CN1743495B - Organic matter vaporization plating device - Google Patents
Organic matter vaporization plating device Download PDFInfo
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- CN1743495B CN1743495B CN200510096608XA CN200510096608A CN1743495B CN 1743495 B CN1743495 B CN 1743495B CN 200510096608X A CN200510096608X A CN 200510096608XA CN 200510096608 A CN200510096608 A CN 200510096608A CN 1743495 B CN1743495 B CN 1743495B
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- C—CHEMISTRY; METALLURGY
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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Abstract
一种有机物蒸镀装置,以将衬底大致垂直竖起的状态蒸镀有机物,形成有机薄膜,可适用于大型衬底,且可形成均匀厚度的有机薄膜。本发明的有机物蒸镀装置具有:腔,其构成壳体并且使衬底维持在相对于地面成70°~110°的角度;有机物存储部,其由接收向上述衬底上蒸镀的有机物的至少一个有机物存储位置构成;有机物喷嘴部,其喷射向上述衬底上蒸镀的有机物;连接线路,其将上述有机物喷嘴部和有机物存储部连接;运送装置,其可使上述有机物存储部、有机物喷嘴部及连接线中的至少上述有机物喷嘴沿垂直方向移动。
An organic matter evaporation device, which vapor-deposits organic matter in a state where the substrate is roughly vertically erected to form an organic thin film, is applicable to large substrates, and can form an organic thin film with a uniform thickness. The organic substance vapor deposition device of the present invention has: a cavity, which constitutes a housing and maintains the substrate at an angle of 70° to 110° relative to the ground; Consists of at least one organic matter storage location; an organic matter nozzle part, which sprays the organic matter vapor-deposited on the above-mentioned substrate; a connecting line, which connects the above-mentioned organic matter nozzle part and the organic matter storage part; a conveying device, which can make the above-mentioned organic matter storage part, organic matter At least the above-mentioned organic substance nozzle among the nozzle part and the connection line moves in the vertical direction.
Description
技术领域technical field
本发明涉及用于形成有机半导体元件等有机薄膜的有机物蒸镀装置,更详细地说,涉及将衬底大致垂直地直立的状态蒸镀有机物,形成有机薄膜,可适用于大型衬底,可形成均匀厚度的有机薄膜的有机物蒸镀装置。The present invention relates to an organic material vapor deposition device for forming organic thin films such as organic semiconductor elements. Organic vapor deposition device for organic thin film with uniform thickness.
背景技术Background technique
通常,含有有机电场发光元件(OLED、Organic light Emitting Device)等的有机半导体元件的有机薄膜在如下方法中有很大不同,即,使低分子有机物质自真空中蒸发而形成有机薄膜的方法,和将高分子有机物质溶解于溶剂后,使用旋涂(spin coating)、浸镀(dip coating)、微阻镀敷(ダケタ一ブレ一ティ ング)、喷墨印刷等形成有机薄膜的方法。In general, organic thin films of organic semiconductor devices including organic electroluminescent devices (OLED, Organic light Emitting Device) etc. are largely different in the method of evaporating low-molecular organic substances from vacuum to form organic thin films, And a method of dissolving a high molecular weight organic substance in a solvent, using spin coating, dip coating, micro-resist plating, inkjet printing, etc. to form an organic thin film.
在由上述方法在真空下制造由低分子有机物质构成的薄膜时,将具有要形成的形状的开口部的障板图案(shadow mask pattern)排列在衬底之前,通过在上述衬底上蒸镀有机物质,在上述衬底上制造有机薄膜。When a thin film made of a low-molecular organic substance is produced under vacuum by the above-mentioned method, a shadow mask pattern (shadow mask pattern) having an opening of a shape to be formed is arranged in front of the substrate, and the film is evaporated on the substrate Organic substances, organic thin films are fabricated on the above-mentioned substrates.
作为由上述的低分子有机物质构成的有机薄膜的制造方法,具有使用点型有机物蒸镀源的方法,和使用线型有机物蒸镀源的方法等。As a method for producing an organic thin film composed of the above-mentioned low-molecular organic substance, there are methods using a point-type organic substance vapor deposition source, a method using a line-type organic substance vapor deposition source, and the like.
但是,在使用上述这样的点型或线型有机源物蒸镀源在大型衬底上形成有机薄膜时,上述衬底和蒸发源之间的距离同时增加,上述衬底和蒸发源之间的距离的增加成为形成于上述衬底上的有机薄膜的均匀性降低的原因。But, when using above-mentioned such point-type or line-type organic source thing evaporation source to form organic thin film on large-scale substrate, the distance between above-mentioned substrate and evaporation source increases simultaneously, the distance between above-mentioned substrate and evaporation source An increase in the distance causes a decrease in the uniformity of the organic thin film formed on the above-mentioned substrate.
另外,当上述衬底和蒸发源之间的距离增加时,从上述蒸发源蒸发的有机物在上述衬底之外的真空腔中蒸镀,使有机物的损失增大,考虑到上述有机物为高价,则存在制造成本增大的问题。In addition, when the distance between the above-mentioned substrate and the evaporation source increases, the organic matter evaporated from the above-mentioned evaporation source is evaporated in a vacuum chamber outside the above-mentioned substrate, so that the loss of the organic matter increases. Considering that the above-mentioned organic matter is expensive, Then, there is a problem that the manufacturing cost increases.
另外,为确保有机薄膜的均匀性,上述障板图案和蒸发源构成规定的角度,可形成有机薄膜。此时,在上述障板图案和蒸发源构成规定角度的情况下,存在如下问题,即,产生由上述障板图案引起的影效果,难以得到希望形状的有机薄膜。In addition, in order to ensure the uniformity of the organic thin film, the above-mentioned mask pattern and the evaporation source form a predetermined angle, and the organic thin film can be formed. At this time, when the mask pattern and the evaporation source form a predetermined angle, there is a problem that a shadow effect caused by the mask pattern occurs, and it is difficult to obtain an organic thin film having a desired shape.
将蒸发源和喷嘴一体化,则存在如下问题,即,由于热而可发生由基板及掩模图案的热造成的变形。When the evaporation source and the nozzle are integrated, there is a problem that deformation due to heat of the substrate and mask pattern may occur due to heat.
另外,在大型衬底的情况下,存在由于衬底的垂下现象,从而使衬底的中央部和边缘部的薄膜的均匀性不同的问题。In addition, in the case of a large substrate, there is a problem that the uniformity of the thin film differs between the center portion and the edge portion of the substrate due to the sagging phenomenon of the substrate.
现有的有机物蒸镀装置为进行有机物的均匀蒸镀,而采用移动衬底的方式,但在这种衬底移动时,存在使腔的大小变得非常大的问题。Conventional organic vapor deposition devices employ a method of moving the substrate in order to uniformly vapor-deposit organic matter, but there is a problem that the size of the chamber becomes very large when the substrate is moved.
在现有有机物蒸镀装置的情况下,在使用上述有机物蒸镀装置时,在各构成要素的间隙中进入有机物粒子,产生有机物的泄漏。若由于这样的有机物的泄漏而污染上述加热器,则存在上述加热器会发生短路的问题。In the case of the conventional organic substance vapor deposition apparatus, when the above-mentioned organic substance vapor deposition apparatus is used, organic substance particles enter the gaps between the components, and leakage of the organic substance occurs. If the heater is contaminated by leakage of such organic substances, there is a problem that the heater may be short-circuited.
在上述加热器发生短路而切换上述加热器时,由于上述加热器与上述有机物蒸镀源构成一体,故存在切换的困难性,另外,还存在切换操作时间长的问题。When the heater is short-circuited and the heater is switched, since the heater is integrated with the organic substance vapor deposition source, switching is difficult, and switching operation takes a long time.
发明内容Contents of the invention
本发明是为解决上述现有技术的问题而研发的,其目的在于提供一种有机物蒸镀装置,其在将衬底大致垂直竖起的状态下蒸镀有机物,形成有机薄膜,可适用于大型衬底,并且可形成均匀厚度的有机薄膜。The present invention is developed to solve the above-mentioned problems of the prior art, and its purpose is to provide an organic substance evaporation device, which can vapor-deposit organic substances in a state where the substrate is erected approximately vertically to form an organic thin film, which can be applied to large-scale substrate, and can form an organic film of uniform thickness.
本发明另一目的在于提供一种有机物蒸镀装置,其在将衬底大致垂直竖起的状态下蒸镀有机物,形成有机薄膜,可适用于大型衬底,并且可形成均匀厚度的有机薄膜,将有机物存储部和有机物喷嘴分离,使衬底及掩模图案的变形最小化。Another object of the present invention is to provide an organic substance evaporation device, which vapor-deposits organic substances in a state where the substrate is roughly vertically erected to form an organic thin film, which is applicable to large substrates and can form an organic thin film with a uniform thickness. Separation of the organic matter storage part and the organic matter nozzle minimizes deformation of the substrate and mask pattern.
本发明其他目的在于提供一种有机物蒸镀装置,其具有可独立分离的加热器和与防溅板一体化的喷嘴部。Another object of the present invention is to provide an organic substance vapor deposition apparatus having a heater that can be separated independently and a nozzle unit integrated with a splash guard.
为实现上述目的,本发明的有机物蒸镀装置具有:腔,其构成壳体,将衬底维持在相对于地面成70°~110°的角度;有机物蒸镀源,其由有机物存储部、有机物引导路、加热器、内部热反射板、外部冷却板及有机物喷嘴构成,用于在所述衬底上蒸镀有机物而形成有机薄膜;有机物蒸镀源运送装置,其可使所述有机物蒸镀源沿垂直方向移动。In order to achieve the above object, the organic matter vapor deposition device of the present invention has: a cavity, which constitutes a housing, and maintains the substrate at an angle of 70° to 110° relative to the ground; an organic matter vapor deposition source, which consists of an organic matter storage unit, an organic matter Consists of a guide path, a heater, an internal heat reflection plate, an external cooling plate, and an organic nozzle, and is used to vapor-deposit organic matter on the substrate to form an organic thin film; organic matter evaporation source conveying device, which can make the organic matter vapor-deposit The source moves vertically.
理想的是,将所述有机物存储部划分成多个单元。Ideally, the organic matter storage unit is divided into a plurality of units.
理想的是,所述有机物引导路是从所述有机物存储部蒸发的有机物粒子的移动路径。Preferably, the organic matter guide path is a movement path of organic matter particles evaporated from the organic matter storage unit.
理想的是,所述有机物引导路使有机物粒子的最终移动方向维持相对于地面成-20°~20°的角度。Preferably, the organic matter guide path maintains the final moving direction of the organic matter particles at an angle of -20° to 20° with respect to the ground.
理想的是,所述加热器设于有机物存储部及有机物引导路的外部,加热所述有机物存储部及有机物引导路。Preferably, the heater is provided outside the organic matter storage portion and the organic matter guide path, and heats the organic matter storage portion and the organic matter guide path.
理想的是,所述内部热反射板比所述加热器靠外部设置。Desirably, the internal heat reflective plate is located on the outside of the heater.
理想的是,所述外部冷却板位于所述内部热反射板的外部,防止所述有机物蒸发部内部的热传递到外部,所述外部冷却板优选使用制冷剂冷却外部热反射板。Ideally, the external cooling plate is located outside the internal heat reflecting plate to prevent the heat inside the organic matter evaporating part from being transferred to the outside, and the external cooling plate preferably uses a refrigerant to cool the external heat reflecting plate.
理想的是,所述有机物蒸镀源还具有位于所述有机物喷嘴部的有机物喷射方向的前端,测定在所述衬底上蒸镀的有机物的蒸镀率及蒸镀厚度的测定传感器。Preferably, the organic substance vapor deposition source further includes a measurement sensor positioned at a front end of the organic substance nozzle portion in an organic substance jetting direction to measure a vapor deposition rate and a vapor deposition thickness of the organic substance vapor-deposited on the substrate.
理想的是,还具有用于在所述有机物中掺杂杂质的装置。It is desirable to also have means for doping impurities in the organic matter.
另外,本发明的有机物蒸镀装置具有:腔,其构成壳体,将衬底维持在相对于地面成70°~110°的角度;多个有机物蒸镀源,其在所述衬底上蒸镀物质形成薄膜,由蒸镀物质存储部、蒸镀物质引导路、加热所述蒸镀物质存储部及蒸镀物质引导路的加热器、形成于所述蒸镀物质存储部及蒸镀物质引导路的外部并且用于反射热的内部热反射板、设于所述内部热反射板的外部并且冷却所述内部热反射板的外部冷却板以及蒸镀物质喷嘴部构成;有机物蒸镀源运送装置,其可使上述蒸镀源沿垂直方向移动。In addition, the organic matter evaporation device of the present invention has: a cavity, which constitutes a housing, and maintains the substrate at an angle of 70° to 110° relative to the ground; a plurality of organic matter evaporation sources, which evaporate on the substrate. The coating material forms a thin film, formed in the evaporation material storage part, the evaporation material guide path, the heater for heating the evaporation material storage part and the evaporation material guide path, and formed in the evaporation material storage part and the evaporation material guide. An internal heat reflection plate for reflecting heat on the outside of the road, an external cooling plate provided outside the internal heat reflection plate and cooling the internal heat reflection plate, and an evaporation substance nozzle part; organic matter evaporation source conveying device , which can move the vapor deposition source in the vertical direction.
所述多个蒸镀源内包括相互相同的有机物,可在衬底,特别是在大型衬底上形成均匀的有机薄膜。The plurality of evaporation sources contain mutually identical organic matter, and a uniform organic thin film can be formed on a substrate, especially a large substrate.
另外,所述多个蒸镀源优选由第一蒸镀源及第二蒸镀源构成,更加理想的是,所述第一蒸镀源为衬底上的薄膜的原材料蒸镀源,所述第二蒸镀源为用于在所述薄膜中含有改善所述薄膜的特性用的杂质的杂质蒸镀源。In addition, the plurality of evaporation sources are preferably composed of a first evaporation source and a second evaporation source, and more ideally, the first evaporation source is a raw material evaporation source for a thin film on a substrate, and the The second vapor deposition source is an impurity vapor deposition source for containing impurities in the thin film for improving the characteristics of the thin film.
所述多个不同的有机物蒸镀源优选可调节喷射角度。Preferably, the spray angles of the multiple different organic matter evaporation sources can be adjusted.
另外,本发明的有机物蒸镀装置包括:腔,其构成壳体并且支承衬底;至少一个有机物蒸镀源,其具有存储有机物并且局部开口的有机物存储部、与所述有机物存储部开口的部分连接而喷射有机物的喷嘴部、覆盖所述有机物存储部的形态的外壳、介于所述有机物存储部和外壳之间的加热器部。In addition, the organic matter evaporation device of the present invention includes: a chamber that constitutes a housing and supports a substrate; at least one organic matter evaporation source that has an organic matter storage portion that stores organic matter and is partially opened, and a portion that is open to the organic matter storage portion A nozzle unit for spraying organic substances, a casing covering the organic substance storage unit, and a heater unit interposed between the organic substance storage unit and the casing are connected.
还可以具有可使所述有机物蒸镀源沿垂直方向移动的有机物蒸镀源运送装置。An organic substance vapor deposition source transport device capable of vertically moving the organic substance vapor deposition source may also be provided.
理想的是,所述有机物存储部及所述喷嘴部中的至少一个由石墨(graphite)构成。Preferably, at least one of the organic substance storage unit and the nozzle unit is made of graphite.
所述喷嘴部具有:有机物喷嘴,其向所述衬底上喷射有机物粒子;防溅膜,其防止所述有机物存储部的有机物飞溅。The nozzle unit includes: an organic substance nozzle that sprays organic substance particles onto the substrate; and a splash prevention film that prevents the organic substance in the organic substance storage unit from being splashed.
理想的是,所述加热器部具有热源的热线和防止所述热线垂下的热线支承体。Preferably, the heater unit has a heating wire of a heat source and a heating wire support that prevents the heating wire from hanging down.
所述有机物蒸镀源还可具有安装于所述外壳内壁的内部热反射板。The organic matter evaporation source may also have an internal heat reflection plate installed on the inner wall of the housing.
所述有机物蒸镀源还可具有安装于所述喷嘴部的衬底方向外部面的热遮断装置。The organic substance vapor deposition source may further include a heat blocking device attached to the substrate-direction outer surface of the nozzle portion.
所述有机物蒸镀源还可具有设于所述外壳外壁的冷却装置。The organic matter evaporation source can also have a cooling device arranged on the outer wall of the shell.
另外,本发明的有机物蒸镀装置包括:腔,其构成壳体并且支承衬底有机物蒸镀源,其具有存储有机物并且局部开口的有机物存储部、与所述有机物存储部的开口部分连接而喷射有机物的喷嘴部、覆盖所述有机物存储部的形态的外壳、介于所述有机物存储部和外壳之间的加热器部;有机物蒸镀源运送装置,其可使所述有机物蒸镀源沿垂直方向移动。In addition, the organic substance vapor deposition device of the present invention includes: a chamber, which constitutes a housing and supports a substrate organic substance vapor deposition source, has an organic substance storage part that stores organic substances and is partially opened, and is connected to the opening part of the organic substance storage part to spray The nozzle part of the organic matter, the shell covering the form of the organic matter storage part, the heater part between the organic matter storage part and the shell; the organic matter vapor deposition source conveying device, which can make the organic matter vapor deposition source vertically direction to move.
理想的是,所述加热器部具有热源的热线和防止所述热线垂下的热线支承体,由覆盖所述有机物存储部的形态的加热器通道(heater tumle1)的结构构成。Preferably, the heater unit has a heating wire of a heat source and a heating wire support for preventing the heating wire from hanging down, and is constituted by a structure covering a heater tunnel (heater tuble 1 ) in the form of the organic matter storage unit.
如上所述,根据本发明,可提供一种有机物蒸镀装置,其在将衬底大致垂直竖起的状态下蒸镀有机物,形成有机薄膜,可适用于大型衬底,且可形成均匀厚度的有机薄膜,将有机物存储部和有机物喷嘴分离,使衬底及掩模图案的变形最小化。As described above, according to the present invention, it is possible to provide an organic substance vapor deposition apparatus that vapor-deposits organic substances in a state where the substrate is erected approximately vertically to form an organic thin film, which is applicable to a large substrate and can form a uniform thickness. The organic thin film separates the organic material storage part from the organic material nozzle, and minimizes the deformation of the substrate and mask pattern.
本发明可提供一种有机物蒸镀装置,其具有可独立分离的加热器部和与防溅板一体化的喷嘴部。According to the present invention, there can be provided an organic substance vapor deposition device having an independently separable heater unit and a nozzle unit integrated with a splash guard.
如上所述,参照本发明理想的实施方式进行了说明,但只要是该技术领域的熟练的从业者,则可在不脱离本发明思想及领域的范围内对本发明进行各种修正及变更。As described above, the present invention has been described with reference to preferred embodiments, but those skilled in the art can make various modifications and changes to the present invention without departing from the spirit and scope of the present invention.
附图说明Description of drawings
图1是用于说明本发明一实施方式的有机物蒸镀装置的概略图:FIG. 1 is a schematic diagram illustrating an organic vapor deposition device according to an embodiment of the present invention:
图2a~图2b是用于说明本发明一实施方式的有机物蒸镀装置的概略图2a to 2b are schematic diagrams illustrating an organic substance vapor deposition device according to an embodiment of the present invention.
图3是用于说明本发明另一实施方式的有机物蒸镀装置的概略图:Fig. 3 is a schematic diagram for illustrating an organic vapor deposition device according to another embodiment of the present invention:
图4是用于说明本发明其他实施方式的有机物蒸镀装置的概略图;4 is a schematic diagram illustrating an organic vapor deposition device according to another embodiment of the present invention;
图5a~图5b是用于说明本发明其他实施方式的有机物蒸镀装置的图;5a to 5b are diagrams illustrating an organic substance vapor deposition device according to another embodiment of the present invention;
图6是用于说明本发明其他实施方式的有机物蒸镀装置的概略图:Fig. 6 is a schematic view illustrating an organic vapor deposition device according to another embodiment of the present invention:
图7a是用于说明本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源的纵剖面图;Fig. 7a is a longitudinal sectional view illustrating an organic matter vapor deposition source of an organic matter vapor deposition device according to another embodiment of the present invention;
图7b是本发明其他实施方式的限定于有机物蒸镀装置的有机物存储部、喷嘴部及加热器部的图示;Fig. 7b is a diagram of an organic matter storage unit, a nozzle unit and a heater unit limited to an organic matter evaporation device according to another embodiment of the present invention;
图7c是本发明其他实施方式的限定于有机物蒸镀装置的外壳的图示;Fig. 7c is a schematic diagram of an enclosure limited to an organic matter evaporation device according to another embodiment of the present invention;
图7d是本发明其他实施方式的限定于有机物蒸镀装置的冷却装置的图示。Fig. 7d is a diagram of a cooling device limited to an organic matter evaporation device according to another embodiment of the present invention.
具体实施方式Detailed ways
下面,参照附图说明本发明的实施方式。Hereinafter, embodiments of the present invention will be described with reference to the drawings.
图中同一参照符号表示相同的构成要素。In the drawings, the same reference symbols denote the same constituent elements.
图1是用于说明本发明一实施方式的有机物蒸镀装置的概略图。FIG. 1 is a schematic diagram illustrating an organic substance vapor deposition apparatus according to one embodiment of the present invention.
参照图1,本发明实施方式的有机物蒸镀装置100包括:腔110,其构成上述有机物蒸镀装置100的壳体;有机物蒸镀源120,其用于在蒸镀有机物的衬底S上喷射有机物粒子;有机物蒸镀源运送装置130,其可使上述有机物蒸镀源120沿垂直方向移动。Referring to Fig. 1, the organic matter evaporation device 100 of the embodiment of the present invention comprises: a
上述腔110使要蒸镀有机物的衬底S大致垂直,理想的是维持在与地面成70°~11O°的角度。另外,优选上述腔110为真空腔。The
上述有机物蒸镀源120包括:有机物存储部121,其接收向上述衬底110上蒸镀的有机物;有机物喷嘴部122,其将从上述有机物存储部121蒸发的有机物向上述衬底S上喷射;连接线路123,其将上述有机物存储部121及有机物喷嘴部122连接,构成上述已蒸镀的有机物的移动路径;测定装置124,其测定在上述衬底S上蒸镀的有机物的蒸镀率及有机物的厚度。The above-mentioned organic
上述有机物蒸镀源运送装置130由具有可使上述有机物蒸镀源120中的至少上述有机物喷嘴部122沿垂直方向移动的移动装置的结构构成。此时,上述有机物蒸镀源运送装置130是适于在维持在真空的上述腔110内使用的垂直运送装置,其还具有运送速度调节机构(未图示),可调节上述有机物蒸镀源120中的至少上述有机物喷嘴部122的移动速度。The organic substance vapor deposition
图中的参照符号M是决定在上述衬底S上蒸镀的有机物形状的掩模图案。Reference symbol M in the figure is a mask pattern for determining the shape of the organic substance vapor-deposited on the above-mentioned substrate S. As shown in FIG.
图2a及图2b是用于说明本发明一实施方式的有机物蒸镀装置的概略图,是限定于蒸镀有机物的衬底及有机物蒸镀源的图示。2a and 2b are schematic diagrams for explaining an organic substance vapor deposition device according to an embodiment of the present invention, and are views limited to a substrate and an organic substance vapor deposition source for vapor deposition of organic substances.
参照图2a及图2b,本发明一实施方式的有机物蒸镀装置110的有机物蒸镀源120包括:有机物存储部121,其由接受向衬底S上蒸镀的有机物的至少一个有机物存储位置121a构成;有机物喷嘴部122,其喷射向衬底S上蒸镀的有机物;连接线路123,其将上述有机物喷嘴部122和有机物存储部121连接;测定装置124,其测定蒸镀于衬底S上的有机物的蒸镀率及有机物的厚度。Referring to Fig. 2a and Fig. 2b, the organic
上述有机物存储部121由存储向上述衬底S上蒸镀的有机物的至少一个有机物存储位置121a构成。上述有机物存储部121是加热有机物存储位置121a使有机物粒子蒸发的部分,上述有机物存储部121通常位于上述腔110的内部,但本发明的有机物存储部121也可以位于上述腔11O的外部。即,上述有机物存储部121的位置是以可位于腔110的内部或外部的全部位置的方式而构成的。The organic substance storage unit 121 is composed of at least one organic substance storage location 121 a for storing the organic substance vapor-deposited on the substrate S. As shown in FIG. The above-mentioned organic matter storage part 121 is a part that heats the organic matter storage location 121a to evaporate the organic matter particles. The above-mentioned organic matter storage part 121 is usually located inside the above-mentioned
上述有机物喷嘴部122是将自上述有机物存储部121蒸发的有机物粒子喷射到上述衬底S上的部分,未作图示,其由具有防止上述有机物粒子凝结的加热器和用于使有机物粒子的喷射均匀的喷嘴的结构构成。另外,上述有机物喷嘴部122还可以是如下的隔壁(baffle)结构,即,在从上述有机物存储部121蒸发的有机物中不完全蒸发成粒子状态,而是进一步将维持由多个有机物粒子凝集的成束(cluster)形态的有机物破碎成有机物粒子状态,使喷射于上述衬底S上的有机物粒子的大小均匀。The organic substance nozzle part 122 is a part for spraying the organic substance particles evaporated from the above-mentioned organic substance storage part 121 onto the above-mentioned substrate S, not shown in the figure. The structure of the spray nozzle is uniform. In addition, the organic substance nozzle part 122 may have a baffle structure in which the organic substance evaporated from the organic substance storage part 121 is not completely evaporated into a particle state, but further maintains the agglomerated state of a plurality of organic substance particles. The organic matter in the form of a cluster is broken into the state of organic matter particles, and the size of the organic matter particles sprayed on the substrate S is made uniform.
上述连接线路123是将上述有机物存储部121和上述有机物喷嘴部122连接,将从有机物存储部121蒸发的有机物粒子运送到上述有机物喷嘴部122的部分。上述连接线路123为防止从上述有机物存储部121蒸发的有机物粒子凝结而可控制温度。另外,为使上述有机物粒子的凝结最小化,可以进行具有大于或等于两个的区域的个别控制。另外,在上述有机物存储部121位于上述腔110的外部时,将上述有机物存储部121和有机物喷嘴部122连接的连接线路123与上述腔110的外部连接。另外,上述连接线路123由于可使上述有机物喷嘴部122沿垂直方向移动,故由褶皱管这种形态构成。The connection line 123 connects the organic matter storage unit 121 and the organic matter nozzle unit 122 , and transports the organic matter particles evaporated from the organic matter storage unit 121 to the organic matter nozzle unit 122 . The temperature of the connection line 123 can be controlled to prevent condensation of organic matter particles evaporated from the organic matter storage unit 121 . In addition, in order to minimize the above-mentioned coagulation of organic particles, individual control with two or more regions may be performed. In addition, when the organic matter storage unit 121 is located outside the
上述测定装置124测定蒸镀于上述衬底S上的有机物的蒸镀率及有机物的厚度,其位于上述有机物喷嘴部122的有机物喷射方向的前端部,与上述有机物喷嘴部122一体化。上述测定装置124在为了上述衬底S上形成有机薄膜而使上述有机物喷嘴部122移动时,与上述有机物喷嘴部122一起移动,测定蒸镀于上述衬底S上的有机物的蒸镀率,控制上述有机物存储部121内的有机物蒸发量。The measuring device 124 measures the vapor deposition rate and the thickness of the organic matter deposited on the substrate S, and is located at the front end of the organic matter nozzle 122 in the direction of organic matter ejection, and is integrated with the organic matter nozzle 122 . When the above-mentioned measuring device 124 moves the above-mentioned organic substance nozzle part 122 in order to form an organic thin film on the above-mentioned substrate S, it moves together with the above-mentioned organic substance nozzle part 122 to measure the vapor deposition rate of the organic substance vapor-deposited on the above-mentioned substrate S, and control The amount of organic matter evaporated in the above-mentioned organic matter storage unit 121 .
使用上述这种有机物蒸镀装置100的有机薄膜的形成方法如下。The method of forming an organic thin film using the organic substance vapor deposition apparatus 100 described above is as follows.
首先,在上述有机物蒸镀装置100的腔110内安装衬底S,使其与地面大致垂直,优选维持在与地面成70°~11O°的角度。First, the substrate S is installed in the
其次,加热位于上述腔110的内部或外部并且由接收有机物的至少一个上述有机物存储位置构成的有机物存储部121,以有机物粒子状态蒸发上述有机物。Next, heating the organic matter storage part 121 located inside or outside the
上述已蒸发的有机物粒子经由上述有机物存储部121及有机物喷嘴部122的连接线路123向上述有机物喷嘴部122移动,经由上述有机物喷嘴部122喷射到上述衬底S上。The evaporated organic particles move to the organic nozzle unit 122 via the connection line 123 between the organic storage unit 121 and the organic nozzle unit 122 , and are sprayed onto the substrate S through the organic nozzle unit 122 .
此时,在从上述有机物存储部121蒸发的有机物中不完全蒸发成粒子状态,而是使维持由多个有机物粒子凝集的成束形态的有机物与有机物喷嘴部122的隔壁冲撞,进一步破碎成有机物粒子状态,由此,使喷射于上述衬底S上的有机物粒子的大小均匀。At this time, the organic matter evaporated from the organic matter storage part 121 is not completely evaporated into a particle state, but the organic matter maintained in a bundled form of agglomerated organic matter particles collides with the partition wall of the organic matter nozzle part 122, and is further broken into organic matter. particle state, thereby making the size of the organic particles sprayed on the substrate S uniform.
另外,上述有机物存储部121及有机物喷嘴部122的连接线路123和有机物喷嘴部122通过辅助加热器加热,以使上述已蒸发的有机物粒子不凝结。In addition, the connection line 123 between the organic matter storage unit 121 and the organic matter nozzle unit 122 and the organic matter nozzle unit 122 are heated by an auxiliary heater so that the evaporated organic matter particles are not condensed.
另外,可通过上述有机物蒸镀源运送装置130在上述有机物蒸镀源120中至少使上述有机物喷嘴部122移动,将上述有机物粒子均匀地喷射到上述衬底S上,在上述衬底S上形成均匀的有机薄膜。In addition, at least the organic nozzle part 122 can be moved in the organic
另一方面,图3是用于说明本发明其他实施方式的有机物蒸镀装置的概略图,是限定于蒸镀有机物的衬底及有机物蒸镀源的图示。On the other hand, FIG. 3 is a schematic diagram illustrating an organic substance vapor deposition apparatus according to another embodiment of the present invention, and is a diagram limited to a substrate and an organic substance vapor deposition source for vapor deposition of organic substances.
参照图3,本发明其他实施方式的有机物蒸镀装置与图1、图2a及图2b所示的有机物蒸镀装置类似。仅在上述有机物蒸镀装置的有机物蒸镀源200由多个有机物存储部210和多个有机物喷嘴部220构成的结构上不同。Referring to FIG. 3 , the organic matter evaporation device in other embodiments of the present invention is similar to the organic matter evaporation device shown in FIG. 1 , FIG. 2 a and FIG. 2 b . The only difference is that the organic substance
即,本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源200具有如下结构:多个有机物存储部210,其由接收向衬底S上蒸镀的有机物的至少一个有机物存储位置构成,位于上述有机物蒸镀装置的腔内部或外部;多个有机物喷嘴部220,其分别对应上述有机物存储部210;多个连接线路230,其将上述各有机物喷嘴部220和有机物存储部210连接;测定装置240,其设于上述各有机物喷嘴部220的有机物喷射方向的前端,测定蒸镀于上述衬底S上的有机物的蒸镀率。That is, the organic
上述这种有机物蒸镀装置的有机物蒸镀源200由于具有多个有机物存储部21O及多个有机物喷嘴部220,故即使不具有用于使上述有机物喷嘴部220移动的移动装置,也可以在大致垂直竖起的大型衬底上蒸镀有机物,在具有上述移动装置的情况下可更均匀地蒸镀有机物。The organic matter
图4是用于说明本发明其他实施方式的有机物蒸镀装置的概略图,是限定于蒸镀有机物的衬底及有机物蒸镀源的图示。4 is a schematic diagram illustrating an organic substance vapor deposition apparatus according to another embodiment of the present invention, and is a diagram limited to a substrate for vapor deposition of organic substances and an organic substance vapor deposition source.
参照图4,本发明其他实施方式的有机物蒸镀装置与图1、图2a及图2b所示的有机物蒸镀装置类似。仅在上述有机物蒸镀装置的有机物蒸镀源300由至少一个有机物存储部310和与上述有机物存储部310中任一个对应的多个有机物喷嘴部320构成的结构上不同。Referring to FIG. 4 , the organic matter evaporation device in other embodiments of the present invention is similar to the organic matter evaporation device shown in FIG. 1 , FIG. 2 a and FIG. 2 b . The only difference is that the organic substance
即,本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源300具有如下结构:有机物存储部,其由接受向衬底S蒸镀的有机物的至少一个有机物存储位置构成,位于上述有机物蒸镀装置的内部或外部;多个有机物喷嘴部,其向上述衬底上喷射有机物粒子;多个连接线路,其将上述各有机物喷嘴部和有机物存储部连接;测定装置,其设于上述各有机物喷嘴部的有机物喷射方向的前端,测定蒸镀于衬底上的有机物的蒸镀率。That is, the organic substance
上述这种有机物蒸镀装置在一个有机物存储位置对应大于或等于两个的有机物喷嘴。The above-mentioned organic matter evaporation device corresponds to more than or equal to two organic matter nozzles in one organic matter storage position.
即,在一个有机物存储位置对应多个有机物喷嘴,在上述大致垂直竖起的衬底上蒸镀有机物,形成有机薄膜。That is, one organic substance storage position corresponds to a plurality of organic substance nozzles, and the organic substance is vapor-deposited on the substantially vertically erected substrate to form an organic thin film.
如上所述,图1~图4所示这样的本发明实施方式的有机物蒸镀装置以垂直竖起的状态喷射有机物粒子,形成有机薄膜,由此,在使用大型衬底的情况下,防止衬底的下垂形状,因此,可适用于大型衬底。As described above, the organic vapor deposition device according to the embodiment of the present invention shown in FIGS. 1 to 4 sprays organic particles in a vertically erected state to form an organic thin film. The drooping shape of the bottom, therefore, can be applied to large substrates.
另外,可将有机物存储部和有机物喷嘴部分离,防止上述衬底及掩模图案的热造成的变形,可在上述衬底上形成有机物的粒子分布均:匀的有机薄膜。In addition, the organic substance storage part and the organic substance nozzle part can be separated, the deformation of the substrate and the mask pattern due to heat can be prevented, and an organic thin film with uniform particle distribution of the organic substance can be formed on the substrate.
使用存储于上述多个有机物存储部的有机物不同的物质,可以进行用于改善上述有机薄膜特性的杂质的注入。Impurities for improving the characteristics of the organic thin film can be implanted using substances different from the organic substances stored in the plurality of organic substance storage parts.
作为用于形成上述有机薄膜的掩模,在使用现有的精密金属掩模(finemetal mask)的目前趋势中,由于有机物与上述衬底S大致垂直地喷射,故具有可确保均匀的阶梯式覆盖(ステップカバリッジ)的优点。As a mask for forming the above-mentioned organic thin film, in the current trend of using the existing fine metal mask (finemetal mask), since the organic matter is sprayed approximately perpendicular to the above-mentioned substrate S, it has the ability to ensure uniform step coverage. (Step Kabari ッ リ ッ ジ) advantages.
由于通过上述有机物蒸镀源运送装置130移动上述有机物蒸镀源120、200、300,在上述衬底S上蒸镀有机物,故与现有的没有有机物蒸镀源运送装置,而使用使衬底S移动的有机物蒸镀装置100蒸镀有机物的情况相比,可将腔11O的大小缩小到约75%以内。Since the above-mentioned organic
另一方面,图5a及图5b是用于说明本发明其他实施方式的有机物蒸镀装置的图,图5a是本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源的纵剖面图,图5b是本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源的横剖面图。On the other hand, FIG. 5 a and FIG. 5 b are diagrams for explaining an organic matter vapor deposition device according to another embodiment of the present invention, and FIG. 5 a is a longitudinal sectional view of an organic matter vapor deposition source of an organic matter vapor deposition device according to another embodiment of the present invention, 5b is a cross-sectional view of an organic substance vapor deposition source of an organic substance vapor deposition device according to another embodiment of the present invention.
参照图5a及图5b,本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源400由有机物存储部410、有机物引导路420、加热器430、内部热反射板440、外部冷却板450、有机物喷嘴部460及测定装置470构成。5a and 5b, the organic
上述有机物存储部410是存储形成于上述衬底S上的有机薄膜的材料的有机物的部分,优选由至少划分成一个单元410a的坩埚构成。The organic
上述有机物引导路420用于将从上述有机物存储部410蒸发的有机物粒子运送到上述有机物喷嘴部460,并且用于决定上述有机物粒子的移动路径。进一步详细地说明,为从上述有机物存储部410向上蒸发上述有机物粒子,在上述大致垂直竖起的衬底S上蒸镀有机物,而必须使上述有机物粒子的最终移动路径为大致水平方向,因此,必须使上述有机物引导路420的末端维持在与地面成-20°~20°的角度。即,引导上述有机物粒子的最终移动路径,使其维持在与地面成-20°~20°的角度。另外,上述有机物引导路420的中间部分以规定的角度倾斜地形成,从上述有机物存储部410蒸发的有机物中的一部分成束(cluster)形态的有机物与引导路的内壁冲撞,破碎成有机物粒子状态,由此,上述成束形态的有机物顺畅地在上述有机物引导路420内部均等地混合,防止有机物在上述衬底S上凝固而进行蒸镀。The organic
上述加热器430设于上述有机物存储部41O及有机物引导路420的外部,用于加热上述有机物存储部410及有机物引导路420。即,加热上述有机物存储部41O,以有机物的粒子状态蒸发上述有机物,不使已蒸发的有机物粒子在上述有机物引导路420的内部凝结而进行加热。The
上述内部热反射板440设于上述加热器430的外部,用于增加上述有机物蒸镀源400的热效率,其多段地构成,以能够吸收上述有机物蒸镀源400内部的热容量。The internal
上述外部冷却板450位于上述内部热反射板440的外部,防止上述有机物蒸镀源400内部的热传递到外部。上述外部冷却板450使用制冷剂冷却内部热反射板440。The
上述有机物喷嘴部460具有如下作用,即,将从上述有机物存储部410蒸发并经由上述有机物引导路420而流入的有机物粒子向大致垂直竖起的衬底S上喷射,决定上述有机粒子在上述衬底S上的蒸镀、分布的形态。另外,上述有机物喷嘴部460优选为在喷射有机物粒子时可调节喷射角度的形态。用于可通过开口上述有机物喷嘴部460的形态来调节喷射有机物粒子的状态,故可控制上述有机物存储位置410内的有机物可均匀地蒸发。The organic
上述测定装置410具有测定蒸镀于相对地面以70°~1lO°的角竖起的衬底S上的有机物的蒸镀率及厚度的作用。另外,上述测定装置410位于上述有机物喷嘴部460的有机物喷射方向的前端部,与上述有机物喷嘴部460一体化。The measuring
另一方面,如图5b所示,上述有机物存储部410被划分成至少一个单元410a,在各单元410a中存储有机物,另外,加热器430均等地分布于上述有机物存储部410的周边。On the other hand, as shown in FIG. 5 b , the organic
其在使有机物存储部410的上述有机物蒸发的情况下,在上述有机物存储部410由一个单元构成时,由于上述有机物存储部4lO内部的温度分布差而产生位置造成的有机物蒸发率的差。这样的位置造成的蒸发率的差使杂质的均匀注入以及有机薄膜的均匀性降低,但可通过将上述有机物存储部410划分成多个单元410a,使上述有机物存储部410内的有机物蒸发率均匀。In the case of evaporating the organic matter in the organic
使用具有上述的本发明其他实施方式的有机物蒸镀源的有机物蒸镀装置的有机薄膜的形成方法如下。A method of forming an organic thin film using an organic substance vapor deposition apparatus having an organic substance vapor deposition source according to another embodiment of the present invention described above is as follows.
首先,在上述有机物蒸镀装置100的腔内安装衬底S,使其与地面维持大致垂直,理想的是维持与地面成70°~11O°的角度。First, the substrate S is installed in the chamber of the above-mentioned organic substance vapor deposition apparatus 100 so that it is kept approximately perpendicular to the ground, preferably at an angle of 70° to 110° with the ground.
其次,通过上述加热器430加热接受上述有机物蒸镀源400的有机物的上述有机物存储部41O。Next, the organic substance storage unit 41O that receives the organic substance from the organic substance
此时,通过上述加热器430将收纳于上述有机物存储部41O的坩埚内的各单元的有机物蒸发成有机物粒子状态。At this time, the organic matter stored in each unit in the crucible of the organic matter storage unit 41O is evaporated into a state of organic matter particles by the
上述已蒸发的有机物粒子经由上述有机物引导路420流入上述有机物喷嘴部460。此时,上述有机物粒子的移动路径通过上述有机物引导路420的形状而决定。由于上述有机物引导路420的末端维持与地面成-20°~20°的角度,故上述有机物蒸镀源400内的上述有机物粒子的最终移动路径维持在与地面成-20°~20°的角度。另外,上述有机物引导路420使在从上述有机物存储部410蒸发的有机物中,不完全蒸发成粒子状态,而是使维持由多个有机物粒子凝集的成束形态的有机物与上述有机物引导路420的内壁冲撞,破碎成有机物粒子状态,由此,使喷射到上述衬底S上的有机物粒子的大小均匀。另外,上述有机物引导路420外部的加热器430在上述有机物引导路420内不凝结上述已蒸发的有机物粒子。The vaporized organic particles flow into the
流入上述有机物喷嘴部460的有机物粒子经由上述有机物喷嘴部460在上述衬底S上蒸镀,形成有机薄膜。此时,通过上述有机物蒸镀源运送装置130使上述有机物蒸镀源400沿垂直方向移动,在维持与上述地面成70°~100°角度的衬底S上蒸镀有机物粒子,形成有机薄膜。另外,上述有机物粒子由于其最终移动路径维持在与地面成-20°~20°的角度,故上述有机物粒子经由上述有机物喷嘴部460喷射到上述衬底S上时,上述有机物粒子以与地面成-20°~20°的角度喷射。另外,在上述有机物粒子在上述衬底S上蒸镀时,通过开口上述有机物喷嘴部460的形态来调节蒸镀于上述衬底S上的有机物粒子的形态。The organic particles flowing into the
另一方面,在上述有机物喷嘴部460的有机物喷射方向上设于前端部的上述测定装置470在向上述衬底S上蒸镀上述有机物期间,测定蒸镀于上述衬底S上的有机物的蒸镀率及有机物的蒸镀厚度。因此,通过使用上述测定装置470控制形成有机薄膜期间的有机物粒子的蒸镀率及有机物的蒸镀厚度,能够实现有机薄膜均匀厚度的再现性。On the other hand, the measuring
图6是用于说明本发明其他实施方式的有机物蒸镀装置的概略图。FIG. 6 is a schematic diagram illustrating an organic substance vapor deposition apparatus according to another embodiment of the present invention.
参照图6,本发明其他实施方式的有机物蒸镀装置具有如下结构:如图1所示,具有多个有机物蒸镀源120,并且具有用于使上述各有机物蒸镀源垂直移动的有机物蒸镀源运送装置。With reference to Fig. 6, the organic matter vapor deposition device of other embodiment of the present invention has following structure: As shown in Fig. source transporter.
作为一例,上述不同的多个蒸镀源可由第一有机物蒸镀源400A及第二有机物蒸镀源400B构成,上述第一有机物蒸镀源400A及第二有机物蒸镀源400B内包相同的有机物,相互分开规定的间隔进行移动,可在衬底上蒸镀均匀的有机薄膜。特别是在使用大型衬底蒸镀有机薄膜时是有利的。As an example, the above-mentioned multiple different evaporation sources may be composed of a first organic material evaporation source 400A and a second organic material evaporation source 400B, and the first organic material evaporation source 400A and the second organic material evaporation source 400B contain the same organic matter, By moving at predetermined intervals from each other, a uniform organic thin film can be deposited on the substrate. It is advantageous especially when using a large substrate to vapor-deposit an organic thin film.
或者,上述不同的多个有机物蒸镀源由第一有机物蒸镀源400A及第二有机物蒸镀源400B构成,上述第一有机物蒸镀源400A及第二有机物蒸镀源400B中的任一个有机物蒸镀源,例如第一有机物蒸镀源400A是在上述衬底S上喷射作为有机薄膜原材料的有机物的有机物蒸镀源,第二有机物蒸镀源400B是在上述有机薄膜中含有用于改善上述有机薄膜特性的杂质的有机物蒸镀源。Alternatively, the above-mentioned multiple different organic matter evaporation sources are composed of the first organic matter evaporation source 400A and the second organic matter evaporation source 400B, and any one of the above-mentioned first organic matter evaporation source 400A and the second organic matter evaporation source 400B Evaporation sources, for example, the first organic matter evaporation source 400A is an organic matter evaporation source that sprays organic matter as an organic thin film raw material on the above-mentioned substrate S, and the second organic matter evaporation source 400B is used to improve the above-mentioned organic thin film. Organic vapor deposition source of impurities characteristic of organic thin films.
此时,上述第一有机物蒸镀源400A及第二有机物蒸镀源400B为了在有机薄膜中含有有机物,而可调节喷射角度,以在上述衬底S上蒸镀物质之前,在一定的区域内混合。At this time, in order to contain organic substances in the organic thin film, the above-mentioned first organic substance evaporation source 400A and second organic substance evaporation source 400B can adjust the spraying angle so that before evaporating substances on the above-mentioned substrate S, within a certain area mix.
另外,通过在上述第一有机物蒸镀源400A及第二有机物蒸镀源400B的喷嘴的喷射方向前端设置可测定各有机物的蒸镀率及蒸镀厚度的测定装置,可在上述衬底S上形成含有杂质的有机薄膜期间,控制蒸镀率及有机物的厚度,可进行有机薄膜中含有的杂质含量的控制。In addition, by installing a measuring device capable of measuring the vapor deposition rate and the vapor deposition thickness of each organic substance at the front end of the spraying direction of the nozzles of the first organic substance vapor deposition source 400A and the second organic substance vapor deposition source 400B, the substrate S can be During the formation of the organic thin film containing impurities, the deposition rate and the thickness of the organic matter can be controlled to control the content of impurities contained in the organic thin film.
如上所述,如图5a及图5b和图6所示,本发明其他实施方式的有机物蒸镀装置100防止经由上述内部热反射板400及外部冷却板450将热放出到除上述有机物喷嘴部460之外的外部,由此可使对上述衬底S及掩模图案M的热影响最小化。即,可防止热造成的上述衬底S及掩模图案M的变形。As mentioned above, as shown in FIG. 5a, FIG. 5b and FIG. 6, the organic matter vapor deposition apparatus 100 according to other embodiments of the present invention prevents heat from being released to other than the organic
图7a~图7d是用于说明本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源的图,图7a是本发明其他实施方式的有机物蒸镀装置的有机物蒸镀源的纵剖面图,图7b是限定于本发明其他实施方式的有机物蒸镀装置的有机物存储部、喷嘴部及加热器部的图示,图7c是限定于本发明其他实施方式的有机物蒸镀装置的外壳的图示,图7d是限定于本发明其他实施方式的有机物蒸镀装置的冷却装置的图示。Fig. 7 a~Fig. 7 d are the figures for explaining the organic substance vapor deposition source of the organic substance vapor deposition device of other embodiment of the present invention, and Fig. 7 a is the vertical sectional view of the organic matter vapor deposition source of the organic substance vapor deposition device of other embodiment of the present invention, Fig. 7b is a schematic view of the organic matter storage part, nozzle part and heater part of the organic matter evaporation device limited to other embodiments of the present invention, and Fig. 7c is a schematic view of the shell of the organic matter vapor deposition device limited to other embodiments of the present invention , FIG. 7d is a diagram of a cooling device limited to an organic vapor deposition device according to another embodiment of the present invention.
参照图7a~图7d,本发明一实施方式的有机物蒸镀装置lO0的上述有机物蒸镀源500具有如下结构:有机物存储部510,其存储有机物,并且局部开口;喷嘴部520,其与上述有机物存储部510的开口的部分连接,喷射有机物;外壳530,其为覆盖上述有机物存储部5lO的形态;加热器部540,其介于上述有机物存储部510和上述外壳530之间。Referring to FIGS. 7a to 7d, the above-mentioned organic matter evaporation source 500 of the organic matter evaporation device 100 according to an embodiment of the present invention has the following structure: an organic
上述有机物存储部510是存储要在上述衬底S上蒸镀的有机薄膜的原材料的有机物的部分,通常由坩埚构成。另外,上述有机物存储部510可由热传导性优良的石墨(graphite)或其等价物构成,但在本发明中不限于该材质。The organic
上述喷嘴部520具有如下作用,即,向大致垂直竖起的衬底S上喷射从上述有机物存储部310蒸发的有机物粒子,决定上述有机物粒子在上述衬底S上的蒸镀、分布的形态。此时,上述喷嘴部520构成将有机物喷嘴521与防溅膜525一体化的形态,其中,有机物喷嘴521将从上述有机物存储部51O蒸发的有机物粒子喷射到上述衬底S上,防溅膜525防止有机物不从上述有机物存储部510蒸发成有机物粒子而是以成束(cluster)形态飞溅的情况。另外,上述喷嘴部520可由热传导性优良的石墨(graphite)或其等价物构成,但在本发明中,不限于该材质。另外,由于可通过开口上述喷嘴部520的形态来调节有机物粒子的喷射状态,故可控制上述有机物存储部51O内的有机物均匀地蒸发。The
上述外壳(housing)530构成覆盖上述有机物存储部510的形态,将上述有机物存储部510和外部环境隔离。The
上述加热器部540介于上述有机物存储部510和上述外壳530之间,用于可蒸发地加热上述有机物存储部510的有机物。此时,上述加热器部540包括可蒸发上述有机物的热源的热线541,和由一种加强筋(Rib)构成的防止所述热线541垂下而进行支撑的热线支承体545。换句话说,上述加热器部540形成由热线541和热线支承体545构成的一种加热器通道(heaterrunne1)的结构,上述加热器通道(heater runne1)覆盖上述有机物存储部51O。因此,上述加热器部540由于在上述有机物蒸镀源500不与其他构成要素,特别是上述有机物存储部510一体化,或安装于其他构成要素上,故可独立地分离及更换。The
另外,上述有机物蒸镀源500还可以具有安装于上述外壳530内壁的内部热反射板550。上述内部热反射板550反射自上述加热器部540产生的热,增加上述加热器部540的热交换。In addition, the organic substance evaporation source 500 may further have an internal heat reflection plate 550 installed on the inner wall of the
上述有机物蒸镀源500还可以具有沿上述喷嘴部520的衬底S方向安装于外部面上的热遮断装置560。上述热遮断装置560防止热经由上述喷嘴部520放出热而影响上述衬底S的情况。The organic substance vapor deposition source 500 may further include a
上述有机物蒸镀源500还可以具有设于上述外壳530外壁的冷却装置570。上述冷却装置570防止自上述加热器部540产生的热经由上述外壳530排出到外部的情况。The organic substance evaporation source 500 may also have a
另一方面,上述有机物蒸镀源500还可以具有未图示的、用于测定蒸镀在上述衬底S上的有机物的蒸镀率及有机物的蒸镀厚度的测定装置。On the other hand, the organic substance vapor deposition source 500 may include a measuring device for measuring the vapor deposition rate and the vapor deposition thickness of the organic substance vapor-deposited on the substrate S, not shown.
如上所述,图7a~图7d所示的上述有机物蒸镀装置的有机物蒸镀源500,将上述有机物存储部510通过加热器通道(heater runne1)结构的上述加热器部540,在上述有机物存储部5lO的开口部分插入喷嘴部520,并且将上述加热器部540插入上述外壳530中,构成上述有机物存储部510、喷嘴部520及加热器部540容易分解组装的结构。As mentioned above, the organic matter evaporation source 500 of the above-mentioned organic matter evaporation device shown in Fig. 7a~Fig. The
另一方面,使用具有上述这种有机物蒸镀源500的有机物蒸镀装置100的有机薄膜的形成方法如下。On the other hand, the method of forming an organic thin film using the organic substance vapor deposition apparatus 100 having the above-mentioned organic substance vapor deposition source 500 is as follows.
首先,在上述有机物蒸镀装置100的腔110内安装衬底,使其与地面大致垂直,理想的是维持在与地面构成70°~110°的角度。First, the substrate is installed in the
其次,通过上述加热器部540加热接受要向上述有机物蒸镀源500的上述衬底S上蒸镀的有机物的有机物存储部510。此时,通过上述加热器部540加热存储于上述有机物存储部5 10中的有机物,以有机物粒子状态进行蒸发。Next, the
上述已蒸发的有机物粒子流入上述喷嘴520中,经由上述喷嘴部520喷射,蒸镀于上述衬底S上。此时,蒸镀于上述衬底S上的有机物粒子通过上述掩模图案M而决定其蒸镀形状。The evaporated organic particles flow into the
此时,可通过上述运送装置130运送上述有机物蒸镀源500,在上述衬底S上蒸镀有机物,可实施更均匀的有机物的蒸镀。At this time, the organic substance vapor deposition source 500 can be transported by the
另一方面,上述喷嘴部520由于将有机物喷嘴52l和防溅板525一体化,故不从上述有机物存储部51O蒸发成有机物粒子,可以防止飞溅成束形态的有机物。On the other hand, since the
上述喷嘴部520由石墨(graphite)那样的热传导率优良的物质构成,即使不设置其他的加热装置,也可以防止经由上述喷嘴部520而喷射的有机物粒子的凝结。The
另外,上述有机物粒子在上述衬底S上蒸镀时,通过开口上述有机物喷嘴部520的有机物喷嘴321的形态来调节蒸镀于上述衬底S上的有机物粒子的形态。In addition, when the organic material particles are deposited on the substrate S, the form of the organic material particles deposited on the substrate S is adjusted by the form of the organic material nozzle 321 opening the organic
另一方面,由于有机物蒸镀源还具有测定装置(未图示),从而能够在上述衬底S上蒸镀上述有机物期间,测定蒸镀于上述衬底S上的有机物的蒸镀率及有机物的蒸镀厚度。因此,在使用上述测定装置580形成有机薄膜时,通过控制有机物粒子的蒸镀率及有机物蒸镀厚度,可实现有机薄膜均匀厚度的再现性。On the other hand, since the organic matter vapor deposition source also has a measuring device (not shown), it is possible to measure the vapor deposition rate of the organic matter vapor-deposited on the above-mentioned substrate S and the organic matter vapor deposition rate during the vapor-deposition of the above-mentioned organic matter on the above-mentioned substrate S. The evaporation thickness. Therefore, when forming an organic thin film using the measuring device 580 described above, by controlling the vapor deposition rate of the organic substance particles and the vapor deposition thickness of the organic substance, reproducibility of the uniform thickness of the organic thin film can be realized.
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| Application Number | Priority Date | Filing Date | Title |
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| KR1020040067259A KR100579406B1 (en) | 2004-08-25 | 2004-08-25 | Vertically Moved Organic Material Deposition Equipment |
| KR67259/04 | 2004-08-25 | ||
| KR84884/04 | 2004-10-22 | ||
| KR1020040084884A KR100646514B1 (en) | 2004-10-22 | 2004-10-22 | Organic material deposition apparatus |
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Families Citing this family (77)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100600357B1 (en) * | 2005-01-05 | 2006-07-18 | 삼성에스디아이 주식회사 | Drive shaft sealing device of deposition source for deposition system and deposition system having same |
| KR100964224B1 (en) * | 2008-02-28 | 2010-06-17 | 삼성모바일디스플레이주식회사 | Evaporating apparatus and method for forming thin film |
| KR101499228B1 (en) * | 2008-12-08 | 2015-03-05 | 삼성디스플레이 주식회사 | Vapor deposition apparatus and vapor deposition method |
| KR101155905B1 (en) | 2009-03-04 | 2012-07-03 | 삼성모바일디스플레이주식회사 | Atomic Layer Deposition device and fabricating method of atomic layer using the same |
| US20100279021A1 (en) | 2009-05-04 | 2010-11-04 | Samsung Mobile Display Co., Ltd. | Apparatus for depositing organic material and depositing method thereof |
| JP5620146B2 (en) | 2009-05-22 | 2014-11-05 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | Thin film deposition equipment |
| TWI475124B (en) | 2009-05-22 | 2015-03-01 | Samsung Display Co Ltd | Thin film deposition apparatus |
| US8882920B2 (en) | 2009-06-05 | 2014-11-11 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
| US8882921B2 (en) | 2009-06-08 | 2014-11-11 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
| US9174250B2 (en) | 2009-06-09 | 2015-11-03 | Samsung Display Co., Ltd. | Method and apparatus for cleaning organic deposition materials |
| US8802200B2 (en) | 2009-06-09 | 2014-08-12 | Samsung Display Co., Ltd. | Method and apparatus for cleaning organic deposition materials |
| KR101097311B1 (en) | 2009-06-24 | 2011-12-21 | 삼성모바일디스플레이주식회사 | Organic light emitting display device and organic film deposition apparatus for manufacturing same |
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| US8486737B2 (en) | 2009-08-25 | 2013-07-16 | Samsung Display Co., Ltd. | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
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| JP5677785B2 (en) | 2009-08-27 | 2015-02-25 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | Thin film deposition apparatus and organic light emitting display device manufacturing method using the same |
| US8696815B2 (en) | 2009-09-01 | 2014-04-15 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
| US8876975B2 (en) | 2009-10-19 | 2014-11-04 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
| JP5452178B2 (en) * | 2009-11-12 | 2014-03-26 | 株式会社日立ハイテクノロジーズ | Vacuum deposition apparatus, vacuum deposition method, and organic EL display device manufacturing method |
| KR101146982B1 (en) | 2009-11-20 | 2012-05-22 | 삼성모바일디스플레이주식회사 | Aapparatus for thin layer deposition and method of manufacturing organic light emitting display apparatus |
| KR101633112B1 (en) * | 2009-12-03 | 2016-06-24 | 엘지디스플레이 주식회사 | Source for vacuum thermal evaporation of organic thin film |
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| KR101174875B1 (en) | 2010-01-14 | 2012-08-17 | 삼성디스플레이 주식회사 | Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method |
| KR101193186B1 (en) | 2010-02-01 | 2012-10-19 | 삼성디스플레이 주식회사 | Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method |
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| KR101202348B1 (en) | 2010-04-06 | 2012-11-16 | 삼성디스플레이 주식회사 | Apparatus for thin layer deposition and method for manufacturing of organic light emitting display apparatus using the same |
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| KR101223723B1 (en) | 2010-07-07 | 2013-01-18 | 삼성디스플레이 주식회사 | Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method |
| KR101673017B1 (en) | 2010-07-30 | 2016-11-07 | 삼성디스플레이 주식회사 | Apparatus for thin layer deposition and method for manufacturing of organic light emitting display apparatus using the same |
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| KR20120029166A (en) | 2010-09-16 | 2012-03-26 | 삼성모바일디스플레이주식회사 | Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method |
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| KR101840654B1 (en) | 2011-05-25 | 2018-03-22 | 삼성디스플레이 주식회사 | Apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same |
| KR101852517B1 (en) | 2011-05-25 | 2018-04-27 | 삼성디스플레이 주식회사 | Apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same |
| KR101857992B1 (en) | 2011-05-25 | 2018-05-16 | 삼성디스플레이 주식회사 | Patterning slit sheet assembly, apparatus for organic layer deposition, method for manufacturing organic light emitting display apparatus and organic light emitting display apparatus |
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| KR20130010730A (en) | 2011-07-19 | 2013-01-29 | 삼성디스플레이 주식회사 | Deposition source and deposition apparatus with the same |
| KR20130015144A (en) | 2011-08-02 | 2013-02-13 | 삼성디스플레이 주식회사 | Deposition source, apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same |
| KR20130069037A (en) | 2011-12-16 | 2013-06-26 | 삼성디스플레이 주식회사 | Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus |
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| US9461277B2 (en) | 2012-07-10 | 2016-10-04 | Samsung Display Co., Ltd. | Organic light emitting display apparatus |
| KR101959974B1 (en) | 2012-07-10 | 2019-07-16 | 삼성디스플레이 주식회사 | Apparatus for organic layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method |
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| KR102162797B1 (en) | 2013-12-23 | 2020-10-08 | 삼성디스플레이 주식회사 | Method for manufacturing of organic light emitting display apparatus |
| CN104004995A (en) * | 2014-06-05 | 2014-08-27 | 上海和辉光电有限公司 | Vapor plating device, vapor plating equipment and vapor plating method |
| CN107761056A (en) * | 2016-08-19 | 2018-03-06 | 合肥欣奕华智能机器有限公司 | A kind of evaporation source, evaporated device and the control method for putting evaporation source |
| US20240084439A1 (en) * | 2021-02-16 | 2024-03-14 | Applied Materials, Inc. | Crucible, evaporation source, evaporation method, evaporation system, and method of manufacturing a device |
| KR20220126152A (en) | 2021-03-08 | 2022-09-15 | 주식회사 선익시스템 | Thin film deposition apparatus |
| KR102648127B1 (en) * | 2021-08-30 | 2024-03-15 | 주식회사 야스 | Vertical Evaporation Point Nozzle Source |
| CN114481039A (en) * | 2021-12-30 | 2022-05-13 | 费勉仪器科技(上海)有限公司 | Evaporation source and vacuum evaporation system |
| CN119615070A (en) * | 2024-10-31 | 2025-03-14 | 惠科股份有限公司 | Evaporation device and evaporation equipment |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003347047A (en) * | 2002-05-28 | 2003-12-05 | Sony Corp | Organic film forming equipment |
| CN1468972A (en) * | 2003-06-04 | 2004-01-21 | 深圳市创欧科技有限公司 | Evaporating and coating apparatus for making organic electroluminescent display |
-
2004
- 2004-08-25 KR KR1020040067259A patent/KR100579406B1/en not_active Expired - Fee Related
-
2005
- 2005-08-25 CN CN200510096608XA patent/CN1743495B/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003347047A (en) * | 2002-05-28 | 2003-12-05 | Sony Corp | Organic film forming equipment |
| CN1468972A (en) * | 2003-06-04 | 2004-01-21 | 深圳市创欧科技有限公司 | Evaporating and coating apparatus for making organic electroluminescent display |
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| Publication number | Publication date |
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| KR20060018745A (en) | 2006-03-02 |
| KR100579406B1 (en) | 2006-05-12 |
| CN1743495A (en) | 2006-03-08 |
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