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CN1619807B - Substrates including integrated circuit chips and integrated circuits thereon - Google Patents

Substrates including integrated circuit chips and integrated circuits thereon Download PDF

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Publication number
CN1619807B
CN1619807B CN200410100344.6A CN200410100344A CN1619807B CN 1619807 B CN1619807 B CN 1619807B CN 200410100344 A CN200410100344 A CN 200410100344A CN 1619807 B CN1619807 B CN 1619807B
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integrated circuit
chip
metal
substrate
circuit chip
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CN1619807A (en
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邹育仁
范一龙
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AUO Corp
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AU Optronics Corp
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    • H10W72/073
    • H10W72/20
    • H10W74/15

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Abstract

An integrated circuit chip, a packaging structure thereof and a flat panel display device are provided. The integrated circuit packaging structure comprises an integrated circuit chip, an insulating substrate and a film layer. The integrated circuit chip is provided with a chip body and a plurality of metal bumps. The metal bumps are arranged on the first surface of the chip body, and each metal bump is provided with a patterned laminating surface. The insulating substrate is provided with a plurality of electrode pads respectively corresponding to the metal bumps, and each electrode pad is provided with a second surface. The glue film layer is arranged between the integrated circuit chip and the insulating substrate and covers the metal bumps and the electrode pads. In addition, a plurality of electric conductor patterns are arranged on the laminating surface or the corresponding second surface.

Description

包括集成电路芯片的基板及其上的集成电路 Substrates including integrated circuit chips and integrated circuits thereon

技术领域technical field

本发明涉及一种集成电路芯片、其构装结构及平面显示装置,尤其涉及一种适用玻璃上接合(COG)构装技术而不需采用各向异性导电膜(ACF)的集成电路芯片及其构装结构。The present invention relates to an integrated circuit chip, its construction structure and a flat display device, in particular to an integrated circuit chip which is suitable for bonding on glass (COG) construction technology without using anisotropic conductive film (ACF) and its Construct structure.

背景技术Background technique

目前常见的平面显示装置,例如液晶显示器(LCD)或是等离子显示器(PDP)之中,均采用集成电路(IC)芯片等半导体组件,用以控制影像的显示。IC芯片的构装中,玻璃上接合(Chip-On-Glass,COG)构装结构是目前常用的一种方式,其结构是将驱动IC芯片直接构装于平面显示装置的绝缘基板之上。Currently common flat panel display devices, such as liquid crystal displays (LCDs) or plasma displays (PDPs), all use semiconductor components such as integrated circuit (IC) chips to control the display of images. In the assembly of IC chips, a Chip-On-Glass (COG) assembly structure is commonly used at present, and its structure is to directly assemble the driver IC chip on the insulating substrate of the flat panel display device.

请参见图1A以及图1B,说明现有的IC芯片COG构装结构。如图1A所示,IC芯片20上设置有多个金属凸块210,而绝缘基板10上则设置有对应于金属凸块210的电极垫110。进行构装时,是在绝缘基板10上涂布含有导电粒子310的各向异性导电膜(Anisotropic Conductive Film,ACF)30,再将IC芯片20压合于绝缘基板10,如图1B所示,并施以适当的压力,温度以及时间控制,使绝缘基板10与IC芯片20透过各向异性导电膜30黏合,且对应的金属凸块210与电极垫110之间通过导电粒子310而产生电性导通。一般而言,每一金属凸块210的凸出长度大体相等,且其压合面通常都设置成平面,如此较易确保压合时的均匀性。Please refer to FIG. 1A and FIG. 1B , illustrating the existing IC chip COG assembly structure. As shown in FIG. 1A , a plurality of metal bumps 210 are disposed on the IC chip 20 , and electrode pads 110 corresponding to the metal bumps 210 are disposed on the insulating substrate 10 . When assembling, an anisotropic conductive film (Anisotropic Conductive Film, ACF) 30 containing conductive particles 310 is coated on the insulating substrate 10, and then the IC chip 20 is pressed onto the insulating substrate 10, as shown in FIG. 1B, Appropriate pressure, temperature and time control are applied, so that the insulating substrate 10 and the IC chip 20 are bonded through the anisotropic conductive film 30, and the corresponding metal bump 210 and the electrode pad 110 pass through the conductive particles 310 to generate electricity. sexual conduction. Generally speaking, the protruding lengths of each metal bump 210 are substantially equal, and the pressing surfaces thereof are usually set as a plane, so that it is easier to ensure the uniformity of the pressing.

然而,各向异性导电膜30中所含有的导电粒子310,并不一定散布均匀,有可能恰好在某些区域导电粒子310的密度较低或较高,因此在进行构装时,可能会因为导电粒子310散布不均而产生问题。However, the conductive particles 310 contained in the anisotropic conductive film 30 are not necessarily uniformly distributed, and the density of the conductive particles 310 may be low or high in some areas. The uneven distribution of the conductive particles 310 causes problems.

举例而言,如图1C所示,将IC芯片20压合于绝缘基板10时,若是金属凸块210与电极垫110之间的各向异性导电膜30如区域A般恰好不含导电粒子310,则金属凸块210与电极垫110之间即会阻抗过大,无法有效构成电性导通。For example, as shown in FIG. 1C , when the IC chip 20 is bonded to the insulating substrate 10, if the anisotropic conductive film 30 between the metal bump 210 and the electrode pad 110 does not contain conductive particles 310 just like the region A , the impedance between the metal bump 210 and the electrode pad 110 is too large, and the electrical conduction cannot be effectively formed.

另外,如图1D所示,将IC芯片20压合于绝缘基板10时,若是各向异性导电膜30的某区域内导电粒子310分布较为密集,即可能如区域B般在相邻的金属凸块210产生短路现象,进而影响控制信号的传输。In addition, as shown in FIG. 1D, when the IC chip 20 is bonded to the insulating substrate 10, if the conductive particles 310 are densely distributed in a certain area of the anisotropic conductive film 30, that is, as in area B, adjacent metal bumps may be formed. Block 210 generates a short circuit, thereby affecting the transmission of the control signal.

除此之外,各向异性导电膜30由于添加导电粒子310,其材料成本不低,且金属凸块210以及电极垫110等线路的间隙的尺寸受到导电粒子310的颗粒大小(例如导电粒子可为直径5微米的颗粒)所限制,无法将线路设置得更为密集。另外,上述导电粒子310分布不均的现象,即使未如图1C般无法有效构成电性导通,或如图1D般产生短路现象,但仍然可能局部产生阻抗增加或是电性导通不良等现象。In addition, due to the addition of conductive particles 310, the material cost of the anisotropic conductive film 30 is not low, and the size of the gap between the metal bump 210 and the electrode pad 110 is affected by the particle size of the conductive particles 310 (for example, the conductive particles can be limited by particles with a diameter of 5 microns), it is impossible to set the lines more densely. In addition, the uneven distribution of the above-mentioned conductive particles 310 may not effectively form electrical conduction as shown in FIG. 1C or cause a short circuit as shown in FIG. 1D , but local impedance increase or poor electrical conduction may still occur. Phenomenon.

发明内容Contents of the invention

有鉴于此,本发明的一个目的即在于提出一种集成电路芯片及其构装结构,针对现有COG构装技术加以改良,使其不需采用各向异性导电膜即可进行构装,如此即可避免现有COG构装技术所发生的问题。In view of this, an object of the present invention is to propose an integrated circuit chip and its assembly structure, which improves the existing COG assembly technology so that it can be assembled without using an anisotropic conductive film. The problems that occur in the existing COG construction technology can be avoided.

本发明揭示一种集成电路芯片,包括一芯片本体、多个金属凸块以及多个电导体图案。芯片本体具有一第一表面,金属凸块设置于芯片本体的第一表面,且每一金属凸块具有一图案化的压合面。多个电导体图案分别设置于压合面上。The invention discloses an integrated circuit chip, which includes a chip body, a plurality of metal bumps and a plurality of electrical conductor patterns. The chip body has a first surface, the metal bumps are arranged on the first surface of the chip body, and each metal bump has a patterned bonding surface. A plurality of electrical conductor patterns are respectively arranged on the pressing surface.

另外,本发明还揭示一种集成电路构装结构,包括一集成电路芯片、一绝缘基板以及一胶膜层。集成电路芯片具有一芯片本体以及多个金属凸块。金属凸块设置于芯片本体的第一表面,而每一金属凸块具有一压合面。绝缘基板具有分别对应于金属凸块的多个电极垫,且每一电极垫具有一第二表面。胶膜层设置于集成电路芯片与绝缘基板之间,且包覆该些金属凸块以及该些电极垫。其中,压合面或第二表面上,设置有多个电导体图案。In addition, the invention also discloses an integrated circuit assembly structure, which includes an integrated circuit chip, an insulating substrate and an adhesive film layer. The integrated circuit chip has a chip body and a plurality of metal bumps. The metal bumps are disposed on the first surface of the chip body, and each metal bump has a pressing surface. The insulating substrate has a plurality of electrode pads respectively corresponding to the metal bumps, and each electrode pad has a second surface. The adhesive film layer is disposed between the integrated circuit chip and the insulating substrate, and covers the metal bumps and the electrode pads. Wherein, a plurality of electrical conductor patterns are arranged on the pressing surface or the second surface.

另外,本发明还揭示一种平面显示装置,包括一驱动IC、一显示面板以及一胶膜层。驱动IC具有一芯片本体以及多个金属凸块,金属凸块设置于芯片本体的一表面,且每一金属凸块具有一压合面。显示面板具有多个电极垫,分别对应于金属凸块,且每一电极垫具有一第二表面。胶膜层设置于驱动集成电路芯片与显示面板之间,且包覆该些金属凸块以及该些电极垫。其中,压合面或第二表面上,设置有多个电导体图案。In addition, the present invention also discloses a plane display device, which includes a driver IC, a display panel and an adhesive film layer. The driving IC has a chip body and a plurality of metal bumps, the metal bumps are arranged on a surface of the chip body, and each metal bump has a pressing surface. The display panel has a plurality of electrode pads respectively corresponding to the metal bumps, and each electrode pad has a second surface. The adhesive film layer is disposed between the driving integrated circuit chip and the display panel, and covers the metal bumps and the electrode pads. Wherein, a plurality of electrical conductor patterns are arranged on the pressing surface or the second surface.

上述本发明的各形态中,电导体图案可为半球状或其它适于制造的形状,且电导体图案的直径大体为3-15微米较佳。In each aspect of the present invention above, the electrical conductor pattern can be hemispherical or other shapes suitable for manufacturing, and the diameter of the electrical conductor pattern is generally 3-15 microns.

另外,本发明还揭示一种集成电路构装结构,包括一集成电路芯片、一绝缘基板以及一胶膜层。集成电路芯片具有一芯片本体以及多个金属凸块。金属凸块设置于芯片本体的第一表面,而每一金属凸块具有一压合面,其中,压合面上设置有多个第一电导体图案。绝缘基板具有分别对应于金属凸块的多个电极垫,且每一电极垫具有一第二表面,其中,第二表面上设置有多个第二电导体图案。胶膜层设置于集成电路芯片与绝缘基板之间,且包覆该些金属凸块以及该些电极垫。In addition, the invention also discloses an integrated circuit assembly structure, which includes an integrated circuit chip, an insulating substrate and an adhesive film layer. The integrated circuit chip has a chip body and a plurality of metal bumps. The metal bumps are disposed on the first surface of the chip body, and each metal bump has a bonding surface, wherein a plurality of first electrical conductor patterns are disposed on the bonding surface. The insulating substrate has a plurality of electrode pads respectively corresponding to the metal bumps, and each electrode pad has a second surface, wherein a plurality of second electrical conductor patterns are arranged on the second surface. The adhesive film layer is disposed between the integrated circuit chip and the insulating substrate, and covers the metal bumps and the electrode pads.

另外,本发明还揭示一种平面显示装置,包括一驱动IC、一显示面板以及一胶膜层。驱动IC具有一芯片本体以及多个金属凸块,金属凸块设置于芯片本体的一表面,且每一金属凸块具有一压合面,其中,压合面上设置有多个第一电导体图案。显示面板具有多个电极垫,分别对应于金属凸块,且每一电极垫具有一第二表面,其中,第二表面上设置有多个第二电导体图案。胶膜层设置于驱动集成电路芯片与显示面板之间,且包覆该些金属凸块以及该些电极垫。In addition, the present invention also discloses a plane display device, which includes a driver IC, a display panel and an adhesive film layer. The driver IC has a chip body and a plurality of metal bumps, the metal bumps are arranged on a surface of the chip body, and each metal bump has a bonding surface, wherein a plurality of first electrical conductors are arranged on the bonding surface pattern. The display panel has a plurality of electrode pads respectively corresponding to the metal bumps, and each electrode pad has a second surface, wherein a plurality of second electrical conductor patterns are arranged on the second surface. The adhesive film layer is disposed between the driving integrated circuit chip and the display panel, and covers the metal bumps and the electrode pads.

上述本发明的各形态中,第一电导体图案以及第二电导体图案可为金属颗粒或对应嵌合于金属颗粒的多个凹槽,其形状可为半球状或其它适于制造的形状,且其直径大体为3-15微米较佳。In each form of the present invention above, the first electrical conductor pattern and the second electrical conductor pattern can be metal particles or a plurality of grooves correspondingly embedded in the metal particles, and their shapes can be hemispherical or other shapes suitable for manufacturing, And its diameter is generally 3-15 microns is preferred.

为使本发明的上述及其它目的、特征和优点能更明显易懂,下文特举数个具体的优选实施例,并配合附图做详细说明。In order to make the above and other objects, features and advantages of the present invention more comprehensible, several specific preferred embodiments are specifically cited below and described in detail with accompanying drawings.

附图说明Description of drawings

图1A是现有玻璃上接合(COG)构装结构接合前的示意图;FIG. 1A is a schematic diagram of a conventional bonding-on-glass (COG) assembly structure before bonding;

图1B是图1A的COG构装结构接合后的示意图;FIG. 1B is a schematic diagram of the COG assembly structure of FIG. 1A after bonding;

图1C是图1A的COG构装结构接合不良的示意图;FIG. 1C is a schematic diagram of poor joint of the COG construct structure of FIG. 1A;

图1D是图1A的COG构装结构发生短路的示意图;Figure 1D is a schematic diagram of a short circuit occurring in the COG structure of Figure 1A;

图2是本发明第一实施例的集成电路芯片结构的示意图;Fig. 2 is a schematic diagram of the integrated circuit chip structure of the first embodiment of the present invention;

图3是本发明第二实施例的集成电路构装结构的示意图;3 is a schematic diagram of an integrated circuit assembly structure according to a second embodiment of the present invention;

图4是本发明第三实施例的集成电路构装结构的示意图;4 is a schematic diagram of an integrated circuit assembly structure according to a third embodiment of the present invention;

图5是本发明第四实施例的集成电路构装结构的示意图;5 is a schematic diagram of an integrated circuit assembly structure according to a fourth embodiment of the present invention;

图6是本发明第五实施例的集成电路构装结构的示意图;FIG. 6 is a schematic diagram of an integrated circuit assembly structure according to a fifth embodiment of the present invention;

图7是本发明第六实施例的集成电路构装结构的示意图;FIG. 7 is a schematic diagram of an integrated circuit assembly structure according to a sixth embodiment of the present invention;

图8是本发明第七实施例的集成电路构装结构的示意图。FIG. 8 is a schematic diagram of an integrated circuit assembly structure according to a seventh embodiment of the present invention.

具体实施方式Detailed ways

第一实施例first embodiment

以下请参见图2,以一实施例说明本发明的集成电路芯片的结构。Please refer to FIG. 2 below to illustrate the structure of the integrated circuit chip of the present invention with an embodiment.

如图2所示,本实施例的集成电路芯片包括一芯片本体20、多个金属凸块210以及作为多个电导体图案的多个金属颗粒215。芯片本体20具有一第一表面,即图2所示的下表面。金属凸块210设置于芯片本体20的第一表面,且每一金属凸块210具有一图案化的压合面。金属颗粒215是作为电导体图案,分别设置于压合面上。金属颗粒215的形状可为半球状,其直径大体为3-15微米较佳,也可依集成电路芯片的线路需求而设置成适当的尺寸。如此,金属颗粒215即可取代现有COG构装结构中的导电粒子。As shown in FIG. 2 , the integrated circuit chip of this embodiment includes a chip body 20 , a plurality of metal bumps 210 and a plurality of metal particles 215 serving as a plurality of electrical conductor patterns. The chip body 20 has a first surface, namely the lower surface shown in FIG. 2 . The metal bumps 210 are disposed on the first surface of the chip body 20 , and each metal bump 210 has a patterned bonding surface. The metal particles 215 are used as electrical conductor patterns and are respectively disposed on the bonding surfaces. The shape of the metal particle 215 can be hemispherical, and its diameter is generally 3-15 microns, and it can also be set to an appropriate size according to the circuit requirements of the integrated circuit chip. In this way, the metal particles 215 can replace the conductive particles in the existing COG structure.

第二实施例second embodiment

请再参见图3,说明本发明的第二实施例的集成电路芯片进行构装时的结构。图3的集成电路构装结构包括一集成电路芯片20、一绝缘基板10以及一胶膜层40。集成电路芯片20与图2的结构相似,其芯片本体的第一表面设置有多个金属凸块210,而每一金属凸块210具有一图案化的压合面,每一压合面上分别设置有作为多个电导体图案的半球状的金属颗粒215。绝缘基板10是包括玻璃基板或塑料基板,且具有分别对应于金属凸块210的多个电极垫110,每一电极垫110具有一第二表面(上表面)。当金属凸块210的压合面分别压合于对应的电极垫110的第二表面时,由于压合面上设置有半球状的金属颗粒215,因此,对应的每一金属凸块210与每一电极垫110即可通过作为多个电导体图案的金属颗粒215而产生电性导通。另外,由于金属凸块210与电极垫110之间通过金属颗粒215即可产生电性导通,因此集成电路芯片20与绝缘基板10之间所设置的胶膜层40不需含有导电粒子,可采用一般具有黏着性的胶膜,包覆金属凸块210与电极垫110,使集成电路芯片20与绝缘基板10紧密接合,不需使用成本较高的各向异性导电膜。Please refer to FIG. 3 again, illustrating the structure of the integrated circuit chip of the second embodiment of the present invention when it is assembled. The integrated circuit assembly structure in FIG. 3 includes an integrated circuit chip 20 , an insulating substrate 10 and an adhesive film layer 40 . The structure of the integrated circuit chip 20 is similar to that shown in FIG. 2 . The first surface of the chip body is provided with a plurality of metal bumps 210, and each metal bump 210 has a patterned bonding surface, and each bonding surface is respectively Hemispherical metal particles 215 are provided as a plurality of electrical conductor patterns. The insulating substrate 10 includes a glass substrate or a plastic substrate, and has a plurality of electrode pads 110 respectively corresponding to the metal bumps 210 , and each electrode pad 110 has a second surface (upper surface). When the pressing surface of the metal bump 210 is respectively pressed on the second surface of the corresponding electrode pad 110, since the hemispherical metal particles 215 are arranged on the pressing surface, each corresponding metal bump 210 and each An electrode pad 110 can be electrically connected through the metal particles 215 as a plurality of electrical conductor patterns. In addition, since the metal particle 215 can produce electrical conduction between the metal bump 210 and the electrode pad 110, the adhesive film layer 40 provided between the integrated circuit chip 20 and the insulating substrate 10 does not need to contain conductive particles, and can The metal bump 210 and the electrode pad 110 are coated with an adhesive film generally, so that the integrated circuit chip 20 and the insulating substrate 10 are closely bonded without using an anisotropic conductive film with high cost.

第三实施例third embodiment

请再参见图4,说明本发明的第三实施例的集成电路芯片进行构装时的结构。图4的集成电路构装结构包括一集成电路芯片20、一绝缘基板10以及一胶膜层40。集成电路芯片20与图2的结构相似,其芯片本体的第一表面设置有多个金属凸块210,而每一金属凸块210具有一图案化的压合面,每一压合面上分别设置有作为多个第一电导体图案的半球状的金属颗粒215。绝缘基板10包括玻璃基板或塑料基板,且具有分别对应于金属凸块210的多个电极垫110,每一电极垫110具有一第二表面(上表面),在第二表面也设置有作为多个第二电导体图案的多个金属颗粒115,且金属凸块210的压合面设置的金属颗粒215与电极垫110的第二表面设置的金属颗粒115是位于互相对应压合的位置。当金属凸块210的压合面分别压合于对应的电极垫110的第二表面时,由于金属凸块210的压合面上设置有半球状的金属颗粒215,且电极垫110的第二表面也设置有互相对应压合的金属颗粒115,因此,对应的每一金属凸块210与每一电极垫110即可通过金属颗粒115与215而产生电性导通。另外,由于金属凸块210与电极垫110之间通过金属颗粒115与215即可产生电性导通,因此集成电路芯片20与绝缘基板10之间所设置的胶膜层40不需含有导电粒子,可采用一般具有黏着性的胶膜,包覆金属凸块210与电极垫110,使集成电路芯片20与绝缘基板10紧密接合,不需使用成本较高的各向异性导电膜。Please refer to FIG. 4 again, illustrating the structure of the integrated circuit chip according to the third embodiment of the present invention when it is assembled. The integrated circuit assembly structure in FIG. 4 includes an integrated circuit chip 20 , an insulating substrate 10 and an adhesive film layer 40 . The structure of the integrated circuit chip 20 is similar to that shown in FIG. 2 . The first surface of the chip body is provided with a plurality of metal bumps 210, and each metal bump 210 has a patterned bonding surface, and each bonding surface is respectively Hemispherical metal particles 215 are provided as a plurality of first electric conductor patterns. The insulating substrate 10 includes a glass substrate or a plastic substrate, and has a plurality of electrode pads 110 corresponding to the metal bumps 210, each electrode pad 110 has a second surface (upper surface), and is also provided on the second surface as a plurality of electrode pads 110. A plurality of metal particles 115 of the second electrical conductor pattern, and the metal particles 215 disposed on the pressing surface of the metal bump 210 and the metal particles 115 disposed on the second surface of the electrode pad 110 are located at corresponding pressing positions. When the pressing surface of the metal bump 210 is respectively pressed on the second surface of the corresponding electrode pad 110, since the hemispherical metal particles 215 are arranged on the pressing surface of the metal bump 210, and the second surface of the electrode pad 110 The surface is also provided with metal particles 115 that are pressed against each other, so that each corresponding metal bump 210 and each electrode pad 110 can be electrically connected through the metal particles 115 and 215 . In addition, since the metal particles 115 and 215 can produce electrical conduction between the metal bump 210 and the electrode pad 110, the adhesive film layer 40 provided between the integrated circuit chip 20 and the insulating substrate 10 does not need to contain conductive particles. , a general adhesive film can be used to cover the metal bump 210 and the electrode pad 110, so that the integrated circuit chip 20 and the insulating substrate 10 are tightly bonded, without using an anisotropic conductive film with high cost.

第四实施例Fourth embodiment

请再参见图5,说明本发明的第四实施例的集成电路芯片进行构装时的结构。图5的集成电路构装结构包括一集成电路芯片20、一绝缘基板10以及一胶膜层40。集成电路芯片20与图2的结构相似,其芯片本体的第一表面设置有多个金属凸块210,而每一金属凸块210具有一图案化的压合面,每一压合面上分别设置有作为多个第一电导体图案的半球状的金属颗粒215。绝缘基板10包括玻璃基板或塑料基板,且具有分别对应于金属凸块210的多个电极垫110,每一电极垫110具有一第二表面(上表面),在第二表面也设置有作为多个第二电导体图案的多个金属颗粒115,且金属凸块210的压合面设置的金属颗粒215与电极垫110的第二表面设置的金属颗粒115是位于互相错位卡合的位置(相错)。当金属凸块210的压合面分别压合于对应的电极垫110的第二表面时,由于金属凸块210的压合面上设置有半球状的金属颗粒215,且电极垫110的第二表面也设置有互相错位卡合的金属颗粒115,因此,对应的每一金属凸块210与每一电极垫110即可通过金属颗粒115与215相互错位卡合而产生电性导通。另外,由于金属凸块210与电极垫110之间通过金属颗粒115与215的错位卡合即可产生电性导通,因此集成电路芯片20与绝缘基板10之间所设置的胶膜层40不需含有导电粒子,因此可采用一般具有黏着性的胶膜,包覆金属凸块210与电极垫110,使集成电路芯片20与绝缘基板10紧密接合,不需使用成本较高的各向异性导电膜。Please refer to FIG. 5 again, illustrating the structure of the integrated circuit chip of the fourth embodiment of the present invention when it is assembled. The integrated circuit assembly structure in FIG. 5 includes an integrated circuit chip 20 , an insulating substrate 10 and an adhesive film layer 40 . The structure of the integrated circuit chip 20 is similar to that shown in FIG. 2 . The first surface of the chip body is provided with a plurality of metal bumps 210, and each metal bump 210 has a patterned bonding surface, and each bonding surface is respectively Hemispherical metal particles 215 are provided as a plurality of first electric conductor patterns. The insulating substrate 10 includes a glass substrate or a plastic substrate, and has a plurality of electrode pads 110 corresponding to the metal bumps 210, each electrode pad 110 has a second surface (upper surface), and is also provided on the second surface as a plurality of electrode pads 110. A plurality of metal particles 115 of the second electrical conductor pattern, and the metal particles 215 disposed on the press-fitting surface of the metal bump 210 and the metal particles 115 disposed on the second surface of the electrode pad 110 are located at mutually dislocated engagement positions (relative to each other) wrong). When the pressing surface of the metal bump 210 is respectively pressed on the second surface of the corresponding electrode pad 110, since the hemispherical metal particles 215 are arranged on the pressing surface of the metal bump 210, and the second surface of the electrode pad 110 The metal particles 115 are also dislocated and engaged with each other on the surface. Therefore, each corresponding metal bump 210 and each electrode pad 110 can be electrically connected through the mutual dislocation and engagement of the metal particles 115 and 215 . In addition, since the metal bumps 210 and the electrode pads 110 can be electrically connected through the dislocation engagement of the metal particles 115 and 215, the adhesive film layer 40 provided between the integrated circuit chip 20 and the insulating substrate 10 does not It needs to contain conductive particles, so an adhesive film with general adhesiveness can be used to cover the metal bumps 210 and the electrode pads 110, so that the integrated circuit chip 20 and the insulating substrate 10 are tightly bonded, without using an anisotropic conductive film with high cost. membrane.

第五实施例fifth embodiment

请再参见图6,说明本发明的第五实施例的集成电路芯片进行构装时的结构。图6的集成电路构装结构包括一集成电路芯片20、一绝缘基板10以及一胶膜层40。图6中的集成电路芯片20并不采用图2所示的集成电路芯片结构,而是采用一般现有的集成电路芯片。集成电路芯片20的每一金属凸块210具有一图案化的压合面,但每一压合面上并不设置金属颗粒,而只在绝缘基板10的多个电极垫110的第二表面设置作为多个电导体图案的多个金属颗粒115。当金属凸块210的压合面分别压合于对应的电极垫110的第二表面时,由于电极垫110的第二表面设置有作为多个电导体图案的金属颗粒115,因此,对应的每一金属凸块210与每一电极垫110即可通过金属颗粒115而产生电性导通。另外,由于金属凸块210与电极垫110之间通过金属颗粒115即可产生电性导通,因此集成电路芯片20与绝缘基板10之间所设置的胶膜层40不需含有导电粒子,因此可采用一般具有黏着性的胶膜,包覆金属凸块210与电极垫110,使集成电路芯片20与绝缘基板10紧密接合,不需使用成本较高的各向异性导电膜。Please refer to FIG. 6 again, illustrating the structure of the integrated circuit chip according to the fifth embodiment of the present invention when it is assembled. The integrated circuit assembly structure in FIG. 6 includes an integrated circuit chip 20 , an insulating substrate 10 and an adhesive film layer 40 . The integrated circuit chip 20 in FIG. 6 does not adopt the structure of the integrated circuit chip shown in FIG. 2 , but uses a general existing integrated circuit chip. Each metal bump 210 of the integrated circuit chip 20 has a patterned bonding surface, but metal particles are not disposed on each bonding surface, but are only disposed on the second surface of the plurality of electrode pads 110 of the insulating substrate 10 A plurality of metal particles 115 as a plurality of electrical conductor patterns. When the pressing surfaces of the metal bumps 210 are respectively pressed on the second surface of the corresponding electrode pad 110, since the second surface of the electrode pad 110 is provided with metal particles 115 as a plurality of electrical conductor patterns, each corresponding A metal bump 210 and each electrode pad 110 can be electrically connected through the metal particles 115 . In addition, since the metal particle 115 can produce electrical conduction between the metal bump 210 and the electrode pad 110, the adhesive film layer 40 provided between the integrated circuit chip 20 and the insulating substrate 10 does not need to contain conductive particles, so A general adhesive film can be used to cover the metal bump 210 and the electrode pad 110, so that the integrated circuit chip 20 and the insulating substrate 10 are closely bonded, without using an anisotropic conductive film with high cost.

第六实施例Sixth embodiment

请再参见图7,说明本发明的第六实施例的集成电路芯片进行构装时的结构。图7的集成电路构装结构包括一集成电路芯片20、一绝缘基板10以及一胶膜层40。集成电路芯片20与图2的结构相似,其芯片本体的第一表面设置有多个金属凸块210,而每一金属凸块210具有一图案化的压合面,每一压合面上分别设置有作为多个第一电导体图案的半球状的金属颗粒215。绝缘基板10包括玻璃基板或塑料基板,且具有分别对应于金属凸块210的多个电极垫110,每一电极垫110具有一第二表面(上表面),在第二表面则设置有对应嵌合于金属颗粒215的作为多个第二电导体图案的多个凹槽125。当金属凸块210的压合面分别压合于对应的电极垫110的第二表面时,由于金属凸块210的压合面上设置有半球状的金属颗粒215,且电极垫110的第二表面设置有对应的凹槽125,因此,对应的每一金属凸块210与每一电极垫110即可通过金属颗粒215与凹槽125的嵌合而产生电性导通。另外,由于金属凸块210与电极垫110之间通过金属颗粒215与凹槽125的嵌合即可产生电性导通,因此集成电路芯片20与绝缘基板10之间所设置的胶膜层40不需含有导电粒子,因此可采用一般具有黏着性的胶膜,包覆金属凸决210与电极垫110,使集成电路芯片20与绝缘基板10紧密接合,不需使用成本较高的各向异性导电膜。Please refer to FIG. 7 again, illustrating the structure of the integrated circuit chip of the sixth embodiment of the present invention when it is assembled. The integrated circuit assembly structure in FIG. 7 includes an integrated circuit chip 20 , an insulating substrate 10 and an adhesive film layer 40 . The structure of the integrated circuit chip 20 is similar to that shown in FIG. 2 . The first surface of the chip body is provided with a plurality of metal bumps 210, and each metal bump 210 has a patterned bonding surface, and each bonding surface is respectively Hemispherical metal particles 215 are provided as a plurality of first electric conductor patterns. The insulating substrate 10 includes a glass substrate or a plastic substrate, and has a plurality of electrode pads 110 corresponding to the metal bumps 210, each electrode pad 110 has a second surface (upper surface), and a corresponding inlay is provided on the second surface. The plurality of grooves 125 are adapted to the metal particles 215 as the plurality of second electrical conductor patterns. When the pressing surface of the metal bump 210 is respectively pressed on the second surface of the corresponding electrode pad 110, since the hemispherical metal particles 215 are arranged on the pressing surface of the metal bump 210, and the second surface of the electrode pad 110 Corresponding grooves 125 are provided on the surface, therefore, each corresponding metal bump 210 and each electrode pad 110 can be electrically connected through the fitting of metal particles 215 into the grooves 125 . In addition, because electrical conduction can be generated between the metal bump 210 and the electrode pad 110 through the fitting of the metal particle 215 and the groove 125, the adhesive film layer 40 disposed between the integrated circuit chip 20 and the insulating substrate 10 It does not need to contain conductive particles, so an adhesive film with general adhesiveness can be used to cover the metal bumps 210 and the electrode pads 110, so that the integrated circuit chip 20 and the insulating substrate 10 are tightly bonded, without using an anisotropic film with high cost. conductive film.

第七实施例Seventh embodiment

请再参见图8,说明本发明的第七实施例的集成电路芯片进行构装时的结构。图8的集成电路构装结构包括一集成电路芯片20、一绝缘基板10以及一胶膜层40。图8中的集成电路芯片20并不采用图2所示的集成电路芯片,而是采用一般现有的集成电路芯片20。集成电路芯片20的每一金属凸块210具有一图案化的压合面,但每一压合面上并不设置金属颗粒,而是只在绝缘基板10的多个电极垫110的第二表面设置作为多个第二电导体图案的多个金属颗粒115,金属凸块210的压合面上则设置有对应嵌合于金属颗粒115的作为多个第一电导体图案的多个凹槽225。当金属凸块210的压合面分别压合于对应的电极垫110的第二表面时,由于电极垫110的第二表面设置有金属颗粒115,金属凸块210的压合面上则设置有对应的凹槽225,因此,对应的每一金属凸块210与每一电极垫110即可通过金属颗粒115与凹槽225的嵌合而产生电性导通。另外,由于金属凸块210与电极垫110之间通过金属颗粒115与凹槽225的嵌合即可产生电性导通,因此集成电路芯片20与绝缘基板10之间所设置的胶膜层40不需含有导电粒子,因此可采用一般具有黏着性的胶膜,包覆金属凸块210与电极垫110,使集成电路芯片20与绝缘基板10紧密接合,不需使用成本较高的各向异性导电膜。Please refer to FIG. 8 again, illustrating the structure of the integrated circuit chip of the seventh embodiment of the present invention when it is assembled. The integrated circuit assembly structure in FIG. 8 includes an integrated circuit chip 20 , an insulating substrate 10 and an adhesive film layer 40 . The integrated circuit chip 20 in FIG. 8 does not use the integrated circuit chip shown in FIG. 2 , but uses a general existing integrated circuit chip 20 . Each metal bump 210 of the integrated circuit chip 20 has a patterned bonding surface, but each bonding surface is not provided with metal particles, but only on the second surface of the plurality of electrode pads 110 of the insulating substrate 10 A plurality of metal particles 115 are provided as a plurality of second electrical conductor patterns, and a plurality of grooves 225 as a plurality of first electrical conductor patterns corresponding to the metal particles 115 are provided on the pressing surface of the metal bump 210 . When the pressing surface of the metal bump 210 is respectively pressed on the second surface of the corresponding electrode pad 110, since the second surface of the electrode pad 110 is provided with metal particles 115, the pressing surface of the metal bump 210 is provided with Corresponding to the groove 225 , therefore, each corresponding metal bump 210 and each electrode pad 110 can be electrically connected through the fitting of the metal particle 115 and the groove 225 . In addition, because electrical conduction can be generated between the metal bump 210 and the electrode pad 110 through the fitting of the metal particle 115 and the groove 225, the adhesive film layer 40 disposed between the integrated circuit chip 20 and the insulating substrate 10 It does not need to contain conductive particles, so an adhesive film with general adhesiveness can be used to cover the metal bump 210 and the electrode pad 110, so that the integrated circuit chip 20 and the insulating substrate 10 are tightly bonded, and there is no need to use an anisotropic film with high cost. conductive film.

如上所述,本发明的各实施例的集成电路构装结构中,由于金属凸块210与电极垫110之间至少一者设置有作为多个电导体图案的金属颗粒115及/或215,通过金属颗粒115及/或215即可产生电性导通,因此不需使用成本较高的各向异性导电膜作为接合集成电路芯片20与绝缘基板10的胶膜,只需采用一般具有黏着性胶膜,可节省成本。但上述实施例也不限定胶膜层的材料,仍可依需要使用各向异性导电膜或其它胶膜做为胶膜层。As mentioned above, in the integrated circuit structure of each embodiment of the present invention, since at least one of the metal bumps 210 and the electrode pads 110 is provided with metal particles 115 and/or 215 as a plurality of electrical conductor patterns, through The metal particles 115 and/or 215 can produce electrical conduction, so there is no need to use an anisotropic conductive film with high cost as the adhesive film for bonding the integrated circuit chip 20 and the insulating substrate 10, and only need to use a general adhesive Membranes save costs. However, the above embodiments do not limit the material of the adhesive film layer, and the anisotropic conductive film or other adhesive films can still be used as the adhesive film layer as required.

另外,上述各实施例的集成电路构装结构中,由于胶膜层40不含导电粒子,因此不会如现有COG构装结构那样因导电粒子散布不均匀而产生电性导通不良或短路等现象,且金属凸块210以及电极垫110等线路的间隙也不受尺寸限制,可依需求而设置成较为密集的线路。In addition, in the integrated circuit structure of the above-mentioned embodiments, since the adhesive film layer 40 does not contain conductive particles, it will not cause poor electrical conduction or short circuit due to uneven distribution of conductive particles as in the existing COG structure. and other phenomena, and the gaps between metal bumps 210 and electrode pads 110 are not limited by size, and can be arranged as denser circuits according to requirements.

另外,作为多个电导体图案的金属颗粒215是直接生成于金属凸块210的压合面,其可由半导体工艺或其它适当的工艺进行制造,形状并不限于半球状或颗粒状,可依工艺所容许制造的形状加以制造,且可通过工艺的控制而使电导体图案均匀分布,如此可容易控制构装结构的电流稳定性。In addition, the metal particles 215 as a plurality of electrical conductor patterns are directly formed on the bonding surface of the metal bump 210, which can be manufactured by a semiconductor process or other appropriate processes, and the shape is not limited to hemispherical or granular, and can be made according to the process. The shape allowed to be manufactured can be manufactured, and the electric conductor pattern can be evenly distributed through the control of the process, so that the current stability of the structure can be easily controlled.

上述本发明的各形态中,第一电导体图案以及第二电导体图案可为金属颗粒或对应嵌合于金属颗粒的多个凹槽,其形状可为半球状或其它适于制造的形状,且其直径大体为3-15微米较佳。In each form of the present invention above, the first electrical conductor pattern and the second electrical conductor pattern can be metal particles or a plurality of grooves correspondingly embedded in the metal particles, and their shapes can be hemispherical or other shapes suitable for manufacturing, And its diameter is generally 3-15 microns is preferred.

本发明各实施例的技术可适当应用于任何集成电路构装结构的场合,举例而言,常见的平面显示装置,例如液晶显示器或等离子显示器等,即可应用上述实施例中所述的集成电路构装结构进行其驱动IC芯片封装,以绝缘基板10做为平面显示装置的显示面板、集成电路芯片20做为平面显示装置的驱动IC芯片。The techniques of the various embodiments of the present invention can be suitably applied to any occasions with integrated circuit structures. For example, common flat display devices such as liquid crystal displays or plasma displays can be applied to the integrated circuits described in the above-mentioned embodiments. The assembly structure carries out the driving IC chip packaging, the insulating substrate 10 is used as the display panel of the flat display device, and the integrated circuit chip 20 is used as the driving IC chip of the flat display device.

虽然本发明已经以具体的优选实施例揭露如上,然其并非用以限定本发明,任何本领域技术人员,在不脱离本发明的精神和范围的前提下,仍可作各种修改和变化,因此本发明的保护范围当视所附的权利要求所界定的为准。Although the present invention has been disclosed above with specific preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can still make various modifications and changes without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the appended claims.

Claims (16)

1. integrated circuit comprises:
One chip body has a lower surface;
A plurality of metal couplings are arranged at this lower surface, and those metal couplings have the stitching surface of a patterning;
One insulated substrate;
A plurality of electronic padses are formed on this insulated substrate the position corresponding to those metal couplings, and the upper surface of those electronic padses have corresponding to or interlace in the pattern of the stitching surface of this patterning; And
One adhesive film is arranged between the lower surface and this insulated substrate of this chip body, and coats those metal couplings and those electronic padses.
2. integrated circuit as claimed in claim 1, wherein the stitching surface of this patterning is shaped as hemisphere.
3. integrated circuit as claimed in claim 2, wherein this hemispheric diameter range is approximately 3 to 15 microns.
4. integrated circuit as claimed in claim 1, wherein this insulated substrate comprises glass substrate or plastic base.
5. integrated circuit as claimed in claim 1, wherein when the upper surface of those electronic padses had pattern corresponding to the stitching surface of this patterning, the pattern of the upper surface of those electronic padses was a plurality of grooves or a plurality of metallic particles.
6. integrated circuit as claimed in claim 1, when wherein the upper surface of those electronic padses had the pattern that interlaces in the stitching surface of this patterning, the pattern of the upper surface of those electronic padses was a plurality of metallic particles.
7. substrate that comprises integrated circuit (IC) chip comprises:
One chip body has a lower surface;
A plurality of metal couplings are arranged at this lower surface, and those metal couplings have the stitching surface of a patterning;
One insulated substrate;
A plurality of electronic padses be formed on this insulated substrate the position corresponding to those metal couplings, and the upper surface of those electronic padses have the pattern corresponding to the stitching surface of this patterning; And
One adhesive film is arranged between the lower surface and this insulated substrate of this chip body, and coats those metal couplings and those electronic padses.
8. the substrate that comprises integrated circuit (IC) chip as claimed in claim 7, wherein the stitching surface of this patterning is shaped as hemisphere.
9. the substrate that comprises integrated circuit (IC) chip as claimed in claim 8, wherein this hemispheric diameter range is approximately 3 to 15 microns.
10. the substrate that comprises integrated circuit (IC) chip as claimed in claim 7, wherein the pattern of the upper surface of those electronic padses is a plurality of grooves or a plurality of metallic particles.
11. the substrate that comprises integrated circuit (IC) chip as claimed in claim 7, wherein this insulated substrate comprises glass substrate or plastic base.
12. a substrate that comprises integrated circuit (IC) chip comprises:
One chip body has a lower surface;
A plurality of metal couplings are arranged at this lower surface, and those metal couplings have the stitching surface of a patterning;
One insulated substrate;
A plurality of electronic padses are formed on this insulated substrate the position corresponding to those metal couplings, and the upper surface of those electronic padses has the pattern that interlaces in the stitching surface of this patterning; And
One adhesive film is arranged between the lower surface and this insulated substrate of this chip body, and coats those metal couplings and those electronic padses.
13. the substrate that comprises integrated circuit (IC) chip as claimed in claim 12, wherein the stitching surface of this patterning is shaped as hemisphere.
14. the substrate that comprises integrated circuit (IC) chip as claimed in claim 13, wherein this hemispheric diameter range is approximately 3 to 15 microns.
15. the substrate that comprises integrated circuit (IC) chip as claimed in claim 12, wherein this insulated substrate comprises glass substrate or plastic base.
16. the substrate that comprises integrated circuit (IC) chip as claimed in claim 12, wherein the pattern of the upper surface of those electronic padses is a plurality of grooves or a plurality of metallic particles.
CN200410100344.6A 2004-12-06 2004-12-06 Substrates including integrated circuit chips and integrated circuits thereon Expired - Fee Related CN1619807B (en)

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CN100416810C (en) * 2006-03-09 2008-09-03 南茂科技股份有限公司 Semiconductor device and method for manufacturing the same
DE102014201166A1 (en) * 2014-01-23 2015-08-06 Robert Bosch Gmbh Method for producing a flip-chip circuit arrangement and flip-chip circuit arrangement
CN106658988A (en) * 2017-02-07 2017-05-10 武汉华星光电技术有限公司 Display, circuit board, and pin structure of circuit board
CN111564107B (en) * 2020-06-11 2022-06-21 厦门通富微电子有限公司 Preparation method of display device
CN111524466B (en) * 2020-06-11 2022-06-21 厦门通富微电子有限公司 Preparation method of display device
CN111524465B (en) * 2020-06-11 2022-06-21 厦门通富微电子有限公司 Preparation method of display device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1293467A (en) * 1999-09-14 2001-05-02 索尼化学株式会社 Chip parts on glass and connecting material used thereof
TW506103B (en) * 2001-08-06 2002-10-11 Au Optronics Corp Bump layout on a chip

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1293467A (en) * 1999-09-14 2001-05-02 索尼化学株式会社 Chip parts on glass and connecting material used thereof
TW506103B (en) * 2001-08-06 2002-10-11 Au Optronics Corp Bump layout on a chip

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特開2003-100806 2003.04.04

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