CN1328936C - Method of forming encapsulation protection structure - Google Patents
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- CN1328936C CN1328936C CNB2004100012700A CN200410001270A CN1328936C CN 1328936 C CN1328936 C CN 1328936C CN B2004100012700 A CNB2004100012700 A CN B2004100012700A CN 200410001270 A CN200410001270 A CN 200410001270A CN 1328936 C CN1328936 C CN 1328936C
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Abstract
Description
技术领域technical field
本发明涉及一种形成有机发光元件(有机EL元件)的封装保护结构的方法,尤其涉及一种应用于有机发光显示器(OLED)的形成封装保护结构的方法。The invention relates to a method for forming an encapsulation protection structure of an organic light-emitting element (organic EL element), in particular to a method for forming an encapsulation protection structure applied to an organic light-emitting display (OLED).
背景技术Background technique
随着信息时代的来临,显示器已成为电气设备的必要元件,例如笔记型电脑、移动电话、资讯家电(IA)以及个人数字助理(PDA)等,大多需要显示器元件。一般来说,轻、薄、省电是对显示器的基本要求,但受限于视角、应答速度、亮度、图像质量以及对温度的稳定性等要求,新一代显示器技术中,有机发光显示器元件(Organic Light Emitting Device,OLED)由于具有自发光性(不需使用背光源)、视角广、应答速度快、制造工艺简单、耗电低等良好特性,目前已成为所属领域技术人员积极研究开发的产品。With the advent of the information age, the display has become a necessary component of electrical equipment, such as notebook computers, mobile phones, information appliances (IA) and personal digital assistants (PDA), etc., most of which require display components. Generally speaking, lightness, thinness, and power saving are the basic requirements for displays, but limited by viewing angle, response speed, brightness, image quality, and temperature stability. In the new generation of display technology, organic light-emitting display components ( Organic Light Emitting Device (OLED) has become a product actively researched and developed by technicians in the field due to its good characteristics such as self-luminescence (no need to use backlight), wide viewing angle, fast response speed, simple manufacturing process, and low power consumption. .
由于有机发光显示器发展的历史还不够长,目前的技术尚面临一些有待突破的问题。尤其是,大气中的水气与氧气很容易造成有机发光显示器元件(简称有机EL元件)的阴极氧化以及有机化合物介面剥离等现象,使得有机EL元件极易产生暗点(darkspot),不但降低显示器的良好率以及所发出的辉度,同时亦缩短了显示器的使用寿命。为了避免上述缺陷,传统的技术多以金属封装罐或玻璃封装罐的封装保护来避免有机发光显示器元件中的电极层材料以及有机层材料与外界环境接触。然而,金属封装罐在制造上具有重量重、易被氧化等缺点,玻璃封装罐具有不易加工、易碎、体积大以及重量重等缺点。而且,金属与玻璃的接着性差、元件粘合处的平坦度要求又高,封装上极易因应力不均而造成剥离现象,况且随着采用塑料基板来制作有机EL元件的趋势,将来可能不再使用金属或玻璃封装保护结构。因此,为了能够使有机EL元件达到更轻、更薄,以及适应未来有机EL元件全塑化的发展,致密性高的封装保护结构镀覆方式应是积极加强研究发展的重点。Since the development history of organic light-emitting displays is not long enough, the current technology still faces some problems to be broken through. In particular, moisture and oxygen in the atmosphere can easily cause cathode oxidation of organic light-emitting display elements (referred to as organic EL elements) and organic compound interface peeling, which makes organic EL elements very easy to produce dark spots (darkspot), which not only reduces the display The good rate and the brightness emitted, but also shorten the life of the display. In order to avoid the above-mentioned defects, the traditional technologies mostly use metal packaging cans or glass packaging cans for packaging protection to prevent the electrode layer materials and organic layer materials in the organic light-emitting display element from contacting the external environment. However, metal packaging cans have disadvantages such as heavy weight and easy oxidation in manufacture, and glass packaging cans have disadvantages such as difficult processing, fragility, large volume and heavy weight. Moreover, the adhesion between metal and glass is poor, and the flatness of the component bonding is high, and the packaging is very easy to cause peeling due to uneven stress. Moreover, with the trend of using plastic substrates to make organic EL components, it may not be possible in the future. The protective structure is then encapsulated in metal or glass. Therefore, in order to make organic EL elements lighter and thinner, and to adapt to the development of full plasticization of organic EL elements in the future, the high-density packaging protection structure plating method should be the focus of actively strengthening research and development.
请参阅图1,该图为现有的有机EL元件封装结构的断面示意图。如图1所示,有机EL元件10通常包括一基板101、一第一导电层102、一有机发光材料多层结构103、一第二导电层104。其中,基板101通常为玻璃基板或金属基板,第一导电层102为氧化铟锡(ITO)导电透明膜或氧化铟锌(IZO)薄膜,第二导电层104则可为金属或金属化合物或氧化铟锡(ITO)导电透明膜或氧化铟锌(IZO)薄膜等,为了阻绝有机发光显示器元件中的电极层材料以及有机层材料与外界环境接触,必须形成一封装保护结构11于有机EL元件10上,以下为传统有机EL元件形成封装保护结构的必要步骤:Please refer to FIG. 1 , which is a schematic cross-sectional view of an existing organic EL element packaging structure. As shown in FIG. 1 , an organic EL element 10 generally includes a substrate 101 , a first conductive layer 102 , a multilayer structure of organic luminescent material 103 , and a second conductive layer 104 . Among them, the substrate 101 is usually a glass substrate or a metal substrate, the first conductive layer 102 is an indium tin oxide (ITO) conductive transparent film or an indium zinc oxide (IZO) thin film, and the second conductive layer 104 can be a metal or a metal compound or an oxide film. Indium tin (ITO) conductive transparent film or indium zinc oxide (IZO) film, etc., in order to block the electrode layer material and organic layer material in the organic light-emitting display element from contacting the external environment, it is necessary to form a package protection structure 11 on the organic EL element 10 Above, the following are the necessary steps to form a packaging protection structure for traditional organic EL elements:
首先,利用热升华方式将如丙稀酸(酯)前体之类的高分子材料镀着在有机EL元件10上,以照光方式使高分子聚合形成一第一缓冲层111,并利用溅射(sputtering)或化学气相沉积(CVD)方法,在反应腔体中以无机或陶瓷材料形成第一保护层(passivation)112,该保护层完全填补于第一缓冲层111上,将基板101回送至高分子沉积腔体,再形成一第二缓冲层113于第一保护层112上。接着,将整个基板101传送回无机或陶瓷材料的反应腔体中,形成第二保护层(passivation)114于第二缓冲层113上,再视需求反复制作多层结构。First, polymer materials such as acrylic acid (ester) precursors are plated on the organic EL element 10 by means of thermal sublimation, and the polymers are polymerized to form a first buffer layer 111 by means of light irradiation, and the first buffer layer 111 is formed by sputtering (sputtering) or chemical vapor deposition (CVD) method, form the first protective layer (passivation) 112 with inorganic or ceramic materials in the reaction chamber, the protective layer is completely filled on the first buffer layer 111, and the substrate 101 is returned to high The molecular deposition chamber is used to form a second buffer layer 113 on the first protection layer 112 . Next, the entire substrate 101 is transported back into the reaction chamber made of inorganic or ceramic materials to form a second passivation layer (passivation) 114 on the second buffer layer 113 , and then repeatedly fabricate a multi-layer structure as required.
在制作封装保护结构11的过程中,由于整个基板101必须在制作保护层的反应腔体与制作缓冲层的热升华腔体间往复传送,制造工艺较复杂,元件若为上板发光(Top emission)型元件则需考虑到照光是否会对有机材料造成影响。In the process of manufacturing the packaging protection structure 11, since the entire substrate 101 must be reciprocated between the reaction chamber for making the protective layer and the thermal sublimation chamber for making the buffer layer, the manufacturing process is relatively complicated. ) type components, it is necessary to consider whether the light will affect the organic material.
所以,如何针对有机EL元件来设计制造工艺较简便、成本较低的封装保护结构,的确是目前应加以研究的课题。Therefore, how to design a package protection structure with a simpler manufacturing process and lower cost for organic EL elements is indeed a topic that should be studied at present.
发明内容Contents of the invention
本发明要解决的技术问题是提供一种形成有机EL元件的封装保护结构的方法,该方法可在同一反应腔体中完成封装保护结构的制造过程,且可应用于具有玻璃基板、金属基板以及塑料基板的有机发光元件,并使有机发光元件(有机EL元件)的封装保护结构(passivation layer)更轻、更薄以及致密性高。The technical problem to be solved by the present invention is to provide a method for forming a packaging protection structure for organic EL elements, which can complete the manufacturing process of the packaging protection structure in the same reaction chamber, and can be applied to glass substrates, metal substrates and Organic light-emitting elements on plastic substrates, and make the passivation layer of organic light-emitting elements (organic EL elements) lighter, thinner and denser.
据此,本发明所提供的应用于有机发光显示器(OLED)上的形成封装保护结构的方法包括:将有机发光元件置于等离子体反应腔体内,利用等离子增强化学气相沉积(PECVD)方法在有机发光元件上形成一第一缓冲层(buffer layer),而不需用照光方式将高分子前体固化;在第一缓冲层上形成一第一保护层(passivation layer);在第一保护层上形成一第二缓冲层(bufferlayer);以及在第二缓冲层上形成一第二保护层(passivation layer)。其中,第一缓冲层、第一保护层、第二缓冲层以及第二保护层都在同一等离子体反应腔体内以等离子体聚合方式形成。Accordingly, the method for forming an encapsulation protection structure applied to an organic light-emitting display (OLED) provided by the present invention includes: placing an organic light-emitting element in a plasma reaction chamber, and using a plasma-enhanced chemical vapor deposition (PECVD) method A first buffer layer (buffer layer) is formed on the light-emitting element without curing the polymer precursor by light; a first passivation layer is formed on the first buffer layer; forming a second buffer layer; and forming a second passivation layer on the second buffer layer. Wherein, the first buffer layer, the first protection layer, the second buffer layer and the second protection layer are all formed by plasma polymerization in the same plasma reaction chamber.
根据本发明的构思,其中等离子体聚合方法可为等离子增强化学气相沉积(PECVD)或高密度等离子化学气相沉积(HDPCVD)或诱导结合等离子化学气相沉积(ICPCVD)等化学气相沉积方法。According to the concept of the present invention, wherein the plasma polymerization method can be chemical vapor deposition methods such as plasma enhanced chemical vapor deposition (PECVD) or high density plasma chemical vapor deposition (HDPCVD) or induced combined plasma chemical vapor deposition (ICPCVD).
根据本发明的构思,其中形成缓冲层与保护层时,视工艺需求可进行有机元件或缓冲层或保护层的表面处理(surface treatment)步骤或清洗步骤(self-clean)。According to the concept of the present invention, when forming the buffer layer and the protective layer, a surface treatment step or a self-cleaning step of the organic element or the buffer layer or the protective layer may be performed according to the process requirements.
根据本发明的构思,其中第一保护层以及第二保护层由类金钢石碳膜(Diamond-like Carbon)材料构成。According to the concept of the present invention, the first protective layer and the second protective layer are made of a diamond-like carbon film (Diamond-like Carbon) material.
根据本发明的构思,其中第一缓冲层与第二缓冲层为以高分子前体形成的高分子薄膜,且所述高分子前体可选自苯乙烯(Styrene)、乙炔(Acetylene)、乙烯(Ethylene)或甲苯(Methylbenzene,C6H5CH3)之一,形成如高分子型类金刚石碳膜薄膜(Polymer like Diamond-like Carbon)等高分子薄膜。According to the concept of the present invention, wherein the first buffer layer and the second buffer layer are polymer films formed from polymer precursors, and the polymer precursors can be selected from styrene (Styrene), acetylene (Acetylene), ethylene (Ethylene) or toluene (Methylbenzene, C 6 H 5 CH 3 ) to form polymer films such as polymer diamond-like carbon films (Polymer like Diamond-like Carbon).
根据本发明的构思,其中有机发光元件可为无源有机发光元件,亦可为有源有机发光元件。且可为朝下发光的有源有机发光元件或朝上发光的有源有机发光元件。According to the concept of the present invention, the organic light emitting element can be a passive organic light emitting element or an active organic light emitting element. And it can be a downward-emitting active organic light-emitting element or an upward-emitting active organic light-emitting element.
根据本发明的构思,其中有机发光元件包括:一基板;一形成于基板上的第一导电层;一形成于第一导电层上的有机发光材料多层结构;一形成于有机发光材料多层结构上的第二导电层。According to the concept of the present invention, the organic light emitting element includes: a substrate; a first conductive layer formed on the substrate; a multilayer structure of organic light emitting material formed on the first conductive layer; a multilayer structure formed on the organic light emitting material the second conductive layer on the structure.
根据本发明的构思,其中基板可为玻璃基板或塑胶基板。According to the concept of the present invention, the substrate may be a glass substrate or a plastic substrate.
附图说明Description of drawings
图1为现有的有机EL元件封装结构断面示意图;FIG. 1 is a schematic cross-sectional view of an existing organic EL element packaging structure;
图2A至2D为本发明优选实施方式的形成封装保护结构方法流程图。2A to 2D are flowcharts of a method for forming a package protection structure according to a preferred embodiment of the present invention.
附图标记说明Explanation of reference signs
有机EL元件 10 基板 101Organic EL element 10 substrate 101
第一导电层 102 有机发光材料多层结构 103First conductive layer 102 Multilayer structure of organic luminescent material 103
第二导电层 104 封装保护结构 11Second conductive layer 104 Encapsulation protection structure 11
第一缓冲层 111 第一保护层 112First buffer layer 111 First protective layer 112
第二缓冲层 113 第二保护层 114Second buffer layer 113 Second protection layer 114
有机发光元件 20 封装保护结构 21Organic Light Emitting Components 20 Encapsulation Protection Structure 21
第一缓冲层 211 第一保护层 212First buffer layer 211 First protective layer 212
第二缓冲层 213 第二保护层 214Second buffer layer 213 Second protection layer 214
具体实施方式Detailed ways
本发明提供的形成封装保护结构的方法应用于有机发光元件(有机EL元件)上。有机发光元件大致上分为无源式与有源式两种,以下虽以无源式有机发光元件作为实施方式进一步说明本发明的技术方案,然而其它有机发光元件,例如朝下发光或是朝上发光的有源式有机发光元件均适用。此外,对有机发光元件基板也没有限制,玻璃基板或塑料基板皆可应用于本发明的技术方案中。The method for forming an encapsulation protection structure provided by the invention is applied to an organic light-emitting element (organic EL element). Organic light-emitting elements are roughly divided into two types: passive type and active type. Although the passive type organic light-emitting element is used as an embodiment to further illustrate the technical solution of the present invention, other organic light-emitting elements, for example, emit light downward or All active organic light-emitting elements that emit light on the top are applicable. In addition, there is no limitation on the substrate of the organic light emitting element, either a glass substrate or a plastic substrate can be applied to the technical solution of the present invention.
请参见图2A至2D,这些附图为本发明优选实施方式的形成封装保护结构方法的流程图。如图2A所示,首先,将一无源式有机发光元件20放置于一等离子体反应腔体内(未示出),在有机发光元件20上形成一第一缓冲层211,接着如图2B所示,利用等离子体聚合方式,在第一缓冲层211上填补形成第一保护层212。接下来,如图2C所示,在同一等离子体反应腔体内,再次利用等离子体聚合方式(plasma polymerlization),在第一保护层212上形成第二缓冲层213。之后,如图2D所示,再次以等离子体聚合方式形成第二保护层214,视需要可重复缓冲层与保护层的制作。若需构图(pattern),则可利用掩模(shadow mask)将不需镀覆的部分挡住(未图示),如此完成整个封装保护结构21的制造过程。Please refer to FIGS. 2A to 2D , which are flowcharts of a method for forming a package protection structure according to a preferred embodiment of the present invention. As shown in FIG. 2A, first, a passive organic light-emitting element 20 is placed in a plasma reaction chamber (not shown), and a first buffer layer 211 is formed on the organic light-emitting element 20, and then as shown in FIG. 2B As shown, the first protection layer 212 is filled and formed on the first buffer layer 211 by means of plasma polymerization. Next, as shown in FIG. 2C , in the same plasma reaction chamber, the second buffer layer 213 is formed on the first protection layer 212 by plasma polymerlization again. After that, as shown in FIG. 2D , the second protection layer 214 is formed again by plasma polymerization, and the fabrication of the buffer layer and the protection layer can be repeated if necessary. If patterning is required, a shadow mask can be used to block the parts that do not need to be plated (not shown), thus completing the entire manufacturing process of the package protection structure 21 .
在封装保护结构21的制造过程中,本发明所使用的等离子体聚合方式采用的是等离子增强化学气相沉积法(PECVD),以甲烷(CH4)或甲苯(Methylbenzene,C6H5CH3)或C4F8等为主要反应气体,在等离子体反应腔体中,形成第一保护层212以及第二保护层214,所使用的材料为类金刚石碳(Diamond-like Carbon),此外,在制造过程中,如需要还可根据需求调整不同参数,譬如掺杂某些金属材料,例如钛(Ti)、铌(Nb)、钽(Ta)、铬(Cr)、钼(Mo)、钨(W)、钌(Ru)、铁(Fe)、钴(Co)、镍(Ni)、铝(Al)、铜(Cu)、金(Au)、银(Ag)等,或掺杂某些非金属材料,例如硅(Si)原子等或者周期表内III-V族元素等。当然,其它等离子体聚合方式亦可应用于本发明的技术方案中,例如高密度等离子体化学气相沉积法(HDPCVD)等。此外,本发明中所使用的形成第一缓冲层211与第二缓冲层213的材料可采用高分子前体(precursor)当作反应气体,其中,所述高分子前体可选自例如苯乙烯(Styrene)、乙炔(Acetylene)、乙烯(Ethylene)或甲苯(Methylbenzene,C6H5CH3)或C4F8之一,形成高分子薄膜,如高分子型类金刚石碳薄膜(Polymer likeDiamond-like Carbon)等,以使第一缓冲层211与第二缓冲层213能与第一保护层212以及第二保护层214在同一等离子体反应腔体中形成。当然,如有需要,还可在第二保护层214上再形成另一缓冲层(未示出),之后再加上另一保护层(未图示),以使有机发光元件20与外界环境进一步隔离。In the manufacturing process of the encapsulation protection structure 21, the plasma polymerization method used in the present invention is plasma enhanced chemical vapor deposition (PECVD), with methane (CH 4 ) or toluene (Methylbenzene, C 6 H 5 CH 3 ) Or C 4 F 8 etc. as the main reaction gas, in the plasma reaction chamber, form the first protective layer 212 and the second protective layer 214, the material used is diamond-like carbon (Diamond-like Carbon), in addition, in In the manufacturing process, if necessary, different parameters can be adjusted according to requirements, such as doping certain metal materials, such as titanium (Ti), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten ( W), ruthenium (Ru), iron (Fe), cobalt (Co), nickel (Ni), aluminum (Al), copper (Cu), gold (Au), silver (Ag), etc., or doped with some non- Metal materials, such as silicon (Si) atoms, etc., or III-V group elements in the periodic table, etc. Of course, other plasma polymerization methods can also be applied to the technical solution of the present invention, such as high-density plasma chemical vapor deposition (HDPCVD) and the like. In addition, the materials used in the present invention to form the first buffer layer 211 and the second buffer layer 213 can use a polymer precursor (precursor) as a reaction gas, wherein the polymer precursor can be selected from, for example, styrene (Styrene), acetylene (Acetylene), ethylene (Ethylene) or toluene (Methylbenzene, C 6 H 5 CH 3 ) or one of C 4 F 8 to form a polymer film, such as a polymer diamond-like carbon film (Polymer likeDiamond- like Carbon), etc., so that the first buffer layer 211 and the second buffer layer 213 can be formed in the same plasma reaction chamber as the first protective layer 212 and the second protective layer 214. Of course, if necessary, another buffer layer (not shown) can be formed on the second protective layer 214, and then another protective layer (not shown) can be added, so that the organic light-emitting element 20 can be separated from the external environment. further isolation.
本发明的技术方案主要是在同一等离子体反应腔体内借助于等离子体聚合方法分别依序在有机发光元件20的表面上形成第一缓冲层211、第一保护层212、第二缓冲层213以及第二保护层214。如此,便可克服传统的有机发光元件20必须在不同反应腔体间往复运送才得以形成封装保护结构的缺点。另外,如果想要提高封装保护结构的清洁度,在进行每一等离子体聚合工序前,反应腔体内部可先进行清洗步骤(self-clean),如此,可确保封装保护结构的清洁。The technical solution of the present invention is mainly to sequentially form the first buffer layer 211, the first protective layer 212, the second buffer layer 213 and the The second protective layer 214 . In this way, the traditional disadvantage that the organic light-emitting element 20 must be transported back and forth between different reaction chambers to form the package protection structure can be overcome. In addition, if it is desired to improve the cleanliness of the package protection structure, before each plasma polymerization process, the inside of the reaction chamber can be cleaned first (self-clean), so that the cleanliness of the package protection structure can be ensured.
由于,制造封装保护结构(passivation)21的目的就是要使有机发光元件20中的有机层材料及电极层材料与外界环境完全隔离,所使用的材料还需有效排出有机发光元件长时间工作所产生的热能,因此在封装保护结构的材料上最好使用致密度高且又具有良好导热性的材料。本发明所使用的类金刚石碳膜(DLC)相较于目前一般所使用的有机材料或陶瓷材料来说,具有较佳的抗磨耗性以及高热传导性,同时对湿气也有较低的水穿透率,而且随着制备方法、掺杂杂质以及参数的不同,类金刚石碳的特性可由应力极小软性的高分子薄膜到硬的或硬度极高的非晶质类金刚石碳膜,其颜色由褐色至透明皆可。因此,本发明的由类金刚石碳材料所形成的封装保护结构能有效隔绝有机发光元件与外界环境的接触。此外,本发明的封装保护结构21的最外层为类金刚石碳材料所形成的第二保护层214,还可增加有机发光元件20的抗磨耗性,使得有机发光元件20的寿命更为长久。Because the purpose of manufacturing the encapsulation protection structure (passivation) 21 is to completely isolate the organic layer material and electrode layer material in the organic light emitting element 20 from the external environment, the materials used must also effectively discharge the Therefore, it is best to use a material with high density and good thermal conductivity for the material of the packaging protection structure. Compared with the organic materials or ceramic materials commonly used at present, the diamond-like carbon film (DLC) used in the present invention has better wear resistance and high thermal conductivity, and has lower water penetration to moisture at the same time. Transmittance, and with the different preparation methods, doping impurities and parameters, the characteristics of diamond-like carbon can be from a soft polymer film with extremely small stress to a hard or extremely hard amorphous diamond-like carbon film, and its color It can range from brown to transparent. Therefore, the encapsulation and protection structure formed by the diamond-like carbon material of the present invention can effectively isolate the contact between the organic light-emitting element and the external environment. In addition, the outermost layer of the encapsulation protection structure 21 of the present invention is the second protection layer 214 formed of diamond-like carbon material, which can also increase the abrasion resistance of the organic light emitting element 20 and make the life of the organic light emitting element 20 longer.
综上所述,本发明的技术方案是利用等离子体聚合方法以及类金刚石碳材料来形成第一保护层以及第二保护层,两保护层间又用等离子体聚合方法以及高分子前体材料于同一等离子体反应腔体中形成缓冲层,以吸收第一保护层以及第二保护层间的应力,使得整个封装保护结构(passivation)得以在同一反应腔体中制成,克服了传统有机发光元件于反应腔体间反覆运送的缺点,使制造步骤简单、降低了制造成本,并能有效实现隔绝有机发光元件与外界环境的接触的隔绝。再加上,类金刚石碳材料的封装保护结构(passivation layer)的致密度高、电绝缘性能良好、热传导性佳、抗磨耗性能良好、高硬度、耐腐蚀性佳,这些都符合封装保护结构的需求,因此,本发明的技术方案对于有机发光元件的封装保护结构制造工艺来说是一种实用、新颖且进步的技术方案。In summary, the technical solution of the present invention is to use the plasma polymerization method and the diamond-like carbon material to form the first protective layer and the second protective layer, and to use the plasma polymerization method and the polymer precursor material between the two protective layers. A buffer layer is formed in the same plasma reaction chamber to absorb the stress between the first protective layer and the second protective layer, so that the entire encapsulation protection structure (passivation) can be made in the same reaction chamber, which overcomes the traditional organic light-emitting element The disadvantage of repeatedly transporting between the reaction chambers simplifies the manufacturing steps, reduces the manufacturing cost, and can effectively isolate the organic light-emitting element from contact with the external environment. In addition, the passivation layer of diamond-like carbon material has high density, good electrical insulation performance, good thermal conductivity, good wear resistance, high hardness, and good corrosion resistance, all of which meet the requirements of the passivation layer. Therefore, the technical solution of the present invention is a practical, novel and progressive technical solution for the manufacturing process of the encapsulation and protection structure of the organic light-emitting element.
本领域技术人员在本发明构思和保护范围内作出的改型和修饰都将落入所附权利要求书请求保护的范围。Alterations and modifications made by those skilled in the art within the concept and protection scope of the present invention will fall within the protection scope of the appended claims.
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| CN105679969B (en) * | 2016-03-17 | 2017-11-28 | 深圳市华星光电技术有限公司 | The method for packing of OLED and OLED encapsulating structures |
| CN106601931B (en) * | 2016-12-19 | 2018-08-14 | 武汉华星光电技术有限公司 | OLED encapsulation method and OLED encapsulating structures |
| CN106654045B (en) * | 2016-12-19 | 2019-12-24 | 武汉华星光电技术有限公司 | OLED packaging method and OLED packaging structure |
| CN110165077A (en) * | 2019-05-28 | 2019-08-23 | 深圳市华星光电半导体显示技术有限公司 | Organic LED display panel and its packaging method |
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| US6146225A (en) * | 1998-07-30 | 2000-11-14 | Agilent Technologies, Inc. | Transparent, flexible permeability barrier for organic electroluminescent devices |
| CN1284694A (en) * | 1999-06-04 | 2001-02-21 | 株式会社半导体能源研究所 | Methods of making electro-optic devices |
| US20020024096A1 (en) * | 2000-08-18 | 2002-02-28 | Shunpei Yamazaki | Light-emitting device and display device |
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| US6146225A (en) * | 1998-07-30 | 2000-11-14 | Agilent Technologies, Inc. | Transparent, flexible permeability barrier for organic electroluminescent devices |
| CN1284694A (en) * | 1999-06-04 | 2001-02-21 | 株式会社半导体能源研究所 | Methods of making electro-optic devices |
| US20020024096A1 (en) * | 2000-08-18 | 2002-02-28 | Shunpei Yamazaki | Light-emitting device and display device |
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