CN1395301A - Method for manufacturing mixed integrated circuit device - Google Patents
Method for manufacturing mixed integrated circuit device Download PDFInfo
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- CN1395301A CN1395301A CN02125144A CN02125144A CN1395301A CN 1395301 A CN1395301 A CN 1395301A CN 02125144 A CN02125144 A CN 02125144A CN 02125144 A CN02125144 A CN 02125144A CN 1395301 A CN1395301 A CN 1395301A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components
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Abstract
一种混合集成电路装置的制造方法,在模装工序中在模腔内要固定混合集成电路衬底的水平方向的位置。本发明通过使保持一定间隔的特定导线39a、39b与第一连结部53连接的部分与设于模型上的导销46a、46b接触,可固定混合集成电路衬底31的位置。由于特定导线39a、39b的间隔与混合集成电路衬底31的端子数无关,故即使端子数不同也可共用模型。
A method for manufacturing a hybrid integrated circuit device, in which the position of the hybrid integrated circuit substrate in the horizontal direction is fixed in the mold cavity during the molding process. In the present invention, the position of the hybrid integrated circuit substrate 31 can be fixed by making the part where the specific wires 39a, 39b connected to the first connecting portion 53 keep a certain distance contact the guide pins 46a, 46b provided on the mold. Since the interval of the specific wires 39a, 39b is independent of the number of terminals of the hybrid integrated circuit substrate 31, the model can be shared even if the number of terminals is different.
Description
技术领域technical field
本发明涉及混合集成电路装置的制造方法,涉及在混合集成电路衬底上利用传递模形成树脂封装体的混合集成电路装置的制造方法。The present invention relates to a manufacturing method of a hybrid integrated circuit device, and relates to a manufacturing method of a hybrid integrated circuit device in which a resin package is formed on a hybrid integrated circuit substrate by transfer molding.
背景技术Background technique
通常,用于混合集成电路装置的封装方法主要有两种。Generally, there are mainly two packaging methods for hybrid integrated circuit devices.
第一方法是采用象在安装有半导体元件等电路元件的混合集成电路衬底之上盖盖子那样形状的装置、即通常被称作箱体构件的装置进行封装。该结构有时采用中空结构或在其中另外注入树脂的结构。The first method is to package with a device in the shape of a lid placed on a hybrid integrated circuit substrate on which circuit elements such as semiconductor devices are mounted, that is, a device generally called a box member. The structure sometimes adopts a hollow structure or a structure in which resin is additionally injected.
第二方法是作为半导体IC的模装方法采用注入模法。例如特开平11-330317号公报所示。该注入模法通常采用热塑性树脂,例如将加热到300℃的树脂利用高的注入压力注入并一度充填在模型内来封装树脂。与传递模相比,由于不需要将树脂充填在模型内后树脂的聚合时间,故具有可缩短作业时间的优点。The second method is to use injection molding as a molding method for semiconductor ICs. For example, it is shown in JP-A-11-330317. The injection molding method generally uses a thermoplastic resin, for example, a resin heated to 300° C. is injected with a high injection pressure and once filled in the mold to encapsulate the resin. Compared with the transfer mold, since the polymerization time of the resin after filling the mold is unnecessary, there is an advantage that the working time can be shortened.
下面参照图9至图12说明使用注入模的现有混合集成电路装置及其制造方法。A conventional hybrid integrated circuit device using an injection mold and its manufacturing method will be described below with reference to FIGS. 9 to 12. FIG.
首先,如图9所示,作为金属衬底这里采用铝(以下称Al)衬底1来说明。First, as shown in FIG. 9, an aluminum (hereinafter referred to as Al)
该Al衬底1表面被阳极氧化,其上整个面上形成有绝缘性好的树脂2。但是,若考虑到耐压,则也可省去该氧化物。The surface of the
树脂封装体10由支承部件10a和热塑性树脂形成。即通过注入模模装用热塑性树脂覆盖了载置于支承部件10a上的衬底1。然后,支承部件10a和热塑性树脂的接触部利用注入的高热的热塑性树脂溶化支承部件10a的接触部,实现全模装结构。The
这里,热塑性树脂采用的是被称作PPS(聚亚苯基硫醚)的树脂。Here, as the thermoplastic resin, what is called PPS (polyphenylene sulfide) is used.
热塑性树脂的注入温度非常高,约为300℃,存在高温的树脂使焊料12溶化产生焊料不良的问题。因此,预先罐封热硬性树脂(例如环氧树脂),覆盖焊料的结部、金属细线7、有源元件5及无源元件6,形成外敷层9。由此,防止在热塑性树脂成型时注入树脂压使尤其是细线(约30~80μm)倒下或断线。The injection temperature of the thermoplastic resin is very high, about 300° C., and there is a problem that the high-temperature resin melts the
树脂封装体10分两阶段形成。第一阶段为了确保在衬底1背面和模型之间设置间隙并在其间用高注入压力充填树脂时衬板1背面的厚度,在衬板1背面载置支承部件10a。第二阶段通过注入模由热塑性树脂覆盖载置于支承部件10a上的衬底1。然后,支承部件10a和热塑性树脂的接触部由注入的高热的热塑性树脂溶化支承部件10a的接触部,实现全模装结构。这里作为支承部件10a的热塑性树脂最好是与衬底1热膨胀系数同等的树脂。The
下面,参照图10~图12说明使用注入模的现有混合集成电路装置的制造方法。Next, a method of manufacturing a conventional hybrid integrated circuit device using an injection mold will be described with reference to FIGS. 10 to 12 .
图10是工序流程图,包括准备金属衬底的工序、绝缘层形成工序、铜箔压装工序、局部镀镍工序、铜箔蚀刻工序、装片工序、引线接合工序、罐封工序、导线连接工序、支承部件安装工序、注入模工序、导线切断工序等各工序。Figure 10 is a flow chart of the process, including the process of preparing the metal substrate, the insulating layer forming process, the copper foil pressing process, the partial nickel plating process, the copper foil etching process, the chip loading process, the wire bonding process, the potting process, and the wire connection process, support member mounting process, injection molding process, lead wire cutting process and other processes.
图11及图12表示各工序的剖面图。另外,不需图示也清楚的工序则省略附图。11 and 12 show cross-sectional views of each step. In addition, the drawings are omitted for processes that are clear without illustration.
首先,在图11(A)及图11(B)中,表示准备金属衬底的工序、绝缘层形成工序、铜箔压装工序、局部镀镍工序及铜箔蚀刻工序。First, FIG. 11(A) and FIG. 11(B) show a step of preparing a metal substrate, an insulating layer forming step, a copper foil press-fitting step, a partial nickel plating step, and a copper foil etching step.
在准备金属衬底的工序中,作为衬底的作用根据散热性、衬底强度及衬底屏蔽性等而准备。而且,在本实施例中,使用散热性好的例如厚1.5mm左右的Al衬底1。In the step of preparing the metal substrate, the role as the substrate is prepared in terms of heat dissipation, substrate strength, substrate shielding properties, and the like. Furthermore, in this embodiment, an
其次,在铝衬底1上,还在整个面上形成绝缘性好的树脂2。在绝缘性树脂2上压装构成混合集成电路的铜的导电箔3。在铜箔3上,根据其与例如电连接作为取出电极的铜箔3和有源元件5的金属细线7的粘接性,在整个面上实施镀镍4。Next, on the
然后,利用公知的网印等形成镀镍4a及导电路3a。Then, nickel plating 4a and
其次,图11(C)表示装片工序及引线接合工序。Next, FIG. 11(C) shows a chip mounting process and a wire bonding process.
在前工序形成的导电路3a上通过焊剂12等导电糊安装有源元件5及无源元件6,实现规定的电路。The
图12(A)、图12(B)表示罐封工序、导线连接工序及支承部件安装工序。12(A) and 12(B) show a potting step, a wire connection step, and a supporting member installation step.
如图12(A)所示,在罐封工序中,在其后的注入模工序之前,预先用热硬性树脂(例如环氧树脂)罐封焊料的结部、金属细线7、有源元件5及无源元件6,形成外敷层9。As shown in FIG. 12(A), in the potting process, before the subsequent injection molding process, the joints of the solder, metal
接着,准备用于将来自上述混合集成电路的信号输出及输入的外部导线8。然后,通过形成于衬底1外周部的外部连接端子11及焊料12连接外部导线8。Next,
然后,如图12(B)所示,在连接了外部导线8等的混合集成电路衬底1上载置支承部件10a,将衬底1载置在支承部件10a上,从而可确保下工序所述的注入模模装时衬底1背面的树脂封装体10的厚度。Then, as shown in FIG. 12(B), the support member 10a is placed on the hybrid integrated
图12(C)表示注入模工序及导线切断工序。Fig. 12(C) shows an injection molding process and a wire cutting process.
如图所示,在衬底1上用热硬性树脂罐封并形成外敷层9之后,利用注入模形成树脂封装体10。此时,支承部件10a和热塑性树脂的接触部利用注入的高热的热塑性树脂使支承部件10a的接触部溶化,形成全模装结构的树脂封装体10。As shown in the figure, after the
最后,根据使用目的切断外部导线8,调节外部导线8的长度。Finally, the
利用上述工序,完成图9所示的混合集成电路装置。Through the above steps, the hybrid integrated circuit device shown in FIG. 9 is completed.
另外,半导体芯片中通常实施传递模法。在该传递模形成的混合集成电路装置中,例如是在铜构成的导线架上固定安装半导体元件。而且,半导体元件和导线是通过金(以下称Au)线电连接。这是由于Al细线容易折曲,接合时需要超声波,故接合时间较长,因此不能采用。因此,目前,将由一张金属板构成、金属板上形成电路并且由Al细线引线接合的金属衬底直接传递模模装的混合集成电路装置不存在。In addition, transfer mode methods are often implemented in semiconductor chips. In the hybrid integrated circuit device formed by transfer molding, for example, a semiconductor element is fixedly mounted on a lead frame made of copper. Also, the semiconductor element and the wiring are electrically connected through a gold (hereinafter referred to as Au) wire. This is because thin Al wires are easily bent, and ultrasonic waves are required for bonding, so the bonding time is long, so they cannot be used. Therefore, at present, there is no hybrid integrated circuit device that will be directly transfer-die-mounted by a metal substrate composed of a single metal plate on which circuits are formed and wire-bonded by Al thin wires.
发明内容Contents of the invention
在注入模型的混合集成电路装置中,需要防止模装时的注入压力使金属细线7折曲或断线,防止注入时的温度使焊料12流动。因此,在图9所示的现有结构中采用罐封形成的外敷层9来对应上述问题。In the injection molded hybrid integrated circuit device, it is necessary to prevent the
但是,在用热硬性树脂(例如环氧树脂)罐封并形成外敷层9后,进行注入模模装,故存在耗费热硬性树脂的材料成本及操作成本的问题。However, injection molding is performed after potting with a thermosetting resin (such as epoxy resin) to form the
在现有的使用导线架的、传递模形成的混合集成电路装置中,将半导体元件等固定安装在隔离岛上,故半导体元件等产生的热自固定安装区域发散,但散热区域有限,存在散热性差的问题。In the existing hybrid integrated circuit device using a lead frame and formed by a transfer mold, the semiconductor elements are fixedly mounted on the isolation island, so the heat generated by the semiconductor elements is dissipated from the fixed installation area, but the heat dissipation area is limited, and there is a problem of heat dissipation. problem of poor sex.
如上所述,在树脂封装体的引线接合中,采用了抗树脂注入压能力强的Au线,故采用Al线的传递模目前也未实施。而且,Al细线由于用超声波接合进行,收缩的部分弱,并且,弹性系数低,不能抗树脂的注入压等原因,会迅速弯曲。As described above, in wire bonding of resin packages, Au wires that are highly resistant to resin injection pressure are used, so transfer molding using Al wires has not been practiced yet. In addition, since Al thin wires are bonded by ultrasonic waves, the contracted parts are weak, and the modulus of elasticity is low, so that they cannot withstand the injection pressure of the resin, so they tend to bend quickly.
在由传递模全部封装混合集成电路衬底的情况下,需要在模型内进行混合集成电路衬底的水平及厚度方向的位置固定,但是,当将固定销与混合集成电路衬底的背面接触进行定位时,存在封装后该衬底背面露出导致耐压劣化的问题。In the case of encapsulating the hybrid integrated circuit substrate with a transfer mold, it is necessary to fix the position of the hybrid integrated circuit substrate in the horizontal and thickness directions within the mold, but when the fixing pins are brought into contact with the rear surface of the hybrid integrated integrated circuit substrate During positioning, there is a problem that the rear surface of the substrate is exposed after packaging, resulting in degradation of withstand voltage.
本发明的目的在于提供一种在传递模工序中将混合集成电路衬底在模型内固定在规定位置的装置。An object of the present invention is to provide a device for fixing a hybrid integrated circuit substrate at a predetermined position within a mold during a transfer molding process.
为了解决上述问题,本发明的半导体集成电路装置的制造方法包括下述工序:准备至少表面进行过绝缘处理的混合集成电路衬底;在所述衬底上形成导电图形;在所述导电图形上固定安装半导体元件或无源元件;将导线电连接在所述衬底上;利用传递模在所述衬底的至少表面上模装热硬性树脂。In order to solve the above problems, the manufacturing method of the semiconductor integrated circuit device of the present invention includes the following steps: preparing a hybrid integrated circuit substrate whose surface has been subjected to insulation treatment at least; forming a conductive pattern on the substrate; fixing a semiconductor element or a passive element; electrically connecting wires on said substrate; molding a thermosetting resin on at least a surface of said substrate by means of a transfer mold.
在本发明中,模装工序的特征在于,使用焊料接合在混合集成电路衬底的导线架的特定导线的间隔一定,并使所述特定导线与设于导线中断的连结部连接的部分和设于模型上的导销接触。由此,进行所述导线架的定位,进而可进行混合集成电路衬底的定位,故可解决现有问题。并且,通过进行混合集成电路衬底的定位,可用散热性良好的树脂对混合集成电路衬底的背面进行一定厚度的覆盖,可提高混合集成电路装置的散热性。In the present invention, the molding process is characterized in that the specific lead wires of the lead frame of the hybrid integrated circuit substrate are bonded with solder at a constant interval, and the specific lead wires are connected to the connection part provided at the lead wire interruption and the device is connected. Make contact with the guide pins on the model. Thereby, the positioning of the lead frame and further the positioning of the hybrid integrated circuit substrate can be performed, so that the conventional problems can be solved. Moreover, by positioning the hybrid integrated circuit substrate, the back surface of the hybrid integrated circuit substrate can be covered with a certain thickness of resin with good heat dissipation, and the heat dissipation of the hybrid integrated circuit device can be improved.
附图说明Description of drawings
图1是本发明的混合集成电路装置的(A)平面图,(B)剖面图;Fig. 1 is (A) plane view of the hybrid integrated circuit device of the present invention, (B) sectional view;
图2是本发明的混合集成电路装置的(A)剖面图,(B)平面图;Fig. 2 is (A) sectional view, (B) plane view of hybrid integrated circuit device of the present invention;
图3是本发明混合集成电路装置的制造方法的流程图;Fig. 3 is a flow chart of the manufacturing method of the hybrid integrated circuit device of the present invention;
图4是说明本发明混合集成电路装置的制造方法的图;4 is a diagram illustrating a method of manufacturing a hybrid integrated circuit device of the present invention;
图5是说明本发明混合集成电路装置的制造方法的图;5 is a diagram illustrating a method of manufacturing a hybrid integrated circuit device of the present invention;
图6是说明本发明混合集成电路装置的制造方法的图;6 is a diagram illustrating a method of manufacturing a hybrid integrated circuit device of the present invention;
图7是说明本发明混合集成电路装置的制造方法的图;7 is a diagram illustrating a method of manufacturing a hybrid integrated circuit device of the present invention;
图8是说明本发明混合集成电路装置的制造方法的图;8 is a diagram illustrating a method of manufacturing a hybrid integrated circuit device of the present invention;
图9是现有混合集成电路装置的剖面图;Fig. 9 is a cross-sectional view of a conventional hybrid integrated circuit device;
图10是现有混合集成电路装置的制造方法的流程图;10 is a flowchart of a manufacturing method of a conventional hybrid integrated circuit device;
图11是说明现有混合集成电路装置的制造方法的图;11 is a diagram illustrating a method of manufacturing a conventional hybrid integrated circuit device;
图12是说明现有混合集成电路装置的制造方法的图;12 is a diagram illustrating a method of manufacturing a conventional hybrid integrated circuit device;
具体实施方式Detailed ways
下面,参照图1及图2说明本发明实施例1的混合集成电路装置。Next, a hybrid integrated circuit device according to
首先,参照图2说明本混合集成电路装置的结构。如图2(A)所示,混合集成电路装置31考虑到固定安装在衬底31上的半导体元件等产生的热,采用散热性好的衬底。在本实施例中,就使用铝衬底31的情况进行说明。另外,虽然在本实施例中衬底31采用了铝(以下称Al)衬底,但不必特别限定。例如采用印刷电路板、陶瓷衬底、金属衬底等作为衬底31也可实现本实施例。而且,金属衬底可以用铜衬底、铁衬底、铁镍衬底或AlN(氮化铝)衬底等。First, the structure of this hybrid integrated circuit device will be described with reference to FIG. 2 . As shown in FIG. 2(A), the hybrid
Al衬底31表面被阳极氧化,其上在整个面上还形成绝缘性良好的例如环氧树脂构成的绝缘树脂32。不过,若不考虑耐压,则也可不设该金属氧化物。The surface of the
在该树脂32上,形成有铜箔33(参照图5)构成的导电路33a,Al衬底31上除电连接部位外例如由环氧系树脂形成外敷层,以保护导电路33a。导电路33a上通过焊料40安装有功率晶体管、小信号晶体管或IC等有源元件35、片状电阻、片状电容器等无源元件36,实现规定的电路。这里,也可以局部不采用焊料,而用银糊等电连接。在半导体元件等有源元件8面朝上安装的情况下,通过金属细线37连接。金属细线37在功率系半导体元件的情况下例如使用约150~500μmφ的Al线。通常将其称作粗线。在半功率系或小信号系半导体元件的情况下使用例如约30~80μmφ的Al线。通常将其称作细线。在设于Al衬底31外周部的外部连接用端子38上通过焊料40连接有铜或铁镍等导电性部件构成的外部导线39。On the
本发明的特征在于,在混合集成电路衬底31上的有源元件35、无源元件36及Al细线37等上直接形成树脂封装体。The present invention is characterized in that a resin package is directly formed on the
也就是说,在树脂封装体41中,传递模使用的热硬性树脂粘度低且硬化温度低于上述连接装置所用的焊料40等的熔点例如183℃。由此,如图9所示,可除去现有混合集成电路装置中利用热硬性树脂(例如环氧树脂)的罐封形成的外敷层9。That is, in the resin package 41 , the thermosetting resin used for the transfer mold has a low viscosity and a curing temperature lower than the melting point of, for example, 183° C., the
其结果,尤其是将小信号系的IC等与导电路33a电连接的、例如约40μm左右的直径的金属细线等,即使直接填充传递模模装时的热硬性树脂,也不会躺倒、断线或折曲。尤其对Al细线而言,可防止折曲是要点。As a result, especially thin metal wires with a diameter of about 40 μm, which electrically connect small-signal ICs and the like to the
下面如图2(B)所示,外部导线39向树脂封装体41的外部导出,外部导线39根据使用目的而调节长度。树脂封装体41上在与导出外部导线39的侧边相对的一侧,在两处作为压销痕形成有孔42。孔42是在上述传递模模装时压销47(参照图6)固定衬底31所产生的,在树脂封装体41形成后仍存在。Next, as shown in FIG. 2(B), the
如图1(A)所示,孔42形成于衬底31的外周部43即衬底31上未形成电路等的部分。另外,孔42在衬底31的外周部43形成于绝缘树脂32上,故形成品质和耐湿性方面没有问题的结构。外周部43是为了在一个个冲压衬底31时确保与电路区域的距离而设置的边界。As shown in FIG. 1(A) , the hole 42 is formed in the outer
如图1(A)、(B)所示,在Al衬底31上交错地形成有导电路33a,该导电路33a上通过焊料40等安装有功率晶体管、小信号晶体管或IC等有源元件35、片状电阻、片状电容器等无源元件36,通过外部连接用端子38连接有外部导线39,实现规定的电路。As shown in Fig. 1(A) and (B),
如图所示,衬底31上以小的空间形成有复杂的电路。本发明的混合集成电路装置的特征在于,在Al衬底31整个面上形成绝缘树脂32后,在树脂32上形成复杂的电路,然后,在衬底31上粘接外部导线39,利用传递模直接一体形成树脂封装体41。As shown in the figure, complex circuits are formed on the
以往,在利用传递模形成混合集成电路装置的情况下,例如由铜构成的导线架利用蚀刻、冲孔或冲压等进行加工,形成配线、隔离岛等,故不能形成象混合集成电路的导电图形那样复杂的电路。传递模形成的导线架,在形成图1(A)那样的配线时,为了防止导线的弯曲需要在不同的部位用吊线固定。这样,在使用通常的导线架的混合集成电路中最多只安装几个有源元件,形成具有图2(A)那样的导电图形的混合集成电路受到了限制。In the past, in the case of forming a hybrid integrated circuit device using a transfer mold, for example, the lead frame made of copper was processed by etching, punching or stamping to form wiring, isolation islands, etc., so it was impossible to form a conductive circuit like a hybrid integrated circuit. Circuits as complex as graphics. In the lead frame formed by the transfer die, when forming the wiring as shown in Fig. 1(A), it is necessary to fix it with suspension wires at different positions in order to prevent the lead wire from being bent. Thus, only a few active elements are mounted at most in a hybrid integrated circuit using a conventional lead frame, and the formation of a hybrid integrated circuit having a conductive pattern as shown in FIG. 2(A) is limited.
也就是说,通过采用本发明的混合集成电路装置的结构,可利用传递模形成具有复杂电路的衬底31。在本发明中,衬底31是使用导热系数高的衬底进行传递模模装的,故可发散衬底31整体产生的热。因此,与传递模模装的现有导线架构成的混合集成电路装置相比,由于直接模装金属衬底31,故该衬底作为大的散热片起作用,散热性好,可改善电路特性。That is, by adopting the structure of the hybrid integrated circuit device of the present invention, the
下面,参照图3~图8说明本发明的混合集成电路装置的制造方法。另外,图4至图8中,不需图示即清楚的工序省略附图。Next, a method of manufacturing the hybrid integrated circuit device of the present invention will be described with reference to FIGS. 3 to 8 . In addition, in FIGS. 4 to 8 , the drawings are omitted for processes that are clear without illustration.
图3是工序流程图,包括:准备金属衬底的工序;绝缘层形成工序;铜箔压装工序;局部镀镍工序,铜箔蚀刻工序;装片工序;引线接合工序;导线连接工序;传递模工序;导线切断工序等各工序。由该流程图可知,虽然目前是通过注入模形成树脂封装体,但本发明实现了由传递模形成树脂封装体的工序。Figure 3 is a process flow chart, including: the process of preparing the metal substrate; the insulating layer forming process; the copper foil pressing process; the partial nickel plating process, the copper foil etching process; the chip loading process; the wire bonding process; Die process; wire cutting process and other processes. As can be seen from the flow chart, the present invention realizes the process of forming the resin package by the transfer mold, although the resin package is formed by the injection mold at present.
如图4(A)所示,本发明的第一工序是准备金属衬底、形成绝缘层、压装铜箔和进行镀镍的工序。As shown in FIG. 4(A), the first process of the present invention is the process of preparing a metal substrate, forming an insulating layer, press-fitting copper foil, and performing nickel plating.
在准备金属衬底的工序中,作为衬底的作用要考虑散热性、衬底强度、衬底模装性等而准备。此时,尤其是当将功率晶体管、大规模LSI、数字信号处理电路等集成在一个小型混合IC时,由于热集中,故散热性受到重视。在本实施例中,使用散热性好的、例如厚1.5mm左右的Al衬底31。在本实施例中,衬底31使用Al衬底,但是不必特别限定。In the step of preparing the metal substrate, the role of the substrate is prepared in consideration of heat dissipation, substrate strength, substrate moldability, and the like. At this time, especially when power transistors, large-scale LSIs, digital signal processing circuits, etc. are integrated into a small hybrid IC, heat dissipation is important because heat is concentrated. In this embodiment, an
例如使用印刷电路板、陶瓷衬底、金属衬底等作为衬底31也可实现本实施例。金属衬底可考虑铜衬底、铁镍衬底或由导电性好的金属构成的化合物等。This embodiment can also be realized using, for example, a printed circuit board, a ceramic substrate, a metal substrate, or the like as the
接着,衬底31表面被阳极氧化,生成氧化物,其上整个面还形成绝缘性好的例如由环氧树脂构成的树脂32。不过,若不考虑耐压,则也可省去该金属氧化物。然后,在绝缘性树脂32上压装构成混合集成电路的铜的导电箔33。在铜箔33上考虑到与例如将作为取出电极的铜箔33和有源元件35电连接的金属细线37的粘接性,在整个面上形成镀镍34。Next, the surface of the
如图4(B)所示,本发明的第二工序是用蚀刻形成局部镀镍和进行铜箔蚀刻的工序。As shown in FIG. 4(B), the second step of the present invention is a step of forming partial nickel plating by etching and etching copper foil.
在镀镍34上,利用公知的网印等仅在需要镀镍34的部分残留抗蚀剂,形成选择掩模。然后,利用蚀刻在例如形成取出电极的部位形成镀镍34a。然后,除去抗蚀剂,再次利用公知的网印等仅在作为铜箔33构成的导电图形33a需要的部分残留抗蚀剂形成选择掩模。然后通过蚀刻,在绝缘性树脂32上形成铜箔33的导电图形33a。然后,在导电图形33a上例如利用网印由环氧树脂形成树脂外敷层。当然,进行电连接的部位不形成树脂外敷层。On the nickel plating 34, a selective mask is formed by leaving a resist only on the portion where the nickel plating 34 is required by known screen printing or the like. Then,
如图4(C)所示,本发明第三工序是进行装片和引线接合的工序。As shown in FIG. 4(C), the third process of the present invention is a process of performing chip mounting and wire bonding.
在前工序形成的导电图形33a上通过焊剂40等导电性糊剂安装功率晶体管、小信号晶体管或IC等有源元件35、片状电阻、片状电容器等无源元件36,实现规定的电路。这里,也可以局部不采用焊料,而用银糊等电连接。在安装功率晶体管、半功率晶体管等有源元件35时,考虑到散热性,在有源元件35和导电路33a之间设置散热片。
其次,在半导体元件等有源元件35面朝上安装的情况下,通过接合由金属细线37电连接。如上所述电连接有源元件35和导电路33a的金属细线37考虑到和铜箔33构成的导电路33a的粘接性,经镀镍34a进行引线接合。Next, when the
这里,金属细线37特别使用Al细线37,Al细线37在空气中难于进行正球状连接,故使用针脚式接合法。但是,针脚式接合法中针脚部容易因树脂的应力而破坏,且与Au细线相比,弹性系数小,具有容易受树脂压力而被压倒的特征。因此,使用Al细线37时,尤其是形成树脂封装体41时要注意。这一点将后述。Here, Al
如图5(A)、(B)所示,本发明第四工序是进行导线连接的工序。As shown in Fig. 5(A) and (B), the fourth step of the present invention is a step of conducting wire connection.
如图5(A)所示,准备用于将来自上述混合集成电路的信号输出及输入的外部导线39。外部导线39为了用作输出输入端子由导电性的Cu、Fe-Ni等材质构成,并且,根据电流容量等决定外部导线39的宽度和厚度。在本发明的实施例中,外部导线39的强度、弹性是需要的,这一点在下道工序即传递模模装工序会详细说明。这里故要准备例如0.4~0.5mm左右厚的Fe-Ne外部导线39。然后,将外部导线39经焊料40和衬底31外周部形成的外部连接用端子38连接。此时,连接装置不限于焊料,也可以由点焊等进行连接。As shown in FIG. 5(A),
这里,如图5(B)所示,本发明的特征在于,外部导线39相对于衬底31的安装面稍稍成一角度连接。图5中,衬底背面和外部导线39的背面间以所成的角度为10度左右的方式连接。连接外部导线39和外部连接用电极38的焊料40的熔点高于下道工序即传递模模装工序所用的热硬性树脂的硬化温度设定得较低。Here, as shown in FIG. 5(B), the present invention is characterized in that the external leads 39 are connected at a slight angle with respect to the mounting surface of the
本发明的第五工序是作为本发明特征的工序,如图6及图7所示,是利用传递模进行模装的工序。利用传递模模装,用热硬性树脂49总括封装混合集成电路衬底31。The fifth step of the present invention is a characteristic step of the present invention, and as shown in FIGS. 6 and 7, is a step of molding with a transfer mold. The hybrid
为了利用传递模模装总括封装混合集成电路衬底31,混合集成电路衬底31如图6(B)所示在模腔70内必须定位。但是,在本发明中,由于是将混合集成电路衬底包括背面总括进行树脂模装,故不能使混合集成电路衬底31直接接触下模。因此,如上所述,使导线架39具有角度。如图6(B)所示,形成由压销47在混合集成电路衬底31的背面设置空间并进行固定的结构。同样,采用了即使销的个数不同也能共同使用的导线架。In order to collectively package the hybrid
具体地说,最初,如图6(A)所示,将用焊料粘接了导线架39的混合集成电路衬底31搬送到模型44及45。Specifically, first, as shown in FIG. 6(A), the hybrid
然后,参照图7,通过使导线架39的特定部分与导销46接触,进行混合集成电路衬底31的水平方向(这里指纸面的纵向及横向)的定位。然后参照图6(B),通过用压销47按压混合集成电路衬底31的外周部43固定混合集成电路衬底31厚度方向的位置。Then, referring to FIG. 7 , positioning of the hybrid
具体地说,导线架是在第一连结部39d和第二连结部39c两处连结多个导线39作为框体而保持的。自混合集成电路衬底31导出的导线的数量根据混合集成电路衬底31表面上形成的电气回路的规模而变化。但是,为了进行导线架39水平方向的定位,必须设置与导销46接触的特定的导线39a和39b,其间隔格局衬底尺寸是一定的。因此,根据衬底表面上形成的电气回路的规模导线的个数变化,这种情况下,增减与导销接触的导线以外的导线个数。这样,采用导线架根据衬底表面上形成的电气回路的规模使任意部位的导线缺齿的结构。Specifically, the lead frame is held by connecting a plurality of
如图5(B)所示,导线架39不平行于混合集成电路衬底31,是向上方倾斜连接的。如后所述,可利用导线架39的弹性进行混合集成电路衬底31的厚度方向的定位。As shown in FIG. 5(B), the
导销46如图6(A)、图6(B)及图7(A)所示,是设于下模44的凸起物。参照图7(A),导销46由与特定导线39a及39b和第一连结部39d连接的部分接触的导销46a及46b、以及自外侧与第一连结部接触的导销46c及46d形成。也就是说,通过使这四个导销与导线架39的特定部分接触,固定导线架39的图面的方向。因此,混合集成电路衬底31也在图面方向固定。The
即使在传递模模装输出及输入端子数不同的混合集成电路衬底时,由于特定导线39a及39b间隔一定,其中的导线被去掉,故也可共用模型及导销46。Even when transferring hybrid integrated circuit substrates with different numbers of output and input terminals to be molded, since the
如图6(A)、(B)所示,上模45设有压销47,导线架39如上所述用焊料向上倾斜地接合在混合集成电路衬底31上。因此,在上模45和下模44嵌合时,混合集成电路衬底31由压销47向下压,使其与下模44的底面平行。这样,模腔70内的混合集成电路衬底31完成厚度方向的位置固定。As shown in FIG. 6(A) and (B), the
如图7(B)所示,将自浇口49注入模腔70内的热硬性树脂以首先与衬底31的侧面接触的方式注入。然后,如箭头49所示注入的热硬性树脂自衬底31沿箭头49a向衬底31的上部方向及下部方向分流。此时,向衬底31的上部的流入宽度56和向衬底31的下部方向的流入宽度55形成大致相等的宽度,故热硬性树脂向衬底31下部的流入也可顺畅地进行。并且,尤其是由于树脂先充填混合集成电路衬底31的背面,故混合集成电路衬底31不会向下倾斜。另外,热硬性树脂的注入速度及注入压力也因曾于衬底31侧面接触而降低,可抑制Al细线37的折曲、断线等的影响。As shown in FIG. 7(B), the thermosetting resin injected from the gate 49 into the
由此,在本工序中可在模腔70内进行混合集成电路衬底31的定位后总括进行传递模模装,也没有热硬性树脂的注入压引起的混合集成电路衬底31的移动。因此,可用导热性好的热硬性树脂以一定厚度封装混合集成电路衬底31的背面,故可制造耐压性号且散热性优良的混合集成电路装置。Thus, transfer molding can be performed after positioning the hybrid
另外,由于连接功率晶体管、小信号晶体管及IC等有源元件35、片状电阻、片状电容器等无源元件36及外部导线39的焊料40的熔点高于热硬性树脂的熔点,故即使不用现有混合集成电路装置的罐封树脂9(参照图9)进行保护,也不会被传递模模装时的热量再熔融,不会使固定位置偏移。In addition, since the melting point of
另外,导线架的第二连结部39c具有防止进行传递模模装时热硬性树脂向模型外流出的作用。因此,在传递模模装刚结束时,如图8所示,封装的树脂连续到第二连结部39c。In addition, the second connecting
如图8所示,本发明第六工序是进行导线切断的工序。As shown in FIG. 8, the sixth step of the present invention is a step of cutting the wire.
在前工序即传递模模装工序自模型44、45以外部导线的厚度流出的树脂由形成于外部导线39的第二连结部39c挡住,直接硬化。也就是说,自外部导线39的第二连结部39c起树脂封装体4 1侧的导线间充填了流出树脂50,自外部导线39的第二连结部起前端的导线间未充填树脂。The resin that flowed out from the
然后,冲切第二连结部39c同时除去流出树脂50,根据使用目的调节外部导线39的长度,例如,在虚线51的位置切断外部导线39,使其一个个导线独立,可作为输入输出端子起作用。Then, punch the second connecting
利用上述工序,完成图1所示的混合集成电路装置。Through the above steps, the hybrid integrated circuit device shown in FIG. 1 is completed.
如上所述,本发明的混合集成电路装置的制造方法的特征在于,在传递模模装工序中,通过使特定导线与设于模型上的导销接触进行混合集成电路装置在模型内的定位。这样,在本发明的混合集成电路装置的制造方法中,可省略现有混合集成电路装置的制造方法中的支承部件的载置,并且,可大幅度提高完成的混合集成电路装置的散热性。As described above, the method of manufacturing a hybrid integrated circuit device according to the present invention is characterized in that the positioning of the hybrid integrated circuit device in the mold is performed by bringing specific leads into contact with guide pins provided on the mold in the transfer molding step. Thus, in the method of manufacturing a hybrid integrated circuit device according to the present invention, the mounting of the supporting member in the conventional method of manufacturing a hybrid integrated circuit device can be omitted, and the heat dissipation of the completed hybrid integrated circuit device can be greatly improved.
对本发明的混合集成电路装置及其制造方法,上面就全模装型混合集成电路装置进行了说明,但并不限于上述实施例。例如也可形成混合集成电路装置的背面整面露出的混合集成电路装置。这种情况下,在上述效果之外,还可得到散热性的效果。The hybrid integrated circuit device and its manufacturing method of the present invention have been described above for the fully molded hybrid integrated circuit device, but are not limited to the above embodiments. For example, a hybrid integrated circuit device may be formed in which the entire rear surface of the hybrid integrated circuit device is exposed. In this case, in addition to the above-mentioned effects, the effect of heat dissipation can also be obtained.
并且,在本实施例中,是就外部导线自衬底的一个侧面导出的单侧导线的情况进行的说明,并不限于该结构,两侧导线,四个方向导线的情况下,在上述效果之外,还可在使衬底稳定的状态下实现传递模模装工序。另外,只要不脱离本发明的要旨的范围,就可进行种种变更。In addition, in this embodiment, the description is made on the case of a single-sided lead with external leads derived from one side of the substrate, and is not limited to this structure. In the case of two-sided leads and four-direction leads, the above-mentioned effect In addition, the transfer molding process can be realized in a state where the substrate is stabilized. In addition, various changes can be made without departing from the scope of the gist of the present invention.
另外,在不将导线39a作为电信号用端子使用时,如图7a所示,也可去掉自第二连结部39c向衬底31侧的导线。In addition, when the lead wire 39a is not used as an electrical signal terminal, as shown in FIG. 7a, the lead wire from the
如上所述,本发明的混合集成电路装置的制造方法可得到如下所述的优异效果。As described above, the manufacturing method of the hybrid integrated circuit device of the present invention can obtain the following excellent effects.
在模装工序中,通过使特定导线和连结部连接的部分与设于模型上的导销接触,可在模腔内将与导线架连接的混合集成电路衬底定位后,用热硬性树脂总括进行传递模模装。由此,可以一定的厚度用导热性好的热硬性树脂封装混合集成电路衬底的背面,可制作散热性好的混合集成电路装置。另外,通过使与导销接触的导线的间隔一定,而与混合集成电路衬底的端子数无关,即使在传递模模装端子数不同的混合集成电路衬底时,也可共用模型。In the molding process, the hybrid integrated circuit substrate connected to the lead frame can be positioned in the mold cavity by making the part where the specific wire and the connection part are connected to the guide pin provided on the mold, and then wrap it with a thermosetting resin. Perform transfer molding. Thereby, the back surface of the hybrid integrated circuit substrate can be encapsulated with a thermosetting resin with good thermal conductivity at a constant thickness, and a hybrid integrated circuit device with good heat dissipation can be produced. Also, by making the intervals between the lead wires in contact with the guide pins constant regardless of the number of terminals in the hybrid IC substrate, it is possible to share a model even when transferring hybrid IC substrates with different numbers of terminals to be molded.
另外,通过在导线架与上下模型接触的部分设置连结部,可防止在模装工序中热硬性树脂自导线间的缝隙流出到模型外部。通过使该连结部的长度与混合集成电路衬底的端子数无关地一定,即使在传递模模装端子数不同的混合集成电路衬底时也可共用模型。In addition, by providing a connecting portion where the lead frame is in contact with the upper and lower molds, it is possible to prevent thermosetting resin from flowing out of the mold from the gap between the leads during the molding process. By making the length of the connecting portion constant regardless of the number of terminals of the hybrid integrated circuit substrate, it is possible to share a model even when transferring hybrid integrated circuit substrates with different numbers of molded terminals.
Claims (9)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001196987A JP4614586B2 (en) | 2001-06-28 | 2001-06-28 | Method for manufacturing hybrid integrated circuit device |
| JP196987/01 | 2001-06-28 | ||
| JP196987/2001 | 2001-06-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1395301A true CN1395301A (en) | 2003-02-05 |
| CN1249798C CN1249798C (en) | 2006-04-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021251444A Expired - Fee Related CN1249798C (en) | 2001-06-28 | 2002-06-28 | Method for manufacturing mixed integrated circuit device |
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| US (1) | US6593169B2 (en) |
| JP (1) | JP4614586B2 (en) |
| CN (1) | CN1249798C (en) |
| TW (1) | TW538661B (en) |
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| US7521290B2 (en) | 2006-02-22 | 2009-04-21 | Sanyo Electric Co., Ltd. | Method of manufacturing circuit device |
| CN101308161B (en) * | 2007-05-18 | 2011-12-07 | 株式会社电装 | Electronic device having molded resin case, and molding tool and method of manufacturing the same |
| CN113284871A (en) * | 2020-02-19 | 2021-08-20 | 珠海格力电器股份有限公司 | DBC substrate frame structure and forming jig and forming method thereof |
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| JP4413054B2 (en) * | 2004-03-29 | 2010-02-10 | 三洋電機株式会社 | Method for manufacturing hybrid integrated circuit device |
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- 2001-06-28 JP JP2001196987A patent/JP4614586B2/en not_active Expired - Lifetime
-
2002
- 2002-06-25 TW TW91113851A patent/TW538661B/en not_active IP Right Cessation
- 2002-06-27 US US10/183,757 patent/US6593169B2/en not_active Expired - Lifetime
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7521290B2 (en) | 2006-02-22 | 2009-04-21 | Sanyo Electric Co., Ltd. | Method of manufacturing circuit device |
| CN101308161B (en) * | 2007-05-18 | 2011-12-07 | 株式会社电装 | Electronic device having molded resin case, and molding tool and method of manufacturing the same |
| CN113284871A (en) * | 2020-02-19 | 2021-08-20 | 珠海格力电器股份有限公司 | DBC substrate frame structure and forming jig and forming method thereof |
| CN113284871B (en) * | 2020-02-19 | 2024-05-17 | 珠海格力电器股份有限公司 | DBC substrate frame structure, forming jig and forming method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4614586B2 (en) | 2011-01-19 |
| US20030003630A1 (en) | 2003-01-02 |
| JP2003017518A (en) | 2003-01-17 |
| CN1249798C (en) | 2006-04-05 |
| TW538661B (en) | 2003-06-21 |
| US6593169B2 (en) | 2003-07-15 |
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