CN1237394C - Producing method for lithographic printing plate originals - Google Patents
Producing method for lithographic printing plate originals Download PDFInfo
- Publication number
- CN1237394C CN1237394C CN 01104305 CN01104305A CN1237394C CN 1237394 C CN1237394 C CN 1237394C CN 01104305 CN01104305 CN 01104305 CN 01104305 A CN01104305 A CN 01104305A CN 1237394 C CN1237394 C CN 1237394C
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- 230000009467 reduction Effects 0.000 description 1
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- 238000011160 research Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005480 shot peening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- ORFSSYGWXNGVFB-UHFFFAOYSA-N sodium 4-amino-6-[[4-[4-[(8-amino-1-hydroxy-5,7-disulfonaphthalen-2-yl)diazenyl]-3-methoxyphenyl]-2-methoxyphenyl]diazenyl]-5-hydroxynaphthalene-1,3-disulfonic acid Chemical compound COC1=C(C=CC(=C1)C2=CC(=C(C=C2)N=NC3=C(C4=C(C=C3)C(=CC(=C4N)S(=O)(=O)O)S(=O)(=O)O)O)OC)N=NC5=C(C6=C(C=C5)C(=CC(=C6N)S(=O)(=O)O)S(=O)(=O)O)O.[Na+] ORFSSYGWXNGVFB-UHFFFAOYSA-N 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
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- 235000020354 squash Nutrition 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
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- 239000002562 thickening agent Substances 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- YEIGUXGHHKAURB-UHFFFAOYSA-N viridine Natural products O=C1C2=C3CCC(=O)C3=CC=C2C2(C)C(O)C(OC)C(=O)C3=COC1=C23 YEIGUXGHHKAURB-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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- 239000004246 zinc acetate Substances 0.000 description 1
Images
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
| a30 (%) | Surface area (%) | Ra (μm) | Rp (μm) | Rmax (μm) | Anode oxide film process flow rate (cm/ second) | The 1st section current density (A/dm 2) | The 2nd section current density (A/dm 2) | The 3rd section current density (A/dm 2) | |
| Embodiment 1 | 35 | 28 | 0.55 | 3.5 | 4.8 | 25 | 10 | 20 | 30 |
| Embodiment 2 | 50 | 45 | 0.35 | 2.2 | 3.0 | 2 | 10 | 15 | 40 |
| Embodiment 3 | 60 | 65 | 0.70 | 5.1 | 6.5 | 220 | 5 | 20 | 30 |
| Embodiment 4 | 15 | 17 | 0.22 | 1.6 | 2.1 | 40 | 15 | 20 | 30 |
| a30 (%) | Surface area (%) | Ra (μm) | Rp (μm) | Rmax (μm) | Anode oxide film process flow rate (cm/ second) | The 1st section current density (A/dm 2) | The 2nd section current density (A/dm 2) | The 3rd section current density (A/dm 2) | |
| Comparative example 1 | 35 | 28 | 0.55 | 3.5 | 4.8 | 25 | 10 | 20 | 30 |
| a30 (%) | Surface area (%) | Ra (μm) | Rp (μm) | Rmax (μm) | Anode oxide film process flow rate (cm/ second) | The 1st section current density (A/dm 2) | The 2nd section current density (A/dm 2) | The 3rd section current density (A/dm 2) | |
| Comparative example 2 | 75 | 32 | 0.55 | 3.5 | 4.8 | 25 | 10 | 20 | 30 |
| Comparative example 3 | 40 | 9 | 0.35 | 2.2 | 3.0 | 2 | 10 | 15 | 40 |
| Comparative example 4 | 60 | 65 | 0.95 | 5.1 | 6.5 | 200 | 5 | 20 | 30 |
| Comparative example 5 | 15 | 17 | 0.22 | 2.0 | 2.9 | 35 | 15 | 20 | 30 |
| Comparative example 6 | 35 | 28 | 0.55 | 3.5 | 4.8 | 0.5 | 5 | 20 | 30 |
| Comparative example 7 | 35 | 28 | 0.55 | 3.5 | 4.8 | 260 | 5 | 20 | 30 |
| Comparative example 8 | 50 | 45 | 0.35 | 2.2 | 3.0 | 100 | 10 | 10 | 10 |
| Comparative example 9 | 60 | 65 | 0.70 | 5.1 | 6.5 | 50 | 20 | 20 | 20 |
| Comparative example 10 | 15 | 17 | 0.22 | 1.6 | 2.1 | 60 | 30 | 30 | 30 |
Claims (5)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04700/2000 | 2000-02-24 | ||
| JP2000047000 | 2000-02-24 | ||
| JP2000047000A JP2001232965A (en) | 2000-02-24 | 2000-02-24 | Method for manufacturing original plate for lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1310359A CN1310359A (en) | 2001-08-29 |
| CN1237394C true CN1237394C (en) | 2006-01-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 01104305 Expired - Fee Related CN1237394C (en) | 2000-02-24 | 2001-02-23 | Producing method for lithographic printing plate originals |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2001232965A (en) |
| CN (1) | CN1237394C (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE541709T1 (en) | 2001-10-05 | 2012-02-15 | Fujifilm Corp | LITHOGRAPHIC PRINTING PLATE SUBSTRATE AND PRESENSITIZED PLATE AND PROCESS FOR PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE |
| JP5073287B2 (en) * | 2006-12-28 | 2012-11-14 | 三菱アルミニウム株式会社 | Method for producing surface-treated aluminum material and apparatus for producing surface-treated aluminum material |
| JP5014781B2 (en) * | 2006-12-28 | 2012-08-29 | 三菱アルミニウム株式会社 | Method for producing surface-treated aluminum material and apparatus for producing surface-treated aluminum material |
| JP5014782B2 (en) * | 2006-12-28 | 2012-08-29 | 三菱アルミニウム株式会社 | Method for producing surface-treated aluminum material and apparatus for producing surface-treated aluminum material |
| JP5401026B2 (en) * | 2007-09-26 | 2014-01-29 | 富士フイルム株式会社 | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
| CN101293441B (en) * | 2008-06-23 | 2010-04-14 | 石深泉 | Environment-friendly ink-jet CTP offset master and production method thereof |
| US20100173135A1 (en) * | 2009-01-06 | 2010-07-08 | Jonghan Choi | Method of Controlling Surface Roughness of a Flexographic Printing Plate |
| TWI405040B (en) * | 2010-10-01 | 2013-08-11 | Chi Mei Corp | A positive-type photosensitive resin composition, and a method of forming a pattern |
| TWI435176B (en) * | 2011-06-22 | 2014-04-21 | Chi Mei Corp | Positive photosensitive resin composition and method for forming pattern using the same |
| KR101193571B1 (en) * | 2011-12-23 | 2012-10-25 | (주)아인스 | Electrolyte for coating a film on aluminum and method for coating a film on aluminum using thereof |
| CN105818563A (en) * | 2015-01-05 | 2016-08-03 | 中国科学院化学研究所 | Offset plate base surface treatment method |
| CN107663108A (en) * | 2016-07-29 | 2018-02-06 | 比亚迪股份有限公司 | Ceramic coarsening solution and preparation method thereof and ceramic method of roughening |
| KR102658153B1 (en) * | 2017-09-28 | 2024-04-16 | 제이에스알 가부시끼가이샤 | Radiation-sensitive resin composition and use thereof |
| CN108983551A (en) * | 2018-08-22 | 2018-12-11 | 南京中电熊猫液晶材料科技有限公司 | Coating machine photo resistance recovery system |
| JP6693629B1 (en) * | 2019-05-27 | 2020-05-13 | ナトコ株式会社 | Water-based coating composition for topcoat of metal siding, method for producing metal siding, and water-based coating composition for topcoat of metal siding |
-
2000
- 2000-02-24 JP JP2000047000A patent/JP2001232965A/en active Pending
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2001
- 2001-02-23 CN CN 01104305 patent/CN1237394C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN1310359A (en) | 2001-08-29 |
| JP2001232965A (en) | 2001-08-28 |
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