CN1359031A - Original plate for lithographic printing plate - Google Patents
Original plate for lithographic printing plate Download PDFInfo
- Publication number
- CN1359031A CN1359031A CN 00134598 CN00134598A CN1359031A CN 1359031 A CN1359031 A CN 1359031A CN 00134598 CN00134598 CN 00134598 CN 00134598 A CN00134598 A CN 00134598A CN 1359031 A CN1359031 A CN 1359031A
- Authority
- CN
- China
- Prior art keywords
- lithographic printing
- printing plate
- original edition
- expression
- photopolymerization layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 54
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 18
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000005984 hydrogenation reaction Methods 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 12
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims abstract 3
- 239000002585 base Substances 0.000 claims description 49
- 239000000178 monomer Substances 0.000 claims description 32
- 239000000203 mixture Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 abstract description 7
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 239000003999 initiator Substances 0.000 abstract description 2
- 238000007645 offset printing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 37
- -1 isocyanate compound Chemical class 0.000 description 34
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 27
- 125000000217 alkyl group Chemical group 0.000 description 23
- 238000006073 displacement reaction Methods 0.000 description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 20
- 239000000049 pigment Substances 0.000 description 20
- 239000007788 liquid Substances 0.000 description 19
- 239000007864 aqueous solution Substances 0.000 description 17
- 150000001875 compounds Chemical class 0.000 description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 229910004298 SiO 2 Inorganic materials 0.000 description 13
- 150000001241 acetals Chemical class 0.000 description 13
- 125000003118 aryl group Chemical group 0.000 description 13
- 238000003384 imaging method Methods 0.000 description 12
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 10
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 10
- 238000012644 addition polymerization Methods 0.000 description 10
- 239000000975 dye Substances 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000004115 Sodium Silicate Substances 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 8
- 229910052911 sodium silicate Inorganic materials 0.000 description 8
- 125000001931 aliphatic group Chemical group 0.000 description 7
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 239000004411 aluminium Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 239000007767 bonding agent Substances 0.000 description 7
- 150000001721 carbon Chemical group 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 235000013772 propylene glycol Nutrition 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 6
- 125000002947 alkylene group Chemical group 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- ZPSJGADGUYYRKE-UHFFFAOYSA-N 2H-pyran-2-one Chemical compound O=C1C=CC=CO1 ZPSJGADGUYYRKE-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical class NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 239000003809 bile pigment Substances 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 206010034960 Photophobia Diseases 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229940125898 compound 5 Drugs 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- MCJUWBUSIQXMPY-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical class [Ti].C1C=CC=C1 MCJUWBUSIQXMPY-UHFFFAOYSA-N 0.000 description 3
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 3
- 208000013469 light sensitivity Diseases 0.000 description 3
- GQPLMRYTRLFLPF-UHFFFAOYSA-N nitrous oxide Inorganic materials [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- YYPNJNDODFVZLE-UHFFFAOYSA-N 3-methylbut-2-enoic acid Chemical compound CC(C)=CC(O)=O YYPNJNDODFVZLE-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 206010009866 Cold sweat Diseases 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 159000000013 aluminium salts Chemical class 0.000 description 2
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000005110 aryl thio group Chemical group 0.000 description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical group C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 229960001483 eosin Drugs 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 235000003642 hunger Nutrition 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- JLXZMLLNPNOODV-UHFFFAOYSA-N imidazol-4-one Chemical group O=C1C=NC=N1 JLXZMLLNPNOODV-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000001488 sodium phosphate Substances 0.000 description 2
- 229910000162 sodium phosphate Inorganic materials 0.000 description 2
- 235000011008 sodium phosphates Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- BAZVSMNPJJMILC-UHFFFAOYSA-N triadimenol Chemical compound C1=NC=NN1C(C(O)C(C)(C)C)OC1=CC=C(Cl)C=C1 BAZVSMNPJJMILC-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- KWQPWOQUXSQDNN-UHFFFAOYSA-N (2,3,4-trimethylphenyl) dihydrogen phosphate Chemical compound CC1=CC=C(OP(O)(O)=O)C(C)=C1C KWQPWOQUXSQDNN-UHFFFAOYSA-N 0.000 description 1
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical class NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- OAKFFVBGTSPYEG-UHFFFAOYSA-N (4-prop-2-enoyloxycyclohexyl) prop-2-enoate Chemical compound C=CC(=O)OC1CCC(OC(=O)C=C)CC1 OAKFFVBGTSPYEG-UHFFFAOYSA-N 0.000 description 1
- SORHAFXJCOXOIC-CCAGOZQPSA-N (z)-4-[2-[(z)-3-carboxyprop-2-enoyl]oxyethoxy]-4-oxobut-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCCOC(=O)\C=C/C(O)=O SORHAFXJCOXOIC-CCAGOZQPSA-N 0.000 description 1
- ABFQGXBZQWZNKI-UHFFFAOYSA-N 1,1-dimethoxyethanol Chemical compound COC(C)(O)OC ABFQGXBZQWZNKI-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- OGBWMWKMTUSNKE-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CCCCCC(OC(=O)C(C)=C)OC(=O)C(C)=C OGBWMWKMTUSNKE-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- KIIGEOHDCOLSHI-UHFFFAOYSA-N 1h-imidazole;naphthalene Chemical group C1=CNC=N1.C1=CC=CC2=CC=CC=C21 KIIGEOHDCOLSHI-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- ICBJBNAUJWZPBY-UHFFFAOYSA-N 2-hydroxyethyl 3-methylbut-2-enoate Chemical compound CC(=CC(=O)OCCO)C ICBJBNAUJWZPBY-UHFFFAOYSA-N 0.000 description 1
- XCQOCBLUMZLEGS-UHFFFAOYSA-N 3,4-diethoxyhexa-1,5-diene Chemical compound C(C)OC(C(C=C)OCC)C=C XCQOCBLUMZLEGS-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- CZWWCTHQXBMHDA-UHFFFAOYSA-N 3h-1,3-thiazol-2-one Chemical group OC1=NC=CS1 CZWWCTHQXBMHDA-UHFFFAOYSA-N 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- ZAOCHAKKCFKXFA-UHFFFAOYSA-N 4-ethoxyhexa-1,5-dien-3-ol Chemical compound CCOC(C=C)C(C=C)O ZAOCHAKKCFKXFA-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 206010067484 Adverse reaction Diseases 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- FGDRIJASPMFEAS-UHFFFAOYSA-N C(C(=C)C)(=O)OC(COC(C(=C)C)=O)CC(C)(C)C Chemical compound C(C(=C)C)(=O)OC(COC(C(=C)C)=O)CC(C)(C)C FGDRIJASPMFEAS-UHFFFAOYSA-N 0.000 description 1
- BBJLVBHQJYDCHY-UHFFFAOYSA-N C(C=C)(=O)O.CC(O)(C(CO)(CO)CO)C Chemical compound C(C=C)(=O)O.CC(O)(C(CO)(CO)CO)C BBJLVBHQJYDCHY-UHFFFAOYSA-N 0.000 description 1
- JBEUGZMOTLBZNU-UHFFFAOYSA-N CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(CO)(CO)CO Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(CO)(CO)CO JBEUGZMOTLBZNU-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- 241000579895 Chlorostilbon Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 241001597008 Nomeidae Species 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- VRCQPYGEMIFMFR-UHFFFAOYSA-O O=C1[S+]=CCN1 Chemical group O=C1[S+]=CCN1 VRCQPYGEMIFMFR-UHFFFAOYSA-O 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 102000004160 Phosphoric Monoester Hydrolases Human genes 0.000 description 1
- 108090000608 Phosphoric Monoester Hydrolases Proteins 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- ZCZFEIZSYJAXKS-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] prop-2-enoate Chemical compound OCC(CO)(CO)COC(=O)C=C ZCZFEIZSYJAXKS-UHFFFAOYSA-N 0.000 description 1
- SSOONFBDIYMPEU-UHFFFAOYSA-N [3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propyl] prop-2-enoate Chemical compound OCC(CO)(CO)COCC(CO)(CO)COC(=O)C=C SSOONFBDIYMPEU-UHFFFAOYSA-N 0.000 description 1
- SGGPVBOWEPPPEH-UHFFFAOYSA-N [K].[Zr] Chemical compound [K].[Zr] SGGPVBOWEPPPEH-UHFFFAOYSA-N 0.000 description 1
- QACZTJJABFVRAS-UHFFFAOYSA-N acetic acid;2-butoxyethanol Chemical class CC(O)=O.CCCCOCCO QACZTJJABFVRAS-UHFFFAOYSA-N 0.000 description 1
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 1
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 230000006838 adverse reaction Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- PRKQVKDSMLBJBJ-UHFFFAOYSA-N ammonium carbonate Chemical compound N.N.OC(O)=O PRKQVKDSMLBJBJ-UHFFFAOYSA-N 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 150000001452 anthocyanidin derivatives Chemical group 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- XYOVOXDWRFGKEX-UHFFFAOYSA-N azepine Chemical compound N1C=CC=CC=C1 XYOVOXDWRFGKEX-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- ZWIPGARCRSFMHK-UHFFFAOYSA-N benzene;1h-imidazole Chemical class C1=CNC=N1.C1=CC=CC=C1 ZWIPGARCRSFMHK-UHFFFAOYSA-N 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- CHIHQLCVLOXUJW-UHFFFAOYSA-N benzoic anhydride Chemical compound C=1C=CC=CC=1C(=O)OC(=O)C1=CC=CC=C1 CHIHQLCVLOXUJW-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000004054 benzoquinones Chemical class 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- AKOHUFLQBXMCOZ-UHFFFAOYSA-N butane-1,3-diol 3-methylbut-2-enoic acid Chemical compound CC(=CC(=O)O)C.C(CC(C)O)O AKOHUFLQBXMCOZ-UHFFFAOYSA-N 0.000 description 1
- GKRVGTLVYRYCFR-UHFFFAOYSA-N butane-1,4-diol;2-methylidenebutanedioic acid Chemical compound OCCCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O GKRVGTLVYRYCFR-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- SKOLWUPSYHWYAM-UHFFFAOYSA-N carbonodithioic O,S-acid Chemical group SC(S)=O SKOLWUPSYHWYAM-UHFFFAOYSA-N 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- VYXSBFYARXAAKO-WTKGSRSZSA-N chembl402140 Chemical compound Cl.C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-WTKGSRSZSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- UZBQIPPOMKBLAS-UHFFFAOYSA-N diethylazanide Chemical compound CC[N-]CC UZBQIPPOMKBLAS-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043276 diisopropanolamine Drugs 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- NIQCNGHVCWTJSM-UHFFFAOYSA-N dimethyl benzenedicarboxylate Natural products COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- VKFAUCPBMAGVRG-UHFFFAOYSA-N dipivefrin hydrochloride Chemical compound [Cl-].C[NH2+]CC(O)C1=CC=C(OC(=O)C(C)(C)C)C(OC(=O)C(C)(C)C)=C1 VKFAUCPBMAGVRG-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 229910052876 emerald Inorganic materials 0.000 description 1
- 239000010976 emerald Substances 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- SEACYXSIPDVVMV-UHFFFAOYSA-L eosin Y Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C([O-])=C(Br)C=C21 SEACYXSIPDVVMV-UHFFFAOYSA-L 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 229940011411 erythrosine Drugs 0.000 description 1
- 239000004174 erythrosine Substances 0.000 description 1
- 235000012732 erythrosine Nutrition 0.000 description 1
- DAOJMFXILKTYRL-UHFFFAOYSA-N ethane-1,2-diol;2-methylidenebutanedioic acid Chemical compound OCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O DAOJMFXILKTYRL-UHFFFAOYSA-N 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- LOVPPFWYZXMGGB-UHFFFAOYSA-N ethanol prop-2-enoic acid Chemical class C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(O)C LOVPPFWYZXMGGB-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- FIKFOOMAUXPBJM-UHFFFAOYSA-N hepta-2,5-dienediamide Chemical class NC(=O)C=CCC=CC(N)=O FIKFOOMAUXPBJM-UHFFFAOYSA-N 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- KUQWZSZYIQGTHT-UHFFFAOYSA-N hexa-1,5-diene-3,4-diol Chemical compound C=CC(O)C(O)C=C KUQWZSZYIQGTHT-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- UOBSVARXACCLLH-UHFFFAOYSA-N monomethyl adipate Chemical class COC(=O)CCCCC(O)=O UOBSVARXACCLLH-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N n-propyl alcohol Natural products CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- HZBAVWLZSLOCFR-UHFFFAOYSA-N oxosilane Chemical compound [SiH2]=O HZBAVWLZSLOCFR-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical class C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- CXZRDVVUVDYSCQ-UHFFFAOYSA-M pyronin B Chemical compound [Cl-].C1=CC(=[N+](CC)CC)C=C2OC3=CC(N(CC)CC)=CC=C3C=C21 CXZRDVVUVDYSCQ-UHFFFAOYSA-M 0.000 description 1
- INCIMLINXXICKS-UHFFFAOYSA-M pyronin Y Chemical compound [Cl-].C1=CC(=[N+](C)C)C=C2OC3=CC(N(C)C)=CC=C3C=C21 INCIMLINXXICKS-UHFFFAOYSA-M 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical group O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- YEMGQZDWLLBIEY-UHFFFAOYSA-M sodium;2-anilinoacetate Chemical compound [Na+].[O-]C(=O)CNC1=CC=CC=C1 YEMGQZDWLLBIEY-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 229940113165 trimethylolpropane Drugs 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The original plate for offset printing plate provided by said invention possesses enough sensitivity and image intensity, its printing resistance is excellent, specially, its small point reproducibility (high sensibility) also is good, said original plate contains polyvinyl acetal wire alkali soluble group, hydrogenation polymerization unit and photopolymerization layer with photopolymerization initiator.
Description
The present invention relates to original edition for lithographic printing plate, particularly about high sensitivity, the original edition for lithographic printing plate of superior mechanical intensity, optical polymerism.
Extensively know existing various for many years with the negative type original edition for lithographic printing plate of photopolymerizable composition as photographic layer.When utilizing this original edition for lithographic printing plate to make lithographic plate, generally be on the photographic layer (photopolymerization layer) at these original edition for lithographic printing plate, transparent negative film original copy (slabstone lithographic film) in the placement, carry out image exposure with ultraviolet ray etc., therefore, need a large amount of time of cost in the operation.
In recent years, be accompanied by the development of imaging technique, require that luminous ray is had the very photopolymer of high photosensitivity, for example, a kind of photosensitive material and the highest photo-polymerization type photosensitive material of light sensitivity that is suitable for plate-making of non-contact type projection exposure or visible light laser plate-making.As visible light laser most promising be Ar laser 488,514.5nm light, the 2nd humorous glistening light of waves (SHG-LD, 350-600nm) of semiconductor laser, the 532nm light of SHG-YAG laser etc.
In photographic layer, use the photopolymerizable composition of certain high sensitivity, on this space of a whole page, scan, original copy for type composition, picture original etc. are formed directly on the space of a whole page, thereby make without the film original copy directly plate-making become possibility with the laser that dwindles into light pencil.For example, by using special public clear 61-9621 communique, the spy opens clear 63-178105 communique, spy and the photopolymerization constituent of putting down in writing in the communique such as opens flat 2-244050 number, can not use the film original copy and directly plate-making.
Yet, use has the laser explosure device of above-mentioned LASER Light Source, when the lithographic printing plate-use version of having used these photopolymerizable compositions in the photographic layer is carried out scan exposure, make us the phenomenon that to be satisfied with below often taking place, promptly because light sensitivity and image intensity deficiency, cause printing capability inferior, particularly the repeatability of point (high light characteristic) is inferior.
This phenomenon even utilize the exposure device of other light sources except that laser, also takes place often.
Therefore, the objective of the invention is to overcome above-mentioned shortcoming of the prior art, a kind of original edition for lithographic printing plate is provided, have sufficient light sensitivity and image intensity, thereby have good anti-printing capability, particularly have good point repeatability (high light characteristic).
Present inventors through further investigation, found that for achieving the above object, and as the bonding agent composition of photopolymerization layer, have the polyvinyl acetal of alkali solubility base by use, can overcome above-mentioned shortcoming of the prior art, and so far finish the present invention.
That is, original edition for lithographic printing plate of the present invention has the photopolymerization layer that contains the polyvinyl acetal, hydrogenation polymerizable monomer and the Photoepolymerizationinitiater initiater that have the alkali solubility base.
Though there is the inferior problem of point repeatability in the master that existing photo-polymerization type lithographic printing plate is used.But we think that this is because with the point image section of the lithographic plate of this original edition for lithographic printing plate making, because of contacting the cause that very easily damaged by external force with blanket cylinder etc.
In contrast, original edition for lithographic printing plate of the present invention is as the bonding agent composition of photopolymerization layer, by containing the polyvinyl acetal of band alkali solubility base, make this polyvinyl acetal, interact with hydrogenation polymerizable monomer and supporter, to the dissolubility of alkali,, also be difficult to be subjected to the influence of external force when suppressing video picture even contact with blanket cylinder etc. during result's printing.
Below original edition for lithographic printing plate of the present invention is elaborated
(polyvinyl acetal) with alkali solubility base
At first the polyvinyl acetal to the greatest factor of original edition for lithographic printing plate of the present invention-have alkali solubility base describes.
In the photopolymerization layer of original edition for lithographic printing plate of the present invention, contained bonding agent composition though be the polyvinyl acetal with alkali solubility base, does not have particular determination to this, preferably represents with following formula (I).
[changing 1]
General expression (I)
(R
1, R
2Expression can have substituent alkyl or hydrogen atom, R
3Expression has carboxylic acid group's aliphatics or aromatic hydrocarbyl, R
4Expression can have the aliphatics of hydroxyl or itrile group or aromatic hydrocarbyl, a, b represent positive number, and c, d, e represent the number more than 0.)
As the R in the polyvinyl acetal of above-mentioned formula [I] expression
1, R
2Be that substituent alkyl or hydrogen atom can be arranged, though unqualified to this, the alkyl of 1-15 carbon atom preferably.
As the R in the polyvinyl acetal of above-mentioned formula [I] expression
3Be aliphatics or the aromatic hydrocarbyl that the carboxylic acid group is arranged, though this is not had particular determination, preferably Yi Xia material.
[changing 2]
As the R in the polyvinyl acetal of above-mentioned formula (I) expression
4Be aliphatics or the aromatic hydrocarbyl that hydroxyl or itrile group can be arranged, though this is not had particular determination, preferably Yi Xia material.
[changing 3]
(R
5, R
6Expression H or CH
3, Y represents that number, the A of 1-20 represent H or CN).
In addition, these have the polyvinyl acetal consumption of alkali solubility base, for the total composition of the photopolymerization layer of original edition for lithographic printing plate of the present invention, for 10-90 weight % (to call % in the following text), are preferably 20-70%.
[hydrogenation polymerizable monomer]
Below to second key factor in the original edition for lithographic printing plate of the present invention, the hydrogenation polymerizable monomer describes.
Contained hydrogenation polymerizable monomer in the photopolymerization layer as original edition for lithographic printing plate of the present invention, be and above-mentioned polyvinyl acetal interacts, can when video picture, suppress alkali dissolution, though this is not had special very fixed, preferably have the urethane bond base.
As hydrogenation polymerizable monomer,, can enumerate following though this is not had particular determination with urethane bond base:
I) have the alkylene oxide base of band ethene insatiable hunger two Multiple Bonds bases and the addition polymerization monomer of urethane bond base.
As the alkylene oxide base with band ethene insatiable hunger two Multiple Bonds bases and the addition polymerization monomer of urethane bond base, though this is not had particular determination, the preferably resultant of reaction of the alcohol of isocyanate compound and following formula (II) expression.
[changing 4] general expression (II)
(in the formula, R
7, R
8, R
9, R
10, R
11, R
12, R
13, R
14, R
15, R
16, R
17, R
18Represent hydrogen atom respectively, the alkyl or phenyl of 1-10 carbon atom, Y represent the base (R of hydrogen atom or following formula (III) expression
19Expression hydrogen atom or methyl).
[changing 5] general expression (III)
Wherein at least one is a hydrogen atom, X represent alkyl, aryl, alkoxy ,-base (R of OH or following formula (III) expression
19Expression hydrogen atom or methyl).
[changing 6] general expression (III)
Among all X, the Y, at least one is the base of above-mentioned formula (III) expression, n, f, g, h, i, j, k represent 0 or positive number) (R
19Expression hydrogen atom or methyl).
As the instantiation of above-mentioned isocyanate compound, in the following example shown in
[changing 7]
[changing 8]
[changing 9]
[changing 10]
As the instantiation of the alcohol of above-mentioned formula (II) expression, shown in following.
[changing 11]
R=hydrogen or methyl o, p, q, r, s, the rational number of t=0～20
These have the alkylene oxide base of band ethene unsaturated two Multiple Bonds bases and the addition polymerization monomer consumption of urethane bond base, are divided into 5-95 weight % (to call % in the following text), preferably 10-90% for the photopolymerization layer assembly of original edition for lithographic printing plate of the present invention.
The hydrogenation polymerizable monomer of ii) following formula (IV) expression
[changing 12]
General expression (IV)
(R
20Expression-(CH
2)
V-substituent aromatic series base, heterocyclic radical or alicyclic group, R maybe can be arranged
21Expression
[changing 13]
Or
[changing 14]
R
22Expression
[changing 15]
Or hydrogen atom, R
23Expression hydrogen atom or methyl, U, V represent the number more than 1.)
R in the addition polymerization monomer of above-mentioned formula (IV) expression
20Be above-mentioned expression, though this there is not particular determination, preferably shown below.
[changing 16]
The hydrogenation polymerizable monomer consumption of above-mentioned formula (IV) expression is divided into 5-95 weight % (to call % in the following text) for the photopolymerization layer assembly of original edition for lithographic printing plate of the present invention, is preferably 10-90%.
Except above-mentioned [(i) having the alkylene oxide base of the unsaturated two Multiple Bonds bases of band ethene and the hydrogenation polymerism unit of urethane bond base] and [the (ii) hydrogenation polymerizable monomer of representing with formula (IV)], as the compound of the unsaturated two Multiple Bonds bases of the ethene that can contain the hydrogenation polymerization, can from having at least 1, the compound of best two unsaturated two Multiple Bonds bases of above ethene, end select arbitrarily.
For example, these compounds can be monomer, contain 2 amount bodies, 3 aggressiveness that give of measuring body and oligomer, or their potpourri, and their chemical forms such as multipolymer.
As monomer and multipolymer thereof, the acid amides etc. of ester, unsaturated carboxylic acid and the aliphatics multivalence amines of unsaturated carboxylic acid (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, iso-crotonic acid, maleic acid etc.) and aliphatics multivalence alcoholic compound is arranged.
Ester monomer instantiation as aliphatics multivalence alcoholic compound and unsaturated carboxylic acid, as acrylate, the ethylene glycol diacrylate is arranged, the trietbhlene glycol diacrylate, 1,-3 butanediol diacrylates, the tetramethylene glycol diacrylate, the propyleneglycoles diacrylate, the neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tris (acryloyl-oxy propyl group) ether, three hydroxyl ethane triacrylates, hexanediyl ester, 1,4-cyclohexanediol diacrylate, tetrem allyl diglycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, the dipentaerythritol diacrylate, dipentaerythritol five acrylate, dipentaerythritol acrylate, the D-sorbite triacrylate, the D-sorbite tetraacrylate, D-sorbite five acrylate, D-sorbite six acrylate, three (acrylyl oxy-ethyl) chlorinated isocyanurates, polyester acrylic ester oligomer etc.
As methacrylate, the tetramethylene ethylene glycol dimethacrylate is arranged, the trietbhlene glycol dimethylacrylate, the neopentyl ethylene glycol dimethacrylate, trimethylol-propane trimethacrylate, the trimethylolethane trimethacrylate methacrylate, the ethylene glycol dimethylacrylate, the 1,3 butylene glycol dimethylacrylate, hexanediol dimethacrylate, dimethyl pentaerythritol acrylate, pentaerythritol acrylate trimethyl, pentaerythrite tetramethyl acrylate, the dipentaerythritol dimethylacrylate, dipentaerythritol hexamethyl acrylate, dipentaerythritol pentamethyl acrylate, the D-sorbite trimethyl acrylic ester, D-sorbite tetramethyl acrylate, two [P-(3-metering system oxygen-2-hydroxyl propoxyl group) phenyl] dimethylmethane, two-[P-(metering system oxygen ethoxy) phenyl] dimethylmethane etc.
As itaconate, ethylene glycol diitaconate, propyleneglycoles diitaconate, 1 are arranged, 3-butylene glycol diitaconate, 1,4-butylene glycol diitaconate, tetramethylene ethylene glycol bisthioglycolate itaconate, pentaerythrite diitaconate, D-sorbite four itaconates etc.
As crotonates, ethylene glycol two crotonatess, tetramethylene ethylene glycol bisthioglycolate crotonates, pentaerythrite two crotonatess, D-sorbite two crotonatess etc. are arranged.
As the iso-crotonic acid ester, ethylene glycol two iso-crotonic acid esters, pentaerythrite two iso-crotonic acid esters, D-sorbite four iso-crotonic acid esters etc. are arranged.
As maleate, ethylene glycol dimaleate, trietbhlene glycol dimaleate, pentaerythrite dimaleate D-sorbite four maleates etc. are arranged.
And then also can enumerate the potpourri of above-mentioned ester monomer.
Amide monomer instantiation as aliphatics multivalence amines and unsaturated carboxylic acid, methylene bis one acrylic acid amides, the two monomethyl acrylic acid amides, 1 of ethene are arranged, own methylene bis-the acrylic acid amides of 6-, 1, the own methylene bis-acrylic acid amides of 6-, diethylenetriamine three acrylic acid amides, the two acrylic acid amides of xylylene, xylylene methacrylate acid amides etc.
As other examples, put down in writing in the in addition special public clear 48-41708 communique, in 1 molecule, have on the polyisocyanate compounds of 2 above isocyanate group, addition contain the ethene urethane compound etc. of 2 above polymerism vinyl in 1 molecule with the vinyl monomer with hydroxyl of following formula (A) expression.
CH
2＝C(Q
1)COOCH
2CH(Q
2)OH(A)
(but, Q
1And Q
2Represent H or CH individually
3).
Can also enumerate, urethane acrylate class, the spy that the spy opens clear 51-37193 number record opens the polyester acrylate class of putting down in writing in clear 48-64183 number, special public clear 49-43191 number, special public clear 52-30490 number each communique, and epoxy resin and the reaction of (methyl) acrylic acid generate polyfunctional acrylate and methacrylates such as epoxy acrylate class.And then, as photo-hardening monomer and oligomer, also can use and introduce in the Japanese bonding will Vol.20No7.300-308 of the association page or leaf (1984).
These remove (i) and have the alkylene oxide base of the unsaturated two Multiple Bonds bases of band ethene and the addition polymerization monomer of urethane bond base, (ii) with the addition polymerization monomer of above-mentioned formula (IV) expression, outside can contain, but addition polymerization monomer consumption with the unsaturated two Multiple Bonds bases of addition polymerization ethene, photopolymerization layer assembly for original edition for lithographic printing plate of the present invention is divided into 5-90% weight (to call % in the following text), is preferably 10-18%.
[Photoepolymerizationinitiater initiater]
Below to the 3rd key factor in the original edition for lithographic printing plate of the present invention, Photoepolymerizationinitiater initiater describes.
Contained Photoepolymerizationinitiater initiater in the photopolymerization layer as original edition for lithographic printing plate of the present invention, can be according to the wavelength that uses light source, suitably select known various Photoepolymerizationinitiater initiaters in patent, the document etc., perhaps also with the Photoepolymerizationinitiater initiater more than 2 kinds (photopolymerization initiator system), the Photoepolymerizationinitiater initiater that uses separately among the present invention, and, can be referred to as Photoepolymerizationinitiater initiater or light trigger with the Photoepolymerizationinitiater initiater more than 2 kinds.
For example, when using near the light of 400nm to make light source, be extensive use of dibenzoyl, benzoyl ether, rice phase Le Shi ketone, anthraquinone, sulphur xanthone, acridine, azophenlyene, benzophenone etc.
With the above visible light of 400nm, Ar laser, the 2nd higher harmonics of semiconductor laser, when SHG-YAG laser is made light source, various light triggers have also been proposed, for example can enumerate certain photo-reduction dyestuff of No. 2850445 record of United States Patent (USP), Rose Bengal for example, tetrabromofluorescein, erythrosine etc., or the combined system of dyestuff and light trigger, for example, the composite initiation system of dyestuff and amine (special public clear 44-20189 number), Hexaarylbiimidazole, the paralled system of free radical generating agent and dyestuff (special public clear 45-37377 number), Hexaarylbiimidazole and P-dialkyl amido benzene fork ketoboidies system (special public clear 47-2528 number, the spy opens clear 54-155292 number), the system of ring-type cis-α-dicarbonyl compound and dyestuff (spy opens clear 48-84183 number), the system of ring-type triazine and merocyanine pigment (spy opens clear 54-151024 number), (spy opens clear 52-112681 number the system of 3-coumalin and activating agent, the spy opens clear 58-15503 number), diimidazole, styrene derivative, the system of mercaptan (spy opens clear 59-140203 number), (spy opens clear 59-1504 to the system of organic peroxide and pigment, the spy opens clear 59-140203 number, the spy opens clear 59-189340 number, the spy opens clear 62-174203 number, special public clear 62-1641 number, No. the 4766055th, United States Patent (USP)), (spy opens clear 63-178105 number for dyestuff and active halid system, the spy opens clear 63-258903 number, Te Kaiping 2-63054 number etc.), (spy opens clear 62-143044 number the system of dyestuff and borate compound, the spy opens clear 62-150242 number, the spy opens clear 64-13140 number, the spy opens clear 64-13141 number, the spy opens clear 64-13142 number, the spy opens clear 64-17048 number, Te Kaiping 1-229003, Te Kaiping 1-298348 number, Te Kaiping 1-138204 number etc.), (spy opens flat 2-179643 number to have the system of the pigment and the free radical generating agent of rhodanine ring, Te Kaiping 2-244050 number) two luxuriant titaniums and coumalin be the system (spy opens clear 63-221110 number) of pigment, but two luxuriant titaniums and xanthene are to contain the combined system of ethene unsaturated compound of addition polymerization of amino or urethane groups on the pigment (spy opens flat 4-221958 number, Te Kaiping 4-219756 number), the system (spy opens flat 6-295061 number) of two luxuriant titaniums and specific merocyanine pigment, two luxuriant titaniums and have the system (special be willing to flat 7-164583 number etc.) of the pigment of benzene bile pigments ring.
Best light trigger as pigment, can use cyanine system, and merocyanine system, xanthene system, coumalin system, benzene bile pigments system as initiating agent, can use the combination of two cyclopentadiene titanium compounds, triaizine compounds.
As cyanine is pigment, and best enumerating has following structure, this do not had a particular determination.
[changing 17]
(in the formula, Z
1And Z
2Expression form benzene imidazoles or the needed non-metallic atom group of naphthalene imidazole ring, can be identical, also can be different.R
24, R
25, R
26And R
27Represent replaceable alkyl respectively, X
-The expression negative ion is right, and n is 0 or 1).
It is the instantiation of pigment that cyanine has been shown in the following table 1
[table 1]
R
24R
25R
26R
27A B C D X
-NC
2H
5C
2H
5C
2H
5C
2H
5Cl Cl Cl Cl I
-1C
2H
5C
2H
5C
2H
5C
2H
5H CF
3H CF
3I
-1 (CH
2)
2SO
3Na C
2H
5(CH
2)
2SO
3 -C
2H
5Cl Cl Cl Cl-0
As merocyanine is pigment, and best enumerating has following structure, this do not had a particular determination.
[changing 18]
(in the formula, Z
1And Z
2Needed non-metallic atom group when representing the nitrogen heterocyclic ring with 5 yuan of normally used formation of anthocyanidin ring and/or 6 yuan of rings respectively, R
28, R
29Represent alkyl respectively, Q
1And Q
2Expression utilizes needed former subgroup when being combined to form 4-oxazoline ketone ring, 5-oxazoline ketone ring, 4-imidazolone ring, 4-thiazolinone ring, 5-thiazolinone ring, 5-imidazolone ring or 4-two mercapto ketone rings.L
1, L
2, L
3, L
4And L
5Represent methine respectively, m represents 1 or 2.I, h represent 0 or 1 respectively, and l represents 1 or 2, and j, k represent 0,1,2 or 3 respectively, X-represent negative ion to).
[changing 19]
(R in the formula
30And R
31Represent hydrogen atom, alkyl, displacement alkyl, alkenyl, displacement alkenyl, alkynyl, displacement alkynyl, alkoxy carbonyl group, aryl, displacement aryl or aralkyl separately separately.A represents the nitrogen-atoms of oxygen atom, sulphion, plasma selenium, tellurium ion, displacement alkyl or aryl or the carbon atom of displacement dialkyl group.X represents to form needed non-metallic atom group when containing the azepine five-membered ring.Y represents to replace phenyl, do not have the polynuclear aromatic ring of displacement or displacement or does not have displacement or the assorted aromatic rings of displacement; Z represents hydrogen atom, alkyl, displacement alkylaryl, displacement aryl, aralkyl, alkoxy, alkylthio group, arylthio, displacement amino, acyl group or alkoxy carbonyl group, and also can mutually combine with Y forms ring.
Below the expression merocyanine is the instantiation of pigment.
[changing 20]
[changing 21]
As xanthene is pigment, can enumerate rhodamine B, rhodamine 6G, ethyl tetrabromofluorescein, pure soluble acidic eosin, Pyronine Y, Pyronine B etc.
As coumalin is pigment, can enumerate to have following structure, but unqualified.
[changing 22]
(in the formula, R
32, R
33And R
34Represent hydrogen atom, halogen atom, alkyl or alkoxy, R respectively
34And R
35The alkyl, the R that represent 4-16 carbon atom of at least one expression of alkyl respectively
37The base of expression hydrogen atom, alkyl, alkoxy, acyl group, cyano group, carboxyl or its ester derivant or amide derivatives; R
38Expression the total number of carbon atoms is 3-17 heterocycle residue-CO-R
39, R
33And R
34, R
35And R
36Can mutually combine and form ring, R
39It is base shown below.)
[changing 23]
R
39: alcoxyl
It is the instantiation of pigment that coumalin below is shown
[changing 24]
As the benzene bile pigments, can enumerate and to have following structure, but unqualified.
[changing 25]
(in the formula, R
3-R
5Represent hydrogen atom, halogen atom, alkyl, aryl, hydroxyl, alkoxy or amino independent of one another.R
3-R
5Also can form ring by non-metallic atom together with each combinative carbon atom.
R
7Expression hydrogen atom, alkyl, aryl, heteroaromatic base, cyano group, alkoxy, carboxyl or alkenyl, R
5Be R
7The expression the base or-Z-R
7, Z represents carbonyl, sulfonyl, sulfinyl or propine dicarbapentaborane.R
7And R
8Also can form ring by non-metallic atom.
A represents O, S, NH or has substituent nitrogen-atoms.B is [changing 26]
Base,
G
1, G
2Can be the same or different expression hydrogen atom, cyano group, alkoxy carbonyl group, aryloxy carbonyl, acyl group, aromatic carbonyl, alkylthio group, arylthio, alkane sulfonyl, arylsulfonyl or fluorosulfonyl, but G
1And G
2Can not be hydrogen atom simultaneously, G
1And G
2Also can form ring by non-metallic atom with carbon atom.)
The instantiation of benzene bile pigments below is shown
[changing 27]
As the triaizine compounds of Photoepolymerizationinitiater initiater, can enumerate formal compound.
[changing 28]
(in the formula, Hal represents halogen atom, Y
2Expression-C (Hal)
3,-NH
2,-NHR
21,-N (R
21)
2,-OR
21R
21Expression alkyl, displacement alkyl, aryl, displacement aryl, R
20Represent a C (Hal)
3, alkyl, displacement alkyl, aryl, displacement aryl, displacement alkenyl.)
The instantiation of triaizine compounds below is shown.
[changing 29]
As best Photoepolymerizationinitiater initiater, two cyclopentadiene titanium compounds are arranged.
As two cyclopentadiene titanium compounds, for example can suitably select for use the spy to open clear 59-152396 number, spy and open the known compound of putting down in writing in the clear 61-151197 communique.
More specifically can enumerate two-cyclopentadienyl-Ti-two-chloride, two-cyclopentadienyl-Ti-pair-phenyl, two-luxuriant-Ti-two-2,3,4,5,6-phenyl-pentafluoride-1-base (following note is made A-1), two-cyclopentadienyl-Ti-two-2,3,5,6-phenyl tetrafluoride-1-base, two-cyclopentadienyl-Ti-two-2,4,6-trifluoro-benzene-1-base, two-cyclopentadienyl-Ti-is two-2,6-two fluorobenzene-1-base, two-cyclopentadienyl-Ti-is two-2,4-two fluorobenzene-1-base, two-first cyclopentadienyl-Ti-two-2,3,4,5,6-phenyl-pentafluoride-1-base (following note is made A-2), two-first cyclopentadienyl-Ti-two-2,5,6-phenyl tetrafluoride-1-base, two-first cyclopentadienyl-Ti-is two-2,4-two fluorobenzene-1-base, two (cyclopentadienyls)-two (2,6-two fluoro-3-(pyridine-1-yl) phenyl) titanium (following note is made A-3).
The contained concentration of these Photoepolymerizationinitiater initiaters in the photopolymerization layer of lithographic plate of the present invention generally is seldom.When too much inadequately, can produce bad results such as cutting off light.Therefore, the amount of Photoepolymerizationinitiater initiater among the present invention, the total amount for adhesive ingredients and hydrogenation polymerizable monomer composition is preferably 0.01-70 weight %, and more preferably 1-50 weight % can obtain good result.
Also can add auxiliary agents such as amines, mercaptan compound in the initiating agent, good especially is amines and the amino acids of representing with following formula.
[changing 30]
(in the formula, R
8-R
18Represent alkyl respectively)
[changing 31]
(in the formula, R
19-R
22Expression alkyl, alkoxy, R
21And R
22Can form ring, R
23Expression heterocycle, alkylthio group.)
[changing 32]
(in the formula, R
28, R
29Can be identical or inequality, expression can have the substituent alkyl or the heterocyclic radical that also can contain unsaturated link.R
26-R
27Can be identical or inequality, the expression hydrogen atom can have alkyl, heterocyclic radical, hydroxyl, replace oxygen base, sulfydryl, displacement sulfenyl that sub stituent also can contain unsaturated link.R
26, R
27Can mutually combine forms ring, be illustrated on the binding main chain of ring to contain-O-,-NR-,-O-CO-,-NH-CO-,-S-and/or-SO
2-the alkylene base of 2-8 carbon atom.R
24, R
25Represent hydrogen atom, can have alkyl or displacement carbonyl that sub stituent also can contain unsaturated link.)
Dialkyl group benzoates, 4 such as P-diethylamino benzoate can have been enumerated, two amino benzophenones, 4 such as 4 '-two (dimethylamino) benzophenone, two aminobphenyl acyls such as 4 '-two (diethylamino) dibenzoyl.
[changing 33]
N-phenylglycine, N-phenylglycine sodium salt etc.
In the photopolymerization layer of original edition for lithographic printing plate of the present invention, except above basis,, preferably add a spot of thermal polymerization inhibitor in order to stop in the composition of photopolymerization layer is made or the unnecessary thermal polymerization of addition polymerization monomer generation in preserving.As suitable thermal polymerization inhibitor, quinhydrones is arranged, P-methoxy phenol, two-t-butyl-P-cresols, 1,2,3,-thrihydroxy-benzene, t-butyl-catechol, benzoquinones, 4,4 ' one sulfenyl two (3-methyl-6-t-J base phenol), 2, the cerous salt of 2 '-methylene bis (4-tetramethyl-6-t-butylphenol), N-nitrous phenyl hydramine, the aluminium salt of N-nitrous phenyl hydramine etc.The addition of thermal polymerization inhibitor is for the amount of the total composition of photopolymerization layer composition of original edition for lithographic printing plate of the present invention.Be preferably 0.01-5%.Also can be as required, for the obstruction of anti-block to polymerization, add the advanced higher fatty acid derivative of behenic acid Huo Yu acid acid amides one class etc., in the dry run after coating, make all surface of photopolymerization layer all want dry, the addition of advanced higher fatty acid derivative is 0.5-10% for well for the weight of the total composition of photopolymerization layer composition of original edition for lithographic printing plate of the present invention.
And then with the purpose that is colored as of photopolymerization layer, also can add colorant, as colorant, pigment, ethyl violet rowland, crystal formation violet, azo dyes, anthraquinone based dye, cyanine based dyes such as phthalocyanine series pigments (C.I Pigment Blue 15: 3,15: 4,15: 6 etc.), azo pigment, carbon black, titanium dioxide are for example arranged.The addition of dyestuff and pigment is 0.5-5% for well for the weight of the total composition of photopolymerization layer composition of original edition for lithographic printing plate of the present invention.
In addition, for improving the rerum natura of cured film, also can add the adjuvants such as plasticizer of inorganic filler or dioctyl phthalate (dop), dimethyl phthalate ester, trimethylphenyl phosphate etc.Its addition is preferably in below 10% for total composition weight of photopolymerization layer composition of the present invention.
In the photopolymerization layer composition of original edition for lithographic printing plate of the present invention,, also can add surfactant for improving the coated face quality.
When the photopolymerization layer with original edition for lithographic printing plate of the present invention is coated on the supporter, it can be dissolved in the various organic solvents for using.As the solvent that uses this moment, acetone is arranged, methyl ethyl ketone, cyclohexane, the ethylene glycol monomethyl ether, ethylene glycol list ether, the ethylene glycol dimethyl ether, the propyleneglycoles monomethyl ether, propyleneglycoles list ether, diacetone, cyclohexanone, diacetone alcohol, the ethylene glycol methyl ether acetate, ethylene glycol ether acetic acid esters, ethylene glycol list isopropyl ether, ethylene glycol monobutyl ether acetic acid esters, 3-methoxy propyl alcohol, methoxy methoxy ethanol, the divinyl glycol monoethyl ether, the divinyl ethylene glycol monoethyl ether, diethyleneglycol dimethyl ether, the divinyl ethylene glycol diethyl ether, the propyleneglycoles methyl ether acetate, the propyleneglycoles monoethyl ether acetate, 3-methoxycarbonyl propyl acetic acid esters, N, dinethylformamide, dimethyl sulfoxide (DMSO), gamma-butyrolacton, methyl lactate, ethyl lactate etc.These solvents can use separately also can mix use.
Solid component concentration in the coating solution, % is more suitable for 1-50 weight.
In the lithographic printing plate-use version of the present invention, photopolymerization layer by complexor, in dried weight, optimum range is 0.1-10g/m
23-5g/m more preferably
2, 0.5-3g/m
2Especially good.
As the supporter that uses in the original edition for lithographic printing plate of the present invention, use the plate object of dimensionally stable, as the plate object of dimensionally stable.There are paper, plastics (for example tygon, polypropylene, polystyrene etc.) to form the paper of lamination, perhaps, sheet metals such as aluminium (comprising aluminium alloy), zinc, copper for example, and then, for example the plastic sheeting of classes such as cellulose diacetate, Triafol T, Triafol T, cellulose propionate, butyric acid cellulose, butyric acid cellulose acetate, cellulose nitrate, tygon terephalic acid ester, tygon, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, as the paper of above-mentioned metal laminated or evaporation or plastic foil etc.In these supporters, the size of aluminium sheet is the most stable, and cheaply desirable especially, the composite sheet that the aluminium flake on fitting on the tygon terephalic acid ester film of record forms in preferably special public clear 48-18327 number.
For having the metal surface, particularly have the aluminium surface supporter, preferably carry out graining processing, sodium silicate, fluoridize dip treating in the aqueous solution such as potassium zirconium, phosphate, or surface treatment such as anodized.
After preferably the graining processing is carried out in use, in sodium silicate aqueous solution, carry out dip treating again.As record in the public clear 47-5125 of spy number, aluminium sheet carried out anodized after, in alkali metal silicate aqueous solution, carry out dip treating again.Implement above-mentioned anodized, for example, organic acids such as mineral acids such as phosphoric acid, chromic acid, sulfuric acid, boric acid or oxalic acid, sulfaminic acid their salt is water-soluble or one or two or more kinds combination electrolytic solution of non-aqueous solution in, make anode with aluminium sheet, pass to electric current and implement.
To electroplate also be effective to the silicate of record in No. the 3658662nd, the United States Patent (USP).
And then open clear 52-58602 number, spy the public clear 46-27481 of spy number, spy and open in clear 52-30503 number disclosedly, on the supporter of implementing the electrolysis scrubbing, recombinant is implemented the surface treatment that anodized and sodium silicate are handled.
Open in clear 56-28893 number disclosedly as the spy, carry out mechanical asperitiesization, chemical corrosion, electrolytic decontaminating, anodized and sodium silicate successively and handle.
And then after these are handled, being coated with coating up and down, this time coating is water miscible resin, for example has polyvinylphosphonic acid, sulfonic polymkeric substance and multipolymer, polyacrylic acid, water-soluble metal salt (for example Firebrake ZB) or weld, an amine salt etc. on side chain.
Open in flat 7-159983 number disclosedly as the spy, utilize free radical to cause addition reaction, with the sol-gel treatment substrate of the total combination of functional group that obtains, also fine use.
Except implementing the hydrophilicity-imparting treatment for making supporting body surface form water wettability, implement these hydrophilicity-imparting treatment also for preventing to be located at the adverse reaction of the photopolymerization layer composition on the supporter, and for the adherence that improves photopolymerization layer etc.
For the photopolymerization layer that is located on the supporter, for preventing that airborne oxygen from producing, son suppresses polymerization, the protective seam that is formed by good disconnected oxygen polymkeric substance can also be set, for example polyvinyl alcohol (PVA), polyvinylpyrrolidone, acid cellulose class etc.About the coating process of this protective seam, for example No. the 34583111st, United States Patent (USP), spy open write up in clear 55-49729 number.
Original edition for lithographic printing plate to the above-mentioned photopolymerization layer of coating on above-mentioned supporter obtains directly exposes as the above-mentioned Ar of utilization laser, YAG-SHG laser etc.
After carrying out image exposure, carry out video picture and handle, the imaging liquid that uses in handling as this video picture can use current known alkaline aqueous solution.Inorganic alkaline agent such as sodium silicate, potassium silicate, sodium phosphate, potassium phosphate, ammonium phosphate, dibastic sodium phosphate, potassium hydrogen phosphate, ammonium hydrogen phosphate, sodium carbonate, sal tartari, hartshorn salt, sodium bicarbonate, saleratus, ammonium bicarbonate, sodium borate, potassium borate, ammonium borate, NaOH, ammonium hydroxide, potassium hydroxide and lithium hydroxide are for example arranged.Also can use organic basic agent such as monomethyl amine, dimethyl amine, Trimethylamine, single ethylamine, diethylamide, triethylamine, single isopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, aziridine, ethylene diamine, pyridine.
These alkaline agents can use separately, also can be used in combination more than two kinds.
In the above-mentioned alkaline aqueous solution, the imaging liquid of bringing into play one section effect according to the present invention is the aqueous solution that contains more than the pH12 of alkali silicate.Can be according to the silicon oxide sio of silicate moisture
2With alkali metal oxide M
2The ratio of O is (generally with [SiO
2]/[M
2O] mol ratio represent) and concentration, regulate the video picture of alkali metal silicate aqueous solution, for example, the spy opens in the clear 54-62004 communique disclosed, SiO
2/ Na
2The mol ratio of O is 1.0-1.5 (i.e. [SiO
2]/[Na
2O] be 1.0-1.5), SiO
2Content is to put down in writing [SiO in the sodium silicate aqueous solution of 1-4 weight % and the special public clear 57-7427 communique
2]/[M] be 0.5-0.75 (i.e. [SiO
2]/[M
2O] be 1.0-1.5), SiO
2Concentration be 1-4 weight %, and this imaging liquid is a benchmark there to be total alkaline metal gram-atom wherein, contains 20% potassium at least, the aqueous solution of this alkali silicate is the most handy.
And then, use automatic developing device, when this original edition for lithographic printing plate is carried out video picture, known that the aqueous solution (replenishing liquid) by will be higher than imaging liquid base strength joins in the imaging liquid, can needn't change the imaging liquid in the video picture groove for a long time, handled a large amount of original edition for lithographic printing plate, also preferably use this arbitrary way among the present invention, for example, it is disclosed to use the spy to open in the clear 54-62004 communique, the SiO of imaging liquid
2/ Na
2The O mol ratio is 1.0-1.5 (i.e. [SiO
2]/[Na
2O] be 1.4-1.5), SiO
2Content is the sodium silicate aqueous solution of 1-4 weight %, and according to the treatment capacity of negative type original edition for lithographic printing plate, continuously or intermittently adds SiO in imaging liquid
2/ Na
2The mol ratio of O is 0.5-1.5 (i.e. [SiO
2]/[Na
2O] be 0.5-1.5) the method for sodium silicate aqueous solution (replenish liquid), and then in the public clear 57-7427 communique of spy the most suitable disclosed developing method, feature is with [SiO
2]/M is 0.5-0.75 (i.e. [SiO
2]/[M
2O] be 1.0-1.5), SiO
2Concentration is that the alkali metal silicate salt solution of 1-4 weight % is made imaging liquid, as [the SiO of the alkali silicate that replenishes liquid
2]/M] be 0.25-0.75 (i.e. [SiO
2]/[M
2O] be 0.5-1.5), and, this imaging liquid and should replenish in liquid any one, the benchmark with total alkaline metal gram-atom of wherein existing contains 20% potassium at least.
So carry out the lithographic plate that video picture is handled, as the spy open clear 54-8002 number, spy open clear 55-115045 number, spy open clear 59-58431 number etc. put down in writing in the communique, water wash water, the washing fluid that contains surfactant etc., the hyposensitization liquid that contains Arabic latex or starch derivative etc. are handled.For aftertreatment, these processing can be carried out myriad combinations and use by the lithographic plate of original edition for lithographic printing plate of the present invention.
After the video picture or after at random carrying out aftertreatments such as above-mentioned hyposensitization processing, utilize said method to carry out blanket exposure, the lithographic plate that obtains like this is installed on the offset press, is used for the printing of a large amount of numbers.
Remove the employed blade type remover of edition last dirt during as printing, can use known PS version blade type remover, CL-1, CL-2, CP, CN-4, CN, CG-1, PC-1, SR, IC (Fuji Photo Film Co., Ltd.'s system) etc. are for example arranged.
Below enumerate embodiment the present invention is described, but the present invention is not limited in these embodiment.
[embodiment 1-14, comparative example 1 and 2]
The aluminium sheet that (making of original edition for lithographic printing plate) is thick with 0.30mm uses nylon bruss and 400 purpose float stone aqueous suspensions, behind its surface enforcement graining, washes again.70 ℃ of following 60 seconds of dipping in 10% sodium hydrate aqueous solution, implement corrosion after, after the circulating water flushing, with the washing that neutralizes of 20% aqueous solution of nitric acid, follow and wash again.With it at V
AUnder the condition of=12.7V, use simple alternating current waveform electric current, in 1% aqueous solution of nitric acid, with 160 coulombs/dm
2The anode electric weight carry out the processing of electrolysis asperities.When measuring its surfaceness 0.6 μ (Ra represents).Then flood in 30% aqueous sulfuric acid, 55 ℃ of following crude removals are after 2 minutes, in 20% aqueous sulfuric acid, with current density 2A/dm
2, carrying out 2 minutes anodized, the anodic oxidation thickness of formation is 2.7g/m
2
Below, modulate the liquid composition (sol solutions) of SG method by following order.
[sol solutions]
Phosmer-PE 24 weight portions
(trade name, UNI KCC system)
Methyl alcohol 130 weight portions
Water 20 weight portions
85% phosphatase 11,6 weight portions
Tetrem oxosilane 50 weight portions
3-metering system oxygen propyl group three monosilanes 48 weight portions
After above-mentioned substance mix stirred, confirm heating in the time of about 5 minutes, react 60 clocks after, reactant is changed in other containers, add 3000 weight portion methyl alcohol, obtain sol solutions.
, be coated with gyrator on substrate this sol solutions dilution with methyl alcohol/ethylene glycol=9/1 (weight ratio), form the Si amount and be 3mg/m
2, 100 ℃ following dry 1 minute.
By the following optical polymerism composition of forming, making drying coated weight is 1.4g/m on the substrate of handling like this
2, 80 ℃ were descended dry 2 minutes, and formed photopolymerization layer.
[sensitization liquid]
Following bonding agent (using bonding agent, amount to list in table 2)
Following monomer (using monomer, amount to list in table 2)
Following compound 1 (consumption is listed in table 2)
Following compound 2 (consumption is listed in table 2)
Following compound 3 (consumption is listed in table 2)
Following compound 4 (consumption is listed in table 2)
Following compound 5 (consumption is listed in table 2)
15: 6/ (A)-3/2 of copper phthalocyanine (Pigment blue) disperse thing 0.5g
Megafac?F-177
(trade name, chemical industry (strain) system, fluorine surfactant) 0.02g
The aluminium salt of N-nitrous phenyl hydramine (with the pure medicine system of light) 0.015g
Propyleneglycoles monomethyl ether 27.5g
Methyl ethyl ketone 19.0g
The bonding agent that uses and the structure of monomer are as follows
[changing 34]
[changing 35]
M-2
Under remember in the general expression (IV) R
20For
R
21, R
22For
M-3
Under remember in the general expression (IV) R
20For
R
21For
R
22For
M-4
Under remember in the general expression (IV) R
20 R
21, R
22For
General expression (IV)
The structural formula of above-claimed cpd 1-5 is as follows
[changing 36]
Compound 4
Compound 5
Coating is by the following water soluble protective layer that forms of forming on this photopolymerization layer, and making drying coated weight is 2.5g/m
2, 100 ℃ following dry 3 minutes.
Polyvinyl alcohol (PVA) 22g
(98.5 moles of % of saponification degree, the degree of polymerization 550)
The Japanese latex of non-ionic surfactant (BMALBXNP-10 (strain)) society system) 0.5g
With the original edition for lithographic printing plate that makes like this, (SHG-YAG, 532nm), the line number is that 175 lpi, resolution are 2540 kpi, carries out image exposure with various energy to use the system Plate Jet of Cymbolic Sciences society 4 blade apparatus.
And then, implement 12 seconds back heat treated down at 110 ℃ subsequently for improving the film hardenability.
Use the aqueous solution of 18 times of Fujiphoto (strain) DP-4 imaging liquid dilute with waters, with the system 850NX of this society automatic developing device, 30 ℃ flooded for 15 seconds down, carry out video picture.
Liquid with the dilution in 1: 1 of Fujiphoto (strain) FP-2W emulsion water carries out the emulsion picture.
By following the galley that makes is like this estimated.
The printability resistance review, the SOR-KZ printing machine of use Heidelberg society system, moistening water, the MXE2% dilution of use Emerald Premium uses the big Japanese Anchor system GEOS-G of society (N) to make printing ink.
So-called actual printability resistance is to be illustrated in the actual print part not produce phenomenon such as decoherence, the number that can normally print.
High light printability resistance is the printing number that reproduce on printed article 2% site of expression 175 lpi.
The being clamminess property evaluation of photopolymerization layer makes the plate that has been coated with photopolymerization layer overlapping with the name plate, and the roller that makes 60 ℃ is with 15kg/cm
2Pressure by the time, the degree of photopolymerization layer transfer printing on aluminium sheet, transfer printing is few is taken as " zero ".
The results are shown in table 2
Table 2
| Embodiment | Compound 1 | Compound 2 | Compound 3 | Compound 4 | Compound 5 | Bonding agent (g) | Monomer (g) | Sensitivity (mJ/cm 2) | Actual anti-brush (ten thousand pieces) | High light printability resistance (ten thousand pieces) | The being clamminess property of photopolymerization layer |
| Embodiment 1 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-3(2.0) | ????M-1(2.0) | ??0.08 | ????18 | ????6 | ????○ |
| Embodiment 2 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-3(2.0) | ????M-2(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 3 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-3(2.0) | ????M-3(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 4 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-3(2.0) | ????M-4(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 5 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-3(2.0) | ????M-5(2.0) | ??0.08 | ????18 | ????6 | ????○ |
| Embodiment 6 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-3(2.0) | ????M-6(2.0) | ??0.08 | ????18 | ????6 | ????○ |
| Embodiment 7 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-1(2.0) | ????M-2(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 8 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-2(2.0) | ????M-2(2.0) | ??0.08 | ????18 | ????6 | ????○ |
| Embodiment 9 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-4(2.0) | ????M-2(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 10 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-5(2.0) | ????M-2(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 11 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-1(2.0) | ????M-1(1.0) ????/M-2(0.5) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 12 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-1(1.0) ??/B-3(1.0) | ????M-1(1.0) ????/M-2(0.5) | ??0.08 | ????20 | ????7 | ????○ |
| Embodiment 13 | ?- | ??- | ??0.5 | ??0.15 | ??0.2 | ??B-1(2.0) | ????M-2(2.0) | ??0.08 | ????18 | ????6 | ????○ |
| Embodiment 14 | ?- | ??- | ??0.5 | ??0.15 | ??0.2 | ??B-3(2.0) | ????M-2(2.0) | ??0.08 | ????20 | ????7 | ????○ |
| Comparative example 1 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-6(2.0) | ????M-2(2.0) | ??0.12 | ????13 | ????2 | ????△ |
| Comparative example 2 | ?0.15 | ??0.2 | ??0.5 | ??- | ??- | ??B-7(2.0) | ????M-2(2.0) | ??0.12 | ????13 | ????2 | ????△ |
Claims (5)
1, a kind of original edition for lithographic printing plate is characterized in that: cried out photosensitive layer on substrate, described photosensitive layer is the photopolymerization layer that comprises polyvinyl acetal, hydrogenation polymerizable monomer and the Photoepolymerizationinitiater initiater of band alkali solubility base.
2, original edition for lithographic printing plate according to claim 1 is characterized in that: the described polyvinyl acetal consumption that contains band alkali solubility base is 10～90 weight % of the total composition content of photopolymerization layer.
3, original edition for lithographic printing plate according to claim 1 is characterized in that: described hydrogenation polymerizable monomer consumption is 5～95 weight % of the total composition content of photopolymerization layer.
4, original edition for lithographic printing plate according to claim 1 is characterized in that: described Photoepolymerizationinitiater initiater consumption is 0.01～70 weight % of adhesive ingredients and hydrogenation polymerizable monomer total amount.
5, original edition for lithographic printing plate according to claim 1 is characterized in that: the photopolymerization layer of described original edition for lithographic printing plate is about 0.1～10g/m by complexor
2, in weight after the drying.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00134598 CN1359031A (en) | 2000-12-11 | 2000-12-11 | Original plate for lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00134598 CN1359031A (en) | 2000-12-11 | 2000-12-11 | Original plate for lithographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1359031A true CN1359031A (en) | 2002-07-17 |
Family
ID=4596306
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 00134598 Pending CN1359031A (en) | 2000-12-11 | 2000-12-11 | Original plate for lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1359031A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102548770A (en) * | 2009-09-29 | 2012-07-04 | 富士胶片株式会社 | Method for producing planographic printing plate precursor |
| CN103879168A (en) * | 2012-12-21 | 2014-06-25 | 乐凯华光印刷科技有限公司 | Thermosensitive plate with long printing stroke |
-
2000
- 2000-12-11 CN CN 00134598 patent/CN1359031A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102548770A (en) * | 2009-09-29 | 2012-07-04 | 富士胶片株式会社 | Method for producing planographic printing plate precursor |
| CN103879168A (en) * | 2012-12-21 | 2014-06-25 | 乐凯华光印刷科技有限公司 | Thermosensitive plate with long printing stroke |
| CN103879168B (en) * | 2012-12-21 | 2016-02-17 | 乐凯华光印刷科技有限公司 | A kind of long print journey temperature-sensitive version |
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