CN1321080C - Surface treatment method of forming die, the forming die and optical elements - Google Patents
Surface treatment method of forming die, the forming die and optical elements Download PDFInfo
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- CN1321080C CN1321080C CNB2004100033637A CN200410003363A CN1321080C CN 1321080 C CN1321080 C CN 1321080C CN B2004100033637 A CNB2004100033637 A CN B2004100033637A CN 200410003363 A CN200410003363 A CN 200410003363A CN 1321080 C CN1321080 C CN 1321080C
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- forming face
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- 238000000034 method Methods 0.000 title claims abstract description 51
- 238000004381 surface treatment Methods 0.000 title claims abstract description 42
- 230000003287 optical effect Effects 0.000 title claims description 17
- 238000007493 shaping process Methods 0.000 claims abstract description 107
- 238000005530 etching Methods 0.000 claims abstract description 34
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 26
- 238000009826 distribution Methods 0.000 claims abstract description 10
- 239000012530 fluid Substances 0.000 claims description 35
- 239000002362 mulch Substances 0.000 claims description 27
- 238000009418 renovation Methods 0.000 claims description 22
- 238000012545 processing Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 16
- 239000011159 matrix material Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 4
- 230000003760 hair shine Effects 0.000 claims 1
- 239000011651 chromium Substances 0.000 abstract description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 11
- 229910052804 chromium Inorganic materials 0.000 abstract description 11
- 238000011282 treatment Methods 0.000 abstract description 9
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 abstract description 7
- 238000000227 grinding Methods 0.000 abstract description 7
- 239000012528 membrane Substances 0.000 abstract description 7
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 abstract 2
- 239000010410 layer Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 238000001039 wet etching Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000005304 optical glass Substances 0.000 description 7
- 238000013461 design Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- PRORZGWHZXZQMV-UHFFFAOYSA-N azane;nitric acid Chemical compound N.O[N+]([O-])=O PRORZGWHZXZQMV-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000013543 active substance Substances 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001868 water Inorganic materials 0.000 description 1
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- Moulds For Moulding Plastics Or The Like (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Provided is a surface treatment method of a shaping die and the shaping die which can produce and reproduce the shaping die without any wet etching process nor grinding process. First, the relationship between the angle of incidence of an ion beam and an etching rate distribution in a shaping surface is calculated beforehand each for tungsten carbide (WC) composing a substrate, chromium (Cr) composing an intermediate layer and chromium nitride (CrN) composing a surface layer, under the irradiation conditions identical to those applied at the time of surface treatment except the angle of incidence of the ion beam. From a membrane thickness ratio of Cr to CrN constituting the shaping surface 12, based on the relationship, and by using the shaping die controlling angle [gamma] as a parameter, the etching rate distribution from the surface top to the periphery end part of the shaping surface is calculated. Based on these calculation, the optimum combinational conditions of the shaping die control angle [gamma] and treatment time for the etching depth required for the treatment are worked out to carry out the treatment.
Description
Technical field
The present invention relates to surface treatment method and shaping die for the shaping die that makes shaping usefulness such as optical glass device, and the optical element that is shaped by this shaping die.
Background technology
Spherical lens and non-spherical lens etc. are arranged in the optical glass devices such as lens, particularly, when making non-spherical lens, also can the be shaped glass press forming method of lens of aspherical shape of many employings.
This glass press forming method is, at preprocess on the sphere or aspherical surface forming mould of desired surface quality and surface accuracy, the block thing of heating opticglass, perhaps, glass block through preheating is placed on the shaping die, press forming obtains the shaping thing, so that the effect of its surface working reaches the degree that can omit grinding step then.
Forming face if form operation repeatedly, will soon take place and become bad, phenomenons such as forming quality reduction in the employed shaping die of this glass press forming method.Therefore, when reusing shaping die, must carry out surface treatment, renovate forming face.
In the past, the surface treatment method of shaping die is, use between the matrix of shaping die and upper layer, to have and form with the shaping die of chromium as the middle layer of main component, when renovation, this shaping die is put into chromium solvability treatment solution handle, the dissolving of middle layer and upper layer is peeled off, form new middle layer and upper layer then, (for example, with reference to patent documentation 1, the spy opens flat 1-192733 communique).
In addition, also proposed on the forming face of shaping die, to shine ionic fluid, the mulch film of shaping die has been carried out after the etching processing, on forming face, formed the method (for example, with reference to patent documentation 2, the spy opens flat 5-32424 communique) of new mulch film.
In addition, such method has also been proposed, promptly, when have between base plate and the upper layer one deck or two-layer more than the middle layer, when renovation has the shaping die in this middle layer, utilize ion beam irradiation to carry out etching processing, remove the uppermost part in above-mentioned upper layer and middle layer, then, handle with the treatment solution that can dissolve this middle layer main component, the middle layer of exposing is removed in dissolving, then, form new middle layer and upper layer (for example, with reference to patent documentation 3, the spy opens flat 2001-130918 communique) again.
But there is following problem in the surface treatment method of above-mentioned shaping die in the past.
In the method that patent documentation 1 is put down in writing, general, used chromium solvability treatment solution is the ceric nitrate ammonia solution, or has mixed these two kinds of the mixing solutionss of aquae hydrogenii dioxidi and tensio-active agent in hydrochloric acid.Preceding a kind of solution has metal, the nitride of chromium and the characteristic of carbide beyond the very difficult dissolve chromium.On the other hand, a kind of solution in back, though the material beyond also can dissolve chromium,, matrix has all dissolved possibly.Therefore, a kind of chromium solvability treatment solution before having to use, i.e. ceric nitrate ammonia solution, but, such problem has appearred again, that is and, it is by the formed shaping die of material beyond the chromium that this solution almost can not be applied to the middle layer.
Also have, in the method that patent documentation 2 is put down in writing, because shaping die will be that the center is shaken with the optical axis perpendicular to the surperficial top of forming face, if when shaking, normal direction and the inconsistent part of above-mentioned optical axis on the optional position of forming face are arranged, then the etching depth of the centre portions of forming face and peripheral part will be inhomogeneous, and the surface shape that processes also can change.Particularly, several layers are arranged between upper layer and matrix, perhaps under the situation that radius-of-curvature is little, above-mentioned phenomenon might occur.
In addition, in the method that patent documentation 3 is put down in writing, exist such problem, promptly, not only to carry out the operation of ion beam irradiation and these two operations of solution-treated, need making time and labour, and for employed solution-treated liquid, only just effective when the middle layer is to be formed by chromium, be almost can't use for the middle layer by the shaping die that other materials form.
And, through the forming face of the shaping die after repeatedly being shaped, compare with the shape at the initial stage of shaping, can change to some extent, for the surface shape of this mould is processed into desirable shape, use above-mentioned any method in the past, all must further process through grinding process etc.
Summary of the invention
The present invention proposes in view of above situation, it is not processing and the renovation that forms mould with liquid corrosion, in addition, the surface treatment method and the shaping die that the purpose of this invention is to provide a kind of shaping die that just can finish without grinding process, and by the optical element of this shaping die formed thereby.
In order to address the above problem, the present invention takes following way.
The surface treatment method of shaping die of the present invention is, have ion beam irradiation is being had at least on the forming face of curved surface, forming face is carried out the surface treatment method of shaping die of the ion beam irradiation operation of etching processing, it is characterized in that, in above-mentioned ion beam irradiation operation, obtain the input angle of above-mentioned ionic fluid in advance with respect to above-mentioned forming face central axis, and and above-mentioned forming face on the etching degree distribution between relation, according to this relation, determine at least one in the irradiation time of above-mentioned input angle and above-mentioned ionic fluid then.
Surface treatment method according to this shaping die, because can be from the ionic fluid obtained in advance with respect to the relation between the input angle of forming face central axis and the etching degree distribution in the forming face, decide the input angle of ionic fluid and at least one item in the irradiation time, therefore, just can be by means of the input angle and the etching degree of ionic fluid, on the optional position of forming face, make etching depth reach desirable value, and can also carry out high precision processing forming face.
In the surface treatment method of the shaping die that a first aspect of the present invention is put down in writing, it is characterized in that, in above-mentioned ion beam irradiation operation, change above-mentioned input angle and above-mentioned irradiation time, repeatedly shine with above-mentioned ionic fluid.
Surface treatment method according to this shaping die, because can repeatedly shine with ionic fluid, so, can carry out etching to forming face again, but also can carry out high-precision processing to whole forming face for the sufficient inadequately forming face of its etching of primary ions bundle irradiation back.
In the surface treatment method of the shaping die that a first aspect of the present invention or second aspect are put down in writing, also has following feature, in above-mentioned ion beam irradiation operation, under determined above-mentioned input angle and irradiation time, above-mentioned ionic fluid makes the variation minimum of shape behind pre-irradiation of above-mentioned forming face.
According to the surface treatment method of this shaping die, because the change of shape minimum of forming face, therefore, the shape of forming face remains unchanged in the front and back of ion beam irradiation, and can carry out high-precision renovation to forming face and handle.
In the surface treatment method of the shaping die that a first aspect of the present invention or second aspect are put down in writing, it is characterized in that, in above-mentioned ion beam irradiation operation, the above-mentioned forming face that has mulch film with above-mentioned ion beam irradiation, and at least one side in the material of the matrix below above-mentioned mulch film and the above-mentioned mulch film carried out etching processing, and after above-mentioned operation, also has the renovation operation that on above-mentioned forming face, forms new mulch film.
Surface treatment method according to this shaping die, because have ion beam irradiation operation and the renovation operation after this operation, so, can remove old mulch film by means of the etching processing in the ion beam irradiation operation, and, surface shape to forming face is carried out high-precision rectification, and then by the renovation operation, expose and also through forming new mulch film on the corrigent forming face, thereby can renovate shaping die.
The surface treatment method of the shaping die that a fourth aspect of the present invention is put down in writing, it is characterized in that, in above-mentioned ion beam irradiation operation, above-mentioned relation according to the composition and at least one item in the basic material below the above-mentioned mulch film of above-mentioned mulch film are obtained determines above-mentioned input angle and above-mentioned irradiation time.
Surface treatment method according to this shaping die, owing to be the relation of obtaining according to the composition and at least one item in the basic material below the mulch film of mulch film, decide the input angle of ionic fluid and irradiation time, therefore, composition and the only illuminate condition of basic material can be drawn, and the state that is suitable for the renovation operation after the ion beam irradiation operation of forming face can also be obtained mulch film.
The feature of shaping die of the present invention is, the surface treatment method of the shaping die of putting down in writing with first aspect has carried out surface treatment to forming face.
This shaping die, because by means of the surface treatment method of the invention described above, its forming face becomes and has desirable shape and state, perhaps has the mulch film of renovation, so on this shaping die, carry out press forming, can obtain optical glass device through high-precision surface processing.
Optical element of the present invention is characterised in that the shaping die that utilizes the 6th aspect to put down in writing is shaped.
This optical element owing to used forming face to have desirable shape and state, perhaps has the shaping die of the mulch film of renovation, and this optical element is shaped by this shaping die, and therefore this optical element has very high optical accuracy.
Surface treatment method according to shaping die of the present invention, because can be by changing the input angle and the etching degree of ionic fluid, can on the optional position of forming face, etch into the desirable degree of depth, can also shape face accurately, therefore, do not need just can realize the processing and the renovation of shaping die by liquid corrosion or grinding step.
In addition,, keep the high-precision while, can also reduce manufacturing procedure, reduce manufacturing cost in the quality of the surface shape that makes optical glass device according to shaping die of the present invention.
In addition, according to this optical element, can obtain the opticinstrument of excellent optical performance.
Description of drawings
Fig. 1 is the synoptic diagram that the shaping die of the present invention the 1st and the 2nd embodiment is arranged;
Fig. 2 is the amplification profile diagram of the A portion among Fig. 1;
Fig. 3 is the synoptic diagram of layout of the shaping die of the present invention the 1st embodiment;
Fig. 4 is the graphic representation of expression ionic fluid input angle and the relation between the etching degree of the present invention the 1st embodiment;
Fig. 5 is among the present invention the 1st embodiment, controls angle as the optional position of the forming face of parameter and the graphic representation of the relation between the mulch film etching degree with shaping die;
Fig. 6 is among the present invention the 1st embodiment, with the graphic representation of shaping die control angle as the relation between the etching degree of the optional position of the forming face of parameter and matrix.
Embodiment
Below, referring to figs. 1 through Fig. 3 the 1st embodiment of the present invention is described.
As shown in Figure 1, employed shaping die 10 was arranged in the vacuum vessel 11 when (surface treatment) handled in the renovation of present embodiment, and its forming face 12 is arranged in facing to ionic fluid and penetrates on the position of hole (not shown).
This shaping die 10 is made up of following two parts: on forming face 12 parts of the matrix 14 that is made of wolfram varbide (WC) with central axis 13, be the middle layer (mulch film) 15 of chromium (Cr) formation of 0.5 μ m by thickness; Also have, form on this middle layer 15, thickness is the upper layer (mulch film) 16 of the chromium nitride (CrN) of 0.2 μ m.
This shaping die 10 uses after 3000 times when the glass press forming, and it is bad that the surface of its forming face 12 just becomes.The shape of forming face 12 is that radius-of-curvature is 20mm, and external diameter is the convex shape of 9mm.
Here, the input angle d of ionic fluid is the angle of ionic fluid with respect to the central axis 13 of forming face 12.Also have, shaping die control angle γ is, the angle when being in parastate with the central axis 13 of the incident direction of ionic fluid and forming face 12 is 0 to spend the angle of inclination when departing from this state.Therefore, the input angle α of ionic fluid is exactly shaping die control angle γ.
Because ionic fluid penetrates the degree of convergence that the shape in hole can influence ionic fluid, therefore to be shaped so that in advance that ionic fluid can shine the shape on the forming face 12 that is etched equably.
Here, the gas that is used for ionic fluid is Ar.If use N
2Or other rare gas elementes, because its active height and price height are all inapplicable.
Below, the surface treatment embodiment according to the shaping die surface treatment method of present embodiment is described.
At first, as shown in Figure 4, except the ionic fluid input angle, identical illuminate condition when adopting with surface treatment, respectively to constituting WC, Cr and the CrN of matrix 14, middle layer 15 and upper layer 16, obtain the relation between the etching degree distribution of ionic fluid input angle α and forming face 12 inside.
In addition, the curve among Fig. 4 (1) expression WC, curve (2) expression Cr, curve (3) expression CrN.
Based on above-mentioned relation, as parameter,, calculate from the surperficial top of forming face 12 to the etching degree distribution of peripheral position direction according to Cr that constitutes forming face 12 and the thickness ratio of CrN with shaping die shown in Figure 5 control angle γ.Among Fig. 5, γ is decided to be (1) 0 degree shaping die control angle, (2) 10 degree, (3) 20 degree, (4) 30 degree, (5) 40 degree, (6) 50 degree.
Equally, also the same for basic material WC with Fig. 5,, calculate from the surperficial top of forming face 12 to the etching degree distribution of peripheral position direction as parameter with shaping die shown in Figure 6 control angle γ according to above-mentioned relation.Shaping die shown in Figure 6 control angle γ also get with Fig. 5 in value (1)-(6) same value.
Like this, just can obtain the shaping die control angle γ and the optimum combination condition in treatment time to processing needed etching depth.
Then, form the surface treatment of mould 10 with following ion beam irradiation operation.
At first, shaping die 10 being arranged to its shaping die control angle γ is 40 degree.And in order to remove the impurity in the vacuum vessel 11 as far as possible, promptly materials such as gas, water, oxygen and nitrogen need be reduced to the pressure in the container less than 1.3 * 10
-4Pa is to reduce pressure 4.0 * 10 in the present embodiment
-5Pa.Then,, penetrate the hole to forming face 12 irradiations 20 minutes from ionic fluid, remove upper layer 16 and middle layer 15, the surface of matrix 14 is exposed with etching processing with Ar gas ionic fluid according to Fig. 5 and Fig. 6.
At this moment, being applied to the acceleration voltage on the ionic fluid and the pressure of Ar gas, is the parameter that relation determined by the later surfaceness of economy and etching, preferably respectively from 400V to 1kv, and from 6.7 * 10
-3Pa to 6.7 * 10
-2Select in the scope of Pa.Therefore, in the present embodiment, acceleration voltage is 600V, and gaseous tension is 2.0 * 10
-2Pa.In addition, acceleration electric current at this moment is 120mA, and decelerating voltage is-200V.
Then, the shaping die of shaping die 10 control angle γ gets 5 degree, and the ionic fluid with Ar gas penetrates the hole to forming face 12 irradiations 8 minutes from ionic fluid again, carries out etching processing.
At this moment, the result who measures forming face 12 surface shapes after treatment shows, compares with the surface shape before the membrane removal, and PV (peak) value that surface shape changes is lower than 0.1 μ m.
Then, transfer to the renovation operation of the new mulch film of on forming face 12 formation, on forming face, form the film of middle layer 15 and upper layer 16, so as to constitute with membrane removal before with the film of spline structure, the shaping die 10 that has obtained to renovate.
Use the shaping die 10 after the renovation as stated above, when carrying out the glass press forming, phenomenon such as can not occur peeling off on the forming face, process well, have the optical glass device (optical element) of high-precision surface but also can form.
According to the surface treatment method of this shaping die, can under the state that the surface shape that prevents forming face 12 as far as possible changes, remove the middle layer 15 and the upper layer 16 that on forming face 12, form.And, film forming once more the time, can directly enter the renovation operation and carry out film forming on the forming face 12 after membrane removal without grinding step, thus can be at short notice, with very high precision renovation shaping die.
In addition, by with this shaping die press forming, the optical glass device that can obtain having high optical accuracy.
Secondly, with reference to same Fig. 1 of the 1st embodiment, the 2nd embodiment of the present invention is described.In addition, in the following description, the integrant that has illustrated in the above-described embodiments is marked with same label, and omits its explanation.
The difference of the 2nd embodiment and above-mentioned the 1st embodiment is, in the 1st embodiment, be that the forming face 12 of surface shape and design load equal state is implemented surface treatment, and in the 2nd embodiment, then be after the further change of shaping die is bad, the forming face 21 that surface shape is compared with design load on the shaping die 20 that has taken place to change is implemented surface treatments.
That is, be not only the mulch film of forming face, and, all will form by etching processing to comprising the matrix below the mulch film.
It is 20mm that the forming face 21 of this shaping die 20 has radius-of-curvature, and external diameter is the convex surface of 9mm, and the surface shape of forming face 21 is compared with design load, and the shape of the protrusion from peripheral position to surperficial top orientation approximately exceeds 0.2 μ m.
Below, the concrete instance that the surface treatment method of the shaping die that uses present embodiment is handled the surface is described.
Because it is identical with the 1st embodiment to constitute the material of shaping die 20, so use the etching degree distribution shown in Fig. 5 and Fig. 6.
Then, the same with the 1st embodiment, shaping die 20 is arranged in the vacuum vessel 11.At this moment shaping die control angle γ is 50 degree.
Then, the same with the 1st embodiment, make vacuum vessel 11 keep vacuum state, and the ionic fluid of the Ar gas of use and the 1st embodiment equal state, penetrate the hole by ionic fluid and be radiated on the forming face 21, carry out etching processing, irradiation time is 20 minutes.
To measuring through the surface shape of the forming face 21 after handling like this, the result shows, and the PV value of the variable quantity between the surface shape of design load is less than 0.1 μ m.
Then, transfer to the new middle layer 15 of on forming face 21 formation and the renovation operation of upper layer 16, renovation shaping die 20 forms and the membrane removal identical film of membrane structure before thereon.
Use the shaping die 20 of above-mentioned renovation to carry out the glass press forming, the result such as does not peel off at problem, and it is all right to be shaped.
According to the surface treatment method of this shaping die, can revise the forming face 21 of shaping die 20 by the surface shape of design load, can also remove the middle layer 15 and the upper layer 16 that on forming face 21, form simultaneously.Also have, in the film forming again process, need not just can enter the renovation operation through grinding step and carry out film forming, and can obtain the shaping die of high-precision renovation at short notice on the forming face 21 after membrane removal.
In addition, the same with the 1st embodiment, by means of the press forming of this shaping die, can obtain to have the optical glass device of high optical accuracy.
In addition, technical scope of the present invention is not limited to the foregoing description, in the scope that does not exceed aim of the present invention, can also carry out various variations.
That is, in the above-described embodiments,, change shaping die control angle γ, but shining number of times is not limited to twice in the 1st stage of carrying out ion beam irradiation or the 2nd stage.
In addition, the material in the middle layer of shaping die is that thickness is the Cr of 0.5 μ m, the material of the upper layer of shaping die is that thickness is the CrN of 0.2 μ m, but, when if material and thickness can carry out etching with the ion cutting system, then ionic fluid input angle by obtaining various materials in advance and the relation between the etching degree distribution just can obtain identical effect and effect according to this relation.
And, not only become bad shaping die, and, can use the same method and carry out shape corrections processing for the shaping shaping die before and the matrix of the mould before the film forming for those surfaces in forming process.
Claims (7)
1, a kind of surface treatment method of shaping die, the surface treatment method of this shaping die has ion beam irradiation is being had at least on the forming face of curved surface, forming face is carried out the ion beam irradiation operation of etching processing, it is characterized in that, in above-mentioned ion beam irradiation operation, obtain the input angle of above-mentioned ionic fluid in advance with respect to above-mentioned forming face central axis, and and forming face on relation between the etching degree distribution, according to this relation, determine at least one in the irradiation time of above-mentioned input angle and above-mentioned ionic fluid then.
2, the surface treatment method of shaping die as claimed in claim 1 is characterized in that, in above-mentioned ion beam irradiation operation, changes above-mentioned input angle and above-mentioned irradiation time, repeatedly shines with above-mentioned ionic fluid.
3, the surface treatment method of shaping die as claimed in claim 1 or 2, it is characterized in that, in above-mentioned ion beam irradiation operation, under the situation of determined above-mentioned input angle and irradiation time, above-mentioned ionic fluid makes the variation minimum of above-mentioned forming face shape behind pre-irradiation.
4, the surface treatment method of shaping die as claimed in claim 1 or 2, it is characterized in that, in above-mentioned ion beam irradiation operation, have the above-mentioned forming face of mulch film with above-mentioned ion beam irradiation, and at least one side in the material of the matrix below above-mentioned mulch film and the above-mentioned mulch film is carried out etching processing;
After above-mentioned operation, also has the renovation operation that on above-mentioned forming face, forms new mulch film.
5, the surface treatment method of formed film as claimed in claim 4, it is characterized in that, in above-mentioned ion beam irradiation operation, above-mentioned relation according to the composition and at least one item in the basic material below the above-mentioned mulch film of above-mentioned mulch film are obtained determines above-mentioned input angle and above-mentioned irradiation time.
6, a kind of shaping die is characterized in that, by means of the surface treatment method of the described shaping die of claim 1, forms the surface treatment of face.
7, a kind of optical element is characterized in that, it uses the described shaping die of claim 6 to form.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP016152/2003 | 2003-01-24 | ||
| JP2003016152A JP2004224657A (en) | 2003-01-24 | 2003-01-24 | Surface treatment method of shaping die, and shaping die |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1524812A CN1524812A (en) | 2004-09-01 |
| CN1321080C true CN1321080C (en) | 2007-06-13 |
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| CNB2004100033637A Expired - Lifetime CN1321080C (en) | 2003-01-24 | 2004-01-21 | Surface treatment method of forming die, the forming die and optical elements |
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| JP (1) | JP2004224657A (en) |
| CN (1) | CN1321080C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104136384A (en) * | 2012-03-05 | 2014-11-05 | Hoya株式会社 | Glass material for press molding, glass optical element, and their manufacturing method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101848872B (en) * | 2007-11-09 | 2013-06-05 | 柯尼卡美能达精密光学株式会社 | Method for producing lower mold, method for producing lower mold, glass gob, and method for producing glass molding |
| US8541792B2 (en) * | 2010-10-15 | 2013-09-24 | Guardian Industries Corp. | Method of treating the surface of a soda lime silica glass substrate, surface-treated glass substrate, and device incorporating the same |
| KR101256221B1 (en) | 2010-12-30 | 2013-04-19 | 한국원자력연구원 | Polishing method of metal material surface by ion beam |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0532424A (en) * | 1990-09-21 | 1993-02-09 | Olympus Optical Co Ltd | Method for regeneration forming mold |
| JPH0558654A (en) * | 1991-09-05 | 1993-03-09 | Nissin Electric Co Ltd | Mold for press forming optical glass element and its production |
| JPH05178629A (en) * | 1991-12-27 | 1993-07-20 | Kyocera Corp | Glass optical element molding die and its manufacturing method |
| US5662999A (en) * | 1993-11-15 | 1997-09-02 | Canon Kabushiki Kaisha | Mold and method of manufacturing the same |
| JP2001122630A (en) * | 1999-10-26 | 2001-05-08 | Canon Inc | Optical element molding die and method of reproducing the same |
| JP2001130918A (en) * | 1999-11-01 | 2001-05-15 | Canon Inc | Reproduction method of optical element molding die |
-
2003
- 2003-01-24 JP JP2003016152A patent/JP2004224657A/en active Pending
-
2004
- 2004-01-21 CN CNB2004100033637A patent/CN1321080C/en not_active Expired - Lifetime
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0532424A (en) * | 1990-09-21 | 1993-02-09 | Olympus Optical Co Ltd | Method for regeneration forming mold |
| JPH0558654A (en) * | 1991-09-05 | 1993-03-09 | Nissin Electric Co Ltd | Mold for press forming optical glass element and its production |
| JPH05178629A (en) * | 1991-12-27 | 1993-07-20 | Kyocera Corp | Glass optical element molding die and its manufacturing method |
| US5662999A (en) * | 1993-11-15 | 1997-09-02 | Canon Kabushiki Kaisha | Mold and method of manufacturing the same |
| JP2001122630A (en) * | 1999-10-26 | 2001-05-08 | Canon Inc | Optical element molding die and method of reproducing the same |
| JP2001130918A (en) * | 1999-11-01 | 2001-05-15 | Canon Inc | Reproduction method of optical element molding die |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104136384A (en) * | 2012-03-05 | 2014-11-05 | Hoya株式会社 | Glass material for press molding, glass optical element, and their manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1524812A (en) | 2004-09-01 |
| JP2004224657A (en) | 2004-08-12 |
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