CN1223613C - Continuous processing apparatus by plasma polymerization with vertical chamber - Google Patents
Continuous processing apparatus by plasma polymerization with vertical chamber Download PDFInfo
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- CN1223613C CN1223613C CN01813566.8A CN01813566A CN1223613C CN 1223613 C CN1223613 C CN 1223613C CN 01813566 A CN01813566 A CN 01813566A CN 1223613 C CN1223613 C CN 1223613C
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
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- H01J37/3277—Continuous moving of continuous material
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- B05D2252/02—Sheets of indefinite length
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/338—Changing chemical properties of treated surfaces
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Abstract
Description
发明领域field of invention
本发明涉及具有直立室的等离子体连续处理设备,更具体地说,涉及具有至少一个直立室的等离子体聚合连续处理设备,在所述室中要经表面处理的材料可以垂直移动。The present invention relates to a plasma continuous processing plant having vertical chambers, and more particularly to a plasma polymerization continuous processing plant having at least one vertical chamber in which the material to be surface treated can be moved vertically.
背景技术Background technique
当要涂布的物质表面例如金属板经等离子体放电时,在其上形成具有优异硬度和耐磨性能的涂层。具有这样涂层的产品用作磁盘、光盘或超硬合金工具。When the surface of a substance to be coated, such as a metal plate, is subjected to plasma discharge, a coating layer having excellent hardness and wear resistance is formed thereon. Products with such a coating are used as magnetic disks, optical disks or cemented carbide tools.
另外,当在钢板表面上形成的涂料薄膜经等离子体处理时,可得到具有优异耐久性和耐磨性的涂料涂布的硬质钢板。In addition, when the paint film formed on the surface of the steel sheet is plasma-treated, a paint-coated hard steel sheet having excellent durability and wear resistance can be obtained.
WO 99/28530(1999年6月10日公开)公开了等离子体聚合的表面处理设备。WO 99/28530 (published June 10, 1999) discloses plasma polymerized surface treatment equipment.
图1是现有技术中的等离子体聚合设备的平面示意图。Fig. 1 is a schematic plan view of plasma polymerization equipment in the prior art.
如图1所示,传统的等离子体聚合设备包括真空室1、真空泵5和6控制真空室内的压力,测量仪器7和8测量真空度,电源装置3给物质产生势差,反应气控制装置9和10向待处理的表面周围注射聚合气例如不饱和烃气体例如乙炔气,和非聚合气体例如氮。As shown in Figure 1, the traditional plasma polymerization equipment includes a vacuum chamber 1, vacuum pumps 5 and 6 to control the pressure in the vacuum chamber, measuring instruments 7 and 8 to measure the degree of vacuum, a power supply device 3 to generate a potential difference for the substance, and a reaction gas control device 9 and 10 injecting a polymerizing gas such as an unsaturated hydrocarbon gas such as acetylene gas, and a non-polymerizing gas such as nitrogen around the surface to be treated.
物质2置于室中,旋转泵6启动。在室内的压力调整到10-6乇后,启动扩散泵5以保持室内的压力为10-6乇。The substance 2 is placed in the chamber and the rotary pump 6 is started. After the pressure in the chamber was adjusted to 10 -6 Torr, the diffusion pump 5 was started to maintain the pressure in the chamber at 10 -6 Torr.
通过电源装置使物质偏压,相对的电极4接地。The substance is biased by means of a power supply and the opposite electrode 4 is grounded.
当室内的压力保持在一定的真空度时,不饱和的脂肪烃气体如乙炔气和非聚合气体如氮被注射到室内。When the pressure in the chamber is maintained at a certain degree of vacuum, unsaturated aliphatic hydrocarbon gas such as acetylene gas and non-polymerizing gas such as nitrogen are injected into the chamber.
当室内的压力达到一定的程度时,使用DC或高频使等离子体放电。When the pressure in the chamber reaches a certain level, the plasma is discharged using DC or high frequency.
接着,由DC或高频产生的等离子体切断气体分子的键,被切断的链和被活化的正离子或负离子键合在置于电极之间的物质表面上形成聚合的物质。Next, the plasma generated by DC or high frequency cuts the bonds of the gas molecules, and the severed chains and activated positive or negative ions are bonded on the surface of the material placed between the electrodes to form a polymerized material.
但是由等离子体聚合的传统的表面处理设备有许多问题。But conventional surface treatment equipment by plasma polymerization has many problems.
例如,首先由于表面处理是以这样的方式进行,一种物质被表面处理,不同的物质重新被置于室内进行表面处理。因此很难连续表面处理大量的物质。For example, first since surface treatment is done in such a way that one substance is surface treated, a different substance is brought back into the room for surface treatment. It is therefore difficult to continuously surface treat large quantities of substances.
其次,在由等离子体聚合处理物质表面例如金属片聚合物膜的情况下,随聚合过程的进行,在电极上形成聚合的物质,引起电极碳化产生碳化物。于是,当碳化物从电极脱落时,其落到了正在进行表面处理的物质表面上损坏表面。Secondly, in the case of treating the surface of a substance such as a polymer film of a metal sheet by plasma polymerization, as the polymerization process progresses, a polymerized substance is formed on the electrode, causing carbonization of the electrode to produce carbide. Then, when the carbide falls off from the electrode, it falls onto the surface of the substance being surface treated and damages the surface.
第三,很难保持聚合气体或非聚合气体均一地流动被引入室内到达物质的表面。这样气体流动的不均一性引起了物质表面的不同部分具有不同的表面处理效果,是物质表面上形成均一聚合膜的障碍。Third, it is difficult to maintain a uniform flow of polymerized or non-polymerized gas being introduced into the chamber to the surface of the substance. Such inhomogeneity of gas flow causes different surface treatment effects on different parts of the surface of the substance, which is an obstacle to the formation of a uniform polymeric film on the surface of the substance.
第四,在室内长时间的表面处理过程中,物质不能保证一定的张力,由于重力而下垂。而且,在这样的情况下,物质表面的每一部分具有不同的表面处理效果。Fourth, during the long-term surface treatment process in the room, the material cannot guarantee a certain tension and sags due to gravity. Also, in such a case, each part of the surface of the substance has a different surface treatment effect.
发明内容Contents of the invention
因此本发明的目的是提供等离子体聚合的连续处理设备,所述的设备可以更有效地得到高质量的等离子体聚合膜。It is therefore an object of the present invention to provide continuous processing equipment for plasma polymerization, which can more efficiently obtain high-quality plasma-polymerized films.
本发明的另一个目的是提供等离子体聚合处理系统,通过连续布置多个室而具有各种形式。Another object of the present invention is to provide a plasma polymerization processing system having various forms by arranging a plurality of chambers in succession.
本发明的再一个目的是提供等离子体聚合处理系统,其具有减少电极被碳化而形成的碳化物落到物质表面上的可能性。It is still another object of the present invention to provide a plasma polymerization treatment system which reduces the possibility of carbides formed by carbonization of the electrodes falling onto the surface of the material.
本发明的又一个目的是提供等离子体聚合处理系统,其可使气体注射到室内均一平稳地流动,这样对于表面每一部分得到的表面处理效果都是均一的。Yet another object of the present invention is to provide a plasma polymerization treatment system that allows a uniform and smooth flow of gas injected into the chamber so that the surface treatment effect obtained is uniform for each part of the surface.
本发明的另一个目的是提供等离子体聚合处理系统,其具有多个室,其安装空间大幅减少。Another object of the present invention is to provide a plasma polymerization processing system having a plurality of chambers whose installation space is greatly reduced.
本发明的又一个目的是提供等离子体聚合系统,其可防止表面待处理物质由于重力而下垂。Yet another object of the present invention is to provide a plasma polymerization system that prevents the surface to be treated from sagging due to gravity.
根据本发明目的,为实现在此处具体说明和泛泛描述的这些和其他的优点,提供具有多个室的等离子体聚合连续处理设备,以对被移入室内物质的表面通过等离子体聚合进行表面处理,包括:至少一个直立室,其中待涂布的物质被垂直移动及其中至少包括一个电极。In accordance with the object of the present invention, in order to achieve these and other advantages both specifically and broadly described herein, there is provided a plasma polymerization continuous treatment apparatus having a plurality of chambers for surface treatment by plasma polymerization of the surface of a substance moved into the chamber , comprising: at least one vertical chamber in which the substance to be coated is moved vertically and which includes at least one electrode.
在本发明的等离子体聚合连续处理设备中,电极优选置于与直立室中物质移动方向平行的位置。In the plasma polymerization continuous processing apparatus of the present invention, the electrodes are preferably placed in a position parallel to the moving direction of the substances in the vertical chamber.
在本发明的等离子体聚合连续处理设备中,在连续处理设备的情况下,包括多个直立室,优选在其中之一的直立室中通过等离子体聚合进行物质的表面处理。In the plasma polymerization continuous processing apparatus of the present invention, in the case of a continuous processing apparatus, a plurality of vertical chambers are included, and the surface treatment of a substance by plasma polymerization is preferably performed in one of the vertical chambers.
在本发明的等离子体聚合连续处理设备中,被连续移动到多个室内要进行表面处理的物质,当给其施加电压时,其本身可以作为电极使用。In the plasma polymerization continuous treatment apparatus of the present invention, the substance which is continuously moved to a plurality of chambers for surface treatment can itself be used as an electrode when a voltage is applied thereto.
在本发明的一个具体实施方式的等离子体聚合连续处理设备中,直立室包括室体,其中物质可垂直移动,该室的一侧是敞开的,室门与室体敞开的一侧结合,及至少一个电极置于沿物质移动平行的位置。In a plasma polymerization continuous processing apparatus according to an embodiment of the present invention, the vertical chamber includes a chamber body in which substances can move vertically, one side of the chamber is opened, a chamber door is combined with the opened side of the chamber body, and At least one electrode is positioned parallel to the movement of the mass.
在本发明的另一个具体实施方式的等离子体聚合连续处理设备中,直立室是结合的直立室,其中在其中心形成分割板以使室分成两个直立区域。In another embodiment of the plasma polymerization continuous processing apparatus of the present invention, the upright chamber is a combined upright chamber in which a partition plate is formed at the center thereof to divide the chamber into two upright regions.
本发明的等离子体聚合连续处理设备,可包括至少一个卧式室其中物质水平地移动,及一个直立室其中物质垂直地移动,这样多个室可以各种形式连接。The plasma polymerization continuous processing apparatus of the present invention may include at least one horizontal chamber in which substances move horizontally, and a vertical chamber in which substances move vertically, so that a plurality of chambers can be connected in various forms.
优选,本发明的等离子体聚合连续处理设备,对于连续表面处理而言,包括具有展开辊的展开室用于展开以卷形物状态卷饶的物质,及卷辊用于卷绕表面被处理的物质。Preferably, the plasma polymerization continuous treatment equipment of the present invention, for continuous surface treatment, includes an unwinding chamber with an unrolling roller for unrolling a material rolled in a roll state, and a roll for winding the surface treated substance.
参考附图从以下本发明的详细描述中,本发明上述和其他的目的、特征、涉及方面和优点更加显而易见。The above and other objects, features, related aspects and advantages of the present invention will be more apparent from the following detailed description of the present invention with reference to the accompanying drawings.
附图简述Brief description of the drawings
包括的附图可进一步理解本发明,包含在说明书中并构成说明书的一部分,说明本发明的具体实施方式,及与描述一起用于解释本发明的原理。The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of the specification, illustrate specific implementations of the invention, and together with the description, serve to explain the principle of the invention.
附图中:In the attached picture:
图1是根据现有技术的等离子体聚合设备的示意图;Figure 1 is a schematic diagram of a plasma polymerization device according to the prior art;
图2A是本发明一个具体实施方式的等离子体聚合连续处理设备的剖面图;2A is a cross-sectional view of a plasma polymerization continuous processing device according to a specific embodiment of the present invention;
图2B是本发明一个具体实施方式图2A直立室放大的剖面图;Fig. 2B is an enlarged sectional view of the upright chamber in Fig. 2A of a specific embodiment of the present invention;
图2C是本发明优选实施方式的另一个直立室实例的示意图;Figure 2C is a schematic diagram of another upright chamber example of a preferred embodiment of the present invention;
图2D是本发明优选实施方式的又一个直立室实例的示意图;Figure 2D is a schematic diagram of yet another upright chamber example of a preferred embodiment of the present invention;
图3A是本发明优选实施方式的将气体提供到直立室的一个实施例的示意图;Figure 3A is a schematic diagram of an example of the provision of gas to the vertical chamber of the preferred embodiment of the present invention;
图3B是本发明优选实施方式的将气体提供到直立室的另一个实施例的示意图;Figure 3B is a schematic diagram of another example of providing gas to the vertical chamber of the preferred embodiment of the present invention;
图4是本发明优选实施方式的等离子体聚合连续处理设备的卧式室的剖面图;Fig. 4 is the sectional view of the horizontal chamber of the plasma polymerization continuous treatment equipment of preferred embodiment of the present invention;
图5A是本发明一个实施方式的具有两个直立区域的直立室的剖面图。Figure 5A is a cross-sectional view of an upright chamber having two upright regions according to one embodiment of the invention.
图5B是本发明另一个实施方式的具有两个直立区域的直立室的剖面图。Figure 5B is a cross-sectional view of an upright chamber having two upright regions according to another embodiment of the present invention.
图6是本发明又一个实施方式的具有两个直立区域的直立室的剖面图。6 is a cross-sectional view of an upright chamber having two upright regions according to yet another embodiment of the present invention.
优选实施方式的详细描述Detailed description of the preferred embodiment
详细参考本发明的优选实施方式,在附图中描述了其实施例。Reference will be made in detail to the preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings.
图2是本发明一个具体实施方式的等离子体聚合连续处理设备的剖面图。Fig. 2 is a cross-sectional view of a plasma polymerization continuous processing device according to a specific embodiment of the present invention.
如图2示意,本发明的等离子体聚合连续处理设备大体包括第一直立室20a,第二直立室20b,置于两直立室20a和20b之间的卧式室21,展开辊25用于展开其上卷绕的物质以将其输送到室内,及卷辊26用于卷绕在其上片形式的表面处理的物质。As shown in Figure 2, the plasma polymerization continuous processing equipment of the present invention generally comprises a first
不管表面处理与否,卧式室可以是水平管简单地用作物质的输送路径。Regardless of surface treatment or not, horizontal chambers can simply be horizontal tubes used as transport paths for substances.
展开辊和卷辊可以安装在独立的室内(即展开室和卷绕室),与图2A中示意的不一样。The unwinding and winding rolls may be installed in separate chambers (ie unwinding and winding chambers) other than that illustrated in Figure 2A.
在本发明的优选实施方式中,只存在两个直立室,但根据聚合系统可以进一步包括第三和第四直立室。或通过建造具有四个以上直立室或具有多个卧式室的聚合系统可以进行各种改造。In a preferred embodiment of the present invention, there are only two vertical chambers, but depending on the polymerization system it may further comprise a third and fourth vertical chamber. Or by building aggregate systems with more than four vertical chambers or with multiple horizontal chambers various modifications are possible.
从展开辊输送的物质通过直通过孔22b,进入第一直立室并垂直移动,这样物质经表面处理。The material conveyed from the unwinding roller passes through the through
接下来,物质从第一直立室通过直通过孔22a通过卧式室21,其被输送到第二直立室,其中物质经表面处理,最后卷绕在卷辊上。Next, the substance passes through the
张紧辊23a和23b置于每一个室之间及展开辊与卷辊之间物质的输送路径上,以给物质施加张力,因此防止物质的下垂及改变物质的移动方向。因此,即使物质沿连续的长路径移动时,也可保持恒定不变的移动速度。
在本发明的优选实施方式中,优选至少一个直立室安装在聚合处理系统中,根据表面处理的目的可以将多个直立室和卧式室布置在一起。In a preferred embodiment of the present invention, preferably at least one vertical chamber is installed in the polymerization treatment system, and a plurality of vertical chambers and horizontal chambers can be arranged together according to the purpose of surface treatment.
特别是,在安装了几个卧式室和直立室的情况下,要适当控制在每一个室内的(保护)气体、压力及施加的电压,这样可通过所述的室通过不同的过程进行表面处理。同时,气体类型、气体供给比、给电极施加电压的范围及室内的压力,这些聚合条件的至少一种要在多于两个相邻室中相同,以作为聚合室。In particular, where several horizontal chambers and vertical chambers are installed, the (shielding) gas, pressure and applied voltage in each chamber should be properly controlled so that the surface can be carried out by different processes through said chambers deal with. At the same time, at least one of these polymerization conditions, gas type, gas supply ratio, range of voltage applied to electrodes, and chamber pressure, should be the same in more than two adjacent chambers to serve as a polymerization chamber.
另外,在每一个室中的表面处理可以分为预处理、第一聚合处理、第二聚合处理和后处理,这样当物质经过几个室时,可对该物质进行各种表面处理。In addition, the surface treatment in each chamber can be divided into pretreatment, first polymerization treatment, second polymerization treatment, and post-treatment, so that various surface treatments can be performed on the substance when it passes through several chambers.
特别的是,在预处理室中,优选进行清洗以去除附着在物质表面的各种污染物,之后通过等离子体放电形成聚合膜。In particular, in the pretreatment chamber, cleaning is preferably performed to remove various contaminants attached to the surface of the substance, after which a polymeric film is formed by plasma discharge.
因此,预处理室被置于物质移动路径的前面。非聚合气体例如氧、氮或氩被注射到预处理室内,这样通过等离子体放电使物质表面清洁。Therefore, the pretreatment chamber is placed in front of the mass movement path. A non-polymerizing gas such as oxygen, nitrogen or argon is injected into the pretreatment chamber so that the surface of the material is cleaned by a plasma discharge.
聚合过程可以在直立室中或卧式室中进行,在聚合过程中聚合气体被注射到室内,将DC或高频电压施加到其上以使等离子体放电。在该方面,为解决现有技术中存在的问题,优选至少一个直立室作为聚合室。The polymerization process can be carried out in a vertical chamber or in a horizontal chamber, during which polymerization gas is injected into the chamber to which a DC or high frequency voltage is applied to discharge the plasma. In this respect, in order to solve the problems existing in the prior art, it is preferable that at least one vertical chamber is used as the polymerization chamber.
在聚合室中物质的表面被处理后,优选在将空气注射到室内后通过等离子体放电在不同的室内连续进行表面处理。在空气气氛下这样的后处理有助于防止其上形成聚合膜的物质表面特征的逐渐减少。After the surface of the substance in the polymerization chamber has been treated, the surface treatment is carried out successively in different chambers by plasma discharge, preferably after injecting air into the chamber. Such post-treatment under an air atmosphere helps to prevent the gradual reduction of the surface characteristics of the material on which the polymeric film is formed.
如上所述,包括直立室的具有多个室的等离子体聚合处理设备通过多步处理可实现物质的各种表面处理效果,一旦物质从展开辊移动到卷辊,物质每一种所需要的表面处理可一次进行。As mentioned above, the plasma polymerization treatment equipment with multiple chambers including vertical chambers can achieve various surface treatment effects of substances through multi-step treatment, once the substances move from the unrolling roll to the take-up roll, the surface required for each of the substances Processing can be done in one go.
在本发明优选实施方式的直立室中,由于物质可以垂直移动,即向上或向下,优选电极也被垂直安装在室内。In the vertical chamber of the preferred embodiment of the present invention, since the substance can move vertically, ie up or down, it is preferred that the electrodes are also mounted vertically in the chamber.
图2B是根据本发明一个实施方式的图2A的直立室放大的剖面图。Figure 2B is an enlarged cross-sectional view of the upright chamber of Figure 2A according to one embodiment of the present invention.
形成的直立室为长方形平行六面体,宽高比大于1,室底平面占据的面积与卧式室相比非常小,这样聚合处理系统的整个空间被大幅减少。The formed upright chamber is a rectangular parallelepiped with an aspect ratio greater than 1, and the area occupied by the bottom plane of the chamber is very small compared with the horizontal chamber, so that the entire space of the polymerization treatment system is greatly reduced.
电极27安装在室内,所述的室垂直布置与物质24移动方向平行。The
尽管在附图中显示一个电极安装在两个室内,但几个电极也可垂直地一排布置。示意的物质通过孔22a和22b安装在室的上侧面和下侧面。Although one electrode is shown installed in two chambers in the drawings, several electrodes may also be arranged in a vertical row. The illustrated substances are mounted on the upper and lower sides of the chamber through
图2C是本发明优选实施方式的直立室的另一个实施例的剖面图。Figure 2C is a cross-sectional view of another example of the upright chamber of the preferred embodiment of the present invention.
如图2C所示意,直立室20包括其中含有电极27的室体29a,连接到室一侧的室门29b用于打开和关闭室。另外的电极28被连接到室门内侧面。As shown in FIG. 2C, the
由于电极连接到室门上,电极仅有一面(相对物质的面)参与等离子体放电,防止了由于聚合材料而在其它面上产生碳化物。Since the electrode is attached to the chamber door, only one side of the electrode (the side facing the substance) participates in the plasma discharge, preventing the formation of carbides on the other side due to the polymeric material.
另外,由于电极被简单地连接到室门上,因此电极的安装很容易。In addition, installation of the electrodes is easy since the electrodes are simply attached to the chamber door.
同样,在本发明该具体实施方式中,如上所述,电极可以置于沿物质移动平行的位置。Also, in this embodiment of the invention, as described above, the electrodes may be positioned parallel to the movement of the material.
同时,与图2B的情况不同,注意到物质通过孔22a在室的顶部和底部形成。Meanwhile, unlike the case of FIG. 2B , note that the substance passage holes 22 a are formed at the top and bottom of the chamber.
对于直立室,根据物质的输送路径和室之间的连接结构,直通过孔可以在顶部和底部或上侧面和下侧面上选择形成。For vertical chambers, straight passage holes can be selectively formed on the top and bottom or upper and lower sides according to the transport path of the substance and the connection structure between the chambers.
因此,即使多个直立室和卧式室可被连接成各种形式,但物质的移动方向可从垂直方向到水平方向,及从水平方向到垂直方向自由改变。Therefore, even though a plurality of vertical chambers and horizontal chambers can be connected in various forms, the moving direction of matter can be freely changed from vertical to horizontal and from horizontal to vertical.
图2D是本发明优选实施方式的直立室的另一个实施例的剖面图。Figure 2D is a cross-sectional view of another example of the upright chamber of the preferred embodiment of the present invention.
如图2D示意,直立室有点儿不同与图2C中的直立室。即安装在室门29c的电极28与门面分离。在这样结构中,通过控制电极与物质之间的距离,很容易使电极的位置靠近物质的表面。As shown in Figure 2D, the upright chamber is somewhat different from the upright chamber in Figure 2C. That is, the electrode 28 attached to the chamber door 29c is separated from the door surface. In such a structure, by controlling the distance between the electrode and the substance, it is easy to make the position of the electrode close to the surface of the substance.
参考图2B~2D,朝向物质两个面的两个电极被安装在室内。给电极施加DC或AC电压,电力也可施加到表面被处理的物质,这样物质可被作为电极。Referring to Figures 2B-2D, two electrodes facing both sides of the substance are installed in the chamber. By applying a DC or AC voltage to the electrodes, electricity can also be applied to the surface of the substance being treated so that the substance can be used as an electrode.
为给物质施加电力,可将电力施加到与物质接触的部分,这样电力可被间接施加到物质上。To apply electricity to a substance, electricity can be applied to the part that is in contact with the substance, so that electricity can be indirectly applied to the substance.
例如,辊被安装在多个室中,例如具有展开辊的展开室,具有卷绕辊的卷绕室和聚合室,优选电力施加到与移动物质接触的其中之一的辊上,这样将电力施加到物质上。在这样的情况下,电源装置另外被包括在室的内部或外部以给辊施加电力。For example, the rollers are installed in a plurality of chambers, such as an unwinding chamber with unwinding rollers, a winding chamber with winding rollers, and a polymerization chamber, preferably with power applied to one of the rollers in contact with the moving mass so that the electric power applied to the substance. In such a case, a power supply device is additionally included inside or outside the chamber to apply power to the roller.
由于将电力施加到物质,因此物质可以是阳极或阴极。在这方面,考虑表面处理效果,更优选物质成为阳极,面对的电极成为朝向物质两面的相反的电极。A substance can be either an anode or a cathode due to the application of electricity to the substance. In this regard, considering the surface treatment effect, it is more preferable that the substance becomes an anode, and the facing electrodes become opposite electrodes facing both sides of the substance.
在通过等离子体放电进行表面处理中,引入室内的气体流动是严格的。如果气体不能均匀地流入室内,物质表面处理的均一性将变差。In surface treatment by plasma discharge, the gas flow introduced into the chamber is critical. If the gas cannot flow into the chamber uniformly, the uniformity of the surface treatment of the substance will be deteriorated.
特别是,在连续表面处理中,对于被输送的物质很难保持气体均匀流动。因此在本发明优选实施方式的直立室的情况下,由于物质的移动方向相对于卧式室是垂直的,因此提供进入室内的气体相对于物质流动地非常均匀。In particular, in continuous surface treatment, it is difficult to maintain a uniform gas flow for the substance being transported. Thus in the case of the vertical chamber of the preferred embodiment of the present invention, the gas supplied into the chamber flows very uniformly with respect to the substance since the direction of movement of the substance is vertical with respect to the horizontal chamber.
图3A是本发明优选实施方式的提供气体进入直立室的一个实施例的剖面图。Figure 3A is a cross-sectional view of an example of the provision of gas into the vertical chamber of the preferred embodiment of the present invention.
在直立室20的底部形成气体入口31a,在其顶部形成气体出口31b。A gas inlet 31a is formed at the bottom of the
在这样的情况下,气体流动与物质的移动方向平行,这样气体可被均匀地提供到物质表面的每一位置。In such a case, the gas flow is parallel to the moving direction of the substance, so that the gas can be uniformly supplied to every position on the surface of the substance.
在本发明的优选实施方式中,气体流动方向可与物质的移动方向相同或相反的方向。在物质被向上移动的情况下,气体入口被置于室的上部,气体出口被置于其下部,这样物质的移动方向与气体的流动方向相反。In a preferred embodiment of the present invention, the direction of gas flow may be the same as or opposite to the direction of movement of the substance. In the case where the substance is moved upwards, the gas inlet is placed in the upper part of the chamber and the gas outlet is placed in the lower part thereof so that the movement of the substance is in the opposite direction to the flow of the gas.
图3B是本发明优选实施方式的提供气体进入直立室的另一个实施例的剖面图。Figure 3B is a cross-sectional view of another example of providing gas into the vertical chamber of the preferred embodiment of the present invention.
如图3B示意,与图3实施方式不同,注意到在水平方向将气体提供到室内。气体提供到气体入口32a,沿物质移动垂直的方向流动,然后通过气体出口32b排出。尽管在附图中各自仅示意了两个气体入口和出口,但可以在室的右侧和左侧形成多个气体入口和气体出口,以使气体流动平稳均匀。As illustrated in Figure 3B, unlike the Figure 3 embodiment, it is noted that the gas is provided into the chamber in a horizontal direction. Gas is supplied to the
在直立室中不管气体的流动方向,即沿物质移动是平行还是垂直,在本发明优选实施方式的直立室中,可大幅减少由于在聚合过程中产生的碳化物附着在表面上的污染物。理由是相对于物质被水平移动的情况,由于物质垂直移动,碳化物附着在物质表面上的可能性非常小。Regardless of the flow direction of the gas in the vertical chamber, that is, whether the movement along the material is parallel or vertical, in the vertical chamber of the preferred embodiment of the present invention, the pollutants attached to the surface due to carbides generated during the polymerization process can be greatly reduced. The reason is that the possibility of carbides adhering to the surface of the substance is very small due to the vertical movement of the substance compared to the case where the substance is moved horizontally.
因此,不需要除灰装置以去除附着在物质表面上的碳化物或各种灰尘,简化了设备的结构。Therefore, there is no need for a dust removal device to remove carbides or various dusts attached to the surface of the material, which simplifies the structure of the equipment.
如图2A示意的等离子体聚合设备包括卧式室和直立室。如直立室一样,卧式室也可是聚合室。在卧式室中,预处理可以在聚合过程之前进行,或在聚合过程后进行后处理。The plasma polymerization apparatus as schematically shown in FIG. 2A includes a horizontal chamber and a vertical chamber. Like vertical rooms, horizontal rooms can also be converging rooms. In horizontal chambers, pretreatment can be performed before the polymerization process, or post-treatment after the polymerization process.
图4是本发明优选实施方式的等离子体聚合连续处理设备的卧式室的剖面图。4 is a cross-sectional view of a horizontal chamber of a plasma polymerization continuous processing apparatus according to a preferred embodiment of the present invention.
物质通过孔45a和45b在室的右端和左端形成,上部门42a和下部门42b安装在室的上部和下部。电极43a和43b分别连接在上部门和下部门上。Substance passage holes 45a and 45b are formed at the right and left ends of the chamber, and an upper door 42a and a lower door 42b are installed at the upper and lower parts of the chamber. Electrodes 43a and 43b are connected to the upper and lower doors, respectively.
尽管未示意,可以在室内形成气体入口和气体出口。Although not shown, a gas inlet and a gas outlet may be formed in the chamber.
电极可以连接在上部门和下部门的门面上,或与门面间隔连接。上部门向上打开,而下部门向下打开。The electrodes may be attached to the door faces of the upper door and the lower door, or connected at intervals from the door faces. The upper door opens upwards, while the lower door opens downwards.
当电极连接到卧式室上时,卧式室可以作为聚合室、预处理室或后处理室。或没有电极,卧式室简单地用作物质的移动路径。When the electrodes are connected to the horizontal chamber, the horizontal chamber can be used as a polymerization chamber, a pre-treatment chamber or a post-treatment chamber. Or without electrodes, the horizontal chamber simply serves as a path for the material to move.
图5A是本发明一个实施方式的具有两个直立区域直立室的剖面图。Figure 5A is a cross-sectional view of an upright chamber having two upright regions in accordance with one embodiment of the present invention.
如图5A示意,直立室50a包括在一个室内的中心处垂直方向形成的分割板52。分割板52将室分为两个直立区域51a和51b。至少一个电极置于每一个直立区域。As shown in FIG. 5A, the
在本发明的优选实施方式中,形成的两个电极(53a和53b、54a和54b)在每一个直立区域中相互面对。In a preferred embodiment of the present invention, two electrodes (53a and 53b, 54a and 54b) are formed facing each other in each upright area.
在直立室的下部,形成可供连接的水平路径(或卧式室)58a和58b。In the lower part of the vertical chambers, horizontal paths (or horizontal chambers) 58a and 58b are formed for connection.
在物质55通过左侧的水平路径58a后,被引入到一个水平区域51a,其使物质通过在分割板上部形成的直通过孔57a,被移动到另外的垂直区域51b,然后通过另外的水平路径58b,这样被移出。After the
物质的移动可以相反的方向进行。The movement of matter can take place in the opposite direction.
由于通过分割板将直立室的每一个直立区域分开,每一个直立区域可以作为独立的室分别进行具有不同过程的表面处理。Since each upright area of the upright chamber is separated by the partition plate, each upright area can be used as an independent chamber for surface treatment with different processes.
例如在一个直立区域进行预处理,在另一个直立区域进行聚合过程。或之后,在一个直立区域进行聚合过程,而在另一个直立区域进行后处理。For example preprocessing in one vertical area and aggregation process in another vertical area. Or afterwards, do the aggregation process in one upright and post-processing in the other.
当然,聚合过程也可在两个直立区域中进行。Of course, the polymerization process can also be carried out in two vertical zones.
对于具有两个直立区域的结合的直立室,尽管物质表面处理的路径长,但实质上被聚合室占据的区域相对小,因此其空间利用非常有效。另外,可以在单一的室内对于被输送的物质进行两种不同的表面处理。For a combined upright chamber with two upright regions, despite the long path for material surface treatment, the area substantially occupied by the polymerization chamber is relatively small, so its space utilization is very efficient. In addition, two different surface treatments can be applied to the substance being transported in a single chamber.
参考号57b表示在直立室与水平路径之间的物质通过孔,57c表示在水平路径的端部形成的物质通过孔,及56表示张紧辊。
图5B是本发明另一个实施方式的具有两个直立区域的直立室的剖面图。Figure 5B is a cross-sectional view of an upright chamber having two upright regions according to another embodiment of the present invention.
如图5B示意,直立室与图5A一样,直立室50b由室内中心处形成的分割板52分为两个直立区域,不同之处在于物质55通过一个直立区域51a,通过另外的水平区域58,之后进入另外的直立区域51b。As shown in Figure 5B, the upright chamber is the same as in Figure 5A, the upright chamber 50b is divided into two upright regions by a
水平区域与直立室形成为一体,物质在直立区域与水平路径之间通过在直立区域和水平区域之间形成的通过孔57d移动。The horizontal area is integrally formed with the vertical chamber, and the substance moves between the vertical area and the horizontal path through the passage hole 57d formed between the vertical area and the horizontal area.
具有一体化形成的水平区域和两个直立区域的直立室的优点是,由于在每一个区域可独立地进行表面处理,可使空间利用达到最大,在单一的室内可顺序进行三种表面处理过程。The advantage of an upright chamber with an integrally formed horizontal area and two upright areas is that the space utilization can be maximized since the surface treatment can be carried out independently in each area, and three surface treatment processes can be carried out sequentially in a single room .
图6是本发明另一个实施方式的具有两个直立区域的直立室的剖面图。Figure 6 is a cross-sectional view of an upright chamber having two upright regions according to another embodiment of the present invention.
如图6示意,直立室60包括室体61,其包括由室内中心处形成的分割板65分割的两个直立区域,安装在室体两端的室门62a和62b用于打开和关闭室。As shown in FIG. 6, an
物质66通过直通过孔68在直立室的每一个直立区域移动。每一个张紧辊67改变物质的移动方向,使物质从外部移动到直立区域或从一个直立区域移动到另一个直立区域。
直立室包括电极64a和64b,其置于室体中心隔板65两侧沿物质移动平行的位置,电极63a和63b置于室门的门面上沿物质移动平行的位置。The vertical chamber includes
安装在室门上的电极可连接到门面上或与门面间隔,这样其与物质的间隔可以调整。Electrodes mounted on the door of the chamber may be attached to or spaced from the door so that their spacing from the substance can be adjusted.
尽管示意的从一个直立区域到另一个直立区域的物质移动处于暴露的外部空间,优选将另外的水平路径(或卧式室)与直立室连接,类似上述的实施方式。Although the movement of material from one upright area to another is illustrated in the exposed exterior space, it is preferable to connect an additional horizontal path (or horizontal chamber) to the upright chamber, similar to the embodiments described above.
如上述的描述,本发明的等离子体聚合连续处理设备具有许多优点。As described above, the plasma polymerization continuous processing apparatus of the present invention has many advantages.
例如,第一,由于直立室可以单独或由多个室形成,或可以与卧式室一起形成,因此可以建造各种类型的等离子体聚合处理系统。For example, first, since the vertical chamber can be formed alone or from a plurality of chambers, or can be formed together with the horizontal chamber, various types of plasma polymerization processing systems can be constructed.
第二,根据表面处理的目的,多个室可用于各种功能和应用中,例如聚合室、后处理室及预处理室。Second, depending on the purpose of surface treatment, multiple chambers can be used in various functions and applications, such as polymerization chambers, post-treatment chambers, and pre-treatment chambers.
第三,由于电极被碳化产生的碳化物落到物质表面的可能性大幅减少,在卧式室中,用于去除落在物质表面的碳化物或各种灰的除灰装置就没有必要。Third, since the possibility of the carbides generated by the carbonization of the electrodes falling on the surface of the material is greatly reduced, in the horizontal chamber, there is no need for ash removal devices for removing carbides or various ash falling on the surface of the material.
第四,由于注射到室中的气体在其中可向上或向下流动,气体相对于物质两面可以平稳均匀地流动。因此,在物质的两面都可以得到均匀的表面处理效果,及由此增加了表面处理的可靠性。Fourth, since the gas injected into the chamber can flow upwards or downwards therein, the gas can flow smoothly and evenly with respect to both sides of the substance. As a result, a uniform surface treatment can be obtained on both sides of the substance, and thus the reliability of the surface treatment is increased.
第五,在一些或所有的聚合处理系统被建造为直立室的情况下,由于在工厂中系统空间可被大幅减少,所以甚至在空间利用上是有利的。Fifth, in cases where some or all of the polymerization processing systems are built as vertical chambers, it is even advantageous in terms of space utilization since the system space in the plant can be substantially reduced.
第六,在要进行表面处理的物质通过室被输送的过程中,当物质通过直立室时,由于通常施加张力,可防止物质由于重力而下垂。Sixth, as the material to be surface treated is transported through the chamber, the material is prevented from sagging due to gravity as tension is normally applied as the material passes through the upright chamber.
包括直立室的等离子体聚合处理设备对于连续处理设备而言是必要的组件,由此物质可被迅速大量的进行表面处理。A plasma polymerization treatment plant comprising a vertical chamber is an essential component of a continuous treatment plant, whereby substances can be surface treated rapidly and in large quantities.
在没有背离本发明的精神或实质特征之下,采用几种形成对本发明进行了具体描述,但也应理解上述的具体实施方式并不由以上描述的细节所限制,除非另有说明,而应由其所附的权利要求限定的精神和范围来进行广义的解释,因此所有的变化和改变都在本权利要求限定的范围之内,或因此其范围内的等同物也意欲包括在所附的权利要求之中。Without departing from the spirit or essential characteristics of the present invention, the present invention has been described in detail by using several forms, but it should also be understood that the above-mentioned specific embodiments are not limited by the details described above, unless otherwise specified, but by The spirit and scope of the appended claims shall be construed broadly, and all changes and modifications are therefore intended to be within the scope of the appended claims, or equivalents within the scope thereof are also intended to be embraced by the appended claims. In request.
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| PCT/KR2001/000907 WO2002096956A1 (en) | 2001-05-30 | 2001-05-30 | Continuous processing apparatus by plasma polymerization with vertical chamber |
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| JPS57182302A (en) * | 1981-05-06 | 1982-11-10 | Shuzo Hattori | Apparatus for forming polymer film by plasma polymerization |
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| JPH04110467A (en) * | 1990-08-31 | 1992-04-10 | Terumo Corp | Method and device for producing functional film |
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| JPH06136506A (en) * | 1992-10-21 | 1994-05-17 | Nisshin Steel Co Ltd | Method for plasma polymerization treatment of metallic strip and device therefor |
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| WO2002096956A1 (en) | 2002-12-05 |
| JP2004520493A (en) | 2004-07-08 |
| CN1444605A (en) | 2003-09-24 |
| EP1404722A1 (en) | 2004-04-07 |
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