CN1630458A - Method for forming metal wire pattern by inkjet method - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及一种金属导线形成方法,尤其涉及一种以喷墨法形成金属导线图案的方法。The invention relates to a method for forming a metal wire, in particular to a method for forming a metal wire pattern by an inkjet method.
背景技术Background technique
随着电子产品走向“轻薄短小”的设计概念,印刷电路板(Printed CircuitBoard,PCB)也朝向小孔径、高密度、多层数、细线路发展。一般印刷电路板,通常使用玻璃纤维布或软性基材所组成的平面状基板,利用接着剂与热压方式,贴附金属层或铜箔再进行蚀刻以形成金属导线。但是接着剂的配方中需加入含有卤素的难燃剂,而难以符合欧盟2004年电子产品全面禁用卤素的规定,将限制其未来发展。且接着剂中往往添加离子性不纯物,使基板的介电及绝缘特性变差,以及在高温下容易造成基板扭曲变形,这些都会降低基板的可靠度。因此应尽量在电路板中避免接着剂的使用。As electronic products move towards the design concept of "thin, thin and small", printed circuit boards (Printed Circuit Board, PCB) are also developing towards small aperture, high density, multi-layer, and thin lines. General printed circuit boards usually use glass fiber cloth or a flat substrate composed of a soft substrate. Using adhesives and hot pressing, attach a metal layer or copper foil and then etch to form metal wires. However, the formula of the adhesive needs to add a halogen-containing flame retardant, and it is difficult to comply with the European Union's 2004 ban on halogens in electronic products, which will limit its future development. Moreover, ionic impurities are often added to the adhesive, which deteriorates the dielectric and insulating properties of the substrate, and easily causes distortion and deformation of the substrate at high temperature, which will reduce the reliability of the substrate. Therefore, the use of adhesives should be avoided in circuit boards as much as possible.
因此,可借由金属沉积的方式在基板表面形成金属层,再以光微影方式蚀刻出所需的金属导线。无电镀(electroless plating)或称为化学镀,是沉积金属层的一种方式,在无须外加电压的情形下,把溶液中的金属离子通过自动催化(autocatalytic)的化学反应方式,将金属沉积在固体表面上。这种反应程序与电镀(electroplating)极为类似,不同的是反应发生时的电子传递不经由外部电路,而是借由溶液中的物质在固体表面发生氧化还原反应时,在表面上直接进行传递而有别于外加电路的电镀。为符合电路板的细线宽要求,因而增加了光罩制作和金属层蚀刻的难度,并且不同种类和尺寸的金属导线都需要利用不同光罩来制作,在制造成本上相对的增加。Therefore, a metal layer can be formed on the surface of the substrate by metal deposition, and then the required metal wires can be etched out by photolithography. Electroless plating, or chemical plating, is a method of depositing a metal layer. In the absence of an external voltage, the metal ions in the solution are deposited on the metal through an autocatalytic chemical reaction. on a solid surface. This reaction procedure is very similar to electroplating, the difference is that the electron transfer does not pass through the external circuit when the reaction occurs, but is directly transferred on the surface when the substance in the solution undergoes a redox reaction on the solid surface. It is different from the electroplating of external circuits. In order to meet the thin line width requirements of the circuit board, it increases the difficulty of mask fabrication and metal layer etching, and metal wires of different types and sizes need to be fabricated with different masks, which relatively increases the manufacturing cost.
因而借由无电镀的特性发展出直接在基板上形成金属图案以作为金属导线的方法,由于无电镀需要在经过活化或催化的表面才能进行,可以选择性的在基板表面需要成长金属导线之处形成催化层,然后再进行无电镀。如美国第6521285号专利所述,揭露一种选择性的无电镀方法,预先刻出具有金属导线图案的印刷板,再将其印刷板沾上催化剂,以盖印方式将印刷板对准压在基板上,使基板表面预定形成金属导线之处印上催化层之后,再以无电镀方式在基板具有催化剂的表面成长导电金属。此法同样需要配合不同种类和尺寸的金属导线的催化剂制作不同的印刷板,并且线路的线宽需取决于印刷板可达到的雕刻精密度。Therefore, by virtue of the characteristics of electroless plating, a method of directly forming metal patterns on the substrate as metal wires has been developed. Since electroless plating needs to be performed on an activated or catalyzed surface, metal wires can be selectively grown on the surface of the substrate. A catalytic layer is formed, followed by electroless plating. As described in U.S. Patent No. 6,521,285, a selective electroless plating method is disclosed. A printed board with a metal wire pattern is carved in advance, and then the printed board is dipped in a catalyst, and the printed board is aligned and pressed on the printed board by stamping. On the substrate, after the catalyst layer is printed on the surface of the substrate where the metal wires are to be formed, the conductive metal is grown on the surface of the substrate with the catalyst by electroless plating. This method also needs to make different printed boards with catalysts of different types and sizes of metal wires, and the line width of the circuit depends on the achievable engraving precision of the printed board.
发明内容Contents of the invention
本发明所要解决的技术问题在于提供一种以喷墨法形成金属导线图案的方法,是以微液滴喷涂方式在基板欲形成金属导线之处喷涂催化剂,然后再进行无电镀程序以形成金属导线,避免了接着剂的使用。并且为使催化剂有效吸附于基板,并改善基板的表面性质,基板在进行微液滴喷涂的前需进行适当的表面改质处理。The technical problem to be solved by the present invention is to provide a method for forming a metal wire pattern by inkjet method, which is to spray a catalyst on the substrate where the metal wire is to be formed in the form of micro-droplet spraying, and then perform an electroless plating process to form a metal wire , avoiding the use of adhesives. In addition, in order to effectively adsorb the catalyst on the substrate and improve the surface properties of the substrate, the substrate needs to undergo appropriate surface modification treatment before spraying the micro-droplets.
为了实现上述目的,本发明提供了一种以喷墨法形成金属导线图案的方法,其特点在于,步骤包含有:In order to achieve the above object, the present invention provides a method for forming a metal wire pattern by an inkjet method, which is characterized in that the steps include:
提供一基板;providing a substrate;
以微液滴喷涂方式在该基板表面欲形成金属导线之处喷涂一催化剂以形成一金属催化图案;及Spraying a catalyst on the surface of the substrate where metal wires are to be formed by means of micro-droplet spraying to form a metal catalytic pattern; and
以无电镀方式在该基板表面具有该金属催化图案之处沉积一金属以形成一金属导线。A metal is deposited on the surface of the substrate having the metal catalytic pattern in an electroless manner to form a metal wire.
上述的以喷墨法形成金属导线图案的方法,其特点在于,还包含一在该基板表面进行一改质处理的步骤,使该基板表面形成自组成薄膜接口,以使该催化剂能有效吸附于该基板表面。The above-mentioned method of forming a metal wire pattern by an inkjet method is characterized in that it also includes a step of performing a modification treatment on the surface of the substrate, so that the surface of the substrate forms a self-composed thin film interface, so that the catalyst can be effectively adsorbed on the surface of the substrate. the substrate surface.
上述的以喷墨法形成金属导线图案的方法,其特点在于,所述在该基板表面进行一改质处理的步骤,包含:The above-mentioned method for forming a metal wire pattern by an inkjet method is characterized in that the step of performing a modification treatment on the surface of the substrate includes:
步骤a、将该基板浸泡于一阴离子型聚合电解质溶液;Step a, immersing the substrate in an anionic polyelectrolyte solution;
步骤b、将该基板浸泡于一阳离子型聚合电解质溶液;Step b, immersing the substrate in a cationic polyelectrolyte solution;
步骤c、重复一次以上的步骤a至步骤b;及step c, repeating steps a to b more than once; and
步骤d、将该基板浸泡于该阴离子型聚合电解质溶液。Step d, immersing the substrate in the anionic polyelectrolyte solution.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该阴离子型聚合电解质溶液选自聚丙烯酸溶液、聚甲基丙烯酸和聚赛吩-3-醋酸。The above-mentioned method for forming metal wire pattern by inkjet method is characterized in that the anionic polyelectrolyte solution is selected from polyacrylic acid solution, polymethacrylic acid and polysiphene-3-acetic acid.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该阳离子型聚合电解质溶液选自聚丙烯胺氯化氢溶液、聚乙基吡唑、聚乙基吡咯酮和聚苯胺。The above-mentioned method for forming metal wire pattern by inkjet method is characterized in that the cationic polyelectrolyte solution is selected from the group consisting of polyallylamine hydrogen chloride solution, polyethylpyrazole, polyethylpyrrolidone and polyaniline.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该基板选自玻璃基板、聚酯基板、有机玻璃纤维基板、可挠性有机玻璃纤维基板和聚亚醯胺基板。The above-mentioned method for forming a metal wire pattern by an inkjet method is characterized in that the substrate is selected from a glass substrate, a polyester substrate, an organic glass fiber substrate, a flexible organic glass fiber substrate and a polyimide substrate.
上述的以喷墨法形成金属导线图案的方法,其特点在于,所述在该基板表面进行一改质处理的步骤,包含:The above-mentioned method for forming a metal wire pattern by an inkjet method is characterized in that the step of performing a modification treatment on the surface of the substrate includes:
步骤a、将该基板浸泡于一阳离子型聚合电解质溶液;Step a, soaking the substrate in a cationic polyelectrolyte solution;
步骤b、将该基板浸泡于一阴离子型聚合电解质溶液;Step b, immersing the substrate in an anionic polyelectrolyte solution;
步骤c、重复一次以上的步骤a至步骤b;及step c, repeating steps a to b more than once; and
步骤d、将该基板浸泡于该阴离子型聚合电解质溶液。Step d, immersing the substrate in the anionic polyelectrolyte solution.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该阴离子型聚合电解质溶液选自聚丙烯酸溶液、聚甲基丙烯酸和聚赛吩-3-醋酸。The above-mentioned method for forming metal wire pattern by inkjet method is characterized in that the anionic polyelectrolyte solution is selected from polyacrylic acid solution, polymethacrylic acid and polysiphene-3-acetic acid.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该阳离子型聚合电解质溶液选自聚丙烯胺氯化氢溶液、聚乙基吡唑、聚乙基吡咯酮和聚苯胺。The above-mentioned method for forming metal wire pattern by inkjet method is characterized in that the cationic polyelectrolyte solution is selected from the group consisting of polyallylamine hydrogen chloride solution, polyethylpyrazole, polyethylpyrrolidone and polyaniline.
上述的以喷墨法形成金属导线图案的方法,其特点在于,还包含一提供一波动至该基板的步骤,以平坦化该基板表面的该金属催化图案。The above-mentioned method for forming metal wire pattern by inkjet method is characterized in that it further includes a step of providing a wave to the substrate to planarize the metal catalytic pattern on the surface of the substrate.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该金属的主成分材料为铜。The above-mentioned method of forming a metal wiring pattern by an inkjet method is characterized in that the main component material of the metal is copper.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该催化剂选自四氯钯酸钠溶液和四氨二氯化钯溶液。The above-mentioned method for forming metal wire pattern by inkjet method is characterized in that the catalyst is selected from sodium tetrachloropalladate solution and tetraammonia palladium dichloride solution.
上述的以喷墨法形成金属导线图案的方法,其特点在于,还包含下列步骤:The above-mentioned method for forming a metal wire pattern by an inkjet method is characterized in that it also includes the following steps:
以喷墨方式在该第一金属导线表面喷涂另一层金属催化图案;及Spraying another layer of metal catalytic pattern on the surface of the first metal wire by inkjet; and
进行无电镀在该金属导线表面沉积另一层金属以形成另一金属导线。Electroless plating is performed to deposit another layer of metal on the surface of the metal wire to form another metal wire.
上述的以喷墨法形成金属导线图案的方法,其特点在于,该两种金属的主成分材料不同。The above-mentioned method of forming a metal wire pattern by an inkjet method is characterized in that the main component materials of the two metals are different.
通过使基板表面形成自组成薄膜(Self-Assembled Monolayer,SAM)接口来进行表面改质,基板表面处理的后所形成的自组成薄膜接口,利用原子彼此间的化学动力学差异,引发自组成(self-assembly)而形成特殊的纳米接口结构,此纳米接口结构具有纳米尺寸的厚度。自组成薄膜的成膜机理可借由固液接口间的化学吸附,在基板上形成具有化学键连接的原子紧密排列的二维有序单分子层。重复控制形成此自组成薄膜可形成纳米级的多层膜接口结构,并且可借由此薄膜接口的成分、结构、物理和化学性质来改变基板的表面性质,并使基板表面对于某些物质具有选择性的吸附能力,借此可使基板有效吸附催化剂。Surface modification is carried out by forming a self-assembled monolayer (SAM) interface on the substrate surface. The self-assembled monolayer interface formed after the substrate surface treatment uses the chemical kinetic difference between atoms to induce self-assembled ( self-assembly) to form a special nano-interface structure, the nano-interface structure has a thickness of nanometer size. The film-forming mechanism of the self-assembled thin film can form a two-dimensional ordered monolayer with chemically bonded atoms closely arranged on the substrate by chemical adsorption between the solid-liquid interface. Repeatedly controlling the formation of this self-composed thin film can form a nanoscale multilayer film interface structure, and the composition, structure, physical and chemical properties of the thin film interface can be used to change the surface properties of the substrate, and make the substrate surface resistant to certain substances. Selective adsorption capacity, whereby the substrate can effectively adsorb the catalyst.
通过在基板欲形成金属导线之处喷涂催化剂,可以有效降低并稳定控制后续无电镀所形成的金属导线线宽,基于无电镀的特性,更可轻易控制金属导线的厚度以及降低金属导线的电阻。配合微液滴喷涂和无电镀方法相较于现有的光微影和蚀刻工艺可以快速完成金属导线的制作,提高产率。By spraying the catalyst on the substrate where the metal wire is to be formed, the line width of the metal wire formed by subsequent electroless plating can be effectively reduced and stably controlled. Based on the characteristics of electroless plating, the thickness of the metal wire can be easily controlled and the resistance of the metal wire can be reduced. Cooperating with micro-droplet spraying and electroless plating methods, compared with the existing photolithography and etching processes, the production of metal wires can be quickly completed and the production rate can be improved.
以下结合附图和具体实施例对本发明进行详细描述,但不作为对本发明的限定。The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.
附图说明Description of drawings
图1为本发明以喷墨法形成金属导线图案的方法的流程图;Fig. 1 is the flow chart of the method for forming metal wire pattern with ink-jet method of the present invention;
图2本发明以喷墨法喷涂金属催化图案的装置示意图;Fig. 2 present invention is with the schematic diagram of the device of ink-jet method spraying metal catalytic pattern;
图3为本发明第一实施例的电路板剖面示意图;及3 is a schematic cross-sectional view of a circuit board according to a first embodiment of the present invention; and
图4为本发明第二实施例的电路板剖面示意图。FIG. 4 is a schematic cross-sectional view of a circuit board according to a second embodiment of the present invention.
具体实施方式Detailed ways
请参考图1,其为以喷墨法形成金属导线图案的方法的流程图,首先,步骤110,清洁基板,进行10分钟的紫外光臭氧(UV-ozone)处理。步骤120,将基板浸泡于阴离子型聚合电解质溶液中,阴离子型聚合电解质溶液为10毫摩尔浓度(M)的聚丙烯酸(poly(acrylic acid),PAA)。步骤130,以去离子水清洗基板。步骤140,将基板浸泡于阳离子型聚合电解质溶液中,阳离子型聚合电解质溶液为10毫摩尔浓度(M)的聚丙烯胺氯化氢(poly(allylamine hydrochloride),PAH)。步骤150,再将基板浸泡于阴离子型聚合电解质溶液中。步骤160,以微液滴喷涂方式在基板欲形成金属导线之处喷涂催化剂,催化剂为10毫莫耳浓度(M)的sodium tetrachloropalladate(Na2PdCl4)溶液。步骤170,以去离子水清洗基板。再将基板浸泡于pH值2.5至3之间的氯化氢溶液30秒;然后,步骤180,进行无电镀金属。最后,步骤190,再以去离子水清洗基板。Please refer to FIG. 1 , which is a flow chart of a method for forming a metal wire pattern by an inkjet method. First, in step 110 , the substrate is cleaned and subjected to UV-ozone (UV-ozone) treatment for 10 minutes. Step 120, soaking the substrate in an anionic polyelectrolyte solution, the anionic polyelectrolyte solution is poly(acrylic acid) (PAA) with a concentration of 10 millimolar (M). Step 130, cleaning the substrate with deionized water. Step 140, soaking the substrate in a cationic polyelectrolyte solution, the cationic polyelectrolyte solution is poly(allylamine hydrochloride, PAH) with a concentration of 10 millimolar (M). Step 150, soaking the substrate in an anionic polyelectrolyte solution. In step 160, a catalyst is sprayed on the substrate where metal wires are to be formed by means of micro-droplet spraying. The catalyst is a sodium tetrachloropalladate (Na2PdCl4) solution with a concentration of 10 millimolar (M). Step 170, cleaning the substrate with deionized water. Then soak the substrate in a hydrogen chloride solution with a pH value between 2.5 and 3 for 30 seconds; then, step 180 , perform electroless metal plating. Finally, in step 190, the substrate is rinsed with deionized water.
其中,本发明步骤120至步骤140是用来进行基板的表面改质处理,通过使基板表面形成自组成薄膜接口来进行表面改质,配合不同材料的基板其浸泡阳离子与阴离子聚合电解质溶液的顺序也可能相反。基板经过两种不同电性的聚合电解质溶液的浸泡处理,可在其表面形成自组成薄膜接口。在上述工艺中,为有效改变其表面性质,还可重复步骤120至步骤140在基板表面堆栈多次PAH/PAA双层结构(bilayers),然后再进行步骤150以形成纳米级的多层自组成膜接口。可基于不同材料基板的性质选择自组成薄膜接口的结构,上述的PAH/PAA bilayers可适用的基板材料可为玻璃基板、聚酯(PET)基板、有机玻璃纤维(FR-4)基板、可挠性有机玻璃纤维基板(Flexible FR-4)和聚亚醯胺基板(Polyimide)。此外,其阳离子型聚合电解质溶液可选自聚丙烯胺氯化氢溶液(PAH)、聚乙基吡唑(PVI+)、聚乙基吡咯酮(PVP+)和聚苯胺(PAN);所搭配使用的阴离子型聚合电解质溶液可选自聚丙烯酸溶液(PAA)、聚甲基丙烯酸(PMA)和聚赛吩-3-醋酸(PTAA)。Among them, steps 120 to 140 of the present invention are used to carry out the surface modification treatment of the substrate. The surface modification is performed by forming a self-composed thin film interface on the surface of the substrate, and the sequence of immersing the cationic and anionic polyelectrolyte solutions in conjunction with substrates of different materials It could also be the other way around. The substrate is soaked in two polyelectrolyte solutions with different electrical properties, and a self-composed thin film interface can be formed on the surface. In the above process, in order to effectively change its surface properties, it is also possible to repeat steps 120 to 140 to stack multiple PAH/PAA double-layer structures (bilayers) on the substrate surface, and then perform step 150 to form nanoscale multilayer self-organization membrane interface. The structure of the self-composed thin film interface can be selected based on the properties of different material substrates. The applicable substrate materials for the above-mentioned PAH/PAA bilayers can be glass substrates, polyester (PET) substrates, organic glass fiber (FR-4) substrates, flexible Flexible plexiglass fiber substrate (Flexible FR-4) and polyimide substrate (Polyimide). In addition, its cationic polyelectrolyte solution can be selected from polypropylene amine hydrogen chloride solution (PAH), polyethylpyrazole (PVI+), polyethylpyrrolidone (PVP+) and polyaniline (PAN); The polyelectrolyte solution may be selected from polyacrylic acid solution (PAA), polymethacrylic acid (PMA) and polysiphen-3-acetic acid (PTAA).
本发明是以喷墨打印方法在基板欲形成金属导线之处喷涂催化剂,由于催化剂一般为盐类,可几乎完全溶解于水形成均匀溶液,因此具有良好的喷墨稳定性。由于后续的无电镀所形成的金属导线系取决于喷墨分辨率,而目前的喷墨技术可达高分辨率,因此本发明可用以制作高密度、细线宽的金属导线。此外,为增加喷涂的催化剂液滴的平坦性,在喷墨进行中可提供适当频率和振幅的波动来破坏附着于基板的微液滴的表面张力,而得到较平坦的薄膜均匀性。In the present invention, the catalyst is sprayed on the place where the metal wire is to be formed on the substrate by the inkjet printing method. Since the catalyst is generally a salt, it can be almost completely dissolved in water to form a uniform solution, so it has good inkjet stability. Since the metal wires formed by the subsequent electroless plating depend on the inkjet resolution, and the current inkjet technology can achieve high resolution, the present invention can be used to make metal wires with high density and fine line width. In addition, in order to increase the flatness of sprayed catalyst droplets, fluctuations of appropriate frequency and amplitude can be provided during inkjet to destroy the surface tension of micro-droplets attached to the substrate, resulting in a flatter film uniformity.
请参考图2,为以喷墨法喷涂金属催化图案的装置示意图。包含有喷墨头模块10、运动承载平台20、支撑架21以及波动产生模块30,喷墨头模块10具有一个以上的喷孔11,并固定于一喷头调整机构12以对基板40进行催化剂液滴13喷涂。运动承载平台20是承载基板40并可调整其位置以供喷墨头模块10喷涂催化剂液滴13,且具有支撑架21供基板设置,使基板40和运动承载平台20保持一段距离。而波动产生模块30为压电组件,贴附于基板40下方,波动产生模块30没有与运动承载平台20接触,可避免不必要的能量衰减。波动产生模块30作动产生适当频率的波动,当喷孔11将多个催化剂液滴13喷涂于基板40以形成金属催化图案时,待催化剂液滴的溶剂挥发之后可得到平坦化的金属催化图案。上述工艺是以四氯钯酸钠(Na2PdCl4)溶液或四氨二氯化钯(Pd(NH3)4Cl2)溶液作为催化剂,通过析出钯来进行无电镀铜等金属的催化。Please refer to FIG. 2 , which is a schematic diagram of an apparatus for spraying metal catalytic patterns by inkjet method. Including an inkjet head module 10, a moving platform 20, a support frame 21, and a wave generation module 30, the inkjet head module 10 has more than one nozzle hole 11, and is fixed on a nozzle adjustment mechanism 12 to apply catalyst liquid to the substrate 40. Drop 13 for spraying. The moving carrying platform 20 is carrying the substrate 40 and its position can be adjusted for spraying the catalyst droplets 13 by the inkjet head module 10 , and has a support frame 21 for the substrate to be set to keep a certain distance between the substrate 40 and the moving carrying platform 20 . The wave generating module 30 is a piezoelectric component attached to the bottom of the substrate 40 , and the wave generating module 30 is not in contact with the motion bearing platform 20 , which can avoid unnecessary energy attenuation. The fluctuation generation module 30 operates to generate fluctuations of appropriate frequency. When the spray hole 11 sprays a plurality of catalyst droplets 13 on the substrate 40 to form a metal catalytic pattern, a flattened metal catalytic pattern can be obtained after the solvent of the catalyst droplets volatilizes. . The above process uses sodium tetrachloropalladate (Na2PdCl4) solution or tetraammonia palladium dichloride (Pd(NH3)4Cl2) solution as a catalyst, and catalyzes metals such as electroless copper plating by precipitating palladium.
无电镀又称为化学镀(chemical plating)或自身催化电镀(autocatalyticplating)。无电镀是指在水溶液中的金属离子被在控制的镀液环境下,予以化学还原而在基板形成镀层。一般的无电镀液成分主要需包含有作为镀层金属的来源的金属离子(metal ions);将金属离子还原成金属还原剂(reducing agent);使基材表面具有催化性的催化剂(catalyst)。其次为了维持镀液的稳定性,还需包含错合剂(complexing agent)以防止氢氧化物沉淀、调节析出速率、防止镀液分解,使镀液安定;吸着微粒杂质防止镀液自然分解,以延长镀液寿命的安定剂(stabilizer);以及用以控制pH值在操作范围内的缓冲剂(buffer)。以及为了增加镀层特性,需添加使表面作用良好的润湿剂(wetting agent);使镀层具有良好光泽性的光泽剂(brightener)。Electroless plating is also called chemical plating or autocatalytic plating. Electroless plating means that the metal ions in the aqueous solution are chemically reduced under a controlled plating solution environment to form a plating layer on the substrate. The general electroless plating solution mainly needs to contain metal ions (metal ions) as the source of plating metal; reduce metal ions to metal reducing agent (reducing agent); make the surface of the substrate catalytic (catalyst). Secondly, in order to maintain the stability of the plating solution, it is necessary to include a complexing agent to prevent precipitation of hydroxides, adjust the precipitation rate, prevent the decomposition of the plating solution, and stabilize the plating solution; absorb particulate impurities to prevent the natural decomposition of the plating solution, so as to prolong the life of the plating solution. Stabilizer (stabilizer) for bath life; and buffer (buffer) to control pH value within the operating range. And in order to increase the properties of the coating, it is necessary to add a wetting agent (wetting agent) to make the surface work well; a brightener (brightener) to make the coating have good gloss.
无电镀液需安定,在未使用时需不起作用,只有在催化性的表面接触时才开始作用析出金属镀层。本发明是先在基板进行表面改质处理,再在基板欲形成金属导线之处喷涂催化剂,然后,进行无电镀可选择性仅在具有催化剂的表面沉积金属以形成金属导线。请参考图3,其为本发明第一实施例的电路板剖面示意图。在基板200表面是经过表面改质而具有PAA层211和PAH层212所组成的多层自组成薄膜接口210,金属催化图案220是经过喷涂附着于多层自组成薄膜接口210,第一金属导线230则形成于金属催化图案220上。The electroless plating solution needs to be stable, and it needs to be inactive when not in use, and only starts to act and precipitate the metal coating when the catalytic surface is in contact. In the present invention, the surface modification treatment is carried out on the substrate first, and then the catalyst is sprayed on the place where the metal wire is to be formed on the substrate, and then electroless plating is performed to selectively deposit metal only on the surface with the catalyst to form the metal wire. Please refer to FIG. 3 , which is a schematic cross-sectional view of a circuit board according to a first embodiment of the present invention. The surface of the substrate 200 is modified to have a multilayer self-organized thin film interface 210 composed of a PAA layer 211 and a PAH layer 212. The metal catalytic pattern 220 is sprayed and attached to the multilayer self-assembled thin film interface 210. The first metal wire 230 is formed on the metal catalytic pattern 220 .
由于无电镀经过一段时间之后,其金属析出沉积的速度会下降,因此,应用本发明方法,如图4所示,其为本发明第二实施例的电路板剖面示意图。可在第一金属导线上方再喷涂另一层金属催化图案221,并再次进行第二次无电镀以形成第二金属导线231。同时除了使用相同的催化剂和无电镀浴来增加金属导线图案的厚度,更可选择不同的催化剂和无电镀液,使第一金属导线和第二金属导线可为相同或不同的金属材料所形成。Since the speed of electroless plating will decrease after a period of time, the method of the present invention is applied, as shown in FIG. 4 , which is a schematic cross-sectional view of a circuit board according to the second embodiment of the present invention. Another metal catalytic pattern 221 can be sprayed on the first metal wire, and a second electroless plating is performed again to form the second metal wire 231 . At the same time, in addition to using the same catalyst and electroless plating bath to increase the thickness of the metal wire pattern, different catalysts and electroless plating solutions can be selected, so that the first metal wire and the second metal wire can be formed of the same or different metal materials.
当然,本发明还可有其它多种实施例,在不背离本发明精神及其实质的情况下,熟悉本领域的技术人员当可根据本发明作出各种相应的改变和变形,但这些相应的改变和变形都应属于本发明所附的权利要求的保护范围。Certainly, the present invention also can have other multiple embodiments, without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and deformations according to the present invention, but these corresponding Changes and deformations should belong to the scope of protection of the appended claims of the present invention.
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| CN100486813C (en) * | 2005-12-31 | 2009-05-13 | 财团法人工业技术研究院 | Graphic printing system and data processing method thereof |
| CN100574573C (en) * | 2005-12-31 | 2009-12-23 | 财团法人工业技术研究院 | Multilayer printed wiring board and method for manufacturing the same |
| CN101754585B (en) * | 2008-11-27 | 2011-09-21 | 富葵精密组件(深圳)有限公司 | How to make conductive lines |
| CN1988251B (en) * | 2005-12-20 | 2012-02-08 | 财团法人工业技术研究院 | Manufacturing method of radio frequency identification antenna and antenna structure thereof |
| CN102883543A (en) * | 2012-10-08 | 2013-01-16 | 复旦大学 | Method for manufacturing conducting circuit by additive process |
| CN103476199A (en) * | 2013-09-27 | 2013-12-25 | 电子科技大学 | Printed circuit addition manufacturing method based on copper autocatalysis and chemical copper plating |
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| CN87100440B (en) * | 1987-01-27 | 1988-05-11 | 中国人民解放军装甲兵工程学院 | Methods of Brush Plating Copper on Non-Conductive Materials |
| JPH0696796B2 (en) * | 1991-10-08 | 1994-11-30 | 東京化工機株式会社 | Chemical processing equipment |
| BE1007879A3 (en) * | 1994-01-05 | 1995-11-07 | Blue Chips Holding | Polymer resin viscosity adjustable for filing on palladium catalyst substrate, method of preparation and use. |
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| JP3605313B2 (en) * | 1999-04-27 | 2004-12-22 | 京セラ株式会社 | Wiring board and method of manufacturing the same |
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| JP2004006700A (en) * | 2002-03-27 | 2004-01-08 | Seiko Epson Corp | Surface treatment method, surface treatment substrate, method of forming film pattern, method of manufacturing electro-optical device, electro-optical device, and electronic equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1988251B (en) * | 2005-12-20 | 2012-02-08 | 财团法人工业技术研究院 | Manufacturing method of radio frequency identification antenna and antenna structure thereof |
| CN100486813C (en) * | 2005-12-31 | 2009-05-13 | 财团法人工业技术研究院 | Graphic printing system and data processing method thereof |
| CN100574573C (en) * | 2005-12-31 | 2009-12-23 | 财团法人工业技术研究院 | Multilayer printed wiring board and method for manufacturing the same |
| CN101754585B (en) * | 2008-11-27 | 2011-09-21 | 富葵精密组件(深圳)有限公司 | How to make conductive lines |
| CN102883543A (en) * | 2012-10-08 | 2013-01-16 | 复旦大学 | Method for manufacturing conducting circuit by additive process |
| CN102883543B (en) * | 2012-10-08 | 2016-04-13 | 复旦大学 | A kind of method adopting additive process to prepare conducting wire |
| CN103476199A (en) * | 2013-09-27 | 2013-12-25 | 电子科技大学 | Printed circuit addition manufacturing method based on copper autocatalysis and chemical copper plating |
| CN103476199B (en) * | 2013-09-27 | 2016-02-03 | 电子科技大学 | Based on the printed circuit addition preparation method of copper self-catalysis and electroless copper |
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