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CN1570555A - Micromirror detection method and detection device thereof - Google Patents

Micromirror detection method and detection device thereof Download PDF

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Publication number
CN1570555A
CN1570555A CN 03147629 CN03147629A CN1570555A CN 1570555 A CN1570555 A CN 1570555A CN 03147629 CN03147629 CN 03147629 CN 03147629 A CN03147629 A CN 03147629A CN 1570555 A CN1570555 A CN 1570555A
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micromirror
light source
target surface
light
assembly
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郭建峰
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BenQ Corp
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BenQ Corp
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Abstract

The invention provides a micromirror detection method, which comprises the following steps that a micromirror component is arranged on a micromirror bearing surface of a bearing seat. And then the light source emits light beams towards the micro-mirror assembly. The light beam is reflected from the micromirror assembly to the target surface and projects a second light spot on the target surface. The distance X of the second light spot relative to the reference point is measured, and the inclination of the micro-mirror assembly on the support is calculated accordingly.

Description

微镜检测方法及其检测装置Micromirror detection method and detection device thereof

技术领域technical field

本发明涉及一种微镜检测方法及其检测装置,特别是涉及一种检测微镜组件在组装后的倾斜度的微镜检测方法及其检测装置。The invention relates to a micromirror detection method and a detection device thereof, in particular to a micromirror detection method and a detection device thereof for detecting the inclination of a micromirror assembly after assembly.

背景技术Background technique

微机电技术发展已久,且逐渐应用于一般生活用品或是电子产品之中。而美国德州仪器公司开发的数字微镜组件DMD(Digital MicromirrorDevice),即为一种用于投影设备的反射组件。由数字微镜组件技术所设计的投影机,称为数码光输投影机(DLP,Digital Light Processing),以数字微镜组件作为成像仪器,反射光投射图像到屏幕。其关键组件数字微镜组件是由德州仪器公司开发研制的一种半导体组件,每一个数字微镜组件芯片包含成千上万的微小的正方形反射镜片,又称微镜。这些微镜按照行列紧密排列,每个微镜代表一个像素,并可由相应的内存在开或关的两种状态下控制切换转动,从而控制光的反射。Micro-electro-mechanical technology has been developed for a long time, and it is gradually applied to general daily necessities or electronic products. The digital micromirror component DMD (Digital MicromirrorDevice) developed by Texas Instruments is a reflective component for projection equipment. The projector designed by digital micromirror assembly technology is called digital light output projector (DLP, Digital Light Processing), which uses digital micromirror assembly as an imaging device, and reflects light to project an image to the screen. Its key component, the digital micromirror component, is a semiconductor component developed by Texas Instruments. Each digital micromirror component chip contains thousands of tiny square reflective lenses, also known as micromirrors. These micromirrors are closely arranged in rows and columns, and each micromirror represents a pixel, and can be switched and rotated by the corresponding memory in two states of on or off, so as to control the reflection of light.

数码光输投影机的光学组件繁多,由于数码光输投影机要求的分辨率及成像力都特别严格,故制造时的精度及公差都很难掌握。尤其微镜组件装设于镜头承座上时相对于镜头光轴的倾斜度,其直接关系着成像品质的好坏。但因微镜组件为微米制造,所以很难以一般的测量方法测量其倾斜度。因此镜头成品的特性及其品质,往往需通过实际成像之后才能检测。若在完整组装完毕后才得知镜头有缺陷,则需重新拆开及组装,耗费庞大的时间及人力。因此,需要能在组装过程中,实时检测其组装状况的微镜检测方法及其检测装置,以确保镜头的品质。There are many optical components in a digital optical projector. Since the resolution and imaging power required by digital optical projectors are extremely strict, it is difficult to grasp the precision and tolerance during manufacturing. In particular, the inclination of the micromirror assembly relative to the optical axis of the lens when it is mounted on the lens holder is directly related to the image quality. However, since the micromirror assembly is manufactured in micrometers, it is difficult to measure its inclination with a general measurement method. Therefore, the characteristics and quality of the finished lens can only be detected after actual imaging. If it is found that the lens is defective after complete assembly, it needs to be disassembled and assembled again, which consumes a lot of time and manpower. Therefore, there is a need for a micromirror detection method and detection device capable of detecting its assembly status in real time during the assembly process, so as to ensure the quality of the lens.

发明内容Contents of the invention

本发明即为了要能实时检测镜头的组装状况,而提供的一种微镜检测方法,其包括下述步骤,先将微镜组件设于承座的微镜承靠面。再利用光源朝向微镜组件射出光束。光束从微镜组件反射至靶面,并在该靶面上投射出一第二光点。测量该第二光点相对于基准点的距离X,并由此计算微镜组件在承座上的倾斜度。The present invention provides a micromirror detection method for real-time detection of lens assembly status, which includes the following steps: firstly, the micromirror assembly is arranged on the micromirror bearing surface of the holder. The light source is then used to emit light beams toward the micromirror assembly. The light beam is reflected from the micromirror assembly to the target surface, and a second light spot is projected on the target surface. The distance X of the second light spot relative to the reference point is measured, and the inclination of the micromirror assembly on the seat is calculated accordingly.

本发明也提供一种可供上述检测的微镜检测装置,包括一靶面以及一光源。光源朝向该微镜组件射出一光束,该光束从该微镜组件反射至该靶面。The present invention also provides a micromirror detection device for the above detection, including a target surface and a light source. The light source emits a light beam toward the micromirror assembly, and the light beam is reflected from the micromirror assembly to the target surface.

应用本发明的微镜检测方法,可快速有效地测量微镜组件装设于镜头承座上时相对于镜头光轴的倾斜度。因此,可以在镜头的装配过程中,直接检测微镜组件的组装状况,从而校正微镜组件的倾斜状况,提高产品合格率。By using the micromirror detection method of the present invention, the inclination relative to the optical axis of the lens when the micromirror assembly is installed on the lens holder can be quickly and effectively measured. Therefore, during the assembly process of the lens, the assembly status of the micromirror assembly can be directly detected, thereby correcting the inclination of the micromirror assembly and improving the qualified rate of the product.

附图说明Description of drawings

图1a为现有承座的立体;Fig. 1a is the three-dimensional view of the existing seat;

图1b为现有承座的后侧视图;Figure 1b is a rear side view of the existing socket;

图2a为本发明的微镜检测装置的示意图;Fig. 2 a is the schematic diagram of the micromirror detection device of the present invention;

图2b为本发明的微镜检测装置的靶面的示意图;Fig. 2 b is the schematic diagram of the target surface of the micromirror detection device of the present invention;

图3a为本发明的微镜检测装置的示意图;Fig. 3 a is the schematic diagram of the micromirror detection device of the present invention;

图3b为本发明的微镜检测装置的夹具的示意图;Fig. 3 b is the schematic diagram of the fixture of the micromirror detection device of the present invention;

图4为本发明的倾斜度计算方式的辅助说明图。Fig. 4 is an auxiliary explanatory diagram of the gradient calculation method of the present invention.

具体实施方式Detailed ways

首先,先说明承座的构造参照图1a,承座100包括一镜头承靠面110以及镜头承靠点111。参照图1b,其显示承座100的A方向侧视图,承座100还包括一微镜承靠面120,微镜承靠面120上具有微镜承靠点121以及开口122。微镜组件即由微镜承靠点121设于微镜承靠面120之上。而本发明所要检测的,即为微镜组件在装设于微镜承靠面120上时,是否有过度倾斜的情形。Firstly, the structure of the mount will be explained. Referring to FIG. 1 a , the mount 100 includes a lens resting surface 110 and a lens resting point 111 . Referring to FIG. 1 b , which shows a side view of the holder 100 in direction A, the holder 100 also includes a micromirror bearing surface 120 , and the micromirror bearing surface 120 has a micromirror bearing point 121 and an opening 122 . The micromirror assembly is arranged on the micromirror supporting surface 120 by the micromirror supporting point 121 . What the present invention needs to detect is whether the micromirror assembly is excessively tilted when it is installed on the micromirror bearing surface 120 .

以下先说明本发明的微镜检测装置的结构,再说明使用该微镜检测装置的微镜检测方法。The structure of the micromirror detection device of the present invention will be described below first, and then the micromirror detection method using the micromirror detection device will be described.

参照图2a,本发明的微镜检测装置,包括一靶面150以及一光源140。光源朝向微镜组件130射出一光束160,该光束160从该微镜组件130反射至该靶面150。Referring to FIG. 2 a , the micromirror inspection device of the present invention includes a target surface 150 and a light source 140 . The light source emits a light beam 160 toward the micromirror assembly 130 , and the light beam 160 is reflected from the micromirror assembly 130 to the target surface 150 .

参照图2b,靶面150上具有刻度以及一基准点151。通过光束160从该微镜组件130反射至该靶面150的第二光点152的相对于基准点151的位置,可得知微镜组件的倾斜状况。Referring to FIG. 2 b , there are scales and a reference point 151 on the target surface 150 . According to the position of the second spot 152 of the light beam 160 reflected from the micromirror assembly 130 to the target surface 150 relative to the reference point 151 , the inclination of the micromirror assembly can be known.

上述的光源140可以为激光。The aforementioned light source 140 may be a laser.

上述的光源140可设于靶面150之上。The above-mentioned light source 140 can be disposed on the target surface 150 .

上述的靶面150其材质可以为纸。The above-mentioned target surface 150 may be made of paper.

参照图3a,上述的微镜检测装置可还包括一第一夹具185,用以夹持该承座。以及一第二夹具180,用以夹持该光源。该第一夹具185以及第二夹具180可设于底座170之上。Referring to FIG. 3 a , the above-mentioned micromirror detection device may further include a first clamp 185 for clamping the seat. And a second clamp 180 for clamping the light source. The first clamp 185 and the second clamp 180 can be disposed on the base 170 .

参照图3b,该第一夹具185以及第二夹具180该可具有一夹具主体181,一檔板182,一调制机构183以及一固定件184。该档板182设于该夹具主体181中。该调制机构183穿过该夹具主体181并与该档板182接触,通过调整该调制机构183,可调整该文件板182的位置,并将工件夹持于该档板182与该夹具主体181之间。该固定件184设于该夹具主体181之下,夹具主体181由该固定件184固定在该底座170之上。Referring to FIG. 3 b , the first clamp 185 and the second clamp 180 may have a clamp body 181 , a baffle plate 182 , a modulation mechanism 183 and a fixing piece 184 . The baffle 182 is disposed in the clamp body 181 . The modulating mechanism 183 passes through the fixture body 181 and contacts the baffle plate 182. By adjusting the modulating mechanism 183, the position of the document plate 182 can be adjusted, and the workpiece is clamped between the baffle plate 182 and the fixture body 181. between. The fixing part 184 is disposed under the clamp body 181 , and the clamp body 181 is fixed on the base 170 by the fixing part 184 .

再参照图2a,本发明的微镜检测方法,包括下述步骤:首先,先限定出光源140的位置。先将一标准镜135设于该承座100的该微镜承靠面120。标准镜135为水平程度合于规定的镜面,标准镜135装设于微镜承靠面120时,即为预设的未倾斜状况。再利用该光源140朝向该标准镜135射出该光束160,该光束160从该标准镜135反射至该靶面150,并在该靶面150上投射出一第一光点155,参照图2b。此时,调整该光源140的位置,使该第一光点155投射至该基准点151。通过以上步骤,可限定光源140的标准位置。Referring to FIG. 2a again, the micromirror inspection method of the present invention includes the following steps: first, the position of the light source 140 is defined. First, a standard mirror 135 is disposed on the micromirror supporting surface 120 of the holder 100 . The standard mirror 135 is a mirror surface whose level meets the requirements. When the standard mirror 135 is installed on the micromirror supporting surface 120 , it is in a preset non-tilted state. Then use the light source 140 to emit the light beam 160 toward the standard mirror 135, the light beam 160 is reflected from the standard mirror 135 to the target surface 150, and projects a first light spot 155 on the target surface 150, see FIG. 2b. At this time, the position of the light source 140 is adjusted so that the first light spot 155 is projected to the reference point 151 . Through the above steps, the standard position of the light source 140 can be defined.

接下来,进行测量微镜组件倾斜度的步骤,依然先参照图2a,先将微镜组件130设于承座100的微镜承靠面120。再利用光源140朝向微镜组件130射出光束160。光束160从微镜组件130反射至靶面150,并在该靶面150上投射出一第二光点152,参照图2b。测量该第二光点152相对于基准点151的距离X,并由此计算微镜组件130在承座100上的倾斜度。Next, the step of measuring the inclination of the micromirror assembly is carried out. Still referring to FIG. 2 a , firstly, the micromirror assembly 130 is disposed on the micromirror bearing surface 120 of the holder 100 . The light source 140 is then used to emit a light beam 160 toward the micromirror assembly 130 . The light beam 160 is reflected from the micromirror assembly 130 to the target surface 150, and projects a second light spot 152 on the target surface 150, as shown in FIG. 2b. The distance X of the second light spot 152 relative to the reference point 151 is measured, and the inclination of the micromirror assembly 130 on the base 100 is calculated accordingly.

其计算倾斜度的方式,参照第4图,利用光源140与微镜组件130的间的距离Y,以及第二光点152相对于基准点151的距离X,以三角函数公式 2 θ = tan - 1 ( X Y ) , 可求得微镜组件130的倾斜度角θ。利用倾斜度角θ以及微镜组件130本身的长度,可以得知所需要补偿厚度T。因此可在微镜组件130的倾斜方位垫入厚度为T的垫片,或是以其它方式进行补偿,以修正微镜组件130的倾斜。The way to calculate the inclination, with reference to Fig. 4, utilizes the distance Y between the light source 140 and the micromirror assembly 130, and the distance X of the second light spot 152 relative to the reference point 151, using the trigonometric formula 2 θ = the tan - 1 ( x Y ) , The inclination angle θ of the micromirror assembly 130 can be obtained. Using the inclination angle θ and the length of the micromirror assembly 130 itself, the required compensation thickness T can be obtained. Therefore, a spacer with a thickness T can be inserted in the tilt orientation of the micromirror assembly 130 , or compensated in other ways, so as to correct the tilt of the micromirror assembly 130 .

再回到图2a,本发明的检测方法也可用于检测承座100的平行度,其包括下述步骤:首先将标准镜135设于该承座100的微镜承靠面120。再利用光源140朝向标准镜135射出光束160,光束160从标准镜135反射至靶面150,并在靶面150上投射出第一光点155(参照图2b)。然后调整光源140的位置,使第一光点155投射至基准点151。再将该标准镜135设于该承座100的镜头承靠面110(参照图2a),该光束160从该标准镜135反射至靶面150,并在靶150面上投射出第二光点152(参照图2b)。最后,测量第二光点152相对于该基准点151的位置;并Returning to FIG. 2 a , the detection method of the present invention can also be used to detect the parallelism of the holder 100 , which includes the following steps: first, the standard mirror 135 is set on the micromirror bearing surface 120 of the holder 100 . The light source 140 then emits a light beam 160 toward the standard mirror 135 , the light beam 160 is reflected from the standard mirror 135 to the target surface 150 , and projects a first light spot 155 on the target surface 150 (refer to FIG. 2 b ). Then adjust the position of the light source 140 so that the first light spot 155 is projected to the reference point 151 . Then the standard mirror 135 is arranged on the lens support surface 110 (referring to Fig. 2 a ) of the base 100, the light beam 160 is reflected from the standard mirror 135 to the target surface 150, and projects a second light spot on the target 150 surface 152 (see Figure 2b). Finally, measure the position of the second light spot 152 relative to the reference point 151; and

计算该微镜承靠面120与该镜头承靠面110的平行度。Calculate the parallelism between the micromirror supporting surface 120 and the lens supporting surface 110 .

计算承座100平行度的方式,可与上述的计算微镜组件倾斜度的方式相同,以三角函数的方式求得。The way to calculate the parallelism of the seat 100 can be obtained by means of trigonometric functions in the same way as the way of calculating the inclination of the above-mentioned micromirror assembly.

由于镜头承靠面110是否倾斜直接相关于镜头的光轴角度,因此可依照上述的承座平行度的检测结果,对各部位组件的尺寸误差进行补偿。Since the inclination of the lens supporting surface 110 is directly related to the optical axis angle of the lens, it is possible to compensate for the dimensional errors of components in various parts according to the detection results of the parallelism of the above-mentioned bearings.

应用本发明的微镜检测方法,可快速有效地测量微镜组件装设于镜头承座上时相对于镜头光轴的倾斜度。因此,可以在镜头的装配过程中,直接检测微镜组件的组装状况,从而校正微镜组件的倾斜状况,提高产品合格率。By using the micromirror detection method of the present invention, the inclination relative to the optical axis of the lens when the micromirror assembly is installed on the lens holder can be quickly and effectively measured. Therefore, during the assembly process of the lens, the assembly status of the micromirror assembly can be directly detected, thereby correcting the inclination of the micromirror assembly and improving the qualified rate of the product.

虽然结合以上较佳实施例揭露了本发明,然而其并非用以限定本发明,任何熟悉本领域技术人员在不脱离本发明的精神和范围内,仍可作一些更动与润饰,因此本发明的保护范围应以权利要求所界定的为准。Although the present invention has been disclosed in conjunction with the above preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can still make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection should be defined by the claims.

Claims (24)

1.一种微镜检测装置,用于检测一微镜组件于一承座上的倾斜度,包括:1. A micromirror detection device is used to detect the inclination of a micromirror assembly on a seat, comprising: 一靶面;以及a target surface; and 一光源,该光源朝向该微镜组件射出一光束,该光束从该微镜组件反射至该靶面。A light source, the light source emits a light beam toward the micromirror assembly, and the light beam is reflected from the micromirror assembly to the target surface. 2.如权利要求1所述的微镜检测装置,其中,该微镜检测装置还包括一第一夹具,该第一夹具用以夹持该承座。2. The micromirror inspection device according to claim 1, wherein the micromirror inspection device further comprises a first clamp for clamping the seat. 3.如权利要求1所述的微镜检测装置,其中,该微镜检测装置还包括一第二夹具,该第二夹具用以夹持该光源。3. The micromirror inspection device as claimed in claim 1, wherein the micromirror inspection device further comprises a second clamper for clamping the light source. 4.如权利要求1所述的微镜检测装置,其中,该光源为一激光。4. The micromirror inspection device as claimed in claim 1, wherein the light source is a laser. 5.如权利要求1所述的微镜检测装置,其中,该靶面的材质为纸。5. The micromirror detection device as claimed in claim 1, wherein the material of the target surface is paper. 6.如权利要求1所述的微镜检测装置,其中,该光源设于该靶面之上。6. The micromirror inspection device as claimed in claim 1, wherein the light source is disposed above the target surface. 7.一种承座平行度检测方法,包括下述步骤:7. A method for detecting the parallelism of a seat, comprising the steps of: 将一标准镜设于该承座的一微镜承靠面;setting a standard mirror on a micromirror bearing surface of the holder; 利用一光源朝向该标准镜射出一光束,该光束从该标准镜反射至一靶面,并在该靶面上投射出一第一光点;A light source is used to project a light beam toward the standard mirror, the light beam is reflected from the standard mirror to a target surface, and a first light spot is projected on the target surface; 调整该光源的位置,使该第一光点投射至一基准点;adjusting the position of the light source so that the first light point is projected to a reference point; 将该标准镜设于该承座的一镜头承靠面,该光束从该标准镜反射至该靶面,并在该靶面上投射出一第二光点;The standard mirror is arranged on a lens supporting surface of the base, the light beam is reflected from the standard mirror to the target surface, and a second light spot is projected on the target surface; 测量该第二光点相对于该基准点的位置;以及measuring the position of the second light spot relative to the reference point; and 计算该微镜承靠面与该镜头承靠面的平行度。Calculate the parallelism between the supporting surface of the micromirror and the supporting surface of the lens. 8.如权利要求7所述的承座平行度检测方法,其中,该光源为一激光。8. The method for detecting the parallelism of a socket according to claim 7, wherein the light source is a laser. 9.如权利要求7所述的承座平行度检测方法,其中,该靶面的材质为纸。9. The method for detecting parallelism of sockets according to claim 7, wherein the material of the target surface is paper. 10.如权利要求7所述的承座平行度检测方法,其中,该承座利用一第一夹具夹持。10. The method for detecting the parallelism of a socket according to claim 7, wherein the socket is clamped by a first jig. 11.如权利要求7所述的承座平行度检测方法,其中,该光源设于该靶面之上。11. The method for testing the parallelism of a socket according to claim 7, wherein the light source is disposed above the target surface. 12.如权利要求7所述的承座平行度检测方法,其中,该光源利用一第二夹具夹持。12. The method for testing the parallelism of a socket according to claim 7, wherein the light source is clamped by a second fixture. 13.如权利要求12所述的承座平行度检测方法,其中,调整该光源的位置,使该第一光点投射至该基准点的步骤,通过调整该第二夹具而调整该光源的位置。13. The method for detecting parallelism of sockets according to claim 12, wherein the step of adjusting the position of the light source so that the first light spot is projected onto the reference point is to adjust the position of the light source by adjusting the second fixture . 14.一种微镜检测方法,包括下述步骤:14. A micromirror detection method, comprising the steps of: 将一微镜组件设于一承座的一微镜承靠面;A micromirror assembly is arranged on a micromirror supporting surface of a seat; 利用一光源朝向该微镜组件射出一光束,该光束从该微镜组件反射至一靶面,并在该靶面上投射出一第二光点;A light source is used to emit a light beam toward the micromirror assembly, the light beam is reflected from the micromirror assembly to a target surface, and a second light spot is projected on the target surface; 测量该第二光点相对于一基准点的距离X;以及measuring the distance X of the second light spot relative to a reference point; and 计算该微镜组件在该承座上的倾斜度。Calculate the inclination of the micromirror assembly on the seat. 15.如权利要求14所述的微镜检测方法,其中,在将该微镜组件设于该承座的该微镜承靠面的步骤之前,还包括下述步骤:15. micromirror detection method as claimed in claim 14, wherein, before this micromirror assembly is arranged on the step of this micromirror bearing surface of this seat, also comprise the following steps: 将一标准镜设于该承座的该微镜承靠面;setting a standard mirror on the micromirror bearing surface of the holder; 利用该光源朝向该标准镜射出该光束,该光束从该标准镜反射至该靶面,并在该靶面上投射出一第一光点;using the light source to emit the light beam toward the standard mirror, the light beam is reflected from the standard mirror to the target surface, and projects a first light spot on the target surface; 调整该光源的位置,使该第一光点投射至该基准点。The position of the light source is adjusted so that the first light point is projected to the reference point. 16.如权利要求14所述的微镜检测方法,其中,还包括一测量该光源与该微镜组件之间距离Y的步骤。16. The micromirror inspection method as claimed in claim 14, further comprising a step of measuring the distance Y between the light source and the micromirror assembly. 17.如权利要求16所述的微镜检测方法,其中,计算该微镜组件在该承座上的倾斜度的步骤,利用该光源与该微镜组件之间距离Y以及该第二光点相对于一基准点的距离X,以三角函数计算而达成。17. The micromirror inspection method as claimed in claim 16, wherein the step of calculating the inclination of the micromirror assembly on the seat utilizes the distance Y between the light source and the micromirror assembly and the second light spot The distance X relative to a reference point is calculated using trigonometric functions. 18.如权利要求17所述的微镜检测方法,其中, 2 θ = tan - 1 ( X Y ) , θ为该微镜组件于该承座上的倾斜角。18. micromirror detection method as claimed in claim 17, wherein, 2 θ = the tan - 1 ( x Y ) , θ is the inclination angle of the micromirror assembly on the seat. 19.如权利要求14所述的微镜检测方法,其中,该光源为一激光。19. The inspection method of a micromirror as claimed in claim 14, wherein the light source is a laser. 20.如权利要求14所述的微镜检测方法,其中,该靶面的材质为纸,其上绘有刻度。20. The micromirror detection method as claimed in claim 14, wherein the material of the target surface is paper with scales drawn on it. 21.如权利要求14所述的微镜检测方法,其中,该承座利用一第一夹具夹持。21. The inspection method for a micromirror as claimed in claim 14, wherein the seat is clamped by a first fixture. 22.如权利要求14所述的微镜检测方法,其中,该光源设在该靶面之上。22. The micromirror detection method according to claim 14, wherein the light source is arranged above the target surface. 23.如权利要求14所述的微镜检测方法,其中,该光源利用一第二夹具夹持。23. The micromirror inspection method according to claim 14, wherein the light source is held by a second fixture. 24.如权利要求15所述的微镜检测方法,其中,调整该光源的位置,使该第一光点投射至该基准点的步骤,通过调整该第二夹具而调整该光源的位置。24. The micromirror inspection method as claimed in claim 15, wherein the step of adjusting the position of the light source to project the first light spot onto the reference point is to adjust the position of the light source by adjusting the second fixture.
CN 03147629 2003-07-15 2003-07-15 Micromirror detection method and detection device thereof Pending CN1570555A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101153820B (en) * 2006-09-27 2012-02-08 富士通株式会社 Measurement apparatus and measurement method
CN106018421A (en) * 2016-07-07 2016-10-12 李大伟 Method for adjusting surface of plane component to be parallel to motion plane
CN106524951A (en) * 2016-12-07 2017-03-22 福建福晶科技股份有限公司 Method and apparatus for measuring parallelism of germanium window plate
CN107607061A (en) * 2017-09-07 2018-01-19 中国科学院西安光学精密机械研究所 High-precision angle measurement system and method for virtual optical axis and structure leaning surface

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101153820B (en) * 2006-09-27 2012-02-08 富士通株式会社 Measurement apparatus and measurement method
CN106018421A (en) * 2016-07-07 2016-10-12 李大伟 Method for adjusting surface of plane component to be parallel to motion plane
CN106018421B (en) * 2016-07-07 2019-03-08 脉泽(苏州)智能系统技术有限公司 Adjust the plane component surface method parallel with plane of movement
CN106524951A (en) * 2016-12-07 2017-03-22 福建福晶科技股份有限公司 Method and apparatus for measuring parallelism of germanium window plate
CN107607061A (en) * 2017-09-07 2018-01-19 中国科学院西安光学精密机械研究所 High-precision angle measurement system and method for virtual optical axis and structure leaning surface
CN107607061B (en) * 2017-09-07 2024-04-05 中国科学院西安光学精密机械研究所 High-precision angle measurement method for virtual optical axis and structural leaning surface

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