CN1614760A - Bonding method and apparatus - Google Patents
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- CN1614760A CN1614760A CNA2004100858875A CN200410085887A CN1614760A CN 1614760 A CN1614760 A CN 1614760A CN A2004100858875 A CNA2004100858875 A CN A2004100858875A CN 200410085887 A CN200410085887 A CN 200410085887A CN 1614760 A CN1614760 A CN 1614760A
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Abstract
Description
技术领域technical field
本发明涉及在树脂基板和玻璃基板等的基板上进行半导体元件和表面安装元件等的安装构件的安装用的搭接方法及其装置,特别是涉及高效率地在基板上进行安装构件的安装技术。The present invention relates to a bonding method and device for mounting mounting components such as semiconductor elements and surface mount components on substrates such as resin substrates and glass substrates, and particularly relates to a mounting technology for efficiently mounting components on substrates .
背景技术Background technique
例如,在传统的基板(比如液晶、EL(Electro Luminescence)、等离子显示等的平板式显示面板)的制造工序中,将安装构件(比如半导体芯片等)安装在基板上。作为将安装构件(以下简称为「芯片」)安装在基板上的搭接方法,有一种是将树脂、比如各向异导电性膜(ACF:Anisotropic ConductiveFilm)和非导电性树脂(NCP:Non-Conductive Paste)等夹在基板与芯片之间,一边将加热压接装置从芯片上方进行按压,一边使树脂加热硬化,加热压接在基板上。For example, in the manufacturing process of conventional substrates (such as flat panel display panels such as liquid crystal, EL (Electro Luminescence), plasma display, etc.), mounting components (such as semiconductor chips, etc.) are mounted on the substrate. As a bonding method for mounting a mounting member (hereinafter referred to as "chip") on a substrate, there is a method of bonding a resin such as an anisotropic conductive film (ACF: Anisotropic Conductive Film) and a non-conductive resin (NCP: Non- Conductive Paste), etc. are sandwiched between the substrate and the chip, and the thermocompression bonding device is pressed from above the chip, while the resin is heated and hardened, and the thermocompression is bonded to the substrate.
具体来讲,如图1所示,使用多个头部分别以头部31和支撑台7夹住的方式对每个芯片4进行加热压接。Specifically, as shown in FIG. 1 , each
然而,采用这种搭接装置时,存在着以下的问题。However, when using this overlapping device, there are the following problems.
即,在各个芯片上存在着厚度的偏差,会出现若未将头部按压在各个芯片上则不能高精度固接在基板上的不良情况。That is, there is a variation in the thickness of each chip, and there is a problem that the chip cannot be fixed to the substrate with high precision unless the head is pressed against the chip.
又,在总体由加热工具通过弹性材料进行按压的场合,即使能吸收芯片厚度的偏差,因弹性材料而变厚,故不易传热。即使使用加热台从基板侧进行了加热,当为玻璃基板等的导热率差的基板时,会恶化安装效率。In addition, when the elastic material is pressed by the heating tool as a whole, even if the variation in the thickness of the chip can be absorbed, the elastic material becomes thick, so that heat transfer is difficult. Even if heating is performed from the substrate side using a heating stage, mounting efficiency deteriorates in the case of a substrate having poor thermal conductivity such as a glass substrate.
由于邻接的芯片相互间的间距小,不能用形状比芯片大的头部对邻接的芯片同时进行加热压接,因此,如图1所示,比如必须以跳过1个芯片4进行加热压接的方式来配备头部31。即,因不能一次性地对多个芯片4进行加热压接,故存在着作业效率差的不良情况。Since the distance between adjacent chips is small, it is not possible to heat and press adjacent chips at the same time with a head that is larger in shape than the chip. Therefore, as shown in FIG. The way to equip the
此时,为了加热硬化而从下方照射红外线时,在未被按压的芯片部分,该部位的树脂在未加压的情况下被硬化,比如在使用了ACF的场合,树脂内的导电粒子未与芯片侧的压块和基板电极接触,结果是存在着发生导通不良的问题。At this time, when infrared rays are irradiated from below for heat curing, the resin in the part of the chip that is not pressed is cured without pressure. For example, when ACF is used, the conductive particles in the resin The pressure piece on the chip side is in contact with the substrate electrode, and as a result, there is a problem that poor conduction occurs.
若想要避免上述的导通不良,必需要配设将向未被头部加压到的芯片部分照射的红外线进行遮蔽的构件等,不仅使装置结构复杂化,而且会导致作业效率下降的不良后果。In order to avoid the above-mentioned poor conduction, it is necessary to arrange a member that shields the infrared rays irradiated to the part of the chip that is not pressurized by the head, which not only complicates the device structure, but also leads to the disadvantage of lowering the working efficiency. as a result of.
若在保持高温加热的状态下解除对芯片进行的加压,则树脂处于玻璃化转变点(Tg)以上,故不能完全硬化,这样,成为了在带有因高温引起的芯片与基板的热膨胀之差引起的变形·挠曲形状下进行解除加压,因这种变形·挠曲会使被按压的电极与压块之间发生间隙,存在着造成电阻值增大、搭接不良的问题。If the pressure on the chip is released while maintaining the high temperature heating, the resin is above the glass transition point (Tg), so it cannot be completely cured. Depressurization is carried out under the deformed and deflected shape caused by the difference. Such deformation and deflection will cause a gap between the pressed electrode and the press block, resulting in an increase in resistance value and poor bonding.
并且,由于芯片与基板的线膨胀系数不同,故在树脂加热硬化后的冷却过程中,因芯片与基板的收缩量之差会引起挠曲,受该挠曲的影响,在将芯片与基板接合的树脂上发生龟裂,也存在着造成电阻值增大、接合不良的问题。In addition, since the coefficient of linear expansion of the chip and the substrate is different, in the cooling process after the resin is heated and hardened, the difference in shrinkage between the chip and the substrate will cause deflection. Cracks may occur on the resin, which may lead to increased resistance and poor bonding.
发明内容Contents of the invention
本发明的目的在于,提供能高效率地在基板上进行安装构件的安装的搭接方法及其装置。An object of the present invention is to provide a bonding method and an apparatus thereof capable of efficiently mounting a mounting member on a substrate.
为了实现上述目的,本发明采用了如下结构。In order to achieve the above object, the present invention adopts the following structure.
本发明的搭接方法,将树脂夹在安装构件与基板之间、在基板上进行安装构件的安装,所述方法包含以下的过程:In the lapping method of the present invention, the resin is sandwiched between the mounting member and the substrate, and the mounting member is installed on the substrate. The method includes the following processes:
在将弹性材料夹在基板上的多个安装构件与加压装置之间的状态下、由加压装置与支承基板的支承构件夹入状地对多个安装构件同时进行加压的加压过程;A pressurization process in which the elastic material is sandwiched between the multiple mounting members on the substrate and the pressurizing device, and the multiple mounting members are sandwiched between the pressing device and the supporting member that supports the substrate. ;
以及向处于所述加压状态的所述树脂照射红外线进行加热硬化的加热过程。and a heating process of irradiating infrared rays to the resin in the pressurized state to heat harden.
采用本发明的搭接方法,由于将基板上的多个安装构件被覆状地夹有弹性材料,使用加压装置从该弹性材料的上方同时进行加压,因此,由弹性材料将芯片的厚度偏差吸收,对芯片进行均等加压。此时,从基板侧照射的红外线透过基板使树脂加热硬化。由此可高效率地将多个安装构件一次性安装在基板上。According to the bonding method of the present invention, since the plurality of mounting members on the substrate are sandwiched with elastic material in a covered shape, and the pressing device is used to simultaneously pressurize from above the elastic material, therefore, the thickness of the chip is offset by the elastic material. Absorb, pressurize the chip evenly. At this time, infrared rays irradiated from the substrate side pass through the substrate to heat and harden the resin. Accordingly, a plurality of mounting members can be efficiently mounted on the substrate at one time.
又,作为树脂,最好是混入有导电粒子的树脂。即,夹有包含导电粒子的树脂地将安装构件加热压接在基板上。这样,因多个安装构件均匀地被加压,故树脂中含有的导电粒子也均等地弹性变形。结果是能充分确保导电粒子对安装构件及基板的接触面积,可避免电阻值不良。In addition, as the resin, it is preferable to use a resin mixed with conductive particles. That is, the mounting member is thermocompression bonded to the substrate with a resin containing conductive particles interposed therebetween. In this way, since the plurality of attachment members are uniformly pressed, the conductive particles contained in the resin are also uniformly elastically deformed. As a result, the contact area of the conductive particles with the mounting member and the substrate can be sufficiently ensured, and poor resistance value can be avoided.
又,基板最好是平板式显示面板,采用本发明的该方法,因基板上的安装构件一次性加热压接,故不需要象多个头部那样进行多次的加热处理。因此,适用于容易接受对热的应力的平板式显示面板。又,由于平板式显示面板是一种红外线容易透过的玻璃基板,故适用于本方式。In addition, the substrate is preferably a flat display panel. With the method of the present invention, since the mounting members on the substrate are thermally bonded at one time, it is not necessary to perform multiple heat treatments like multiple heads. Therefore, it is suitable for a flat display panel that easily receives thermal stress. Also, since the flat display panel is a glass substrate through which infrared rays are easily transmitted, it is suitable for this mode.
又,为了实现上述目的,本发明还采用了如下结构。Moreover, in order to achieve the above object, the present invention also adopts the following structure.
本发明的搭接方法,还包含以下的过程:所述树脂加热硬化后使其冷却至玻璃化转变点附近以下、然后将安装构件的加压进行解除的冷却过程。The bonding method of the present invention further includes a cooling process in which the resin is cured by heating and then cooled to below the vicinity of the glass transition point, and then the pressurization of the mounting member is released.
采用本发明的搭接方法,在将安装构件加热压接在基板上后,使其冷却至与该树脂对应的玻璃化转变点附近以下。因此,树脂成为了基本上完全硬化的状态,并在低温之后解除加压,故可防止因基板与芯片的热膨胀之差等引起的变形·挠曲,可得到所有电极的良好的连接。According to the bonding method of the present invention, after the mounting member is thermally and pressure-bonded to the substrate, it is cooled to below the glass transition point corresponding to the resin. Therefore, the resin is almost completely cured, and the pressure is released after a low temperature, so that deformation and deflection caused by the difference in thermal expansion between the substrate and the chip can be prevented, and good connection of all electrodes can be obtained.
在加热过程中最好是同时对支承构件进行加热。采用这种方法,通过加热支承构件,将来自支承构件的热量传递给基板。这样,对芯片与基板的双方进行加热,使两构件处于大致相同的温度,故可缓和因两构件的热膨胀系数之差引起的挠曲。特别是当基板是平板式显示面板的场合,因红外线透过基板,故最好是采用使支承构件的温度上升、从支承构件直接将热量传递给平板式显示面板的结构。The support member is preferably heated simultaneously during the heating process. In this way, by heating the support member, heat from the support member is transferred to the substrate. In this way, both the chip and the substrate are heated so that both members are at substantially the same temperature, so that warpage caused by a difference in thermal expansion coefficient between the two members can be alleviated. In particular, when the substrate is a flat display panel, since infrared rays pass through the substrate, it is preferable to adopt a structure in which the temperature of the supporting member is raised and the heat is directly transferred from the supporting member to the flat display panel.
又,弹性体最好是具有隔热性的构件。采用这种方法,因使用具有隔热性的弹性体将安装构件被覆,故可防止热量从被接合面通过弹性体漏出。由此可高效率地进行树脂的加热硬化。Also, the elastic body is preferably a heat insulating member. According to this method, since the mounting member is covered with a heat-insulating elastic body, it is possible to prevent heat from leaking from the surface to be joined through the elastic body. Thereby, heat hardening of resin can be efficiently performed.
又,为了实现上述目的,本发明还采用了如下结构。Moreover, in order to achieve the above object, the present invention also adopts the following structure.
本发明的搭接装置,将树脂夹在安装构件与基板之间、在基板上进行安装构件的安装,所述装置包含以下的要素:The bonding device of the present invention sandwiches the resin between the mounting member and the substrate, and mounts the mounting member on the substrate. The device includes the following elements:
载置保持所述基板的保持台;placing and holding a holding table for holding the substrate;
对所述被载置的基板上的多个安装构件同时进行加压的单一的加压装置;a single pressurizing device that simultaneously pressurizes a plurality of mounting members on the placed substrate;
加压所述多个安装构件时、被夹在安装构件与加压装置之间的弹性材料;an elastic material sandwiched between the mounting members and the pressing means when the plurality of mounting members are pressurized;
从下方将所述基板的所述安装构件的安装部分进行支承的支承构件;a support member supporting the mounting portion of the mounting member of the substrate from below;
以及从所述基板的下方照射红外线、使树脂加热硬化的加热装置。and a heating device for irradiating infrared rays from below the substrate to heat and harden the resin.
采用本发明的搭接装置,使用单一的加压装置,通过弹性材料从上方对载置保持于保持台的基板上的多个安装构件同时进行加压,并且使用支承构件从下方通过基板进行支承。此时,从基板下方照射红外线,使树脂加热硬化。由此,可高效率地将多个安装构件一次性安装在基板上。According to the overlapping device of the present invention, a single pressurizing device is used to simultaneously pressurize a plurality of mounting members placed and held on the substrate of the holding table from above with an elastic material, and to support the substrate from below using a supporting member. . At this time, infrared rays are irradiated from below the substrate to heat and harden the resin. Thereby, a plurality of mounting members can be efficiently mounted on the substrate at one time.
又,支承构件最好是玻璃支撑台,以形成有从加热装置输出的红外线通过该玻璃支撑台、只对基板上安装的芯片部分进行照射的输出部的形态,对该玻璃支撑台除了基板侧表面的一部分之外、使用金属膜将其它部分被覆。In addition, the support member is preferably a glass support table, and the infrared rays output from the heating device pass through the glass support table to irradiate only the part of the chip mounted on the substrate. Except for a part of the surface, the other part is covered with a metal film.
采用该结构,从加热装置输出的红外线通过该玻璃支撑台,只对基板上安装有安装构件的部位进行照射,因此,只是对基板局部性加热,可避免基板整体的温度上升。结果是可适用于平板式显示面板之类的热应力差的基板。According to this configuration, the infrared rays output from the heating device pass through the glass support table and irradiate only the portion of the substrate on which the mounting member is mounted. Therefore, the substrate is only locally heated and temperature rise of the entire substrate can be avoided. The result is that it is suitable for substrates with poor thermal stress such as flat panel display panels.
又,最好是使用金属膜将玻璃支撑台被覆,并且,在红外线照射的同时对玻璃支撑台进行加热。Also, it is preferable to cover the glass support base with a metal film, and to heat the glass support base while irradiating with infrared rays.
采用本结构,通过将玻璃支撑台、作成金属膜与热线吸收板玻璃并用,使玻璃支撑台本身的温度上升,作为加热器来使用。这样,可将热量从支承着基板的玻璃支撑台的前端部直接传递给安装有芯片的基板部分,同时通过红外线照射方式的加热,可更加高效率地进行树脂的加热硬化。并且,由于能将玻璃支撑台作为加热器使用,故不需要另外再配设加热器。According to this structure, the glass support base is used as a heater by raising the temperature of the glass support base itself by using the glass support base as a metal film together with the heat-absorbing plate glass. In this way, heat can be directly transferred from the front end of the glass support table supporting the substrate to the substrate portion on which the chip is mounted, and at the same time, the resin can be heated and hardened more efficiently by heating by infrared radiation. In addition, since the glass support table can be used as a heater, it is not necessary to separately arrange a heater.
又,被覆玻璃支撑台的金属膜最好是铝、金、铜、铬的任一种。Also, the metal film covering the glass support table is preferably any of aluminum, gold, copper, and chrome.
为了实现上述目的,本发明还采用了如下结构。In order to achieve the above object, the present invention also adopts the following structure.
本发明的搭接装置,还包含以下的要素:对所述玻璃支撑台进行加热的加热器。The bonding device of the present invention further includes the following element: a heater for heating the glass support table.
采用本结构,由加热器对玻璃支撑台进行加热,可将来自玻璃支撑台的热量直接传递给基板。这样,在使用红外线透过但温度不容易上升的玻璃基板时,可减小基板与安装构件的温度差。According to this structure, the glass support table is heated by the heater, and the heat from the glass support table can be directly transferred to the substrate. In this way, when using a glass substrate that transmits infrared rays but does not tend to increase in temperature, the temperature difference between the substrate and the mounting member can be reduced.
又,加热装置最好是在内部具有由金属膜被覆的椭圆体状的空间,将放射的红外线反射给金属膜,聚光后进行输出。Moreover, it is preferable that the heating device has an ellipsoid-shaped space covered with a metal film inside, and reflects emitted infrared rays to the metal film, condenses them, and outputs them.
采用该结构,通过使用金属膜将具有椭圆体状的内部空间的加热装置的内壁被覆,由内部的金属膜将放射的红外线反射,聚光后进行输出。这样,可以将红外线只对基板上的安装构件的部位进行照射。并且,可将红外线聚光向规定部位进行照射,可高效率地对树脂进行加热。另外,所谓椭圆体状是指其纵剖面是椭圆体状并具有深度的形状。According to this structure, the inner wall of the heating device having an ellipsoidal internal space is covered with a metal film, and the radiated infrared rays are reflected by the inner metal film, condensed, and output. In this way, infrared rays can be irradiated only to the portion on the substrate where the member is mounted. In addition, infrared rays can be condensed and irradiated to a predetermined location, and the resin can be heated efficiently. In addition, the term "ellipsoidal shape" refers to a shape in which the longitudinal section is ellipsoidal and has depth.
为了实现上述目的,本发明还采用了如下结构。In order to achieve the above object, the present invention also adopts the following structure.
本发明的搭接装置,还包含以下的要素:将加热硬化后的树脂冷却至玻璃化转变点附近以下的冷却装置。The bonding device of the present invention further includes a cooling device for cooling the heat-hardened resin to below the vicinity of the glass transition point.
采用该结构,在基板上使安装构件加热硬化之后,通过由吹风等的冷却装置进行冷却,可冷却至与该树脂对应的玻璃化转变点附近以下。这样,树脂成为基本上完全硬化的状态,并且,成为低温之后将加压解除,故可防止因基板与芯片的热膨胀之差等引起的变形·挠曲,可得到所有电极的良好的连接。According to this structure, after the mounting member is heated and hardened on the substrate, it can be cooled to below the vicinity of the glass transition point corresponding to the resin by cooling with a cooling device such as air blowing. In this way, the resin is almost completely cured, and the pressure is released after the temperature becomes low, so that deformation and deflection caused by the difference in thermal expansion between the substrate and the chip can be prevented, and good connection of all electrodes can be obtained.
为了实现上述目的,本发明还采用了如下结构。In order to achieve the above object, the present invention also adopts the following structure.
本发明的搭接装置,还包含以下的要素:向基板的背面侧进行送风的气嘴。The bonding device of the present invention further includes the following element: an air nozzle for blowing air to the rear side of the substrate.
采用该结构,通过在基板的背面侧配设气嘴,在使树脂加热硬化后将安装构件加热压接在基板上时,只对安装部分照射红外线进行加热,其它的基板背面的区域通过空气而被冷却。这样,比如当基板是玻璃基板时的背面侧具有偏光膜的场合,可以对耐热性差的偏光膜进行冷却保护。With this structure, by arranging the air nozzle on the back side of the substrate, when the mounting member is thermocompression bonded to the substrate after the resin is heated and cured, only the mounting part is irradiated with infrared rays to heat, and the other area on the back of the substrate is heated by air. was cooled. In this way, for example, when the substrate is a glass substrate and has a polarizing film on the back side, the polarizing film having poor heat resistance can be cooled and protected.
为了说明本发明,图示了现在认为是较合适的若干种形态,但希望理解成不是对发明作出图示所示的那种结构及方法的限定。In order to explain the present invention, some forms considered to be suitable at present are illustrated, but it should be understood that the invention is not limited to the structure and method shown in the figures.
附图说明Description of drawings
图1为表示传统的主压接装置大致结构的立体图。FIG. 1 is a perspective view showing a general structure of a conventional main crimping device.
图2为表示第1和第2实施例中的主压接装置大致结构的立体图。Fig. 2 is a perspective view showing a general structure of the main crimping device in the first and second embodiments.
图3为表示第1实施例中的头部周边的要部结构的剖视图。Fig. 3 is a cross-sectional view showing the structure of main parts around the head in the first embodiment.
图4为表示实施例装置的要部结构的剖视图。Fig. 4 is a cross-sectional view showing the structure of main parts of the device of the embodiment.
图5为表示将芯片在基板上加热压接状态的剖视图。FIG. 5 is a cross-sectional view showing a state where a chip is thermocompression-bonded on a substrate.
图6为表示第2实施例中的头部周边的要部结构的概略结构图。Fig. 6 is a schematic configuration diagram showing the configuration of main parts around the head in the second embodiment.
图7为表示第2实施例装置的真正压接方法的流程图。Fig. 7 is a flow chart showing the actual crimping method of the apparatus of the second embodiment.
具体实施方式Detailed ways
下面参照附图说明本发明的一实施例。An embodiment of the present invention will be described below with reference to the drawings.
[第1实施例][first embodiment]
在本实施例中,对使用ACP(Anisotropic Conductive Paste)、ACF、NCP、NCF(Non-Conductive Film)等的树脂、将安装构件、即芯片安装在基板上的场合的例子进行说明。In this embodiment, an example of the case where a mounting member, that is, a chip is mounted on a substrate using resin such as ACP (Anisotropic Conductive Paste), ACF, NCP, and NCF (Non-Conductive Film) will be described.
作为本发明中的「安装构件」,通常可以考虑采用比如IC芯片、半导体芯片、光元件、表面安装元件、芯片、晶片、TCP(Tape Carrier Package)、FPC(Flexible Printed Circuit)等的与种类及大小无关、是指与基板的接合侧的所有的形态,向平板式显示面板上进行芯片搭接方式的COG(Chip OnGlass)及TCP和FPC搭接方式的OLB(Outer Lead Bonding)。As the "mounting member" in the present invention, it is generally possible to consider the types and types of IC chips, semiconductor chips, optical components, surface mount components, chips, wafers, TCP (Tape Carrier Package), FPC (Flexible Printed Circuit), etc. Regardless of the size, it refers to all forms of the bonding side with the substrate, COG (Chip On Glass) of the chip bonding method to the flat panel display panel, and OLB (Outer Lead Bonding) of the TCP and FPC bonding method.
本发明中的「基板」的含义是指比如树脂基板、玻璃基板、薄膜基板等,只要是容易透过红外光或容易吸收后发热的基板即可。The "substrate" in the present invention means, for example, a resin substrate, a glass substrate, a film substrate, etc., as long as it is a substrate that easily transmits infrared light or easily absorbs and generates heat.
作为本发明中的从加热装置输出的「红外线」,比如是指含有远红外部分和近红外部分的波长的红外线。作为近红外线,比如最好是在波长800~1200nm的范围内。The "infrared rays" output from the heating device in the present invention refer to, for example, infrared rays with wavelengths including far-infrared and near-infrared. As near-infrared rays, for example, it is preferable to have wavelengths in the range of 800 to 1200 nm.
首先,参照附图具体说明本实施例所使用的装置。First, the apparatus used in this embodiment will be specifically described with reference to the drawings.
图2为表示本发明中的搭接装置、即主压接装置的大致结构的立体图,图3为表示实施例装置的要部结构的侧视图,图4为表示实施例装置的概略结构的侧视图。Fig. 2 is a perspective view showing the general structure of the lapping device in the present invention, that is, the main crimping device, Fig. 3 is a side view showing the main part structure of the embodiment device, and Fig. 4 is a side view showing the schematic structure of the embodiment device view.
如图2所示,本发明中的主压接装置1具有:将从未图示的临时压接单元搬送来的基板2进行水平保持的可动台3;从上方对芯片4进行加压的加压装置5;夹在芯片4与加压装置5之间的弹性材料6;从基板2的下方与加压装置5一起将芯片4夹住进行支承的玻璃支撑台7;对树脂进行加热硬化的红外线照射部8;以及对基板2进行冷却的冷却装置9。As shown in FIG. 2 , the main crimping device 1 in the present invention has: a movable table 3 for horizontally holding a
如图2所示,可动台3具有对基板2进行吸附保持的基板保持台10,该基板保持台10分别可移动自如地构成在水平2轴(X、Y)方向、上下(Z)方向、以及绕Z轴周围(θ)方向上。As shown in FIG. 2 , the movable table 3 has a substrate holding table 10 for sucking and holding the
加压装置5具有与配设于该装置5上方的气缸11连接并可进行上下运动的头部12。该头部12呈凸状,沿基板2的芯片排列方向延伸。即,由凸部前端通过弹性材料6同时对多个芯片4进行加压。The pressurizing device 5 has a
弹性材料6夹在加压装置5与芯片4之间,被悬架在配备成将处于待机位置的头部12夹入形态的卷装滚轴13和引出滚轴14上。另外,通过卷装该弹性材料6,可从引出滚轴14供给新的弹性材料6。另外,弹性材料6,比如可使用装有交叉(日文:クロス)玻璃的硅片等,最好是具有隔热性的弹性材料。The
通过使用具有隔热性的弹性材料,可以防止从芯片2的非搭接面侧向弹性材料传递的热量漏出。由此可更高效率地对树脂进行加热硬化。By using an insulating elastic material, it is possible to prevent the heat transferred from the non-bonding surface side of the
弹性材料6的厚度可根据使用的构件等进行适当变更。The thickness of the
如图2和图3所示,玻璃支撑台7是具有平坦部的锥状体,其前端可以支承安装有芯片4的基板2的背面部分,与加压装置5一样向基板2的芯片排列方向延伸。在其基板侧表面(图3中的上方)的倾斜部15上蒸镀有铝。只有平坦部开口。即,从红外线照射部8输出的红外线通过玻璃支撑台7,只能从开口部16输出,对基板上的树脂进行照射。As shown in Figures 2 and 3, the glass support table 7 is a cone-shaped body with a flat part, and its front end can support the back part of the
通过在玻璃支撑台7的倾斜部15上蒸镀铝,红外线不会从该部位漏出,故红外线不会照射到未安装有芯片4的基板上的部位。又,通过并用热线吸收板玻璃,对玻璃支撑台7进行加热,可利用该热量对基板2进行加热。By vapor-depositing aluminum on the
这样,只需对基板2进行局部性加热,即可避免基板整体的温度上升。又,玻璃支撑台7本身只能使红外线通过,不会积累加热器之类的过度的热量,结果是基板2不会受到因玻璃支撑台7本身发生的热应力。In this way, the temperature rise of the entire substrate can be avoided only by locally heating the
如图2和图4所示,红外线照射部8其外观是块状,配备于玻璃支撑台7的下方。其内部具有椭圆体状的空间17,底部具有放射红外线(比如近红外线和远红外线)的加热器18。又,其内壁被金属膜19、比如金等被覆。另外,红外线照射部8与本发明的加热装置相当。As shown in FIGS. 2 and 4 , the infrared irradiating unit 8 has a block-like appearance and is disposed below the glass support table 7 . It has an ellipsoidal space 17 inside, and a heater 18 that emits infrared rays (such as near infrared rays and far infrared rays) at the bottom. Also, the inner wall thereof is covered with a metal film 19 such as gold or the like. In addition, the infrared irradiation unit 8 corresponds to the heating device of the present invention.
即,从加热器18放射的红外线由内壁的金属膜19进行反射,向输出侧的开口部、即向如图4的箭头所示的玻璃支撑台7聚光后进行输出。That is, the infrared rays radiated from the heater 18 are reflected by the metal film 19 on the inner wall, condensed to the opening on the output side, that is, to the
如图3所示,冷却装置9配备于玻璃支撑台7的左右,向玻璃支撑台7的倾斜部15与基板2的背面侧之间供给空气。即,对照射红外线的基板背面部分和与基板2邻接的玻璃支撑台7的倾斜部15的表面进行冷却。As shown in FIG. 3 , the cooling device 9 is disposed on the left and right sides of the glass support table 7 , and supplies air between the
图4所示的控制部20,一旦结束了树脂的加热硬化处理,从冷却装置9供给空气,对基板2和玻璃支撑台7进行冷却,并且,当基板温度到达树脂的玻璃化转变点(Tg)时,停止空气的供给。The control unit 20 shown in FIG. 4 , once the heating and curing treatment of the resin is completed, air is supplied from the cooling device 9 to cool the
作为该冷却等的时间和条件的设定方法,通过事先的试验,一边测定芯片4、基板2、树脂的各温度一边进行条件设定。这样,在实际安装时,根据预先求出的条件和时间对温度等进行控制,故不需要对温度等进行实测。As a method of setting the time and conditions of the cooling and the like, the conditions are set while measuring the respective temperatures of the
在高速冷却时,最好是从基板上部直接对芯片4和树脂、以及基板上部进行吹风。When cooling at a high speed, it is preferable to blow air directly on the
下面参照附图对使用上述实施例装置、在基板上用ACF安装芯片的一系列动作进行说明。本实施例中,以将芯片完全真正压接于基板的场合为例、对前工序的临时压接工序中在将芯片预先临时压接于基板的状态下进行搬送的结构作出说明。Next, a series of operations for mounting a chip on a substrate using the ACF using the apparatus of the above embodiment will be described with reference to the accompanying drawings. In this embodiment, a case in which a chip is completely and actually crimped on a substrate is taken as an example, and a structure in which a chip is temporarily crimped on a substrate in advance in a preliminarily crimping step and transported will be described.
在前一阶段的临时压接工序中,夹有树脂地将芯片4临时压接的基板2,由未图示的搬送机构搬送至主压接装置1。该基板2向可动台3的基板保持台10上进行移载而被吸附保持。基板保持台10通过未图示的驱动机构向前方(图2中的Y方向)、即在头部12与玻璃支撑台7之间移动,以形成从上下方向由头部12和玻璃支撑台7将芯片4夹入的形态进行基板2的对位。In the temporary pressure-bonding process at the previous stage, the
一旦结束了基板2的对位,则通过未图示的驱动机构使头部12下降,由该头部12和位于基板2下侧的玻璃支撑台7同时将多个芯片4夹住。此时,由头部12使夹在芯片4与头部12之间的弹性材料6同时下降,将排列安装在基板上的多个芯片4同时覆盖。即,加压时,弹性材料6,如图5所示吸收芯片4的厚度偏差,对各芯片4施加大致均匀的压力。Once the alignment of the
这样,位于芯片4侧的压块21与基板电极22之间的导电粒子23也均匀地弹性变形,以充分确保两电极间的接触阻力。In this way, the conductive particles 23 located between the pressure piece 21 on the
一旦由头部12和玻璃支撑台7将芯片4夹住,则从红外线照射部8输出红外线。如图4所示,红外线由红外线照射部8的内壁反射,在输出侧的开口部聚光后向玻璃支撑台7输出。Once the
被输出的红外线通过玻璃支撑台7以从基板侧的开口部16聚光的状态进行输出。被输出的红外光(红外线),不仅被基板2(玻璃基板)吸收,而且透过基板2也被树脂和芯片4所吸收,高效率地对树脂进行加热硬化。特别是吸收了红外线的基板2和芯片4其本身温度上升,将该热量传递给树脂。这样,红外线只能照射到基板上安装有芯片4的部位,可实现只对安装部分进行加热的目的。The output infrared rays are output in a state of being condensed from the opening 16 on the substrate side through the glass support table 7 . The output infrared light (infrared rays) is not only absorbed by the substrate 2 (glass substrate), but also transmitted through the
在经过规定时间照射红外线后结束红外线的照射,从冷却装置9供给空气,从背面侧及/或上面对基板2进行冷却。After the irradiation of infrared rays has elapsed for a predetermined time, the irradiation of infrared rays is terminated, and air is supplied from the cooling device 9 to cool the
当处于Tg温度附近以下时将加压解除,使头部12返回至上方的待机位置,将基板保持台10移动至基板交接位置。移动到交接位置的基板2通过未图示的基板搬送机构向基板收容单元搬送,收容在基板回收箱中。When the temperature is below the vicinity of the Tg temperature, the pressurization is released, the
以上,结束芯片4对1个基板2的搭接。As above, bonding of the
如上所述,通过将弹性材料6夹在多个芯片4与头部12之间进行加热压接,由弹性材料6将各个芯片4的厚度偏差吸收,可将多个芯片4一次性均等地加热压接在基板2上,可缩短加热压接时间、即提高作业效率。As described above, by sandwiching the
又,在基板侧表面配设有输出红外线的开口部16,利用由金属膜被覆其它部分的玻璃支撑台7和由金属膜19被覆内部空间17的整个内壁、将由内部反射的红外线聚光后输出的红外线照射部8,由此可使红外线只能向基板2的安装有芯片4的部位进行照射。这样,仅使基板2的温度局部性上升,可避免基板整体的温度上升。In addition, an opening 16 for outputting infrared rays is provided on the side surface of the substrate, and the infrared rays reflected internally are condensed and output by using the glass support table 7 covered with a metal film 19 and the entire inner wall of the internal space 17 covered with a metal film 19. Infrared irradiating part 8, so that infrared rays can only be irradiated to the part of the
又,可以使红外线透过基板,更加促使树脂硬化。In addition, infrared rays can be transmitted through the substrate, and the hardening of the resin can be further promoted.
如上所述,由于可缩短对基板2的加热时间以及避免基板整体的温度上升,因此,对于热应力差的平板式显示面板之类的基板,能有效地利用于本As described above, since the heating time for the
实施例装置。Example device.
并且,在使树脂加热硬化之后,在冷却到达玻璃化转变点后,通过将由头部12的加压解除,使树脂成为大致完全硬化的状态。即,因在低温下将加压解除,故可消除因基板2与芯片4的热膨胀之差引起的变形·挠曲。结果是能可靠地对安装有芯片4的基板进行使用。Then, after the resin is heated and cured, it is cooled to reach the glass transition point, and the pressure from the
[第2实施例][Second embodiment]
作为本实施例的装置结构,只有加压装置周围与上述的第1实施例装置不同,在相同的部位上标记同一符号,对于不同的部分进行说明。The device configuration of this embodiment differs from the device of the first embodiment above only around the pressurizing device, and the same symbols are assigned to the same parts, and the different parts will be described.
图6为表示本发明中的搭接装置的要部结构的主视图。Fig. 6 is a front view showing the main part structure of the overlapping device in the present invention.
如图6所示,主压接装置,具有:将从未图示的临时压接单元搬送来的基板2进行水平保持的可动台3;从上方对芯片4进行加压的加压装置5;夹在芯片4与加压装置5之间的弹性材料6;与加压装置5一起从基板2的下方将芯片4夹入状地进行支承的玻璃支撑台7;对玻璃支撑台7进行加热的加热器50;红外线照射部8;分别从上方和下方向基板2供给空气的气嘴51;以及对这些各构成进行总体性控制的控制部53。As shown in FIG. 6 , the main pressure-bonding device includes: a movable table 3 that horizontally holds a
如图2所示,可动台3具有对基板2进行吸附保持的基板保持台10,该基板保持台10分别可移动自如地构成在水平2轴(X、Y)方向、上下(Z)方向、以及绕Z轴周围(θ)方向上。As shown in FIG. 2 , the movable table 3 has a substrate holding table 10 for sucking and holding the
加压装置5的头部12未图示地配设有加热器(比如陶瓷加热器)以及使冷却介质循环用的流路。即,在使树脂加热硬化时,由加热器对头部12进行加热,将弹性材料6进行加热。通过由加热器将弹性材料6加热,可避免芯片4吸收红外线所拥有的热量被导热给与非搭接侧接触的弹性材料6而造成损失。即,对于弹性材料6为无隔热性或隔热性差的物体时具有效果。The
在采用真正压接的加热后的冷却过程中,流路用于头部12的冷却。具体来讲,配设于加热器的上部,在流路中使冷却介质、比如空气和冷却水进行循环。During cooling after heating with true crimping, the flow path is used for cooling of the
加热器50是加热玻璃支撑台7、利用该热量对基板进行加热用的构件。如图6所示,该加热器50安装在离基板2为规定距离的玻璃支撑台7的侧壁上,由控制部53进行温度控制。The
配备于基板下方的气嘴51,是在加热玻璃支撑台7时、对玻璃支撑台7与基板2接触部分附近区域的导热进行抑制用的构件,向基板背面供给空气。The
气嘴51按照来自控制部53的控制信号,通过阀V的开闭操作,从空气供给源55供给空气。The
控制部53,是总体性执行对玻璃支撑台7进行加热的加热器50的温度进行调节以及对基板2和芯片4进行冷却用的气嘴51的空气的供给进行调节等的构件。另外,对于具体的各部的控制详见后述。The
下面,对采用上述的主压接装置在基板上的树脂(ACF)部分对芯片进行真正压接时、在树脂的加热硬化后的冷却过程中边调节温度边将芯片固接在基板上的方法作出说明。关于具体的方法,参照图7的流程进行说明。Next, when the chip is actually crimped on the resin (ACF) part on the substrate using the above-mentioned main crimping device, the method of fixing the chip on the substrate while adjusting the temperature during the cooling process after the resin is heated and hardened Make an explanation. A specific method will be described with reference to the flowchart in FIG. 7 .
<步骤S1>基板对位<Step S1> Substrate Alignment
基板2通过未图示的搬送机构被搬送到主压接装置。该基板2被移载在可动台3的基板保持台10上进行吸附保持。基板保持台10通过未图示的驱动机构朝向前方(图2的Y方向)、即在头部12与玻璃支撑台7之间进行移动,以夹有弹性材料6地由头部5和玻璃支撑台7从上下方向将芯片4夹入的形态对基板2进行对位,。The
<步骤S2>加热工序<Step S2> Heating process
使树脂的温度上升至比如190℃以上,由控制部53对向安装部分的红外线IR的照射程度(比如、输出程度或开·闭切换方式)以及照射时间进行调节。作为对于ACF情况下的设定温度最好是200~220℃范围。当设定温度低于190℃时,有损于树脂的硬化促进,若超过220℃、甚至240℃以上,则树脂的耐热性方面存在着问题。The temperature of the resin is raised to, for example, 190° C. or higher, and the irradiation degree (for example, output degree or on/off switching method) and irradiation time of infrared rays IR to the mounting portion are adjusted by the
此时,从气嘴51向基板背面供给空气,对芯片安装部分以外的区域进行冷却。即,适用于具有耐热性差的偏光膜的玻璃基板。At this time, air is supplied from the
<步骤S3>冷却开始<Step S3> Cooling starts
一旦加热工序结束,则开始冷却,以使树脂温度达到Tg温度。具体来讲,按照以下顺序进行冷却。Once the heating process is over, cooling is started so that the resin temperature reaches the Tg temperature. Specifically, cooling is performed in the following order.
首先,根据来自控制部53的加热OFF信号将未图示的阀开放,开始向头部内供给空气。随着该空气的供给对头部内的加热器进行冷却。此时,利用大气开放状态下的冷却以及头部12快速的冷却所引起的传热,能有效地使树脂冷却。First, a valve (not shown) is opened in response to a heating OFF signal from the
一旦到达与各树脂对应的Tg温度附近、比如对于ACF情况下为到达Tg温度+20℃时,则停止头部12的冷却,控制部53对阀V进行开放操作,从基板下方的气嘴51向芯片4供给空气,同时对加热器50的温度进行调节。Once it reaches the vicinity of the Tg temperature corresponding to each resin, for example, in the case of ACF, when it reaches the Tg temperature + 20°C, the cooling of the
作为这些温度调节的时间和条件的设定方法,通过事先试验,一边测定芯片4、基板2和树脂的各温度一边进行条件设定。As a method of setting the time and conditions of these temperature adjustments, the conditions are set while measuring the respective temperatures of the
<步骤S4>解除加压<Step S4> Release the pressurization
冷却温度一旦到达Tg温度,将头部12对芯片的加压解除,使头部12返回到上方待机位置。Once the cooling temperature reaches the Tg temperature, the pressurization of the chip by the
<步骤S5>取出基板<Step S5> Take out the substrate
一旦将头部12的加压解除,则将基板保持台10移动到基板交接位置。移动到交接位置的基板2通过未图示的基板搬送机构搬送至基板收容单元,被收容在基板回收箱中。Once the pressure of the
以上,结束对1个基板2的芯片4的真正压接。As above, the actual pressure-bonding of the
本发明不限定于上述实施例,可以进行如下的变形实施。The present invention is not limited to the above-described embodiments, and may be implemented in the following modifications.
(1)上述实施例是使用金属膜将红外线照射部的内部空间的整个内壁面被覆,但也可用金属膜将一部分被覆。比如,也可用金属膜只将图4的下半部分被覆。(1) In the above-described embodiment, the entire inner wall surface of the inner space of the infrared irradiating part is covered with a metal film, but a part of the inner wall surface may be covered with a metal film. For example, only the lower half of Fig. 4 may be covered with a metal film.
又,也可将红外线照射部作成上下可分割的结构,由此可提高维修性。In addition, the infrared irradiating portion may be configured to be vertically divisible, thereby improving maintainability.
(2)上述实施例是在玻璃支撑台7的倾斜部15上蒸镀有铝,但也可不用铝,改为比如蒸镀金、铜、铬等。(2) In the above-mentioned embodiment, aluminum is vapor-deposited on the
通过并用热吸收板玻璃,随着红外线的照射使金属部分的温度上升,玻璃支撑台7本身的温度也上升,可将玻璃支撑台7作为加热器来使用。即,玻璃支撑台7的温度上升,从与基板2抵接的前端部直接将热量传递给基板2。By using the heat-absorbing plate glass together, the temperature of the metal portion rises with the irradiation of infrared rays, and the temperature of the
由此,在使树脂硬化时,通过红外线的照射对芯片4和树脂进行加热,基板2也同时加热,使芯片4和基板2上升至大致相同的温度。在此状态下对树脂进行加热,将芯片4安装在基板2上,然后对芯片4和基板2同时进行冷却,到达基本上完全硬化的Tg温度附近,由此可缓和因芯片4与基板2的热膨胀系数之差引起的挠曲,能将芯片4可靠地固接在基板2上。Thus, when the resin is cured, the
特别是在采用平板式显示面板之类的玻璃基板时,因芯片4和玻璃基板的热膨胀系数大致与3ppm相等,故通过对芯片4和玻璃基板同时加热和同时冷却,可进一步缓和挠曲的发生。Especially when a glass substrate such as a flat panel display panel is used, since the thermal expansion coefficient of the
又,从红外线透过玻璃基板使热量不容易积聚的角度出发,最好是将热量从玻璃支撑台7直接传递给玻璃基板。Also, from the viewpoint that infrared rays pass through the glass substrate so that heat is not easily accumulated, it is preferable to directly transfer the heat from the glass support table 7 to the glass substrate.
又,在平板式显示面板上安装芯片4的场合,最好不要将热应力施加于整个基板。这样,在将玻璃支撑台7作为加热器使用时,最好是向玻璃支撑台7的倾斜部15吹风,不要使来自金属膜的放射热到达基板2,而是从与基板抵接的玻璃支撑台7的前端将热量局部性进行传递。Also, when the
本发明在不脱离其思想或本质的情况下可实施其它的具体形态,因此,作为发明所述的范围,不单是以上的说明,应参照后面附加的权利要求。The present invention can be implemented in other specific forms without departing from its idea or essence. Therefore, the scope of the invention should not be limited to the above description, and the appended claims should be referred to.
Claims (14)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003-378048 | 2003-11-07 | ||
| JP2003378048 | 2003-11-07 | ||
| JP2003378048A JP4001341B2 (en) | 2003-11-07 | 2003-11-07 | Bonding method and apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN1614760A true CN1614760A (en) | 2005-05-11 |
| CN100426479C CN100426479C (en) | 2008-10-15 |
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| CNB2004100858875A Expired - Fee Related CN100426479C (en) | 2003-11-07 | 2004-11-05 | Bonding method and apparatus |
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| Country | Link |
|---|---|
| JP (1) | JP4001341B2 (en) |
| KR (1) | KR101189290B1 (en) |
| CN (1) | CN100426479C (en) |
| TW (1) | TWI373078B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108475484A (en) * | 2017-06-22 | 2018-08-31 | 深圳市柔宇科技有限公司 | Bogey and press equipment |
| CN110914962A (en) * | 2017-05-29 | 2020-03-24 | 株式会社新川 | Packaging device and manufacturing method of semiconductor device |
| CN116577629A (en) * | 2022-02-09 | 2023-08-11 | 株式会社爱德万测试 | Electronic component processing equipment and electronic component testing equipment |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4687273B2 (en) * | 2005-06-23 | 2011-05-25 | 住友電気工業株式会社 | Electronic component mounting method |
| JP4872291B2 (en) * | 2005-09-27 | 2012-02-08 | 住友電気工業株式会社 | Electrode connection method, electrode connection device, and method for manufacturing wiring board assembly |
| KR100691810B1 (en) | 2006-02-17 | 2007-03-12 | 주식회사 나래나노텍 | Improved pattern electrode bonding device |
| KR100734422B1 (en) * | 2006-03-08 | 2007-07-03 | 삼성전자주식회사 | Bonding device for LCD |
| KR20110027714A (en) * | 2008-06-05 | 2011-03-16 | 스미토모 베이클라이트 가부시키가이샤 | Manufacturing Method of Semiconductor Device and Semiconductor Device |
| JPWO2010050209A1 (en) * | 2008-10-31 | 2012-03-29 | 東レ株式会社 | Method and apparatus for joining electronic component and flexible film substrate |
| KR101119541B1 (en) * | 2009-11-30 | 2012-02-22 | (주)멜파스 | Apparatus of compressing for acf bonding and method of the same |
| JP2011199184A (en) * | 2010-03-23 | 2011-10-06 | Fujifilm Corp | Substrate mounting device and substrate mounting method |
| WO2014142330A1 (en) * | 2013-03-15 | 2014-09-18 | 株式会社ニコン | Biochip fixing method, biochip fixing device, and screening method for biomolecule array |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS6444918A (en) * | 1987-08-13 | 1989-02-17 | Konishiroku Photo Ind | Production of liquid crystal display device |
| JPH07130795A (en) * | 1993-11-04 | 1995-05-19 | Matsushita Electric Ind Co Ltd | Semiconductor element connecting method and semiconductor element connecting apparatus |
| JPH09297318A (en) * | 1996-03-06 | 1997-11-18 | Seiko Epson Corp | Liquid crystal device, liquid crystal device manufacturing method, and electronic apparatus |
| JP3815149B2 (en) * | 1999-11-04 | 2006-08-30 | セイコーエプソン株式会社 | Component mounting method and electro-optical device manufacturing method |
| JP2003303851A (en) * | 2002-02-05 | 2003-10-24 | Toray Eng Co Ltd | Chip mounting method and device using the same |
| JP3949031B2 (en) * | 2002-02-05 | 2007-07-25 | 東レエンジニアリング株式会社 | Chip mounting method |
-
2003
- 2003-11-07 JP JP2003378048A patent/JP4001341B2/en not_active Expired - Fee Related
-
2004
- 2004-11-01 TW TW093133160A patent/TWI373078B/en not_active IP Right Cessation
- 2004-11-04 KR KR1020040089197A patent/KR101189290B1/en not_active Expired - Fee Related
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110914962A (en) * | 2017-05-29 | 2020-03-24 | 株式会社新川 | Packaging device and manufacturing method of semiconductor device |
| CN108475484A (en) * | 2017-06-22 | 2018-08-31 | 深圳市柔宇科技有限公司 | Bogey and press equipment |
| CN108475484B (en) * | 2017-06-22 | 2022-02-15 | 深圳市柔宇科技股份有限公司 | Bearing device and laminating equipment |
| CN116577629A (en) * | 2022-02-09 | 2023-08-11 | 株式会社爱德万测试 | Electronic component processing equipment and electronic component testing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200522238A (en) | 2005-07-01 |
| CN100426479C (en) | 2008-10-15 |
| KR101189290B1 (en) | 2012-10-15 |
| KR20050044257A (en) | 2005-05-12 |
| TWI373078B (en) | 2012-09-21 |
| JP4001341B2 (en) | 2007-10-31 |
| JP2005142397A (en) | 2005-06-02 |
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Address after: Kanagawa Patentee after: Japanese Innolux Limited by Share Ltd of Japan Patentee after: Tourara Engineering Co., Ltd. Address before: Tokyo, Japan, Japan Patentee before: International Display Technology Co., Ltd. Patentee before: Tourara Engineering Co., Ltd. |
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