provide a wet processing device that can easily suck high-viscosity fluid without using ultrasonic waves, and has a cleaning nozzle for cleaning residues. In the present invention, it is arranged close to the surface of the object to be cleaned (8) and has a slit-shaped fluid for discharging the cleaning fluid (9) supplied from the outside to the surface of the object to be cleaned (8) in a belt shape. The supply port (2) of the discharge port (10) and the cleaning assembly (11) having the discharge port (3) for discharging the cleaning fluid (9) discharged from the discharge port (10), and the discharge port (10) The cross-sectional area, relative to the opening cross-sectional area of the supply port of the cleaning fluid (9) supplied from the outside, has more than 1 The opening cross-sectional area of a positive number of one-fold, the cleaning assembly thus constituted is arranged in a direction perpendicular to the moving direction of the object to be cleaned (8).

Description

wet processing unit

technical field

The present invention relates to a wet processing apparatus having a cleaning unit for cleaning the surfaces of semiconductor wafers and glass substrates.

Background technique

In the manufacture of electronic equipment such as semiconductor equipment, semiconductor devices, and liquid crystal display panels, the process of cleaning semiconductor wafers and glass substrates as objects to be cleaned must be included in the manufacturing process. In the cleaning process, in order to remove various substances to be removed in the manufacturing process, various cleaning liquids such as ultrapure water, electrolytic ionized water, ozone water, and hydrogen water are used for cleaning. These cleaning liquids are supplied from the nozzle of the cleaning device to the on the substrate.

However, for a wet processing device that uses a general cleaning nozzle at present, for example, a cleaning solution such as electrolytic ionized water is used to clean a 500 mm square substrate. If the remaining amount of foreign matter (particles) on the substrate after rinsing is desired to achieve a cleanliness level of 0.5 particles/cm ² , then about 25 to 30 liters/min of cleaning solution and rinsing cleaning solution must be used.

Therefore, there is a proposal to use a liquid-saving cleaning nozzle that can significantly reduce the amount of cleaning liquid used compared with the existing method, and simultaneously use an ultrasonic generator to remove the object to be removed by its vibration waves.

4 is a cross-sectional view illustrating an example of a configuration for wet processing having a conventional cleaning nozzle. As shown in Figure 4, the cleaning nozzle 101 of this structure is provided with an introduction path (introduction pipe) 103 having an inlet 103a for introducing a cleaning liquid (processing liquid) 102 at one end and a cleaning nozzle 103 having an inlet for cleaning at one end. The liquid (discharge of the treatment liquid after the wet treatment) is discharged to the discharge passage (discharge pipe) 104 of the external discharge port 104a.

The other ends of these introduction passages 103 and discharge passages 104 are connected to form a connection portion 106 having a facing surface 105a facing the substrate to be processed (object to be cleaned) W, and an introduction passage is also provided on the connection portion 106. The first opening (introduction opening) 103b in which 103 opens and the second opening (discharge opening) 104b in which discharge passage 104 opens. Such nozzles are called push-pull nozzles (flow-saving nozzles). The openings of the first and second openings 103b·104b face the substrate W to be processed. In the space between the connecting portion 106 and the substrate W to be processed, a processing region 107 where wet processing is performed is formed.

Furthermore, an ultrasonic vibrator portion 108 for ultrasonically vibrating the cleaning solution 102 in the processing area 107 during the cleaning process of the substrate W to be processed is provided on the connecting portion 106 . The ultrasonic vibrator portion 108 is provided on a vibrating plate (vibrating portion) 105 and a main surface of the vibrating plate 105 , and includes an ultrasonic vibrator 109 that ultrasonically vibrates the vibrating plate 105 . The ultrasonic vibrator 109 is an electrostrictive element such as PZT, and receives an electronic signal at an ultrasonic frequency from the oscillator to generate ultrasonic vibration. The ultrasonic vibrator 109 is bonded to the vibrating plate 105 with an adhesive used for ultrasonic vibrator bonding or the like mainly composed of epoxy resin.

The material constituting the vibrating plate 105 can be selected from ceramic materials such as high-purity glassy carbon, stainless steel, quartz, sapphire, and alumina, or materials such as aluminum and its alloys, titanium, and magnesium. When a vibrating plate is installed on the nozzle for wet processing used in normal cleaning treatment, it is sufficient to use stainless steel as the material of the vibrating plate 105, but when the cleaning liquid is a relatively strong acid or hydrofluoric acid, sapphire or alum Made of ceramic materials such as clay, it is ideal for wet processing because it has excellent resistance to wet processing liquids and prevents deterioration.

In addition, the ultrasonic vibrator 109 can output ultrasonic vibrations with a frequency in the range of 20 kHz to 10 MHz, which is practically ideal for wet processing, especially from the viewpoint of the thickness of the processing liquid layer that can be maintained, the frequency can reach 10 MHz. More than 0.2MHz is better. In addition, the wavelength λ of the ultrasonic vibration generated by the ultrasonic vibrator 109 in the vibrating plate 105 ranges from about 0.6 mm to about 300 mm when the vibrating plate 105 made of stainless steel (SUS316L) is used.

If the wavelength of the ultrasonic vibration that the ultrasonic vibrator 109 takes place in this vibrating plate 105 is λ, then the plate thickness dimension T of the vibrating plate 105 shown in Fig. 4 is: T=(n ± 0.1) λ/2 (wherein n is an integer greater than 2). The value of n is generally 3-7, especially 5 is the best. Here, the plate thickness dimension T is preferably set within a range having a certain range for each numerical value such as λ±0.3mm, 3λ/2±0.3mm, 5λ/2±0.3mm, and 7λ/2±0.3mm. This setting takes into account conditions such as temperature changes. If the plate thickness dimension T is set in this way, the ultrasonic vibration from the ultrasonic vibrator 109 can be effectively propagated. If the cleaning nozzle 101 equipped with the ultrasonic vibrator part 108 is used for wet processing, the ultrasonic vibration (ultrasonic energy) can be sufficiently Added to the cleaning solution 102, wet processing can be effectively performed.

In addition, on the side of the discharge passage 104, a pressure control unit (not shown in the figure) is provided, and the pressure control unit (processing liquid recovery mechanism) passes the pressure of the cleaning liquid (also including the cleaning liquid) that makes the first opening 103b contact with the atmosphere. The surface tension of the substrate W to be processed and the surface tension of the surface to be cleaned of the substrate to be processed) and the atmospheric pressure are balanced so that the cleaning liquid 102 that contacts the substrate to be processed W flows to the discharge passage 104 after cleaning. The above-mentioned pressure control unit is constituted by a decompression pump provided on the discharge port 104a side.

Therefore, the pressure control unit on the side of the discharge passage 104 uses a decompression pump to control the force of the decompression pump to suck the cleaning liquid in the connection part 106, so that the pressure of the cleaning liquid (including The surface tension of the cleaning liquid, the surface tension of the surface W1 to be cleaned of the substrate W to be processed, and the atmospheric pressure are balanced.

That is, by setting the relationship between the pressure Pw of the cleaning solution (also including the surface tension of the cleaning solution and the surface tension of the surface W1 to be cleaned of the substrate W) and the atmospheric pressure Pa in contact with the atmosphere at the first opening 103b as PwPa, Then, the cleaning liquid supplied to the substrate W to be processed through the first opening 103b and coming into contact with the substrate W is discharged to the discharge path 104 without leaking outside the cleaning nozzle.

That is, the cleaning liquid supplied from the cleaning nozzle to the substrate W to be processed does not contact the portion of the substrate W to be processed other than the portion (first and second openings 103b·104b) to which the cleaning liquid has been supplied, and Remove from substrate W. In addition, prior art related to such a cleaning nozzle is disclosed, for example, Patent Document 1 can be cited.

[Patent Document 1] JP-A-2003-158110

Contents of the invention

Issues to be solved

However, the above-mentioned conventional liquid-saving cleaning nozzle performs cleaning while using a decompression pump while approximately maintaining the pressure of the cleaning liquid in balance with the atmospheric pressure, so the suction force for highly viscous cleaning liquid is relatively low. Cleaning nozzles can often bring a lot of residue.

In addition, in the ultrasonic cleaning device, due to the use of ultrasonic waves to physically disperse the dirt in the liquid, the combined cleaning method of physical cleaning and chemical cleaning by selecting the cleaning liquid using chemical effects such as dissolution and emulsification, so it is necessary Control the propagation speed of sound waves in various cleaning liquids, and control the liquid depth through liquid temperature. In addition, it is also necessary to control the sound wave according to the type of dirt and particle size, the type and shape of the cleaning object, and the type of cleaning liquid. It is a complicated mechanism to manage the ultrasonic frequency. Therefore, it is easy to cause contact accidents between the cleaning object and the cleaning nozzle, and the failure of the ultrasonic transmitter, which leads to an increase in the cost of the device.

It is an object of the present invention to provide a wet treatment device that can easily suck high-viscosity fluid without using ultrasonic waves, and has a cleaning nozzle for cleaning residues.

means of solving problems

In order to achieve the above objects, the present invention is characterized by the following configurations. That is, the wet processing apparatus of the present invention is produced as follows.

(1) It is equipped with a supply port that is arranged close to the surface of the object to be cleaned and has a slit-shaped discharge port for discharging the cleaning fluid supplied from the outside to the surface of the object to be cleaned in a strip shape, and for The cleaning assembly of the discharge port that discharges the cleaning fluid discharged from the discharge port,

The cross-sectional area of the discharge port, relative to the opening cross-sectional area of the supply port socket portion of the cleaning fluid supplied from the outside, has a positive number of more than 1/1 times in order to discharge the cleaning fluid to the surface of the object to be cleaned. The cross-sectional area of the opening is arranged in a direction perpendicular to the moving direction of the object to be cleaned.

(2) In addition, the wet processing device of the present invention has two above-mentioned cleaning assemblies close to the surface of the object to be cleaned and symmetrically arranged left and right, there is a common discharge port between the above-mentioned two above-mentioned cleaning assemblies, and the opening cross-sectional area of the discharge port is , is a positive multiple of more than 1 of the cross-sectional area of the opening of the cleaning fluid socket.

(3) In addition, in the wet processing device of the present invention, the cross-sectional shape of the contact surface that is in contact with the cleaning fluid perpendicular to the moving direction of the above-mentioned object to be cleaned at the discharge port is defined from the front end of the discharge port to the outlet of the discharge port. It is arc-shaped and has an opening whose length corresponds to the width of the object to be cleaned, and the cleaning assembly is supported on the external fixing plate by a plurality of elastic bodies connected at one end. Elastomers have an adjustable mechanism for their spring rate.

(4) The above-mentioned elastic body is controlled with an arbitrary elastic coefficient according to the weight of the cleaning assembly inputted in advance into the adjustable elastic coefficient mechanism. The modulus of elasticity mechanism has a flow sensor that detects the flow rate of cleaning fluid supplied from the supply port, and the modulus of elasticity of the elastic body is controlled by the modulus of modulus of elasticity that receives a detection signal from the flow sensor.

In addition, the adjustable mechanism of the elastic coefficient has a gap sensor for detecting the gap between the cleaning component and the surface of the object to be cleaned, and the elastic coefficient of the elastic body is controlled by the adjustable elastic coefficient mechanism which is input with the detection signal of the gap sensor.

Furthermore, the adjustable mechanism of the elastic coefficient has an object detection sensor for detecting the presence or absence of the object to be cleaned, and the elastic coefficient of the elastic body is controlled by the adjustable mechanism of the elastic coefficient that is input with the detection signal of the object sensor .

Furthermore, in the present invention, the cleaning unit has a stopper that operates when the gap between the cleaning unit and the surface of the object to be cleaned is smaller than a predetermined gap, and the cleaning unit has a function of pressurizing and supplying the cleaning fluid supplied to the supply port. Either one of the booster pump and the suction pump for sucking the cleaning fluid discharged from the discharge port, or both.

Invention effect

Utilize the word of the present invention, discharge port, with respect to the opening area of the supply mouth socket portion of the supply port portion of the cleaning fluid that is supplied from the outside, its front end portion that discharges cleaning fluid to the surface of the object to be cleaned has a positive number that exceeds 1 times. In this way, relative to the flow rate of the cleaning fluid supplied to the supply mouthpiece, the discharge speed is further accelerated, and the accelerated high-speed flow of the strip-shaped cleaning fluid can directly impact the dirt on the surface of the object to be cleaned and clean it. And because of the high-speed flow formed by the strip-shaped cleaning fluid discharged from the discharge port, a negative pressure is generated on the cleaning assembly. Under its action, the discharge port is pulled closer to the surface of the object to be cleaned. The gravitational force becomes larger as the distance between the object to be cleaned and the discharge port is closer to zero. Here, as the distance between the object to be cleaned and the discharge port shrinks, the flow rate of the fluid spray of the cleaning fluid increases, so the fluid resistance acting on particles such as dirt increases further, thereby enhancing the ability of particles such as dirt to break away from the object to be cleaned. Effect. In addition, this attractive force is added to the attractive force of the outlet.

In addition, utilize the word of the present invention, because the ejection port of two cleaning components is opposite, with respect to the opening area of the supply mouth socket part of the supply port portion of the cleaning fluid that is supplied from the outside, the front end portion that discharges the cleaning fluid to the surface of the object to be cleaned has a The opening area is more than one-tenth of a positive number of 1, so the dirt on the surface of the object to be cleaned can be directly impacted and removed by the high-speed flow of the strip-shaped cleaning fluid discharged from the two discharge ports, and the central discharge port is effective. Inhale and discharge in one fell swoop, and since the cleaning area of the object to be cleaned can be surrounded by two discharge ports to discharge the cleaning fluid, the cleaning fluid and the removed dirt will not be diffused to the outside.

In addition, if the present invention is used, since the above-mentioned opposite discharge ports are arranged symmetrically with respect to the discharge ports, the dirt on the surface of the object to be cleaned is directly impacted and removed by the high-speed flow of the strip-shaped cleaning fluid discharged from the two discharge ports. The central part of the discharge port at the center of each discharge port merges, and they can be sucked and discharged effectively at one stroke, and since the cleaning area of the object to be cleaned can be surrounded by the above two discharge ports to spit out the cleaning fluid, it will not be drained. The cleaning fluid and the removed dirt are diffused to the outside.

In addition, if the present invention is used, since the opening area of the discharge port is a positive multiple of more than 1 of the supply port of the cleaning fluid, even a high-viscosity cleaning fluid can be easily sucked and discharged, and it is compatible with the supply port. Compared with the conventional method with the same cross-sectional area of the discharge port, the suction efficiency is dramatically improved.

Furthermore, by using the present invention, since the discharge port is perpendicular to the moving direction of the object to be cleaned, the cross-sectional shape of the contact surface contacting with the cleaning fluid forms an arc shape from the discharge port front end to the outlet of the above-mentioned discharge port, And there is an opening whose length corresponds to the width of the object to be cleaned, so the flow velocity of the high-speed flow of the strip-shaped cleaning fluid discharged from the outlet of the slit-shaped opening corresponding to the width of the object to be cleaned will not be lost, and can Suction and discharge are performed without any omission, and the suction efficiency is further improved dramatically compared to the conventional method in which the cross-sectional area of the supply port and the discharge port are the same.

In addition, if the present invention is used, since the cleaning assembly is supported on the external fixing plate by a plurality of elastic bodies connected at one end, it is possible to prevent the high-speed flow formed by the cleaning fluid discharged from the discharge port on the cleaning assembly. The negative pressure is supplemented, and the cleaning component and the object to be cleaned can always maintain an appropriate gap, so it can automatically prevent the contact damage accident between the cleaning component and the object to be cleaned, and at the same time obtain the cleaning effect and the stability of the object to be cleaned.

In addition, if the present invention is used, since the elastic body has an adjustable mechanism for its elastic coefficient, it is possible to detect the viscosity that changes due to the selection of the type of cleaning fluid and the liquid temperature during operation, and to detect the liquid temperature due to the fluid being discharged from the discharge port. The high-speed flow formed by the high-speed cleaning fluid causes the negative pressure on the cleaning component to follow the changes in viscosity and liquid temperature, so that the cleaning component and the object to be cleaned can always maintain a proper gap, so that it can be connected with the object to be cleaned. The cleaning object is always kept at an appropriate angle and distance, and the high-speed cleaning fluid discharged from the discharge port directly impacts and removes the dirt on the surface of the object to be cleaned, and can automatically prevent contact damage accidents between the cleaning component and the object to be cleaned.

In addition, if the present invention is used, the elastic body can be controlled with any elastic coefficient according to the weight of the cleaning assembly input in the adjustable mechanism of the elastic coefficient in advance, so even according to various wet processing devices and cleaning fluids Types of cleaning components with different weights are selected, as long as the weight is input, the gap between the above cleaning components and the object to be cleaned can be maintained at the specified gap through control.

Furthermore, if the present invention is utilized, due to the adjustable mechanism of the elastic coefficient, it is equipped with a flow sensor that detects the flow of the cleaning fluid supplied from the opposite supply port, and the elastic coefficient of the elastic body utilizes the detection signal inputted into the flow sensor. The above-mentioned adjustable mechanism is controlled, so the gap between the cleaning component of the specified flow value and the object to be cleaned can be maintained at the specified gap through control, and even if the flow rate (flow rate) of the cleaning fluid and the temperature change of the cleaning fluid cause viscosity changes , and flow velocity changes can also be properly controlled. Furthermore, even if the supply of the cleaning fluid is stopped, accidents of contact damage between the cleaning unit and the object to be cleaned can be automatically prevented.

In addition, if the present invention is used, due to the adjustable mechanism of the elastic coefficient, a temperature sensor is provided to detect the temperature of the cleaning fluid supplied from the above-mentioned opposite supply port, and the elastic coefficient of the elastic body is determined by the detection signal input from the temperature sensor. The above-mentioned adjustable mechanism is controlled, so even if the viscosity of the cleaning fluid changes due to the temperature change, it can follow the change of the negative pressure on the cleaning component due to the high-speed flow of the cleaning fluid discharged from the discharge port. In order to keep an appropriate gap between the cleaning component and the object to be cleaned, it is possible to maintain an appropriate angle and distance from the object to be cleaned, and use the high-speed cleaning fluid ejected from the outlet to directly impact the dirt on the surface of the object to be cleaned. It can be removed, and it can automatically prevent the contact damage accident between the cleaning component and the object to be cleaned.

In addition, if the present invention is used, due to the adjustable mechanism of the elastic coefficient, there is a gap sensor for detecting the gap between the cleaning assembly and the object to be cleaned, and the elastic coefficient of the elastic body is determined by inputting the gap between the cleaning assembly and the object to be cleaned. The detection signal of the detected gap sensor is controlled by the adjustable mechanism, so even for the instantaneous change of the gap between the cleaning component and the object to be cleaned, an appropriate gap can be maintained, and the accident of contact damage between the cleaning component and the object to be cleaned can be automatically prevented At the same time, it can always maintain an appropriate angle with the object to be cleaned, and use the high-speed cleaning fluid discharged from the discharge port to directly impact the dirt on the surface of the object to be cleaned and remove it.

In addition, if the present invention is utilized, due to the adjustable mechanism of the elastic coefficient, it is provided with an object detection sensor for detecting the presence or absence of the object to be cleaned, and the elastic coefficient of the elastic body is used to maintain the gap between the cleaning assembly and the object to be cleaned. The gap is controlled by an adjustable mechanism that inputs the detection signal of the sensor of the object to be cleaned, so it can detect whether the object to be cleaned is installed in the wet processing device. When there is no object to be cleaned, the distance between the cleaning component and the transport table of the object By maintaining the gap at a predetermined gap, contact damage accidents can be automatically prevented, and inadvertent movement of the supply device for cleaning fluid and the like can be avoided.

Furthermore, if the present invention is used, since the cleaning assembly is provided with a stopper that operates when the gap between the cleaning assembly and the object to be cleaned is less than a predetermined gap, even if the mechanism or sensor that controls the gap between the cleaning assembly and the object to be cleaned is abnormal, It is also possible to maintain a gap in which the object to be cleaned is not damaged by the stopper.

In addition, according to the present invention, since the cleaning unit includes any one of a pressure pump for pressurizing and supplying the cleaning fluid supplied to the supply port and a suction pump for sucking the cleaning fluid discharged from the discharge port , or both, so the speed of the pressure pump and the suction pump can be controlled according to the viscosity and temperature of the cleaning fluid, the size and shape of the object to be cleaned, so that the high-speed flow discharged from the discharge port can be used The dirt on the surface of the object to be cleaned is directly impacted and removed by the belt-shaped cleaning fluid, and is effectively sucked and discharged at one stroke at the discharge port.

Brief description of the drawings

Fig. 1 is a perspective view of the appearance of the cleaning assembly of Embodiment 1 of the wet processing device of the present invention.

Fig. 2 is an A-A' sectional view of the cleaning assembly shown in Fig. 1 .

Fig. 3 is a cross-sectional view of a cleaning unit of Embodiment 2 of the wet processing device of the present invention.

4 is a cross-sectional view illustrating an example of a configuration for wet processing having a conventional cleaning nozzle.

Symbol Description

1: wet processing device; 2: supply port; 3: discharge port; 4: installation plate; 5: fixed plate; 6: supply core; Fluid; 10: outlet; 11·11′: cleaning component; 12: elastic body; 13: elastic body support plate; 14: adjustable mechanism of elastic coefficient; 15; stopper; 16: fluid spray; 101: Ultrasonic cleaning device; 102: cleaning liquid; 103: introduction passage; 103a: introduction port; 103b: first opening; 104: discharge passage; 104a: discharge port; 104b: second opening; 105: vibration plate; 106: Connection part; 107: processing area; 108: ultrasonic vibrator part; 109: ultrasonic vibrator; W: substrate to be processed; W1: surface to be cleaned.

Detailed ways

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the drawings of the embodiments.

Example 1

Fig. 1 is a perspective view of the appearance of the cleaning assembly of Embodiment 1 of the wet processing device of the present invention. In addition, FIG. 2 is an A-A' sectional view of the cleaning unit shown in FIG. 1 . In Fig. 1 and Fig. 2, the wet treatment apparatus 1 of embodiment 1 is arranged close to the top of the object 8 to be cleaned, and has the function of discharging the strip-shaped cleaning fluid 9 onto the surface of the object 8 to be cleaned. Discharge port 10 with slit-shaped opening. The discharge port 10 is arranged left and right, and is equipped with the supply port 2 of the two above-mentioned cleaning fluids 9 having the opposite discharge port 10 arranged symmetrically with respect to the discharge port 3 and the fluid jet liquid 16 ejected from the above-mentioned relative discharge port 10. The cleaning assembly 11 constituted by the discharge port 3 through which the cleaning fluid 9 is discharged.

The above-mentioned symmetrically arranged and opposite discharge ports 10 are characterized in that, relative to the opening area of the supply port 2 socket portion of the cleaning fluid 9 supplied from the outside, the above-mentioned cleaning fluid 9 is ejected to the surface of the object 8 to be cleaned. The front end is reduced to more than a positive number of 1 times.

The discharge port 10 is composed of a supply core 6 that guides the cleaning fluid 9 supplied from the supply port 2 to the discharge port 10 and a discharge port that guides the cleaning fluid 9 discharged from the discharge port 10 to the discharge port 3 that is discharged to the outside. Core 7 is formed.

In addition, the cleaning unit 11 is supported by being connected to the fixing plate 5 through an elastic body support plate 13 protruding outside from the supply core 6 and elastic bodies 12 such as coil springs.

Furthermore, because the gap sensor not shown in the figure that detects the gap between the above-mentioned cleaning assembly 11 and the object 8 to be cleaned and the detection signal of the object detection sensor not shown in the figure for detecting the presence or absence of the object 8 to be cleaned, the above-mentioned The adjustable mechanism 14 of the elastic coefficient of the elastic body 12 is arranged on the above-mentioned elastic body support plate 13 .

Furthermore, the cleaning unit 11 includes a stopper 15 fixed to either the elastic support plate 13 or the fixing plate 5, which operates when the gap between the cleaning unit 11 and the object 8 is smaller than a predetermined gap.

In FIG. 2, the cleaning fluid 9, which is pressurized by a pump not shown in the figure and whose water flow is increased, is supplied to the supply port 2. A fluid jet 16 is expelled. The constant flow supplied from a place with a large cross-sectional area to a small cross-sectional area has a faster flow velocity, and due to the ejected fluid spray 16, a huge fluid resistance acts on particles such as dirt attached to the object to be cleaned 8, dirt, etc. Particles are removed.

Here, the above-mentioned discharge port 10 is disposed symmetrically with respect to the above-mentioned discharge port 3, so the object to be cleaned 8 is cleaned by the fluid spray liquid 16 ejected in opposite directions by utilizing a conveying device not shown in the figure to pass through the bottom of the cleaning assembly 11, Particles such as dirt are completely and thoroughly removed.

Furthermore, the above-mentioned discharge port 3 that utilizes a suction pump not shown in the figure to discharge the cleaning fluid 9 has an opening area that exceeds a positive multiple of 1 of the supply port 2 socket of the above-mentioned cleaning fluid 9. Wide mouth, so that the cleaning fluid 9 that contains particles such as dirt and other particles cleaned by the above-mentioned respectively reversely ejected fluid spray liquid 16 is discharged at one stroke, so even the high-viscosity cleaning fluid 9 can be easily sucked and discharged. , and compared with the conventional method in which the cross-sectional area of the supply port and the discharge port is the same, the suction efficiency is greatly improved.

And, according to the theorem that the flow velocity of the constant flow supplied from a place with a large cross-sectional area to a small cross-sectional area, which was explained above, defined by Bernoulli, increases and the pressure decreases, near the discharge port 10 where the fluid spray liquid 16 is ejected, the pressure decreases. Small, relative to the object to be cleaned 8, the cleaning component 11 is subjected to negative pressure. Under this action, the discharge port 10 is subjected to an attractive force that is drawn closer to the surface of the object 8 to be cleaned. This attractive force becomes larger as the distance between the object 8 and the discharge port 10 is closer to zero. Here, as the distance between the object to be cleaned 8 and the discharge port 10 dwindles, the flow velocity of the fluid jet liquid 16 of the cleaning fluid 9 increases, so the fluid resistance acting on particles such as dirt increases further, thereby strengthening the separation of particles such as dirt. The effect of the object to be cleaned 8.

In addition, the above-mentioned discharge port 3 is vertical to the moving direction of the object to be cleaned 8, and the cross-sectional shape of the contact surface with the cleaning fluid 9 is from the front end of the discharge port 10 to the discharge port core 7 at the outlet of the discharge port 3. It is formed in an arc shape and has an opening whose length corresponds to the width of the object 8 to be cleaned.

For this reason, the strip shape ejected from the discharge port 10 of the slit-shaped opening corresponding to the width of the above-mentioned object to be cleaned 8 does not lose the flow rate of the cleaning fluid jet 16 of the high-speed flow, and can be cleaned without omission. Inhalation and discharge, compared with the conventional method in which the cross-sectional area of the supply port and the discharge port are the same, the suction efficiency is further improved dramatically.

Furthermore, since the above-mentioned cleaning assembly 11 is supported by a plurality of elastic bodies 12 connected at one end on the external fixing plate 5 for maintaining the gap between the cleaning assembly 11 and the object to be cleaned 8 at a predetermined gap, The negative pressure generated on the cleaning assembly 11 by the high-speed flow of the cleaning fluid 8 discharged from the outlet 10 is supplemented, and an appropriate gap can always be maintained between the cleaning assembly 11 and the object to be cleaned 8, so it can automatically prevent the cleaning assembly from 11 and the contact damage accident of the object to be cleaned 8.

Furthermore, since the above-mentioned elastic body 12 has an adjustable mechanism 14 of its elastic coefficient, it is possible to detect the viscosity and the liquid temperature during operation due to the change of the type of the cleaning fluid 9 due to selection, and to detect the fluid temperature due to the discharge port 10. The negative pressure generated on the cleaning component 11 due to the high-speed flow formed by the ejected fluid spray 16 is followed by changes in viscosity and liquid temperature, so that the cleaning component 11 and the object to be cleaned 8 are always kept at an appropriate gap Therefore, it is possible to maintain an appropriate angle with the object 8 to be cleaned, and to directly impact the dirt on the surface of the object 8 to be cleaned with the fluid jet liquid 16 of the high-speed flow ejected from the discharge port 10 and to remove it, and it can automatically prevent the cleaning assembly 11 and the object to be cleaned. Contact damage accident of cleaning object 8.

Because the above-mentioned elastic body 12 can be controlled with any elastic coefficient according to the weight of the above-mentioned cleaning assembly 11 input in the adjustable mechanism 14 of the above-mentioned elastic coefficient in advance, so even according to various wet processing devices and the type of the cleaning fluid 9 Select cleaning components 11 of different weights, and as long as the weight is input, the gap between the cleaning components 11 and the object 8 to be cleaned can be maintained at a specified gap through control.

Due to the adjustable mechanism 14 of the above-mentioned elastic coefficient, it is equipped with a flow sensor not shown in the figure that detects the flow rate of the cleaning fluid 9 supplied from the above-mentioned relative supply port 2, and the elastic coefficient of the above-mentioned elastic body 12 can be utilized The adjustable mechanism 14 of the above-mentioned elastic coefficient that is input with the detection signal of the above-mentioned flow sensor is controlled, so the gap between the above-mentioned cleaning assembly 11 of the specified flow value and the object 8 to be cleaned can be maintained at a specified gap by controlling, so that it can be connected with the object to be cleaned. The cleaning object 8 maintains an appropriate angle and distance with the cleaning fluid jet 16 of the high-speed flow discharged from the discharge port 10 to directly impact the dirt on the surface of the cleaning object 8 and remove it, and even if the flow rate (flow velocity) of the cleaning fluid 9 changes , or the supply of the cleaning fluid 9 is stopped, and the accident of contact damage between the cleaning assembly 11 and the object 8 to be cleaned can be automatically prevented.

Due to the adjustable mechanism 14 of the above-mentioned elastic coefficient, it is equipped with a temperature sensor not shown in the figure that detects the temperature of the cleaning fluid supplied from the above-mentioned opposite supply port 2, and the elastic coefficient of the above-mentioned elastic body 12 is input by using The adjustable mechanism 14 of the above-mentioned elastic coefficient that receives the detection signal of the above-mentioned temperature sensor is controlled, so even if the flow rate (flow velocity) of the cleaning fluid 9 and the temperature change of the cleaning fluid 9 cause viscosity changes and flow velocity changes, it can be properly Controlling in a precise manner, and following the change of the negative pressure on the cleaning assembly 11 due to the high-speed flow formed by the cleaning fluid jet 16 discharged from the discharge port 10, so that the gap between the cleaning assembly 11 and the object to be cleaned 8 Always keep in an appropriate gap, thus can keep the appropriate angle and distance with the object to be cleaned 8 and use the cleaning fluid spray 16 of the high-speed flow discharged from the discharge port 10 to directly impact the dirt on the surface of the object to be cleaned 8 and remove it, and The contact damage accident between the cleaning component 11 and the object 8 to be cleaned can be automatically prevented.

Due to the adjustable mechanism 14 of the above-mentioned elastic coefficient, it is equipped with a gap sensor not shown in the figure that detects the gap between the above-mentioned cleaning assembly 11 and the object to be cleaned 8, and the elastic coefficient of the above-mentioned elastic body 12 is input to the above-mentioned The above-mentioned adjustable mechanism 14 of the elastic coefficient of the detection signal of the above-mentioned gap sensor that detects the gap between the cleaning assembly 11 and the object 8 to be cleaned is controlled, so even for the instantaneous change of the gap between the cleaning assembly 11 and the object 8 to be cleaned, it is possible to Maintain an appropriate gap, and can automatically prevent the contact damage accident between the cleaning assembly 11 and the object 8 to be cleaned, and at the same time, can always keep an appropriate angle with the object 8 to be cleaned, and directly impact the object to be cleaned by the high-speed fluid spray 16 discharged from the discharge port 10. The dirt on the surface of the object 8 is cleaned and removed.

Due to the adjustable mechanism 14 of the above-mentioned elastic coefficient, it is equipped with an unshown object detection sensor for detecting the presence or absence of the object to be cleaned 8, and the elastic coefficient of the above-mentioned elastic body is utilized to make the above-mentioned cleaning assembly 11 and the object to be cleaned 8 The gap is maintained at a predetermined gap and is controlled by the above-mentioned adjustable mechanism 14 that is input with the detection signal of the above-mentioned object sensor to be cleaned, so it can be detected whether the wet processing device 1 is equipped with an object to be cleaned 8. When there is no object to be cleaned 8, the above-mentioned The gap between the cleaning unit 11 and the unshown transfer table of the object to be cleaned 8 is maintained at a predetermined gap, so that contact damage accidents can be automatically prevented, and at the same time, inadvertent actions of supply devices such as the cleaning fluid 9 can be avoided by control.

Since the above-mentioned cleaning assembly 11 is equipped with the stopper 15 installed on the elastic body support plate 13 that operates when the gap between the above-mentioned cleaning assembly 11 and the object 8 to be cleaned is less than the specified gap, even if the gap between the above-mentioned cleaning assembly 11 and the object 8 to be cleaned In the event of an abnormality in the mechanism or sensor for controlling the gap, the stopper 15 can also be in contact with any one of the elastic support plate 13 or the fixed plate 5 to maintain a gap that does not damage the object to be cleaned 8 .

The above-mentioned cleaning unit 11 is equipped with a pressure pump (not shown) for pressurizing and supplying the above-mentioned cleaning fluid 9 supplied to the supply port 2 and a pump for sucking the above-mentioned cleaning fluid 9 discharged from the discharge port 3 . Any one of the suction pumps not shown in the figure, or both, can control the number of revolutions of the booster pump and the suction pump according to the viscosity, temperature, size and shape of the cleaning fluid 9 above, Thereby, the dirt on the surface of the object 8 to be cleaned directly impacted and removed by the strip-shaped cleaning fluid spray 16 discharged from the discharge port 10 at a high speed can be sucked and discharged efficiently at the discharge port 3 at one go.

Example 2

Fig. 3 is a cross-sectional view of a cleaning unit of Embodiment 2 of the wet processing device of the present invention. In embodiment 2, it does not have any one of the supply ports 2 arranged left and right in embodiment 1 and has the opposite discharge port 10 symmetrically arranged with respect to the discharge port 3, and has a cleaning unit 11 each having one supply port and one discharge port. '. The above-mentioned cleaning assembly 11' is characterized in that it has a slit-shaped opening that is arranged close to the top of the object to be cleaned 8 and is configured to discharge the strip-shaped cleaning fluid 9 onto the surface of the object to be cleaned 8. The cleaning assembly 11' constituted by the discharge port 3 through which the cleaning fluid of the fluid ejection liquid 16 discharged from the discharge port 10 is discharged. , the front end portion at which the cleaning fluid 9 is ejected toward the surface of the object 8 to be cleaned is reduced to more than one-fold of a positive number.

The cleaning fluid 9, which is pressurized by a pump not shown in the figure and whose water flow is increased, is supplied to the supply port 2, and the fluid spray 16 is discharged from the discharge port 10 constituted by the supply port core 6 and the discharge port core 7 to the object 8 to be cleaned. . The constant flow supplied from a place with a large cross-sectional area to a small cross-sectional area has a faster flow velocity, and due to the ejected fluid spray 16, a huge fluid resistance acts on particles such as dirt attached to the object to be cleaned 8, dirt, etc. Particles are removed.

Here, the above-mentioned discharge port 3 that utilizes a suction pump not shown in the figure to discharge the cleaning fluid 9 is composed of a discharge core 7 and a discharge core 7'. The wide mouth of the supply port 2 that exceeds a positive multiple of 1, so that the cleaning fluid 9 that contains particles such as dirt and the like that is cleaned by the fluid jet liquid 16 ejected from the above-mentioned discharge port 10 is discharged at one stroke, so even if it is High viscosity cleaning fluid 9 can also be easily sucked and discharged.

In addition, the above-mentioned discharge port 3 is vertical to the moving direction of the object to be cleaned 8, and the cross-sectional shape of the contact surface with the cleaning fluid 9 is from the front end of the discharge port 10 to the discharge port core 7 at the outlet of the discharge port 3. It is formed in an arc shape and has an opening whose length corresponds to the width of the object 8 to be cleaned. Other constitutions and functions are the same as in Embodiment 1.

The cleaning assembly 11.11' of the wet processing apparatus such as semiconductor chip of the present invention, in embodiment 1,2, although all is arranged close to the top of object to be cleaned 8, but also can be up and down with embodiment 1,2 On the contrary, the cleaning components 11·11' are disposed close to the bottom of the object 8 to be cleaned.

Here, as the material of the supply core 6 and the discharge core 7 of the cleaning assembly 11, ceramic materials such as high-purity glassy carbon, stainless steel, quartz, sapphire, alumina, or aluminum and its alloys, titanium, magnesium, etc. can be used. material selected. Stainless steel is sufficient as a material used in general cleaning treatment, but when the cleaning solution is a relatively strong acid or hydrofluoric acid, it is made of ceramic materials such as sapphire or alumina, because it has excellent resistance to wet treatment solutions, and It can prevent deterioration, so it is ideal for wet processing.

Possibility of industrial use

The device provided by the present invention does not use an ultrasonic device, and forms a high-speed flow of the cleaning fluid by itself, and makes the discharge port of the cleaning fluid after cleaning into a wide-mouth shape so that it is easy to suck high-viscosity liquid, and the discharge port is arranged in the center. Supply ports are arranged on both sides to prevent residues from leaking, and the use of high-speed negative pressure and elastic bodies such as springs prevents substrates and other objects to be cleaned from contacting cleaning components. It is a simple device, so it has the possibility of industrial application.

Claims (13)

1. A wet processing device, wherein, it is equipped with a slit-shaped spout that is arranged close to the surface of the object to be cleaned and has a slit-shaped nozzle for discharging the cleaning fluid supplied from the outside in a strip shape to the surface of the object to be cleaned. The supply port of the outlet and the cleaning unit having a discharge port for discharging the cleaning fluid discharged from the discharge port are characterized in that, The above-mentioned discharge port has an opening cross-sectional area greater than one-fold of a positive number of the opening cross-sectional area of the supply port for the above-mentioned cleaning fluid supplied from the outside. The moving direction of the laundry is in the vertical direction. 2. The wet processing device according to claim 1, characterized in that there are two cleaning assemblies close to the surface of the object to be cleaned and symmetrically arranged left and right, and there is a common discharge port between the two cleaning assemblies . 3. The wet processing apparatus according to claim 1 or 2, wherein the cross-sectional opening area of the discharge port is a positive multiple of more than 1 the cross-sectional opening area of the supply port for cleaning fluid. 4. The wet processing device according to any one of claims 1 to 3, wherein the cross-sectional shape of the contact surface with the cleaning fluid perpendicular to the moving direction of the above-mentioned object to be cleaned at the above-mentioned discharge port is from The front end of the discharge port is formed in an arc shape to the exit of the discharge port, and has an opening whose length corresponds to the width of the object to be cleaned. 5. The wet processing device according to any one of claims 1-4, characterized in that, the cleaning assembly is supported on an external fixing plate by a plurality of elastic bodies connected at one end. 6. The wet processing device according to claim 5, wherein the elastic body has an adjustable mechanism for its elastic coefficient. 7. The wet processing device according to claim 5 or 6, wherein the elastic body is controlled with an arbitrary elastic coefficient according to the weight of the cleaning component pre-input into the adjustable elastic coefficient mechanism. 8. The wet processing device according to any one of claims 5 to 7, wherein the adjustable mechanism for the elastic coefficient has a flow sensor for detecting the flow rate of the cleaning fluid supplied from the supply port, The elastic coefficient of the elastic body is controlled by the adjustable mechanism of the elastic coefficient which receives the detection signal of the flow sensor. 9. The wet processing device according to any one of claims 5 to 8, wherein the controllable mechanism of the elastic coefficient has a temperature sensor for detecting the temperature of the cleaning fluid supplied from the supply port, The elastic coefficient of the elastic body is controlled by the adjustable mechanism of the elastic coefficient which receives the detection signal of the temperature sensor. 10. The wet processing device according to any one of claims 5 to 9, wherein the adjustable mechanism of the above-mentioned elastic coefficient has a gap sensor for detecting the gap between the cleaning assembly and the surface of the object to be cleaned, The elastic coefficient of the elastic body is controlled by the adjustable mechanism of the elastic coefficient to which the detection signal of the gap sensor is input. 11. The wet processing device according to any one of claims 5 to 10, wherein the adjustable mechanism of the above-mentioned elastic coefficient has an object detection sensor for detecting the presence or absence of the above-mentioned object to be cleaned, The elastic coefficient of the above-mentioned elastic body is controlled by the adjustable mechanism of the above-mentioned elastic coefficient which is input with the detection signal of the object sensor to be cleaned. 12. The wet processing apparatus according to any one of claims 1 to 11, wherein the cleaning unit has a stopper that operates when a gap between the cleaning unit and the surface of the object to be cleaned is smaller than a predetermined gap. 13. The wet processing apparatus according to any one of claims 1 to 12, wherein the cleaning unit has a pressure pump for pressurizing and supplying the cleaning fluid supplied to the supply port, and Either one of the suction pumps or both of the suction pumps for suctioning the cleaning fluid discharged from the discharge port.

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