CN1348597A - Bistable micro switch and manufacturing method thereof - Google Patents
Bistable micro switch and manufacturing method thereof Download PDFInfo
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- CN1348597A CN1348597A CN99816529A CN99816529A CN1348597A CN 1348597 A CN1348597 A CN 1348597A CN 99816529 A CN99816529 A CN 99816529A CN 99816529 A CN99816529 A CN 99816529A CN 1348597 A CN1348597 A CN 1348597A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H9/00—Details of switching devices, not covered by groups H01H1/00 - H01H7/00
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H61/00—Electrothermal relays
- H01H61/01—Details
- H01H61/0107—Details making use of shape memory materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
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- H01H1/0036—Switches making use of microelectromechanical systems [MEMS]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/0036—Switches making use of microelectromechanical systems [MEMS]
- H01H2001/0042—Bistable switches, i.e. having two stable positions requiring only actuating energy for switching between them, e.g. with snap membrane or by permanent magnet
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H61/00—Electrothermal relays
- H01H2061/006—Micromechanical thermal relay
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Abstract
Description
本发明一般涉及一种微动开关,更具体地说,涉及一种使用一种形状记忆合金的微加工双稳态开关。The present invention relates generally to a microswitch, and more particularly to a micromachined bistable switch using a shape memory alloy.
最初的机电和固态微动开关开发于20世纪40年代后期。从那时起,电子工业已经冲击到用来生产这样的开关的制造和功能极限。特别是,当前机电微动开关在尺寸、成本、功能、耐久性、及对于高频用途的连接技术方面呈现出技术不足。同样,固态开关呈现出一种特别高的断状态对通状态阻抗比,并且对于多种用途,在断状态耦合电容中呈现出不希望高的通状态“接触”电阻值。因此,电子工业当前正在寻找制造能更小、更可靠、耐久、功能多、及成本有效的开关的新的和革新的方法。The first electromechanical and solid-state snap switches were developed in the late 1940s. Since then, the electronics industry has pushed the limits of manufacturing and functionality used to produce such switches. In particular, current electromechanical microswitches present technical deficiencies in size, cost, functionality, durability, and connection techniques for high frequency applications. Also, solid state switches exhibit an exceptionally high off-state to on-state impedance ratio and, for many purposes, undesirably high on-state "contact" resistance values in the off-state coupling capacitance. Accordingly, the electronics industry is currently searching for new and innovative ways of making switches that are smaller, more reliable, durable, versatile, and cost effective.
在各种当今和预测的电路用途中,存在对低成本、微型开关器件的需要,这些开关器件构造在常规混合电路基片或板上,并且具有双稳态能力。另外,用于这些器件的制造过程应该与常规固态技术兼容,如用来形成导电路径、接触垫及包括在这种电路中的无源电路元件的薄膜沉积和图案形成过程。In a variety of current and projected circuit applications, there is a need for low cost, miniaturized switching devices that are constructed on conventional hybrid circuit substrates or boards and that have bistable capability. In addition, the fabrication processes used for these devices should be compatible with conventional solid state techniques, such as thin film deposition and patterning processes used to form conductive paths, contact pads, and passive circuit elements included in such circuits.
一种形状记忆合金(“SMA”)是一种能够在加热时从一种“变形”形状至一种“记忆”形状经历塑性变形的已知材料。如果然后允许SMA材料冷却,则它部分返回其变形形状,并且能完全返回变形形状。换句话说,SMA材料随温度变化经历从奥氏体状态至马氏体状态的可逆变换。A shape memory alloy ("SMA") is a known material capable of undergoing plastic deformation from a "deformed" shape to a "memory" shape when heated. If the SMA material is then allowed to cool, it partially returns to its deformed shape, and can return completely. In other words, SMA materials undergo a reversible transformation from the austenitic state to the martensite state as a function of temperature.
研究和开发公司仅触及在开关结构中如何能使用这种可控制形状变形材料的表面。例如,常规机电开关已经把SMA导线用作旋转致动器和把SMA片弯曲成一个阀。把导线绕其纵向轴扭转或扭曲,并且然后限制导线的端部以防运动。片状致动器机械耦合到一个或多个可运动元件上,从而致动器的温度诱导变形施加一个力,或者产生机械元件的运动。The research and development company has only scratched the surface of how this controllably shape-deformable material could be used in switch structures. For example, conventional electromechanical switches have used SMA wires as the rotary actuator and bent SMA pieces to form a valve. The wire is twisted or twisted about its longitudinal axis, and the ends of the wire are then restrained from movement. The blade actuator is mechanically coupled to one or more movable elements such that temperature-induced deformation of the actuator exerts a force, or produces movement of the mechanical element.
与这些和类似SMA开关配置和制造技术有关的问题与对于常规机电开关在以上描述的那些类似。特别是,尺寸、可靠性、耐久性、功能性、及成本的约束限制先有技术SMA开关的用途。Problems associated with these and similar SMA switch configurations and fabrication techniques are similar to those described above for conventional electromechanical switches. In particular, size, reliability, durability, functionality, and cost constraints limit the usefulness of prior art SMA switches.
在闭合时,使用或不使用形状记忆合金的常规开关和继电器通常较大、苯重、或者太易坏,不能用于工业目的或批量生产。因此,便利的是开发一种开关或继电器,这种开关或继电器能从形状记忆合金的特性得益,并且能消除当前开关技术的以上列出问题,这些技术可以使用或不使用形状记忆合金。When closed, conventional switches and relays, with or without shape memory alloys, are typically large, heavy, or too fragile for industrial purposes or mass production. Accordingly, it would be advantageous to develop a switch or relay that would benefit from the properties of shape memory alloys and would eliminate the above-listed problems of current switch technologies, which may or may not use shape memory alloys.
本发明的目的在于,克服或至少减小上述问题的一个或多个的影响。It is an object of the present invention to overcome or at least reduce the effects of one or more of the above mentioned problems.
在一个实施例中,本发明提供一种双稳态开关。该开关包括如下元件:一个基片,带有至少一个电源;一个可弯曲片,带有一个固定到基片上的第一远端;一个桥触点,形成在可弯曲片的一个第二和相对远端处;及至少一个热致动元件,连接到可弯曲片的一个第一表面上并且在第二远端与电源之间,其中从电源通过热致动元件的电流间接弯曲可弯曲片,并且借助于一个可持续力短路在基片上的信号触点。In one embodiment, the present invention provides a bistable switch. The switch includes the following elements: a substrate with at least one power source; a flexible piece with a first distal end fixed to the substrate; a bridge contact formed on a second and opposite end of the flexible piece. at the distal end; and at least one thermally actuated element connected to a first surface of the bendable sheet and between the second distal end and a power supply, wherein current from the power supply through the thermally actuated element indirectly bends the bendable sheet, And short-circuit the signal contacts on the substrate by means of a sustainable force.
本发明的另一个实施例提供一个用来制造用于带有信号线触点和一个电源的基片的双稳态开关的过程。具体地说,该过程包括提供一个可弯曲片;把至少一个热致动元件连接在可弯曲片的一个第一远端与电源之间;在可弯曲片的第一远端处形成一个导电桥触点;及把可弯曲片的一个第二和相对远端安装到基片上,其中从电源通过热致动元件的电流间接弯曲可弯曲片,并且短路在基片上的信号触点。Another embodiment of the present invention provides a process for fabricating a bistable switch for a substrate with signal line contacts and a power supply. Specifically, the process includes providing a bendable sheet; connecting at least one thermally actuable element between a first distal end of the bendable sheet and a power source; forming a conductive bridge at the first distal end of the bendable sheet contacts; and mounting a second and opposite distal end of the flexible sheet to the substrate, wherein current from the power source through the thermally actuated element indirectly bends the flexible sheet and shorts the signal contacts on the substrate.
本发明性结构提供一种生产双稳态开关的较简单和便宜方法,该开关具有借助于使用标准半导体基础单元-晶体管的当前固态方法不能获得的性能值。这种构造微动开关的新的和革新微加工方法使用户能够建造能携带非常高电压、电流和频率信号的系统。这成为可能的,因为微动开关在概念上等效于一个微型继电器。事实上,这种微动开关是一种运动以连接或脱开导电触点的机械微型结构。另外,这种结构和方法与标准硅处理兼容,允许在合理成本下的批量生产。The inventive structure provides a simpler and cheaper method of producing bistable switches with performance values not achievable by means of current solid state methods using standard semiconductor building blocks - transistors. This new and innovative microfabrication method of constructing microswitches enables users to build systems capable of carrying very high voltage, current and frequency signals. This is possible because a microswitch is conceptually equivalent to a tiny relay. In fact, the microswitch is a mechanical microstructure that moves to connect or disconnect conductive contacts. Additionally, this structure and method is compatible with standard silicon processing, allowing mass production at reasonable cost.
在阅读如下详细描述和参照附图时,本发明的其他方面和优点将成为显然的,在附图中:Other aspects and advantages of the present invention will become apparent upon reading the following detailed description and upon reference to the accompanying drawings, in which:
图1表明按照本发明一个实施例的一种双稳态开关的立体图;Fig. 1 shows the perspective view of a kind of bistable switch according to one embodiment of the present invention;
图2表明图1的发明性双稳态开关的总示意布局;Figure 2 shows the general schematic layout of the inventive bistable switch of Figure 1;
图3A和3B-5A和5B表明一个用来制造图1的双稳态开关的过程;3A and 3B-5A and 5B illustrate a process for making the bistable switch of FIG. 1;
图6A和6B表明一个用来制造图1的双稳态开关的以包括一个弯皱的臂部分;Figures 6A and 6B illustrate an arm portion used to manufacture the bistable switch of Figure 1 to include a crimp;
图7A和7B表示安装和致动的图6A的双稳态开关以表明一个第一和一个第二开关位置;Figures 7A and 7B show the bistable switch of Figure 6A mounted and actuated to indicate a first and a second switch position;
图8表明包括多个桥触点的图1的双稳态开关的一个可选择实施例;及Figure 8 illustrates an alternative embodiment of the bistable switch of Figure 1 comprising a plurality of bridge contacts; and
图9A和9B表明发明性双稳态开关的又一个实施例。9A and 9B illustrate yet another embodiment of the inventive bistable switch.
尽管本发明适合于可选择形式的各种修改,但其具体实施例通过图中的例子已经表示,并且在这里详细地描述。然而,应该理解,这里具体实施例的描述不打算把本发明限制为公开的具体形式,而是相反,打算覆盖落在如由附属权利要求书定义的本发明的精神和范围内的所有改进、等效物、及选择例。While the invention is susceptible to various modifications in alternative forms, specific embodiments thereof have been shown by way of example in the drawings and described in detail herein. It should be understood, however, that the description herein of specific embodiments is not intended to limit the invention to the particular forms disclosed, but on the contrary, the intention is to cover all modifications, Equivalents, and Alternative Examples.
本发明借助于微加工的最近进步利用形状记忆合金的性质,开发一种高效率、有效和高度可靠的微动开关。在微动开关中的SMA的使用把开关或继电器的性能增大几个数量级。具体地说,实现这点,因为形状记忆效应的应力和应变都能非常大,提供每单位体积的显著功输出。因此,把SMA用作致动机构的微动机械开关能施加几百兆帕斯卡的应力;容许大于百分之三的应变;工作在比静电或PZO要求低得多的普通TTL电压下;用芯片上的电气引线直接供电;及经得住几百万次循环而不疲劳。The present invention exploits the properties of shape memory alloys by means of recent advances in micromachining to develop a highly efficient, effective and highly reliable microswitch. The use of SMAs in micro switches increases the performance of switches or relays by orders of magnitude. Specifically, this is achieved because the stress and strain of the shape memory effect can be very large, providing a significant work output per unit volume. Therefore, micromechanical switches using SMA as the actuating mechanism can apply stresses of several hundred megapascals; tolerate strains greater than three percent; operate at common TTL voltages that are much lower than electrostatic or PZO requirements; The electrical leads on the power supply are directly powered; and can withstand millions of cycles without fatigue.
形状记忆合金经受在高于TA的温度下开始的温度相关相变,其特征在于把合金加热到高于温度TA和低于TH时合金恢复任何初始形状的能力,而与在低于TA的温度下施加在合金上的机械变形无关。在操作中,当SMA材料在低于温度TA的温度TL下时,SMA拥有一种特定晶体结构,由此材料是韧性的,并且可以较容易地变形成任意形状。在把SMA加热到商于温度TA的温度TH时,晶体结构变化以便把SMA复原到初始未变形形状,恢复原始给与的形状,由此表现恢复应力的开始。因此,其上相转换出现的形状记忆合金的转变温度范围定义成在TH与TA之间。SMA最优地在低于TA的温度下在2与8%之间变形,该变形在把SMA加热到在TA与TH之间时能完全恢复。一种最佳变形是4%。Shape memory alloys undergo a temperature-dependent phase transition initiated at temperatures above TA , which is characterized by the ability of the alloy to recover any initial shape when the alloy is heated above temperature TA and below TH , whereas at temperatures below The mechanical deformation exerted on the alloy at the temperature T A is irrelevant. In operation, when the SMA material is at a temperature TL lower than the temperature TA , the SMA possesses a specific crystal structure whereby the material is ductile and can be deformed relatively easily into arbitrary shapes. When the SMA is heated to a temperature TH higher than the temperature TA , the crystal structure changes to restore the SMA to its original undeformed shape, restoring the original given shape, thereby representing the onset of recovery stress. Therefore, the transition temperature range of the shape memory alloy on which the phase transformation occurs is defined to be between TH and TA . The SMA optimally deforms between 2 and 8% at temperatures below TA , which deformation fully recovers when the SMA is heated to between TA and TH . An optimum deformation is 4%.
这些记忆材料已经主要以丝、棒、和板的形状的体积形式生产。最常规和容易得到的形状记忆合金是Nitinol(镍钛金属互化物)-一种镍和钛的合金。然而,其他的SMA包括铜锌铝、或铜铝镍。对于小至18℃的温度变化,Nitinol能通过其相变,并且在施加抵抗对改变其形状的阻力时施加一个非常大的力。如早先讨论的那样,使用形状记忆合金的常规开关和继电器一般基于变形形状记忆合金的形状的原理操作,同时它在相变湿度范围以下。把变形合金加热到其转变湿度范围以上恢复变形的全部或部分,并且合金的运动移动必要的机械元件。These memory materials have been mainly produced in bulk form in the shape of wires, rods, and plates. The most common and readily available shape memory alloy is Nitinol (nickel-titanium intermetallic compound) - an alloy of nickel and titanium. However, other SMAs include copper zinc aluminum, or copper aluminum nickel. For temperature changes as small as 18°C, Nitinol is able to pass through its phase transition and exert a very large force while exerting resistance against changing its shape. As discussed earlier, conventional switches and relays using shape memory alloys generally operate on the principle of deforming the shape of the shape memory alloy while it is below the phase transition humidity range. Heating the deformed alloy above its transformation humidity range restores all or part of the deformation, and movement of the alloy moves the necessary mechanical elements.
现在转到附图,图1表明一种按照本发明一个实施例的热致动双稳态微动机械开关10。开关10的致动臂12被微加工,并且固定到一个上基片表面14上。基片14能包括一个绝缘硅或砷化镓基片、一块印刷电路板、一块诸如高密度氧化铝(Al2O3)或氧化铍(BeO)之类的陶瓷材料的平板、或一种诸如熔化氧化硅之类的玻璃材料。然而,熟悉本专业的普通技术人员应该认识到,本发明的开关不如此限制,并因此能安装到几乎任何稳定结构上以提供希望的悬臂式双稳态开关。Turning now to the drawings, Figure 1 illustrates a thermally actuated bistable
上表面14提供控制触点16a、16b和地触点18,以可靠地互连到臂12的相应控制和地触点上。另外,上基片表面14提供由臂12的导电桥触点22桥接或短路的信号触点20a和20b。信号触点20a和20b可以传输或支持任何电气信号,包括例如常规模拟或数字数据、或声音信号。The
顶部和底部导电路径元件24a和24b由常规技术联接到臂12上,并且两个SMA元件26a和26b安装在臂12的顶部和底部中心梁上的触点与地通孔之间。在一个实施例中,SMA元件26a和26b由具有在约25与125微米之间的直径的钛镍合金丝制成。Top and bottom
在操作期间,以上发明性开关提供图2中表明的基本电路结构。具体地说,当继电器30a闭合而继电器30b断开时,通过由元件16a、24a、26a、和18组成的顶部导电马蹄型路径的电流,将向上运动臂12。相反,当继电器30a断开而继电器30b闭合时,通过由元件16b、24b、26b、和18组成的底部导电马蹄型路径的电流,将向下运动臂12。在热冷却阶段期间存在的力远小于在加热SMA元件时存在的力。换句话说,下面要详细描述的导电装置把必需的电力从任一个控制触点16a或16b经导电路径元件24a或和24b和SMA元件26a或26b分别传递到地触点元件18。对于下面的实施例,SMA元件26a或26b最好具有在约25与125微米之间的直径,并且在操作期间能供有40至160毫安。During operation, the above inventive switch provides the basic circuit structure illustrated in FIG. 2 . Specifically, when
下面参照图3A-3B至6A-6B,根据本发明用来构造双稳态开关的制造过程如下。具体地说,图3A、4A、5A及6A表明开关10的底部表面,而图3B、4B、5B及6B表明相同图的侧视图。Referring now to Figures 3A-3B to 6A-6B, the fabrication process used to construct the bistable switch according to the present invention is as follows. Specifically, Figures 3A, 4A, 5A and 6A illustrate the bottom surface of
图3A和3B表明一种涂有一个形成图案光致抗蚀剂层52的稳定材料50。在该具体实施例中,稳定材料50是以轧制板材制造的铍铜合金,具有在约12至50微米之间的厚度和在约300至1,200微米之间的宽度。然而,可以使用提供希望弹性或可弯曲性质和厚度的其他材料。例如,可以使用从包括聚合树脂、塑料、木复合材料、硅、硅树脂、及诸如不锈钢合金之类的各种合金材料的组中选择的材料。3A and 3B illustrate a stabilizing
在一种最佳微加工过程中,一种常规光刻技术用来定义稳定材料50的表面上的希望图案(由虚线表示的图案)。具体地说,形成图案的光致抗蚀剂52定义一种三梁结构,这种结构具有一个尾部54和一个首部56、触点通孔58a和58c、及定义梁62a、62b、和62c的两个缝隙60a和60b。一种常规刻蚀技术除去由图案光致抗蚀剂52未保护的稳定材料50,以形成图4A中表明的三梁结构12。In an optimal microfabrication process, a conventional photolithographic technique is used to define the desired pattern on the surface of the stabilizing material 50 (the pattern indicated by the dashed line). Specifically, patterned photoresist 52 defines a three-beam structure having a
熟悉本专业的技术人员将认识到,希望图案能由其他常规方法形成。例如,如果希望开关尺寸大得足以避免微加工技术,则稳定材料50能通过一个常规冲压或模压过程形成图案。Those skilled in the art will recognize that it is desirable that the pattern can be formed by other conventional methods. For example, the stabilizing
其次,如在图4A和4B中表明的那样,一个非导电绝缘层64涂覆在结构12的顶部和底部表面上。该电气绝缘体最好是一个paralene层。在可选择实施例中,绝缘材料64能从包括二氧化硅、聚酰亚胺、湿氧化物、及四氮化三硅层的组中选择。这些可选择物将提供具有类似操作特性的类似结构。熟悉本专业的技术人员将认识到,如果稳定材料50是非导电材料,则可以消除绝缘层64。Next, a non-conductive insulating
在涂覆结构12的每一侧上,沉积一种诸如金之类的导电材料,并且形成图案以创建希望马蹄型路径的一部分。更具体地说,涂覆结构12的顶部表面(见图1)提供一条联接在控制通孔58a与顶部接触垫之间的L形导电路径24a。另外,相同的导电材料形成地通孔58c。在结构12的相对或底部侧上,如图4A中表明的那样,涂覆结构12提供另一条联接在控制触点68b与底部接触垫58b之间的L形导电路径24b。另外,相同的材料形成控制触点68a、地触点70及桥触点22。熟悉本专业的技术人员将认识到,用于导电路径24a和24b、控制触点68a和68b、地触点70、地和控制通孔58a和58c、顶部和底部接触垫58b、及桥触点22的导电材料,可以从金、铜、钯金合金、镍、银、铝、及现有技术可得到的多种其他导电材料的组中选择。On each side of the
参照图5A和5B,一个致动器元件26a和26b可靠地联接到在每个接触垫与地通孔58c之间的臂12的顶部和底部表面上。如果希望,一种粘合剂材料(未表示)能用来把致动器元件26a和26b联接到相应顶部和底部臂表面上。粘合剂材料能从包括胶结材料、环氧树脂、锁定芯片带(lock-on-chip tape)、焊料、嵌入材料、聚酰亚胺、及诸如扣或夹之类的机械固定物的组中选择。这种连接把每个致动器元件26a和26b定位在中间梁62B的顶部和底部表面的一个中央部分上以完成导电马蹄型路径。致动器元件26a和26b最好是以片、带、或丝形式提供的镍钛SMA。对于以上实施例,SMA元件26a和26b最好具有在约25与125微米之间的直径。Referring to Figures 5A and 5B, an
如早先公开的那样,SMA元件26A和26B在通过材料的电流达到一个预建立的相变温度之后延伸或接触。对于该具体实施例,相变过程典型地将通过两种方法之一出现。一种第一相变技术减小致动材料的总体积,并且作为结果,形状记忆合金的长度减小,接触稳定材料12。在一种第二相变技术中,SMA在它安装到稳定结构12上之前和/或之后伸展不超过8%的百分比。在相变时,SMA的长度减小,在接触稳定材料12层之前返回其原始长度,甚至更多,高达8%。依据对首部12a的位移、接触力、数量循环、及制造过程的要求,形状记忆合金可以伸展或不伸展。As disclosed earlier, SMA elements 26A and 26B extend or contact after an electrical current through the materials reaches a pre-established phase transition temperature. For this particular example, the phase change process will typically occur by one of two methods. A first phase change technique reduces the overall volume of the actuation material and, as a result, the length of the shape memory alloy decreases contacting the
希望过程的最后步骤包括弯皱和安装以上结构。没有弯皱步骤,把以上结构能安装到一个希望基片上,以形成具有图1中表明的一种悬臂结构的可靠微加工双稳态开关。同样,开关不能连续地短路信号触点,除非电力是活性的以在希望SMA元件内产生必须的电流和转变。因此,该最后压花或弯皱步骤将允许活动器件保持一个接触位置,即使在断电之后也是如此。这种压花或超皱因此向臂提供一种咬住作用功能,这把臂保持在一个给定位置,除非当SMA元件之一把臂弹回相反位置。The final steps of the desirably process include crimping and installing the above structure. Without the crimping step, the above structure can be mounted on a desired substrate to form a reliable microfabricated bistable switch with a cantilever structure as shown in FIG. Likewise, the switch cannot continuously short the signal contacts unless power is active to generate the necessary current and transitions within the desired SMA element. Thus, this final embossing or crimping step will allow the movable device to maintain a contact position even after power-off. This embossing or supercorrugation thus provides the arm with a snap action function which holds the arm in a given position unless one of the SMA elements snaps the arm back into the opposite position.
参照图6A和6B,表明希望的压花或弯皱元件80A和80B。使用常规冲压或染色方法可以形成这种咬住作用结构。更具体地说,把左和右梁62A和62C的中央部分弯皱以形成波浪型变形或蹄形。对于熟悉本专业的技术人员,当致动器元件26a和26b转变以向上或向下运动臂末端12a时,这种弯皱区域80A和80B将产生一个持续力。同样,即使断电联接到开关10上的源之后,弯皱区域80A和80B也允许桥触点22保持与信号触点20a和20b接触或分离。换句话说,通过形成弯皱80A和80B,一旦把臂12向上或向下定位,电流就必须通过适当的SMA元件以分别向下或向上把臂12弯曲到另一个位置。否则,开关10总是向上或向下定位,除非它实际上由用户运动。Referring to Figures 6A and 6B, desired embossing or crimping elements 80A and 80B are shown. This snap action structure can be formed using conventional stamping or dyeing methods. More specifically, the central portions of the left and right beams 62A and 62C are crimped to form a wave-like deformation or a shoe shape. To those skilled in the art, such crimped regions 80A and 80B will generate a sustained force as the
有或没有形成在第一和第三梁62A和62C上的弯皱元件,生成的结构都必须固定到基片14上,如图7A和7B或图1中表明的那样。具体地说,悬臂开关10通过常规粘合方法联接到基片表面14上。具体地说,印刷电路板的焊料或压力槽用来把电力和地触点16a、16b、和18附着或固定到开关10的基片表面14上。因此,当致动元件26b由底部马蹄型导电路径加热时,生成的结构将向下弯曲以把桥触点22与信号触点20a和20b相联接。同样,当致动元件26A由顶部马蹄型导电路径加热时,将断开桥触点22与信号触点20a和20b之间的连接。With or without corrugated elements formed on the first and third beams 62A and 62C, the resulting structure must be secured to the
本发明的另一个实施例包括把一个辅助触点22′放置在末端12a的顶部表面上,以便短路在一个多层基片上的辅助信号触点20a′、20b′。对于图8中表明的该例子,如果顶部SMA元件26a由通过顶部马蹄型导电路径的电流加热,则结构将向上运动,以把顶部桥触点22′与顶部信号触点20a′、20b′相联接。另一方面,如果致动器元件26B由通过底部马蹄型导电路径24b和26b的电流加热,则结构将向下运动,以把桥触点22与信号触点20a和20b相联接。对于该具体实施例,臂12不弯皱。因此,在加热相应SMA 26a或26b以向上或向下运动末端12a的同时,桥触点22或22′仅能够连续地短路信号触点20a、20b或20a′、20b′。然而,熟悉本专业的技术人员将认识到,弯皱能用来保持臂12与触点20a和20b或20a′和20b′的一个或其他相接触。Another embodiment of the present invention includes placing an auxiliary contact 22' on the top surface of end 12a to short circuit
图9A和9B表明以上发明性开关的另一个实施例。在该实施例中,片50形成图案并且刻蚀或冲压以形成希望臂12,如参照图3B在以上描述的那样,并且桥触点22形成(如以上描述的那样)在臂末端12a上。其次,致动器元件60的中央部分连成回路或固定到臂12上在与末端12a相邻的一个位置处,并且与桥触点22电气分离。最后,臂12的尾部54固定到基片表面14上,并且致动器元件60的端部62a和62b在与臂12的长度相邻的水平相对方向上延伸,以与同基片表面14相邻的一个电源64相连接。换句话说,以前布置在臂12上以提供必需的电路以致动SMA元件的导电L形路径和触点(见图1),已经运动到离开开关臂12的一个位置,以提供电源64。Figures 9A and 9B illustrate another embodiment of the above inventive switch. In this embodiment, the
现在参照图9B,在操作期间,由源62供给到SMA 60的电流接触SMA 60,以向下运动臂12和把信号触点20a和20b与桥触点22短路。如在以上公开中描述的那样,对于断电的电源62,SMA 60将返回一个把桥触点22与信号触点20a和20b分离的位置。熟悉本专业的技术人员将认识到,另一个SMA(未表示)可以以类似方式固定到臂12上,但在对于SMA 60的相反侧上,并且由一个类似电源供给电流。同样,能弯皱臂12以形成一个如参照图7A和7B在以上描述的那样起作用的器件,并且臂12能形成带有或不带有多重平行梁的图案。对于该具体实施例,如果在臂12上没有梁并且一个附加SMA元件固定到臂12的另一侧或绕其缠绕,则可以使用单压花或完整表面弯皱。Referring now to FIG. 9B, during operation, current supplied to
关于以上实施例,熟悉本专业的技术人员将认识到,臂12能形成图案,以形成一种带有必须保持任何希望SMA元件的多梁结构。同样,臂12能形成图案,以仅形成不带有梁的矩形结构。对于类似的提示,SMA元件26a和26b的厚度和数量能增大或减小,以容纳希望的臂结构和在加热时运动其所必需的力。另外,在可弯曲臂12上形成的弯皱的数量将取决于生成开关的形状和功能特性。With respect to the above embodiments, those skilled in the art will recognize that the
总之,本发明提供一种生产微动开关和继电器的较简单和便宜方法。这种构造微动开关和继电器的新的和革新微加工方法使用户能够建立能传输非常高的电压、电流、频率信号的系统。另外,该发明性过程在概念上能设计成与标准硅处理兼容,并且允许器件以非常合理的成本批量生产。因此,该发明性结构提供一种小型双稳态咬住动作机电开关,该开关能由拥有用于增大速度致动和相对于任何先有技术开关机构的力的独特能力的形状记忆合金致动。此外,因为微加工的进步,该结构能生产成具有类似于在500-3,000微米之间的长度、在约200-1,200之间的宽度和在约25-36微米之间的厚度,这小于在今天市场上的任何竞争双稳态开关。熟悉本专业的技术人员将认识到,这些尺寸可以变化,以得到用于发明性开关的希望尺寸和功能特性。In summary, the present invention provides a simpler and less expensive method of producing microswitches and relays. This new and innovative micromachining method of constructing microswitches and relays enables users to build systems capable of transmitting very high voltage, current, and frequency signals. Additionally, the inventive process can conceptually be designed to be compatible with standard silicon processing and allow devices to be mass-produced at very reasonable cost. Thus, the inventive structure provides a small bistable snap action electromechanical switch that can be actuated from a shape memory alloy possessing a unique ability for increased velocity actuation and force relative to any prior art switch mechanism. move. In addition, because of advances in micromachining, the structure can be produced to have a length similar to that between 500-3,000 microns, a width between about 200-1,200 microns, and a thickness between about 25-36 microns, which is smaller than in any competing bistable switch on the market today. Those skilled in the art will recognize that these dimensions can be varied to obtain the desired dimensions and functional properties for the inventive switch.
仍进入这里要求的发明性概念的范围内的其他设计变更对于熟悉本专业的技术人员将是显然的。例如,这里描述的说明性实施例把SMA元件26a和26b用作用来加热SMA元件的导电路径部分以实现相同的目的。例如,SMA元件能联接到分离的导电元件上,或者他们能联接到完全不同种类的加热元件上(例如非电气的)。Other design changes that still fall within the scope of the inventive concepts claimed herein will be apparent to those skilled in the art. For example, the illustrative embodiments described herein use the
以上描述了本发明的说明性实施例。为了清晰起见,在说明书中没有描述实际实施的所有特征。当然要理解,在任何这样的实际实施例的发展中,必须进行多种实施专门决定以实现开发者的特定目的,如服从系统有关的和商务有关的约束,这些约束随实施而变。况且,要认识到,尽管这样一种开发努力可能是复杂和费时的,但对于得到本公开益处的熟悉本专业的技术人员不过是一项例行任务。Illustrative embodiments of the present invention are described above. In the interest of clarity, not all features of an actual implementation are described in this specification. It will of course be understood that in the development of any such actual embodiment, various implementation-specific decisions must be made to achieve the developer's specific goals, such as compliance with system-related and business-related constraints, which vary from implementation to implementation. Moreover, it will be recognized that such a development effort might be complex and time-consuming, but would nevertheless be a routine undertaking for those skilled in the art having the benefit of this disclosure.
Claims (32)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US1999/006450 WO2000058980A1 (en) | 1999-03-26 | 1999-03-26 | Bistable micro-switch and method of manufacturing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1348597A true CN1348597A (en) | 2002-05-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN99816529A Pending CN1348597A (en) | 1999-03-26 | 1999-03-26 | Bistable micro switch and manufacturing method thereof |
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| EP (1) | EP1166298A1 (en) |
| KR (1) | KR20020018655A (en) |
| CN (1) | CN1348597A (en) |
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| BR (1) | BR9917232A (en) |
| CA (1) | CA2363386A1 (en) |
| WO (1) | WO2000058980A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102439674A (en) * | 2009-05-20 | 2012-05-02 | 通用汽车环球科技运作有限责任公司 | Active material circuit protector |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004001781A1 (en) * | 2002-06-25 | 2003-12-31 | Gerard Industries Pty Ltd | Improved electrical switch |
| US11105319B2 (en) | 2017-05-05 | 2021-08-31 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| CN110709757B (en) * | 2017-05-05 | 2022-11-22 | 哈钦森技术股份有限公司 | Shape memory alloy actuator and method thereof |
| US11333134B2 (en) | 2017-05-05 | 2022-05-17 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| US11815794B2 (en) | 2017-05-05 | 2023-11-14 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| US11448853B2 (en) | 2017-05-05 | 2022-09-20 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| US10920755B2 (en) | 2017-05-05 | 2021-02-16 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| US11306706B2 (en) | 2017-05-05 | 2022-04-19 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| US11859598B2 (en) | 2021-06-10 | 2024-01-02 | Hutchinson Technology Incorporated | Shape memory alloy actuators and methods thereof |
| WO2023136306A1 (en) * | 2022-01-17 | 2023-07-20 | アルプスアルパイン株式会社 | Imaging device, camera module, and control method for imaging device |
| US12510061B2 (en) | 2023-04-12 | 2025-12-30 | Hutchinson Technology Incorporated | Shape memory alloy (SMA) bimorph actuators and methods for manufacturing the same |
| US11982263B1 (en) | 2023-05-02 | 2024-05-14 | Hutchinson Technology Incorporated | Shape metal alloy (SMA) bimorph actuators with reduced wire exit angle |
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| US3893055A (en) * | 1973-04-16 | 1975-07-01 | Texas Instruments Inc | High gain relays and systems |
| US4570139A (en) * | 1984-12-14 | 1986-02-11 | Eaton Corporation | Thin-film magnetically operated micromechanical electric switching device |
| DE4205029C1 (en) * | 1992-02-19 | 1993-02-11 | Siemens Ag, 8000 Muenchen, De | Micro-mechanical electrostatic relay - has tongue-shaped armature etched from surface of silicon@ substrate |
| US5619177A (en) * | 1995-01-27 | 1997-04-08 | Mjb Company | Shape memory alloy microactuator having an electrostatic force and heating means |
| US5825275A (en) * | 1995-10-27 | 1998-10-20 | University Of Maryland | Composite shape memory micro actuator |
| DE69734537T2 (en) * | 1996-08-27 | 2006-08-10 | Omron Corp. | Micro-relay and method for its production |
| US5796152A (en) * | 1997-01-24 | 1998-08-18 | Roxburgh Ltd. | Cantilevered microstructure |
-
1999
- 1999-03-26 CA CA002363386A patent/CA2363386A1/en not_active Abandoned
- 1999-03-26 BR BR9917232-1A patent/BR9917232A/en not_active IP Right Cessation
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- 1999-03-26 AU AU31142/99A patent/AU3114299A/en not_active Abandoned
- 1999-03-26 EP EP99912877A patent/EP1166298A1/en not_active Withdrawn
- 1999-03-26 WO PCT/US1999/006450 patent/WO2000058980A1/en not_active Ceased
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102439674A (en) * | 2009-05-20 | 2012-05-02 | 通用汽车环球科技运作有限责任公司 | Active material circuit protector |
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| Publication number | Publication date |
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| AU3114299A (en) | 2000-10-16 |
| CA2363386A1 (en) | 2000-10-05 |
| WO2000058980A1 (en) | 2000-10-05 |
| EP1166298A1 (en) | 2002-01-02 |
| KR20020018655A (en) | 2002-03-08 |
| BR9917232A (en) | 2002-02-19 |
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