CN1549039A - Method for producing light interference display unit - Google Patents
Method for producing light interference display unit Download PDFInfo
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- CN1549039A CN1549039A CNA031237819A CN03123781A CN1549039A CN 1549039 A CN1549039 A CN 1549039A CN A031237819 A CNA031237819 A CN A031237819A CN 03123781 A CN03123781 A CN 03123781A CN 1549039 A CN1549039 A CN 1549039A
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Abstract
The present invention is the structure and making process of light interference type display panel. The making process includes successively forming the first electrode and sacrificial layer on substrate; forming openings in the sacrificial layer; painting photoresist layer on the sacrificial layer to fill the openings; microphotographing to form photoresist pattern layer and to define support; forming the second electrode on the sacrificial layer and the support; thermally shifting the support to alter the distance between the first electrode and the second electrode; and finally eliminating the sacrificial layer to obtain light interference type display unit.
Description
Technical field
The present invention relates to a kind of manufacture method of light interference type display panel, and particularly relevant for a kind of manufacture method of light interference type display panel of the stilt with sway brace.
Background technology
Flat-panel screens is owing to have little, the lightweight characteristic of volume, at the Portable display device, and very advantageous in the monitor market of using, little space.Flat-panel screens is now removed LCD (Liquid Crystal Display, LCD), organic electric exciting light-emitting diode (OrganicElectro-Luminescent Display, OLED) and plasma display (Plasma Display Panel, PDP) or the like outside, a kind of plane display mode of light interference type that utilizes is suggested.
See also U.S. USP5835255 patent, this patent has disclosed the array of display cells (Array of Modulation) of a visible light, can be used as flat-panel screens and uses.As shown in Figure 1, the diagrammatic cross-section that has shown existing display unit.Each light interference type display unit 100 comprises twice wall (Wall) 102 and 104, and 102,104 on twice wall is supported by stilt 106 and forms a chamber (Cavity) 108.The distance that the twice wall is 102,104, just the length of chamber 108 is D.But one of them is one to have the partial penetration partially reflecting layer of absorptivity absorption portion visible light for a wall 102,104, and another then is one can produce the reflection horizon of deformation with driven.When incident light passes wall 102 or 104 and when entering in the chamber 108, in the wavelength of the visible light spectrum that incident light is all (Wave Length represents with λ), only there is the wavelength (λ 1) of coincidence formula 1.1 can produce constructive interference and exports.Wherein N is a natural number.In other words,
2D＝Nλ (1.1)
When chamber 108 length D satisfy the integral multiple of incident light half wavelength, then can produce constructive interference and export precipitous light wave.At this moment, observer's eyes are observed along the direction of incident light incident, can see that wavelength is the reflected light of λ 1, therefore, is in "open" state to display unit 100.
First wall is a part of penetrating component reflecting electrode, generally is made up of a base material, an absorption layer and a dielectric layer.When incident light passed first wall, the part intensity of incident light was absorbed by absorption layer.Wherein, the material that forms base material can be the conductive, transparent material, for example indium oxide tin glass (ITO) or indium zinc oxide glass (IZO), and the material that forms absorption layer can be metal, for example aluminium, chromium, silver or the like.The material that forms dielectric layer can be monox, silicon nitride or metal oxide.The part of metal oxide can direct oxidation partially absorbs layer and obtains.Second wall then is a deformable reflecting electrode, can be out of shape under the control of voltage and moves up and down.Generally speaking the material that forms second wall can be dielectric material/conductive, transparent material or metal material/conductive, transparent material.
Fig. 2 has shown the diagrammatic cross-section after existing display unit adds voltage.As shown in Figure 2, under the driving of voltage, wall 104 produces deformation because of electrostatic attraction, sinks to the direction of wall 102.At this moment, the distance that the twice wall is 102,104, just the length of chamber 108 is also non-vanishing, but is d, and d can equal zero.At this moment, the D in the formula 1.1 will replace with d, in the wavelength X of the visible light spectrum that incident light is all, the visible wavelength (λ of coincidence formula 1.1 only be arranged
2) can produce constructive interference, penetrate wall 102 and export by the reflection of wall 104.102 pairs of wavelength of wall are λ
2Light have higher light absorption, at this moment, all visible light spectrum of incident light is all by filtering, for the observer who observes along the direction of incident light incident wall 102, with the reflected light that can not see in any visible light spectrum, therefore, display unit 100 is in "off" state.
Referring again to Fig. 1, the stilt 106 in the display unit 100 is generally formed by negative resistance material.Please shown in Fig. 3 A to Fig. 3 C, Fig. 3 A to Fig. 3 C is the manufacture method of existing display unit.As shown in Figure 3A, on a transparent base 109, form earlier first wall 102 and sacrifice layer 110 in regular turn, in wall 102 and sacrifice layer 110, form opening 112 again and form stilt in it to be applicable to.Then, a negative photoresist layer 111 and fill up opening 112 in spin coating on the sacrifice layer 110, the purpose that forms negative photoresist layer 111 is to form the stilt that is positioned between first wall 102 and second wall (not being shown on the figure).By the direction of arrow 113, the photoresist layer that is positioned at opening 112 is carried out back-exposure to the direction of transparent base 109.For the demand of back-exposure manufacturing process, sacrifice layer 110 is necessary for opaque material, is generally metal material.
Shown in Fig. 3 B, the negative photoresist layer of removing to exposure stays stilt 106 within opening 112.Then, form wall 104 on sacrifice layer 110 and stilt 106.Shown in Fig. 3 C, last, remove sacrifice layer 110 and form chamber 114 with structure release etch (Release Etch Process), the length D of chamber 114 is the thickness of sacrifice layer 110.Therefore, must in the manufacturing process of different display units, use the sacrifice layer of different-thickness, reflect the purpose of the light of different wave length to realize control.
For monochromatic flat-panel screens, display unit 100 is formed to utilize and is voltage-operatedly come the array of gauge tap enough, but for the color plane display, display unit 100 is obviously not enough.The existing practice is that manufacturing has three display units of different chamber length and becomes a pixel, and as shown in Figure 4, Fig. 4 has shown existing array color plane display diagrammatic cross-section.On same base material 300, form three display units 302,304 and 306 arrays respectively, when incident light 308 incidents, three display unit 302,304 and 306 different chamber length can reflect the coloured light of different wave length respectively, for example, and ruddiness, green glow or blue light.The arrangement of array of display cells formula the more important thing is that except selecting different mirror surfaces for use the resolution and the brightness between various coloured light that can provide splendid are even, and still, because the difference of chamber length, three display units must will be made respectively.
Shown in Fig. 5 A to Fig. 5 D, be the diagrammatic cross-section of existing array color plane manufacturing method of display device.Shown in Fig. 5 A, on a transparent base 300, form earlier first wall 310 and first sacrifice layer 312 in regular turn, in first wall 310 and sacrifice layer 312, form opening 314,316,318 and 320 again to define display unit 302,304 and the 306 predetermined positions that form.Then, form second sacrifice layer 322 of syntype on first sacrifice layer 312 and within the opening 314,316,318 and 320.
Shown in Fig. 5 B, with a lithography manufacturing process remove in opening 314 and 316 and therebetween with opening 318,322 in second sacrifice layer 322 after, the 3rd sacrifice layer 324 that forms syntype is on first sacrifice layer 312 and second sacrifice layer 322 and within the opening 314,316,318 and 320.
Shown in Fig. 5 C, keep opening 318 and 320 s' the 3rd sacrifice layer 324 and remove the 3rd sacrifice layer 324 other parts with a lithography manufacturing process.Then, spin coating one negative photoresistance is on first sacrifice layer 312, second sacrifice layer 322 and the 3rd sacrifice layer 324 and within opening 314,316,318 and 320 and fill up all openings and form negative photoresist layer 326, and the purpose of negative photoresist layer 326 is to form the stilt (not being illustrated on the figure) that is positioned between first wall 310 and second wall (not being shown on the figure).
Shown in Fig. 5 D, the photoresist layer that is positioned at opening 314,316,318 and 320 is carried out back-exposure by the direction of transparent base 300.For the demand of back-exposure manufacturing process, at least the first sacrifice layer 312 is necessary for opaque material, is generally metal material.Remove unexposed negative photoresist layer 326 and stay stilt 328 in opening 314,316,318 and 320.Then, forming second wall, 330 syntypes is covered on first sacrifice layer 312, second sacrifice layer 322 and the 3rd sacrifice layer 324 and the stilt 328.
At last, remove first sacrifice layer 312, second sacrifice layer 322 and the 3rd sacrifice layer 324 and form as shown in Figure 4 display unit 302,304 and chamber length d1, d2, the d3 of 306, three display units 302,304 and 306 thickness that is respectively first sacrifice layer 312, first sacrifice layer 312 and second sacrifice layer 322 and first sacrifice layer 312, second sacrifice layer 322 and the 3rd sacrifice layer 324 with structure release etch (Release Etch Process).Therefore, must in the manufacturing process of different display units, use the sacrifice layer of different-thickness, reflect the purpose of the light of different wave length to realize control.
Existing manufacturing array formula color plane display needs three road lithography manufacturing processes at least, with the chamber length of definition display unit 302,304 and 306.In order to cooperate back-exposure to form stilt, must use metal material as sacrifice layer, cost is higher itself in complicated manufacturing process, more seriously owing to complicated manufacturing process makes qualification rate to improve.
Therefore, provide a kind of easy light interference type display unit structure making process to make to have high resolving power simultaneously, high brightness, manufacturing process is simple and easy and manufacturing process's qualification rate is high colored light interference type display panel, become an important problem.
Summary of the invention
Therefore purpose of the present invention just provides a kind of light interference type display unit structure and manufacture method thereof, is applicable to make colored light interference type display panel, can have high resolving power and high brightness.
Another object of the present invention provides a kind of light interference type display unit structure and manufacture method thereof, is applicable to make colored light interference type display panel, the simple and easy and manufacturing process's qualification rate height of manufacturing process.
Another purpose of the present invention is that a kind of light interference type display unit structure and manufacture method thereof are being provided, and is applicable to make the colored light interference type display panel with stilt.
According to above-mentioned purpose of the present invention, a kind of manufacture method of light interference type display unit structure is proposed in a preferred embodiment of the present invention, on a transparent base, form earlier first wall and sacrifice layer in regular turn, in first wall and sacrifice layer, form opening again and form stilt in it to be applicable to.Then, spin coating last layer photoresistance and fill up opening on sacrifice layer.Define pillar with sway brace length as a stilt and definition sway brace with little shadow manufacturing process's pattern photoresist layer.Because the exposure of photoresist layer is by means of a light shield, so sacrifice layer no longer is necessary for opaque materials such as metal, general dielectric material also is applicable to as sacrifice layer.
Above sacrifice layer and stilt, form one second wall, again stilt is carried out one and bake (Baking) firmly, the sway brace of stilt is because stress, sway brace is that axle can produce displacement with the pillar, sway brace is less near an end movement amount of pillar, and the end of sway brace has bigger displacement.The displacement meeting of sway brace changes the position of second wall.At last, remove sacrifice layer and form chamber with structure release etch (Release Etch Process), because the displacement of sway brace, the length D of chamber can not be equal to the thickness of sacrifice layer.
Different length has different stress with the sway brace of the ratio of thickness, the size and the direction of the displacement that produces differ when carrying out baking firmly, therefore, can utilize the sway brace of the ratio of different length and thickness to control the length of chamber, and must in the manufacturing process of different display units, not use the sacrifice layer of different-thickness as prior art, and can reach the purpose that control reflects the light of different wave length.Such practice has considerable advantage, and the first, the reduction of cost.The thickness of existing chamber is the thickness of sacrifice layer, and sacrifice layer is removed at the last need of manufacturing process.The displacement that the present invention utilizes sway brace to make progress increases the length of chamber, and therefore, the length of chamber is greater than the thickness of sacrifice layer, and when forming the chamber of equal length, the thickness of sacrifice layer can decline to a great extent.Therefore, making the employed material of sacrifice layer also declines to a great extent.The second, the shortening of manufacturing process's time.The structure release etch of existing sacrificial metal layer is very consuming time, and etching gas must infiltrate to remove sacrifice layer via the gap between stilt.The present invention is because of being to utilize light shield to do face exposure, so sacrifice layer can adopt transparent material, dielectric material for example, but not must use transparent materials such as metal as prior art.In addition, because the employed thickness of sacrifice layer can significantly reduce, the required time of structure release etch can significantly reduce, moreover the use of dielectric material also makes speeding up of structure release etch, and this also can reduce the required time of structure release etch.Three, utilize stilt to form the complexity that colored light interference type display panel can reduce manufacturing process significantly, the sway brace length of utilizing stilt and the difference of thickness ratio change the stress of sway brace, after hard roasting, make different light interference type display unit have different chamber length and can change catoptrical wavelength, for example ruddiness, green glow or blue light to obtain different coloured light because of the displacement of sway brace.
The present invention also provides the manufacture method of an array formula color plane display device structure.Each array color plane display unit has three light interference type display unit.On a transparent base, form earlier first wall and sacrifice layer in regular turn, in first wall and sacrifice layer, form opening again and form stilt in it to be applicable to.Then, spin coating last layer photoresistance and fill up opening on sacrifice layer.Define pillar with sway brace length as a stilt and definition sway brace with little shadow manufacturing process's pattern photoresist layer, the sway brace of different light interference type display unit has different length.The sway brace of three light interference type display unit only together little shadow of need manufacturing process can be finished.Because the exposure of photoresist layer is by means of a light shield, so sacrifice layer no longer is necessary for opaque materials such as metal, general dielectric material also is applicable to as sacrifice layer.
Above sacrifice layer and stilt, form one second wall, again stilt is carried out one and bake (Baking) firmly, the sway brace of stilt is because stress, sway brace is that axle can produce displacement with the pillar, sway brace is less near an end movement amount of pillar, and the end of sway brace has bigger displacement.The displacement meeting of sway brace changes the position of second wall.At last, remove sacrifice layer and form chamber with structure release etch (Release Etch Process), because the displacement of sway brace, the length D of chamber can not be equal to the thickness of sacrifice layer.
First wall is first electrode and second wall is second electrode.The length difference of each light interference type display unit T type sway brace, has different stress, therefore in the hard roasting displacement difference of sway brace later, can change catoptrical wavelength to obtain different coloured light so the chamber length of each light interference type display unit is different, for example ruddiness, green glow or blue light and can obtain an array formula color plane display device structure.
The invention has the beneficial effects as follows, the color plane display that the array of disclosed light interference type display unit is formed according to the present invention, the advantage that has kept existing array color plane display, have high resolving power and high brightness, also have simultaneously the advantage of existing multi-layer color plane display, the simple and easy and manufacturing process's qualification rate height of manufacturing process.Hence one can see that, the disclosed light interference type display unit of the present invention not only keeps the existing all advantages of light interference type color plane display simultaneously when forming array, high resolving power, high brightness, manufacturing process is simple and easy and manufacturing process's qualification rate height outside, nargin in the time of more can increasing manufacturing process, manufacturing process's qualification rate of raising light interference type color plane display.
Description of drawings
Fig. 1 is the diagrammatic cross-section of existing display unit;
Fig. 2 is the diagrammatic cross-section after existing display unit adds voltage;
Fig. 3 A to Fig. 3 C is the manufacture method of existing display unit;
Fig. 4 is existing array color plane display diagrammatic cross-section;
Fig. 5 A to Fig. 5 D is the diagrammatic cross-section of existing array color plane manufacturing method of display device;
Fig. 6 A to Fig. 6 C is the manufacture method of a kind of light interference type display unit of preferred embodiment of the present invention;
Fig. 6 D is a kind of light interference type display unit diagrammatic cross-section according to a preferred embodiment of the present invention; And
Fig. 7 A to Fig. 7 D is the manufacture method according to a kind of array color plane display device structure of the present invention's second preferred embodiment.Wherein, description of reference numerals is as follows:
100,302,304,306,500,624,626,628: light interference type display unit
102,104,310,330: wall
1021,109,300,501,701: base material
1022: absorption layer
1023: dielectric layer
106,328,512,616,618,620,622: stilt
108,114,, 516,6241,6261,6281: chamber
110,312,322,324,506,604: sacrifice layer
111,326: negative photoresist layer
112,314,316,318,320,508,606,608,610,612: opening
113: arrow
502,504,602,630: the minute surface electrode
510,614: material layers
514,6161,6181,6201,6221: pillar
5121,5122,6162,6182,6183,6202,6203,6222: sway brace
504 ', 5121 ', 5122 ': dotted line
R: ruddiness
G: green glow
B: blue light
D, D ', d, d1, d2, d3: length
Embodiment
For allow color-variable pixel unit structure provided by the present invention clear more for the purpose of, in the embodiment of the invention 1, describe the structure of each light interference type display unit in detail.In addition, by make the present invention disclosed with the formed light interference type color plane of light interference type display unit array display clear more for the purpose of, in the embodiment of the invention 2, further describe.
Embodiment 1
Fig. 6 A to Fig. 6 C is the manufacture method of a kind of light interference type display unit of preferred embodiment of the present invention.As shown in Figure 6A, form first electrode 502 and sacrifice layer 506 in regular turn earlier on a transparent base 501, wherein, sacrifice layer 506 can adopt transparent material, for example dielectric material, or transparent materials, for example metal material.Form opening 508 with a lithography manufacturing process in first electrode 502 and sacrifice layer 506, opening 508 is applicable to that portion forms stilt within it.
Then, form a material layers 510 and fill up opening 508 at sacrifice layer 506.Material layers 510 is applicable to the formation stilt, generally can usability finish matter, and for example photoresistance, or the polymerizable material of non-sensitization, for example polyester or poly-vinegar or the like.If use non-sensitization material to form material layers, then need a lithography operation on material layers 510, to define stilt.Form material layers 510 with the sensitization material in the present embodiment, so only need with a little shadow operation patterning material layers 510.
Shown in Fig. 6 B, define stilt 512 by a little shadow manufacturing process pattern material layers 510, stilt 512 has pillar 514 and is positioned within the opening 508 and sway brace 5121 and 5122. Sway brace 5121 and 5122 length are also defined by same little shadow manufacturing process.As for the thickness of sway brace 5121 and 5122, then be when forming the step of material layers 510, to determine.Above sacrifice layer 506 and stilt 512, form one second electrode 504.
At last, shown in Fig. 6 C, carry out a hot manufacturing process, for example one bake (Baking) firmly, the sway brace 5121 of stilt 512 and 5122 is because stress, sway brace 5121 and 5122 serves as that axle can produce a displacement with pillar 514, sway brace 5121 and 5122 less near an end movement amount of pillar 514, and the end of sway brace 5121 and 5122 has bigger displacement.Sway brace 5121 and 5122 displacement meeting change the position of second electrode 504.At last, remove sacrifice layer and form chamber 516 with structure release etch (Release Etch Process).
Shown in Fig. 6 D, Fig. 6 D has shown a kind of light interference type display unit diagrammatic cross-section according to a preferred embodiment of the present invention as the light interference type display unit of Fig. 6 A to Fig. 6 C manufacturing.One light interference type display unit 500 can be used as a color-variable pixel unit, comprises one first electrode 502, one second electrode 504 at least, and wherein, first electrode 502 becomes to be arranged in parallel with second electrode 504 approximately.First electrode 502 and one second electrode 504 are selected from narrow wavestrip (Narrowband) minute surface, wide wavestrip (Broadband) minute surface, nonmetal mirror and speculum or it makes up the set of being formed.
Supported by stilt 512 between first electrode 502 and second electrode.The sway brace 5121 and 5122 of stilt 512 is upturned.The length of the chamber in existing light interference type display unit structure is the thickness of sacrifice layer, if the thickness of sacrifice layer is D, the length of chamber also is D.In the present embodiment, 504 at first electrode 502 and second electrode are supported by stilt 512 and are formed a chamber 516.Stilt 512 has sway brace 5121 and 5122, the ratio decision sway brace 5121 of sway brace 5121 and 5122 length and thickness and 5122 stress, and dotted line 5121 ' and 5122 ' shows the position before sway brace 5121 and 5122 carries out hot manufacturing process.When after overheated manufacturing process, sway brace 5121 and 5122 can produce displacement, and the position that makes second electrode 504 produces change from the position that the position indicated of original dotted line 504 ', the chamber 510 that first electrode 502 and second electrode are 504 is changed over the length of D ' by the length of original D, because the length of chamber 516 changes, catoptrical frequency also can change.Generally speaking, when with poly-vinegar compound when forming the material of stilt 512, sway brace 5121 and 5122 length thickness ratio be between 5 between 50 the time, the length D ' of chamber 510 is about 1.5 times to 3 times of thickness D of sacrifice layer.Certainly, also can change the length thickness ratio of sway brace 5121 and 5122 and make the thickness D of the length D ' of the chamber 516 after baking firmly less than sacrifice layer.
Be applicable in the present invention as the material that forms stilt 512 to comprise positive photoresistance, negative photoresistance, various polymkeric substance, for example, acrylic (Acrylic) resin, epoxy resin or the like.
Embodiment 2
Shown manufacture method as Fig. 7 A to Fig. 7 D according to a kind of array color plane display device structure of the present invention's second preferred embodiment.Shown in Fig. 7 A, on a transparent base 601, form first electrode 602 and sacrifice layer 604 in regular turn earlier, wherein, sacrifice layer 604 can adopt transparent material, for example dielectric material, or transparent materials, for example metal material.Form opening 606,608,610,612 with a lithography manufacturing process in first electrode 602 and sacrifice layer 604, opening 606,608,610,612 is applicable to and forms stilt in it.
Then, on sacrifice layer 604, form a material layers 614 and fill up opening 606,608,610,612.Four openings 606,608,610,612 define the position of light interference type display unit 624,626 and 628 in twos.Material layers 614 is applicable to the formation stilt, generally can usability finish matter, and for example photoresistance, or the polymerizable material of non-sensitization, for example polyester or poly-vinegar or the like.If use non-sensitization material to form material layers, then need a lithography manufacturing process on material layers 614, to define stilt.Form material layers 614 with the sensitization material in the present embodiment, so only need with a little shadow manufacturing process pattern material layers 614.
Shown in Fig. 7 B, define stilt 616,618,620,622 by a little shadow manufacturing process pattern material layers 614, stilt 616,618,620,622 has pillar 6161,6181,6201,6221 respectively and is positioned within the opening 606,608,610,612 and sway brace 6162,6182,6183,6202,6203,6222. Sway brace 6162 and 6182,6183 identical with 6222 length with 6202 and 6203.Above sacrifice layer 604 and stilt 616,618,620,622, form one second electrode 630.
Shown in Fig. 7 C, carry out a hot manufacturing process, for example one bake (Baking) firmly, stilt 616,618,620,622 sway brace 6162,6182,6183,6202,6203,6222 because stress, sway brace 6162,6182,6183,6202,6203,6222 with pillar 6161,6181,6201,6221 is that axle can produce displacement, sway brace 6162,6182,6183,6202,6203,6222 near pillar 6161,6181,6201, an end movement amount of 6221 is less, and sway brace 6162,6182,6183,6202,6203,6222 end has bigger displacement.Sway brace 6162 and 6182,6183 and 6202,6203 is with the big or small identical of 6222 displacements in twos but the displacement difference between three groups of sway braces, therefore, brace 6162 and 6182,6183 and 6202,6203 also different to the change amount of second electrode 630 position of causing with 6222 displacement.
At last, shown in Fig. 7 D.Remove sacrifice layer 604 and the chamber 6241,6261 and 6281 of formation light interference type display unit 624,626 and 628 with structure release etch (Release Etch Process).Chamber 6241,6261 and 6281 has different length d
1, d
2And d
3In light interference type display unit 624,626 and 628 is under the "open" state, shown in formula 1.1, and chamber length d
1, d
2And d
3Design can produce the reflected light of different wave length, for example ruddiness, green glow or blue light.
Because the length d of chamber 6241,6261 and 6281
1, d
2And d
3Be not that thickness by sacrifice layer decides, but decide by sway brace 6162 and 6182,6183 and 6202,6203 and 6222 length, therefore, do not need little shadow manufacturing process as the prior art complexity to form the different sacrifice layer of thickness and define different chamber length.
The color plane display of forming according to the array of the disclosed light interference type display unit of present embodiment, kept the advantage of array color plane display in the prior art, have high resolving power and high brightness, also have simultaneously the advantage of existing multi-layer color plane display, the simple and easy and manufacturing process's qualification rate height of manufacturing process.For existing array color plane display, do not need to form the different sacrifice layer of thickness in the array of the disclosed light interference type display unit of present embodiment and define different chamber length, simple and easy and and the manufacturing process's qualification rate height of manufacturing process as existing complicated little shadow manufacturing process.For existing multi-layer color plane display, the array of the disclosed light interference type display unit of present embodiment, it is in the same plane that all can be used to produce the light interference type display unit that reflects coloured light, incident light need not penetrate the light interference type display unit of multilayer to reflect different coloured light, therefore have high resolving power and high brightness, and, existing multi-layer color plane display is that the light interference type display unit that incident light effectively passed be arranged in the front position arrives the light interference type display unit of position, back and result's (reflected light of green wavelength or blue light wavelength) of the back position light interference type display unit interference of light can effectively penetrate the front position light interference type display unit, the employed material of first electrode of three type light interference type display unit and second electrode is formed and thickness all needs inequality, manufacturing process seems merely, but in fact is still suitable complexity.By contrast, the complexity of the manufacturing process of the array of the disclosed light interference type display unit of the present invention is not higher than existing manufacturing process.
Though the present invention discloses as above with a preferred embodiment, but be not in order to qualification the present invention, any those skilled in the art, without departing from the spirit and scope of the present invention, the equivalent structure transformation of being made all is included in the claim of the present invention.
Claims (17)
1. the manufacture method of a light interference type display unit is applicable to that on the base material, this method comprises at least:
Form one first electrode on this base material;
Form a sacrifice layer on this first electrode;
Formation at least two is opened within sacrifice layer and this first electrode and defines the position of this light interference type display unit;
Form a pillar and also form at least one sway brace simultaneously in each this opening on this pillar, wherein this pillar and this sway brace form a stilt;
Form one second electrode on this sacrifice layer and this sway brace;
One this stilt of hot fabrication process; And
Remove this sacrifice layer.
2. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, the method that forms this stilt also comprises:
Forming a sensitization material layers fills up those openings and covers this sacrifice layer; And
This sensitization material layers of patterning is to form pillar and form at least one sway brace on this pillar in each those opening, wherein this pillar and this sway brace form a stilt.
3. the manufacture method of light interference type display unit as claimed in claim 2 is characterized in that, this sensitization material layers is a photoresistance.
4. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, the method for this sensitization material layers of patterning comprises a micro-photographing process.
5. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, the method that forms this stilt also comprises:
Forming a non-sensitization material layers fills up described opening and covers this sacrifice layer; And
To form pillar and form at least one sway brace in each described opening on this pillar, wherein this pillar and this sway brace form a stilt with this non-sensitization material layers of a micro image etching procedure patterning.
6. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this hot processing procedure can be for one roasting firmly.
7. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this hot processing procedure makes this sway brace stress and produces displacement.
8. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this first electrode comprises at least:
One base material;
One absorption layer; And
One dielectric layer.
9. the manufacture method of light interference type display unit as claimed in claim 8 is characterized in that, this base material is the electrically conducting transparent material.
10. the manufacture method of light interference type display unit as claimed in claim 8 is characterized in that, the material that forms this dielectric layer can be monox, silicon nitride or metal oxide.
11. the manufacture method of light interference type display unit as claimed in claim 8 is characterized in that, this absorption layer can be metal.
12. the manufacture method of light interference type display unit as claimed in claim 8 is characterized in that, this base material is indium tin oxidation glass or indium zinc oxidation glass.
13. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this this first electrode and this second electrode are selected from the set that narrow wavestrip minute surface, wide wavestrip minute surface, nonmetal mirror and speculum or its combination are formed.
14. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this second electrode is for producing the electrode that mo(u)ld bottom half becomes.
15. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this second electrode is transportable electrode.
16. the manufacture method of light interference type display unit as claimed in claim 1 is characterized in that, this second electrode comprises an opaque conductive material or half electrically conducting transparent material at least.
17. the manufacture method of light interference type display unit as claimed in claim 16 is characterized in that, this translucent conductive material can be indium tin oxidation glass or indium zinc oxidation glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03123781 CN1252530C (en) | 2003-05-20 | 2003-05-20 | Method for producing light interference display unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03123781 CN1252530C (en) | 2003-05-20 | 2003-05-20 | Method for producing light interference display unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1549039A true CN1549039A (en) | 2004-11-24 |
| CN1252530C CN1252530C (en) | 2006-04-19 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 03123781 Expired - Fee Related CN1252530C (en) | 2003-05-20 | 2003-05-20 | Method for producing light interference display unit |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100360982C (en) * | 2005-01-13 | 2008-01-09 | 友达光电股份有限公司 | Microelectromechanical optical display assembly |
| US7403321B2 (en) | 2004-12-30 | 2008-07-22 | Au Optronics Corp. | Optical microelectromechanical device |
-
2003
- 2003-05-20 CN CN 03123781 patent/CN1252530C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7403321B2 (en) | 2004-12-30 | 2008-07-22 | Au Optronics Corp. | Optical microelectromechanical device |
| CN100360982C (en) * | 2005-01-13 | 2008-01-09 | 友达光电股份有限公司 | Microelectromechanical optical display assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1252530C (en) | 2006-04-19 |
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