CN1229674C - Inclined bump structure on mirror surface and manufacturing method thereof - Google Patents
Inclined bump structure on mirror surface and manufacturing method thereof Download PDFInfo
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- CN1229674C CN1229674C CN 01137577 CN01137577A CN1229674C CN 1229674 C CN1229674 C CN 1229674C CN 01137577 CN01137577 CN 01137577 CN 01137577 A CN01137577 A CN 01137577A CN 1229674 C CN1229674 C CN 1229674C
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Abstract
The present invention relates to a method for manufacturing a declining lug structure on the surface of a reflector, which at least comprises the following steps of providing a substrate, forming a photosensitive material layer on the substrate, zoning the photosensitive material layer so as to form a plurality of trapezoidal bodies with different bottom surfaces, smoothening the trapezoidal bodies to form a plurality of groups of lug structures with a declining angle, wherein the bottoms of the trapezoidal bodies are connected with each other. The present invention uses an optical diffraction method and a special light mask film to ensure that an applied reflecting type liquid crystal display has reflecting brightness and a wide visual angle by the simple technology of single exposure.
Description
Technical field
The invention relates to declining lug structure and manufacture method thereof on a kind of mirror surface, particularly about a kind of declining lug structure and manufacture method of utilizing on the mirror surface that the optics diffraction method forms the reflection type liquid crystal display screen thereof.
Background technology
For reflection type liquid crystal display screen (reflective Liquid Crystal Display),, must be noted that also whether the visual angle is broad except must be noted that the brightness of LCDs (LCD) reflection.Therefore, how designing the mirror surface (reflector) that the LCDs of sening as an envoy to has reflecting brightness and wide viewing angle concurrently, is present important research direction.
With reference to Fig. 1, this figure is the light reflectance and the graph of a relation that takes measurement of an angle of the traditional mirror surface of expression.Wherein, mirror surface is horizontal positioned and surface smoothing.Suppose that incident light when being mapped to the mirror surface of LCDs, can penetrate LCDs with 20 degree incident angles with-20 degree reflection angle, therefore, can measure maximum reflectivity R for-20 when spending in angle
1, and the distribution curve of reflectivity is very narrow, mostly concentrates near-20 degree.
Yet desirable LCDs should present maximum reflectivity when angle about 0 is spent, and also can present partial reflectance in other angles.Therefore for the reflectance curve among Fig. 1 is moved to the left, make and be about 0 and occur maximum reflectivity when spending, and curve distribution is more broad, have reflecting brightness and wide-visual angle effect concurrently to reach, another kind of traditional method is with mirror surface inclination (slant), change the travel path of light, for example mirror surface is inclined relative to horizontal about 10 degree, makes originally to penetrate with the reflection angle of 20 degree incident angle incident optical energies with about 0 degree.With reference to Fig. 2, it represents another its light reflectance of traditional mirror surface and the graph of a relation that takes measurement of an angle.Wherein, mirror surface is to tilt to place and surface smoothing.Angle is 0 can measure maximum reflectivity R when spending
1But the reflectivity distribution curve of Fig. 2 is still very narrow, mostly concentrates near 0 degree, can't make liquid crystal display reach wide-visual angle effect.
In order to solve the problem that reflectivity too concentrates on a certain angle, another kind of traditional method is also to form projection on the mirror surface that tilts.With reference to Fig. 3, this figure is another traditional its light reflectance of mirror surface of expression and the graph of a relation that takes measurement of an angle.Wherein, mirror surface is to tilt to place and surface formation projection.Because mirror surface tilts, make near the angle 0 degree can measure high reflectance, and the normal angle of every bit is all different on the lug surface, also make the light can be with in wider angle internal reflection.Maximum reflectivity R in Fig. 3
2Compare with Fig. 2, because most light all concentrates on 0 degree among Fig. 2, so maximum reflectivity R
1Can be greater than maximum reflectivity R
2, still, the reflectivity distribution curve among Fig. 3 but becomes broader.Therefore, the mirror surface of this tool projection cube structure can make LCDs reach with reflecting brightness and wide-visual angle effect.As for above-mentioned technology, then can utilize a photomask with single opening, carry out multiexposure, multiple exposure (multi-step exposure) process and reach.For example, with exposure intensity L
1, time shutter t
1Photoresist on the substrate is exposed, form exposure area A; Follow mobile photomask, again with exposure intensity L
2With time shutter t
2Photoresist is exposed, form exposure area B; And then mobile photomask, expose, so repeat down.Wherein, utilize the time shutter to equate but exposure intensity L
1＞L
2＞.., or utilize exposure intensity to equate but time shutter t
1＞t
2＞.., and make the exposure area A＞B＞.. of formation.Then, develop (develop) photoresist is from high to low stepped.Then, heating is flowed (reflow) stepped photoresist again, and forms the photoresist with slick and sly surface.
Yet above-mentioned technology is to need continuous mobile photomask to expose respectively with the photoresist to zones of different, also need adjust position and the exposure intensity or the time of photomask, has shortcoming consuming time and the increase manufacturing cost.In addition, need repeatedly to move the photomask and the exposure of this single opening for forming single projection with a pitch angle, after development and heating, just can finish again, if will on mirror surface, increase the number of projection, that is the concavo-convex degree on the increase mirror surface makes light scatter more good, then technology can be more numerous and diverse consuming time, is unsuitable for very much batch production.
Summary of the invention
Therefore, purpose of the present invention is exactly in the declining lug structure and the manufacture method thereof that provide on a kind of mirror surface, utilize the optics diffraction method to finish declining lug structure, not only technology is simple, and the light scatter effect is more good, can make reflection type lcd panel reach the purpose that has reflecting brightness and wide viewing angle concurrently.
The object of the present invention is achieved like this, and a kind of manufacture method with catoptron of declining lug structure promptly is provided, and may further comprise the steps at least: a substrate is provided; On this substrate, form a photosensitive material layer; This photosensitive material layer of block planning is to form a plurality of projections with different floorages, and wherein, the bottom of these projections interconnects; Level and smooth these projections have the projection cube structure at a pitch angle with formation; And on this substrate, forming a metallic reflector, this metallic reflector also covers this declining lug structure.
The present invention also provides a kind of manufacture method of declining lug structure, may further comprise the steps at least: a substrate is provided; On this substrate, cover a photosensitive material layer; This photosensitive material layer of block planning to be forming set of diagrams case at least, and each picture group case is by having different floorages, and a plurality of projection that the bottom links to each other is formed; And level and smooth these projections, to form the projection cube structure at tool one pitch angle.
The present invention also provides a kind of manufacture method of declining lug structure, may further comprise the steps at least: form a photosensitive material layer on a substrate; This photosensitive material layer that exposes makes the first under-exposure of this photosensitive material layer simultaneously; This photosensitive material layer that develops is so that this first of this photosensitive material layer forms a recess; And level and smooth this photosensitive material layer, to form a continuous concaveconvex structure with a default pitch angle.
Synthetically say,, propose the manufacture method of the declining lug structure on a kind of mirror surface, may further comprise the steps at least: a substrate is provided according to purpose of the present invention; On substrate, form a photosensitive material layer; Block planning photosensitive material layer is forming a plurality of projections with different floorages, and the bottom of these projections is to interconnect; And level and smooth (smoothing) these projections, have many groups projection (bump) structure at a pitch angle with formation.Wherein, the step of block planning photosensitive material layer also comprises exposure (expose) and develops (develop), and provides a photomask (photomask) so that the photosensitive material layer is exposed.Wherein, comprise m picture group case (m is 〉=1 positive integer) on the photomask, each picture group case is made up of a plurality of strip shading regions of tool different in width, and has more a long and narrow shading region in the light-permeable gap between the strip shading region in twos at adjacent this.Make a plurality of prismatoids that form behind the exposure imaging be according to floorage greatly to minispread, and the bottom links to each other.Level and smooth step then by roasting mode (baking) make these prismatoids more mobile (reflow) finish.Each group projection cube structure is to be formed by connecting to little projection to low, arrogant from height by a plurality of, and to organize projection cube structure be regular more or randomly be formed on the substrate.
Description of drawings
Fig. 1 is traditional its light reflectance of a mirror surface of expression and the graph of a relation that takes measurement of an angle;
Fig. 2 is another its light reflectance of traditional mirror surface of expression and the graph of a relation that takes measurement of an angle;
Fig. 3 is another traditional its light reflectance of mirror surface of expression and the graph of a relation that takes measurement of an angle;
Fig. 4 is the part vertical view of expression according to the photomask of the embodiment of the invention;
Fig. 5 A～5C represents the tilt manufacture method of projection cube structure of the mirror surface according to the embodiment of the invention one;
Fig. 6 is the sectional axonometric drawing of expression according to the declining lug structure on the mirror surface of the embodiment of the invention one;
Fig. 7 is the part vertical view of expression according to the photomask of the embodiment of the invention two;
Fig. 8 is the tilt sectional axonometric drawing of projection cube structure of mirror surface that expression forms with the photomask of Fig. 7.
Fig. 9 A is the part vertical view of expression according to another photomask of the present invention;
Fig. 9 B is the part vertical view of expression according to the another photomask of the present invention;
Figure 10 is the part vertical view of expression according to another photomask of the present invention.
The reference numerals explanation
R
1, R
2: maximum reflectivity
L
1, L
2: exposure intensity
t
1, t
2: the time shutter
400,700: photomask
(401)
1, (401)
2, (401)
3, (401)
4... (401)
n, (901)
1, (901)
2, (901)
3: rectangular
W
1, W
2, W
3, W
4... W
n: rectangular width
d
1, d
2, d
3... d
n, (902)
1, (902)
2: the gap
s
1, s
2, s
3... s
n: the narrow width
405, S
11, S
12, S
21, S
22, S: narrow rectangular
W: slit width
θ: pitch angle
d
1', d
2', d
3', d
4', d
5': the distance between every picture group case
502: substrate
504,505,506,507,508,505 ', 506 ', 507 ', 508 ': photoresist
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, preferred embodiment cited below particularly, and be described in detail as follows with reference to accompanying drawing:
Technical characterstic of the present invention is, utilize optics diffraction method and to have the photomask of slit (slit) figure, make through the photosensitive material (photosensitivity material) after the single exposure development, for example be photoresist (photo resist), form many picture groups case, each picture group case comprises the projection (bump) that a plurality of bottoms are connected, and wherein, above-mentioned projection is from big to small, arranges from high to low.Afterwards, again projection is carried out smoothing step (smoothing process), for example make projection fusionization (melting) and flow again (reflow) with roasting mode (baking), one continuously slick and sly and have the projection at a default pitch angle to form, and each projection of each group be arrogant to little, from high to hanging down connection.
Use declining lug structure on the mirror surface of the present invention when reflection type liquid crystal display screen (reflective liquid crystal display), be that a metallic film is covered on the substrate, and the covering declining lug structure, to form a metallic reflector with reflection ray.Because this metallic reflector has the surface at and tool pitch angle same concavo-convex with declining lug structure, be able to when making the light that enters LCDs arrive at the metallic reflection laminar surface by the reflection of a plurality of different angles, and liquid crystal display reached have concurrently the purpose of reflecting brightness and wide viewing angle.
Below promptly do and illustrate at the declining lug structure on the mirror surface of the present invention and manufacture method thereof.Yet therefore do not limit the present invention.
Embodiment one
In this embodiment, be to utilize one to have the photomask of slit to form the declining lug structure on the mirror surface of the present invention.Wherein, comprise the m block graphics on the photomask, each block graphics is rectangular by the n bar of different in width, comforts oneself narrowly to form every a gap arrangement, and increases at least one narrow rectangularly between each gap, makes and forms many slits (multi-slits) on the photomask.Wherein, m is 〉=1 positive integer, and n is 〉=2 positive integer.
With reference to Fig. 4, the figure shows part vertical view according to the photomask of the embodiment of the invention one.Comprise the m block graphics on the photomask 400, each block graphics is by n bar rectangular (401)
1, (401)
2, (401)
3... (401)
nForm, and its width is respectively W
1, W
2, W
3..., W
nGap between rectangular is d in regular turn
1, d
2, d
3..., d
n, and in the gap with one narrow rectangular be example, narrow rectangular width is respectively s
1, s
2, s
3..., s
n, then arrange another block graphics behind each block graphics, so repeat down to arrange until finishing the m group.
Then, utilize the photomask 400 of Fig. 4, carry out design transfer.In following technology, for convenience of description, be hypothesis n=4, and d
1=d
2=d
3=...=d
n=d, s
1=s
2=s
3=...=s
n=s.
With reference to Fig. 5 A～5C, its expression is according to the manufacture method of the declining lug structure on the embodiment of the invention one mirror surface.Shown in Fig. 5 A, be coated with the photosensitive material of height h on the substrate 502, for example be photoresist 504, and with ultraviolet (UV) expose (exposure), develop (develop).Suppose to be dissolved in after photoresist 504 is for chance light the positive photoresist (positivephotoresist) of developer solution, and the oblique line on the photomask 400 partly is light tight district (opaque region).Wherein, on the photomask 400 except having width W respectively
1, W
2, W
3, and W
4Rectangular (401)
1, (401)
2, (401)
3, (401)
4Respectively have one narrow rectangular 405 in the gap between rectangular outward.The for example about 4 μ m of the width d in gap, therefore for example about 1 μ m of the width s of narrow 405 is about (4-1)/2=1.5 μ m from narrow rectangular 405 to adjacent rectangular distance.Because on the photomask 400 rectangular (401) in light tight district
1, (401)
2, (401)
3, (401)
4The photoresist 504 of below does not pass through the irradiation of ultraviolet, can not be dissolved in developer solution after therefore developing.And the gap on the photomask 400 is because light-permeable makes the corresponding photoresist 504 in below be dissolved in developer solution.
Existence that it should be noted that narrow rectangular 405 (Fig. 5 A) makes script more be separated into two littler slits (slit) with regard to little gap.During when ultraviolet irradiation downwards and by the gap, can produce double aperture slit diffraction (diffraction), light quantity by photomask 400 is reduced, and then the photoresist that makes gap on the corresponding photomask in below cause the situation of under-exposure (under exposure) simultaneously when exposure.Therefore, the photoresist of Fig. 5 A 504 is through after developing, and can form prismatoid photoresist 505,506,507 shown in Fig. 5 B, and 508, and the bottom of prismatoid photoresist is to interconnect.
In addition, the photoresist that floorage is big more, the height of photoresist is high more behind exposure imaging, otherwise then low more.For example, the height behind the width 14 μ m photoresist exposure imagings is the height greater than width 7 μ m photoresists.Therefore, in the present invention, because W
1＞W
2＞W
3＞W
4, therefore, the floorage ratio of the prismatoid photoresist shown in Fig. 5 B of back that develops is 505＞506＞507＞508, and its aspect ratio is h
1＞h
2＞h
3＞h
4
Then, fusion (melting) prismatoid photoresist 505,506,507, and 508 is to carry out smoothing (smooth) step.Because mainly being dissolved in the solvent by the emulsion of resin (resin) and tool photolytic activity (photoactivity), photoresist forms, therefore the photoresist after developing is through heating schedule, it for example is baking (baking), can be further with solvent residual in the photoresist, because of evaporation drops to minimum.Solvent in the photoresist reduces, and can strengthen the tack of photoresist to substrate surface.When heating-up temperature was increased to glass transformation temperature (glass transitiontemperature), photoresist is then softening to become similar glass fusion state at high temperature, and can flow (reflow) and smoothing in the surface again.Again because the prismatoid photoresist 505,506,507 among Fig. 5 B, and 508 bottoms link to each other, therefore, when carrying out level and smooth step, a plurality of prismatoid photoresists can form a plurality of continuous projections (contiguous bumps), shown in Fig. 5 C.Because the prismatoid photoresist 505,506,507 among Fig. 5 B, and 508 height be to arrange from high to low, the photoresist 505 that flows again in the therefore level and smooth step ', 506 ', 507 ', and 508 ' can form a tiltangle.Wherein, make the heating-up temperature scope of a plurality of prismatoid photoresist fusionizations preferable between 200～230 ℃, what heat time heating time was preferable is not about 1 hour, but not thereby limit the present invention, during practical application, heating-up temperature and time are to decide on the photo anti-corrosion agent material characteristic of selecting for use.
With reference to Fig. 6, its expression is according to the sectional axonometric drawing of the declining lug structure on the embodiment of the invention one mirror surface.Suppose that the pattern on the photomask 400 comprises 2 block graphicses (m=2), then according to Fig. 5 A～formed photoresist of 5C technology, can produce the projection cube structure of 2 groups of tool one pitch angle (inclined angle) θ, and each the group by 4 (n=4) projections (bump) from the height to low, arrogant to being formed by connecting for a short time.
When using the present invention in the mirror surface of a LCDs (LCD), then after the process of Fig. 5 C, on substrate 502, plate the layer of metal film, and cover photoresist 505 ', 506 ', 507 ', 508 ' surface (Fig. 5 C, Fig. 6), the surface that makes metallic film is as ups and downs photoresist surface.The declining lug structure of this mirror surface can reflect light from a plurality of angles, and makes LCD reach wide-visual angle effect.
From the above, declining lug structure representative: by a plurality of projections (formed many group (m) projection cube structures of m * n), and each group projection cube structure is formed by n projection, and n projection is descending, connect from high to low and form the projection cube structure at tool one pitch angle.
Certainly, in the above-described embodiments, though formed by n projection and do explanation with each group projection cube structure, so therefore the present invention is not restricted.But each group and the also projection of each self-contained different number between each is organized; for example first group has 5 projections; second group has 6 projections; the 3rd group has 4 projections; as long as change the pattern on the photomask; make exposure, development, the photoresist after melting can produce tool one pitch angle projection cube structure, is technical protection scope of the present invention.
Embodiment two
In embodiment two, provide the photomask pattern that another has slit, obtain declining lug structure to carry out manufacturing of the present invention.After the manufacturing, its projection concentration class of the photoresist of embodiment two is more than embodiment one, that is, the concavo-convex degree on the mirror surface improves, and the light scatter effect is more good.
Include m block graphics (m for 〉=1 positive integer) on the photomask of embodiment two, each block graphics is rectangular by many, and the narrow arrangement of comforting oneself forms, in the gap between rectangular also with one narrow rectangular be example.M block graphics (random) at random is arranged on the photomask, also can be as proper alignment as the matrix, for example long limit m ' group broadside n ' group (m=m ' * n ').In the present embodiment, for convenient narration, promptly with m block graphics random arrangement, and each block graphics includes n bar rectangular (n for 〉=2 positive integer) and does explanation.Wherein, m=4, n=3.
With reference to Fig. 7, its expression is according to the part vertical view of the photomask of the embodiment of the invention two.Wherein, have 4 block graphicses (being m=4) random alignment on photomask 700, each block graphics is comforted oneself narrow arrangement by 3 rectangular (being n=3) and is formed, and more has one narrow rectangular between rectangular.
Then, carry out the design transfer of photomask 700.It is made shown in Fig. 5 A～5C, and the photomask 400 of Fig. 5 A is replaced as photomask 700, carries out as embodiment one described exposure (exposure) then, develops (develop), and smoothing (smooth) three steps.Wherein, photoresist is a positive photoresist, and the oblique line on the photomask 700 partly is light tight district.In this embodiment, also need control the distance between each group and each group, d as shown in Figure 7
1', d
2', d
3', d
4', d
5', make respectively organizing photoresist and also can interconnect after the fusionization, make continuous being formed on the substrate of declining lug structure.
With reference to Fig. 8, this figure is the sectional axonometric drawing of expression with the projection cube structure on the mirror surface of the photomask formation of Fig. 7.Utilize photomask 700 formed photoresist (Fig. 8) after making, can produce the projection many, make the photoresist surface more concavo-convex than Fig. 6.Certainly, if the m block graphics pattern on the photomask as proper alignment as the matrix, as the figure of long limit m ' group broadside n ' group (m=m ' * n '), also can form projection cube structure of the present invention.
In the above-described embodiments, though be to do explanation with the optical mask pattern of Fig. 4 and Fig. 7, not in order to limit the scope of the invention.For example, can be that the random pattern of m group intersperses among on the photomask, each group is made up of to the light tight district of narrow arrangement a plurality of comforting oneself, it also can be the arrangement as m picture group case such as the matrix, as for the light tight district number of each group can be equal to not Zu light tight district number, or unequal, all can make the declining lug structure on the photoresist layer generation mirror surface after optical mask pattern shifts.In addition, the slit of optical mask pattern also is not limited only to double aperture slit shown in Figure 4, in addition can be shown in Fig. 9 A, in rectangular (901)
1With rectangular (901)
2Gap (902)
1In two narrow rectangular S are provided
11, S
12And rectangular (901)
1With narrow rectangular S
11, narrow rectangular S
11With narrow rectangular S
12, and narrow rectangular S
12With rectangular (901)
2, except the parallel lines that can be designed to Fig. 9 A are arranged, more can be depicted as shown in Fig. 9 B, slit width W keeps certain zigzag design etc.Or as shown in figure 10, in rectangular (101)
1With rectangular (101)
2Gap (102)
1, (102)
2In discontinuous narrow rectangular S is provided.This photomask design that has many slits (multi-slits) a bit also can be made into projection required for the present invention.
In addition, when carrying out the manufacturing of general TFT liquid crystal panel, part except projection cube structure, also have on the substrate some parts for example need expose out in order to the contact hole of the usefulness of circuit contacts (contact), therefore the photoresist of its top needs to remove fully, causes loose contact in order to avoid resistance value is excessive.And photomask of the present invention more forms narrow between light tight district, its advantage just is: when the ultraviolet light of use common intensity exposes, ultraviolet light produces double aperture slit diffraction by the slit of narrow both sides, the light quantity that arrives photoresist is reduced, the situation of similar under-exposure (under exposure), therefore through after developing, the bottom of photoresist can interconnect, and the photoresist after the fusionization can be formed continuously and the projection cube structure at tool one pitch angle very smoothly.As for making the exposed part of substrate with respect to needs on the photomask, then form opening ultraviolet light can be passed through fully, so that exposure is removed the photoresist on it fully via developing again.Briefly, the present invention can finish the declining lug structure on the mirror surface simultaneously under the exposure technology of general ultraviolet light quantity, and removes the photoresist on the substrate contact hole.
Therefore, observe from another angle, the manufacture method of the declining lug structure on the mirror surface of the present invention is to utilize one to comprise that the photomask of first area and second area exposes to the photosensitive material layer on the substrate.Wherein, the first area is the photic zone for the many narrow slit structures of a tool, make the first of photosensitive material layer form recess (concave portion) in under-exposed (under-exposed) mode, second area is light tight district then, and the second portion of photosensitive material layer is not exposed.Then, develop, this second portion of photosensitive material layer is bonded with each other via first, and form the projection that most bottoms link to each other.Then, smoothing (smooth) photosensitive material layer is to form a continuous concaveconvex structure (contiguous deformitystructure) with a default pitch angle (predetermined inclined angle).
In sum, the present invention utilizes one to have many slits photomask and simple technology, pass through single exposure, development, reach the smoothing step, can on mirror surface, form many group declining lug structures, make the effect of light scatter more good, and make the reflection type lcd panel (reflective LCD) of application reach the purpose that has reflecting brightness and wide viewing angle concurrently.In addition, the number of the m of composition pattern and n is many more on photomask, and it is just many more to make the formed projection number of back per unit area, that is the concentration class of projection is high more, and the effect of light scatter is more good.
Declining lug structure and manufacture method thereof on the disclosed mirror surface of the above embodiment of the present invention,
Have the following advantages:
1. the projection concentration class on the minute surface of the present invention more increases than traditional handicraft, makes the light scatter effect better, and then makes the reflection type lcd panel of application have the advantage of reflecting brightness and wide viewing angle concurrently.
2. only need use the process of single exposure can form declining lug structure of the present invention, make work simplification, and manufacturing cost and time thereby reduction, very suitable batch process.
3. only need under general exposure, finish the declining lug structure on the mirror surface of the present invention, and remove the photoresist on the substrate contact hole simultaneously fully, so technology of the present invention extremely saves time, and have economic benefit.
In sum; though the present invention with preferred embodiment openly as above; right its is not in order to limit the present invention; any those skilled in the art; without departing from the spirit and scope of the present invention; when can making various changes and remodeling, thus protection scope of the present invention should with claims scope was defined is as the criterion.
Claims (17)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01137577 CN1229674C (en) | 2000-09-29 | 2001-10-30 | Inclined bump structure on mirror surface and manufacturing method thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP300028/2000 | 2000-09-29 | ||
| CN 01137577 CN1229674C (en) | 2000-09-29 | 2001-10-30 | Inclined bump structure on mirror surface and manufacturing method thereof |
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| Publication Number | Publication Date |
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| CN1416016A CN1416016A (en) | 2003-05-07 |
| CN1229674C true CN1229674C (en) | 2005-11-30 |
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| CN 01137577 Expired - Fee Related CN1229674C (en) | 2000-09-29 | 2001-10-30 | Inclined bump structure on mirror surface and manufacturing method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104667175B (en) * | 2015-02-04 | 2017-12-12 | 辽宁中医药大学 | A kind of health products with protection alcoholic liver injury function |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1704847B (en) * | 2004-05-28 | 2010-11-10 | 鸿富锦精密工业（深圳）有限公司 | Light shield and method for making inclined reflection bumpers by using the same |
| CN100443996C (en) * | 2006-05-30 | 2008-12-17 | 友达光电股份有限公司 | Backlight module |
| CN101246274B (en) * | 2007-02-15 | 2010-12-22 | 红蝶科技(深圳)有限公司 | Projection type area light source system |
| CN104199209A (en) * | 2014-07-28 | 2014-12-10 | 京东方科技集团股份有限公司 | Mask plate, manufacturing method thereof and manufacturing method of target graph |
| US9880415B2 (en) * | 2016-01-11 | 2018-01-30 | Giantplus Technology Co., Ltd. | Liquid crystal display module |
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2001
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104667175B (en) * | 2015-02-04 | 2017-12-12 | 辽宁中医药大学 | A kind of health products with protection alcoholic liver injury function |
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| CN1416016A (en) | 2003-05-07 |
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