CN1305789C - Mould for forming optical elements and the optical elements - Google Patents
Mould for forming optical elements and the optical elements Download PDFInfo
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- CN1305789C CN1305789C CNB2004100033694A CN200410003369A CN1305789C CN 1305789 C CN1305789 C CN 1305789C CN B2004100033694 A CNB2004100033694 A CN B2004100033694A CN 200410003369 A CN200410003369 A CN 200410003369A CN 1305789 C CN1305789 C CN 1305789C
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- 230000003287 optical effect Effects 0.000 title claims description 77
- 239000000463 material Substances 0.000 claims abstract description 149
- 239000013078 crystal Substances 0.000 claims abstract description 62
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 30
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 20
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 11
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 10
- 239000000956 alloy Substances 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 8
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 239000010937 tungsten Substances 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 5
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 5
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims abstract description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 56
- 239000002184 metal Substances 0.000 claims description 56
- 239000011651 chromium Substances 0.000 claims description 51
- 150000004767 nitrides Chemical class 0.000 claims description 44
- 229910052804 chromium Inorganic materials 0.000 claims description 37
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 35
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 33
- 239000007769 metal material Substances 0.000 claims description 27
- 239000010936 titanium Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 25
- 229910052719 titanium Inorganic materials 0.000 claims description 24
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 22
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims description 8
- 239000011733 molybdenum Substances 0.000 claims description 8
- 238000007493 shaping process Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 239000004411 aluminium Substances 0.000 claims 2
- 238000007598 dipping method Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 137
- 239000002344 surface layer Substances 0.000 abstract description 111
- 238000000465 moulding Methods 0.000 abstract description 87
- 239000011521 glass Substances 0.000 abstract description 36
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 abstract description 10
- 239000000126 substance Substances 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 description 28
- 230000000052 comparative effect Effects 0.000 description 27
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 18
- 229910000566 Platinum-iridium alloy Inorganic materials 0.000 description 16
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 16
- 238000005507 spraying Methods 0.000 description 16
- 229910000510 noble metal Inorganic materials 0.000 description 13
- 230000003647 oxidation Effects 0.000 description 12
- 238000007254 oxidation reaction Methods 0.000 description 12
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 8
- 238000010884 ion-beam technique Methods 0.000 description 8
- 230000004927 fusion Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 230000003746 surface roughness Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 229910000691 Re alloy Inorganic materials 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- YEWLVPDHCCERJH-UHFFFAOYSA-N [Re].[Ir] Chemical compound [Re].[Ir] YEWLVPDHCCERJH-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000010970 precious metal Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- -1 for example Chemical compound 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009684 ion beam mixing Methods 0.000 description 1
- CJTCBBYSPFAVFL-UHFFFAOYSA-N iridium ruthenium Chemical compound [Ru].[Ir] CJTCBBYSPFAVFL-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- DBJYYRBULROVQT-UHFFFAOYSA-N platinum rhenium Chemical compound [Re].[Pt] DBJYYRBULROVQT-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/11—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
- C03B2215/17—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/31—Two or more distinct intermediate layers or zones
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/32—Intermediate layers, e.g. graded zone of base/top material of metallic or silicon material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
Description
技术领域technical field
本发明涉及用玻璃原料进行冲压成形来制造透镜、棱镜等光学元件的光学元件成形用的模具,以及由此而形成的光学元件。The present invention relates to an optical element molding die for producing optical elements such as lenses and prisms by press-molding glass raw materials, and the optical elements formed therefrom.
背景技术Background technique
近年来,作为这种用玻璃原料制造光学元件的方法,有使用成形模具的冲压成形法。用这种制造方法,由于不需要研磨加工,具有能简单而廉价地制造光学元件的优点。以往,一直在对这种用于冲压成形的光学元件成形用的模具进行种种研究,以使其在成形过程中与玻璃原料接触的成形面能保持表面的粗糙度,从而它能长时间地用于光学元件的成形。In recent years, as a method of manufacturing optical elements from such a glass raw material, there is a press molding method using a molding die. With this manufacturing method, there is an advantage that the optical element can be manufactured simply and inexpensively because grinding processing is not required. In the past, various researches have been carried out on this kind of mold for forming optical elements for stamping, so that the forming surface that contacts the glass raw material during the forming process can maintain the surface roughness, so that it can be used for a long time. in the shaping of optical components.
即,这种光学元件成形用的模具,具有模具母材,贵金属层和中间层。模具母材用铬、钛等金属材料作为粘接材料烧结而成的超硬合金和金属陶瓷制成;贵金属层在制造光学元件的过程中直接与玻璃原料接触;中间层在模具母材与贵金属层中间形成(例如,请参阅专利文献特公昭62-28093号公报)。That is, such a mold for molding an optical element has a mold base material, a noble metal layer, and an intermediate layer. The base material of the mold is made of superhard alloy and cermet which are sintered with chromium, titanium and other metal materials as bonding materials; the precious metal layer is in direct contact with the glass raw material in the process of manufacturing optical elements; the intermediate layer is formed between the base material of the mold and the precious metal Formed in the middle of the layer (for example, please refer to Japanese Patent Publication No. 62-28093).
贵金属层是用白金、铱等贵金属材料形成的,用来防止玻璃原料的熔接。此外,中间层是从下列各种材料中选择一种以上的材料形成的:氮化钛、碳化铬、碳化钛、碳化铌、碳化钽、碳化硅、氧化铝、锆、钛、铬。The precious metal layer is formed of precious metal materials such as platinum and iridium, and is used to prevent fusion of glass raw materials. In addition, the intermediate layer is formed of one or more materials selected from the following various materials: titanium nitride, chromium carbide, titanium carbide, niobium carbide, tantalum carbide, silicon carbide, alumina, zirconium, titanium, chromium.
形成以上所述的含有钛、铬等金属材料的中间层的目的,是防止模具母材中所含有的金属成分向成形面方向析出。此外,形成这种中间层的目的,还有提高模具母材与贵金属层的结合力,防止贵金属层剥离,以及借助于缓和冲压成形时的热循环应力,抑制成形面粗糙度的增大。The purpose of forming the above-mentioned intermediate layer containing metal materials such as titanium and chromium is to prevent the metal components contained in the mold base material from being precipitated toward the forming surface. In addition, the purpose of forming this intermediate layer is to improve the bonding force between the mold base material and the noble metal layer, prevent the noble metal layer from peeling off, and suppress the increase in the roughness of the forming surface by relieving the thermal cycle stress during stamping forming.
可是,在上述以往的光学元件成形用的模具中,中间层是用含有钛、铬等金属材料的化合物形成的。这样,在反复进行冲压成形的过程中,金属材料会在成形面上,即贵金属层的表面上析出,会发生玻璃原料熔接那样的问题。此外,微量的氧会从贵金属层侵入中间层的内部,还有上述微量的氧会使中间层氧化,降低结合力的问题。However, in the aforementioned conventional optical element molding dies, the intermediate layer is formed of a compound containing metal materials such as titanium and chromium. In this way, during the repeated press forming, the metal material is deposited on the forming surface, that is, on the surface of the noble metal layer, and a problem such as fusing of the glass raw material occurs. In addition, a trace amount of oxygen penetrates into the interior of the intermediate layer from the noble metal layer, and the above-described trace amount of oxygen oxidizes the intermediate layer to reduce the bonding force.
还有,由于冲压成形时的热量,会使得在成形面上析出的金属材料氧化,还会在贵金属层的成形面上产生不均匀的晶粒生长,所以还存在成形面的表面粗糙度会逐渐增大的问题。从以上这些事实可知,由于反复地进行冲压成形,就会发生所成形的光学元件的表面精度下降,以及由于玻璃原料的粘连而不能脱模等不良情况。In addition, due to the heat during stamping, the metal material precipitated on the forming surface will be oxidized, and uneven grain growth will occur on the forming surface of the noble metal layer, so the surface roughness of the forming surface will gradually decrease. growing problem. From the above facts, it can be seen that repeated press molding causes problems such as deterioration of the surface accuracy of the molded optical element and failure of demolding due to sticking of glass raw materials.
另外,本发明人等经过精心研究后,明白了由于冲压成形时的热量而使贵金属层的成形面产生不均匀结晶的生长的主要原因。In addition, the inventors of the present invention found out the main cause of non-uniform crystal growth on the forming surface of the noble metal layer due to the heat during press forming, as a result of intensive studies.
即,本发明人等发现,在成形光学元件的过程中所产生的成形面粗糙度的增大,与中间层和贵金属层的成形面上成膜的结晶状态有关。此外,还发现,形成表面层的白金、铱等贵金属材料,要受到在其正下方形成的中间层和模具母材的各个晶粒的结晶方位的影响。还发现,在中间层中使用钛、铬等金属材料的情况下,中间层的晶粒的各自的结晶方位要受到在其正下方的模具母材的各个晶粒的结晶方位的影响。That is, the present inventors found that the increase in the roughness of the molded surface that occurs during the molding of the optical element is related to the crystallization state of the film formed on the molded surface of the intermediate layer and the noble metal layer. In addition, it was found that noble metal materials such as platinum and iridium forming the surface layer are affected by the crystal orientation of each crystal grain of the intermediate layer formed directly below and the mold base material. It has also been found that when a metal material such as titanium or chromium is used for the intermediate layer, the respective crystal orientations of the crystal grains of the intermediate layer are affected by the crystal orientations of the individual crystal grains of the mold base material directly below.
因此,从上述内容可知,使用直径比构成模具母材的材料的晶粒直径还大的晶粒来形成中间层,而且用贵金属材料来形成中间层的情况下,贵金属层的各个结晶的结晶方位,要受到中间层本身的各个晶粒的结晶方位,和隔着中间层的模具母材的各个晶粒的结晶方位的影响。此外,还发现,在冲压成形的过程中,各个模具母材的晶粒,由于受热而使晶粒生长和氧化的速度,进行的程度,是各不相同的。Therefore, it can be seen from the above that when the intermediate layer is formed using crystal grains having a diameter larger than the crystal grain diameter of the material constituting the mold base material, and when the intermediate layer is formed of a noble metal material, the crystal orientation of each crystal of the noble metal layer , will be affected by the crystal orientation of each crystal grain of the intermediate layer itself, and the crystal orientation of each crystal grain of the mold base material separated by the intermediate layer. In addition, it is also found that in the process of stamping and forming, the grains of each mold base material are different in the speed and degree of grain growth and oxidation due to heating.
本发明人等从以上两点发现,各个母材晶粒的结晶生长和氧化速度,进行程度,分别给予贵金属层各个结晶各不相同的影响,由于贵金属层的各个结晶的结晶生长和氧化速度,进行程度各不相同,就会产生不均匀的结晶生长等,并导致成形面的粗糙度增大。The inventors of the present invention have found from the above two points that the crystal growth and oxidation speed of each base material grain and the degree of progress have different effects on each crystal of the noble metal layer. Since the crystal growth and oxidation speed of each crystal of the noble metal layer, Depending on the degree of progress, non-uniform crystal growth, etc. will occur, and the roughness of the molding surface will increase.
发明内容Contents of the invention
本发明就是有鉴于上述情况而提出来的,其目的是,提供一种在用冲压成形反复地成形光学元件时,防止成形面表面粗糙度的增大,能加工出表面精度很高的光学元件的光学元件成形用的模具,以及用这种模具形成的光学元件。The present invention has been made in view of the above circumstances, and its object is to provide an optical element capable of producing an optical element with high surface precision by preventing the increase in the surface roughness of the molding surface when the optical element is repeatedly formed by press forming. Molds for forming optical components, and optical components formed with such molds.
为达到上述目的,本发明提出了以下各种手段。To achieve the above objects, the present invention proposes the following various means.
本发明的第一方面是一种光学元件成形用的模具,它是把玻璃原料冲压成形为透镜、棱镜等光学元件用的光学元件成形用的模具,其特征在于,它具有下列各部分:用烧结的超硬合金或者碳化硅制成的模具母材;在上述模具母材的表面上形成,在冲压成形的过程中与上述玻璃原料接触的表面层;以及,在上述模具母材与表面层之间形成的中间层。上述表面层是从下列元素中选择的至少一种元素形成的:白金、钯、铱、锇、钌、铼,或者是由含有这些元素的合金、化合物形成的。上述中间层具有母材表面层,它是由非晶粒状态的,或者是由晶粒直径比构成上述模具母材的晶粒直径小的晶粒形成的结晶状态的,钨、碳、碳化钨、碳化硅中的至少一种材料构成的。上述母材表面层与上述模具母材的表面接触。The first aspect of the present invention is a mold for forming optical elements, which is a mold for forming optical elements for optical elements such as lenses and prisms by punching glass raw materials. It is characterized in that it has the following parts: A mold base material made of sintered superhard alloy or silicon carbide; a surface layer formed on the surface of the above mold base material and in contact with the above-mentioned glass raw material during the stamping process; and, a surface layer between the above mold base material and the surface layer intermediate layer formed between. The above-mentioned surface layer is formed of at least one element selected from the following elements: platinum, palladium, iridium, osmium, ruthenium, rhenium, or an alloy or compound containing these elements. The above-mentioned intermediate layer has a surface layer of a base material, which is in an amorphous state, or in a crystalline state formed of crystal grains having a diameter smaller than that of the grains constituting the above-mentioned mold base material, tungsten, carbon, tungsten carbide , silicon carbide at least one material. The base material surface layer is in contact with the surface of the mold base material.
按照本发明的光学元件成形用的模具,之所以母材表面层形成非晶粒状态,或者形成由晶粒直径比构成上述模具母材的晶粒直径小的晶粒形成的结晶状态,是因为要在冲压成形的过程中不让模具母材的各个晶粒不同的结晶方位对表面层产生影响。According to the mold for molding an optical element of the present invention, the surface layer of the base material is formed in an amorphous state, or in a crystalline state formed of crystal grains having a diameter smaller than that of the crystal grains constituting the above-mentioned mold base material. In the process of stamping and forming, the different crystallographic orientations of each grain of the mold base material should not affect the surface layer.
这一点是根据以上所述的本发明人的研究中的发现而提出来的,即,当中间层是在由晶粒比构成模具母材的材料的晶粒还要大的晶粒构成的结晶状态下形成时,表面层和中间层的结晶方位会受到模具母材中的各个晶粒的结晶方位的影响,从而成为在冲压成形的过程中加热光学元件成形用的模具时,发现与玻璃原料接触的表面层的成形面粗糙度增大的原因。This point is proposed based on the above-mentioned findings of the present inventors' studies, that is, when the intermediate layer is formed of crystal grains larger than the crystal grains of the material constituting the mold base material, When formed in the state, the crystallographic orientation of the surface layer and the intermediate layer will be affected by the crystallographic orientation of each crystal grain in the mold base material, so that when the mold for optical element molding is heated during the stamping process, it is found that it is different from the glass raw material The reason why the roughness of the forming surface of the contact surface layer increases.
因此,在按照本发明的构成的情况下,即使由于对光学元件成形用的模具加热而使模具母材中的结晶发生生长和氧化,也不会让模具母材的晶粒和晶粒边界的影响波及表面层,从而能防止与玻璃原料接触的成形面粗糙度的增大。Therefore, in the case of the constitution according to the present invention, even if the crystals in the mold base material grow and oxidize due to heating the mold for optical element molding, the crystal grains of the mold base material and the crystal grain boundaries will not be separated. The influence spreads to the surface layer, thereby preventing the increase in the roughness of the molding surface in contact with the glass raw material.
本发明的第二方面所提出来的光学元件成形用的模具,是在第一方面所记载的光学元件成形用的模具中,还有这样的特征,即,上述结晶状态的晶粒的直径在2μm以下。The mold for molding an optical element proposed in the second aspect of the present invention is the mold for molding an optical element described in the first aspect, and is further characterized in that the crystal grains in the above-mentioned crystalline state have a diameter between 2μm or less.
按照这一发明的光学元件成形用的模具,母材表面层的晶粒的直径之所以要在2μm以下,是因为用烧结而成的超硬合金,或者碳化硅做成的模具母材的晶粒直径,至少大于2μm。According to the mold for forming optical elements of this invention, the reason why the diameter of the crystal grains on the surface layer of the base material must be below 2 μm is because the crystal grains of the base material of the mold made of sintered superhard alloy or silicon carbide Particle diameter, at least greater than 2 μm.
本发明的第三方面所提出来的光学元件成形用的模具,是在第一或第二方面所记载的光学元件成形用的模具中,还有这样的特征,即,上述中间层还具有在上述母材表面层与上述表面层之间的,由铬、钛、铝、钼中至少一种金属材料构成的金属层。The mold for molding an optical element proposed by the third aspect of the present invention is the mold for molding an optical element described in the first or second aspect, and is further characterized in that the above-mentioned intermediate layer also has a A metal layer between the surface layer of the base material and the surface layer is composed of at least one metal material selected from chromium, titanium, aluminum, and molybdenum.
按照这一发明的光学元件成形用的模具,由于在母材表面层与表面层之间形成了由铬、钛、铝、钼中至少一种金属材料构成的金属层,能获得充分的结合力,同时还能缓和在冲压成形时由于热循环而产生的应力。因此,即使反复地进行冲压成形,也能可靠地防止表面层的剥离。According to the mold for forming an optical element of this invention, since a metal layer composed of at least one metal material of chromium, titanium, aluminum, and molybdenum is formed between the surface layer of the base material, sufficient bonding force can be obtained. , At the same time, it can also relieve the stress generated by the thermal cycle during stamping and forming. Therefore, even if press forming is repeated, peeling of the surface layer can be reliably prevented.
本发明的第四方面所提出来的光学元件成形用的模具,是在第三方面所记载的光学元件成形用的模具中,还有这样的特征,即,上述中间层还具有在上述金属层与上述表面层之间的,由含有铬、钛、铝、钼中至少一种金属材料的氮化物构成的氮化物层。The mold for molding an optical element proposed in the fourth aspect of the present invention is the mold for molding an optical element described in the third aspect, further characterized in that the intermediate layer further has a Between the above-mentioned surface layer is a nitride layer composed of nitride containing at least one metal material among chromium, titanium, aluminum and molybdenum.
按照这一发明的光学元件成形用的模具,由于用氮化铬、氮化钛、氮化铝、氮化铝钛、氮化钼等那样的氮化物所形成的氮化物层,具有优良的耐热性能和耐氧化性能,所以,即使反复地进行冲压成形,也能防止氧从表面层的成形面侵入中间层的内部。这样,氧就到达不了由铬和钛等所形成的金属层,从而能防止由于金属层的氧化而导致结合力的下降。因此,能在长时间内防止表面层的剥离。According to the mold for forming optical elements of this invention, since the nitride layer formed of nitrides such as chromium nitride, titanium nitride, aluminum nitride, aluminum titanium nitride, molybdenum nitride, etc., has excellent resistance Therefore, even if the press forming is repeated, it is possible to prevent oxygen from intruding into the interior of the intermediate layer from the forming surface of the surface layer. In this way, oxygen does not reach the metal layer formed of chromium, titanium, etc., so that a decrease in bonding force due to oxidation of the metal layer can be prevented. Therefore, peeling of the surface layer can be prevented for a long time.
此外,由于这种氮化物层是很稳定的化合物,所以金属层的钛、铬等金属材料不会在表面层的成形面上析出。因此,能够防止由于析出的金属材料的氧化而使成形面的粗糙度增大,同时还能防止冲压成形过程中玻璃原料熔接在成形面上。In addition, since the nitride layer is a very stable compound, metal materials such as titanium and chromium in the metal layer do not precipitate on the forming surface of the surface layer. Therefore, it is possible to prevent the roughness of the molding surface from being increased due to the oxidation of the precipitated metal material, and to prevent the glass feedstock from being fused to the molding surface during press molding.
本发明的第五方面所提出来的光学元件成形用的模具,是在第四方面所记载的光学元件成形用的模具中,还有这样的特征,即,上述氮化物层具有氮元素的浓度向着上述金属层逐渐减小的氮元素浓度倾斜层。The optical element molding mold proposed in the fifth aspect of the present invention is the optical element molding mold described in the fourth aspect, further characterized in that the nitride layer has a concentration of nitrogen element Gradually decreasing nitrogen concentration gradient layers towards the metal layer.
按照这一发明的光学元件成形用的模具,由于用氮化合物构成的氮化物层,与用不含氮元素的金属材料构成的金属层的边界不明显,所以,即使冲压成形的温度上升,氮化物层也不会从金属层上剥离下来。因此,表面层不会暴露出来,能可靠地防止表面层的成形面粗糙度增大。According to the mold for optical element molding of this invention, since the nitride layer made of nitrogen compound has no obvious boundary with the metal layer made of metal material not containing nitrogen, even if the temperature of press forming is raised, the nitrogen The compound layer will not be peeled off from the metal layer. Therefore, the surface layer is not exposed, and the roughness of the molding surface of the surface layer can be reliably prevented from increasing.
本发明的第六方面提出了一种光学元件,其特征在于,它使用本发明第一方面中所记载的光学元件成形用的模具,由玻璃原料成形而制成。A sixth aspect of the present invention provides an optical element characterized in that it is formed by molding a glass raw material using the optical element molding die described in the first aspect of the present invention.
如上所述,按照本发明的第一方面,由于形成了由非晶粒的,或者是由晶粒直径比构成模具母材的晶粒直径小的晶粒所形成的,钨、碳、碳化钨、碳化硅中的至少一种材料构成的母材表面层,让它与模具母材接触,能防止与玻璃原料接触的表面层的成形面的粗糙度增大,从而能制成表面精度高的光学元件。As described above, according to the first aspect of the present invention, tungsten, carbon,
此外,按照本发明的第二方面,由于使母材表面层的晶粒直径在2μm以下,所以能可靠地防止表面层受到模具母材的各个晶粒不同结晶方位的影响。Furthermore, according to the second aspect of the present invention, since the grain diameter of the surface layer of the base material is 2 μm or less, it is possible to reliably prevent the surface layer from being affected by the different crystal orientations of the individual crystal grains of the mold base material.
此外,按照本发明的第三方面,由于在母材表面层与表面层之间,还具有由铬、钛、铝、钼中至少一种金属材料构成的金属层,所以在反复进行冲压成形的过程中,能可靠地防止由于表面层的剥离而造成的玻璃原料的熔接,从而能制成表面精度高的光学元件。In addition, according to the third aspect of the present invention, since there is a metal layer composed of at least one metal material among chromium, titanium, aluminum, and molybdenum between the surface layer of the base material, the During the process, it can reliably prevent the fusion of glass raw materials caused by the peeling of the surface layer, so that optical elements with high surface precision can be produced.
此外,按照本发明的第四方面,由于在金属层与表面层之间,形成了由钛或铬形成的氮化物层,在冲压成形的过程中,除了能防止玻璃原料熔接在成形面上之外,还能防止由于形成金属层的金属材料的氧化而降低结合力,从而能在长时间里制成表面精度高的光学元件。In addition, according to the fourth aspect of the present invention, since the nitride layer formed of titanium or chromium is formed between the metal layer and the surface layer, in addition to preventing the glass raw material from fusing to the forming surface during the press forming process, In addition, it is possible to prevent the reduction of bonding force due to the oxidation of the metal material forming the metal layer, so that an optical element with high surface precision can be manufactured over a long period of time.
此外,按照本发明的第五方面,由于氮化物层与金属层的分界不明显,所以能可靠地防止表面层的成形面的粗糙度增大,从而能在更长的时间里制成表面精度高的光学元件。In addition, according to the fifth aspect of the present invention, since the boundary between the nitride layer and the metal layer is not sharp, the roughness of the forming surface of the surface layer can be reliably prevented from increasing, thereby making it possible to achieve surface accuracy over a longer period of time. High optics.
还有,按照本发明的第六方面,由于光学元件的表面精度很高,从而能获得光学精度很高的光学元件。Also, according to the sixth aspect of the present invention, since the surface precision of the optical element is high, an optical element with high optical precision can be obtained.
附图说明Description of drawings
图1是本发明的第一、第二实施例的光学元件成形用的模具的构成的示意图;Fig. 1 is the schematic diagram of the formation of the mold that the optical element molding of the first, second embodiment of the present invention is used;
图2是在本发明的第一实施例的光学元件成形用的模具中,图1的主要部分放大后的断面图;2 is an enlarged cross-sectional view of the main part of FIG. 1 in the mold for forming an optical element according to the first embodiment of the present invention;
图3是在本发明的第二实施例的光学元件成形用的模具中,图1的主要部分放大后的断面图;3 is an enlarged cross-sectional view of the main part of FIG. 1 in a mold for forming an optical element according to a second embodiment of the present invention;
具体实施方式Detailed ways
图1、2表示本发明的第一实施例。在这个实施例中的光学元件成形用的模具,是通过冲压成形制造凸透镜(光学元件)用的模具。如图1所示,这种光学元件成形用的模具1具有下列各部分:一对模具母材2、2;在各模具母材2的表面2a上形成的,具有在冲压成形的过程中与玻璃原料M接触的成形面3a的表面层3;以及在这两个模具母材2与表面层3之间形成的中间层4。1, 2 show a first embodiment of the present invention. The mold for forming an optical element in this embodiment is a mold for producing a convex lens (optical element) by press molding. As shown in FIG. 1, the
模具母材2是用烧结成的超硬合金或者碳化硅形成的,其表面2a做成与凸透镜的曲率半径吻合的凹面形状。The
如图2所示,中间层4由母材表面层5、金属层6和氮化物层7构成。母材表面层5与模具母材2的表面2a接触,由非晶体状态的,或者由1~2μm的晶粒形成的结晶状态的钨、碳化钨等材料构成。金属层6与母材表面层5的表面5a接触而形成,由铬、钛等金属材料构成。氮化物层7与金属层6的表面6a接触而形成,由含有铬、钛等元素的氮化物构成。As shown in FIG. 2 , the
表面层3由白金、铱等金属材料构成,与氮化物7的表面7a接触而形成。这个表面层3是用射频喷镀(RF Spatter)、离子束喷镀、蒸镀之类的PVD(物理气相生长法)或CVD(化学气相生长法)形成的。The
另外,母材表面层5可用下列各种方法形成:用射频喷镀、离子束喷镀、蒸镀之类的PVD、CVD法,注入形成母材表面层5的材料的离子注入法;将氩气之类的离子以电气方式加速后照射在模具母材上,在形成母材表面层5的材料上成膜的离子辅助成膜法;一边注入离子一边成膜的离子束混合法。此外,为了有效地抑制结晶的生长,最好在把母材表面层5的材料和模具母材2的温度控制在母材表面层5的材料的结晶生长温度以下的过程中,形成母材表面层5。借助于这些方法,就能控制在非晶体状态下,或者在由1~2μm的晶粒构成的结晶状态下,形成母材表面层5。In addition, the
对模具母材2、母材表面层5、金属层6、氮化物层7和表面层3的材质,及其形成方法进行各种改变,制造出了9种光学元件成形用的模具。这些模具的具体构成如表1所示。Nine types of molds for optical element molding were produced by variously changing the materials of the
表1
表1中的成形模具1~3的制造方法如下。The manufacturing methods of forming dies 1 to 3 in Table 1 are as follows.
首先,用烧结法制成以碳化钨(WC)为主要成分的超硬合金构成的模具母材2,并用离子束喷镀法在这种模具母材2的表面2a上形成由碳化钨(WC)制成的母材表面层5。接着,用离子束喷镀法,使由铬(Cr)形成的金属层6成膜,再借助于一边让氮气流动一边喷镀铬的反应喷镀,形成由氮化铬(CrN)构成的氮化物层7。最后,用喷镀法形成由白金-铱合金(Pt-Ir),或铱-铼合金(Ir-Re),或白金(Pt)构成的表面层3。First, a
此外,表1中的成形模具4~6的制造方法如下。In addition, the manufacturing methods of forming dies 4 to 6 in Table 1 are as follows.
首先,用烧结法制成以碳化钨(WC)为主要成分的超硬合金构成的模具母材2,并用离子束喷镀法在这种模具母材2的表面2a上形成由碳化钨(WC)制成的母材表面层5。接着,用射频喷镀法,使由钛(Ti)形成的金属层6成膜,再借助于一边让氮气流动一边喷镀铬的反应喷镀,形成由氮化钛(TiN)构成的氮化物层7。最后,用喷镀法形成由白金-铱合金(Pt-Ir),或铱-铼合金(Ir-Re),或白金(Pt)构成的表面层3。First, a
此外,表1中的成形模具7~9的制造方法如下。In addition, the manufacturing methods of forming dies 7 to 9 in Table 1 are as follows.
首先,用烧结法制成以碳化硅(SiC)为主要成分的模具母材2,并用CVD法在这种模具母材2的表面2a上使由碳化硅(SiC)制成的母材表面层5成膜。然后,研磨母材表面层5的表面5a,使其成为镜面。接着,用射频喷镀法使由铬(Cr)形成的金属层6成膜,再借助于一边让氮气流动一边喷镀铬的反应喷镀,形成由氮化铬(CrN)构成的氮化物层7。最后,用射频喷镀法形成由白金-铱合金(Pt-Ir),或铱-铼合金(Ir-Re),或白金(Pt)构成的表面层3。First, a
如表1所示,还制作了与上述成形模具1~9比较用的三个比较例的光学元件成形用的模具1。其中有,省略了母材表面层5的比较例1;省略了母材表面层5和氮化物层7的比较例2;以及从成形模具4中省略了母材表面层5、金属层6和氮化物层7的比较例3。这三个比较例1~3的制造过程与成形模具1或4相同。As shown in Table 1,
另外,在成形模具1~3、成形模具7~9中的氮化物层7的成分,在表1中记载的是CrN,但实际上,也可以是在CrN中混合了Cr或者Cr2N。此外,在成形模具4~6和比较例1中的氮化物层7的成分,在表1中记载的是TiN,但实际上,也可以是在TiN中混合了Ti或者Ti2N。还有,在成形模具4~6和比较例1中的氮化物层7的成分,并不是仅限于TiN,例如,也可以是氮化钛铝(TiAlN)。In addition, the composition of the nitride layer 7 in the forming dies 1 to 3 and the forming dies 7 to 9 is described as CrN in Table 1, but Cr or Cr 2 N may actually be mixed with CrN. In addition, the composition of the nitride layer 7 in molding dies 4 to 6 and comparative example 1 is described as TiN in Table 1, but actually, Ti or Ti 2 N may be mixed with TiN. In addition, the composition of the nitride layer 7 in the molding dies 4 to 6 and the comparative example 1 is not limited to TiN, for example, titanium aluminum nitride (TiAlN) may be used.
对于以上12种光学元件成形用的模具1,把光学元件成形用的模具1的温度固定在580℃,分别使用玻璃原料M进行反复的实际冲压成形的成形次数的实验,一直到表面层3的成形面3a和成为凸透镜的成品发生不合格的情况为止。其实验结果示于表2。For the above 12 kinds of
表2
根据表2的结果,本发明的实施例,即成形模具1~9,即使进行了3000次以上的冲压成形,也没有发现表面层3的成形面3a及成形件有不良情况。与此相反,对比较例1来说,反复成形约140次,成形件的表面就产生了发乌那样的不良情况。According to the results in Table 2, the examples of the present invention, that is, the molding dies 1 to 9, did not find defects in the
对于比较例1来说,在测定此一时刻的表面层3的成形面3a上的表面粗糙度时,并未发现粗糙度在数值上增大了。可是,在用电子显微镜观察形成这种成形面3a的晶粒时,可以看到与模具母材2的晶粒、晶粒边界同样的花纹,在各个晶粒表面的一部分上存在着细微的凹凸,而且可以看到明显的晶粒边界。这是因为,露出在模具母材2的表面2a上的晶粒各自的结晶方向不同,在此基础上所形成的金属层6和表面层3的晶粒方向所受到的模具母材2的结晶方向的影响,在单位晶粒上形成了不同的膜。即,可以认为,由于金属层6和表面层3随着在成形时所接受的热量不同,在与模具母材2的晶粒相同的单位晶粒上,其结晶生长和氧化的程度是不同的,所以成形面3a的粗糙度增大了。In Comparative Example 1, when the surface roughness on the
此外,当仔细观察成形件的表面时,可看到与表面层3的成形面3a同样的花纹。根据以上的情况,可以认为,成形面3a细微的表面形状变化都复制到成形件的表面上,因而会产生发乌的情形。In addition, when the surface of the molded product is carefully observed, the same pattern as that of the
另一方面,当仔细观察成形模具1~9的表面层3的成形面3a时,发现它的晶粒、晶粒边界的花纹与模具母材2的不同,所以可知金属层6、氮化物层7和表面层3没有受到模具母材2的晶粒和结晶边界的影响。可以认为,这是因为母材表面层5的晶粒的直径在2μm以下,小于模具母材2的晶粒的直径的缘故。On the other hand, when the
因此,对在成形模具1~9的场合,通过对光学元件成形用的模具1加热,即使在模具母材2中发生了结晶生长和氧化,但,由于模具母材2的晶粒和结晶边界的影响不会传递给表面层3,所以能防止与玻璃原料接触的成形面3a的粗糙度增大。Therefore, in the case of
此外,在比较例2中,在反复冲压成形大约70次的时刻,玻璃原料M便产生了熔接在表面层3的成形面3a上的不良情况。更进一步,当继续反复进行冲压成形时,成形件便破裂,不能继续成形了。详细观察该成形面3a,就可以看到,在成形面3a的一部分上颜色变化了。根据元素分析可知,这个变色部分肯定是铬和氧化铬,是金属层6中的铬在成形面3a上析出,其一部分被氧化了。因此,可以认为,在冲压成形的过程中,玻璃原料M熔接在这些铬和氧化铬上了。In addition, in Comparative Example 2, the glass raw material M was fused to the
另一方面,对于成形模具1~9和比较例1,即使详细观察表面层3的成形面3a,也看不到上述变色部分。这是因为,氮化铬、氮化钛、氮化铝钛等氮化物作为化合物,具有很稳定的性质,阻碍了形成金属层6的金属材料在表面层3的成形面3a上析出的缘故。因此,在冲压成形的过程中,可以防止玻璃原料M熔接在成形面3a上。On the other hand, in molding dies 1 to 9 and comparative example 1, even when the
此外,由于这些氮化物具有优良的耐热性能和耐氧化性能,所以,即使反复地进行冲压成形,也仍能阻止氧从表面层3的成形面3a侵入金属层6。因此,即使反复进行冲压成形,也能防止形成金属层6的金属材料由于氧化而减小结合力。In addition, since these nitrides have excellent heat resistance and oxidation resistance, oxygen intrusion into the metal layer 6 from the forming
此外,在比较例3中,在反复冲压成形大约50次的时刻,玻璃原料M便熔接在表面层3的成形面3a上,成形件的一部分发生了所谓发乌的不良情况。仔细观察这种成形面3a时,可以确认,由于结合力减小,表面层3从模具母材2上剥离下来了。此外,还判明,玻璃原料M的熔接和成形件的发乌是在表面层3的剥离部分上发生的。从这一事实,可以认为,是由于模具母材2的暴露造成的玻璃原料M的熔接,和暴露出来的模具母材2的氧化导致的表面粗糙度增加的原因,使得成形品发乌。In addition, in Comparative Example 3, the glass raw material M was welded to the
另一方面,对于成形模具1~9和比较例1,即使详细观察表面层3的成形面3a,也看不到表面层3的剥离。这表明,形成金属层6的铬和钛具有强大的结合力,金属层6防止了表面层3的剥离。On the other hand, in molding dies 1 to 9 and Comparative Example 1, no peeling of the
如上所述,采用这种光学元件成形用的模具1,由于它是把用非晶体的,或者由粒径为1~2μm的晶粒形成的结晶状态的钨、碳、碳化钨、碳化硅中任何一种材料所制成的母材表面层5与模具母材2接触而形成的,所以在冲压成形的过程中,能切实地防止与玻璃原料M接触的表面层3的成形面3a粗糙度的增加,从而能形成表面精度高的凸透镜。As mentioned above, the
此外,由于在母材表面层5与氮化物层7、表面层3之间形成了由钛或铬构成的金属层6,所以,在反复进行冲压成形的过程中,能切实地防止因表面层3的剥离玻璃原料M熔接在成形面3a上,从而能形成表面精度高的凸透镜。In addition, since the metal layer 6 made of titanium or chromium is formed between the
还有,由于在金属层6与表面层3之间形成了由钛和铬制成的氮化物层7,所以,在冲压成形的过程中,能防止剥离原料M熔接在成形面3a上,并且,还能防止由于形成金属层6的金属材料的氧化而使结合力减小,从而能在很长的时间里形成表面精度高的凸透镜。Also, since the nitride layer 7 made of titanium and chromium is formed between the metal layer 6 and the
此外,由于使用这种光学元件成形用的模具1所成形的凸透镜的表面精度很高,从而能获得光学精度很高的凸透镜。In addition, since the surface precision of the convex lens molded by using such an optical element molding die 1 is high, a convex lens with high optical precision can be obtained.
下面,图3表示本发明的第二实施例,这个实施例的构成,基本上与图1、图2中所示的光学元件成形用的模具1相同,只是氮化物层7的构成不同。这里,只对图3中的氮化物层7进行说明,并且,对于与图1、2的构成要素相同的部分都标以相同的标号,并省略其说明。Next, FIG. 3 shows a second embodiment of the present invention. The structure of this embodiment is basically the same as that of the optical element molding die 1 shown in FIGS. 1 and 2, except that the structure of the nitride layer 7 is different. Here, only the nitride layer 7 in FIG. 3 will be described, and the same reference numerals will be assigned to the same components as those in FIGS. 1 and 2, and descriptions thereof will be omitted.
即,本实施例的氮化物层7具有氮的浓度向着金属层6逐渐减小的氮浓度倾斜层8。制造了三种具有这种氮浓度倾斜层8的光学元件成形用的模具1。这些模具的具体构成示于表3。That is, nitride layer 7 of the present embodiment has nitrogen
表3
表3中的成形模具10~12的形成方法如下面所述。The forming methods of the forming dies 10 to 12 in Table 3 are as follows.
首先,用烧结法形成以碳化钨(WC)作为主要成分的超硬合金制成的模具母材2,再用离子束喷射法在这种模具母材2的表面2a上形成用碳化钨(WC)构成的母材表面层5。接着,用离子束喷射成膜法形成由铬(Cr)构成的金属层6,然后,在进行铬的成膜过程中逐渐增加氮气的导入量,从0sccm开始一直增加到8sccm,形成氮浓度逐渐增加的氮浓度倾斜层8。然后,在保持氮气的导入量为8sccm的状态下,借助于喷射铬的反应喷射法,形成由氮化铬(CrN)构成的其余的氮化物层7。最后,用离子束喷射法形成用白金-铱合金(Pt-Ir),或者铱-铼合金(Ir-Re),或者白金(Pt)构成的表面层3。First, a
此外,作为与这些成形模具10~12的比较例,制作了与第一实施例中所述的成形模具1同样构成的比较例4。这些成形模具10~12和比较例4,除了有或没有氮浓度倾斜层8之外,其余的模具母材2、母材表面层5、金属层6、氮化物层7和表面层3的材质都相同。Moreover, as a comparative example with these molding dies 10-12, the comparative example 4 which was comprised similarly to the molding die 1 mentioned in 1st Example was produced. These forming dies 10-12 and Comparative Example 4, except for the presence or absence of the nitrogen
对上述四种光学元件成形用的模具1,用玻璃原料M进行了实际上的反复冲压成形,并分别进行了在表面层3的成形面3a及制成的凸透镜成形件上产生不良情形为止的成形次数的实验。成形时光学元件成形用的模具1的温度,在冲压成形3000次以前为580℃,在其后的冲压成形时为600℃。实验的结果示于表4。For the
表4
按照表4的结果,在580℃下即使进行3000次冲压成形,在成形模具10~12及比较例4上也没有发生不良情况。但是,改为在600℃下进一步进行冲压成形,其结果是,在成形模具10~12中,即使再进行2000次以上的冲压成形,也没有发生不良的情况。而与此相反,在比较例4中,大约进行了1500次冲压成形之后,就出现了玻璃原料M的熔接。According to the results in Table 4, even if press forming was performed 3,000 times at 580° C., no defects occurred in the molding dies 10 to 12 and Comparative Example 4. However, press forming was further performed at 600° C., and as a result, no defect occurred even if press forming was performed more than 2,000 times in the molding dies 10 to 12 . On the contrary, in Comparative Example 4, fusion of the glass raw material M occurred after about 1500 times of press forming.
详细观察该比较例4表面层3的成形面3a,发现表面层3和氮化物层7的一部分从金属层6上剥离下来了,在剥离的部分上露出了金属层6中的铬。可以认为玻璃原料M是熔接在这个金属层6的铬上了。When the molded
如上所述,采用这种光学元件成形用的模具1,由于形成了氮浓度倾斜层8,使得金属层6与氮化物层7之间没有了明显的分界,即使让冲压成形的温度上升,氮化物层7也不会从金属层6上剥离下来,所以能切实地防止表面层3的成形面3a的粗糙度增大。因此,能在更长的时间段里形成表面精度高的凸透镜。As mentioned above, with the
此外,由于使用这种光学元件成形用的模具1所成形的凸透镜的表面精度高,从而能获得表面精度高的凸透镜。In addition, since the surface precision of the convex lens molded using such an optical element molding die 1 is high, a convex lens with high surface precision can be obtained.
另外,在上述实施例中,母材表面层5的晶粒直径为1~2μm,但,并不是只限于这个范围,至少,可以比模具母材2的晶粒直径更小。只是,母材表面层5的晶粒直径应小一些为好,特别理想的是小于1μm。In addition, in the above-mentioned embodiment, the crystal grain diameter of the base
此外,在上述实施例中,是在模具母材2的表面2a上形成母材表面层5的,但,并不是只限于这样做,只要至少形成金属层6的基础上形成了非晶粒状态,或者形成了晶粒直径比模具母材2的晶粒直径小的晶粒的结晶状态,就可以了。因此,例如,只要在形成模具母材2之后,从模具母材2的表面2a注入氩之类的离子,在模具母材2的表面2a附近形成非晶粒状态,或者形成晶粒直径为1-2μm的晶粒直径小的晶粒构成的结晶状态,在这个模具母材2的表面2a上形成金属层6,就可以了。In addition, in the above-mentioned embodiment, the base
此外,构成光学元件成形用的模具1的模具母材2及其他各层的材料的组合,也不限于成形模具1~12的组合。即,模具母材2只要是从碳化钨等超硬合金,和以碳化硅为主要成分的材料中选择的材料就可以,母材表面层5只要是从钨、碳、碳化钨、碳化硅中选择的一种以上的材料就可以。即,例如,可以把成形模具1~6中的母材表面层5的成分从碳化钨(WC)改为用钨(W)来代替。另外,将成形模具7~9中的母材表面层5的成分由碳化硅(SiC)改为碳(C)也可以。在上述成分的情况下,除了用PVD法、CVD法形成母材表面层5之外,也可以用离子注入法来形成。In addition, the combination of the
此外,金属层6只要是从下列各种金属材料中选择的至少一种就可以:铬、钛、铝、钼;氮化物层7只要是至少含有从下列元素中选择的一种元素的氮化物就可以:铬、钛、铝、钼。不过,理想的是,金属层6的金属材料与氮化物层7中的氮化物所含的金属材料是同一种金属材料。In addition, as long as the metal layer 6 is at least one selected from the following various metal materials: chromium, titanium, aluminum, molybdenum; the nitride layer 7 only needs to be a nitride containing at least one element selected from the following elements You can: chromium, titanium, aluminum, molybdenum. However, ideally, the metal material of the metal layer 6 and the metal material contained in the nitride in the nitride layer 7 are the same metal material.
还有,表面层3可以是从白金、钯、铱、锇、钌、铼中选择的至少一种材料,或者是从含有这些元素的合金、化合物中选择的任何一种。即,表面层3可以是,例如,由白金-钯合金(Pt-Pd)、白金-铼合金(Pt-Re)、铱-钌合金(Ir-Ru)等合金形成,或者只由铱(Ir)、锇(Os)、镣(Ru)、铼(Re)等金属材料形成。Also, the
此外,光学元件成形用的模具1的中间层4,是由母材表面层5、金属层6和氮化物层7构成的,但,也并不是只限于这种构成,也可以只由母材表面层5和金属层6构成。即使是这样的构成,也能可靠地获得防止在冲压成形过程中因表面层3的剥离而造成的玻璃原料M熔接的效果。In addition, the
还有,这种中间层4的构成也可以从上述构成中进一步去掉金属层6,即,也可以只由母材表面层5构成。即便是这种构成,也能可靠地获得防止在冲压成形过程中因与玻璃原料M接触,而使表面层3的成形面3a的粗糙度增大的效果。In addition, the configuration of the
此外,光学元件成形用的模具1可用来成形凸透镜,但,不仅限于此,它也可以用于平面透镜、凹透镜、棱镜,或者具有光学表面的元件之类的光学元件的成形。In addition, the optical
以上,参照附图详细说明了本发明的实施例,但,具体的构成并不仅限于这些实施例,本发明还包括不脱离本发明要点的范围内的一切设计上的变化。Above, the embodiments of the present invention have been described in detail with reference to the drawings, but the specific configuration is not limited to these embodiments, and the present invention includes all design changes within the scope not departing from the gist of the present invention.
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|---|---|---|---|---|
| CN1721346B (en) * | 2004-07-16 | 2011-03-23 | 鸿富锦精密工业(深圳)有限公司 | Manufacturing method of core for molding glass |
| CN1769226B (en) * | 2004-11-06 | 2010-04-28 | 鸿富锦精密工业(深圳)有限公司 | Mold core with wear-resistant layer and preparation method thereof |
| CN1331786C (en) * | 2004-11-10 | 2007-08-15 | 亚洲光学股份有限公司 | Mold cores for glass molding |
| JP5930725B2 (en) | 2012-01-17 | 2016-06-08 | キヤノン株式会社 | Amorphous alloy, mold for molding, and molding method of optical element |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4781744A (en) * | 1985-10-11 | 1988-11-01 | Asahi Glass Company Ltd. | Molding method |
| JPH06263460A (en) * | 1993-03-10 | 1994-09-20 | Canon Inc | Optical element molding die and method of manufacturing the same |
| JPH07149528A (en) * | 1993-11-30 | 1995-06-13 | Matsushita Electric Ind Co Ltd | Mold for forming microlens array, method for manufacturing the same, and method for manufacturing microlens |
| JPH09227139A (en) * | 1996-02-28 | 1997-09-02 | Nippon Tungsten Co Ltd | Glass optical element mold |
| CN1292770A (en) * | 1999-01-05 | 2001-04-25 | 松下电器产业株式会社 | Die for forming optical device, method for manufacturing the same, and optical device |
| CN1356276A (en) * | 2000-11-30 | 2002-07-03 | 日本碍子株式会社 | Mould for shaping glass product and its manufacture |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09286624A (en) * | 1996-04-22 | 1997-11-04 | Nikon Corp | Mold for optical element molding |
| JP2002293632A (en) * | 2001-03-28 | 2002-10-09 | Ibiden Co Ltd | Molding die |
| JP2002338267A (en) * | 2001-05-16 | 2002-11-27 | Olympus Optical Co Ltd | Optical element molding die |
-
2004
- 2004-01-21 CN CNB2004100033694A patent/CN1305789C/en not_active Expired - Lifetime
-
2009
- 2009-02-09 JP JP2009027923A patent/JP4763064B2/en not_active Expired - Lifetime
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4781744A (en) * | 1985-10-11 | 1988-11-01 | Asahi Glass Company Ltd. | Molding method |
| JPH06263460A (en) * | 1993-03-10 | 1994-09-20 | Canon Inc | Optical element molding die and method of manufacturing the same |
| JPH07149528A (en) * | 1993-11-30 | 1995-06-13 | Matsushita Electric Ind Co Ltd | Mold for forming microlens array, method for manufacturing the same, and method for manufacturing microlens |
| JPH09227139A (en) * | 1996-02-28 | 1997-09-02 | Nippon Tungsten Co Ltd | Glass optical element mold |
| CN1292770A (en) * | 1999-01-05 | 2001-04-25 | 松下电器产业株式会社 | Die for forming optical device, method for manufacturing the same, and optical device |
| CN1356276A (en) * | 2000-11-30 | 2002-07-03 | 日本碍子株式会社 | Mould for shaping glass product and its manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4763064B2 (en) | 2011-08-31 |
| JP2009102225A (en) | 2009-05-14 |
| CN1524813A (en) | 2004-09-01 |
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