CN1322518C - Conductive paste for terminal electrode of multilayer ceramic electronic part - Google Patents
Conductive paste for terminal electrode of multilayer ceramic electronic part Download PDFInfo
- Publication number
- CN1322518C CN1322518C CNB2005100837125A CN200510083712A CN1322518C CN 1322518 C CN1322518 C CN 1322518C CN B2005100837125 A CNB2005100837125 A CN B2005100837125A CN 200510083712 A CN200510083712 A CN 200510083712A CN 1322518 C CN1322518 C CN 1322518C
- Authority
- CN
- China
- Prior art keywords
- powder
- firing
- copper
- copper powder
- conductive paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 33
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 110
- 239000000843 powder Substances 0.000 claims abstract description 64
- 229910052802 copper Inorganic materials 0.000 claims abstract description 36
- 239000010949 copper Substances 0.000 claims abstract description 36
- 239000011521 glass Substances 0.000 claims abstract description 34
- 239000010409 thin film Substances 0.000 claims abstract description 21
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000002245 particle Substances 0.000 claims description 26
- 238000010304 firing Methods 0.000 abstract description 52
- 239000011230 binding agent Substances 0.000 abstract description 42
- 230000003647 oxidation Effects 0.000 abstract description 20
- 238000007254 oxidation reaction Methods 0.000 abstract description 20
- QUQFTIVBFKLPCL-UHFFFAOYSA-L copper;2-amino-3-[(2-amino-2-carboxylatoethyl)disulfanyl]propanoate Chemical compound [Cu+2].[O-]C(=O)C(N)CSSCC(N)C([O-])=O QUQFTIVBFKLPCL-UHFFFAOYSA-L 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 43
- 239000001301 oxygen Substances 0.000 description 34
- 229910052760 oxygen Inorganic materials 0.000 description 34
- 238000000034 method Methods 0.000 description 32
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 31
- 239000012298 atmosphere Substances 0.000 description 29
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 229910052799 carbon Inorganic materials 0.000 description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 238000005245 sintering Methods 0.000 description 16
- 238000000576 coating method Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 229910000679 solder Inorganic materials 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- 230000007423 decrease Effects 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 9
- 239000003985 ceramic capacitor Substances 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 9
- 238000007747 plating Methods 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 7
- -1 composed of copper Chemical compound 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 6
- 239000010953 base metal Substances 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- 235000014113 dietary fatty acids Nutrition 0.000 description 6
- 239000000194 fatty acid Substances 0.000 description 6
- 229930195729 fatty acid Natural products 0.000 description 6
- 150000004665 fatty acids Chemical class 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 235000021355 Stearic acid Nutrition 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 5
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 239000008117 stearic acid Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910007472 ZnO—B2O3—SiO2 Inorganic materials 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 229950010007 dimantine Drugs 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 238000004227 thermal cracking Methods 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 230000003064 anti-oxidating effect Effects 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- NAPSCFZYZVSQHF-UHFFFAOYSA-N dimantine Chemical compound CCCCCCCCCCCCCCCCCCN(C)C NAPSCFZYZVSQHF-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005243 fluidization Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005118 spray pyrolysis Methods 0.000 description 2
- 239000003760 tallow Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- IYVBNEJDHFJJEM-UHFFFAOYSA-N 22-methyltricosan-1-amine Chemical compound CC(C)CCCCCCCCCCCCCCCCCCCCCN IYVBNEJDHFJJEM-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 206010021143 Hypoxia Diseases 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 229910020617 PbO—B2O3—SiO2 Inorganic materials 0.000 description 1
- PLZVEHJLHYMBBY-UHFFFAOYSA-N Tetradecylamine Chemical compound CCCCCCCCCCCCCCN PLZVEHJLHYMBBY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940088977 dimethyl palmitamine Drugs 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 239000002003 electrode paste Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- NHLUVTZJQOJKCC-UHFFFAOYSA-N n,n-dimethylhexadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCN(C)C NHLUVTZJQOJKCC-UHFFFAOYSA-N 0.000 description 1
- UQKAOOAFEFCDGT-UHFFFAOYSA-N n,n-dimethyloctan-1-amine Chemical compound CCCCCCCCN(C)C UQKAOOAFEFCDGT-UHFFFAOYSA-N 0.000 description 1
- SFBHPFQSSDCYSL-UHFFFAOYSA-N n,n-dimethyltetradecan-1-amine Chemical compound CCCCCCCCCCCCCCN(C)C SFBHPFQSSDCYSL-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- HKUFIYBZNQSHQS-UHFFFAOYSA-N n-octadecyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC HKUFIYBZNQSHQS-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- XYGMTBGUABLGQJ-UHFFFAOYSA-N octadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCN.CCCCCCCCCCCCCCCCCCN XYGMTBGUABLGQJ-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C1/00—Details
- H01C1/14—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors
- H01C1/148—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors the terminals embracing or surrounding the resistive element
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/28—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
- H01C17/281—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thick film techniques
- H01C17/283—Precursor compositions therefor, e.g. pastes, inks, glass frits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/232—Terminals electrically connecting two or more layers of a stacked or rolled capacitor
- H01G4/2325—Terminals electrically connecting two or more layers of a stacked or rolled capacitor characterised by the material of the terminals
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Conductive Materials (AREA)
- Ceramic Capacitors (AREA)
- Coils Or Transformers For Communication (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
一种用于多层陶瓷电子零件的端电极的导电膏,包括(A)主要包含铜和在其至少一部分表面上具有玻璃态薄膜的球形导电粉,(B)主要包含铜的薄片状导电粉,(C)玻璃粉,和(D)有机载体,并且可进一步包括(E)脂族胺。当焙烧形成多层陶瓷电子零件的端电极时,该浆表现出非常优异的低温粘结剂去除性能,而且,在抗氧化性能、粘结剂去除性能和烧制性能方面也是优异的,而不需要严格控制烧制条件,因此能形成粘合和导电性方面均优异的致密的端电极。A conductive paste for terminal electrodes of multilayer ceramic electronic parts, comprising (A) a spherical conductive powder mainly containing copper and having a glassy thin film on at least a part of its surface, (B) a flaky conductive powder mainly containing copper , (C) glass powder, and (D) organic vehicle, and may further include (E) aliphatic amine. When fired to form terminal electrodes of multilayer ceramic electronic parts, the paste exhibits very excellent low-temperature binder removal performance, and is also excellent in oxidation resistance, binder removal performance and firing performance, while not Firing conditions need to be strictly controlled, so that dense terminal electrodes excellent in both adhesion and conductivity can be formed.
Description
发明背景Background of the invention
1、发明领域1. Field of invention
本发明涉及一种用于形成例如多层陶瓷电容器、多层陶瓷感应器、叠层型压电元件和类似物的多层陶瓷电子零件端电极的导电膏。特别是,本发明涉及适于形成具有由镍或类似物制成的贱金属(base metal)内电极的多层陶瓷电子零件端电极的导电铜膏。The present invention relates to an electroconductive paste for forming terminal electrodes of multilayer ceramic electronic parts such as multilayer ceramic capacitors, multilayer ceramic inductors, multilayer piezoelectric elements and the like. In particular, the present invention relates to a conductive copper paste suitable for forming terminal electrodes of multilayer ceramic electronic parts having base metal internal electrodes made of nickel or the like.
2、背景技术2. Background technology
多层陶瓷电子零件,例如,多层陶瓷电容器,一般制备如下。将内电极导电膏以指定图案印刷在例如钛酸钡陶瓷或类似物的电介质陶瓷生坯片上。将几个这类单独层叠置,并压制在一起,从而制备未烧制的叠片,其中陶瓷生坯片层和内电极膏层被交替层叠。将因此获得的叠片切成规定形状的小片,和然后将这些小片在高温下一起烧制,从而制备多层陶瓷电容器主体。其次,通过用主要由导电粉、玻璃粉和有机载体构成的端电极导电膏浸渍或类似乎段涂覆每个陶瓷电容器主体上暴露内电极的端面;然后,干燥之后,通过高温烧制形成端电极。随后,如果需要通过电镀或类似手段在端电极的顶部形成镍、锡或类似物电镀层。Multilayer ceramic electronic parts, for example, multilayer ceramic capacitors, are generally produced as follows. The internal electrode conductive paste is printed in a prescribed pattern on a dielectric ceramic green sheet such as barium titanate ceramic or the like. Several such individual layers are laminated and pressed together to prepare a green laminate in which ceramic green sheet layers and internal electrode paste layers are alternately laminated. The laminate thus obtained is cut into small pieces of a prescribed shape, and then these small pieces are co-fired at high temperature, thereby producing a multilayer ceramic capacitor main body. Secondly, by dipping or similarly coating the end face of each ceramic capacitor body where the internal electrodes are exposed with a terminal electrode conductive paste mainly composed of conductive powder, glass powder and organic vehicle; then, after drying, the terminal is formed by high-temperature firing. electrode. Subsequently, nickel, tin or the like plating is formed on top of the terminal electrodes by plating or the like if necessary.
通常,诸如钯、银-钯、铂和类似的贵金属已被用作内电极材料。然而,因为根据资源保护、成本降低和在烧结钯或银-钯过程中防止时由氧化膨胀导致分层和破裂的需要,例如镍、钴、铜及类似的贱金属现在构成这种材料的主流。因此,提供与贱金属内电极容易形成优良电连接的铜、镍、钴或这些金属的合金被用来代替银或银-钯作为端电极材料。Generally, noble metals such as palladium, silver-palladium, platinum, and the like have been used as internal electrode materials. However, base metals such as nickel, cobalt, copper, and similar base metals now constitute the mainstream of this material because of the need for resource conservation, cost reduction, and prevention of delamination and cracking due to oxidative expansion during sintering of palladium or silver-palladium. . Therefore, copper, nickel, cobalt, or alloys of these metals, which provide easy formation of an excellent electrical connection with base metal internal electrodes, are used instead of silver or silver-palladium as the terminal electrode material.
在贱金属因此用于内电极和端电极时,端电极的烧制通常在700到900℃的最高温度在具有极低的氧气分压的非氧化气氛里例如包含几个ppm到几十个ppm的氧气的惰性气体气氛下进行。Where base metals are thus used for internal and terminal electrodes, the firing of the terminal electrodes is usually at a maximum temperature of 700 to 900°C in a non-oxidizing atmosphere with a very low partial pressure of oxygen containing, for example, several ppm to several tens of ppm under an inert gas atmosphere of oxygen.
然而,在尤其是主要由铜组成端电极导电膏在这样包含很少量氧气的气氛下烧制时,用作载体的有机成分例如粘合剂树脂、溶剂或类似物并不趋向于被氧化分懈,因此,合适地燃烧、分解和除去有机成分(也叫“粘结剂的除去”)很难以适当的方式进行。特别是,在相对低的温度下进行的烧制初始阶段,如果在玻璃流体化和铜粉烧结之前没有充分地除去粘结剂,则在烧结开始之后碳和含碳的有机残留物例如载体分解产物或类似物将会被封闭在薄膜里。这种被封闭的碳和含碳有机残留物(在有些情况下下文称为“残留碳”)会在后续高温阶段导致各种问题,引起电子零件性能的损失,和降低该零件的可靠性。例如,在高温烧结铜粉的阶段,留在薄膜里的碳防碍玻璃的流体化和铜的烧结,以致于损害电极的优良致密结构和与陶瓷体的粘合性。而且,这种残留碳夺取介电陶瓷中的氧,因此引起氧不足以致于引起介电性能降低,并且导致陶瓷体的强度也引起下降。陶瓷体强度下降的结果是,在后来的焊接过程或类似过程中发生由热冲击(热裂解)引起的陶瓷体的裂纹。而且,当被封闭的残余碳在高温转变成气体时,形成起泡(气泡)以致于影响烧结薄膜的结构。结果是,当后来在烧结薄膜上进行电镀处理时,电镀液渗透到电极薄膜中,引起绝缘电阻的降低和陶瓷体的裂纹;而且,渗透的电镀液在焊料回流过程中被加热并转变成气体,因此导致“焊料喷溅”,这引起熔融焊料散射。However, when the terminal electrode conductive paste mainly composed of copper is fired in such an atmosphere containing a small amount of oxygen, organic components such as binder resins, solvents or the like used as a carrier do not tend to be oxidized. Therefore, proper combustion, decomposition and removal of organic components (also called "binder removal") is difficult to do in a proper manner. In particular, at the initial stage of firing at a relatively low temperature, if the binder is not sufficiently removed before glass fluidization and copper powder sintering, carbon and carbon-containing organic residues such as supports decompose after sintering begins The product or the like will be enclosed in a film. This occluded carbon and carbon-containing organic residues (hereinafter referred to as "residual carbon" in some cases) can cause various problems in subsequent high temperature stages, causing loss of performance of the electronic part, and reducing the reliability of the part. For example, at the stage of sintering copper powder at high temperature, the carbon remaining in the film hinders the fluidization of the glass and the sintering of copper, so that the excellent dense structure of the electrode and the adhesion to the ceramic body are damaged. Moreover, this residual carbon deprives oxygen in the dielectric ceramics, thus causing oxygen deficiency to cause a decrease in dielectric properties, and to cause a decrease in the strength of the ceramic body as well. As a result of the decrease in the strength of the ceramic body, cracks in the ceramic body due to thermal shock (thermal cracking) occur during a subsequent welding process or the like. Also, when the trapped residual carbon turns into gas at high temperature, bubbles (bubbles) are formed so as to affect the structure of the sintered film. As a result, when the plating treatment is performed on the sintered film later, the plating solution penetrates into the electrode film, causing a decrease in insulation resistance and cracks in the ceramic body; moreover, the infiltrated plating solution is heated and turned into a gas during solder reflow , thus resulting in "solder spatter", which causes the molten solder to scatter.
因此,在烧制的初始阶段如何有效实现除去粘结剂的问题,以致于在高温区烧结铜粉之前减少残留碳,在主要由贱金属(尤其是铜)组成的端电极导电膏中已经成为一个重要问题。Therefore, the problem of how to effectively remove the binder in the initial stage of firing, so that the residual carbon is reduced before the copper powder is sintered in the high temperature zone, has become a problem in the terminal electrode conductive paste mainly composed of base metals (especially copper). an important question.
通常,为了解决这个问题,已经使用了用具有好的热分解性能的树脂例如丙烯酸系树脂或类似物作为粘结剂树脂的方法、或用具有在低温时玻璃不趋向于软化而是在除去载体之后软化的性能的玻璃的方法,以致于制备的电极的结构更好。Generally, in order to solve this problem, a method of using a resin having good thermal decomposition properties such as an acrylic resin or the like as a binder resin, or using a resin having a property that the glass does not tend to soften at low temperatures but removes the carrier After softening the properties of the glass, the structure of the prepared electrode is better.
而且,使用细小球铜粉的端电极膏在应用和干燥时会形成过于致密的薄膜;因此,出现载体不易被去除,并且碳一残留到高温。因此,已经提出使用薄片状铜粉代替球形铜粉。例如,日本专利公开No.8-180731A公开了一种包含薄片状铜粉、球形铜粉、玻璃粉和有机载体的多层陶瓷电容器端电极膏。这种薄片状铜粉在干燥的膏薄膜中形成合适的空隙;显示出这些空隙充当着气体通道,以致于粘结剂去除能平稳地在结构中进行。而且,在日本专利公开No.2002-56717A中,指出通过在特定范围内设置膏干膜密度可改善粘结剂去除性能而不用牺牲膏的应用性能和的薄膜精细结构。Also, terminal paste using fine spherical copper powder forms an overly dense film when applied and dried; therefore, it appears that the carrier is not easily removed, and carbon remains at high temperatures. Therefore, it has been proposed to use flaky copper powder instead of spherical copper powder. For example, Japanese Patent Laid-Open No. 8-180731A discloses a multilayer ceramic capacitor terminal paste comprising flaky copper powder, spherical copper powder, glass powder and an organic vehicle. This flaky copper powder formed suitable voids in the dried paste film; these voids were shown to act as gas channels so that binder removal proceeded smoothly in the structure. Also, in Japanese Patent Laid-Open No. 2002-56717A, it is pointed out that binder removal performance can be improved by setting paste dry film density within a specific range without sacrificing application performance and film fine structure of the paste.
同时,为了有效除去粘结剂,还有一些方法,其中在烧制时温度升高过程中电极致密化之前,在(例如)约200到600℃的温度范围内通过将氧气浓度增加到几百个ppm或更高,从而加速有机材料的氧化分解,和然后降低氧气浓度并进行烧制。例如,日本专利公开No.10-330802A和日本专利公开No.2001-338831A公开了一些方法,其中用由玻璃等类似物组成的抗氧化涂层涂覆小球形细铜粉,在具有高氧气分压的气氛例如空气气氛或类似气氛里进行粘结剂去除过程,以致于分解载体同时阻止铜的氧化,并且在降低氧气分压之后再进行烧制。Meanwhile, in order to effectively remove the binder, there are also methods in which, before densification of the electrode during temperature rise at the time of firing, by increasing the oxygen concentration to hundreds of ppm or higher, thereby accelerating the oxidative decomposition of organic materials, and then reducing the oxygen concentration and firing. For example, Japanese Patent Laid-Open No. 10-330802A and Japanese Patent Laid-Open No. 2001-338831A disclose methods in which small spherical fine copper powder is coated with an anti-oxidation coating composed of glass or the like, The binder removal process is performed in a pressurized atmosphere such as an air atmosphere or the like so that the support is decomposed while preventing oxidation of copper, and the firing is performed after reducing the partial pressure of oxygen.
在近年来,对多层陶瓷电极部件的增加的容量、改善的性能和改善的可靠性提出日益严格的要求。尤其在小尺寸大容量多层陶瓷电容器的情况下,内电极之间的间距变窄,即,1到2μm,以致于如果端电极不致密的和结构不精细则易产生缺陷电容器。因此需要更平稳地去除粘结剂,并形成更致密的和更精细结构的没有氧化的最终烧制薄膜。然而,在使用的端电极导电膏是铜导电膏的情况下,残余碳量的减少(优异的粘结剂去除性能)和阻止铜的氧化是相互冲突的目的,即如果尝试改善其中一个性能,这些性能中的另一个就会降低,和如果这些性能的任一个是差的,就不会形成优良的电极。另外,在烧结铜时残余碳的影响也是大的,以致于不管使用哪一种传统方法都极难满足上述要求。In recent years, increased capacity, improved performance and improved reliability of multilayer ceramic electrode components have been increasingly demanded. Especially in the case of small-sized large-capacity multilayer ceramic capacitors, the spacing between internal electrodes becomes narrow, ie, 1 to 2 µm, so that defective capacitors are liable to occur if terminal electrodes are not dense and structured. There is therefore a need for smoother binder removal and formation of a denser and finer textured final fired film free of oxidation. However, in the case where the terminal electrode conductive paste used is a copper conductive paste, the reduction of the amount of residual carbon (excellent binder removal performance) and the prevention of oxidation of copper are conflicting purposes, that is, if one of the properties is tried to be improved, The other of these properties will be degraded, and if any one of these properties is poor, no good electrode will be formed. In addition, the influence of residual carbon in sintering copper is also so great that it is extremely difficult to satisfy the above requirements no matter which conventional method is used.
例如,在用玻璃涂层涂覆铜粉的表面之后,在如上述高氧气分压的气氛中去除粘结剂,并且在降低氧气分压之后再进行烧制,在这种方法的情况下,低温区的抗氧化效果和粘结剂去除性能是优良的;然而,在高温区气氛的调整是困难的,以致于难以进行烧制而最终不氧化铜粉。For example, after coating the surface of copper powder with a glass coating, removing the binder in an atmosphere of high oxygen partial pressure as described above, and performing firing after reducing the oxygen partial pressure, in the case of this method, The anti-oxidation effect and binder removal performance in the low temperature region are excellent; however, the adjustment of the atmosphere in the high temperature region is difficult, so that it is difficult to perform firing without eventually oxidizing the copper powder.
相反地,然而,当在具有几十个ppm或更少的氧气分压的低氧气氛中去除粘结剂时,在低温下去除粘结剂趋向于不完全,即使是通过使用薄片状铜粉使其具有气体能容易排走的结构形成薄膜。烧制气氛中氧气浓度为几个ppm或更少时,或当同时烧制的小片的数量很大时,这个趋势尤其显著。而且,为了改善分散性和防止氧化,薄片金属粉通常要用脂肪酸或其金属盐例如硬脂酸或类似物进行表面处理;然而,根据本发明人进行的研究,这种物质的存在促使起泡和陶瓷体的退化。Conversely, however, when the binder is removed in a low-oxygen atmosphere having an oxygen partial pressure of several tens of ppm or less, the binder removal at low temperatures tends to be incomplete even by using flaky copper powder It has a structure in which gas can be easily discharged to form a thin film. This tendency is particularly remarkable when the oxygen concentration in the firing atmosphere is several ppm or less, or when the number of chips fired simultaneously is large. Also, in order to improve dispersibility and prevent oxidation, flake metal powders are usually surface-treated with fatty acids or metal salts thereof such as stearic acid or the like; however, according to studies conducted by the present inventors, the presence of such substances promotes foaming and degradation of the ceramic body.
而且,在低氧气氛烧制的情况下,极难实现将氧气分压严格控制到约ppm的数量级并保持气氛在固定的浓度。特别地,当膏中含有的有机材料分解时,从气氛中夺取氧以致于引起氧减少,并发生金属氧化减少,因而氧气浓度出现轻微变化。因此,去除粘结剂容易程度和铜的氧化程度也随陶瓷体中的微小不同、小片尺寸、同时烧制的小片的数量、膏中有机组分和烧制条件例如氧气浓度、最高温度和温度曲线图和类似条件而变化。而且,因为在烧制过程中一直残留到高温区的碳的量随着同时烧制的小片的数量和这些小片的形状而变化很大,要在被烧制的主体附近获得稳定的局域氧气分压是尤其困难的。结果是,性能波动很大以致于结果中有相当大的分散性。Moreover, in the case of firing in a low-oxygen atmosphere, it is extremely difficult to strictly control the oxygen partial pressure to the order of about ppm and keep the atmosphere at a constant concentration. In particular, when the organic material contained in the paste decomposes, oxygen is taken from the atmosphere so as to cause a decrease in oxygen, and a decrease in metal oxidation occurs, so that a slight change occurs in the oxygen concentration. Therefore, the ease of binder removal and the degree of copper oxidation also vary slightly with the ceramic body, die size, number of dies fired simultaneously, organic components in the paste, and firing conditions such as oxygen concentration, maximum temperature, and temperature curves and similar conditions vary. Moreover, because the amount of carbon remaining in the firing process up to the high temperature region varies greatly with the number of simultaneously fired small pieces and the shape of these small pieces, to obtain a stable localized oxygen in the vicinity of the fired body Partial pressure is especially difficult. As a result, performance fluctuates so much that there is considerable scatter in the results.
然而,根据电子零件标准和制造商,目前在陶瓷类型和所使用烧制条件方面有所不同,以致于人们需求一种具有广泛的工艺范围的膏,有可能在不同烧制条件下以稳定的方式获得具有优良性能的端电极。However, there are currently differences in the types of ceramics and firing conditions used according to electronic parts standards and manufacturers, so that there is a need for a paste with a wide process way to obtain terminal electrodes with excellent performance.
发明概要Summary of the invention
本发明的目的是解决所有上面提到的问题,和提供一种端电极铜导电膏,[i]当烘烤至多层陶瓷电子零件上时,尤其当在具有几十个ppm氧气分压或更少的低氧气氛里通过粘结剂去除过程和高温烧制过程进行烧制时,其表现出极少的铜氧化并且同时表现出在低温时优良的粘结剂去除特性,[ii]其不会引起任何起泡或陶瓷体的退化,和[iii]其能形成致密的、高导电性的烧结薄膜而没有电镀液渗透或与内电极不完善的连接。The purpose of the present invention is to solve all the above-mentioned problems, and to provide a terminal electrode copper conductive paste, [i] when baked onto multilayer ceramic electronic parts, especially when having a partial pressure of oxygen of several tens of ppm or more When fired through a binder removal process and a high-temperature firing process in a low-oxygen atmosphere, it exhibits minimal copper oxidation and at the same time exhibits excellent binder removal properties at low temperatures,[ii] it does not Any blistering or degradation of the ceramic body would be caused, and [iii] it would form a dense, highly conductive sintered film without plating solution penetration or imperfect connection to the internal electrodes.
尤其是,此外,本发明的一个目的是提供一种铜导电膏,其对烧结温度或烧制气氛中的氧气浓度具有很小、的敏感性,和能应用到很多种不同类型的陶瓷体并且能够满足烧制条件的变化。In particular, in addition, it is an object of the present invention to provide a copper conductive paste which has little sensitivity to the sintering temperature or the oxygen concentration in the firing atmosphere, and which can be applied to many different types of ceramic bodies and Ability to meet changes in firing conditions.
为了实现本发明的上述目的,本发明包括下述的结构。In order to achieve the above objects of the present invention, the present invention includes the following structures.
(1)用于多层陶瓷电子零件的端电极的导电膏,包括(A)主要包含铜和在其至少一部分表面具有玻璃态薄膜的球形导电粉,(B)主要包含铜的薄片状导电粉,(C)玻璃粉,和(D)有机载体。(1) A conductive paste for terminal electrodes of multilayer ceramic electronic parts, comprising (A) a spherical conductive powder mainly containing copper and having a glassy thin film on at least a part of its surface, (B) a flaky conductive powder mainly containing copper , (C) glass powder, and (D) organic vehicle.
(2)用于多层陶瓷电子零件的端电极的导电膏,包括(A)主要包含铜和在其至少一部分表面具有玻璃态薄膜的球形导电粉,(B)主要包含铜的薄片状导电粉,(C)玻璃粉,(D)有机载体,和(E)脂族胺。(2) A conductive paste for terminal electrodes of multilayer ceramic electronic parts, comprising (A) a spherical conductive powder mainly containing copper and having a glassy thin film on at least a part of its surface, (B) a flaky conductive powder mainly containing copper , (C) glass frit, (D) organic vehicle, and (E) aliphatic amine.
(3)根据上述(2)的导电膏,其中在(B)薄片状导电粉颗粒的表面上吸附至少一部分上述(E)脂族胺。(3) The conductive paste according to (2) above, wherein at least a part of the above-mentioned (E) aliphatic amine is adsorbed on the surface of the (B) flaky conductive powder particles.
(4)根据上述(2)或(3)的导电膏,其中(E)脂族胺的量,基于(B)薄片状导电粉的重量,是0.05到2.0重量%。(4) The conductive paste according to (2) or (3) above, wherein the amount of (E) aliphatic amine is 0.05 to 2.0% by weight based on the weight of (B) flaky conductive powder.
(5)根据上述(1)-(4)任一项的导电膏,其中(A)和(B)的比率是在5∶95到95∶5的范围内。(5) The conductive paste according to any one of (1)-(4) above, wherein the ratio of (A) and (B) is in the range of 5:95 to 95:5.
本发明的端电极导电膏在抗氧化、粘结剂去除性能和烧制性能方面是显著地优良,并能形成致密的具有优良粘合强度和导电性的端电极。The terminal electrode conductive paste of the present invention is remarkably excellent in oxidation resistance, binder removal performance and firing performance, and can form a dense terminal electrode with excellent adhesive strength and conductivity.
因此,即使在低氧气分压的惰性气氛中进行烧制的情况下,没有由于残余碳或类似物导致陶瓷体的电性能降低,和没有发生由于机械强度的降低引起的热裂解。而且,能制备出在高温负荷寿命试验之后表现出优良性能的高度可靠的多层陶瓷电子零件。而且,能形成没有气泡的致密的电极薄膜,以致于接着烧制之后的电镀过程中没有电解液的渗透,和因此没有裂纹和绝缘电阻的降低,并且没有焊料喷溅。而且,同样没有由于铜的氧化引起端电极电阻增加,没有由于与内电极不完善的连接引起不够的容量,并且没有可镀性或类似性能降低。Therefore, even in the case of firing in an inert atmosphere with a low oxygen partial pressure, there is no decrease in electrical properties of the ceramic body due to residual carbon or the like, and no thermal cracking due to decrease in mechanical strength occurs. Furthermore, a highly reliable multilayer ceramic electronic part exhibiting excellent performance after a high-temperature load life test can be produced. Furthermore, a dense electrode film without air bubbles can be formed, so that there is no permeation of the electrolytic solution during plating following firing, and thus no cracks and lowering of insulation resistance, and no solder spatter. Moreover, there is also no increase in terminal electrode resistance due to oxidation of copper, no insufficient capacity due to imperfect connection with internal electrodes, and no decrease in plateability or the like.
而且,使用特定导电粉和特定分散剂的结果是,本发明的膏对烧制条件具有很小的敏感性,并能满足各种不同烧制条件例如烧制气氛(尤其氧气浓度)、烧制温度和分布图和类似条件。而且,本发明能应用到各种具有不同组分和性能的陶瓷体。而且,由于不必要对烧制条件进行严格控制,可以简化方法,改善生产效率,和减少成本。Moreover, as a result of using a specific conductive powder and a specific dispersant, the paste of the present invention has little sensitivity to firing conditions, and can satisfy various firing conditions such as firing atmosphere (especially oxygen concentration), firing Temperature and profiles and similar conditions. Furthermore, the present invention can be applied to various ceramic bodies having different compositions and properties. Also, since strict control of firing conditions is not necessary, the method can be simplified, the production efficiency can be improved, and the cost can be reduced.
优选实施例的详细描述Detailed description of the preferred embodiment
本发明中使用的主要包括铜并在粉的至少一部分表面上具有薄玻璃态薄膜的球形导电粉(A),是通过用薄玻璃态物质涂覆主要包括铜的球形金属粉而形成的(或者使该薄玻璃态物质粘合到所述粉上)。除了纯铜粉之外,主要由铜的合金组成,例如包含铜和至少一种选自金、银、钯、铂、镍、铑、钴、铁和类似物的金属的合金,也可用作主要包含铜的球形金属粉。(下文中,这些粉被统称为“球形铜粉”)。通过激光衍射粒径分析仪测定的粉平均粒径D50(包括玻璃态薄膜)约为0.1到10μm的粉可用作球形铜粉。The spherical conductive powder (A) mainly comprising copper and having a thin glassy film on at least a part of the surface of the powder used in the present invention is formed by coating a spherical metal powder mainly comprising copper with a thin glassy substance (or The thin glassy substance binds to the powder). In addition to pure copper powder, alloys mainly composed of copper, such as alloys containing copper and at least one metal selected from gold, silver, palladium, platinum, nickel, rhodium, cobalt, iron and the like, can also be used as Spherical metal powder consisting mainly of copper. (Hereafter, these powders are collectively referred to as "spherical copper powder"). A powder having a powder average particle diameter D 50 (including a glassy thin film) of about 0.1 to 10 µm as measured by a laser diffraction particle size analyzer can be used as the spherical copper powder.
当玻璃态薄膜在铜粉表面以固相存在时,该膜起到防止金属氧化的保护层和防止烧结的层的作用。构成球形铜粉的单个颗粒不需要完全被玻璃态材料涂覆。然而,从而理想的是,表面被均匀涂覆的粉。玻璃态薄膜的量优选0.01到50重量%,和甚至更优选0.1到10重量%,基于球形铜粉的重量。When the glassy thin film exists as a solid phase on the surface of the copper powder, the film functions as a protective layer against metal oxidation and as a layer against sintering. The individual particles that make up the spherical copper powder need not be completely coated with glassy material. However, it is thus desirable that the surface is uniformly coated with powder. The amount of the glassy thin film is preferably 0.01 to 50% by weight, and even more preferably 0.1 to 10% by weight, based on the weight of the spherical copper powder.
通过任何所需的方法制备这种粉,例如通过在球形铜粉上气相沉积得到玻璃态薄膜的方法,或用溶胶凝胶法或类似方法涂覆粉的方法。然而,为了形成非常薄的覆盖单个铜颗粒的整个表面的均匀厚度的玻璃态膜,要求通过使用日本专利公开No.10-330802A中描述的方法制备该粉,例如,该方法是:溶液形成微滴,该溶液包含至少一种可热分解铜化合物和一种经过热分解制成不会形成有上述金属的固溶体的玻璃态材料的氧化物前体,和通过加热这些微液滴到比上述金属化合物的分解温度高的温度,在制备出铜粉的同时玻璃态材料沉积在上述铜金属粉的表面的附近。This powder is prepared by any desired method, such as a method of obtaining a glassy thin film by vapor deposition on spherical copper powder, or a method of coating the powder by a sol-gel method or the like. However, in order to form a very thin glassy film of uniform thickness covering the entire surface of a single copper particle, it is required to prepare the powder by using the method described in Japanese Patent Laid-Open No. 10-330802A, for example, the method is: solution forming micro droplets, the solution comprising at least one thermally decomposable copper compound and an oxide precursor that undergoes thermal decomposition to form a glassy material that does not form a solid solution with the above-mentioned metals, and by heating these micro-droplets to a ratio of the above-mentioned metal At a temperature at which the decomposition temperature of the compound is high, the glassy material is deposited in the vicinity of the surface of the copper metal powder at the same time as the copper powder is produced.
玻璃态薄膜是具有玻璃化转变点和玻璃化软化点的任意玻璃态材料,接着在粘结剂去除之后在高温区烧制的过程中玻璃在这两个点软化和液化;该玻璃态薄膜可以是无定形的,或可在无定形薄膜中包含晶体。另外,这个玻璃态薄层的组分可以是与作为无机粘结剂与膏混合的玻璃粉的组分相同或不同;然而,理想的是,该玻璃态薄膜在膏烧制过程中直到至少载体的分解温度时不会软化或液化,并且在粘结剂去除之后软化和液化以致该玻璃作为烧结助剂。所使用的玻璃种类的例子包括BaO-ZnO-B2O3类、BaO-ZnO类、BaO-SiO2类、BaO-ZnO-SiO2类、BaO-B2O3-SiO2类、ZnO-B2O3类、BaO-CaO-Al2O3类、PbO-B2O3-SiO2-Al2O3类、PbO-B2O3-ZnO类、ZnO-B2O3类、Bi2O3-B2O3-SiO2类和R’2O-B2O3-SiO2类(R’表示碱金属元素)和类似物。如果选择具有高软化点的玻璃态组分,接着粘结剂去除之后的高温区烧制之前将会抑制氧化和烧结;因此依据烧制条件决定涂层的量和组分。而且,通过在烧制过程中与熔融的玻璃粉(C)反应来改善电极膜的粘合性、可镀性、导电性和类似性能的成分也可以包括在组分中。A glassy film is any glassy material having a glass transition point and a glass softening point at which the glass softens and liquefies during firing in the high temperature region after binder removal; the glassy film can Is amorphous, or can contain crystals in an amorphous film. In addition, the composition of this glassy thin layer may be the same as or different from that of the glass frit mixed with the paste as an inorganic binder; It does not soften or liquefy at its decomposition temperature, and softens and liquefies after binder removal so that the glass acts as a sintering aid. Examples of glass types used include BaO-ZnO-B 2 O 3 type, BaO-ZnO type, BaO-SiO 2 type, BaO-ZnO-SiO 2 type, BaO-B 2 O 3 -SiO 2 type, ZnO- B 2 O 3 types, BaO-CaO-Al 2 O 3 types, PbO-B 2 O 3 -SiO 2 -Al 2 O 3 types, PbO-B 2 O 3 -ZnO types, ZnO-B 2 O 3 types, Bi 2 O 3 -B 2 O 3 -SiO 2 types and R' 2 OB 2 O 3 -SiO 2 types (R' represents an alkali metal element) and the like. If a glassy component with a high softening point is selected, oxidation and sintering will be inhibited before firing in the high temperature zone following binder removal; therefore the amount and composition of the coating depends on the firing conditions. Also, ingredients for improving the adhesion, plateability, conductivity and the like of the electrode film by reacting with the molten glass frit (C) during firing may also be included in the composition.
当在上述球形导电粉(A)的情况下,除了纯铜粉,含有铜作为主要组分的合金也可用作如本发明规定的主要包含铜的薄片状导电粉(B)。而且,例如镍、钴、铁、锌、锡、金、银、钯、铂、铑或类似物、或这些金属的合金的抗氧化金属的薄膜,是通过例如电镀、气相沉积或类似方法在薄片状铜粉颗粒的表面形成,其中能形成和球形导电粉(A)相似的玻璃态薄膜的粉也能被使用。形成这种金属涂层或玻璃态薄膜的结果是,抗氧化性得到改善,以致于可在较高的氧气分压进行烧制。在下文中,这些粉会被统称为“薄片状铜粉”。As in the case of the above-mentioned spherical conductive powder (A), besides pure copper powder, an alloy containing copper as a main component can also be used as the flaky conductive powder (B) mainly containing copper as specified in the present invention. Also, a thin film of an oxidation-resistant metal such as nickel, cobalt, iron, zinc, tin, gold, silver, palladium, platinum, rhodium, or the like, or an alloy of these metals, is deposited on a thin sheet by, for example, electroplating, vapor deposition, or the like. Surface formation of spherical copper powder particles, wherein a powder capable of forming a glassy thin film similar to the spherical conductive powder (A) can also be used. As a result of the formation of such metallic coatings or glassy films, oxidation resistance is improved so that firing at higher oxygen partial pressures is possible. Hereinafter, these powders will be collectively referred to as "flaky copper powder".
理想的是,使用具有平均粒径为1.0到10.0μm的粉作为上述薄片状铜粉。本文中,平均粒径是薄片状颗粒的主轴的平均值,并且是通过使用激光散射颗粒尺寸分析仪测量的颗粒尺寸分布的累计分数50%值(D50)(基于重量)。通过在上述范围内设定平均颗粒直径,有可能形成导电膏的干膜,该导电膏具有允许载体的分解产物(在烧制时转变成气体)容易排出到膜外部的结构;另外,可获得优良的涂覆膜形状。如果平均粒径小于1.0μm,粘结剂去除是不充分的,容易发生气泡;而且,抗氧化性降低另外,如果平均粒径超过10.0μm,膏体的流动性降低,并不可能涂覆成优良的形状;而且,在膜干燥的过程中形成多孔结构“以多孔结构”保留在烧制的膜中,以致于电极趋向于变成多孔的。It is desirable to use a powder having an average particle diameter of 1.0 to 10.0 μm as the above-mentioned flaky copper powder. Herein, the average particle diameter is an average value of major axes of flaky particles, and is a cumulative fractional 50% value (D 50 ) (weight basis) of particle size distribution measured by using a laser scattering particle size analyzer. By setting the average particle diameter within the above range, it is possible to form a dry film of conductive paste having a structure that allows decomposition products of the carrier (transformed into gas at the time of firing) to be easily discharged to the outside of the film; in addition, it is possible to obtain Excellent coating film shape. If the average particle size is less than 1.0 μm, the binder removal is insufficient, and air bubbles tend to occur; moreover, the oxidation resistance decreases. Also, if the average particle size exceeds 10.0 μm, the fluidity of the paste decreases, and it is impossible to apply Excellent shape; moreover, the porous structure formed during the drying of the film remains "porous" in the fired film so that the electrode tends to become porous.
另外,尤其是,如果薄片状铜粉的平均粒径(μm)和平均厚度(μm)的比率设定在3到80的范围内,或如果比表面积设定在0.3到2.0m2/g的范围内,可得到结合优良涂层相容性和烧制性能具有非常优良的粘结剂去除效果的端电极导电膏。如果平均粒径和平均厚度的比率小于3,粘结剂去除性能就不足;另外,如果该比率超过80,膏体流动性降低,以致于当通过浸渍(例如形成凸出等)进行涂覆时难以形成具有优良形状的涂层。另外,电极趋向于多孔,并且表面表现出粗糙的趋势。然而,薄片状粉的平均厚度可通过SEM观测来测定。如果比表面积小于0.3m2/g,通过烧制获得的电极薄膜趋向于多孔;另外,如果该表面积大于2.0m2/g,膏体的流动性不足,并且端电极的中心部分趋向于形成凸出。In addition, especially, if the ratio of the average particle diameter (μm) to the average thickness (μm) of the flaky copper powder is set in the range of 3 to 80, or if the specific surface area is set in the range of 0.3 to 2.0 m 2 /g Within the range, a terminal electrode conductive paste with a very good binder removal effect combined with excellent coating compatibility and firing performance can be obtained. If the ratio of the average particle diameter to the average thickness is less than 3, the binder removal performance is insufficient; in addition, if the ratio exceeds 80, the fluidity of the paste is reduced so that when coating is performed by dipping (such as forming protrusions, etc.) It is difficult to form a coating with an excellent shape. Additionally, electrodes tend to be porous, and the surface exhibits a tendency to be rough. However, the average thickness of the flaky powder can be determined by SEM observation. If the specific surface area is less than 0.3m 2 /g, the electrode film obtained by firing tends to be porous; in addition, if the surface area is greater than 2.0m 2 /g, the fluidity of the paste is insufficient, and the center portion of the terminal electrode tends to form a convex out.
这种薄片状铜粉可通过任意方法制备。例如,使用球磨或类似方法研磨球形粉的方法,化学还原方法,碾碎铜箔的方法都可使用。Such flaky copper powder can be prepared by any method. For example, a method of grinding spherical powder using a ball mill or the like, a chemical reduction method, and a method of crushing copper foil can be used.
上述球形导电粉和上述薄片状导电粉的混合比率可根据所使用的材料、烧制条件和所要求的性能合适地确定。然而,优选地,比率是在5∶95到95∶5(重量比率)的范围内。如果薄片状导电粉的比率小于这个值,干膜的密度变得过高,以致于粘结剂去除性能降低。另一方面,如果超过这个范围,相反地难以从电极薄膜中排出载体分解气体,以致于粘结剂去除性能降低;另外在高温时金属的扩散不足,以致于烧结被阻止了。The mixing ratio of the above-mentioned spherical conductive powder and the above-mentioned flaky conductive powder can be appropriately determined according to the materials used, firing conditions, and required properties. However, preferably, the ratio is in the range of 5:95 to 95:5 (weight ratio). If the ratio of the flaky conductive powder is less than this value, the density of the dry film becomes too high so that the binder removal performance is lowered. On the other hand, if it exceeds this range, it is conversely difficult to discharge the carrier decomposition gas from the electrode film, so that the binder removal performance is lowered; in addition, the diffusion of metal is insufficient at high temperature, so that sintering is prevented.
优选地,合适地选择和混合(A)和(B)以致于通过下面的公式计算的干膜密度D(g/cm3)在3.0到4.8g/cm3的范围内。Preferably, (A) and (B) are properly selected and mixed so that the dry film density D (g/cm 3 ) calculated by the following formula is in the range of 3.0 to 4.8 g/cm 3 .
D=W/(πT×10-4)D=W/(πT×10 -4 )
这里,在导电膏应用作为PET膜的表面涂层之后,W和T是干膜的重量(g)和厚度(μm),以致于得到的膜的厚度约为250μm,在150℃干燥10分钟和然后切成直径未20mm的圆片,并且去掉PET膜。Here, W and T are the weight (g) and thickness (μm) of the dry film after the conductive paste is applied as a surface coating of the PET film so that the resulting film has a thickness of about 250 μm, dried at 150°C for 10 minutes and Then cut into discs with a diameter of not more than 20 mm, and remove the PET film.
对使用的玻璃粉(C)没有特别的限制,只要该粉能在普通端电极铜膏中用作无机粘结剂。特别地,理想使用的抗还原玻璃不包含易还原的成分例如铅等,例如,BaO-ZnO-B2O3类、RO-ZnO-B2O3-MnO2类、RO-ZnO类、RO-ZnO-MnO2类、RO-ZnO-SiO2类、ZnO-B2O3类、SiO2-B2O3-R’2O类玻璃和类似物(R代表碱土金属和R’表示碱金属元素)。混入的玻璃粉的量是以导电粉每100重量份计约为1到20重量份。在使用的量小于1重量份的情况下,上述薄片电子零件的陶瓷体和端电极之间的粘结强度降低。另外,在这个量起过20份重量的情况下,在烧制之后在电极表面分布大量的玻璃,以致于会发生碎片间的溶解,并且以致于难以在端电极表面电镀。There is no particular limitation on the glass powder (C) used, as long as the powder can be used as an inorganic binder in the common terminal electrode copper paste. In particular, anti-reduction glasses ideally used do not contain easily reducible components such as lead, etc., for example, BaO-ZnO-B 2 O 3 type, RO-ZnO-B 2 O 3 -MnO 2 type, RO-ZnO type, RO - ZnO-MnO 2 type, RO-ZnO-SiO 2 type, ZnO-B 2 O 3 type, SiO 2 -B 2 O 3 -R' 2 O type glass and similar (R for alkaline earth metal and R' for alkali metal element). The amount of the glass powder mixed is about 1 to 20 parts by weight per 100 parts by weight of the conductive powder. In the case where the amount used is less than 1 part by weight, the bonding strength between the ceramic body and the terminal electrodes of the above-mentioned thin electronic part decreases. In addition, in the case where the amount exceeds 20 parts by weight, a large amount of glass is distributed on the electrode surface after firing, so that dissolution between fragments occurs, and it becomes difficult to plate on the surface of the terminal electrode.
除了将相应成分的原材料混合物混合、熔化、迅速冷却和研磨的普通的方法之外,玻璃粉也可通过其他理想的方法例如溶胶凝胶方法、喷溅热解方法、雾化方法或类似方法获得.尤其是在喷溅热解方法的情况下,能获得具有小的均匀颗粒尺寸的球形玻璃粉,以致于当其用于导电膏时不需要进行粉碎处理。因此,这样的方法是理想的。In addition to the usual methods of mixing, melting, rapidly cooling and grinding raw material mixtures of the corresponding components, glass powders can also be obtained by other ideal methods such as sol-gel methods, spray pyrolysis methods, atomization methods or similar methods . Especially in the case of the spray pyrolysis method, spherical glass frit having a small uniform particle size can be obtained so that pulverization treatment is not required when it is used for a conductive paste. Therefore, such an approach is ideal.
本发明的导电膏也可包含各种无机添加剂例如通常使用的金属氧化物、粘土矿物、陶瓷、氧化剂和类似物,以及其他导电粉,其用量以不会引起本发明效果的损失的量。The conductive paste of the present invention may also contain various inorganic additives such as commonly used metal oxides, clay minerals, ceramics, oxidizing agents and the like, and other conductive powders in amounts that do not cause loss of the effects of the present invention.
同样对有机载体(D)没有特别的限制;可以适当地选择和使用通用的溶解和分散在有机溶剂中的有机粘结剂例如丙烯酸型树脂、纤维素型树脂或类似物。如果必要,也可添加增塑剂、分散剂、粘度调节剂、表面活性剂、氧化剂、有机金属化合物和类似物。同样对载体的混合比例没有限制;使用的量是用来在膏中保持无机成分的合适的量,并且可根据应用方法合适地调整该量。There is also no particular limitation on the organic vehicle (D); a general-purpose organic binder dissolved and dispersed in an organic solvent such as an acrylic type resin, a cellulose type resin or the like can be appropriately selected and used. Plasticizers, dispersants, viscosity modifiers, surfactants, oxidizing agents, organometallic compounds and the like may also be added, if necessary. There is also no limitation on the mixing ratio of the carrier; the amount used is an appropriate amount for maintaining the inorganic components in the paste, and the amount can be appropriately adjusted according to the application method.
各种胺能用作脂族胺(B),例如,伯胺例如辛胺、月桂胺、十四胺、十八胺、油胺、牛油胺、牛油丙邻二胺和类似物,仲胺例如二硬脂胺和类似物,叔胺例如三乙胺、二甲基辛胺、二甲基十四胺、二甲基棕榈胺、二甲基硬脂胺、二甲基山萮胺、二甲基月桂胺、三辛胺和类似物.可组合使用这些胺中的两种或更多。也可使用通常以“脂族胺”出售的大量不同类型胺的混合物。特别是,从后面所述的在薄片状铜粉上进行涂覆处理的容易程度和金属吸收的观点来看,在主链上具有约14到18个碳原子的较高烷基胺,例如十八烷胺硬脂胺、油胺、二甲基硬脂胺或类似物,或主要包含这种胺的脂族胺,尤其适于使用。Various amines can be used as aliphatic amines (B), for example, primary amines such as octylamine, laurylamine, tetradecylamine, octadecylamine, oleylamine, tallowamine, tallow propylene diamine and the like, secondary Amines such as distearylamine and the like, tertiary amines such as triethylamine, dimethyloctylamine, dimethyltetradecylamine, dimethylpalmitamine, dimethylstearylamine, dimethylbehenylamine, Dimethyllaurylamine, trioctylamine and similar. Two or more of these amines may be used in combination. Mixtures of a number of different types of amines, often sold as "aliphatic amines," may also be used. In particular, higher alkylamines having about 14 to 18 carbon atoms in the main chain, such as deca Octadecylamine stearylamine, oleylamine, dimethylstearylamine or the like, or aliphatic amines comprising mainly such amines, are especially suitable for use.
脂族胺优选通过作为涂层处理应用并且预先吸附在薄片状铜粉表面来使用。对所使用的涂覆方法没有特别的限制;例如,胺可单独使用或将其溶解在溶剂里,和通过用于普通表面处理剂相同的方法对铜粉的表面进行表面处理。而且,在通过研磨球形或粒状铜粉制备薄片状铜粉的情况下,脂族胺可用作研磨助剂,和当“作为助剂”吸附在粉的表面时与膏混合。The aliphatic amine is preferably used by being applied as a coating treatment and previously adsorbed on the surface of the flaky copper powder. There is no particular limitation on the coating method used; for example, amine may be used alone or dissolved in a solvent, and the surface of the copper powder is surface-treated by the same method used for common surface treatment agents. Also, in the case of preparing flaky copper powder by grinding spherical or granular copper powder, the aliphatic amine can be used as a grinding aid, and mixed with the paste when adsorbed on the surface of the powder "as an aid".
脂族胺能防止薄片状铜粉的氧化,并改善粉在膏中的分散性。通常,较高的脂肪酸例如硬脂酸,月硅酸和类似物,或这种酸的金属盐,通常被用于这种目的。然而,在普通还原烧制条件下,包含在铜膏中的脂肪酸非常抗分解和分散,以致于即使在载体成分已经完全分解之后,该脂肪酸一直保存到700到800℃的高温。根据本发明人进行的研究,显然是由于下面的原因:即,作为与铜形成金属皂的结果,较高脂肪酸强烈的粘合在铜粉表面,以致于在包含非常少的氧气的气氛里这些物质在高温时并易分解。因此,即使载体的去消除得到了改善,脂肪酸作为残留碳保留在薄膜中,和仅在薄膜开始烧结之后才开始分解。因此,这防碍烧结,并引起陶瓷体的气泡和退化,和增加了工艺依赖性。另一个方面,脂族胺具有优良的抗氧化作用和作为分散剂的作用,并且也不形成强烈粘合铜的化合物,以致于即使在低温的非氧化气氛中这些化合物容易地分解和从电极膜去除。Aliphatic amines prevent oxidation of flake copper powder and improve powder dispersion in paste. Generally, higher fatty acids such as stearic acid, lauric acid and the like, or metal salts of such acids, are commonly used for this purpose. However, the fatty acid contained in the copper paste is so resistant to decomposition and dispersion under ordinary reducing firing conditions that the fatty acid is preserved up to a high temperature of 700 to 800° C. even after the carrier component has been completely decomposed. According to the studies carried out by the inventors, it is apparently due to the following reason: that is, as a result of the formation of metal soaps with copper, higher fatty acids are strongly bound to the surface of copper powder, so that in an atmosphere containing very little oxygen these The substance decomposes easily at high temperature. Therefore, even though support removal is improved, the fatty acid remains in the film as residual carbon, and begins to decompose only after the film begins to sinter. Therefore, this hinders sintering, and causes bubbles and degradation of the ceramic body, and increases process dependence. On the other hand, aliphatic amines have excellent antioxidant effects and functions as dispersants, and do not form compounds that strongly bind copper, so that these compounds are easily decomposed and removed from the electrode film even in a low-temperature non-oxidizing atmosphere. remove.
混入组分的脂族胺的量优选0.05到2.0重量%,基于薄片状铜粉的重量。如果混合的量少于0.05重量%,效果就会不足;另外.即使混入超过2.0重量%的量,没有附加的改善。The amount of the aliphatic amine mixed into the components is preferably 0.05 to 2.0% by weight based on the weight of the flake copper powder. If the mixing amount is less than 0.05% by weight, the effect will be insufficient; in addition. Even if it is blended in an amount exceeding 2.0% by weight, there is no additional improvement.
在本发明的膏中,混合上述成分的结果是,猜测干膜的结构可保持在多孔状态,这对粘结剂的去除是最佳的,以致于粘结剂消除可平稳地在结构单元中进行。因此,在软化玻璃和烧结铜之前可非常快速地进行粘结剂去除而没有铜的氧化,以致于使直到高温区残留关闭在膜里的残余碳的量达最小。In the paste of the present invention, as a result of mixing the above ingredients, it is conjectured that the structure of the dry film can be maintained in a porous state, which is optimal for the removal of the binder, so that the removal of the binder can be smoothly carried out in the structural unit conduct. Thus, binder removal can be performed very quickly without oxidation of the copper prior to softening the glass and sintering the copper, so that the amount of residual carbon remaining closed in the film until the high temperature region is minimized.
其次,烧结逐渐进行,并且结构变得致密和精细。根据由本发明人进行的研究,在烧制过程中,例如在峰温度800℃下没有发生铜的氧化的氧气分压是10-3ppm或更少.在这一点上,为了保持在这个温度的如此低的氧气分压,残余碳的量不是零;显然在铜粉附近保留非常少量的碳是必要的,以致于形成消耗氧的环境。然而,在过去,不管粘结剂去除过程是在氧化气氛中进行还是在非常少氧的气氛中,残留如此少控制量的碳非常困难。另外,在下面描述的实施例中,依据由本发明人证实的发现,在实施例中所示的本发明膏的情况下,在高温区残余碳以非常小的可控量存在于铜粉附近。碳存在的结果是,显然,甚至在接近最大烧制温度的高温下,在铜粉附近保持局部的氧气分压,以致于铜的氧化被阻止了。Second, sintering proceeds gradually, and the structure becomes dense and fine. According to a study conducted by the present inventors, during firing, for example, the oxygen partial pressure at which oxidation of copper does not occur at a peak temperature of 800°C is 10 -3 ppm or less. At this point, in order to maintain such a low oxygen partial pressure at this temperature, the amount of residual carbon is not zero; apparently it is necessary to retain a very small amount of carbon near the copper powder, so that an oxygen-depleting environment is formed. However, in the past, it has been very difficult to retain such small and controlled amounts of carbon regardless of whether the binder removal process was performed in an oxidizing atmosphere or in a very oxygen-poor atmosphere. In addition, in the examples described below, according to the findings confirmed by the present inventors, in the case of the inventive paste shown in the examples, residual carbon exists in a very small controllable amount near the copper powder in the high temperature region. As a result of the presence of carbon, apparently, even at elevated temperatures close to the maximum firing temperature, a partial pressure of oxygen is maintained locally in the vicinity of the copper powder so that oxidation of the copper is prevented.
而且,因为具有这种理想的烧结行为,和因为能形成可控的气氛,显然烧制条件的敏感性也降低了。尤其是,一致保存到高温区的碳的量是稳定的,以致于工艺依赖性是小的,甚至在混合球形铜粉和薄片状铜粉以致于干膜的填充性能是高的情况下。Also, because of this ideal sintering behavior, and because of the controlled atmosphere that can be created, it is apparent that the sensitivity to firing conditions is also reduced. In particular, the amount of carbon uniformly preserved to the high temperature region is stable so that process dependence is small even in the case of mixing spherical copper powder and flaky copper powder so that the filling performance of the dry film is high.
实施例Example
样品1至9的准备Preparation of samples 1 to 9
混合如表1所示的相应组分,使用2μm平均粒径且具有位于粉颗粒表面上13nm平均厚度的均匀BaO-SiO2型玻璃态薄层(粉体中玻璃态薄层:约2重量%)的球形铜粉作为玻璃-涂覆的球形铜粉,使用具有经过主要由十八胺组成的脂族胺(由Kao Corporation生产的“FARMIN 80”)表面处理的7μm平均粒径和0.2μm平均厚度的薄片状铜粉作为薄片状铜粉(十八胺的量相对于薄片状铜粉的量:约0.3重量%),使用2μm平均粒径的BaO-ZnO-B2O3型球形玻璃粉或2μm平均粒径的ZnO-B2O3-SiO2型球形玻璃粉作为玻璃粉,以及通过在松油醇中溶解丙烯酸类树脂得到的溶液作为有机载体,然后通过用三辊磨捏合制备导电膏。样品6至9在本发明的范围之外。此外,在样品8和9中,使用具有2μm平均粒径但没有玻璃态薄层的球形铜粉来代替涂覆有玻璃态薄层的球形铜粉。Mixing the corresponding components as shown in Table 1, using a uniform BaO-SiO type glassy thin layer with an average particle size of 2 μm and an average thickness of 13 nm on the surface of the powder particles (glassy thin layer in the powder: about 2% by weight ) as a glass-coated spherical copper powder having an average particle diameter of 7 µm and an average Thick flaky copper powder As flaky copper powder (the amount of octadecylamine relative to the amount of flaky copper powder: about 0.3% by weight), a BaO-ZnO-B 2 O 3 type spherical glass powder with an average particle size of 2 μm is used Or ZnO-B 2 O 3 -SiO 2 type spherical glass powder with an average particle size of 2 μm as glass powder, and a solution obtained by dissolving acrylic resin in terpineol as an organic vehicle, and then prepared conductive by kneading with a three-roll mill paste. Samples 6 to 9 are outside the scope of the present invention. Furthermore, in Samples 8 and 9, spherical copper powder having an average particle diameter of 2 μm without a glassy thin layer was used instead of the spherical copper powder coated with a glassy thin layer.
实验1Experiment 1
通过在高温下烧结钛酸钡陶瓷电介质生坯片的叠片和镍内电极制备平面尺寸为2.0mm×1.25mm及厚度为1.25mm的一种Y5V 1μF(额定值)多层陶瓷电容器主体,通过将电容器主体的镍内电极暴露的两端面浸渍来应用样品1至9中的导电膏以至于使烧制后的层厚废为60μm,并通过将其在热风干燥机内150℃下保持10分钟来干燥这些样品。A Y5V 1μF (rated value) multilayer ceramic capacitor body with a planar size of 2.0mm×1.25mm and a thickness of 1.25mm was prepared by sintering a stack of barium titanate ceramic dielectric green sheets and nickel internal electrodes at high temperature. Apply the conductive paste in samples 1 to 9 by immersing the exposed end faces of the nickel inner electrodes of the capacitor body so that the layer thickness after firing is 60 μm, and hold it in a hot air dryer at 150° C. for 10 minutes to dry the samples.
其后,在带式马弗炉中,设置烧制气氛的整个区域(粘结剂去除区和烧制区)含5ppm氧气的氮气气氛,并且在表1所示的峰温度下且在峰值温度下的保持时间设为10分钟来烧制样品,从烧制开始到结束的时间设置为1小时,这样形成端电极并得到多层陶瓷电容器。Thereafter, in the belt muffle furnace, set the whole area of the firing atmosphere (binder removal zone and firing zone) to contain 5ppm oxygen nitrogen atmosphere, and at the peak temperature shown in Table 1 and at the peak temperature The sample was fired with the holding time set at 10 minutes, and the time from the start to finish of firing was set at 1 hour, thus forming terminal electrodes and obtaining a multilayer ceramic capacitor.
用具有在相应的条件下烘烤的端电极的电容器来测量静电电容。而且,用扫描电子显微镜(SEM)观察端电极膜的表面和横截面,并且检查气孔的存在或不存在。The electrostatic capacity was measured with a capacitor having terminal electrodes baked under the corresponding conditions. Also, the surface and cross section of the terminal electrode film were observed with a scanning electron microscope (SEM), and the presence or absence of pores was checked.
此外,对通过电镀在电极膜上形成镍镀层并且进一步形成锡镀膜的试验样品,检测了可镀性、端电极拉伸强度和有无焊料溅出。而且,进行了热冲击试验。结果汇于表1。此外,所示的静电电容和拉伸强度值为500个电容器的平均值。Furthermore, for test samples in which a nickel plating layer was formed on an electrode film by electroplating and a tin plating film was further formed, plateability, terminal electrode tensile strength, and the presence or absence of solder spatter were examined. Furthermore, a thermal shock test was performed. The results are summarized in Table 1. In addition, the electrostatic capacitance and tensile strength values shown are average values of 500 capacitors.
通过已镀面积相对于电极表面的程度(%)来估计可镀性。○:基本上10%,○:90到99%,Δ:70到89%粘合,×:69%或更少。Platability was estimated by the extent (%) of the plated area relative to the electrode surface. ○: substantially 10%, ○: 90 to 99%, Δ: 70 to 89% adhesion, ×: 69% or less.
如下进行有或无焊料溅出的检查,和热冲击试验实验。The inspection with and without solder spatter, and the thermal shock test were performed as follows.
焊料溅出量:30个样品中的端电极覆盖有焊料,使样品通过焊料重熔炉,并且研究出现熔融焊料飞溅到四周区域的现象的样品数目。Amount of solder spatter: 30 samples in which terminal electrodes were covered with solder, the samples were passed through a solder remelting furnace, and the number of samples in which a phenomenon in which molten solder spattered to surrounding areas occurred was investigated.
热冲击试验:330℃下将样品浸泡燥焊料浴中7秒钟,并且研究(在30个样品中)出现热裂解的样品数目。Thermal Shock Test: Samples were immersed in a dry solder bath at 330°C for 7 seconds and the number of samples (out of 30 samples) showing thermal cracking was investigated.
表1Table 1
*比较例*Comparative example
从表1所示结果中清楚看出,使用具有玻璃态薄膜的球形铜粉和薄片状铜粉混合体的样品1至4同只使用这些粉体之一的样品6和7相比较,或者是同使用没有涂覆玻璃态薄膜的球形铜粉和薄片状铜粉的样品8和9相比较,在所有特征方面都是优秀的。特别是,使用没有涂覆玻璃态薄膜的球形铜粉的样品8和9表现出低的静电电容;这似乎是由于铜粉的氧化。From the results shown in Table 1, it is clear that samples 1 to 4 using a mixture of spherical copper powder and flaky copper powder with a glassy thin film were compared with samples 6 and 7 using only one of these powders, or Compared with Samples 8 and 9 using spherical copper powder and flake-shaped copper powder not coated with a glassy thin film, they are excellent in all characteristics. In particular, samples 8 and 9 using spherical copper powder not coated with a glassy thin film exhibited low electrostatic capacitance; this seems to be due to oxidation of the copper powder.
样品10至15的准备Preparation of samples 10 to 15
分别混合表2中的组分,除了使用一种平均粒径为7μm且平均厚度为0.2μm的一定量的十八胺(上述的“FARMIN 80”)或表2所示的硬脂酸表面处理的薄片状铜粉作为薄片状铜粉以外,使用与样品1至9中相同的材料制备导电膏。而且,样品10是与样品4有相同组分的浆体,样品12是与样品8有相同组分的浆体,样品15是与样品5有相同组分的浆体。The components in Table 2 were mixed separately, except that an amount of octadecylamine ("FARMIN 80" mentioned above) with an average particle size of 7 μm and an average thickness of 0.2 μm or a stearic acid surface treatment as shown in Table 2 was used A conductive paste was prepared using the same materials as in Samples 1 to 9 except for the flaky copper powder. Also, sample 10 is a slurry having the same composition as sample 4, sample 12 is a slurry having the same composition as sample 8, and sample 15 is a slurry having the same composition as sample 5.
实验2Experiment 2
使用样品号为10到15的导电膏,将烧制气氛划分为温度上升过程中达到600℃的区(粘结剂去除区)和温度高于600℃的区(烧制区),并且设置相应的气氛为含有表2中所示氧气量的氮气氛。而且,峰值温度是变化的。除此以外,以与实验1相同的方式生产电容器。进行相同的实验,并且所得结果示于表2。Using conductive pastes with sample numbers 10 to 15, divide the firing atmosphere into a zone where the temperature rises to 600°C (binder removal zone) and a zone where the temperature is higher than 600°C (firing zone), and set the corresponding The atmosphere was a nitrogen atmosphere containing the amount of oxygen shown in Table 2. Also, the peak temperature is variable. Except for this, capacitors were produced in the same manner as in Experiment 1. The same experiment was carried out, and the results obtained are shown in Table 2.
表2Table 2
*比较例*Comparative example
在样品10、11、13、14和15中混合使用覆有玻璃态薄膜的球形铜粉同薄片状铜粉,可看出用十八胺处理薄片状铜粉的样品10、13和15能够形成优异的端电极,显示出对烧制气氛依赖性很小,并且在含有几十个ppm的氧气的气氛内进行粘结剂去除过程和高温烧制过程的情形和只有几个ppm或更少的相当低的氧含量的气氛内进行这些过程的情况下,均具有宽的工艺范围(processwindow)。另一方面,对于用硬脂酸处理薄片状铜粉的样品11和14,在粘结剂去除区的烧制气氛内通过调整氧气浓度在一定程度上可以改善端电极性能。样品12是使用没有涂覆玻璃态薄膜的球形铜粉和薄片状铜粉的比较例;在此例中,未得到满意的结果。In samples 10, 11, 13, 14, and 15, spherical copper powder coated with a glassy thin film was mixed with flake-shaped copper powder. It can be seen that samples 10, 13, and 15 treated with octadecylamine to form Excellent terminal electrode, showing little dependence on firing atmosphere, and in the case of binder removal process and high-temperature firing process in an atmosphere containing several tens of ppm of oxygen and only a few ppm or less In the case of carrying out these processes in an atmosphere with a relatively low oxygen content, each has a wide process window. On the other hand, for samples 11 and 14 which treated flake copper powder with stearic acid, the terminal electrode performance can be improved to some extent by adjusting the oxygen concentration in the firing atmosphere in the binder removal zone. Sample 12 is a comparative example using spherical copper powder and flaky copper powder not coated with a glassy thin film; in this case, satisfactory results were not obtained.
样品16至18的制备Preparation of samples 16 to 18
分别混合表3所示的组分,然后除了使用一种平均粒径为5μm且平均厚度为0.2μm的一定量表3所示的十八胺(上述的“FARMIN 80”)、二甲基硬脂胺(Kao Corporation生产的“FARMIN DM8098”)或油酸表面处理的薄片状铜粉作为薄片状铜粉以外,以与样品1至9中相同的材料制备导电膏。此外,样品18为在本发明范围之外的比较例。The components shown in Table 3 were mixed separately, and then in addition to using a certain amount of octadecylamine shown in Table 3 (the above-mentioned "FARMIN 80") with an average particle size of 5 μm and an average thickness of 0.2 μm, dimethyl hard A conductive paste was prepared with the same material as in Samples 1 to 9 except for flaky copper powder surface-treated with tallow amine ("FARMIN DM8098" manufactured by Kao Corporation) or oleic acid as the flaky copper powder. In addition, Sample 18 is a comparative example outside the scope of the present invention.
实验3Experiment 3
利用样品16至18的导电膏,使用X7R 4.7μF(额定值)电容器作为多层陶瓷电容器主体,并且除了将焙烧气氛和峰值温度设置为含有如表3所示浓度氧气的氮气气氛内以外,以与实验1中相同的方式生产电容器。进行与实验1中相同的试验;结果列在表3中。Using the conductive paste of samples 16 to 18, an X7R 4.7μF (rated value) capacitor was used as the multilayer ceramic capacitor body, and in addition to setting the firing atmosphere and peak temperature in a nitrogen atmosphere containing oxygen at the concentration shown in Table 3, the Capacitors were produced in the same manner as in Experiment 1. The same test as in Experiment 1 was carried out; the results are listed in Table 3.
表3table 3
*比较例*Comparative example
显然在表3的结果中,涂覆有玻璃态薄膜的球形铜粉及薄片状铜粉混合使用的样品16和17在所有特征方面都优于使用未涂覆玻璃态薄膜的球形铜粉及薄片状铜粉的样品18。Obviously, in the results of Table 3, samples 16 and 17, which are mixed with spherical copper powder and flake-shaped copper powder coated with a glassy thin film, are superior to spherical copper powder and flakes that are not coated with a glassy thin film in all characteristics. sample 18 of copper powder.
Claims (6)
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| JP2004098011 | 2004-03-30 | ||
| JP2004098011A JP4647224B2 (en) | 2004-03-30 | 2004-03-30 | Conductive paste for multilayer ceramic electronic component terminal electrode |
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| CN1322518C true CN1322518C (en) | 2007-06-20 |
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| US (1) | US7368070B2 (en) |
| EP (1) | EP1583107B1 (en) |
| JP (1) | JP4647224B2 (en) |
| KR (1) | KR100680461B1 (en) |
| CN (1) | CN1322518C (en) |
| AT (1) | ATE326759T1 (en) |
| CA (1) | CA2502375C (en) |
| DE (1) | DE602005000007T2 (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN1700361A (en) | 2005-11-23 |
| DE602005000007T2 (en) | 2006-10-19 |
| JP4647224B2 (en) | 2011-03-09 |
| US7368070B2 (en) | 2008-05-06 |
| DE602005000007D1 (en) | 2006-06-22 |
| TW200535869A (en) | 2005-11-01 |
| US20050219789A1 (en) | 2005-10-06 |
| EP1583107A1 (en) | 2005-10-05 |
| MY134459A (en) | 2007-12-31 |
| JP2005286111A (en) | 2005-10-13 |
| TWI269312B (en) | 2006-12-21 |
| CA2502375C (en) | 2008-02-12 |
| ATE326759T1 (en) | 2006-06-15 |
| EP1583107B1 (en) | 2006-05-17 |
| CA2502375A1 (en) | 2005-09-30 |
| KR20060045129A (en) | 2006-05-16 |
| KR100680461B1 (en) | 2007-02-08 |
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