CN1503035A - Glass substrate for flat panel display and method for manufacturing same - Google Patents
Glass substrate for flat panel display and method for manufacturing same Download PDFInfo
- Publication number
- CN1503035A CN1503035A CNA2003101183321A CN200310118332A CN1503035A CN 1503035 A CN1503035 A CN 1503035A CN A2003101183321 A CNA2003101183321 A CN A2003101183321A CN 200310118332 A CN200310118332 A CN 200310118332A CN 1503035 A CN1503035 A CN 1503035A
- Authority
- CN
- China
- Prior art keywords
- coating
- glass
- glass substrate
- acid
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 124
- 239000000758 substrate Substances 0.000 title claims abstract description 109
- 238000000034 method Methods 0.000 title claims abstract description 55
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 238000005530 etching Methods 0.000 claims abstract description 69
- 239000011248 coating agent Substances 0.000 claims abstract description 68
- 238000000576 coating method Methods 0.000 claims abstract description 68
- 229920005989 resin Polymers 0.000 claims abstract description 24
- 239000011347 resin Substances 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 20
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229920001225 polyester resin Polymers 0.000 claims abstract description 8
- 238000012546 transfer Methods 0.000 claims abstract description 6
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000011354 acetal resin Substances 0.000 claims abstract description 4
- 239000003822 epoxy resin Substances 0.000 claims abstract description 4
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 4
- 229920006324 polyoxymethylene Polymers 0.000 claims abstract description 4
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 13
- 229960002050 hydrofluoric acid Drugs 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 229920005990 polystyrene resin Polymers 0.000 claims description 8
- 229920002647 polyamide Polymers 0.000 claims description 7
- 229920005678 polyethylene based resin Polymers 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 238000004090 dissolution Methods 0.000 claims description 6
- 238000010422 painting Methods 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 239000000194 fatty acid Substances 0.000 claims description 3
- 229930195729 fatty acid Natural products 0.000 claims description 3
- -1 fatty acid ester Chemical class 0.000 claims description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 3
- 239000011707 mineral Substances 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 239000010452 phosphate Substances 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 4
- 238000001039 wet etching Methods 0.000 abstract description 4
- 239000011247 coating layer Substances 0.000 abstract 6
- 239000004645 polyester resin Substances 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000000227 grinding Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000003701 mechanical milling Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- Surface Treatment Of Glass (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The main object of the present invention is to provide a method for manufacturing a glass substrate for a Flat Panel Display (FPD) having a highly precise pattern by forming a coating layer having high chemical resistance and high adhesion on the surface of a glass substrate before wet etching. According to the present invention, a glass substrate for an FPD, in which a coating layer 2 is formed on a part of the surface of a glass substrate 1, the surface of the glass substrate other than the part where the coating layer is formed is etched by treatment with an etching solution containing hydrofluoric acid, and then the coating layer is removed, is manufactured so that a substrate surface is patterned to have a predetermined shape. As a first preferred example of the coating layer 2, a coating layer formed by film transfer using a resin selected from the group consisting of an epoxy resin, a polyvinyl acetal resin, a polyester resin, and a fluororesin as a coating material is exemplified.
Description
Technical field
The present invention relates to adopt wet etching to be manufactured on the method that glass baseplate surface forms the glass for flat panel display substrate of setting pattern.
Background technology
So-called flat-panel monitor (below, claim " FPD ") is meant the flat-panel display devices of plasma display (PDP), LCD (LCD), field-emitter display (FED), electroluminescent display (ELD) etc.These flat-panel display devices, in front and/or the back side use slim glass substrate.
The FPD glass substrate, no matter how the kind of FPD all has lightweight and the common technical task of this class of slimming, and owing to according to the kind of FPD different technical tasks is arranged, therefore is fit to the drawing of the glass substrate of FPD type requirements.Here, in this instructions so-called " drawing ", be meant and adopt etching that at least a portion of glass baseplate surface is processed into the shape pattern of setting, for example adopt etching make glass substrate all slimmings of surface, implement to shelter processing etc. the part of glass baseplate surface carried out etching, according to the position control etch quantity of glass substrate etc. grade differential etc. be set.
For example, PDP requires to form dividing plate with glass substrate.As shelf-shaped being become band or the method for rectangular usefulness, known have the dielectric that forms dividing plate stuck with paste repeatedly stencil printing that screen printing burns till or coating dielectric stick with paste the abrasive cleaning that adopts sand blasting to remove not need part in dry back etc.
Also have, LCD then requires the glass substrate slimming with glass substrate and FED with glass substrate.Become the slimming method of main flow now, known have use etch processes liquid to carry out the wet etch method of chemical grinding or use sand grains friction sample board carry out the mechanical milling method of physical grinding, with cmp (CMP) method of two kinds of methods combinations etc.
In addition, ELD is with glass substrate because as back side lid, so require the glass substrate of pin-type.As present draughtsmanship, known abrasive cleaning that the part that adopts the sand blasting cutting to intend slimming charts arranged, make mould be in the extruding glass substrate charts under the high temperature extrusion forming method, use sand grains friction sample board to carry out the mechanical milling method etc. of physical grinding.
As mentioned above, the past is adopted the method for mechanical lapping when FPD is charted with glass substrate, therefore has following problem points.
At first, as the problem points of mechanical lapping, fine drawing has the limit of physics, and micron-sized grinding is difficulty quite.Also have,, be not suitable for glass substrate for display even millimetre-sized charting surface state is also bad.
Also have, abrasive cleaning produces the cutting chip of sand grains and glass in a large number, has the problem of residual dust of glass baseplate surface and so on.Also have, mechanical lapping similarly surface state is bad, is not suitable for display panel used glass substrate.
In addition, therefore extrusion forming method exists the high problem points of manufacturing cost owing to extrusion die under the softening condition of high temperature of glass substrate.Also have, have the high problem of the employed Mold Making expense of this method.
In view of above problem, glass baseplate surface to be implemented etching form patterning, the chemical grinding method that wet etching is carried out in estimation is more favourable than the method for carrying out mechanical lapping.
Right also have, and chemical grinding method in the past because etching solution uses the fluoric acid of strong acid, so exist masking layer in the etching to suffer erosion or produce the problem of peeling off etc. with glass substrate, is not also established suitable mask formation means so far.
Summary of the invention
The present invention puts and the research finished in view of the above-mentioned problems, its purpose is by before carrying out wet etching, form resistance to chemical reagents and the big coating of adhesiveness at glass baseplate surface, the FPD that implemented the pinpoint accuracy pattern is provided manufacture method and FPD glass substrate with glass substrate.
To achieve the above object, the invention is characterized in, part at glass baseplate surface forms coating, the etching solution that contains fluoric acid by use is handled, carry out etching with forming coating part glass baseplate surface in addition, by removing coating, make substrate surface and form the FPD glass substrate of setting the shape pattern then.
Therefore, as the above-mentioned coating first preferred concrete example, can enumerate with the resin of selecting in epoxy resin, polyvinyl acetal resin, vibrin, the fluororesin is the coated material raw material, the coating that forms by film transfer.
Also have, as the above-mentioned coating second preferred concrete example, can enumerate the resin from polystyrene resin, polyamide-based resin, polyester based resin, polyethylene-based resin, selected directly or the solution of this resin usefulness dissolution with solvents as the coated material raw material coating that forms by coating.
Also have, as above-mentioned coating the 3rd preferred concrete example, can enumerate the resin from polystyrene resin, polyamide-based resin, polyester based resin, polyethylene-based resin, selected directly or the solution of this resin usefulness dissolution with solvents as the coated material raw material coating that forms by screen printing.
Above-mentioned three kinds coating is because resistance to chemical reagents and all big to the adhesiveness of glass substrate, even when therefore using the etching solution that contains fluoric acid to handle, because just to forming the surface etching of coating part glass substrate in addition, so can make the FPD glass substrate that implements the pinpoint accuracy pattern.
Also have, therefore the present invention can realize the reduction of operation cost owing to use etching solution directly to the glass substrate drawing.In addition, owing to form pattern, therefore can optionally carry out etching to the position of handling by etch processes to glass substrate.Also have, owing to make acid proof lining material and glass substrate bonding, so coating do not peel off with glass substrate, optionally carries out the above etching of about 1 μ m.
Also have, the present invention considers from the viewpoint of control etching speed, preferably also contains the mineral acid of selecting more than at least a kind as etching solution except fluoric-containing acid from hydrochloric acid, sulfuric acid, nitric acid and phosphoric acid.In addition, the present invention considers attached to the viewpoint on the glass substrate from the resultant of reaction that prevents silicofluoride that etching produces etc., preferably also contain the surfactant of selecting more than at least a kind as etching solution except fluoric-containing acid from carboxylic acid system, phenol system, acid amides system, fatty acid ester system, phosphate system, sulfuric ester system, sulfonic acid system, amine system, ether system, high molecular alcohol.
Description of drawings
Fig. 1 is the mode chart of explanation ELD with the drawing operation of glass substrate.
Fig. 2 is the mode chart that explanation LCD or ELD use the etch figures(s) case of glass substrate.
Fig. 3 is the mode chart of expression PDP with the etch figures(s) case of glass substrate.
Fig. 4 is the mode chart of explanation ELD with the etch figures(s) case of glass substrate.
Fig. 5 is the mode chart of the etch figures(s) case of explanation adhesive substrates.
Invention embodiment
The FPD glass substrate that adopts the present invention to make is to handle and serve as the substrate of necessary operation system to forming the operation (removing operation) that glass baseplate surface beyond the coating part carries out etched operation (etching work procedure) and remove coating with the etching solution that forms the operation (lining operation) of coating in the part of glass baseplate surface, contains fluoric acid by use.Below, respectively by the present invention of each specification.
[lining operation]
The glass substrate that uses in this operation, if in PDP, LCD, FED and ELD normally used known glass substrate, just be not particularly limited, generally speaking, preferably use soda-lime glass or alkali-free glass.
Also have, the size of glass substrate and thickness are suitably to adopt according to the various display apparatus of this substrate of assembling, do not have particular determination.
Also have, the coating in that the part of glass baseplate surface forms preferably uses in etching work procedure described later, has the resistance to chemical reagents of the etching solution erosion that is not contained fluoric acid and has the adhering coating of not peeling off with glass substrate.The present invention by being the coated material raw material with specific resin, and uses specific means to form above-mentioned coating.
As first concrete example, preferably with the resin selected in epoxy resin, polyvinyl acetal resin, vibrin, the fluororesin as the coated material raw material, form coating by film transfer.
Also have, as second concrete example, preferred directly the resin of from polystyrene resin, polyamide-based resin, polyester based resin, polyethylene-based resin, selecting or with the solution of this resin of dissolution with solvents as the coated material raw material, form coating by coating.At this moment, preferably use the organic solvent of toluene, hexane, ethyl acetate etc. as solvent.
In addition, as the 3rd concrete example, preferred directly the resin of from polystyrene resin, polyamide-based resin, polyester based resin, polyethylene-based resin, selecting or with the solution of this resin of dissolution with solvents as the coated material raw material, form coating by screen painting.At this moment, preferably use the organic solvent of toluene, hexane, ethyl acetate etc. as solvent.
The present invention uses above-mentioned specific coated material raw material when the part of glass baseplate surface forms coating, can form means according to the specific coating of film transfer, coating and screen painting etc. and suitably form its pattern.
For example, when adopting film transfer or coating as coating formation means, preferably at first form coating, by will partly cutting and remove, at the part formation coating of glass baseplate surface with the corresponding coating in the etched position of needs on the whole surface of glass substrate.Also have, when adopting screen painting as coating formation means, preferred adopt by with the method for the corresponding half tone of pattern at a part of coating material raw material of glass baseplate surface, form coating in the part of glass baseplate surface.
Also have, the present invention can also can form coating on the two sides only at the one side formation coating of glass substrate.Only form the situation of coating, when not requiring the glass substrate slimming, can carry out etch processes described later in that whole surface is coated with under the state of coated material raw material formation coating to another side in the one side of glass substrate.Also have, only form the situation of coating, when requiring the glass substrate slimming, can another side not done any enforcement and directly carry out etch processes in the one side of glass substrate.
[etching work procedure]
The etching solution that uses in this operation is to contain fluoric acid as etching solution that must etching composition, is adapted at 1～45 weight %, is more suitable at 1～10 weight %, is adapted at most using in the concentration range of 2～5 weight %.Especially, as the situation that the present invention charts, etching speed was too fast when fluoric acid concentration surpassed 45 weight %, produced the problem of the flatness variation of etched glass part.On the other hand, when fluoric acid concentration was lower than 1 weight %, etching speed was too slow, the time lengthening that etching needs.
Also have, the present invention considers from the viewpoint of control etching speed, can suitably use also to contain the etching solution of selecting of mineral acid more than at least a kind except that fluoric-containing acid from hydrochloric acid, sulfuric acid, nitric acid and phosphoric acid.
Also have, the present invention considers attached to the viewpoint on the glass substrate from the resultant of reaction that prevents silicofluoride that etching produces etc., can suitably use the etching solution that also contains the surfactant of selecting more than at least a kind except that fluoric-containing acid from carboxylic acid system, phenol system, acid amides system, fatty acid ester system, phosphate system, sulfuric ester system, sulfonic acid system, amine system, ether system, high molecular alcohol.That is, if use such etching solution to carry out etch processes, it is raised or sunken to prevent that then etched part from producing.
This operation perhaps is coated on etching solution on the glass substrate by glass substrate being immersed in the above-mentioned etching solution, more than the degree of depth 1 μ m, preferably in the scope of 100～700 μ m etching is carried out in the substrate front and/or the back side.
Also have, glass substrate is immersed in situation in the etching solution, carry out etch processes under the state that for example preferably in the treatment trough of setting size, accommodate etching solution, etching solution is flowed.This situation is if use the treatment trough that can hold tens of glass substrates then can improve etched processing power.Also have,,, help the condition control of etching work procedure on treatment trough owing to can obtain certain etching speed if temperature control equipment is installed.Also have, the temperature of reaction in this operation does not have particular determination, but usually preferably by the composition of suitable design etched liquid, 20～50 ℃ temperature range is that standard temperature is carried out etch processes.
In addition, this operation also can one side be discharged etching solution, one side with the resultant of reaction that filtered etch such as filtrator produce from treatment trough continuously, and the etching solution of this filtration is resupplied treatment trough.By recycling etching solution in this wise, owing to supply with fresh frequently and form uniform etching solution,, also can stably carry out the etch processes of pinpoint accuracy even when therefore carrying out etch processes continuously.
Also have, this operation also can be used the device that produces bubbles such as nitrogen from the bottom of treatment trough continuously.If use such device,, therefore can make the etching condition stabilization because bubble strips the resultant of reaction that glass baseplate surface produces because of etching.In addition, in order to improve the effect that bubble strips resultant of reaction, can suitably make glass substrate remain on state vertical or that tilt, preferably with the vertical inclinations that become 5 degree～45 degree according to the viscosity and the etching condition of etching solution.
[removing operation]
This operation is after etching work procedure finishes, and cleans glass substrate by suitable method, peels off the coating that glass baseplate surface forms by suitable method simultaneously.
Below, according to description of drawings the present invention of expression embodiment of the present invention.Fig. 1 is the accompanying drawing of the relevant ELD of the present invention of explanation with method for manufacturing glass substrate, is the figure that analog map shows the basic process of charting.Below, pattern formation method is described.
Surface at the glass substrate 1 that carries out pattern formation forms coating 2 (Fig. 1 (a) and (b)).Be coated on the coated material raw material on the glass substrate 1,, preferably use polystyrene resin, polyester based resin, polyamide-based resin, polyethylene-based resin if the good raw material of acid resistance does not then have particular restriction.Also have, glass substrate does not have particular restriction yet, general preferred use soda-lime glass or alkali-free glass.
Then, the contrast pattern form adopts and to cut into, die-cut etc. method cuts coating, makes the necessary part on glass substrate 1 surface do well (Fig. 1 (c), (d)) that reveal.What Fig. 1 (c) represented is that cutting knife 3 is given as security until state of contact vertically downward from the top of glass substrate 1.Subsequently, peel off institute's certain portions (Fig. 1 (d)) of coating 2, the part of peeling off is corresponding with the part that glass substrate 1 will chart.
Above-mentioned processing is coated with etching solution, or charts by being immersed in the etching solution after finishing.The travel direction of the arrow 4 expression drawing of (Fig. 1 (e)).The situation of dipping glass substrate 1 in etching solution is formed and the even temperature distribution as uniform liquid, can be by number μ m level control etch quantity.Also have, prevent that resultant of reaction is again attached on the glass substrate.
Peel off coating 2 (Fig. 1 (f)) by suitable method when therefore, in the end glass substrate being washed.Also have, in the example of Fig. 1,, also can carry out the etch processes on glass substrate two sides though just carry out the etch processes of glass substrate 1 in one side.This situation about not forming the face of coating, realizes slimming by etch processes.Only in one side when carrying out etch processes, can whole overleaf surface coated coated material raw material.
In addition, preferably according to the viscosity and the etching condition of etching solution, make glass substrate remain on vertical or inclination.The bubble generator that illustrates among the embodiment when glass substrate is tilted, has and utilizes bubble to strip the effect of the accompanying resultant of reaction of glass surface, and its angle preferably becomes 5 to spend～45 inclinations of spending with vertical.
Also has example that Fig. 2 represents to use among LCD or the ELD, that partly chart in substrate body.Fig. 2 (a) is a planimetric map, and Fig. 2 (b) is the sectional view along the A-A of Fig. 2 (a).Fig. 3 expresses the example that glass substrate that PDP uses carries out rectangular drawing.Fig. 4 represents that glass substrate body part that ELD uses makes the example of stage pattern.Fig. 4 (a) is a planimetric map, and Fig. 4 (b) is the sectional view along the B-B of Fig. 4 (a).Fig. 5 represents to be fitted with the example of the glass substrate of glass substrate 5b that has carried out drawing and the glass substrate 5a that does not chart.Fig. 5 (a) is a planimetric map, and Fig. 5 (b) is the sectional view along the C-C of Fig. 5 (a).Here, though illustrate above shape with glass substrate, can certainly form the pattern of toroidal, the pattern forms miscellaneous such as pattern of square as FPD.In addition, the size of pattern also can be controlled at tens of μ m levels.
Embodiment
Below, explain the present invention by embodiment, but the present invention is not subjected to any qualification of these embodiment.
Glass substrate
As glass substrate, use alkali-free glass substrate (10cm * 10cm is square, thickness 1.1mm).
Etching solution
With water is solvent, and modulation contains the fluoric acid 3% as etching composition, the etching solution of sulfuric acid 5%.
Lining
Use polystyrene resin as the coated material raw material, the two sides of glass substrate all is covered.
The drawing of coating
Cut and remove the coated material of intending the etch processes part.
Treatment trough
Treatment trough is by the retaining part that glass substrate is remained on certain angle and feed the bubble discharge section of gas from the below generation gas of retaining part, and etching solution round-robin cyclic part is constituted.Also have, this treatment trough is heated to 40 ℃ experimentizes.
The result
Operated under these conditions 90 minutes, and confirmed the etched 300 μ m of glass substrate itself.Also have, about not etched part, though by the coating lining, remove coated material at last after, optionally survey the result of 20 place's etching part thickness, the deviation maximum of thickness of slab is 5 μ m.
The effect of invention
As mentioned above, according to the manufacture method of FPD usefulness glass substrate according to the present invention, because Make acid proof coating and glass substrate bonding, therefore in etch processes coating not with base Plate is peeled off, and can optionally chart to the part of glass substrate.
Claims (6)
1. the manufacture method of glass for flat panel display substrate, it is part formation coating at glass baseplate surface, the etching solution that contains fluoric acid by use is handled, etching is carried out on the surface that forms coating part glass substrate in addition, then by removing coating, make the method that substrate surface forms the glass for flat panel display substrate of setting the shape pattern
It is characterized in that aforementioned coating be the resin from epoxy resin, polyvinyl acetal resin, vibrin, fluororesin, selected as the coated material raw material, the coating that forms by film transfer.
2. the manufacture method of glass for flat panel display substrate, it is part formation coating at glass baseplate surface, the etching solution that contains fluoric acid by use is handled, etching is carried out on the surface that forms coating part glass substrate in addition, then by removing coating, make the method that substrate surface forms the glass for flat panel display substrate of setting the shape pattern
It is characterized in that aforementioned coating be the resin from polystyrene resin, polyamide-based resin, polyester based resin, polyethylene-based resin, selected directly or with the solution of this resin of dissolution with solvents as the coated material raw material, the coating that forms by coating.
3. the manufacture method of glass for flat panel display substrate, it is part formation coating at glass baseplate surface, the etching solution that contains fluoric acid by use is handled, etching is carried out on the surface that forms coating part glass substrate in addition, then by removing coating, make the method that substrate surface forms the glass for flat panel display substrate of setting the shape pattern
It is characterized in that aforementioned coating be the resin from polystyrene resin, polyamide-based resin, polyester based resin, polyethylene-based resin, selected directly or with the solution of this resin of dissolution with solvents as the coated material raw material, the coating that forms by screen painting.
4. the manufacture method of the described glass for flat panel display substrate of each of claim 1～3 is characterized in that etching solution also contains the mineral acid of selecting more than at least a kind except that fluoric-containing acid from hydrochloric acid, sulfuric acid, nitric acid and phosphoric acid.
5. the manufacture method of the described glass for flat panel display substrate of each of claim 1～4 is characterized in that etching solution also contains the surfactant of selecting more than at least a kind except that fluoric-containing acid from carboxylic acid system, phenol system, acid amides system, fatty acid ester system, phosphate system, sulfuric ester system, sulfonic acid system, amine system, ether system, high molecular alcohol.
6. the glass for flat panel display substrate is to adopt any method of claim 1～5 to make.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002338855 | 2002-11-22 | ||
| JP338855/2002 | 2002-11-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1503035A true CN1503035A (en) | 2004-06-09 |
| CN100432772C CN100432772C (en) | 2008-11-12 |
Family
ID=34260203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003101183321A Expired - Fee Related CN100432772C (en) | 2002-11-22 | 2003-11-21 | Glass substrate for flat panel display and manufacturing method thereof |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20040045311A (en) |
| CN (1) | CN100432772C (en) |
| SG (1) | SG121817A1 (en) |
| TW (1) | TW200417783A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103160282A (en) * | 2011-12-16 | 2013-06-19 | 爱思开海力士有限公司 | Etching composition and method for fabricating semiconductor device using the same |
| CN103476725A (en) * | 2011-05-02 | 2013-12-25 | Hoya株式会社 | Process and device for producing glass substrate for cover glass for use in electronic appliance, and method and device for removing alkali fluoroaluminate |
| CN103723927A (en) * | 2012-10-12 | 2014-04-16 | 技迪科技股份有限公司 | Method for manufacturing glass substrate with wavy surface |
| CN104520098A (en) * | 2012-08-09 | 2015-04-15 | 旭硝子株式会社 | Glass-sheet-fluorine-resin laminate |
| CN104556716A (en) * | 2014-12-30 | 2015-04-29 | 深圳南玻伟光导电膜有限公司 | Etching solution and secondary hardening method of glass for capacitive touch screen |
| CN104849900A (en) * | 2015-06-03 | 2015-08-19 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN110770640A (en) * | 2017-05-24 | 2020-02-07 | 株式会社Nsc | Method for manufacturing glass panel with transparent film, method for manufacturing liquid crystal panel with transparent film, method for manufacturing glass panel, and method for manufacturing liquid crystal panel |
| CN120417249A (en) * | 2025-06-30 | 2025-08-01 | 深圳市板明科技股份有限公司 | An anti-diffusion agent for PCB glass substrate and its preparation method and application |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4071220B2 (en) * | 2004-03-17 | 2008-04-02 | 西山ステンレスケミカル株式会社 | Manufacturing method of glass substrate |
| KR101106765B1 (en) * | 2009-07-14 | 2012-01-18 | 명 옥 이 | Wood Forming Device |
| KR101956846B1 (en) * | 2016-08-16 | 2019-06-19 | 오성수 | Etching method of glass substrate and etching appratus using the same |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4415405A (en) * | 1981-08-19 | 1983-11-15 | Yale University | Method for engraving a grid pattern on microscope slides and slips |
| GB2114062B (en) * | 1982-01-26 | 1985-03-20 | Peter James Crowe | Etching glass |
| JPS6077148A (en) * | 1983-09-30 | 1985-05-01 | Hoya Corp | Method for working glass substrate |
| FR2593804A1 (en) * | 1986-02-02 | 1987-08-07 | Fanni Jacques | Glass etching process employing self-adhesive precut stencils. Application to the etching of vehicle registration numbers |
| DE4018092A1 (en) * | 1990-06-06 | 1991-12-12 | Bosch Gmbh Robert | Etching of pattern in or through glass layers - uses thin nickel layer directly on glass and photoresist on top of this to provide improved adhesion and etch resistance |
| DE4025193A1 (en) * | 1990-08-09 | 1992-02-13 | Olympia Aeg | Etching precision contour in glass plate surface - using coating of water soluble glass lacquer to provide adhesive surface for photoresist layer |
| JP2001089191A (en) * | 1999-09-27 | 2001-04-03 | Nippon Sheet Glass Co Ltd | Production process for display glass substrate and display glass substrate produced by the same |
| KR100380844B1 (en) * | 2001-04-12 | 2003-04-18 | 니시야마 스테인레스 케미컬 가부시키가이샤 | Method and apparatus for chemically polishing a liquid crystal glass substrate |
-
2003
- 2003-11-06 SG SG200306602A patent/SG121817A1/en unknown
- 2003-11-10 TW TW092131426A patent/TW200417783A/en unknown
- 2003-11-19 KR KR1020030082061A patent/KR20040045311A/en not_active Ceased
- 2003-11-21 CN CNB2003101183321A patent/CN100432772C/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103476725B (en) * | 2011-05-02 | 2016-10-05 | Hoya株式会社 | The manufacture method of the glass substrate of electronic equipment cover glass and manufacture device and the removing method of fluoaluminic acid alkali metal salt and device thereof |
| CN103476725A (en) * | 2011-05-02 | 2013-12-25 | Hoya株式会社 | Process and device for producing glass substrate for cover glass for use in electronic appliance, and method and device for removing alkali fluoroaluminate |
| CN103160282A (en) * | 2011-12-16 | 2013-06-19 | 爱思开海力士有限公司 | Etching composition and method for fabricating semiconductor device using the same |
| CN103160282B (en) * | 2011-12-16 | 2016-03-02 | 爱思开海力士有限公司 | Etch combinations thing and utilize it to manufacture the method for semiconducter device |
| CN104520098A (en) * | 2012-08-09 | 2015-04-15 | 旭硝子株式会社 | Glass-sheet-fluorine-resin laminate |
| CN103723927A (en) * | 2012-10-12 | 2014-04-16 | 技迪科技股份有限公司 | Method for manufacturing glass substrate with wavy surface |
| TWI461378B (en) * | 2012-10-12 | 2014-11-21 | Global Display Co Ltd | Method for manufacturing glass substrate having arched surface |
| CN104556716A (en) * | 2014-12-30 | 2015-04-29 | 深圳南玻伟光导电膜有限公司 | Etching solution and secondary hardening method of glass for capacitive touch screen |
| CN104849900A (en) * | 2015-06-03 | 2015-08-19 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| US9929189B2 (en) | 2015-06-03 | 2018-03-27 | Boe Technology Group Co., Ltd. | Fabrication method of display panel and display panel and display device |
| CN110770640A (en) * | 2017-05-24 | 2020-02-07 | 株式会社Nsc | Method for manufacturing glass panel with transparent film, method for manufacturing liquid crystal panel with transparent film, method for manufacturing glass panel, and method for manufacturing liquid crystal panel |
| CN120417249A (en) * | 2025-06-30 | 2025-08-01 | 深圳市板明科技股份有限公司 | An anti-diffusion agent for PCB glass substrate and its preparation method and application |
| CN120417249B (en) * | 2025-06-30 | 2025-10-31 | 深圳市板明科技股份有限公司 | An anti-diffusion agent for PCB glass substrates, its preparation method and application |
Also Published As
| Publication number | Publication date |
|---|---|
| SG121817A1 (en) | 2006-05-26 |
| CN100432772C (en) | 2008-11-12 |
| KR20040045311A (en) | 2004-06-01 |
| TW200417783A (en) | 2004-09-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1503035A (en) | Glass substrate for flat panel display and method for manufacturing same | |
| CN1532158A (en) | Method for cutting glass | |
| CN1380572A (en) | Chemical polishing method and chemical polishing device for liquid crystal glass substrate | |
| CN103482877A (en) | Method of processing cover glass and display device comprising the cover glass | |
| EP1364702A3 (en) | Process for producing array plate for biomolecules having hydrophilic and hydrophobic regions | |
| KR101113849B1 (en) | Method for isolating flexible substrate from support substrate | |
| US9181100B2 (en) | Method of transferring a graphene film | |
| CN1255842C (en) | Method for forming barrier structure on substrate and object formed therefrom | |
| ATE525500T1 (en) | METHOD FOR PRODUCING DIAMOND SUBSTRATES | |
| CN1217391A (en) | Etching device, etching method and circuit board made using said method | |
| JP7070425B2 (en) | Manufacturing method for laminated boards and electronic devices | |
| JP3665323B2 (en) | Glass substrate for flat panel display and manufacturing method thereof | |
| CN101051604A (en) | Method and device for panel etching process | |
| KR101890194B1 (en) | Method for preparing nail trimming instrument and nail trimming instrument prepared thereby | |
| CN1284199C (en) | Method for making base plate for panel display | |
| CN1024078C (en) | Method for making photographic sand carving pattern on surface of hard material and appratus thereof | |
| CN1451997A (en) | Electro-optic panel, electronic device and method for manufacturing electro-optic panel | |
| JP2004182586A5 (en) | ||
| KR101683473B1 (en) | Method for cutting glass by double etching | |
| US9533278B2 (en) | Patterned deposition of liquid films for biomedical devices | |
| HK1065373A (en) | Glass substrate for flat panel display, and process for producing the same | |
| KR101317790B1 (en) | Adhesive Chuck and Method for Manufacturing the same | |
| CN1955132A (en) | Etching device of glass substrate | |
| CN1896806A (en) | Module for manufacturing a display device, method of manufacturing the same, and method of manufacturing a display device using the same | |
| CN1287771A (en) | Manufacturing method of wiring circuit board, and wiring circuit board |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| REG | Reference to a national code |
Ref country code: HK Ref legal event code: DE Ref document number: 1065373 Country of ref document: HK |
|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| REG | Reference to a national code |
Ref country code: HK Ref legal event code: WD Ref document number: 1065373 Country of ref document: HK |
|
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081112 Termination date: 20111121 |