CN1225489C - 可光致固化组合物、固化体及其制造方法 - Google Patents
可光致固化组合物、固化体及其制造方法 Download PDFInfo
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- CN1225489C CN1225489C CNB018102506A CN01810250A CN1225489C CN 1225489 C CN1225489 C CN 1225489C CN B018102506 A CNB018102506 A CN B018102506A CN 01810250 A CN01810250 A CN 01810250A CN 1225489 C CN1225489 C CN 1225489C
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/06—Substrate layer characterised by chemical composition
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
| 双(甲基)丙烯酸酯 | 单(甲基)丙烯酸酯 | 巯基化合物 | |
| 实施例1 | (A)94 | (B)6 | (C)6 |
| 实施例2 | (A)92 | (B)8 | (C)6 |
| 实施例3 | (A)96 | (B)4 | (C)6 |
| 比较例1 | (A)99.5 | (B)0.5 | (C)6 |
| 比较例2 | (A)60 | (B)40 | (C)6 |
| 比较例3 | (A)94 | (B)6 | 无 |
| 光线透射率(%) | 双折射(nm) | 耐热性Tg(℃) | 耐冲击性(cm) | 挠曲弹性模量(MPa) | 吸水率(%) | 脱膜性 | |
| 实施例1 | 92 | 0.4 | 190 | 100 | 4000 | 0.5 | ○ |
| 实施例2 | 92 | 0.4 | 190 | 110 | 4100 | 0.5 | ○ |
| 实施例3 | 92 | 0.4 | 190 | 90 | 3900 | 0.5 | ○ |
| 比较例1 | 92 | 1.0 | 190 | 60 | 3700 | 0.5 | △ |
| 比较例2 | 92 | 0.4 | 130 | 100 | 3000 | 1.0 | ○ |
| 比较例3 | 91 | 5.0 | 250 | 40 | 3400 | 0.3 | × |
| 光线透射率(%) | 双折射(nm) | 耐热性Tg(℃) | 耐冲击性(cm) | 挠曲弹性模量(MPa) | 吸水率(%) | 脱模性 | 紫外线照射试验时色相(YI值) | ||
| 试验前 | 试验后 | ||||||||
| 实施例4 | 91 | 0.6 | 190 | 75 | 4100 | 0.5 | ○ | 1.46 | 1.78 |
| 实施例5 | 91 | 0.6 | 190 | 65 | 3900 | 0.5 | ○ | 1.49 | 1.86 |
| 实施例6 | 92 | 0.5 | 190 | 65 | 3800 | 0.5 | ○ | 1.39 | 1.95 |
| 实施例7 | 91 | 0.6 | 190 | 70 | 4000 | 0.5 | ○ | 1.55 | 4.15 |
| 实施例8 | 92 | 0.7 | 190 | 65 | 3900 | 0.5 | ○ | 1.63 | 3.73 |
| 实施例9 | 91 | 5.5 | 190 | 70 | 4100 | 0.5 | ○ | 1.56 | 3.59 |
| 光线透射率(%) | 双折射(nm) | 耐热性Tg(℃) | 耐冲击性(cm) | 挠曲弹性模量(MPa) | 吸水率(%) | 脱模性 | 加热时色相(YI值) | ||
| 试验前 | 试验后 | ||||||||
| 实施例10 | 92 | 0.6 | 190 | 70 | 4000 | 0.5 | ○ | 0.76 | 1.74 |
| 实施例11 | 91 | 0.5 | 190 | 70 | 3900 | 0.5 | ○ | 0.89 | 1.96 |
| 实施例12 | 92 | 0.5 | 190 | 65 | 4000 | 0.5 | ○ | 0.95 | 1.99 |
| 实施例13 | 92 | 0.6 | 190 | 70 | 4000 | 0.5 | ○ | 1.32 | 3.03 |
| 实施例14 | 91 | 5.5 | 190 | 65 | 4100 | 0.5 | ○ | 1.29 | 2.95 |
Claims (13)
Applications Claiming Priority (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP94717/00 | 2000-03-30 | ||
| JP94716/2000 | 2000-03-30 | ||
| JP94716/00 | 2000-03-30 | ||
| JP94717/2000 | 2000-03-30 | ||
| JP2000094717 | 2000-03-30 | ||
| JP2000094716 | 2000-03-30 | ||
| JP336117/2000 | 2000-11-02 | ||
| JP336117/00 | 2000-11-02 | ||
| JP336118/00 | 2000-11-02 | ||
| JP336118/2000 | 2000-11-02 | ||
| JP2000336117 | 2000-11-02 | ||
| JP2000336118 | 2000-11-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1432029A CN1432029A (zh) | 2003-07-23 |
| CN1225489C true CN1225489C (zh) | 2005-11-02 |
Family
ID=27481162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB018102506A Expired - Lifetime CN1225489C (zh) | 2000-03-30 | 2001-03-27 | 可光致固化组合物、固化体及其制造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6759104B2 (zh) |
| EP (1) | EP1275668B1 (zh) |
| KR (1) | KR100795740B1 (zh) |
| CN (1) | CN1225489C (zh) |
| AU (1) | AU2001242817A1 (zh) |
| WO (1) | WO2001074918A1 (zh) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004198542A (ja) * | 2002-12-16 | 2004-07-15 | Showa Denko Kk | カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物 |
| JPWO2004104059A1 (ja) * | 2003-05-26 | 2006-07-20 | オムロン株式会社 | 硬化型樹脂組成物、光学部品および光導波路 |
| CN100581792C (zh) * | 2004-03-22 | 2010-01-20 | 亨斯迈先进材料(瑞士)有限公司 | 可光致固化组合物 |
| US8105759B2 (en) * | 2005-07-05 | 2012-01-31 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition |
| JP2007234424A (ja) * | 2006-03-01 | 2007-09-13 | Nitto Denko Corp | 透明導電性フィルムおよびタッチパネル |
| EP2071633A4 (en) * | 2006-08-31 | 2011-03-16 | Nat Inst Of Advanced Ind Scien | TRANSPARENT ELECTRODE SUBSTRATE FOR A SOLAR CELL |
| US20080095995A1 (en) * | 2006-10-18 | 2008-04-24 | Hong Rae Cha | Filter and flat panel display device using the filter |
| WO2010067779A1 (ja) * | 2008-12-09 | 2010-06-17 | 出光興産株式会社 | 光学部品用樹脂原料組成物、光学部品用樹脂および光学部品 |
| US7766668B1 (en) * | 2009-02-11 | 2010-08-03 | Avx Corporation | Low profile electrical conductor assembly for interconnecting conductive components in a stacked configuration |
| JP5163812B2 (ja) | 2009-05-20 | 2013-03-13 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物、硬化膜、保護膜、層間絶縁膜、およびそれを用いた半導体装置、表示素子 |
| TWI381303B (zh) * | 2010-02-09 | 2013-01-01 | Oji Paper Co | 導電性積層體及使用其之觸控面板 |
| JP5869916B2 (ja) * | 2012-03-02 | 2016-02-24 | デンカ株式会社 | 光硬化性樹脂組成物 |
| US9193888B2 (en) | 2012-03-19 | 2015-11-24 | Basf Se | Radiation-curable aqueous dispersions |
| EP2828311A1 (de) | 2012-03-19 | 2015-01-28 | Basf Se | Strahlungshärtbare wässrige dispersionen |
| KR101611006B1 (ko) * | 2013-08-13 | 2016-04-08 | 제일모직주식회사 | 광경화 조성물 및 이를 사용하여 제조된 봉지화된 장치 |
| US9840635B2 (en) | 2013-11-05 | 2017-12-12 | Construction Research & Technology, Gmbh | Binding agent systems |
| DK3201261T3 (en) | 2014-10-01 | 2019-04-08 | Basf Se | PROCEDURE FOR Curing HARDWARE COMPOSITIONS |
| CN112707984B (zh) * | 2021-01-11 | 2022-04-05 | 西安交通大学 | 一种基于动态共价键的4d打印光敏树脂及其制备方法 |
| US11753497B2 (en) * | 2021-04-29 | 2023-09-12 | Canon Kabushiki Kaisha | Photocurable composition |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9211731D0 (en) * | 1992-06-03 | 1992-07-15 | Merck Patent Gmbh | Electrooptical liquid crystal system |
| JPH061869A (ja) * | 1992-06-22 | 1994-01-11 | Idemitsu Petrochem Co Ltd | ホスファゼン系樹脂被覆部材 |
| KR960012438B1 (ko) * | 1993-07-10 | 1996-09-20 | 주식회사 코오롱 | 농업용 폴리에스테르 필름 |
| JPH08240819A (ja) * | 1995-03-01 | 1996-09-17 | Fuji Xerox Co Ltd | 液晶表示素子及びその駆動方法 |
| JP3780554B2 (ja) * | 1995-03-15 | 2006-05-31 | 大日本インキ化学工業株式会社 | 活性エネルギー線硬化型樹脂組成物、液晶デバイス及びその製造法 |
| JPH11507087A (ja) * | 1995-05-30 | 1999-06-22 | ソーラー・インターナショナル・ホールディングズ・リミテッド | 高屈折率/高アッベ数組成物 |
| JPH09152510A (ja) | 1995-09-25 | 1997-06-10 | Mitsubishi Chem Corp | 低複屈折光学部材及びその製造方法 |
| JP3662666B2 (ja) * | 1996-04-18 | 2005-06-22 | 日本ペイント株式会社 | 紫外線硬化型液状組成物及び塗膜形成方法 |
| JP3592842B2 (ja) | 1996-07-08 | 2004-11-24 | 帝人ファイバー株式会社 | ポリエステル系弾性繊維及びそれからなる伸縮性湿式不織布 |
| JPH1025624A (ja) | 1996-07-08 | 1998-01-27 | Mitsubishi Chem Corp | 炭素繊維及び炭素繊維集合体 |
| JP3540115B2 (ja) | 1996-07-09 | 2004-07-07 | 三菱化学株式会社 | 樹脂組成物及びこれを活性エネルギー線により硬化させてなる部材 |
| US6075065A (en) | 1996-12-20 | 2000-06-13 | Takeda Chemical Industries, Ltd. | Photocurable resin composition and a method for producing the same |
| JPH10231340A (ja) * | 1996-12-20 | 1998-09-02 | Takeda Chem Ind Ltd | 光硬化性樹脂組成物およびその製造方法 |
| JP3901821B2 (ja) * | 1998-02-06 | 2007-04-04 | 三菱化学株式会社 | 低複屈折光学部材、その成形用樹脂組成物及び光学部材の製造方法 |
| WO2000015591A1 (fr) * | 1998-09-11 | 2000-03-23 | Nissan Chemical Industries, Ltd. | Composes alicycliques et composition de resine durcissable |
-
2001
- 2001-03-27 AU AU2001242817A patent/AU2001242817A1/en not_active Abandoned
- 2001-03-27 WO PCT/JP2001/002490 patent/WO2001074918A1/ja not_active Ceased
- 2001-03-27 EP EP01915848A patent/EP1275668B1/en not_active Expired - Lifetime
- 2001-03-27 CN CNB018102506A patent/CN1225489C/zh not_active Expired - Lifetime
- 2001-03-27 KR KR1020027012869A patent/KR100795740B1/ko not_active Expired - Lifetime
-
2002
- 2002-09-30 US US10/259,778 patent/US6759104B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20030118941A1 (en) | 2003-06-26 |
| CN1432029A (zh) | 2003-07-23 |
| EP1275668B1 (en) | 2011-05-11 |
| WO2001074918A1 (en) | 2001-10-11 |
| KR100795740B1 (ko) | 2008-01-17 |
| KR20020087436A (ko) | 2002-11-22 |
| EP1275668A4 (en) | 2009-06-17 |
| EP1275668A1 (en) | 2003-01-15 |
| US6759104B2 (en) | 2004-07-06 |
| AU2001242817A1 (en) | 2001-10-15 |
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