CN1312317C - Vacuum ionic film coater with gas ionic source arrangement - Google Patents

Abstract

The invention relates to a vacuum ion coating machine configured with a gas ion source, belonging to the technical field of vacuum ion coating. The coating machine includes at least one vacuum chamber, a set of conductive workpiece turret, a gas ion source, and a DC or pulsed DC power supply; the power supply establishes negative bias for the conductive workpiece turret through three sets of switches. and drive the gas ion source; the first and second groups are composed of two switches that are opened and closed at the same time, and must not be opened and closed at the same time; the positive pole of the power supply is connected to the anode of the gas ion source through a switch of the first group. The positive pole of the power supply is connected with the vacuum chamber wall through a switch of the second group at the same time; the negative pole of the power supply is connected with the conductive workpiece turret through another switch of the first group and another switch of the second group at the same time; the conductive workpiece turret and The walls of the vacuum chamber are respectively connected to the two ends of the third group of switches. The invention can give full play to the functions of the gas ion source and the power supply, and reduce equipment configuration costs.

Description

A vacuum ion coating machine equipped with a gas ion source

technical field

The invention belongs to the technical field of vacuum ion coating, in particular to the improvement of a vacuum ion coating machine equipped with a gas ion source.

Background technique

In the application and development of vacuum ion coating technology, gas ion source has received more and more attention and attention. Due to the directionality of the gas ion source, high-density gas ions (plasma) are generated in its active area, which can be applied to the following aspects: (a) when the gas ion source is passed into an inert gas (such as argon), High-intensity gas ion bombardment cleaning can be performed on the surface of the workpiece. The cleaning process is concentrated in a local area of action, and the energy density is much higher than that of ordinary argon ion glow bombardment; compared with cathodic arc metal ion bombardment, there is no side effect of contamination caused by metal particles coating the surface of the workpiece. (b) When the gas ion source is fed into carbon-containing organic gas, the gas ion plating can be performed alone to form a diamond-like carbon (DLC) film layer, or combined with other metal evaporation sources such as magnetron sputtering sources to plate a metal-doped DLC film layer. (c) When the gas ion source is fed with reactive gas (such as oxygen or nitrogen), the gas ion bombardment reaction treatment (such as oxidation or nitriding process) on the surface of the workpiece can be carried out. (d) When the gas ion source is fed with reactive gas (such as oxygen or nitrogen) and works together with other metal evaporation sources such as magnetron sputtering sources, gas ion source enhanced (assisted) reactive ion coating can be performed.

At present, the vacuum ion coating machine of conventional configuration gas ion source mainly includes: vacuum chamber 1 and the conductive workpiece (turn) frame 2 arranged therein, gas ion source 3, and the DC power supply 4 for driving the gas ion source 3 and the conductive workpiece ( Turn) rack 2 to establish a negative bias DC power supply 7. The electromechanical connection method of vacuum ion coating with conventional configuration of gas ion source is shown in Figure 1. Among the figure, the conductive workpiece (turning) frame 2 is connected to the negative pole of the bias DC power supply 7, and the wall of the vacuum chamber 1 is connected to the positive pole of the power supply 7; The cathode of the source 3 is shorted on the wall of the vacuum chamber 1 .

When the DC power supply 4 drives the gas ion source 3 to discharge, the DC power supply 7 simultaneously establishes a negative bias voltage on the conductive workpiece (revolving) frame 2, and the two power supplies work independently of each other. When arc ignition occurs on the surface of the workpiece, the workpiece bias power supply 7 will immediately start the arc extinguishing action (instantly cut off the power supply); while the gas ion source power supply is difficult to monitor the ignition phenomenon, and often cannot operate synchronously, and continues to output gas ions , so that the arc ignition on the workpiece can be maintained, and the surface of the workpiece is burned. Therefore, the conventional method of using two independent power supplies at the same time has the technical problem that the workpiece to be plated is easily ignited by an electric arc.

Contents of the invention

The purpose of the present invention is to transform the existing vacuum ion coating machine equipped with gas ion source, overcome the deficiencies of the prior art, give full play to the functions of gas ion source and power supply, and reduce the cost of equipment configuration.

A vacuum ion coating machine configured with a gas ion source proposed by the present invention includes at least one vacuum chamber, a set of conductive workpiece (revolving) frame and a gas ion source, and a DC power supply or a pulse DC power supply; it is characterized in that, said one power supply establishes negative bias voltage and drives said one gas ion source respectively for said set of conductive workpiece (revolving) frame through three sets of switches; among these three sets of switches The first and second groups are composed of two switches that are opened and closed at the same time, and the switches of the first and second groups cannot be opened and closed at the same time, and the third group of switches is a switch; the electrical connection relationship of the vacuum ion coating machine is: The positive pole of the power supply is connected with the anode of the gas ion source through the first switch of the first group, and the positive pole of the power supply is connected with the vacuum chamber wall through the second switch of the second group at the same time; The second switch of the first group and the first switch of the second group are connected to the conductive workpiece (rotary) frame; the conductive workpiece (rotary) frame and the vacuum chamber wall are respectively connected to the two ends of the third group of switches.

The conductive workpiece (transfer) frame and the vacuum chamber can be electrically insulated from each other.

In the above structure, there is at least one air inlet leading from the vacuum chamber to the inside of the gas ion source; on the gas ion source, there is at least one gas outlet for distributing gas to the vacuum chamber; when the ion source discharges, at least one There is at least one electrically-connectable cathode, which is electrically insulated from the vacuum chamber; at least one electrically-connectable anode is connected to the vacuum chamber, and the anode is electrically insulated from the vacuum chamber.

The above-mentioned DC power supply has at least one output positive pole; at least one output negative pole; it can be turned on and off; and it can output voltage, current or power between its output positive and negative poles.

The above-mentioned pulsed DC power supply is based on the output of the DC power supply, superimposing a reverse unipolar pulse train, and the frequency of the reverse pulse can be adjusted within the range of 5-150kHz or within the frequency range; the reverse pulse The peak voltage is selected between 105%-150% of the forward DC voltage or can be adjusted within the voltage range, and the pulse width of the reverse pulse is up to 90% of the pulse cycle time or within 0%-90% of the pulse width. Can be adjusted in a wide range.

Features and effects of the present invention:

(a) Adopt the gas ion source of electrical connection method of the present invention, direct current power supply or pulsed direct current power supply output power are directly applied between the anode of gas ion source and the workpiece to be plated on the conductive workpiece (turn) frame. The power supply can start the arc extinguishing action in a timely and effective manner, which can not only avoid arc ignition damage on the workpiece, but also prevent metal sputtering of the target body of the gas ion source and pollute the coating process. It completely solves the arc extinguishing failure problem that is easy to occur in the conventional usage of the gas ion source.

(b) The gas ions flying out from the gas ion source are attracted by the negative voltage on the plated workpiece of the conductive workpiece (revolving) frame, and directly obtain kinetic energy from the electric field of the plated workpiece, similar to the glow argon under the bias voltage of the workpiece ion bombardment process. The advantage is that the active area of the gas ion source is local, and the discharge power is generally much larger than that of the argon ion glow bombardment. Therefore, the gas ion bombardment cleaning effect of the gas ion source is stronger and more effective.

(c) The negative electrode of the gas ion source of the present invention is electrically insulated from the wall of the vacuum chamber, and its negative electrode is in the suspension potential when the gas ion source discharges, and changes accordingly with the discharge working state and the vacuum chamber environment, but the potential between the negative electrode and the anode The difference must be less than the operating voltage applied by the power supply 4 . The small potential difference between the cathode and anode of the gas ion source reduces the possibility of arc discharge between the cathode and anode, and reduces the energy of ignition, thereby reducing or avoiding the possibility of sputtering the metal target of the gas ion source.

(d) When the DC power supply of the present invention is used for the work of the gas ion source, a negative bias voltage should not be applied on the conductive workpiece (turn) frame; A negative bias voltage is established on the plated workpiece of the rack. Thus, one power supply does both without any inconvenience or limitation. Therefore, a vacuum ion coating machine equipped with a gas ion source can save a DC power supply or a pulsed DC power supply and reduce equipment costs.

Description of drawings

FIG. 1 is a schematic diagram of the structure and electrical connection of an existing vacuum ion coating machine equipped with a gas ion source.

Fig. 2 is a schematic diagram of the structure and electrical connection of the vacuum ion coating machine equipped with gas ion source according to the present invention.

FIG. 3 is a schematic diagram of the structure and electrical connection of Embodiment 1 of the present invention.

Fig. 4 is a control circuit diagram of Embodiment 1 of the present invention.

Fig. 5 is a schematic diagram of the structure and electrical connection of Embodiment 2 and Embodiment 3 of the present invention.

FIG. 6 is a schematic diagram of the structure and electrical connection of Embodiment 4 of the present invention.

FIG. 7 is a schematic diagram of the structure and electrical connection of Embodiment 5 of the present invention.

Detailed ways

The vacuum ion coating machine of the configuration gas ion source proposed by the present invention is further described as follows in conjunction with the accompanying drawings and embodiments:

The vacuum ion coating machine configured with the gas ion source proposed by the present invention is shown in FIG. 2 . The parts shown in 1, 2, 3, and 4 in Fig. 2 are the same as those in Fig. 1, the difference is:

(a) Only one DC power supply or one pulse DC power supply 4 is reserved, and the power supply 7 in Fig. 1 is no longer needed;

(b) Three sets of switches are added: 71, 72, 81, 82 and 9. 71 and 72 are a double-pole single-throw switch, and the two poles are opened and closed at the same time; it can also be two sets of independent contacts of a contactor. 81 and 82 are the same as 71 and 72. 9 is a single pole single throw switch, or a group of contacts of a contactor. Switches 71 and 72 and switches 81 and 82 cannot be started and closed at the same time, and hardware logic should be established to lock them mutually to ensure safety. Its electrical connection relationship is: the positive pole of the power supply 4 is connected with the anode of the gas ion source 3 through the switch 71, and the positive pole of the power supply 4 is also connected with the vacuum chamber wall through the switch 82 at the same time; The workpiece (turn) frame 2 is connected; the two ends of the switch 9 are connected to the conductive workpiece (turn) frame 2 and the wall of the vacuum chamber 1 respectively.

The working process of the power supply of the present invention is: when 71 and 72 are closed, and 81 and 82 are disconnected, the positive pole of power supply 4 is connected on the anode of gas ion source 3, and the negative pole of power supply 4 is connected on the conductive workpiece (turning) frame 2. At this time, the DC power supply 4 drives the gas ion source 3 to produce gas ions, and these gas ions are attracted by the electric field established by the DC power supply 4 on the conductive workpiece (turn) frame 2, and accelerate the bombardment to the workpiece to be plated. Used as a gas ion source power supply;

When 81 and 82 are closed, and 71 and 72 are disconnected, the positive pole of DC power supply 4 is connected on the wall of vacuum chamber 1, and the negative pole of DC power supply 4 is connected on the workpiece (turn) frame 2. At this time, the DC power supply 4 is used to establish a negative bias voltage on the conductive workpiece (rotary) frame 2 . Used as a workpiece bias power supply;

Switch 9 is specially used for short-circuiting or disconnecting vacuum chamber 1 wall and workpiece (turning) frame 2. Only when the DC power supply 4 drives the gas ion source 3 to work, the switch 9 can be closed and short-circuited, or not closed to open the circuit. Under any other circumstances, the switch 9 must be in an unclosed open circuit state. A logic circuit should also be established to interlock switch 9 and switches 7 and 8 to ensure safe use;

The cathode of the gas ion source is electrically insulated from the wall of the vacuum chamber 1 . When the gas ion source discharges, its cathode is in suspension potential.

The DC power supply described in the present invention can also be replaced by a pulsed DC power supply. The electrical wiring, control and use methods are exactly the same as those of the DC power supply.

The present invention is further described as follows again to specific composition structure and work process in conjunction with five embodiments:

Example 1:

The structure of the vacuum ion coating machine configured with a gas ion source in this embodiment is shown in FIG. 3 . The vacuum chamber 1 and the conductive workpiece (turret) frame 2 are the same as described in FIG. 2 . The wall of vacuum chamber 1 is well grounded (PE). The gas ion source 3 is the LISE574/102 anode laminar flow rectangular gas ion source produced by Beijing Tempur Surface Technology Co., Ltd. The DC power supply 4 selects a pinnacle 10kW DC inverter power supply from AE Company of the United States. The three switches 71, 72, 81, 82 and 9 in Fig. 2 are selected as three identical SC-N2 (35) type AC contactors of Japan FUJI Company, corresponding to KM1, KM2 and KM3, all electrical wiring methods and Figure 2 shows the same.

The control circuit of the coating electromechanical wiring in this embodiment is shown in FIG. 4 . Among them, KM1, KM2 and KM3 represent the pull-in magnet wire package of the AC contactor. KM1: 4, KM2: 4 and KM3: 4 are a pair of normally closed auxiliary control contacts on the AC contactor, which are used to lock KM1, KM3 and KM2 to ensure safe use. ZJ1 is a MY4NJ type intermediate relay of Japanese Omron Company, and a group of its normally open and normally closed contacts are shown in Figure 4. The control circuit needs 220vAC single-phase alternating current (L1 is a phase line, N is a neutral line) to drive the AC contactors KM1, KM2 and KM3 to pull in or disconnect. The intermediate relay ZJ1 can control two working states by using a lock button on the control panel to drive the wire pack of the intermediate relay with 24vDC: (1) When ZJ1 is in the closed (released) state, the DC power supply 4 is connected to the conductive workpiece On the wall of the (revolving) frame 2 and the vacuum chamber 1, a negative bias voltage is established for the plated workpiece on the conductive workpiece (revolving) frame 2; On the ion source 3 and the workpiece (rotary) frame 2, the gas ion source 3 is driven to discharge.

The gas ion source 3 gathers the magnetic field generated by the permanent magnet 13 at the gap of the gas outlet 6 through the magnetically permeable metal target (i.e., the cathode) 15 to form a transverse magnetic field 12; An electric field 11 that is approximately vertical to the target surface of the ion source is established near the gap; the discharge of the gas ion source 3 also needs to continuously feed the working gas into the air inlet 5, and the working gas is controlled by the 3-way mass flow controller respectively. enter.

When the gas ion source 3 is in normal discharge operation, under the action of the magnetic field and electric field at the gap of the gas outlet 6, the electrons will be bound near the anode surface, and a large number of electrons will move quickly in parallel on the runway on the anode surface (anode laminar flow), ionization Neutral gas particles form a high-density plasma region. Under the action of the vertical electric field 11, the gas ions in the plasma are accelerated and fly outward through the gas outlet 6 on the target surface, increasing kinetic energy and forming a gas ion beam. The average kinetic energy of gas particles is determined by (a) the operating voltage of the gas ion source; (b) the vacuum degree of the vacuum chamber; (c) the gas intake volume; (d) the spatial position of the gas ions.

Sometimes the number of workpieces to be plated on the conductive workpiece (rotary) frame 2 in the vacuum chamber 1 is small, and during the rotation or movement of the workpiece, the number of workpieces in the gas ion source action area is often small, which is not conducive to the stable discharge of the gas ion source 3. To this end, the conductive workpiece (rotary) frame 2 is closed and short-circuited on the vacuum chamber 1 through KM3. When there are workpieces to be plated in the active area of the gas ion source, the ionized gas from the ion source 3 will mainly bombard these workpieces; when there are no workpieces to be plated in the active area, the gas ion source 3 will form a discharge through the wall of the vacuum chamber 1 loop to ensure stable discharge of the gas ion source 3 . Due to the use of a single DC power supply 4, no matter the arc ignition is generated on the gas ion source 3 or on the workpiece to be plated, the power supply can promptly and effectively start the arc extinguishing action, which can avoid damage to the workpiece and the target body of the gas ion source. Metal sputtering.

Since the cathode 15 of the gas ion source 3 is electrically suspended, the potential difference between the cathode and the anode of the gas ion source will vary with the working state of the ion source and the environment of the vacuum chamber, but it must be smaller than the workpiece voltage of the gas ion source 3 . Generally between 80 and 200v. The relatively small potential difference reduces the possibility of arc discharge between the cathode and anode of the gas ion source 3, and reduces the energy of ignition, thereby reducing or avoiding the sputtering of the metal target of the gas ion source.

When the gas ion source 3 works alone, the working voltage is mainly affected by the intake air volume of the ion source and the vacuum degree of the environment. The larger the intake air volume, the lower the vacuum degree, which is more conducive to the stable discharge of the gas ion source 3. Generally, the voltage tends to decrease and the current increases. When other conditions remain unchanged, the discharge current of the gas ion source 3 increases, and the voltage increases accordingly. If the discharge voltage is too high, it will lead to increased arc ignition and decreased working stability. Since the gas ion source 3 adopts the electrical connection method of the suspended cathode, the working voltage and the upper limit of the current are obviously improved compared with the conventional method.

Example 2:

The structure and working process of the vacuum ion coating machine equipped with a gas ion source in this embodiment are shown in FIG. 5 . Compared with the vacuum ion coating machine with gas ion source configuration shown in Figure 3, only a pair of LMI443/69 rectangular magnetron sputtering sources 18 and 19 produced by Beijing Tempor Surface Technology Co., Ltd. and American AE Company PEII 10kW intermediate frequency power supply 17. The two output electrodes of the intermediate frequency power supply 17 are respectively connected to the cathode electrodes of the magnetron sputtering sources 18 and 19 for driving a pair (two) of the magnetron sputtering sources 18 and 19 .

When the gas ion source 3 works alone, a positive voltage of several hundred volts (550-750v) is applied to the anode, and the plasma generated by the gas ion source 3 has a high positive potential; the plasma generated when the magnetron sputtering sources 18 and 19 work independently body presents a low positive potential. When the gas ion source 3 and the magnetron sputtering sources 18 and 19 were working simultaneously, the plasmas of the two sources were mixed (coupled), and the two plasma potentials were pulled closer to each other, thereby reducing the positive operating voltage of the gas ion source 3 accordingly And the alternating average working voltage of the magnetron sputtering sources 18 and 19. The extent to which the respective voltages are reduced depends on the relative magnitudes of the operating power (current) of the two sources. The discharge power of the ion source is relatively larger, the working positive voltage of the ion source decreases less, and the voltage of the magnetron source decreases more, and vice versa.

Using this vacuum coating machine for reactive ion coating, when the action area of gas ion source 3 and the coating area of magnetron sputtering sources 18 and 19 converge, it is called converging gas ion source enhanced magnetron sputtering reactive ion coating, referred to as Converging gas ion sputtering reactive ion coating technology; when the action area of the gas ion source 3 and the coating area of the magnetron sputtering sources 18 and 19 are separated in space, it is called spatially separated gas ion source enhanced magnetron sputtering reaction Ion coating, referred to as air separation and gas separation sputtering reactive ion coating technology. This technology has achieved good results in the application of high-quality titanium nitride (TiN) film coating. The working power ratio of gas ion source and magnetron sputtering to target is about 1:9. Since the positive voltage on the ion source is directly applied to the workpiece to be plated, the voltage directly affects the final quality of the reactive ion coating.

After the LMI443/69 rectangular magnetron sputtering source configured in this embodiment is increased to 2 or more sets, the PEII 10kW intermediate frequency power supply also needs to be increased by 1 or more sets accordingly. In this way, the coating speed of the vacuum ion coating machine can be improved, and the application requirements of multi-layer (nano) coating can also be realized.

Example 3:

The only difference between the vacuum ion coating machine configured with the gas ion source in this embodiment and Embodiment 2 is that the original DC power supply 4 is replaced by a pinnacle plus+10kW pulsed DC inverter power supply from AE Company of the United States. For the pulsed DC power supply applied on the gas ion source 3, its pulse frequency is set as 100kHz, and the pulse width is set as 2 microseconds, that is, the DC output duty cycle is 80%, which can completely suppress the arc ignition fast enough Produced, bringing the following more benefits to the entire vacuum ion coating machine:

1) Due to the plasma oscillation caused by the periodic pulse, the start-up threshold voltage of the gas ion source is reduced, and the operating voltage is correspondingly reduced (50 to 100v). It is beneficial to improve discharge stability, improve working current and gas ionization efficiency.

2) Due to the periodic "off" of the operating voltage, the arc discharge on the plated workpiece on the gas ion source 3 and the conductive workpiece (revolving) frame 2 is more effectively suppressed, which not only solves the problem of metal splashing on the gas ion source 3 The problem of radiation (pollution) is avoided, and the surface of the plated workpiece is also prevented from being damaged by ignition. At the same time, because the power supply almost starts the arc extinguishing action, the possibility of instantaneous change of the vacuum working condition is eliminated, so the vacuum ion coating process is more stable.

3) Plasma oscillations generated by periodic pulses also thin the plasma shell on the surface of the workpiece, making it easier for charged ions to enter the depth of the workpiece structure, thereby significantly improving the uniformity of the coating layer on the surface of the workpiece.

4) Since the pulsed DC power supply will generate a pulsed positive voltage, the workpiece to be plated will periodically attract negative electrons to neutralize the surface, thereby avoiding the problem of excessive accumulation of positive charges on the surface of the workpiece and causing the film to break down and spark. The repulsion of positive ions by the surface of the workpiece where positive charges are gathered is avoided. For the plating of dielectric films with poor conductivity, or insulating oxide films, and ion plating on insulating workpieces, the above-mentioned pulsed DC power supply characteristics have been proved to play a key role.

Example 4:

The structure and electrical wiring of the vacuum ion coating machine equipped with a gas ion source in this embodiment are shown in FIG. 6 . Compared with Embodiment 1, this embodiment only changes the gas ion source 3 into a Hall gas ion source 22 with an auxiliary filament 21, and a DC power supply 4 is used as the main power source of the gas ion source. The electrical connection method and implementation Example 1 is the same. A filament electrode of the gas ion source is connected to the cathode of the gas ion source 22 , and is insulated and passed out of the vacuum chamber 1 together. The output of an additional filament power supply 23 is connected to the cathode of the gas ion source 22 (the electrode at one end of the filament) and the electrode at the other end of the filament. The potential of the filament will be suspended together with the potential of the cathode when the gas ion source 22 discharges.

The gas ion source 22 may also have an auxiliary grid, and the grid electrode of the gas ion source is insulated and leads out of the vacuum chamber. The output anode of an additional grid DC power supply is connected to the cathode of the gas ion source, and its cathode is connected to the grid electrode. It is used to pull out the gas ions generated by the gas ion source. At this time, the potential of the auxiliary grid will be suspended together with the potential of the cathode when the gas ion source 22 discharges.

Example 5:

The structure and electrical wiring of the vacuum ion coating machine equipped with a gas ion source in this embodiment are shown in FIG. 7 . Compared with Example 2, this example only replaces the LMI443/69 rectangular magnetron sputtering source configured in Example 2 with a set of RCAE1047 cathodic arc ionization source 25 and The CAE-150 inverter DC power supply 26 produced by Beijing Witton Company. The negative pole of the power supply is connected to the cathode of the cathode arc ionization source, and the positive pole is connected to the wall of the vacuum chamber 1 . On a vacuum ion coating machine equipped with a gas ion source, usually more than one cathode arc source and driving power supply are configured, and the above-mentioned magnetron sputtering source and power supply can also be prepared at the same time. It can also be replaced with various ion evaporation sources such as hollow cathode gun crucible evaporation source, electron gun crucible evaporation source or hot arc crucible evaporation source, as well as the corresponding driving power supply. The purpose is to give full play to the advantages of each metal evaporation source, complement each other's advantages, and exert the best vacuum ion coating effect.

Claims (5)

1, a kind of vaccum ion coater that disposes gas ion source comprises a vacuum chamber and a cover electrically conductive workpiece pivoted frame and gas ion source that is arranged on wherein at least, and a direct supply or a pulse dc power; It is characterized in that a described power supply is respectively a described cover electrically conductive workpiece pivoted frame by three groups of switches and sets up negative bias and drive a described gas ion source; First, second group in these three groups of switches is formed by two switches that open and close simultaneously, and the switch of first and second group must not open and close simultaneously, and the 3rd group of switch is a switch; The electrical connection of this vaccum ion coater is: the positive pole of described power supply first switch by first group links to each other with the anode of described gas ion source, and the positive pole of this power supply passes through second switch of second group simultaneously and links to each other with vacuum-chamber wall; The negative pole of this power supply second switch by first group simultaneously links to each other with the electrically conductive workpiece pivoted frame with first switch of second group; This electrically conductive workpiece pivoted frame and vacuum-chamber wall are connected on respectively on the two ends of the 3rd group of switch.

2, vaccum ion coater as claimed in claim 1 is characterized in that, described electrically conductive workpiece pivoted frame and vacuum chamber electrically insulated from one another.

3, vaccum ion coater as claimed in claim 1 is characterized in that, has an inlet mouth that is fed gas ion source inside by vacuum chamber outward at least; In the air outlet that has a gas distribution in vacuum chamber on the gas ion source at least; Need in ion source, to feed at least a gas during ion source discharge work; Have at least one can connect electric negative electrode, this electrode and vacuum chamber electrical isolation; Have at least one can connect electric anode and lead to outside the vacuum chamber this anode and vacuum chamber electrical isolation.

4, vaccum ion coater as claimed in claim 1 is characterized in that, described direct supply has an output cathode at least; Has an output negative pole at least; Output voltage, electric current or power between this output positive and negative electrode.

5, vaccum ion coater as claimed in claim 1, it is characterized in that, described pulse dc power is on the basis of described direct supply output, the reverse unipolar pulse string that superposes, and the frequency of this reverse impulse is adjusted in 5-150 kHz scope or in this range of frequency; The crest voltage of reverse impulse is selected between the 105%-150% of forward dc voltage or adjusts in this voltage range, the pulsewidth up PRT of reverse impulse 90% or in the pulsewidth scope of 0%-90%, adjust.

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