CN1667144A - Preparation of NiAl Shape Memory Alloy Thin Films by Alloying Ultrathin Laminates by Cold Rolling - Google Patents
Preparation of NiAl Shape Memory Alloy Thin Films by Alloying Ultrathin Laminates by Cold Rolling Download PDFInfo
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- 229910001285 shape-memory alloy Inorganic materials 0.000 title claims abstract description 32
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910000943 NiAl Inorganic materials 0.000 title claims abstract description 26
- 238000005275 alloying Methods 0.000 title claims abstract description 21
- 238000002360 preparation method Methods 0.000 title claims 7
- 239000010409 thin film Substances 0.000 title abstract description 17
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 29
- 239000000956 alloy Substances 0.000 claims abstract description 29
- 238000005097 cold rolling Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 238000000137 annealing Methods 0.000 claims abstract description 5
- 238000009792 diffusion process Methods 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 16
- 230000003446 memory effect Effects 0.000 claims description 5
- 238000010791 quenching Methods 0.000 claims description 2
- 230000000171 quenching effect Effects 0.000 claims description 2
- 239000006104 solid solution Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 4
- 238000002791 soaking Methods 0.000 claims 2
- 239000007858 starting material Substances 0.000 claims 2
- 239000010408 film Substances 0.000 abstract description 29
- 239000011888 foil Substances 0.000 abstract description 18
- 238000003475 lamination Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 5
- 239000013078 crystal Substances 0.000 abstract 1
- 239000000376 reactant Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 19
- 239000002994 raw material Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 5
- 229910000734 martensite Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910000601 superalloy Inorganic materials 0.000 description 3
- 230000009466 transformation Effects 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 229910001000 nickel titanium Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000007578 melt-quenching technique Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000007712 rapid solidification Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005482 strain hardening Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Abstract
Description
技术领域technical field
本发明涉及形状记忆合金领域,具体涉及一种冷轧超薄叠层合金化制备NiAl形状记忆合金薄膜的方法。用该方法制备的薄膜具有生产工艺简单,成分容易控制,力学性能好的优点。The invention relates to the field of shape-memory alloys, in particular to a method for preparing NiAl shape-memory alloy films by cold-rolling ultra-thin lamination alloying. The thin film prepared by the method has the advantages of simple production process, easy control of components and good mechanical properties.
技术背景technical background
现今应用的大多数形状记忆合金受其热弹性马氏体相变温度的影响,工作温度大都低于100℃,但在核动力、航空航天、汽车、电机、化工、油气勘探等工程领域,却对具有更高相变温度的高温形状记忆合金有特别的兴趣和需求。所以,高温形状记忆合金的研制和开发颇具工程应用前景,必将有助于下世纪工程技术领域自动化及自适应能力的升级。Most of the shape memory alloys used today are affected by their thermoelastic martensitic phase transition temperature, and their working temperatures are mostly lower than 100°C. There is particular interest and demand for high temperature shape memory alloys with higher phase transition temperatures. Therefore, the research and development of high-temperature shape memory alloys has considerable engineering application prospects, and will definitely help to upgrade automation and self-adaptive capabilities in the field of engineering technology in the next century.
目前高温形状记忆合金主要有:CuAlNi系、NiTi系、NiAl系。CuAlNi系合金使用温度也只在150℃~200℃左右,限制了其在更高温度范围的使用,而且目前还存在冷加工困难,晶粒粗大,疲劳寿命低的缺点。在NiTi合金的基础上,添加Pd、Pt、Au、Zr和Hf等合金元素虽然能将相变温度提高到500℃以上,但造价极为昂贵,限制了它的使用范围。At present, the high-temperature shape memory alloys mainly include: CuAlNi series, NiTi series, and NiAl series. The service temperature of CuAlNi alloy is only about 150°C-200°C, which limits its use in a higher temperature range, and currently has the disadvantages of difficult cold working, coarse grains, and low fatigue life. On the basis of NiTi alloy, adding alloy elements such as Pd, Pt, Au, Zr and Hf can increase the phase transition temperature to above 500 °C, but the cost is extremely expensive, which limits its application range.
Ni含量在60~70at%的NiAl合金的Ms点随Ni的含量不同可在-150~900℃之间变化。由于合金含有大量的Al,呈现良好的高温抗氧化性能及导热性能。此外,NiAl作为高温形状记忆合金还具有熔点高(比Ni基高温合金约高250℃)、密度低(约是Ni基高温合金的2/3)、导热性好(为Ni基高温合金的4-8倍)的优点,被认为是发展潜力最大的高温形状记忆合金之一。The Ms point of the NiAl alloy with a Ni content of 60-70 at% can vary between -150 and 900 °C depending on the Ni content. Since the alloy contains a large amount of Al, it exhibits good high temperature oxidation resistance and thermal conductivity. In addition, as a high-temperature shape memory alloy, NiAl also has a high melting point (about 250 ° C higher than that of Ni-based superalloys), low density (about 2/3 of Ni-based superalloys), and good thermal conductivity (4 times that of Ni-based superalloys). -8 times) advantages, is considered to be one of the high-temperature shape memory alloys with the greatest development potential.
NiAl相对其他高温形状记忆合金具有明显的优势,本应很广泛的应用。但由于NiAl是金属间化合物,与大多数金属间化合物一样,室温几乎不能塑性变形,这严重阻碍了它的实际应用。为了改善其室温脆性,前人采用了多种方法,如合金化、细化晶粒等。用合金化法,比如加入Fe、Mn等元素,形成了具有很好塑性的γ相,但是γ相的形成致使马氏体相变温度Ms点大大降低,同时使形状记忆效应减弱;同时第二相的形成,减少合金中Al的含量,将降低合金的抗氧化性能,削弱NiAl作为高温形状记忆合金的优势,没有显著解决NiAl合金室温脆性这一关键问题,通过冷轧的方法根本不能制备NiAl合金薄膜。而薄膜驱动元件将是形状记忆合金应用的一个主要领域。Compared with other high-temperature shape memory alloys, NiAl has obvious advantages and should be widely used. However, since NiAl is an intermetallic compound, like most intermetallic compounds, it can hardly be plastically deformed at room temperature, which seriously hinders its practical application. In order to improve its room temperature brittleness, predecessors have adopted a variety of methods, such as alloying, grain refinement and so on. Alloying method, such as adding Fe, Mn and other elements, forms a γ phase with good plasticity, but the formation of γ phase causes the martensitic transformation temperature Ms point to be greatly reduced, and at the same time weakens the shape memory effect; at the same time, the second The formation of phases, reducing the content of Al in the alloy, will reduce the oxidation resistance of the alloy, weaken the advantages of NiAl as a high-temperature shape memory alloy, and have not significantly solved the key problem of room temperature brittleness of NiAl alloys, and NiAl cannot be prepared by cold rolling at all. alloy film. Thin-film drive elements will be a major field of application of shape memory alloys.
这是因为形状记忆合金的驱动受热激励,因此块体形状记忆合金的响应频率低,仅1HZ,比压电材料、磁致伸缩材料等其他驱动材料要低几个数量级。为了提高形状记忆合金的响应频率,必须采用比表面积大,散热能力强的薄膜。为了制备CuAlNi基合金薄膜,人们采用了快速凝固的方法。这种方法虽然能获得厚度小于100μm的NiAl合金薄膜的,但薄膜受到宽度的限制,不适合工业生产。This is because the driving of shape memory alloys is excited by heat, so the response frequency of bulk shape memory alloys is low, only 1HZ, which is several orders of magnitude lower than other driving materials such as piezoelectric materials and magnetostrictive materials. In order to increase the response frequency of the shape memory alloy, a film with a large specific surface area and a strong heat dissipation capability must be used. In order to prepare CuAlNi-based alloy thin films, a rapid solidification method is used. Although this method can obtain a NiAl alloy film with a thickness less than 100 μm, the film is limited by its width and is not suitable for industrial production.
最近发展的冷轧超薄叠层合金化制备合金薄膜的方法,使得我们能采用现有的常规轧制设备,低成本大面积制备NiAl形状记忆合金薄膜。此种方法采用塑性好,变形容易的纯金属或合金箔为原材料,按设计的成分配比确定箔的厚度,将金属箔交互重叠放置,大变形冷轧后获得超薄叠层的三明治结构,根据需要,可以将冷轧后的超薄叠层对折后再次冷轧,如此反复,最后进行扩散退火合金化,获得成分均匀的合金薄膜。其生产工艺流程见附图所示。The recently developed method of cold-rolling ultra-thin lamination alloying to prepare alloy thin films enables us to use existing conventional rolling equipment to prepare NiAl shape memory alloy thin films in large areas at low cost. This method uses pure metal or alloy foil with good plasticity and easy deformation as the raw material. The thickness of the foil is determined according to the designed composition ratio, and the metal foils are placed alternately. After large deformation cold rolling, an ultra-thin laminated sandwich structure is obtained. If necessary, the cold-rolled ultra-thin laminate can be folded in half and then cold-rolled again, and so on, and finally alloyed by diffusion annealing to obtain an alloy film with uniform composition. Its production process is shown in the attached drawing.
发明内容Contents of the invention
本发明的目的是提供一种利用常规的轧制设备,通过冷轧超薄叠层合金化的方法,制备大面积、低成本NiAl形状记忆合金薄膜。The purpose of the present invention is to provide a method for preparing large-area, low-cost NiAl shape memory alloy thin films through cold rolling ultra-thin lamination alloying method using conventional rolling equipment.
NiAl形状记忆合金薄膜的原子组成式为Ni1-xAlx,其组成比满足0.30≤x≤0.40。The atomic composition formula of the NiAl shape memory alloy thin film is Ni 1-x Al x , and its composition ratio satisfies 0.30≤x≤0.40.
冷轧超薄叠层合金化制备大面积NiAl形状记忆合金薄膜的方法:根据设计的原子组成比率,以镍箔,铝箔为原材料,交互重叠放置,大变形冷轧后获得超薄叠层的三明治结构,根据需要,可以将冷轧后的超薄叠层对折后再次冷轧,如此反复。最后在673K~923K的温度范围内保温进行扩散退火,获得成分均匀的合金薄膜。为了使薄膜具有形状记忆效应,合金化后的薄膜还需进行1373K以上的固溶加淬火的β化处理。The method of preparing large-area NiAl shape memory alloy film by cold-rolling ultra-thin lamination alloying: according to the designed atomic composition ratio, nickel foil and aluminum foil are used as raw materials, alternately stacked and placed, and an ultra-thin lamination sandwich is obtained after large deformation cold rolling According to the needs, the cold-rolled ultra-thin laminate can be folded in half and then cold-rolled again, and so on. Finally, the diffusion annealing is carried out with heat preservation in the temperature range of 673K-923K to obtain an alloy thin film with uniform composition. In order to make the thin film have a shape memory effect, the alloyed thin film needs to be subjected to a beta treatment of solid solution and quenching above 1373K.
与现有技术相比,本发明具有如下优点:Compared with prior art, the present invention has following advantage:
1)首次采用冷轧合金化法制备了NiAl形状记忆合金薄膜,解决了NiAl合金在室温因脆性难以制备和加工的问题。其制备的薄膜具有较好的形状记忆效应和塑性,可以满足作为驱动材料的要求。1) For the first time, NiAl shape memory alloy film was prepared by cold rolling alloying method, which solved the problem that NiAl alloy was difficult to prepare and process at room temperature due to its brittleness. The film prepared by it has good shape memory effect and plasticity, and can meet the requirements of being a driving material.
2)能制备大面积的NiAl形状记忆合金薄膜。采用熔体快淬和溅射法只能制备小面积的薄膜,而采用冷轧超薄叠层合金化的方法,能制取宽度大于50mm、长几米到几十米的薄膜,适合大规模工业生产。2) Large-area NiAl shape memory alloy films can be prepared. The melt quenching and sputtering methods can only prepare small-area thin films, but the cold-rolled ultra-thin laminated alloying method can produce thin films with a width greater than 50 mm and a length of several meters to tens of meters, which is suitable for large-scale industries. Production.
3)制备的NiAl形状记忆合金薄膜塑性较好,疲劳寿命高。采用冷轧超薄叠层合金化制备的NiAl合金薄膜晶粒细小,仅几个μm,比目前合金的晶粒低一个数量级,因此具有较好的塑性和较高的疲劳寿命。3) The prepared NiAl shape memory alloy film has good plasticity and high fatigue life. The NiAl alloy thin film prepared by cold-rolled ultra-thin lamination alloying has fine grains, only a few μm, which is an order of magnitude lower than the current alloy grains, so it has better plasticity and higher fatigue life.
4)所制备的薄膜具有低成本高性能的特点。由于组元具有良好的冷变形能力,因此利用现有的冷轧设备就可生产,不需要昂贵的特殊设备,所以成本较低。具有很强的市场竞争力。4) The prepared film has the characteristics of low cost and high performance. Because the component has good cold deformation ability, it can be produced by using existing cold rolling equipment, and does not require expensive special equipment, so the cost is relatively low. Has strong market competitiveness.
附图说明Description of drawings
本发明冷轧超薄叠层合金化制备NiAl形状记忆合金薄膜的加工路线示意图。A schematic diagram of a processing route for preparing a NiAl shape memory alloy thin film by cold-rolling ultra-thin lamination alloying in the present invention.
具体实施方式Detailed ways
本发明制备的NiAl形状记忆合金薄膜的原子组成式为Ni1-xAlx,其组成比满足0.30≤x≤0.40。The atomic composition formula of the NiAl shape memory alloy thin film prepared by the invention is Ni 1-x Al x , and its composition ratio satisfies 0.30≤x≤0.40.
研究表明当二元NiAl合金的Ms点高于530K以上时,马氏体向Ni5Al3相的转变将先于马氏体的逆转变,因此要使二元NiAl合金具有形状记忆效应,合金的Ms点必须低于530K。但如果Ms点过低,合金又将失去应用价值。因此在优选的实施方式中,0.355≤x≤0.37。Studies have shown that when the Ms point of the binary NiAl alloy is higher than 530K, the transformation of martensite to Ni 5 Al 3 phase will be prior to the reverse transformation of martensite. Therefore, to make the binary NiAl alloy have a shape memory effect, the alloy The Ms points must be below 530K. But if the Ms point is too low, the alloy will lose its application value. Thus in a preferred embodiment, 0.355≦x≦0.37.
实施例1Example 1
根据设计的成分配方Ni0.63Al0.37,采用厚度为0.180mm的Ni箔,0.160mm的Al箔为原材料,交互重叠放置10层。首先以65%的变形量冷轧到1.200mm,然后再冷轧到0.080mm,将冷轧的薄膜对折重叠,再冷轧到0.080mm,如此反复10道次。最后将冷轧10道次的薄膜于773K下保温50小时,进行合金化。合金化后的薄膜再加热到1373K,保温0.5小时水淬,电阻法测定合金的Ms点为271K,243K弯曲3%加热后形状完全恢复。According to the designed composition formula Ni 0.63 Al 0.37 , Ni foil with a thickness of 0.180mm and Al foil with a thickness of 0.160mm are used as raw materials, and 10 layers are placed alternately. First cold rolling to 1.200mm with a deformation of 65%, and then cold rolling to 0.080mm, the cold rolled film is folded and overlapped, and then cold rolled to 0.080mm, and so on for 10 passes. Finally, the cold-rolled 10-pass film was kept at 773K for 50 hours for alloying. The alloyed film was reheated to 1373K, kept warm for 0.5 hours and quenched in water. The Ms point of the alloy was determined to be 271K by the resistance method, and the shape was completely restored after bending at 243K with 3% heating.
实施例2Example 2
根据设计的成分配方Ni0.635Al0.365,采用厚度为0.140mm的Ni箔,0.122mm的Al箔为原材料,交互重叠放置10层。首先以62%的变形量冷轧到1.000mm,然后再冷轧到0.080mm,将冷轧的薄膜对折重叠,再冷轧到0.080mm,如此反复10道次。最后将冷轧10道次的薄膜于873K下保温30小时,进行合金化。合金化后的薄膜再加热到1423K,保温0.3小时水淬,电阻法测定合金的Ms点为342K,室温弯曲3%加热后形状完全恢复。According to the designed composition formula Ni 0.635 Al 0.365 , Ni foil with a thickness of 0.140mm and Al foil with a thickness of 0.122mm are used as raw materials, and 10 layers are alternately stacked. First cold rolling to 1.000mm with a deformation of 62%, and then cold rolling to 0.080mm, the cold rolled film is folded and overlapped, and then cold rolled to 0.080mm, and so on for 10 passes. Finally, the cold-rolled 10-pass film was kept at 873K for 30 hours for alloying. The alloyed film was reheated to 1423K, kept warm for 0.3 hours and water quenched. The Ms point of the alloy was determined to be 342K by the resistance method, and the shape was completely recovered after being bent at room temperature by 3% and heated.
实施例3Example 3
根据设计的成分配方Ni0.64Al0.36,采用厚度为0.140mm的Ni箔,0.119mm的Al箔为原材料,交互重叠放置10层。首先以69%的变形量冷轧到0.800mm,然后再冷轧到0.050mm,将冷轧的薄膜对折重叠,再冷轧到0.050mm,如此反复10道次。最后将冷轧10道次的薄膜于923K下保温20小时,进行合金化。合金化后的薄膜再加热到1473K,保温0.25小时水淬,电阻法测定合金的Ms点为419K,室温弯曲3%加热后形状完全恢复。According to the designed composition formula Ni 0.64 Al 0.36 , Ni foil with a thickness of 0.140mm and Al foil with a thickness of 0.119mm are used as raw materials, and 10 layers are placed alternately. First cold rolling to 0.800mm with a deformation of 69%, and then cold rolling to 0.050mm, the cold rolled film is folded and overlapped, and then cold rolled to 0.050mm, repeating 10 passes. Finally, the cold-rolled 10-pass film was kept at 923K for 20 hours for alloying. The alloyed film was reheated to 1473K, kept warm for 0.25 hours and water-quenched. The Ms point of the alloy was determined to be 419K by the resistance method, and the shape was completely recovered after being bent at room temperature by 3% and heated.
实施例4Example 4
根据设计的成分配方Ni0.645Al0.355,采用厚度为0.120mm的Ni箔,0.100mm的Al箔为原材料,交互重叠放置10层。首先以64%的变形量冷轧到0.800mm,然后再冷轧到0.040mm,将冷轧的薄膜对折重叠,再冷轧到0.040mm,如此反复10道次。最后将冷轧10道次的薄膜于923K下保温20小时,进行合金化。合金化后的薄膜再加热到1523K,保温0.25小时水淬,电阻法测定合金的Ms点为492K,室温弯曲3%加热后形状完全恢复。According to the designed composition formula Ni 0.645 Al 0.355 , Ni foil with a thickness of 0.120 mm and Al foil with a thickness of 0.100 mm are used as raw materials, and 10 layers are placed alternately. First cold rolling to 0.800mm with a deformation of 64%, and then cold rolling to 0.040mm, the cold rolled film is folded and overlapped, and then cold rolled to 0.040mm, repeating this 10 times. Finally, the cold-rolled 10-pass film was kept at 923K for 20 hours for alloying. The alloyed film was reheated to 1523K, kept warm for 0.25 hours and water quenched. The Ms point of the alloy was determined to be 492K by the resistance method, and the shape was completely recovered after being bent at room temperature by 3% and heated.
实施例5Example 5
根据设计的成分配方Ni0.645Al0.355,采用厚度为0.180mm的Ni箔,0.150mm的Al箔为原材料,交互重叠放置10层。首先以70%的变形量冷轧到1.000mm,然后再冷轧到0.060mm,将冷轧的薄膜对折重叠,再冷轧到0.060mm,如此反复10道次。最后将冷轧10道次的薄膜于923K下保温20小时,进行合金化。合金化后的薄膜再加热到1573K,保温0.2小时水淬,电阻法测定合金的Ms点为488K,室温弯曲3%加热后形状完全恢复。According to the designed composition formula Ni 0.645 Al 0.355 , Ni foil with a thickness of 0.180mm and Al foil with a thickness of 0.150mm are used as raw materials, and 10 layers are placed alternately. First cold rolling to 1.000mm with a deformation of 70%, and then cold rolling to 0.060mm, fold the cold rolled film in half, and then cold rolling to 0.060mm, repeating 10 passes. Finally, the cold-rolled 10-pass film was kept at 923K for 20 hours for alloying. The alloyed film was reheated to 1573K, kept warm for 0.2 hours and water-quenched. The Ms point of the alloy was determined to be 488K by the resistance method, and the shape was completely restored after being bent at room temperature by 3% and heated.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103057203A (en) * | 2013-01-24 | 2013-04-24 | 哈尔滨工业大学 | Laminated NiAl material and preparation method thereof |
| CN104399750A (en) * | 2014-10-23 | 2015-03-11 | 哈尔滨工程大学 | Preparation method for TiNi memory alloy panel |
| CN107081345A (en) * | 2017-06-14 | 2017-08-22 | 哈尔滨工业大学 | A kind of NiAl alloy epitaxy curved surface plate members are synthetically prepared and forming integrated method |
| CN110142332A (en) * | 2019-05-27 | 2019-08-20 | 大连理工大学 | An integrated method for forming and controlling NiAl alloy thin-walled pipe fittings |
| CN113231465A (en) * | 2021-05-13 | 2021-08-10 | 太原理工大学 | Large-size Ni-Ni3Preparation method of Al-NiAl laminated structure composite board |
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| JPS6046801A (en) * | 1983-08-23 | 1985-03-13 | Toyo Alum Kk | Manufacture of aluminum foil having metallic layer on its surface |
| CN1028375C (en) * | 1991-09-06 | 1995-05-10 | 中国科学院金属研究所 | Preparation process of titanium-nickel alloy foil and plate |
| JP2001329351A (en) * | 2000-05-22 | 2001-11-27 | Nippon Metal Ind Co Ltd | Method of manufacturing shape memory alloy by laminating rolling and shape memory alloy |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103057203A (en) * | 2013-01-24 | 2013-04-24 | 哈尔滨工业大学 | Laminated NiAl material and preparation method thereof |
| CN104399750A (en) * | 2014-10-23 | 2015-03-11 | 哈尔滨工程大学 | Preparation method for TiNi memory alloy panel |
| CN104399750B (en) * | 2014-10-23 | 2016-06-29 | 哈尔滨工程大学 | A kind of TiNi memorial alloy preparation of plates method |
| CN107081345A (en) * | 2017-06-14 | 2017-08-22 | 哈尔滨工业大学 | A kind of NiAl alloy epitaxy curved surface plate members are synthetically prepared and forming integrated method |
| CN107081345B (en) * | 2017-06-14 | 2018-10-02 | 哈尔滨工业大学 | A kind of NiAl alloy epitaxy curved surface plate members are synthetically prepared and forming integrated method |
| CN110142332A (en) * | 2019-05-27 | 2019-08-20 | 大连理工大学 | An integrated method for forming and controlling NiAl alloy thin-walled pipe fittings |
| CN110142332B (en) * | 2019-05-27 | 2020-07-07 | 大连理工大学 | Forming and property control integrated method for NiAl alloy thin-wall pipe fitting |
| CN113231465A (en) * | 2021-05-13 | 2021-08-10 | 太原理工大学 | Large-size Ni-Ni3Preparation method of Al-NiAl laminated structure composite board |
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