CN1563483A - Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device - Google Patents
Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device Download PDFInfo
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- CN1563483A CN1563483A CN 200410017471 CN200410017471A CN1563483A CN 1563483 A CN1563483 A CN 1563483A CN 200410017471 CN200410017471 CN 200410017471 CN 200410017471 A CN200410017471 A CN 200410017471A CN 1563483 A CN1563483 A CN 1563483A
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- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 10
- 239000007921 spray Substances 0.000 title claims description 4
- 238000001816 cooling Methods 0.000 claims abstract description 7
- 239000000498 cooling water Substances 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims 2
- 239000007789 gas Substances 0.000 abstract description 21
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000012495 reaction gas Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 210000003437 trachea Anatomy 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Abstract
本发明公开了一种用于金属有机化学气相沉积设备的双层进气喷头，包括封闭形的外壳体，在外壳体内有上进气腔和下进气腔，在上中层板与底板之间安装有与上进气腔和反应室连通的上出气管，在下中层板与底板之间安装有与下进气腔和反应室连通的下出气管，特征是下出气管的直径大于上出气管的直径，且上出气管放置于下出气管中。本发明还设计有冷却腔。第一路反应气体和第二路反应气体分别由上出气管、下出气管进入反应室，到达衬底表面。因此本发明具有能够将不同反应气体分别送入反应室、使反应气体充分混合均匀、减小预反应、制造成品率高的优点。
The invention discloses a double-layer gas-intake nozzle for metal-organic chemical vapor deposition equipment, which comprises a closed outer casing, an upper gas inlet cavity and a lower gas inlet cavity in the outer casing, and an upper middle layer plate and a bottom plate An upper air outlet pipe communicating with the upper air inlet chamber and the reaction chamber is installed, and a lower air outlet pipe communicating with the lower air inlet chamber and the reaction chamber is installed between the lower middle plate and the bottom plate, and the characteristic is that the diameter of the lower air outlet pipe is larger than the upper air outlet pipe diameter, and the upper outlet pipe is placed in the lower outlet pipe. The invention also provides cooling chambers. The first reaction gas and the second reaction gas enter the reaction chamber through the upper gas outlet pipe and the lower gas outlet pipe respectively, and reach the substrate surface. Therefore, the present invention has the advantages of being able to send different reaction gases into the reaction chamber separately, fully mixing the reaction gases uniformly, reducing pre-reaction, and high manufacturing yield.
Description
技术领域technical field
本发明涉及喷头，尤其是涉及一种用于金属有机化学气相沉积设备(CVD)的双层进气喷头。The invention relates to a nozzle, in particular to a double-layer inlet nozzle for metal organic chemical vapor deposition equipment (CVD).
背景技术Background technique
在用金属有机化学气相沉积设备(MOCVD)制备半导体薄膜材料时，需要将不同反应气体分别送入反应室，然后将反应气体在衬底表面充分混合均匀，同时使得材料制备时的预反应减小，从而提高材料的有关性能。目前用于化学气相沉积设备的双层进气喷头内都设计有相互隔开的上进气腔和下进气腔，不同反应气体分别经上出气管和下出气管进入反应室，由于上出气管和下出气管间隔排列，因而存在以下缺点：由于上出气管和下出气管之间的管间距离较远，两管中气体不易混合充分和均匀，所以只适合低压生长。When using metal-organic chemical vapor deposition equipment (MOCVD) to prepare semiconductor thin film materials, different reaction gases need to be sent into the reaction chamber, and then the reaction gases are fully mixed on the substrate surface, and the pre-reaction during material preparation is reduced. , thereby improving the performance of the material. At present, the double-layer inlet nozzles used in chemical vapor deposition equipment are designed with an upper inlet chamber and a lower inlet chamber separated from each other, and different reaction gases enter the reaction chamber through the upper outlet pipe and the lower outlet pipe respectively. The trachea and the lower trachea are arranged at intervals, so there are the following disadvantages: due to the long distance between the upper trachea and the lower trachea, the gas in the two tubes is not easy to mix fully and uniformly, so it is only suitable for low-pressure growth.
发明内容Contents of the invention
本发明的目的在于提供一种能够将不同反应气体分别送入反应室、使反应气体充分混合均匀、减小预反应的用于金属有机化学气相沉积设备的双层进气喷头。The object of the present invention is to provide a double-layer gas-intake nozzle for metal organic chemical vapor deposition equipment, which can send different reaction gases into the reaction chamber separately, make the reaction gases fully mixed and uniform, and reduce pre-reaction.
本发明的目的是这样实现的：本发明包括封闭形的外壳体，在外壳体内固定有上中层板和下中层板，在顶板与上中层板之间形成上进气腔，在上中层板与下中层板之间形成下进气腔，在外壳体的侧壁上安装有与上进气腔连通的上进气管、与下进气腔连通的下进气管，在上中层板与底板之间安装有与上进气腔和反应室连通的上出气管，在下中层板与底板之间安装有与下进气腔和反应室连通的下出气管，特征是下出气管的直径大于上出气管的直径，且上出气管放置于下出气管中。The purpose of the present invention is achieved in that the present invention comprises a closed outer casing, an upper middle plate and a lower middle plate are fixed in the outer shell, an upper air intake cavity is formed between the top plate and the upper middle plate, and the upper middle plate and the lower middle plate are formed. A lower air intake chamber is formed between the lower middle plates, an upper air intake pipe communicating with the upper air intake chamber and a lower air intake pipe communicating with the lower air intake chamber are installed on the side wall of the outer shell, and the upper air intake pipe is installed between the upper middle plate and the bottom plate There is an upper air outlet pipe connected with the upper air inlet chamber and the reaction chamber, and a lower air outlet pipe connected with the lower air inlet chamber and the reaction chamber is installed between the lower middle plate and the bottom plate, and the characteristic is that the diameter of the lower air outlet pipe is larger than that of the upper air outlet pipe diameter, and the upper outlet tube is placed in the lower outlet tube.
在下中层板与底板之间为冷却腔，在外壳体的侧壁上安装有冷却水进水管和冷却水出水管。Between the lower middle plate and the bottom plate is a cooling chamber, and a cooling water inlet pipe and a cooling water outlet pipe are installed on the side wall of the outer casing.
本发明是在常规用于金属有机化学气相沉积设备的双层进气喷头基础上将上出气管放置于下出气管中，这样第一路反应气体就可从上进气管进入上进气腔，然后经上出气管进入反应室，到达衬底表面，第二路反应气体就可从下进气管进入下进气腔，然后经下出气管与上出气管之间的间隙进入反应室，到达衬底表面，从而达到了将不同反应气体分别送入反应室、使反应气体在衬底表面附近范围充分混合均匀和减小预反应的目的。本发明还设计有用于冷却底板温度的冷却腔。因此本发明具有如下优点：1、能够将不同反应气体分别送入反应室、使反应气体充分混合均匀、减小预反应；2、两路气流同时从一个较小区域喷出，在相同面积上容易将喷孔分布得更密集，从而提高均匀性；3、上出气管可以设计成与上中层板一起从上方取出的活动形式，这样就非常便于清洗；4、加工简便，成品率高，从而制作费用较低。5、该喷头适用于常压和低压生长技术。In the present invention, the upper air outlet pipe is placed in the lower air outlet pipe on the basis of the double-layer air inlet nozzle conventionally used in metal organic chemical vapor deposition equipment, so that the first reaction gas can enter the upper air inlet chamber from the upper air inlet pipe, and then Enter the reaction chamber through the upper air outlet pipe and reach the substrate surface, the second reaction gas can enter the lower air inlet chamber from the lower air inlet pipe, and then enter the reaction chamber through the gap between the lower air outlet pipe and the upper air outlet pipe to reach the substrate The surface, so as to achieve the purpose of sending different reaction gases into the reaction chamber separately, fully mixing the reaction gases in the vicinity of the substrate surface and reducing the pre-reaction. The invention also provides a cooling chamber for cooling the temperature of the base plate. Therefore the present invention has the following advantages: 1, different reaction gases can be sent into the reaction chamber respectively, the reaction gases are fully mixed evenly, and the pre-reaction is reduced; It is easy to distribute the spray holes more densely, thereby improving uniformity; 3. The upper outlet pipe can be designed as a movable form that can be taken out from above together with the upper middle plate, which is very convenient for cleaning; 4. The processing is simple and the yield is high, so that Production costs are lower. 5. The nozzle is suitable for normal pressure and low pressure growth technology.
附图说明Description of drawings
图1为本发明的剖视示意图；Fig. 1 is a schematic sectional view of the present invention;
图2为图1的A-A向俯视图。Fig. 2 is a top view along the line A-A of Fig. 1 .
具体实施方式Detailed ways
下面结合实施例并对照附图对本发明作进一步详细说明。The present invention will be described in further detail below in conjunction with the embodiments and with reference to the accompanying drawings.
本发明包括封闭形的外壳体1，在外壳体1内固定有上中层板4和下中层板5，在顶板3与上中层板4之间形成密封的上进气腔2，在上中层板4与下中层板5之间形成密封的下进气腔9，在外壳体1的侧壁14上安装有与上进气腔2连通的上进气管17、与下进气腔9连通的下进气管16，在上中层板4与底板6之间安装有与上进气腔2和反应室13连通的上出气管7，在下中层板5与底板6之间安装有与下进气腔9和反应室13连通的下出气管8，下出气管8的直径大于上出气管7的直径，且上出气管7放置于下出气管8中。The present invention comprises a closed outer shell 1, in which an
在下中层板5与底板6之间为冷却腔12，在外壳体1的侧壁14上安装有冷却水进水管15和冷却水出水管11。Between the
第一路反应气体可从上进气管17进入上进气腔2，然后经上出气管7进入反应室13，到达衬底10表面，第二路反应气体可从下进气管16进入下进气腔9，然后经下出气管8与上出气管7之间的间隙进入反应室13，到达衬底10表面。冷却水从冷却水进水管15进入冷却腔12，带走由衬底10及其基座传到底板6及上出气管7、下出气管8的热量，然后从冷却水出水管11流出。The first reaction gas can enter the upper
Claims (2)
1, a kind of double-deck air inlet spray head that is used for metal organic chemical vapor deposition equipment, the body skin (1) that comprises enclosed shape, at body skin (1) internal fixing last la m (4) and following la m (5) are arranged, between top board (3) and last la m (4), form the last inlet chamber (2) of sealing, between last la m (4) and following la m (5), form the following inlet chamber (9) of sealing, the last inlet pipe (17) that is communicated with last inlet chamber (2) is installed on the sidewall (14) of body skin (1), the lower inlet duct (16) that is communicated with following inlet chamber (9), between last la m (4) and base plate (6), the last escape pipe (7) that is communicated with last inlet chamber (2) and reaction chamber (13) is installed, between following la m (5) and base plate (6), the following escape pipe (8) that is communicated with following inlet chamber (9) and reaction chamber (13) is installed, it is characterized in that: the diameter of following escape pipe (8) is greater than the diameter of last escape pipe (7), and upward escape pipe (7) is positioned over down in the escape pipe (8).
2, the double-deck air inlet spray head that is used for metal organic chemical vapor deposition equipment as claimed in claim 1, it is characterized in that:, cooling water inlet pipe (15) and cooling water outlet pipe (11) are installed on the sidewall (14) of body skin (1) being cooling chamber (12) between la m (5) and the base plate (6) down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410017471 CN1292092C (en) | 2004-04-01 | 2004-04-01 | Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410017471 CN1292092C (en) | 2004-04-01 | 2004-04-01 | Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device |
Publications (2)
| Publication Number | Publication Date |
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| CN1563483A true CN1563483A (en) | 2005-01-12 |
| CN1292092C CN1292092C (en) | 2006-12-27 |
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