CN1315058A - 压电执行元件 - Google Patents
压电执行元件 Download PDFInfo
- Publication number
- CN1315058A CN1315058A CN00801151A CN00801151A CN1315058A CN 1315058 A CN1315058 A CN 1315058A CN 00801151 A CN00801151 A CN 00801151A CN 00801151 A CN00801151 A CN 00801151A CN 1315058 A CN1315058 A CN 1315058A
- Authority
- CN
- China
- Prior art keywords
- neutral phase
- piezoelectric actuator
- region
- electrodes
- piezoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/871—Single-layered electrodes of multilayer piezoelectric or electrostrictive devices, e.g. internal electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
- H10N30/508—Piezoelectric or electrostrictive devices having a stacked or multilayer structure adapted for alleviating internal stress, e.g. cracking control layers
Landscapes
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Measuring Fluid Pressure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19928177.7 | 1999-06-19 | ||
| DE19928177A DE19928177C2 (de) | 1999-06-19 | 1999-06-19 | Piezoaktor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1315058A true CN1315058A (zh) | 2001-09-26 |
Family
ID=7911880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN00801151A Pending CN1315058A (zh) | 1999-06-19 | 2000-06-19 | 压电执行元件 |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1110254A1 (fr) |
| JP (1) | JP2003522510A (fr) |
| KR (1) | KR20010072697A (fr) |
| CN (1) | CN1315058A (fr) |
| DE (1) | DE19928177C2 (fr) |
| HU (1) | HUP0103374A3 (fr) |
| WO (1) | WO2000079615A1 (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100479217C (zh) * | 2003-10-01 | 2009-04-15 | 罗伯特·博世有限公司 | 压电执行元件 |
| CN1774822B (zh) * | 2004-06-29 | 2010-05-05 | 西门子公司 | 具有额定裂纹位置的压电结构件、其制造方法和应用 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10201641A1 (de) | 2002-01-17 | 2003-08-07 | Epcos Ag | Piezoelektrisches Bauelement und Verfahren zu dessen Herstellung |
| DE10207292B4 (de) * | 2002-02-21 | 2005-08-11 | Siemens Ag | Piezostack und Verfahren zur Herstellung eines Piezostacks |
| DE102005008717A1 (de) | 2005-02-25 | 2006-08-31 | Robert Bosch Gmbh | Aktormodul mit einem Piezoaktor |
| DE102007060167A1 (de) | 2007-12-13 | 2009-06-25 | Robert Bosch Gmbh | Piezoaktor mit einem Multilagenaufbau von Piezoelementen und ein Verfahren zu dessen Herstellung |
| DE102009058907B4 (de) | 2009-12-17 | 2012-12-13 | Eads Deutschland Gmbh | Piezoaktor und Verfahren zum Betreiben eines Piezoaktors, insbesondere in mobilen technischen Einrichtungen |
| DE102011014296A1 (de) * | 2011-03-17 | 2012-09-20 | Epcos Ag | Piezoelektrisches Aktorbauelement und Verfahren zur Herstellung eines piezoelektrischen Aktorbauelements |
| KR101471185B1 (ko) * | 2013-04-11 | 2014-12-11 | 한국기계연구원 | 자가 정렬 임프린트 리소그래피 장치 및 이를 이용한 임프린트 리소그래피 방법 |
| KR102547025B1 (ko) | 2022-05-09 | 2023-06-26 | 박대용 | 하수관거 비굴착 부분보수 장치 및 공법 |
| KR102495695B1 (ko) | 2022-05-09 | 2023-02-06 | 박대용 | 하수관거 비굴착 부분보수 및 모니터링 시스템 |
| KR102634118B1 (ko) | 2022-12-29 | 2024-02-06 | 삼아건설 주식회사 | 하수관거 비굴착 부분보수 장치 및 공법 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04214686A (ja) * | 1990-10-05 | 1992-08-05 | Nec Corp | 電歪効果素子 |
| JPH04159785A (ja) * | 1990-10-23 | 1992-06-02 | Nec Corp | 電歪効果素子 |
| JP2940376B2 (ja) * | 1993-12-24 | 1999-08-25 | 日立プラント建設株式会社 | 積層形圧電アクチュエータ |
| JPH08274381A (ja) * | 1995-03-31 | 1996-10-18 | Chichibu Onoda Cement Corp | 積層型圧電アクチュエータ及びその製造方法 |
-
1999
- 1999-06-19 DE DE19928177A patent/DE19928177C2/de not_active Expired - Fee Related
-
2000
- 2000-06-19 EP EP00951223A patent/EP1110254A1/fr not_active Withdrawn
- 2000-06-19 JP JP2001505080A patent/JP2003522510A/ja active Pending
- 2000-06-19 CN CN00801151A patent/CN1315058A/zh active Pending
- 2000-06-19 HU HU0103374A patent/HUP0103374A3/hu unknown
- 2000-06-19 WO PCT/DE2000/001929 patent/WO2000079615A1/fr not_active Ceased
- 2000-06-19 KR KR1020017001996A patent/KR20010072697A/ko not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100479217C (zh) * | 2003-10-01 | 2009-04-15 | 罗伯特·博世有限公司 | 压电执行元件 |
| CN1774822B (zh) * | 2004-06-29 | 2010-05-05 | 西门子公司 | 具有额定裂纹位置的压电结构件、其制造方法和应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE19928177C2 (de) | 2001-04-26 |
| WO2000079615A1 (fr) | 2000-12-28 |
| EP1110254A1 (fr) | 2001-06-27 |
| HUP0103374A3 (en) | 2002-03-28 |
| DE19928177A1 (de) | 2001-01-11 |
| JP2003522510A (ja) | 2003-07-22 |
| HUP0103374A2 (hu) | 2002-01-28 |
| KR20010072697A (ko) | 2001-07-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |