CN1513199A - Device for supplying power to cathode of arc evaporation device - Google Patents
Device for supplying power to cathode of arc evaporation device Download PDFInfo
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- CN1513199A CN1513199A CNA028112490A CN02811249A CN1513199A CN 1513199 A CN1513199 A CN 1513199A CN A028112490 A CNA028112490 A CN A028112490A CN 02811249 A CN02811249 A CN 02811249A CN 1513199 A CN1513199 A CN 1513199A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
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Abstract
Description
技术领域technical field
本发明涉及用于给构成电弧蒸发装置的阴极的靶子电极供电的装置,用于借助于在阳极和阴极之间至少一个电弧电流产生的电弧点蒸发靶子电极,其中,靶子电极至少与支撑外围导电连接,支撑本身通过至少一个导电连接连接到在蒸发装置外面分布的供电接线上。The invention relates to a device for energizing a target electrode constituting the cathode of an arc evaporation device for evaporating the target electrode by means of an arc point generated by at least one arc current between the anode and the cathode, wherein the target electrode is electrically conductive at least with the periphery of the support Connection, the support itself is connected via at least one electrically conductive connection to a power supply connection distributed outside the evaporation device.
背景技术Background technique
EP 0 306 491 B1公开了一种上述类型的装置。为将合金层涂覆到部件上,使用一个靶子电极,该靶子电极在其不同的活化表面段内具有至少两种不同的金属。在按照DE 42 43 592 A1的电弧蒸发装置中,通过励磁线圈向靶子电极供电,以便使电弧点沿随机轨迹运动。EP 0 306 491 B1 discloses a device of the above-mentioned type. To apply the alloy layer to the component, a target electrode is used which has at least two different metals in its different active surface segments. In an arc vaporization device according to
与磁铁的错接类型或构成阴极的靶子电极的构成无关,向该靶子电极逐点供电的后果是,在取决于靶子电极上电弧点到电流中断位置的情况下,产生不同的阻抗。阻抗的这种变化导致电弧增加分叉,结果增加靶子电极表面放射滴状物。这种滴状物造成所要涂层部件的表面粗糙,因此导致涂层出现不希望的质量损害。阻抗的变化,也就是在预先规定电弧电流情况下电弧电压的变化更加危险,因为控制系统/控制电子装置不识别这种变化,因此设备的操作人员无法把握可重复性和质量。Regardless of the type of misconnection of the magnets or the configuration of the target electrode forming the cathode, the point-by-point supply of this target electrode has the consequence of producing different impedances depending on the arc point on the target electrode to the current interruption position. This change in impedance leads to increased branching of the arc and consequently increased droplet emission from the surface of the target electrode. Such drops cause the surface of the part to be coated to be rough and thus lead to an undesired impairment of the quality of the coating. A change in impedance, ie a change in the arc voltage at a predetermined arc current, is even more dangerous because the control system/control electronics do not recognize this change, so that the operator of the plant cannot be sure of the repeatability and quality.
发明内容Contents of the invention
本发明以该问题为依据,这样改进上述类型的装置,使靶子电极材料不取决于电弧点的位置进行所希望的均匀蒸发,从而对设置在电弧蒸发装置或其真空室内的基质进行均匀的涂层。The present invention is based on this problem by improving a device of the above-mentioned type in such a way that the desired uniform evaporation of the target electrode material is carried out independently of the position of the arc point, so that the substrate arranged in the arc evaporation device or its vacuum chamber is uniformly coated. layer.
依据本发明,该问题基本上由此得以解决,即从支撑和/或者靶子电极引出多个在靶子电极的外围区域内分布的导电连接,它们本身通过接线彼此导电连接。在此方面,特别是可以由销钉,螺丝,铆钉,螺栓或者类似物体构成的点状连接通过环,特别是封闭的环彼此导电连接。涉及靶子电极的导电连接的设置这样实现,以不取决于电弧点的位置为依据,使靶子电极上形成相同的或者基本上相同的阻抗,不言而喻,是在像压力,偏压等过程参数相同的情况下。According to the invention, this problem is basically solved by leading from the support and/or the target electrode a plurality of electrically conductive connections distributed in the peripheral region of the target electrode, which are themselves electrically conductively connected to each other by wires. In this respect, in particular point connections, which can be formed by pins, screws, rivets, bolts or the like, are electrically conductively connected to one another via rings, in particular closed rings. The arrangement of the conductive connection involving the target electrode is achieved in such a way that the same or substantially the same impedance is formed on the target electrode independently of the position of the arc point, it goes without saying that during processes such as pressure, bias, etc. with the same parameters.
此外,在靶子电极和支撑之间设置一层导电性良好的箔,特别是铜箔。Furthermore, a foil with good electrical conductivity, in particular copper foil, is arranged between the target electrode and the support.
分布在电弧蒸发装置外面的和形成导电连接到靶子电极的接线本身,最好是由铜构成的环形导线,而通向靶子电极或其支撑的导电连接本身可以由黄铜构成。作为靶子电极材料可以考虑具有很高电导的任何材料。The wiring itself, which runs outside the arc evaporation device and forms the electrically conductive connection to the target electrode, is preferably a ring wire made of copper, while the electrically conductive connection to the target electrode or its support itself can consist of brass. Any material with a very high electrical conductivity can be used as target electrode material.
与此无关,为取得均匀的阻抗,导电连接展开包络线,同轴外围环绕靶子电极的有效自由面。特别是形成四边形几何形状,其中,沿四边形的每个边在导电连接之间保持相同的或者基本上相同的距离。从包络线平行或者基本上平行分布的边引出的连接同样具有相同的距离。Independently of this, in order to obtain a uniform impedance, the electrically conductive connection develops an envelope, the coaxial periphery surrounding the effective free surface of the target electrode. In particular, a quadrilateral geometry is formed, wherein the same or substantially the same distance between the electrically conductive connections is maintained along each side of the quadrilateral. The connections leading from the parallel or substantially parallel running sides of the envelope likewise have the same distance.
依据本发明,始终向靶子电极产生电弧点的位置直接供电,以不取决于电弧点位置为依据,始终产生相同的阻抗。According to the present invention, power is always supplied directly to the position where the arc point is generated on the target electrode, and the same impedance is always generated on the basis that it does not depend on the position of the arc point.
由此形成作用于电弧点磁场的最小干扰,从而在所希望的范围内对靶子电极进行均匀的电蚀或者蒸发,而不存在这种危险,即从靶子电极产生滴状物,进入真空室,由此造成所要涂层的基质表面不均匀或粗糙。换句话说,具有对作用于电弧点的磁铁的最佳支撑-或导向效果。This results in a minimal disturbance of the magnetic field acting on the arc point, resulting in a uniform galvanic erosion or evaporation of the target electrode within the desired range, without the risk of drops being generated from the target electrode, entering the vacuum chamber, This results in an uneven or rough surface of the substrate to be coated. In other words, there is an optimal support - or guiding effect - of the magnets acting on the arc point.
连接的构成在设计上很简单。靶子电极和支撑可以平面加工,其中,以通常的方式在支撑和靶子电极之间具有可供给冷却水的空隙。The composition of the connections is simple in design. The target electrode and the support can be machined flat, wherein in the usual manner there is a gap between the support and the target electrode to which cooling water can be supplied.
附图说明Description of drawings
本发明的其他细节、优点和特征不仅来自这些引用特征-本身和/或者组合下-的权利要求书,而且也来自对借助附图引用优选实施例的下列说明。其中:Further details, advantages and features of the invention result not only from the claims cited with reference to them - on their own and/or in combination - but also from the following description of preferred exemplary embodiments with reference to the drawings. in:
图1示出靶子电极装置的原理图;Fig. 1 shows the schematic diagram of target electrode device;
图2示出带有电弧点的靶子电极的原理图。Figure 2 shows a schematic diagram of a target electrode with an arc spot.
具体实施方式Detailed ways
在图1中,以纯原理的方式示出电弧蒸发装置,带有由外壳10环绕的真空室12,以便对真空室12内的基质14进行处理,例如涂层。这里,实施例中使用的是硬质材料涂层装置。In FIG. 1 , an arc evaporation device is shown in a purely principled manner with a
为对可设置在转盘上的基质14进行涂层,对存在于真空室12内靶子电极16,如钛靶子电极或者其他适用的靶子电极的材料进行蒸发,这些材料与如N2或者C2H2反应气体产生反应,并在所希望的范围内沉积在基质14上。为此,在靶子电极16和外壳10之间通过电源18连接电压,其中,外壳10为阳极,靶子电极16为阴极。然而就此而言,参阅完全公知的技术,所涉及的施加的电压例如处于20V的数量级,电流为100A的数量级。真空室12内的压力值按使用情况例如可以处于0.0001-0.1bar的范围内。In order to coat the
靶子电极16从载体20出发,载体从它那方面通过绝缘体22例如与铝制的凸缘板24电绝缘,凸缘板从它那方面与外壳10连接。在靶子电极16和载体20之间存在空隙26,为对靶子电极16在所希望的范围内进行冷却,施加如液体的冷却流体。靶子电极16在底端具有环形的凸缘28,由此在载体20和固定板30之间定位。固定板30本身由例如BN制的绝缘体32覆盖,并通过绝缘体34、36与底板24连接。
载体20,固定板30和靶子电极16通过螺栓或者螺丝38、40或者相同作用的元件与作为环形导线的接线42导电连接,也就是说,螺丝或者螺栓38、40彼此连接,并连接在电源18上。电源18的另一极通向外壳。The
外壳10构成阳极,载体20,盖板30和靶子电极16构成阴极,其中,仅靶子电极16利用其表面42露出在真空室12内,从而在阳极,也就是外壳10或其壁和靶子电极16之间可以构成电弧并因此构成电弧点44,其沿表面42的运动通过存在于靶子电极16下面和真空室12外面的磁铁46(MAC=磁铁电弧限制),也就是其磁场确定。The
依据本发明,通过到支撑20并因此到靶子电极16的绝缘体22延伸大量在靶子电极16的外围区域内中断的导电连接38、40,它们通过环形导线42与电源18连接。在此,导电连接38、40具有彼此相同的距离,确切地说至少是在靶子电极16彼此平行分布的侧面内。According to the invention, a plurality of electrically
如果顶视图中的靶子电极16具有直角几何形状,那么接点38、40同样展开直角形的几何形状,也就是说构成相应的包络线。因此,与表面42上电弧点的位置无关,产生了基本上相同的阻抗,其结果是靶子电极16均匀蒸发,由此所要处理的或所要涂层的基质14得到所希望的表面质量。If the
图2纯原理示出靶子电极16的底视图,带有原理上表示的环形导线42和底板24。此外,原理上示出从环形导线42引出的特别是作为螺丝构成的导电连接38、40,借助其表明,它们沿靶子电极16的纵边以相同的距离彼此分布,其中,螺丝38、40沿平行边的距离相等(参见各自彼此平行分布边缘范围内的等量距离b或d)。FIG. 2 shows a purely schematic view from the bottom of the
环形导线42已经提到最好由铜构成,而螺丝或者相同作用的接点38、40可由黄铜构成。It has already been mentioned that the
此外,为取得所希望的均匀供电,在靶子电极与载体20和需要时与固定板30之间具有如铜箔这样导电性良好的箔。In addition, in order to obtain desired uniform power supply, a foil with good conductivity such as copper foil is provided between the target electrode and the
Claims (8)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10126985.4 | 2001-06-05 | ||
| DE2001126985 DE10126985A1 (en) | 2001-06-05 | 2001-06-05 | Arrangement for guiding a current to a target forming the cathode of an electric arc vaporizing device comprises electrically conducting lines running from a holder and/or the target and electrically connected via a connection |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1513199A true CN1513199A (en) | 2004-07-14 |
Family
ID=7687060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA028112490A Pending CN1513199A (en) | 2001-06-05 | 2002-06-04 | Device for supplying power to cathode of arc evaporation device |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1393344A2 (en) |
| CN (1) | CN1513199A (en) |
| AU (1) | AU2002314134A1 (en) |
| DE (1) | DE10126985A1 (en) |
| WO (1) | WO2002099943A2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10256417A1 (en) * | 2002-12-02 | 2004-06-09 | Pvt Plasma Und Vakuum Technik Gmbh | Arc evaporation device |
| EP1835524A1 (en) * | 2006-03-16 | 2007-09-19 | Sulzer Metco AG | Fastening means for sputtering source |
| SE542687C2 (en) * | 2018-06-27 | 2020-06-23 | Impact Coatings Ab Publ | Arc source system for a cathode |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE9014857U1 (en) * | 1990-10-26 | 1992-02-20 | Multi-Arc Oberflächentechnik GmbH, 5060 Bergisch Gladbach | Large-area cathode arrangement with uniform burn-off behavior |
| FR2670218B1 (en) * | 1990-12-06 | 1993-02-05 | Innovatique Sa | PROCESS FOR TREATING METALS BY DEPOSIT OF MATERIAL, AND FOR CARRYING OUT SAID METHOD. |
| IT1253065B (en) * | 1991-12-13 | 1995-07-10 | Unicoat Srl | VOLTAIC ARC VAPORIZER |
| US5932078A (en) * | 1997-08-30 | 1999-08-03 | United Technologies Corporation | Cathodic arc vapor deposition apparatus |
-
2001
- 2001-06-05 DE DE2001126985 patent/DE10126985A1/en not_active Withdrawn
-
2002
- 2002-06-04 CN CNA028112490A patent/CN1513199A/en active Pending
- 2002-06-04 EP EP02740681A patent/EP1393344A2/en not_active Withdrawn
- 2002-06-04 AU AU2002314134A patent/AU2002314134A1/en not_active Abandoned
- 2002-06-04 WO PCT/EP2002/006087 patent/WO2002099943A2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002099943A3 (en) | 2003-04-10 |
| WO2002099943A2 (en) | 2002-12-12 |
| WO2002099943B1 (en) | 2003-10-30 |
| DE10126985A1 (en) | 2002-12-12 |
| EP1393344A2 (en) | 2004-03-03 |
| AU2002314134A1 (en) | 2002-12-16 |
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