CN1229265A - Method for preventing failure in semiconductor fabricating process due to change in process condition recipe - Google Patents
Method for preventing failure in semiconductor fabricating process due to change in process condition recipe Download PDFInfo
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Abstract
一种防止因工艺条件规范改变而引起的半导体制造工艺失效的方法,该方法包括以下步骤:如果特定工艺变量的实时工艺条件改变,那么半导体制造设备向主计算机报告已改变的工艺条件规范;然后主计算机判定该改变的工艺变量的实时工艺数据是否包括在规定数据内;如果改变的工艺变量的实时工艺数据不包括在规定数据内,那么将互锁有关的半导体制造设备,从而防止半导体工艺中的失效。
A method of preventing failure of a semiconductor manufacturing process due to a change in process condition specification, the method comprising the steps of: if real-time process conditions for a particular process variable change, the semiconductor fabrication equipment reports the changed process condition specification to a host computer; and then The main computer judges whether the real-time process data of the changed process variable is included in the specified data; if the real-time process data of the changed process variable is not included in the specified data, it will interlock the relevant semiconductor manufacturing equipment, thereby preventing the semiconductor process from failure.
Description
本发明涉及防止因工艺条件规范(recipe)改变而引起的半导体制造工艺失效的方法,特别涉及这样一种防止半导体制造工艺失效的方法,即,将由工程师改变的存储于半导体制造设备中的工艺变量的实时工艺数据与存储于主计算机中的规定数据比较,并且在该实时工艺数据不在规定数据内时互锁半导体制造设备。The present invention relates to a method for preventing the failure of a semiconductor manufacturing process caused by a change in a process condition specification (recipe), and in particular to such a method for preventing a failure of a semiconductor manufacturing process, that is, the process variable stored in a semiconductor manufacturing device changed by an engineer The real-time process data is compared with the specified data stored in the host computer, and the semiconductor manufacturing equipment is interlocked when the real-time process data is not within the specified data.
一般通过大量按顺序进行的单元处理工艺制造半导体器件,并且各单元处理工艺要求极高的精确度水平。因此,不能人工地执行单元处理工艺。因而沿半导体工艺线排列多个复杂的设备部分,例如CVD设备、溅射设备、腐蚀设备和测量设备,形成单元处理工艺顺序,并且按预定工艺顺序该设备执行单元工艺。Semiconductor devices are generally manufactured through a large number of sequential unit processing processes, and each unit processing process requires an extremely high level of precision. Therefore, the unit processing process cannot be manually performed. Thus, a plurality of complex equipment parts, such as CVD equipment, sputtering equipment, etching equipment, and measurement equipment, are arranged along the semiconductor process line to form a unit process sequence, and the equipment performs the unit process in a predetermined process sequence.
近来,为使半导体制造设备的操作效率最高,引入了一种维护半导体制造设备的系统。Recently, in order to maximize the operating efficiency of semiconductor manufacturing equipment, a system for maintaining semiconductor manufacturing equipment has been introduced.
用于设备维护的系统由下列部分组成:多个执行半导体制造工艺的设备部分,与半导体制造设备相互联机连接且直接控制该设备的设备服务器,与设备服务器联机连接且其中存储用于控制半导体制造设备的数据库的主计算机,和与主计算机联机连接且供给操作者有关半导体制造工艺数据的操作者接口个人计算机(O/I PC)。A system for equipment maintenance is composed of a plurality of equipment sections that perform semiconductor manufacturing processes, an equipment server that is connected on-line with the semiconductor manufacturing equipment and directly controls the equipment, and that is connected on-line with the equipment server and stores therein a The main computer of the database of the equipment, and the operator interface personal computer (O/I PC) that is connected on-line with the main computer and provides the operator with data about the semiconductor manufacturing process.
在这种设备维护系统中,如果将其上装载晶片的一批(a lot)送入半导体制造设备中,那么操作者便通过I/O PC输入有关工艺的基本数据,例如送入设备中的批量的标识号码(ID)或半导体制造设备的ID。In this equipment maintenance system, if a lot on which wafers are loaded is sent into the semiconductor manufacturing equipment, the operator inputs basic data about the process through the I/O PC, such as the The identification number (ID) of the lot or the ID of the semiconductor manufacturing equipment.
然后,根据输入的基本数据,主计算机检索要施加工艺的工艺条件规范的主计算机数据库。主计算机立即对设备卸载这些工艺条件规范。Then, based on the basic data entered, the host computer searches the host computer database for process condition specifications of the process to be applied. The host computer immediately offloads these process condition specifications to the equipment.
在执行半导体制造工艺一段时间之后,工程师通过替换设备的特殊部分,清洗设备,改变特定规范,例如存储在设备或主计算机中的与半导体制造直接有关的工艺条件规范中的特定工艺变量的实时工艺数据等对设备进行预防性维护。在设备中制造其它半导体产品期间以及设备的预防性维护期间,改变特定工艺变量的实时工艺数据。After performing the semiconductor manufacturing process for a period of time, engineers change specific specifications such as real-time process of specific process variables in the specification of process conditions directly related to semiconductor manufacturing stored in the equipment or host computer by replacing special parts of the equipment, cleaning the equipment, preventive maintenance of equipment. Real-time process data for changing specific process variables during manufacture of other semiconductor products in the facility and during preventive maintenance of the facility.
可是,为了执行预防性维护或批量生产另一种半导体,工程师可改变半导体制造设备或主计算机中的这种特定工艺变量的实时工艺数据。在这种情况下,如果由于工程师的错误,不正确地输入了特定工艺变量的实时工艺数据,则出现半导体产品的失效。由于执行半导体制造工艺的操作者或维护设备的工程师没有配备这样一种装置,即该装置可确定该特定工艺变量的实时工艺数据是被正确地输入还是被错误地输入,因而出现这种问题。However, in order to perform preventive maintenance or mass-produce another semiconductor, an engineer may change the real-time process data of this particular process variable in semiconductor manufacturing equipment or a host computer. In this case, if the real-time process data of a specific process variable is incorrectly input due to an engineer's error, failure of the semiconductor product occurs. This problem arises because the operator performing the semiconductor manufacturing process or the engineer maintaining the equipment is not equipped with a means to determine whether the real-time process data for that particular process variable was entered correctly or incorrectly.
所以,本发明的目的是提供一种防止半导体生产失效的方法,即在预防性维护或批量生产另一种半导体时,工程师改变了特定工艺变量的实时工艺数据,在这种情况下,主计算机将在半导体制造设备中的已改变的特定工艺变量的实时工艺数据与存储于主计算机中的规定数据进行比较,如果在改变的该特定工艺变量的实时工艺数据未包括在规定数据内时,便互锁有关的半导体制造设备。Therefore, the object of the present invention is to provide a method to prevent the failure of semiconductor production, that is, during preventive maintenance or mass production of another semiconductor, the engineer changes the real-time process data of a specific process variable, in this case, the host computer Comparing the real-time process data of the changed specific process variable in the semiconductor manufacturing equipment with the prescribed data stored in the host computer, if the changed real-time process data of the specific process variable is not included in the prescribed data, then Interlock related semiconductor manufacturing equipment.
为实现上述目的和其它优点,提供一种防止因工艺条件规范改变而引起的半导体制造工艺失效的方法,所述方法包括下列步骤:改变存储于半导体制造设备的工艺条件规范中的特定工艺变量的实时工艺数据;从半导体制造设备向主计算机报告已改变的工艺条件规范;由主计算机将从半导体制造设备加载的已改变的工艺条件规范与存储于主计算机中的相应的工艺条件规范进行比较,并由主计算机确定已改变的实时工艺条件数据是否包括在规定数据内;和如果该实时工艺数据包括在规定数据内,便由主计算机将实时工艺数据卸载到用户接口计算机,如果实时工艺数据没有包括在规定数据内,那么由主计算机互锁半导体制造设备,以防止执行半导体制造工艺。In order to achieve the above objects and other advantages, there is provided a method of preventing failure of a semiconductor manufacturing process caused by a change in process condition specification, the method comprising the steps of: changing the specific process variable stored in the process condition specification of a semiconductor manufacturing equipment real-time process data; the changed process condition specification is reported from the semiconductor manufacturing equipment to the host computer; the host computer compares the changed process condition specification loaded from the semiconductor fabrication equipment with the corresponding process condition specification stored in the host computer, and determine whether the changed real-time process condition data is included in the specified data by the host computer; and if the real-time process data is included in the specified data, then the host computer will unload the real-time process data to the user interface computer, if the real-time process data does not Included in the prescribed data, then the semiconductor manufacturing equipment is interlocked by the host computer to prevent execution of the semiconductor manufacturing process.
最好,规定数据作为被记录于主计算机中的数据库。Preferably, the prescribed data are as a database recorded in the host computer.
同时,在上述比较和确定步骤中,如果已改变的实时工艺数据没有包括在规定数据内,那么在用户接口计算机上卸载并显示告警消息。Meanwhile, in the above comparison and determination step, if the changed real-time process data is not included in the prescribed data, then an alarm message is downloaded and displayed on the user interface computer.
此外,如果半导体制造设备被互锁,那么工程师重新改变实时工艺数据,使其包括在规定数据内,就可释放互锁。In addition, if the semiconductor manufacturing equipment is interlocked, the engineer can release the interlock by changing the real-time process data to be included in the specified data.
通过参照附图详细说明优选实施例,本发明的上述目的和其它优点将更明显,其中:The above objects and other advantages of the present invention will be more apparent by describing in detail preferred embodiments with reference to the accompanying drawings, in which:
图1是本发明半导体维护系统的框图;Fig. 1 is the block diagram of semiconductor maintenance system of the present invention;
图2示出存储于主计算机数据库中的工艺条件规范;Figure 2 shows the specification of process conditions stored in the main computer database;
图3A至3C示出在半导体制造设备中已改变的工艺条件规范;和3A to 3C show specifications of process conditions which have been changed in semiconductor manufacturing equipment; and
图4是表示用于防止因工艺条件规范改变而引起的半导体制造工艺失效的方法的流程图。FIG. 4 is a flowchart representing a method for preventing semiconductor manufacturing process failures due to process condition specification changes.
附图中展示了本发明的最佳实施例,下面将参照附图更详细地说明本发明。然而,本发明可以许多不同的形式实施,并不限于这里所提出的实施例,提供这些实施例是为了充分和完整地公开发明,使本领域的技术人员可充分地理解本发明的范围。Preferred embodiments of the invention are shown in the accompanying drawings, and the invention will be described in more detail below with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and is not limited to the embodiments set forth herein so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
如图1所示,半导体维护系统1包括多个半导体制造设备40,多个设备服务器30,主计算机10和用户接口计算机50。半导体制造设备40引入已完成先决条件工艺的批量(lot),并执行半导体制造工艺;多个设备服务器30与半导体制造设备40联机连接,直接控制半导体制造设备40执行半导体制造工艺;主计算机10与设备服务器30联机连接,其中存储有数据库,用于提供来自设备服务器30的所需的大批数据以控制半导体制造设备40;用户接口计算机50与主计算机10联机连接,其用于将与半导体制造工艺有关的数据提供给操作者或工程师。As shown in FIG. 1 , the
其中,半导体制造设备40和设备服务器30利用半设备通信标准(SECS)协议共用或交换数据。设备服务器30和主计算机10利用传输控制协议/因特网络协议(TCP/IP)交换数据。Among them, the
同时,存储在主计算机10中的数据库包括与半导体制造工艺有关的所有数据,以使在半导体制造工艺中的所有半导体制造设备40可在最佳条件下执行工艺。该数据库包括:例如,各半导体制造设备的工艺流程,实施工艺的环境要求,和工艺条件规范20等。Meanwhile, the database stored in the
参照图2说明工艺条件规范20,在该规范中规定了半导体制造设备40的工艺条件。The process condition specification 20 in which the process conditions of the
第一栏表示工艺变量21,例如温度21a,压力21b和加工时间21c。第二栏表示可执行半导体制造工艺中的工艺允许范围(下称规定数据23),即从最小工艺值到最大工艺值的范围,在该范围中半导体制造设备30可执行加工。第三栏表示实时工艺数据25,在半导体制造设备40已执行半导体制造工艺时它导致在规定数据23中的最低失效率。The first column represents process variables 21 such as temperature 21a, pressure 21b and processing time 21c. The second column indicates a process allowable range (hereinafter referred to as specified data 23 ) in an executable semiconductor manufacturing process, that is, a range from a minimum process value to a maximum process value in which the
例如,如果温度21a的规定数据23为Ha~Hc(℃),压力21b的规定数据23为Pa~Pc(torr),和加工时间21c的规定数据23为Ta~Tc(min),那么通过设备服务器30卸载到半导体制造设备40的实时工艺数据25实际为温度21a为Ha,压力21b为Pb,和加工时间21c为Tb。For example, if the specified data 23 of the temperature 21a is Ha~Hc (°C), the specified data 23 of the pressure 21b is Pa~Pc (torr), and the specified data 23 of the processing time 21c is Ta~Tc (min), then through the equipment The real-time process data 25 unloaded from the
同时,图3a所示的工艺条件规范32也存储于半导体制造设备40中。在工艺条件规范32中,记录着存储于主计算机10的工艺条件规范32中的除了规定数据23的工艺变量33和实时工艺数据35。其中,参考标号33a指工艺变量中的温度,33b指压力,33c指加工时间。Meanwhile, the
其中,如果进行预防性维护或需要使用相同的半导体制造设备40批量生产另一种半导体,那么工程师可将存储于半导体制造设备40的工艺条件规范32中的特定工艺变量33的实时工艺数据35改变为图3b和3c所示的那些值。Wherein, if preventive maintenance is performed or another semiconductor needs to be mass-produced using the same
图3b表示与图3a中的所示的工艺条件规范32相同的工艺条件规范,除了将实时工艺数据35改变为Hc。示于图3c中的工艺条件规范32″与示于图3a的工艺条件规范32相同,除了将实时工艺数据35从Hb改变为Hd。因此,将省略其详细说明。Figure 3b shows the same process condition specification as the
下面参照图4说明将图3a中所示的工艺条件规范32改变为图3b和3c中所示的那些工艺条件规范时,防止半导体制造工艺中出现操作问题的方法。A method of preventing operational problems in a semiconductor manufacturing process when changing the
例如,当进行改变半导体制造设备41的特定部分或清洁半导体制造设备41的预防性维护时,或用半导体制造设备41批量生产其它半导体时,工程师改变存储于半导体制造设备41中的特殊规范,例如工艺条件规范32。工艺条件规范32可在预防性维护的操作中被改变。即,如果用预定实时工艺数据进行测试,以便使半导体制造工艺中的失效率最小,和如果与使用实时工艺数据35的情况相比,可降低失效率,那么改变实时工艺数据35为测试时所用的那些规定数据。For example, when performing preventive maintenance to change a specific part of the
如果工程师改变图3a所示工艺条件规范32中的特定工艺变量33,例如将在半导体制造设备41中的温度33a的实时工艺数据Hb变为图3b所示温度33a的实时工艺数据Hc,那么如图4的步骤120所示,半导体制造设备41通过设备服务器31将工艺变量33被改变的情况报告给主计算机10。If the engineer changes the
接着,为了确认改变了哪些工艺变量和怎样进行的改变,主计算机10请求半导体制造设备41提供与改变的工艺条件规范32有关的所有数据。然后,如图4的步骤130所示,半导体制造设备41根据主计算机10的请求,加载改变的工艺条件规范32′。Next, in order to confirm which process variables were changed and how the changes were made, the
然后,主计算机10检索在数据库中的所有工艺条件规范,以便发现半导体制造设备41的工艺条件规范20。当经过预定时间周期之后发现工艺条件规范20时,主计算机10将工艺条件规范20与从半导体制造设备41加载的工艺条件规范32′进行比较,确认将温度21a和33a的实时工艺数据25和35从Hb改变为Hc。Then, the
接下来,如图4的步骤140所示,主计算机10判定已变为Hc的温度33a的实时工艺数据35是否在数据库中的规定数据23内,即是否在Ha~Hc的范围内。Next, as shown in step 140 of FIG. 4 , the
如果实时工艺数据Hc在规定数据Ha~Hc内,那么如图4的步骤150所示,主计算机10在半导体制造设备41的显示器或图1的输入/输出(I/O)计算机50上显示实时工艺数据Hc。If the real-time process data Hc is within the specified data Ha~Hc, then as shown in step 150 of FIG. Process data Hc.
但是,如果工程师将温度33a的实时工艺数据35搞错成图3c中所示的Hd,那么主计算机10确定实时工艺数据Hd不在数据库中记录的规定数据Ha~Hc内。However, if the engineer mistakes the real-
在这种情况下,主计算机10通过设备服务器31将告警消息和实时工艺数据Hd传输给半导体制造设备41和I/O计算机50。随后,如图4的步骤160所示,在半导体制造设备41的显示器和I/O计算机50上显示实时工艺数据Hd和告警消息。这是为了使其它工程师或操作者容易识别由该工程师不正确地输入的温度21a的实时工艺数据35。In this case, the
然后,如图4的步骤170所示,主计算机10通过设备服务器31将互锁信号传输给半导体制造设备41,以防止使用不正确输入的实时工艺数据Hd执行半导体制造工艺。这是为了直到该实时工艺数据Hd被清除为止禁止对另一个包括在规定数据Ha~Hc中的数据的半导体制造设备41的操作。Then, as shown in step 170 of FIG. 4 , the
如果实时工艺数据Hd和告警消息被显示在半导体制造设备41的显示器和I/O计算机50上,则该工程师应确认它们。如果确定实时工艺数据Hd是不正确的输入,那么如图4的步骤180所示,该工程师将该实时工艺数据Hd改变为Hc,以便使其包括在主计算机10的数据库中的规定数据Ha~Hc内。If the real-time process data Hd and alarm messages are displayed on the display of the
如果该工程师将该实时工艺数据Hd改变为Hc,半导体制造设备41便向主计算机报告工艺条件规范3200″已被改变。然后,主计算机10将半导体制造设备41的工艺条件规范20与半导体制造设备41报告的工艺条件规范20进行比较,并检索已经改变的工艺变量33。If the engineer changes the real-time process data Hd to Hc, the
接着,主计算机10将改变的工艺变量33即温度33a的实时工艺数据Hc与规定数据Ha~Hc比较,以便确定该实时工艺数据Hc是否包括在规定数据Ha~Hc中。如果该实时工艺数据Hc包括在规定数据Ha~Hc中,那么将取消对半导体制造设备41的互锁,如图4的步骤190所示。Next, the
当工程师确认该告警消息和温度33a的实时工艺数据35时,既使当该实时工艺数据35是按照操作者的指意正确地输入时,如果显示告警消息,那么工程师应确认记录在主计算机10的数据库中的温度21a的规定数据23。如果温度21a的规定数据23是不正确的输入,那么应重新输入温度21a的规定数据23,以便释放对半导体制造设备41的互锁。When the engineer confirms the alarm message and the real-
如上所述,在本发明中,如果为了批量生产其它半导体或在按进度对半导体制造设备进行预防性维护时,改变特定工艺参量的实时工艺条件,那么半导体制造设备向主计算机报告改变的工艺条件规范。然后,主计算机确定该改变的特定工艺变量的实时工艺数据是否在规定数据内。如果该实时工艺数据不包括在规定数据内,那么将互锁相关的半导体制造设备。因此,可消除因不正确地输入实时工艺数据而引起的半导体生产中的失效。As described above, in the present invention, if the real-time process condition of a specific process parameter is changed for the mass production of other semiconductors or when performing preventive maintenance on the semiconductor fabrication facility according to schedule, the semiconductor fabrication facility reports the changed process condition to the host computer specification. Then, the host computer determines whether the real-time process data of the changed specific process variable is within the specified data. If the real-time process data is not included in the specified data, then the relevant semiconductor manufacturing equipment will be interlocked. Therefore, failures in semiconductor production caused by incorrect input of real-time process data can be eliminated.
参照上述实施例已描述了本发明。然而,显然本领域的技术人员按照以上说明可以显而易见地进行许多替换、修改和变更。因此,本发明涵盖了落入本发明权利要求的精神和范围中的所有这些替换、修改和变更。The present invention has been described with reference to the above-mentioned embodiments. However, it is evident that many alternatives, modifications and variations may be apparent to those skilled in the art in light of the above description. Accordingly, the present invention embraces all such alternatives, modifications and changes that fall within the spirit and scope of the claims of the present invention.
Claims (5)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR8480/98 | 1998-03-13 | ||
| KR1019980008480A KR19990074696A (en) | 1998-03-13 | 1998-03-13 | How to prevent semiconductor process defects by changing process conditions recipe |
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| CN1229265A true CN1229265A (en) | 1999-09-22 |
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| CN98119487A Pending CN1229265A (en) | 1998-03-13 | 1998-10-30 | Method for preventing failure in semiconductor fabricating process due to change in process condition recipe |
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| Country | Link |
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| JP (1) | JPH11345751A (en) |
| KR (1) | KR19990074696A (en) |
| CN (1) | CN1229265A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102096412B (en) * | 2006-05-31 | 2013-03-27 | 东京毅力科创株式会社 | Information processing apparatus, semiconductor manufacturing system and information processing method |
| CN105094069A (en) * | 2014-05-15 | 2015-11-25 | 中芯国际集成电路制造(上海)有限公司 | Process control method and system in manufacturing process of semiconductor device |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5168748B2 (en) * | 2001-05-28 | 2013-03-27 | 東京エレクトロン株式会社 | Semiconductor manufacturing apparatus management system and semiconductor manufacturing apparatus management method |
| KR100705414B1 (en) * | 2002-04-12 | 2007-04-10 | 삼성전자주식회사 | Interlock system and its prevention method |
| KR100598398B1 (en) | 2004-10-22 | 2006-07-07 | 삼성전자주식회사 | Sensor data correction method and interlock evaluation method of interlock system |
| JP5077992B2 (en) | 2006-11-06 | 2012-11-21 | 東京エレクトロン株式会社 | Server apparatus, information processing method, and program |
| WO2008096792A1 (en) * | 2007-02-07 | 2008-08-14 | Tokyo Electron Limited | Server device, information processing method, and program |
| JP2014041976A (en) | 2012-08-23 | 2014-03-06 | Toshiba Corp | Recipe management device |
-
1998
- 1998-03-13 KR KR1019980008480A patent/KR19990074696A/en not_active Ceased
- 1998-10-30 CN CN98119487A patent/CN1229265A/en active Pending
- 1998-12-24 JP JP10366437A patent/JPH11345751A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102096412B (en) * | 2006-05-31 | 2013-03-27 | 东京毅力科创株式会社 | Information processing apparatus, semiconductor manufacturing system and information processing method |
| CN105094069A (en) * | 2014-05-15 | 2015-11-25 | 中芯国际集成电路制造(上海)有限公司 | Process control method and system in manufacturing process of semiconductor device |
| CN105094069B (en) * | 2014-05-15 | 2017-12-29 | 中芯国际集成电路制造(上海)有限公司 | Process control method and system in fabrication of semiconductor device |
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| Publication number | Publication date |
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| KR19990074696A (en) | 1999-10-05 |
| JPH11345751A (en) | 1999-12-14 |
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