CN1216320C - 辐射敏感的折射率变化组合物以及变化折射率的方法 - Google Patents
辐射敏感的折射率变化组合物以及变化折射率的方法 Download PDFInfo
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- CN1216320C CN1216320C CN021578559A CN02157855A CN1216320C CN 1216320 C CN1216320 C CN 1216320C CN 021578559 A CN021578559 A CN 021578559A CN 02157855 A CN02157855 A CN 02157855A CN 1216320 C CN1216320 C CN 1216320C
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- methyl
- acid
- refractive index
- butyl
- silane
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- 239000003505 polymerization initiator Substances 0.000 claims abstract description 12
- -1 acryl Chemical group 0.000 claims description 321
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 229920005989 resin Polymers 0.000 claims description 19
- 239000011347 resin Substances 0.000 claims description 19
- 229910052731 fluorine Inorganic materials 0.000 claims description 15
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- 229920002857 polybutadiene Polymers 0.000 claims description 2
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- NHOWDZOIZKMVAI-UHFFFAOYSA-N (2-chlorophenyl)(4-chlorophenyl)pyrimidin-5-ylmethanol Chemical compound C=1N=CN=CC=1C(C=1C(=CC=CC=1)Cl)(O)C1=CC=C(Cl)C=C1 NHOWDZOIZKMVAI-UHFFFAOYSA-N 0.000 description 14
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- 125000003545 alkoxy group Chemical group 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
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- 229910052794 bromium Inorganic materials 0.000 description 12
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 12
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Abstract
一种辐射敏感的折射率变化组合物,其折射率由一种简单的方法来改变,改变的折射率差别足够大,并且还可以提供一种稳定的折射率图案和一种稳定的光学材料,而无论其使用条件。该辐射敏感的折射率变化组合物包含(A)一种可聚合的化合物,(B)一种不可聚合的化合物,它的折射率低于可聚合的化合物(A)的聚合物,和(C)一种辐射敏感的聚合引发剂。
Description
技术领域
本发明涉及一种辐射敏感的折射率变化组合物,一种形成折射率图案的方法,一种折射率图案和一种光学材料。更具体地,本发明涉及一种新的用于光电和显示领域的辐射敏感的折射率变化组合物,一种形成折射率图案的方法,一种折射率图案和一种光学材料。
发明背景
在被称为多媒体社会的当今社会,分别由不同的折射率区域组成的折射率分布型光学模塑产品有很大的需求。这些产品不仅包括用于传输信息的光学纤维,而且包括折射率周期性改变的光学衍射光栅,信息写入折射率不同的地址的光学存储器,光学连接元件如具有精密折射率图案的光学集成电路,光学控制元件,光学调制元件和光学发射元件。
折射率分布型光学模塑产品分为两类:一类具有连续的折射率分布,如模塑产品中的GI型光学纤维(在下文称之为“GRIN光学模塑产品”),而另一类具有不连续的折射率分布,如光学衍射光栅和SI型光学波导管。
GRIN光学模塑产品作为下一代的光学模塑产品吸引了更多的关注。例如,一种折射率从光学纤维芯的中心轴到外周以抛物线形式减小的GI型光学纤维可以传输更大量的信息。一种折射率连续变化的GRIN透镜利用其折射能在平坦表面上均匀和没有球面像差的特征性能,被用作读数透镜以用于复印机、连接纤维用的球面透镜、或微型透镜。
直到现在已经提出了生产以上GRIN光学模塑产品的许多方法。例如,JP-A 9-133813、JP-A 8-336911、JP-A 8-3376091、JP-A 3-192310、JP-A 5-60931(本文所用术语“JP-A”是指“未审查已公开日本专利申请”),WO 93/19505和WO 94/04949公开了一种通过将低分子量的化合物或单体分散到一种聚合物中并使其浓度连续分布而得到GI型光学纤维的方法。JP-A 62-25705公开了通过用光使折射率和反应比不同的2种或2种以上乙烯基单体共聚从而得到的一种棒状GI型光学模塑产品或光学纤维。而且,JP-A 7-56026公开了一种通过形成具有光反应性官能团的聚合物A,将折射率比聚合物A低的化合物B分散在聚合物A中,形成化合物B的浓度分布以后,用光使聚合物A和化合物B反应得到折射率分布的方法。
也已经提出了一些生产无机材料GRIN光学模塑产品的方法。例如其中之一是,在基本由硅或铅组成的棒状玻璃中加入高折射率的铊,将玻璃浸渍于含有低折射率的钾的熔融液中,通过离子交换形成钾的浓度分布制成GI型棒的方法。
类似地通过对短棒,即透镜状的光学模塑产品实施上述方法可以制得一种GRIN透镜。此外,由上述方法制造的GI型棒可以切成圆片状。
作为以上生产具有精密折射率图案的光学模塑产品,如光学衍射光栅和光学集成电路的方法之一,已知有一种通过光照射模塑产品诱发光化学反应,得到折射率变化的技术。例如,在无机材料的情况下,对掺杂以锗的玻璃照射光,使折射率变化从而生产一种光学衍射光栅的方法。在有机材料的情况下,以上技术称之为光致变色反应或光漂白。JP-A 7-92313公开了一种通过对在聚合物中分散了具有光化学反应活性的低分子量化合物的材料照射激光,引发折射率变化,制造光学衍射光栅的技术。此外,最近的JP-A 9-178901提出了使用这种技术生产GRIN光学模塑产品。这种方法利用照射到模塑产品上的光被吸收导致强度变弱,从而相对于照射在深度方向赋予连续的折射率分布。
但是,用上述传统材料得到的折射率分布中,折射率差别的最大值仅为约0.001~0.02,对于防止光学损失和抑制电路误操作的目的,难以提供更宽的折射率分布。
当在折射率分布形成之后,在通过的光的波长接近于用来改变折射率的波长的情况下使用以上传统材料时,则不能防止发生折射率逐步变化的现象,从而使材料劣化。
发明内容
本发明是鉴于现有技术中的上述情况提出的。
即,本发明的目的在于提供一种采用简单方法使折射率变化的辐射敏感的折射率变化组合物,其改变的折射率差别足够大,并且本发明还可以提供一种稳定的折射率图案和一种稳定的光学材料,而不考虑其使用条件。
本发明的另一个目的是提供一种由本发明的以上组合物形成折射率图案的方法。
本发明的另一个目的是提供由本发明的以上方法生产的一种折射率图案或一种光学材料。
本发明的其它目的和优点将由以下描述内容说明。
首先根据本发明,本发明的以上目的和优点可以通过一种辐射敏感的折射率变化组合物来实现,该组合物包含:(A)一种可聚合的化合物,(B)一种不可聚合的化合物,它的折射率低于可聚合的化合物(A)的聚合物,和(C)一种辐射敏感的聚合引发剂。
其次,本发明的以上目的和优点可以通过一种形成折射率图案的方法来实现:将一种包含(A)一种可聚合的化合物,(B)一种不可聚合的化合物,它的折射率低于可聚合的化合物(A)的聚合物,和(C)一种辐射敏感的聚合引发剂的辐射敏感的折射率变化组合物通过图案掩模暴露于辐射中。
第三,本发明的以上目的和优点可以通过由以上折射率图案形成方法形成的折射率图案来实现。
第四,本发明的以上目的和优点可以通过由以上折射率图案形成方法形成的光学材料来实现。
在本发明中,术语“折射率图案”是指一种由折射率不同的区域形成的折射率分布型材料。折射率值的比较基于在室温下和633nm波长测量的折射率。
优选实施方案的具体描述
以下详细描述中给出本发明折射率图案形成方法中使用的折射率变化材料的各组分。
(A)可聚合化合物
与酸、碱或自由基聚合或反应的任何已知化合物都可以用作本发明中使用的可聚合化合物(A)。其聚合物的折射率优选1.45-1.9,更优选1.5-1.9。尽管用作组分(A)的可聚合化合物通常是一种单体,但是它的分子量并无特别限定,并且其分子量可以像低聚物一样高。也可以优选使用分子中具有两个或更多可聚合官能团如双键的化合物。
与酸、碱或由辐射敏感的分解物产生的自由基聚合或反应的化合物是一种分子中含有可聚合官能团如乙烯基团、氮丙啶基团、环氧基团、环硫化物基团、羟基或氧杂环丁基的化合物。
以上化合物的例子包括乙烯基芳香族化合物,乙烯基醚化合物,丙烯酸和甲基丙烯酸,含有环氧基团的可开环聚合的单体,氧杂环丁烷化合物和马来酰亚胺。如下给出以上化合物的典型例子。
乙烯基芳香族化合物的典型例子包括:苯乙烯,以及由烷基、烷氧基、卤素、卤代烷基、硝基、氰基、酰胺和/或酯基在α、邻、间和/或对位取代的苯乙烯衍生物;单乙烯基芳香族化合物如苯乙烯磺酸、2,4-二甲基苯乙烯、对-二甲基氨基苯乙烯、乙烯基苄基氯、乙烯基苯甲醛、茚、1-甲基茚、苊、乙烯基萘、乙烯基蒽、乙烯基咔唑和2-乙烯基芴;多官能团乙烯基芳香族化合物如邻、间、和对-二乙烯基苯,邻、间、和对-二异丙烯基苯,1,2,4-三乙烯基苯,1,2-乙烯基-3,4-二甲基苯,1,3-二乙烯基萘,1,3,5-三乙烯基萘,2,4-二乙烯基联苯,3,5,4’-三乙烯基联苯,1,2-二乙烯基-3,4-二甲基苯和1,5,6-三乙烯基-3,7-二乙基萘。还有二乙烯基苯和二异丙烯基苯的邻、间、和对异构体,并且二乙烯基苯和二异丙烯基苯可以是这些异构体的混合物。
乙烯基醚化合物的典型例子包括:单烷基乙烯基醚如甲基乙烯基醚、乙基乙烯基醚、正丙基乙烯基醚、正丁基乙烯基醚、叔丁基乙烯基醚、异丁基乙烯基醚、叔戊基乙烯基醚、十二烷基乙烯基醚、十八烷基乙烯基醚、乙二醇丁基乙烯基醚、三甘醇乙基乙烯基醚、2-氯乙基乙烯基醚、2-乙基己基乙烯基醚、环己基乙烯基醚、氨基丙基乙烯基醚和2-(二乙基氨基)乙基乙烯基醚;单芳基乙烯基醚如苯甲基乙烯基醚、苯基乙烯基醚、对甲苯基乙烯基醚和萘基乙烯基醚;二乙烯基醚如1,4-丁二醇二乙烯基醚、1,6-己二醇二乙烯基醚、1,4-环己烷二甲醇二乙烯基醚、二(4-乙烯氧基)间苯二酸丁酯、二(4-乙烯氧基)对苯二酸丁酯、二(4-乙烯氧基)戊二酸丁酯、二(4-乙烯氧基)丁二酸丁酯、乙二醇二乙烯基醚、二甘醇二乙烯基醚和三甘醇二乙烯基醚;三乙烯基醚如三羟甲基丙烷三乙烯基醚;四乙烯基醚如季戊四醇四乙烯基醚;和含有羟基的乙烯基醚如丁二醇单乙烯基醚、乙二醇单乙烯基醚、二甘醇单乙烯基醚、环己烷二甲醇单乙烯基醚和己二醇单乙烯基醚。
甲基丙烯酸和丙烯酸化合物的典型例子包括:甲基丙烯酸、丙烯酸,及甲基丙烯酸和丙烯酸的酯如甲酯、乙酯、正丙酯、异丙酯、正丁酯、仲丁酯、叔丁酯、戊酯、新戊酯、异戊基己酯、环己酯、金刚烷酯、烯丙酯、炔丙酯、苯基酯、萘基酯、蒽基酯、蒽醌酯、胡椒基酯、水杨基酯、苯甲酯、苯乙酯、甲苯基酯、甘油酯、1,1,1-三氟乙酯、全氟乙酯、全氟正丙酯、全氟异丙酯、三苯基甲酯、三环[5.2.1.02,6]-8-癸酯(在本技术领域内称为“二环戊酯”)、枯基酯、3-(N,N-二甲基氨基)丙酯、3-(N,N-二甲基氨基)乙酯、呋喃基酯和糠基酯;甲基丙烯酸和丙烯酸的酰苯胺和酰胺如N,N-二甲基、N,N-二乙基、N,N-二丙基、N,N-二异丙基和蒽胺;多官能度的(甲基)丙烯酸酯如二(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸二甘醇酯、二(甲基)丙烯酸丙二醇酯、二(甲基)丙烯酸丁二醇酯、二(甲基)丙烯酸己二醇酯、三羟甲基丙烷二(甲基)丙烯酸酯、三羟甲基丙烷三(甲基)丙烯酸酯、三(甲基)丙烯酸季戊四醇酯、四(甲基)丙烯酸季戊四醇酯、(甲基)丙烯酰氧基乙硫醚、1,4-双[(甲基)丙烯酰基硫代乙基硫代甲基]苯、通过将环氧乙烷或环氧丙烷加入到氢醌或双酚的两个端基而得到的二(甲基)丙烯酸酯化合物、2,2-双(4-(甲基丙烯酰氧乙氧基)苯基)丙烷、2-丙烯酰氧基乙基-2-羟丙基邻苯二甲酸酯、双(4-甲基丙烯酰基硫代苯基)硫化物、对-双(2-甲基丙烯酰氧基乙基硫)二甲苯和对-双(2-甲基丙烯酰氧基丙基硫)二甲苯。
含有环氧基团的可开环聚合单体的典型例子包括双酚A二缩水甘油醚、双酚F二缩水甘油醚、双酚S二缩水甘油醚、溴化的双酚A二缩水甘油醚、溴化的双酚F二缩水甘油醚、溴化的双酚S二缩水甘油醚、氢化的双酚A二缩水甘油醚、氢化的双酚F二缩水甘油醚、氢化的双酚S二缩水甘油醚、3,4-环氧环己基甲基-3,4-环氧环己烷羧酸酯、2-(3,4-环氧环己基-5,5-螺-3,4-环氧基)环己烷间二氧杂环己烷、双(3,4-环氧环己基甲基)己二酸酯、乙烯基氧化环己烯、4-乙烯基环氧环己烯、双(3,4-环氧-6-甲基环己基甲基)己二酸酯、3,4-环氧-6-甲基环己基-3,4-环氧-6-甲基环己烷羧酸酯、亚甲基双(3,4-环氧环己烷)、二环戊二烯二环氧化物、二(3,4-环氧环己烷羧酸)乙二醇酯、环氧环己烷邻二甲酸二辛酯、环氧环己烷邻二甲酸二-2-乙基己基酯、1,4-丁二醇二缩水甘油醚、1,6-己二醇二缩水甘油醚、甘油二缩水甘油醚、三羟甲基丙烷三缩水甘油醚、聚乙二醇二缩水甘油醚、聚丙二醇二缩水甘油醚、通过将一种或多种氧化烯加入到脂肪族多元醇如乙二醇、丙二醇或甘油中得到的聚醚多元醇的多缩水甘油醚,脂肪族长链二元酸的二缩水甘油酯,脂肪族高级醇的单缩水甘油醚,以及苯酚、甲酚、丁基苯酚或聚醚醇(通过将氧化烯加入到这些醇中得到)的单缩水甘油醚。此外,还可以使用由硫原子取代上述每种化合物中环氧环上的氧原子而得到的硫代环氧化合物。
氧杂环丁烷化合物的典型例子包括:
3-乙基-3-甲氧基甲基氧杂环丁烷
3-乙基-3-乙氧基甲基氧杂环丁烷
3-乙基-3-丁氧基甲基氧杂环丁烷
3-乙基-3-己氧基甲基氧杂环丁烷
3-甲基-3-羟基甲基氧杂环丁烷
3-乙基-3-羟基甲基氧杂环丁烷
3-乙基-3-烯丙氧基甲基氧杂环丁烷
3-乙基-3-(2’-羟乙基)氧甲基氧杂环丁烷
3-乙基-3-(2’-羟基-3’-苯氧基丙基)氧甲基氧杂环丁烷
3-乙基-3-(2’-羟基-3’-丁氧基丙基)氧甲基氧杂环丁烷
3-乙基-3-[2’-(2”-乙氧基乙基)氧甲基]氧杂环丁烷
3-乙基-3-(2’-丁氧基乙基)氧甲基氧杂环丁烷
3-乙基-3-苯甲基氧甲基氧杂环丁烷,和
3-乙基-3-(对叔丁基苯甲基氧甲基)氧杂环丁烷。
还可以优选使用分子中同时具有氧杂环丁基和可聚合乙烯基的化合物,如:
3-((甲基)丙烯酰氧甲基)氧杂环丁烷
3-((甲基)丙烯酰氧甲基)-2-三氟甲基氧杂环丁烷
3-((甲基)丙烯酰氧甲基)-2-苯基氧杂环丁烷
2-((甲基)丙烯酰氧甲基)氧杂环丁烷和
2-((甲基)丙烯酰氧甲基)-4-三氟甲基氧杂环丁烷
马来酰亚胺基单体的典型例子包括N-苯基马来酰亚胺、N-环己基马来酰亚胺、N-苯甲基马来酰亚胺、N-琥珀酰亚胺基-3-马来酰亚胺苯甲酸酯、N-琥珀酰亚胺基-4-马来酰亚胺丁酸酯、N-琥珀酰亚胺基-6-马来酰亚胺辛酸酯、N-琥珀酰亚胺基-3-马来酰亚胺丙酸酯和N-(9-吖啶基)马来酰亚胺。
还可以使用丙烯腈、丙烯醛、甲基丙烯腈、氯乙烯、二氯乙烯、氟乙烯、二氟乙烯、N-乙烯基吡咯烷酮、乙烯基吡啶和乙酸乙烯酯。
在所有以上作为组分(A)列举的化合物中,氢原子可以被以下基团取代:氯原子、溴原子、羟基、巯基、烷氧基、硫代烷基、卤代烷基、卤代烷氧基、卤代硫烷基、烷基硫酯基、巯基烷基、芳基、芳烷基、或氰基。
以上烷氧基可以是线形的或支化的。烷氧基的例子包括甲氧基、乙氧基、正丙氧基、异丙氧基、正丁氧基、异丁氧基、仲丁氧基、叔丁氧基、正戊氧基、新戊氧基、和正己氧基。
以上硫代烷基可以是线形的或支化的。硫代烷基的例子包括硫代甲基、硫代乙基、硫代正丙基、硫代异丙基、硫代正丁基、硫代异丁基、硫代仲丁基、硫代叔丁基、硫代正戊基、硫代新戊基、和硫代正己基。
以上卤代烷基的例子包括三氟甲基、五氟乙基、七氟丙基、氯代甲基、2-氯乙基、3-氯丙基、1-氯甲基乙基、4-氯丁基、2-氯甲基丙基、5-氯戊基、3-氯甲基丁基、2-氯乙基丙基、6-氯己基、3-氯甲基戊基、4-氯甲基戊基、2-氯乙基丁基、溴代甲基、2-溴乙基、3-溴丙基、1-溴甲基乙基、4-溴丁基、2-溴甲基丙基、5-溴戊基、3-溴甲基丁基、2-溴乙基丙基、6-溴己基、3-溴甲基戊基、4-溴甲基戊基、和2-溴乙基丁基。
以上卤代烷氧基的例子包括三氟甲氧基、五氟乙氧基、七氟丙氧基、氯代甲氧基、2-氯乙氧基、3-氯丙氧基、1-氯甲基乙氧基、4-氯丁氧基、2-氯甲基丙氧基、5-氯戊氧基、3-氯甲基丁氧基、2-氯乙基丙氧基、6-氯己氧基、3-氯甲基戊氧基、4-氯甲基戊氧基、2-氯乙基丁氧基、溴代甲氧基、2-溴乙氧基、3-溴丙氧基、1-溴甲基乙氧基、4-溴丁氧基、2-溴甲基丙氧基、5-溴戊氧基、3-溴甲基丁氧基、2-溴乙基丙氧基、6-溴己氧基、3-溴甲基戊氧基、4-溴甲基戊氧基、和2-溴乙基丁氧基。
以上卤代硫烷基的例子包括三氟硫甲基、五氟硫乙基、七氟硫丙基、氯代硫甲基、2-氯硫乙基、3-氯硫丙基、1-氯甲基硫乙基、4-氯硫丁基、2-氯甲基硫丙基、5-氯硫戊基、3-氯甲基硫丁基、2-氯乙基硫丙基、6-氯硫己基、3-氯甲基硫戊基、4-氯甲基硫戊基、2-氯乙基硫丁基、溴代硫甲基、2-溴硫乙基、3-溴硫丙基、1-溴甲基硫乙基、4-溴硫丁基、2-溴甲基硫丙基、5-溴硫戊基、3-溴甲基硫丁基、2-溴乙基硫丙基、6-溴硫己基、3-溴甲基硫戊基、4-溴甲基硫戊基、和2-溴乙基硫丁基。
以上巯基烷基的例子包括巯基甲基、2-巯基乙基、3-巯基丙基、1-巯基甲基乙基、4-巯基丁基、2-巯基甲基丙基、5-巯基戊基、3-巯基甲基丁基、2-巯基乙基丙基、6-巯基己基、3-巯基甲基戊基、4-巯基甲基戊基、和2-巯基乙基丁基。
以上芳基的例子包括苯基、甲苯基、二甲苯基、枯烯基、和1-萘基。
以上芳烷基的例子包括苯甲基、α-甲基苯甲基、苯乙基、和萘甲基。
以上列举的已知化合物都可以不加限制地用作本发明中的可聚合化合物(A)。含有芳香族环、卤素原子或硫原子的化合物可以有利地用来增加其与组分(B)之间折射率的差别。
一种可聚合的低聚物也可以用作本发明中的可聚合化合物(A)。
以上反应性低聚物选自一种含有烯键式不饱和键的可聚合低聚物、环氧化物低聚物、硫杂丙环低聚物、氧杂环丁烷低聚物、烷氧基甲基三聚氰胺化合物、烷氧基甲基甘脲化合物、烷氧基甲基苯胍胺化合物、烷氧基甲基脲化合物、异氰酸酯化合物、氰酸酯化合物、噁唑啉化合物、噁嗪化合物、和甲硅烷基化合物(卤代甲硅烷基化合物或其他甲硅烷基化合物)。
以上含有烯键式不饱和键的可聚合低聚物优选是一种单官能度或二官能度的(甲基)丙烯酸酯或官能度为3或更多的(甲基)丙烯酸酯。从聚合能力和所得固化薄膜的强度方面考虑,特别优选二官能度的(甲基)丙烯酸酯或官能度为3或更多的(甲基)丙烯酸酯。
以上单官能度(甲基)丙烯酸酯的例子包括(甲基)丙烯酸2-羟基乙酯、(甲基)丙烯酸卡必醇酯、(甲基)丙烯酸异冰片酯、(甲基)丙烯酸3-甲氧基丁酯、和2-(甲基)丙烯酰氧基乙基-2-羟基苯二甲酸丙酯。以上单官能度(甲基)丙烯酸酯的市售产品包括Aronix M-101,M-111和M-114(Toagosei化学工业公司)、KAYARAD TC-110S和TS-120S(Nippon Kayaku公司)以及Biscoat158和2311(Osaka yukiKagaku Kogyo公司)。
以上二官能度(甲基)丙烯酸酯的例子包括(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸1,6-己二醇酯、二(甲基)丙烯酸1,9-壬二醇酯、二(甲基)丙烯酸丙二醇酯、二(甲基)丙烯酸四甘醇酯、双苯氧基乙醇芴二丙烯酸酯、2,2-双(4-((甲基)丙烯酰氧基乙氧基)苯基)丙烷、2-(甲基)丙烯酰氧基乙基-2-羟基苯二甲酸丙酯、双(4-(甲基)丙烯酰基硫代苯基)硫化物、对-双(2-(甲基)丙烯酰氧基乙基硫)二甲苯和对-双(2-(甲基)丙烯酰氧基丙基硫)二甲苯。以上二官能度(甲基)丙烯酸酯的市售产品包括Aronix M-210,M-240和M-6200(Toagosei化学工业公司)、KAYARAD THDDA,HX-220和R-604(Nippon Kayaku公司)以及Biscoat260,312和335HP(Osaka yuki Kagaku Kogyo公司)。
以上官能度为3或更多的(甲基)丙烯酸酯的例子包括三羟甲基丙烷三(甲基)丙烯酸酯、三(甲基)丙烯酸季戊四醇酯、三((甲基)丙烯酰氧基乙基)磷酸酯、四(甲基)丙烯酸季戊四醇酯、五(甲基)丙烯酸二季戊四醇酯、和六(甲基)丙烯酸二季戊四醇酯。以上官能度为3或更多的(甲基)丙烯酸酯的市售产品包括Aronix M-309,M-400,M-402,M-405,M-450,M-7100,M-8030,M-8060,M-1310,M-1600,M-1960,M-8100,M-8530,M-8560,和M-9050(Toagosei化学工业公司)、KAYARAD TMPTA,DPHA,DPCA-20,DPCA-30,DPCA-60和DPCA-120(Nippon Kayaku公司)以及Biscoat 295,300,360,GPT,3PA和400(Osaka yuki Kagaku Kogyo公司)。
此外,除了上述(甲基)丙烯酸酯化合物之外,丙烯酸氨基甲酸乙酯、氨基甲酸乙酯加合物以及聚酯丙烯酸酯也可以有利地用作本发明中含有烯键式不饱和键的可聚合化合物。这些含有烯键式不饱和键的可聚合化合物的市售产品包括Aronix M-7100,M-8030,M-8060,M-1310,M-1600,M-1960,M-8100,M-8530,M-8560,和M-9050(Toagosei化学工业公司)。
以上单官能度和双官能度(甲基)丙烯酸酯、官能度为3或更多的(甲基)丙烯酸酯、丙烯酸氨基甲酸乙酯、氨基甲酸乙酯加合物以及聚酯丙烯酸酯可以单独使用或组合使用。
以上环氧化物低聚物的例子包括双酚A环氧树脂、双酚F环氧树脂、酚醛环氧树脂、甲酚醛环氧树脂、脂环族环氧树脂、双酚A环氧化合物和脂肪族聚缩水甘油醚。
下面给出以上化合物的市售产品的例子。双酚A环氧树脂的市售产品包括Epicoat 1001、1002、1003、1004、1007、1009、1010和828(Yuka Shell Epoxy公司),双酚F环氧树脂的市售产品包括Epicoat 807(Yuka Shell Epoxy公司),酚醛环氧树脂的市售产品包括Epicoat 152和154(Yuka Shell Epoxy公司)以及EPPN 201和202(Nippon Kayaku公司),甲酚醛环氧树脂的市售产品包括EOCN-102、EOCN-103S、EOCN-104S、EOCN-1020、EOCN-1025和EOCN-1027(Nippon Kayaku公司)和Epicoat 180S75(Yuka Shell Epoxy公司),脂环族环氧树脂的市售产品包括CY175、CY177和CY179(CIBA-GEIGY公司),ERL-4234、ERL-4299、ERL-4221和ERL-4206(U.C.C公司),Showdyne 509(Showa Denko K.K),AraldyteCY-182、CY-192、CY-184(CIBA-GEIGY公司),Epichlon 200和400(Dainippon油墨和化学品公司),Epicoat 871和872(Yuka ShellEpoxy公司),和ED-5661、ED-5662(Celanees Coating公司),脂肪族聚缩水甘油醚的市售产品包括Epolite 100MF(Kyoeisha Kagaku公司)和Epiol TMP(NOF公司)。
除了上述化合物,还可以优选使用含硫的环氧化合物如:
双(β-环氧丙基)硫化物
双(β-环氧丙基硫代)甲烷
1,2-双(β-环氧丙基硫代)乙烷
1,3-双(β-环氧丙基硫代)丙烷
1,2-双(β-环氧丙基硫代)丙烷
1-(β-环氧丙基硫代)-2-(β-环氧丙基硫代甲基)丙烷
1,4-双(β-环氧丙基硫代)丁烷
1,3-双(β-环氧丙基硫代)丁烷
1-(β-环氧丙基硫代)-3-(β-环氧丙基硫代甲基)丁烷
1,5-双(β-环氧丙基硫代)戊烷
1-(β-环氧丙基硫代)-4-(β-环氧丙基硫代甲基)戊烷
1,6-双(β-环氧丙基硫代)己烷
1-(β-环氧丙基硫代)-5-(β-环氧丙基硫代甲基)己烷
1-(β-环氧丙基硫代)-2-[(2-β-环氧丙基硫代乙基)硫]乙烷
1-(β-环氧丙基硫代)-2-[(2-(2-β-环氧丙基硫代乙基)硫代乙基)硫]乙烷
四(β-环氧丙基硫代甲基)甲烷
1,1,1-三(β-环氧丙基硫代甲基)丙烷
1,5-双(β-环氧丙基硫代)-2-(β-环氧丙基硫代甲基)-3-硫代戊烷
1,5-双(β-环氧丙基硫代)-2,4-双(β-环氧丙基硫代甲基)-3-硫代戊烷
1-(β-环氧丙基硫代)-2,2-双(β-环氧丙基硫代甲基)-4-硫代己烷
1,5,6-三(β-环氧丙基硫代)-4-(β-环氧丙基硫代甲基)-3-硫代己烷
1,3-和1,4-双(β-环氧丙基硫代)环己烷
1,3-和1,4-双(β-环氧丙基硫代甲基)环己烷
双[4-(β-环氧丙基硫代)环己基]甲烷
2,2-双[4-(β-环氧丙基硫代)环己基]丙烷
双[4-(β-环氧丙基硫代)环己基]硫化物
2,5-双(β-环氧丙基硫代甲基)-1,4-二噻烷
2,5-双(β-环氧丙基硫代乙基硫代甲基)-1,4-二噻烷
1,3-和1,4-双(β-环氧丙基硫代)苯
1,3-和1,4-双(β-环氧丙基硫代甲基)苯
双[4-(β-环氧丙基硫代)苯基]甲烷
2,2-双[4-(β-环氧丙基硫代)苯基]丙烷
双[4-(β-环氧丙基硫代)苯基]硫化物
双[4-(β-环氧丙基硫代)苯基]砜,和
4,4’-双(β-环氧丙基硫代)联苯;以及环氧低聚物如苯基缩水甘油醚、丁基缩水甘油醚、3,3,3-三氟甲基环氧丙烷、氧化苯乙烯、六氟环氧丙烷、氧化环己烯、N-缩水甘油基苯二酰亚胺、(九氟-N-丁基)环氧化物、全氟乙基缩水甘油醚、表氯醇、表溴醇、N,N-二缩水甘油基苯胺、和3-[2-(全氟己基)乙氧基]-1,2-环氧丙烷。
以上硫杂丙环化合物的例子包括用环硫乙烷基团取代上述环氧化物低聚物的环氧基团而得到的化合物,如J.Org.Chem,28,229(1963)中所述。
以上氧杂环丁烷低聚物的例子包括双[(3-乙基-3-氧杂环丁基甲氧基)甲基]苯(商品名:XDO,Toagosei化学工业公司生产),双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]甲烷,双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]醚,双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]丙烷,双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]砜,双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]酮,双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]六氟丙烷,三[(3-乙基-3-氧杂环丁基甲氧基)甲基]苯和四[(3-乙基-3-氧杂环丁基甲氧基)甲基]苯。
以上烷氧基甲基三聚氰胺化合物、烷氧基甲基甘脲化合物、烷氧基甲基苯胍胺化合物和烷氧基甲基脲化合物是用烷氧基甲基基团分别取代羟甲基三聚氰胺化合物、羟甲基甘脲化合物、羟甲基苯胍胺化合物和羟甲基脲化合物的羟甲基而得到的。烷氧基甲基的类型并无特别限制,例如可以是甲氧基甲基、乙氧基甲基、丙氧基甲基和丁氧基甲基。
以上化合物的市售产品包括Simel 300、301、303、370、325、327、701、266、267、238、1141、272、202、1156、1158、1123、1170和1174,以及UFR65和300(Mitsui Sianamid公司),和NicalakMx-750、Mx-032、Mx-706、Mx-708、Mx-40、Mx-31、Mx-11和Mx-30(Sanwa化学品公司)。
以上异氰酸酯化合物的例子包括亚苯基-1,3-二异氰酸酯、亚苯基-1,4-二异氰酸酯、1-甲氧基亚苯基-2,4-二异氰酸酯、1-甲基亚苯基-2,4-二异氰酸酯、2,4-亚甲苯基二异氰酸酯、2,6-亚甲苯基二异氰酸酯、1,3-亚二甲苯基二异氰酸酯、1,4-亚二甲苯基二异氰酸酯、亚联苯基-4,4’-二异氰酸酯、3,3’-二甲氧基亚联苯基-4,4’-二异氰酸酯、3,3’-二甲基亚联苯基-4,4’-二异氰酸酯、二苯基甲烷-2,4’-二异氰酸酯、二苯基甲烷-4,4’-二异氰酸酯、3,3’-二甲氧基二苯基甲烷-4,4’-二异氰酸酯、3,3’-二甲基二苯基甲烷-4,4’-二异氰酸酯、萘-1,5-二异氰酸酯、环丁烯-1,3-二异氰酸酯、环戊烯-1,3-二异氰酸酯、环己烯-1,3-二异氰酸酯、环己烯-1,4-二异氰酸酯、1-甲基环己烯-2,4-二异氰酸酯、1-甲基环己烯-2,6-二异氰酸酯、1-异氰酸酯-3,3,5-三甲基-5-异氰酸酯甲基环己烷、环己烷-1,3-二(甲基异氰酸酯)、环己烷-1,4-二(甲基异氰酸酯)、异佛尔酮二异氰酸酯、二环己基甲烷-2,4’-二异氰酸酯、二环己基甲烷-4,4’-二异氰酸酯、二异氰酸乙二酯、亚丁基-1,4-二异氰酸酯、亚己基-1,6-二异氰酸酯、亚十二烷基-1,12-二异氰酸酯、赖氨酸二异氰酸酯甲酯,以及上述有机二异氰酸酯之一以化学计量过剩量与含有2官能度活性氢的化合物反应得到的含有双末端异氰酸酯基团的预聚物。
上述二异氰酸酯还可以和具有3或更多异氰酸酯基团的有机多异氰酸酯一起合并使用,如苯基-1,3,5-三异氰酸酯、二苯基甲烷-2,4,4’-三异氰酸酯、二苯基甲烷-2,5,4’-三异氰酸酯、三苯基甲烷-2,4’,4”-三异氰酸酯、三苯基甲烷-4,4’,4”-三异氰酸酯、二苯基甲烷-2,4,2’,4’-四异氰酸酯、二苯基甲烷-2,5,2’,5’-四异氰酸酯、环己烷-1,3,5-三异氰酸酯、环己烷-1,3,5-三(甲基异氰酸酯)、3,5-二甲基环己烷-1,3,5-三(甲基异氰酸酯)、1,3,5-三甲基环己烷-1,3,5-三(甲基异氰酸酯)、二环己基甲烷-2,4,2’-三异氰酸酯或二环己基甲烷-2,4,4’-三异氰酸酯,或者上述具有3或更多异氰酸酯基团的有机多异氰酸酯之一以化学计量过剩量与含有2或更多氢原子的多官能度活性氢的化合物反应得到的一个末端含有异氰酸酯基团的预聚物。
上述噁唑啉化合物的例子包括2,2’-二(2-噁唑啉)、4-呋喃-2-基亚甲基-2-苯基-4H-噁唑-5-酮、1,4-二(4,5-二氢-2-噁唑基)苯、1,3-二(4,5-二氢-2-噁唑基)苯、2,3-二(4-异丙烯基-2-噁唑啉-2-基)丁烷、2,2’-二-4-苯甲基-2-噁唑啉、2,6-二(异丙基-2-噁唑啉-2-基)吡啶、2,2’-亚异丙基二(4-叔丁基-2-噁唑啉)、2,2’-亚异丙基二(4-苯基-2-噁唑啉)、2,2’-亚甲基二(4-叔丁基-2-噁唑啉)、2,2’-亚甲基二(4-苯基-2-噁唑啉)。
上述噁嗪化合物的例子包括2,2’-二(2-噁嗪)、4-呋喃-2-基亚甲基-2-苯基-4H-噁嗪基-5-酮、1,4-二(4,5-二氢-2-噁嗪基)苯、1,3-二(4,5-二氢-2-噁嗪基)苯、2,3-二(4-异丙烯基-2-噁嗪-2-基)丁烷、2,2’-二-4-苯甲基-2-噁嗪、2,6-二(异丙基-2-噁嗪-2-基)吡啶、2,2’-亚异丙基二(4-叔丁基-2-噁嗪)、2,2’-亚异丙基二(4-苯基-2-噁嗪)、2,2’-亚甲基二(4-叔丁基-2-噁嗪)、2,2’-亚甲基二(4-苯基-2-噁嗪)等。
上述卤化甲硅烷基化合物的例子包括四氯硅烷、四溴硅烷、四碘硅烷、三氯溴硅烷、二氯二溴硅烷等四卤代硅烷类,甲基三氯硅烷、甲基二氯溴硅烷、环己基三氯硅烷等单烷基三卤代硅烷类,苯基三氯硅烷、萘基三氯硅烷、4-氯苯基三氯硅烷、苯基二氯溴硅烷等单芳基三卤代硅烷类,苯氧基三氯硅烷、苯氧基二氯溴硅烷等单芳氧基三卤代硅烷类,甲氧基三氯硅烷、乙氧基三氯硅烷等单烷氧基三卤代硅烷类,二甲基二氯硅烷、甲基(乙基)二氯硅烷、甲基(环己基)二氯硅烷等二烷基二卤代硅烷类,甲基(苯基)二氯硅烷等单烷基单芳基二卤代硅烷类,二苯基二氯硅烷等二芳基二卤代硅烷类,二苯氧基二氯硅烷等二芳氧基二卤代硅烷类,甲基(苯氧基)二氯硅烷等单烷基单芳氧基二卤代硅烷类,苯基(苯氧基)二氯硅烷等单芳基单芳氧基二卤代硅烷类,二乙氧基二氯硅烷等二烷氧基二卤代硅烷类,甲基(乙氧基)二氯硅烷等单烷基单烷氧基二氯硅烷类,苯基(乙氧基)二氯硅烷等单芳基单乙氧基二氯硅烷类,三甲基氯硅烷、二甲基(乙基)氯硅烷、二甲基(环己基)氯硅烷等三烷基单卤代硅烷类,二甲基(苯基)氯硅烷等二烷基单芳基单卤代硅烷类,甲基(二苯基)氯硅烷等单烷基二芳基单卤代硅烷类,三苯氧基氯硅烷等三芳氧基单卤代硅烷类,甲基(二苯氧基)氯硅烷等单烷基二芳氧基单卤代硅烷类,苯基(二苯氧基)氯硅烷等单芳基二芳氧基单卤代硅烷类,二甲基(苯氧基)氯硅烷等二烷基单芳氧基单卤代硅烷类,二苯基(苯氧基)氯硅烷等二芳基单芳氧基单卤代硅烷类,甲基(苯基)(苯氧基)氯硅烷等单烷基单芳基单芳氧基单卤代硅烷类,三乙氧基氯硅烷等三乙氧基单卤代硅烷类,以及四氯硅烷的2~5倍体等上述化合物的低聚物。
上述其他甲硅烷基化合物的例子包括六甲基二甲硅氮烷、叔丁基二甲基氯硅烷、二(三甲基甲硅烷基)三氟乙酰胺、二乙基氨基三甲基硅烷、三甲基甲硅烷醇、六甲基二硅氧烷、氯甲基二甲基乙氧基硅烷、乙酰基三苯基硅烷、乙氧基三苯基硅烷、三苯基甲硅烷醇、三乙基甲硅烷醇、三丙基甲硅烷醇、三丁基甲硅烷醇、六乙基二硅氧烷、三甲基甲氧基硅烷、三甲基乙氧基硅烷、三乙基甲氧基硅烷、三乙基乙氧基硅烷、乙酸基乙基二甲基氯硅烷、1,3-二(羟丁基)四甲基二硅氧烷、1,3-二(羟丙基)四甲基二硅氧烷、γ-氨基丙基甲氧基硅烷、γ-氨基丙基乙氧基硅烷、N-β(氨基乙基)-γ-氨基丙基三甲氧基硅烷、N-β(氨基乙基)-γ-氨基丙基甲基二甲氧基硅烷、N-苯基-γ-氨基丙基三甲氧基硅烷、γ-苯氨基丙基三甲氧基硅烷、γ-二丁基氨基丙基三甲氧基硅烷、γ-脲基丙基三乙氧基硅烷、N-β(N-乙烯基苯甲基氨基乙基)-γ-氨基丙基三甲氧基硅烷·盐酸盐、γ-甲基丙烯氧基丙基三甲氧基硅烷、γ-甲基丙烯氧基丙基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三氯硅烷、乙烯基三(β-甲氧基乙氧基)硅烷、γ-环氧丙氧基丙基甲基二乙氧基硅烷、γ-环氧丙氧基丙基三乙氧基硅烷、γ-(3,4-环氧环己基)乙基三甲氧基硅烷、γ-环氧丙氧基丙基三甲氧基硅烷、γ-巯基丙基三甲氧基硅烷、γ-氯丙基三甲氧基硅烷、三甲基氯硅烷、六甲基二甲硅氮烷、N-三甲基甲硅烷基咪唑、二(三甲基甲硅烷基)脲、三甲基甲硅烷基乙酰胺、二(三甲基甲硅烷基)乙酰胺、三甲基甲硅烷基异氰酸酯、三甲基甲氧基硅烷、三甲基乙氧基硅烷、甲基三甲氧基硅烷、甲基三乙氧基硅烷、二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、叔丁基二甲基氯硅烷、叔丁基二苯基氯硅烷、三异丙基氯硅烷、正丙基三甲氧基硅烷、异丁基三甲氧基硅烷、正己基三甲氧基硅烷、正癸基三甲氧基硅烷、正十六烷基三甲氧基硅烷、1,6-二(三甲氧基甲硅烷基)己烷、二甲基甲硅烷基二异氰酸酯、甲基甲硅烷基三异氰酸酯、苯基三甲氧基硅烷、二苯基二甲氧基硅烷以及苯基甲硅烷基三异氰酸酯。
上述已知化合物都可以不加限制地用作反应性低聚物。尽管根据所使用的组分(B)的折射率,可以选择具有优选的折射率的任何反应性低聚物,但是含有芳族环和硫原子的化合物可以优选用来增加其与组分(B)之间折射率的差别。
优选地,在1乇下(133.3帕)沸点优选为160℃或更低,更优选130℃或更低的化合物,以至少20重量%的用量作为可聚合的化合物(A)包含在本发明中。当化合物的用量少于20重量%时,就不可能得到折射率差别较大的组合物。
在上述列举并包含在可聚合化合物(A)中的反应性低聚物中,乙烯基芳香族化合物、乙烯基醚化合物和(甲基)丙烯酸有利地提供了一种在1乇下沸点为160℃或更低的可聚合化合物。
当反应性低聚物用作可聚合化合物(A)时,改善了由本发明的方法形成的折射率图案的强度。
以上作为组分(A)列举的化合物可以单独使用或两种或多种组合使用。
(B)不可聚合的化合物
本发明中使用的组分(B)是一种对酸、碱或自由基稳定的化合物,并且优选具有较高的光学透明度。根据使用目的,组分(B)的折射率可以设定或调节到一个优选的值。化合物(B)的折射率nB小于可聚合化合物(A)的聚合物的折射率nA,并且特别优选满足下列方程(1):
nA-nB≥0.05 (1)
该不可聚合化合物(B)可以是一种粘合聚合物,即,一种可以用作化合物(A)的粘合剂的聚合物。
粘合聚合物(B)的例子包括丙烯酸树脂、聚氨酯树脂、聚酯树脂、聚碳酸酯树脂、降冰片烯树脂、苯乙烯树脂、聚醚砜树脂、硅氧烷树脂、聚酰胺树脂、聚酰亚胺树脂、聚硅氧烷树脂、氟树脂、聚丁二烯树脂、乙烯基醚树脂和乙烯基酯树脂等。根据所使用的化合物(A)的聚合物的折射率,可以选择优选的粘合聚合物(B)。为了增加其与化合物(A)的聚合物之间折射率的差别,并减少长距离光学传输的损失,可以有利地采用氟原子取代上述树脂中的氢原子而得到粘合聚合物(B)。
粘合聚合物(B)的说明性实例包括下列聚合物(括号内的数字是由d射线测量出的折射率数值):
聚偏二氟乙烯(1.42)、聚二甲基硅氧烷(1.43)、聚甲基丙烯酸三氟乙酯(1.44)、聚氧化丙烯(1.45)、聚乙烯基异丁基醚(1.45)、聚乙烯基乙基醚(1.45)、聚氧化乙烯(1.46)、聚乙烯基丁基醚(1.46)、聚乙烯基戊基醚(1.46)、聚乙烯基己基醚(1.46)、聚(4-甲基-1-戊烯)(1.46~1.47)、乙酸丁酸纤维素(1.46~1.49)、聚(4-氟-2-三氟甲基苯乙烯)(1.46)、聚乙烯基辛基醚(1.46)、聚(乙烯基2-乙基己基醚)(1.46)、聚乙烯基癸基醚(1.46)、聚(2-甲氧基乙基丙烯酸酯)(1.46)、聚丙烯酸丁酯(1.46)、聚丙烯酸丁酯(1.47)、聚(甲基丙烯酸叔丁酯)(1.46)、聚乙烯基十二烷基醚(1.46)、聚(3-乙氧基丙基丙烯酸酯)(1.47)、聚氧基羰基四亚甲基(1.47)、聚丙酸乙烯酯(1.47)、聚乙酸乙烯酯(1.47)、聚乙烯基甲基醚(1.47)、聚丙烯酸乙酯(1.47)、乙烯-乙酸乙烯酯共聚物(1.47~1.50)、(80%~20%乙酸乙烯酯)丙酸纤维素(1.47~1.49)、乙酸丙酸纤维素(1.47)、苯甲基纤维素(1.47~1.58)、酚醛树脂(1.47~1.70)、三乙酸纤维素(1.47~1.48)、聚乙烯基甲基醚(等规聚合物)(1.47)、聚(3-甲氧基丙基丙烯酸酯)(1.47)、聚(2-乙氧基乙基丙烯酸酯)(1.47)、聚丙烯酸甲酯(1.47~1.48)、聚甲基丙烯酸异丙酯(1.47)、聚(1-癸烯)(1.47)、聚丙烯(无规聚合物,密度0.8575g/cm3)(1.47)、聚(乙烯基仲丁基醚)(等规聚合物)(1.47)、聚甲基丙烯酸十二烷基酯(1.47)、聚氧乙烯氧琥珀酰基(1.47)、(聚琥珀酸乙二酯)聚甲基丙烯酸十四烷基酯(1.47)、乙烯-丙烯共聚物(EPR-胶)(1.47~1.48)、聚甲基丙烯酸十六烷基酯(1.48)、聚甲酸乙烯酯(1.48)、聚(2-氟乙基甲基丙烯酸酯)(1.48)、聚甲基丙烯酸异丁酯(1.48)、乙基纤维素(1.48)、聚乙酸乙烯酯(1.48~1.50)、乙酸纤维素(1.48~1.50)、三丙酸纤维素(1.48~1.49)、聚甲醛(1.48)、聚丁酸乙烯酯(1.48~1.49)、聚(甲基丙烯酸正己酯)(1.48)、聚(甲基丙烯酸正丁酯)(1.48)、聚二甲基丙烯酸亚乙基酯(1.48)、聚(2-乙氧基乙基甲基丙烯酸酯)(1.48)、聚氧乙烯氧马来酰基(1.48)、(聚马来酸乙二酯)聚(甲基丙烯酸正丙酯)(1.48)、聚(3,3,5-三甲基环己基甲基丙烯酸酯)(1.49)、聚甲基丙烯酸乙酯(1.49)、聚(2-硝基-2-甲基丙基甲基丙烯酸酯)(1.49)、聚三乙基烃甲基甲基丙烯酸酯(1.49)、聚(1,1-二乙基丙基甲基丙烯酸酯)(1.49)、聚甲基丙烯酸甲酯(1.49)、聚(2-癸基-1,3-丁二烯)(1.49)、聚乙烯醇(1.49~1.53)、聚乙基乙醇酸酯甲基丙烯酸酯(1.49)、聚(3-甲基环己基甲基丙烯酸酯)(1.49)、聚(环己基α-乙氧基丙烯酸酯)(1.50)、甲基纤维素(低粘度)(1.50)、聚(4-甲基环己基甲基丙烯酸酯)(1.50)、聚二甲基丙烯酸癸二醇酯(1.50)、聚氨酯(1.50~1.60)、聚(1,2-丁二烯)(1.50)、聚乙烯基甲缩醛(1.50)、聚(2-溴-4-三氟甲基苯乙烯)(1.50)、硝酸纤维素(1.50~1.51)、聚(α-氯丙烯酸仲丁基酯)(1.50)、聚(2-庚基-1,3-丁二烯)(1.50)、聚(α-氯丙烯酸乙酯)(1.50)、聚(2-异丙基-1,3-丁二烯)(1.50)、聚(2-甲基环己基甲基丙烯酸酯)(1.50)、聚丙烯(密度0.9075g/cm3)(1.50)、聚异丁烯(1.51)、聚甲基丙烯酸冰片基酯(1.51)、聚(2-叔丁基-1,3-丁二烯)(1.51)、聚二甲基丙烯酸乙二醇酯(1.51)、聚甲基丙烯酸环己基酯(1.51)、聚(环己二醇-1,4-二甲基丙烯酸酯)(1.51)、丁基橡胶(未加硫)(1.51)、聚四卤糠基甲基丙烯酸酯(1.51)、胶木胶(β)(1.51)、聚乙烯离聚物(1.51)、聚氧化乙烯(高分子量)(1.51~1.54)、聚乙烯(密度0.914g/cm3)(1.51)、(密度0.94~0.945g/cm3)(1.52~1.53)、(密度0.965g/cm3)(1.55)、聚(1-甲基环己基甲基丙烯酸酯)(1.51)、聚(2-羟乙基甲基丙烯酸酯)(1.51)、聚乙烯基氯乙酸酯(1.51)、聚丁烯(等规聚合物)(1.51)、聚甲基丙烯酸乙烯基酯(1.51)、聚(N-丁基-甲基丙烯酰胺)(1.51)、胶木胶(α)(1.51)、萜烯树脂(1.52)、聚(1,3-丁二烯)(1.52)、虫胶(1.51~1.53)、聚(α-氯丙烯酸甲酯)(1.52)、聚(2-氯乙基甲基丙烯酸酯)(1.52)、聚(2-二乙基氨基乙基甲基丙烯酸酯)(1.52)、聚(2-氯环己基甲基丙烯酸酯)(1.52)、聚(1,3-丁二烯)(35%顺式;56%反式1.5180;7%1,2-加成)、天然橡胶(1.52)、聚甲基丙烯酸烯丙酯(1.52)、聚氯乙烯+40%二辛基苯二甲酸酯(1.52)、聚丙烯腈(1.52)、聚甲基丙烯腈(1.52)、聚(1,3-丁二烯)(富含顺式型)(1.52)、丁二烯-丙烯腈共聚物(1.52)、聚甲基异丙烯基酮(1.52)、聚异戊二烯(1.52)、聚酯树脂刚性体(约50%苯乙烯)(1.52~1.54)、聚(N-(2-甲氧基乙基)甲基丙烯酰胺)(1.52)、聚(2,3-二甲基丁二烯)(甲基橡胶)(1.53)、氯乙烯-乙酸乙烯酯共聚物(95/5~90/10)(1.53~1.54)、聚(1,3-二氯丙基甲基丙烯酸酯)(1.53)、聚(2-氯-1-(氯甲基)乙基甲基丙烯酸酯)(1.53)、聚丙烯醛(1.53)、聚(1-乙烯基-2-吡咯烷酮)(1.53)、盐酸化橡胶(1.53~1.55)、尼龙6;尼龙6,6;尼龙6,10(成型体)(1.53)、丁二烯-苯乙烯共聚物(约30%苯乙烯)(1.53)、嵌段共聚物聚(α-氯丙烯酸环己酯)(1.53)、聚(2-氯乙基α-氯丙烯酸酯)(1.53)、丁二烯-苯乙烯共聚物(约75/25)(1.54)、聚(2-氨基乙基甲基丙烯酸酯)(1.54)、聚甲基丙烯酸糠基酯(1.54)、聚丁基巯基甲基丙烯酸酯(1.54)、聚(1-苯基-正戊基甲基丙烯酸酯)(1.54)、聚(N-甲基-甲基丙烯酰胺)(1.54)、纤维素(1.54)、聚氯乙烯(1.54~1.55)、脲甲醛树脂(1.54~1.56)、聚(α-溴丙烯酸仲丁酯)(1.54)、聚(α-溴丙烯酸环己酯)(1.54)、聚(2-溴乙基甲基丙烯酸酯)(1.54)、聚二氢松香酸(1.54)、聚松香酸(1.546)、聚乙基巯基甲基丙烯酸酯(1.55)、聚(N-烯丙基甲基丙烯酰胺)(1.55)、聚(1-苯基乙基甲基丙烯酸酯)(1.55)、聚乙烯基呋喃(1.55)、聚(2-乙烯基四氢呋喃)(1.55)、聚(氯乙烯)+40%三甲酚磷酸酯(1.55)、聚(对甲氧基苯甲基甲基丙烯酸酯)(1.55)、聚甲基丙烯酸异丙酯(1.55)、聚(对异丙基苯乙烯)(1.55)、聚氯丁二烯(1.55~1.56)、聚(氧化乙烯-α-苯甲酸酯-ω-甲基丙烯酸酯)(1.56)、聚(p,p’-苯二甲基二甲基丙烯酸酯)(1.56)、聚(1-苯基烯丙基甲基丙烯酸酯)(1.56)、聚(对环己基苯基甲基丙烯酸酯)(1.56)、聚(2-苯基乙基甲基丙烯酸酯)(1.56)、聚(氧羰基氧基-1,4-亚苯基-1-丙基(1.56)、聚(1-(邻氯苯基)乙基甲基丙烯酸酯)(1.56)、苯乙烯-马来酸酐共聚物(1.56)、聚(1-苯基环己基甲基丙烯酸酯)(1.56)、聚(氧羰基氧基-1,4-亚苯基-1,3-二甲基-亚丁基-1,4-亚苯基)(1.57)、聚(α-溴丙烯酸甲酯)(1.57)、聚甲基丙烯酸苯甲酯(1.57)、聚(2-(苯基磺酰基)乙基甲基丙烯酸酯)(1.57)、聚(间甲酚基甲基丙烯酸酯)(1.57)、苯乙烯-丙烯腈共聚物(约75/25)(1.57)、聚(氧羰基氧基-1,4-亚苯基亚异丁基-1,4-亚苯基)(1.57)、聚(邻甲氧基苯基甲基丙烯酸酯)(1.57)、聚甲基丙烯酸苯酯(1.57)、聚(邻甲酚基甲基丙烯酸酯)(1.57)、聚邻苯二甲酸二烯丙酯(1.57)、聚(2,3-二溴丙基甲基丙烯酸酯)(1.57)、聚(氧羰基氧基-1,4-亚苯基-1-甲基-亚丁基-1,4-亚苯基)(1.57)、聚(氧-2,6-二甲基亚苯基)(1.58)、聚氧乙烯氧对苯二甲酰基(非晶态)(1.58)、聚对苯二甲酸乙二酯(1.51~1.64)、聚苯甲酸乙烯酯(1.58)、聚(氧羰基氧基-1,4-亚苯基亚丁基-1,4-亚苯基)(1.58)、聚(1,2-二苯基乙基甲基丙烯酸酯)(1.58)、聚(邻氯苯甲基甲基丙烯酸酯)(1.58)、聚(氧羰基氧基-1,4-亚苯基-亚仲丁基-1,4-亚苯基)(1.58)、聚氧化季戊四醇氧基邻苯二甲酰基(1.58)、聚(间硝基苯甲基甲基丙烯酸酯)(1.58)、聚(氧羰基氧基-1,4-亚苯基亚异丙基-1,4-亚苯基)(1.59)、聚(N-(2-苯基乙基)甲基丙烯酰胺)(1.59)、聚(4-甲氧基-2-甲基苯乙烯)(1.59)、聚(邻甲基苯乙烯)(1.59)、聚苯乙烯(1.59)、聚(氧羰基氧基-1,4-亚苯基亚环己基-1,4-亚苯基)(1.59)、聚(邻甲氧基苯乙烯)(1.59)、聚二苯基甲基甲基丙烯酸酯(1.59)、聚(氧羰基氧基-1,4-亚苯基亚乙基-1,4-亚苯基)(1.59)、聚(对溴苯基甲基丙烯酸酯)(1.60)、聚(N-苯甲基甲基丙烯酰胺)(1.60)、聚(对甲氧基苯乙烯)(1.60)、聚偏二氯乙烯(1.60~1.63)、聚硫化物(“Thiokol”)(1.6~1.7)、聚(邻氯二苯基甲基甲基丙烯酸酯)(1.60)、聚(氧羰基氧基-1,4-(2,6-二氯)亚苯基-亚异丙基-1,4-(2,6-二氯)亚苯基)(1.61)、聚(氧羰基氧基二(1,4-(3,5-二氯亚苯基)))聚五氯苯基甲基丙烯酸酯(1.61)、聚(邻氯苯乙烯)(1.61)、聚(α-溴丙烯酸苯酯)(1.61)、聚(对二乙烯基苯)(1.62)、聚(N-乙烯基邻苯二甲酰亚胺)(1.62)、聚(2,6-二氯苯乙烯)(1.62)、聚(β-萘基甲基丙烯酸酯)(1.63)、聚(α-萘基烃甲基甲基丙烯酸酯)(1.63)、聚砜(1.63)、聚(2-乙烯基噻吩)(1.64)、聚(α-萘基甲基丙烯酸酯)(1.64)、聚(氧羰基氧基-1,4-亚苯基二苯基-亚甲基-1,4-亚苯基)(1.65)、聚乙烯基苯基硫醚(1.66)、丁基酚醛树脂(1.66)、脲-硫脲-甲醛树脂(1.66)、聚乙烯基萘(1.68)、聚乙烯基咔唑(1.68)、萘-甲醛树脂(1.70)、酚醛树脂(1.70)、聚五溴苯基甲基丙烯酸酯(1.71)等。
在这些化合物中,优选d-射线折射率为1.6或更小的聚合物,更优选d-射线折射率为1.5或更小的聚合物。
不可聚合的化合物(B),特别是粘合聚合物的重均分子量优选100~500,000,更优选100~200,000。
由下式(1)代表的化合物的水解产物或其缩合物也可以用作不可聚合的化合物(B)。
R1 nSi(OR2)4-n (1)其中R1和R2可以相同或不同,并且分别是一个单价有机基团,n是0-2的整数。
在上式(1)中单价有机基团的例子包括烷基、脂环基、芳基、烯丙基和缩水甘油基。烷基的例子包括甲基、乙基、丙基和丁基。烷基基团的碳原子数目优选1-5。烷基基团可以是线形的或支化的,并且可以包含卤素原子如氟原子以取代其氢原子。脂环基的例子包括环己基和降冰片基。芳基的例子包括苯基和萘基。在上式(1)中n优选0或1。
由上式(1)代表的化合物的说明性实例包括甲基三甲氧基硅烷、甲基三乙氧基硅烷、甲基三正丙氧基硅烷、甲基三异丙氧基硅烷、甲基三正丁氧基硅烷、甲基三仲丁氧基硅烷、甲基三叔丁氧基硅烷、甲基三苯氧基硅烷、乙基三甲氧基硅烷、乙基三乙氧基硅烷、乙基三正丙氧基硅烷、乙基三异丙氧基硅烷、乙基三正丁氧基硅烷、乙基三仲丁氧基硅烷、乙基三叔丁氧基硅烷、乙基三苯氧基硅烷、正丙基三甲氧基硅烷、正丙基三乙氧基硅烷、正丙基三正丙氧基硅烷、正丙基三异丙氧基硅烷、正丙基三正丁氧基硅烷、正丙基三仲丁氧基硅烷、正丙基三叔丁氧基硅烷、正丙基三苯氧基硅烷、异丙基三甲氧基硅烷、异丙基三乙氧基硅烷、异丙基三正丙氧基硅烷、异丙基三异丙氧基硅烷、异丙基三正丁氧基硅烷、异丙基三仲丁氧基硅烷、异丙基三叔丁氧基硅烷、异丙基三苯氧基硅烷、正丁基三甲氧基硅烷、正丁基三乙氧基硅烷、正丁基三正丙氧基硅烷、正丁基三异丙氧基硅烷、正丁基三正丁氧基硅烷、正丁基三仲丁氧基硅烷、正丁基三叔丁氧基硅烷、正丁基三苯氧基硅烷、仲丁基三甲氧基硅烷、仲丁基三乙氧基硅烷、仲丁基三正丙氧基硅烷、仲丁基三异丙氧基硅烷、仲丁基三正丁氧基硅烷、仲丁基三仲丁氧基硅烷、仲丁基三叔丁氧基硅烷、仲丁基三苯氧基硅烷、叔丁基三甲氧基硅烷、叔丁基三乙氧基硅烷、叔丁基三正丙氧基硅烷、叔丁基三异丙氧基硅烷、叔丁基三正丁氧基硅烷、叔丁基三仲丁氧基硅烷、叔丁基三叔丁氧基硅烷、叔丁基三苯氧基硅烷、环己基三甲氧基硅烷、环己基三乙氧基硅烷、环己基三正丙氧基硅烷、环己基三异丙氧基硅烷、环己基三正丁氧基硅烷、环己基三仲丁氧基硅烷、环己基三叔丁氧基硅烷、环己基三苯氧基硅烷、降冰片基三甲氧基硅烷、降冰片基三乙氧基硅烷、降冰片基三正丙氧基硅烷、降冰片基三异丙氧基硅烷、降冰片基三正丁氧基硅烷、降冰片基三仲丁氧基硅烷、降冰片基三叔丁氧基硅烷、降冰片基三苯氧基硅烷、苯基三甲氧基硅烷、苯基三乙氧基硅烷、苯基三正丙氧基硅烷、苯基三异丙氧基硅烷、苯基三正丁氧基硅烷、苯基三仲丁氧基硅烷、苯基三叔丁氧基硅烷、苯基三苯氧基硅烷、二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、二甲基二正丙氧基硅烷、二甲基二异丙氧基硅烷、二甲基二正丁氧基硅烷、二甲基二仲丁氧基硅烷、二甲基二叔丁氧基硅烷、二甲基二苯氧基硅烷、二乙基二甲氧基硅烷、二乙基二乙氧基硅烷、二乙基二正丙氧基硅烷、二乙基二异丙氧基硅烷、二乙基二正丁氧基硅烷、二乙基二仲丁氧基硅烷、二乙基二叔丁氧基硅烷、二乙基二苯氧基硅烷、二正丙基二甲氧基硅烷、二正丙基二乙氧基硅烷、二正丙基二正丙氧基硅烷、二正丙基二异丙氧基硅烷、二正丙基二正丁氧基硅烷、二正丙基二仲丁氧基硅烷、二正丙基二叔丁氧基硅烷、二正丙基二苯氧基硅烷、二异丙基二甲氧基硅烷、二异丙基二乙氧基硅烷、二异丙基二正丙氧基硅烷、二异丙基二异丙氧基硅烷、二异丙基二正丁氧基硅烷、二异丙基二仲丁氧基硅烷、二异丙基二叔丁氧基硅烷、二异丙基二苯氧基硅烷、二正丁基二甲氧基硅烷、二正丁基二乙氧基硅烷、二正丁基二正丙氧基硅烷、二正丁基二异丙氧基硅烷、二正丁基二正丁氧基硅烷、二正丁基二仲丁氧基硅烷、二正丁基二叔丁氧基硅烷、二正丁基二苯氧基硅烷、二仲丁基二甲氧基硅烷、二仲丁基二乙氧基硅烷、二仲丁基二正丙氧基硅烷、二仲丁基二异丙氧基硅烷、二仲丁基二正丁氧基硅烷、二仲丁基二仲丁氧基硅烷、二仲丁基二叔丁氧基硅烷、二仲丁基二苯氧基硅烷、二叔丁基二甲氧基硅烷、二叔丁基二乙氧基硅烷、二叔丁基二正丙氧基硅烷、二叔丁基二异丙氧基硅烷、二叔丁基二正丁氧基硅烷、二叔丁基二仲丁氧基硅烷、二叔丁基二叔丁氧基硅烷、二叔丁基二苯氧基硅烷、二环己基二甲氧基硅烷、二环己基二乙氧基硅烷、二环己基二正丙氧基硅烷、二环己基二异丙氧基硅烷、二环己基二正丁氧基硅烷、二环己基二仲丁氧基硅烷、二环己基二叔丁氧基硅烷、二环己基二苯氧基硅烷、二降冰片基二甲氧基硅烷、二降冰片基二乙氧基硅烷、二降冰片基二正丙氧基硅烷、二降冰片基二异丙氧基硅烷、二降冰片基二正丁氧基硅烷、二降冰片基二仲丁氧基硅烷、二降冰片基二叔丁氧基硅烷、二降冰片基二苯氧基硅烷、二苯基二甲氧基硅烷、二苯基二乙氧基硅烷、二苯基二正丙氧基硅烷、二苯基二异丙氧基硅烷、二苯基二正丁氧基硅烷、二苯基二仲丁氧基硅烷、二苯基二叔丁氧基硅烷、二苯基二苯氧基硅烷、二乙烯基三甲氧基硅烷、γ-氨基丙基三甲氧基硅烷、γ-氨基丙基三乙氧基硅烷、γ-缩水甘油氧基丙基三甲氧基硅烷、γ-缩水甘油氧基丙基三乙氧基硅烷、γ-三氟丙基三甲氧基硅烷、γ-三氟丙基三乙氧基硅烷。还可以使用由氟原子部分或全部取代上述化合物中的氢原子而得到的化合物。这些烷基烷氧基硅烷可以单独使用或两种或多种组合使用。
在由上式(1)代表的化合物中,特别优选的是R1和R2都是烷基并且n是1的式(1)的烷基三烷氧基硅烷。其中特别优选甲基三甲氧基硅烷和甲基三乙氧基硅烷。当甲基三甲氧基硅烷和/或甲基三乙氧基硅烷的用量为所有烷基烷氧基硅烷总量的70摩尔%或更多时,可以得到在耐热性和折射率之间具有良好平衡的固化产品。由上式(1)代表的化合物的水解产物及其缩合物的重均分子量优选为500-100,000(以聚苯乙烯为标准物)。
由上式(1)代表的、作为组分(B)的化合物的水解产物及其缩合物的水解反应和缩合反应在水和适当的催化剂存在下进行,如下文详细描述。
更具体地说,由上式(1)代表的化合物溶解在一种适当的有机溶剂中,随后将水间歇地或连续地加入到该溶液中。在此之前催化剂可以溶解或分散在有机溶剂中,或溶解或分散在将要加入的水中。
进行水解反应或缩合反应的温度优选0-100℃,更优选15-80℃。
进行由上式(1)代表的化合物的水解反应和缩合反应的水优选是离子交换水。
水的用量优选为0.25-3摩尔,特别优选0.3-2.5摩尔,基于由上式(1)代表的化合物中R2O-基团的总量为1摩尔。
进行由上式(1)代表的化合物的水解反应和缩合反应的催化剂是一种金属螯合剂化合物、有机酸、无机酸、有机碱或无机碱。
用作催化剂的金属螯合剂化合物的例子包括钛螯合剂化合物,如三乙氧基·单(乙酰基丙酮酸)钛、三正丙氧基·单(乙酰基丙酮酸)钛、三异丙氧基·单(乙酰基丙酮酸)钛、三正丁氧基·单(乙酰基丙酮酸)钛、三仲丁氧基·单(乙酰基丙酮酸)钛、三叔丁氧基·单(乙酰基丙酮酸)钛、二乙氧基·双(乙酰基丙酮酸)钛、二正丙氧基·双(乙酰基丙酮酸)钛、二异丙氧基·双(乙酰基丙酮酸)钛、二正丁氧基·双(乙酰基丙酮酸)钛、二仲丁氧基·双(乙酰基丙酮酸)钛、二叔丁氧基·双(乙酰基丙酮酸)钛、单乙氧基·三(乙酰基丙酮酸)钛、单正丙氧基·三(乙酰基丙酮酸)钛、单异丙氧基·三(乙酰基丙酮酸)钛、单正丁氧基·三(乙酰基丙酮酸)钛、单仲丁氧基·三(乙酰基丙酮酸)钛、单叔丁氧基·三(乙酰基丙酮酸)钛、四(乙酰基丙酮酸)钛、三乙氧基·单(乙基乙酰乙酸)钛、三正丙氧基·单(乙基乙酰乙酸)钛、三异丙氧基·单(乙基乙酰乙酸)钛、三正丁氧基·单(乙基乙酰乙酸)钛、三仲丁氧基·单(乙基乙酰乙酸)钛、三叔丁氧基·单(乙基乙酰乙酸)钛、二乙氧基·双(乙基乙酰乙酸)钛、二正丙氧基·双(乙基乙酰乙酸)钛、二异丙氧基·双(乙基乙酰乙酸)钛、二正丁氧基·双(乙基乙酰乙酸)钛、二仲丁氧基·双(乙基乙酰乙酸)钛、二叔丁氧基·双(乙基乙酰乙酸)钛、单乙氧基·三(乙基乙酰乙酸)钛、单正丙氧基·三(乙基乙酰乙酸)钛、单异丙氧基·三(乙基乙酰乙酸)钛、单正丁氧基·三(乙基乙酰乙酸)钛、单仲丁氧基·三(乙基乙酰乙酸)钛、单叔丁氧基·三(乙基乙酰乙酸)钛、四(乙基乙酰乙酸)钛、单(乙酰基丙酮酸)三(乙基乙酰乙酸)钛、双(乙酰基丙酮酸)双(乙基乙酰乙酸)钛和三(乙酰基丙酮酸)单(乙基乙酰乙酸)钛;锆螯合剂化合物,如三乙氧基·单(乙酰基丙酮酸)锆、三正丙氧基·单(乙酰基丙酮酸)锆、三异丙氧基·单(乙酰基丙酮酸)锆、三正丁氧基·单(乙酰基丙酮酸)锆、三仲丁氧基·单(乙酰基丙酮酸)锆、三叔丁氧基·单(乙酰基丙酮酸)锆、二乙氧基·双(乙酰基丙酮酸)锆、二正丙氧基·双(乙酰基丙酮酸)锆、二异丙氧基·双(乙酰基丙酮酸)锆、二正丁氧基·双(乙酰基丙酮酸)锆、二仲丁氧基·双(乙酰基丙酮酸)锆、二叔丁氧基·双(乙酰基丙酮酸)锆、单乙氧基·三(乙酰基丙酮酸)锆、单正丙氧基·三(乙酰基丙酮酸)锆、单异丙氧基·三(乙酰基丙酮酸)锆、单正丁氧基·三(乙酰基丙酮酸)锆、单仲丁氧基·三(乙酰基丙酮酸)锆、单叔丁氧基·三(乙酰基丙酮酸)锆、四(乙酰基丙酮酸)锆、三乙氧基·单(乙基乙酰乙酸)锆、三正丙氧基·单(乙基乙酰乙酸)锆、三异丙氧基·单(乙基乙酰乙酸)锆、三正丁氧基·单(乙基乙酰乙酸)锆、三仲丁氧基·单(乙基乙酰乙酸)锆、三叔丁氧基·单(乙基乙酰乙酸)锆、二乙氧基·双(乙基乙酰乙酸)锆、二正丙氧基·双(乙基乙酰乙酸)锆、二异丙氧基·双(乙基乙酰乙酸)锆、二正丁氧基·双(乙基乙酰乙酸)锆、二仲丁氧基·双(乙基乙酰乙酸)锆、二叔丁氧基·双(乙基乙酰乙酸)锆、单乙氧基·三(乙基乙酰乙酸)锆、单正丙氧基·三(乙基乙酰乙酸)锆、单异丙氧基·三(乙基乙酰乙酸)锆、单正丁氧基·三(乙基乙酰乙酸)锆、单仲丁氧基·三(乙基乙酰乙酸)锆、单叔丁氧基·三(乙基乙酰乙酸)锆、四(乙基乙酰乙酸)锆、单(乙酰基丙酮酸)三(乙基乙酰乙酸)锆、双(乙酰基丙酮酸)双(乙基乙酰乙酸)锆和三(乙酰基丙酮酸)单(乙基乙酰乙酸)锆;以及铝螯合剂化合物如三(乙酰基丙酮酸)铝和三(乙基乙酰乙酸)铝。
用作催化剂的有机酸的例子包括乙酸、丙酸、丁酸、戊酸、己酸、庚酸、辛酸、壬酸、癸酸、草酸、马来酸、甲基丙二酸、己二酸、癸二酸、五倍子酸、丁二酸、苯六甲酸、花生四烯酸、莽草酸、二乙基己酸、油酸、硬脂酸、亚油酸、亚麻酸、水杨酸、苯甲酸、对氨基苯甲酸、对甲苯磺酸、苯磺酸、一氯乙酸、二氯乙酸、三氯乙酸、三氟乙酸、甲酸、丙二酸、磺酸、苯二甲酸、富马酸、柠檬酸和酒石酸。
用作催化剂的无机酸的例子包括盐酸、硝酸、硫酸、氢氟酸和磷酸。
用作催化剂的有机碱的例子包括吡啶、吡咯、哌嗪、吡咯烷、哌啶、甲基吡啶、三甲基胺、三乙基胺、单乙醇胺、二乙醇胺、二甲基单乙醇胺、单甲基二乙醇胺、三乙醇胺、二氮杂双环辛烷、二氮杂双环壬烷、二氮杂双环十一碳烯、和四甲基氢氧化铵。
用作催化剂的无机碱的例子包括氨、氢氧化钠、氢氧化钾、氢氧化钡、和氢氧化钙。
在这些化合物中,金属螯合剂化合物、有机酸或无机酸优选用作催化剂,更优选使用钛螯合剂化合物或有机酸。
这些化合物可以作为催化剂单独使用或两种或多种组合使用。
催化剂的用量优选为0.001-10重量份,更优选0.01-10重量份,基于100重量份由上式(1)代表的化合物(以SiO2计)。
此外,还优选在由上式(1)代表的化合物的水解反应和缩合反应之后除去残留水和作为反应副产物形成的醇。
下一类型的由下式(2)代表的聚倍半硅氧烷、其水解产物或水解产物的缩合物优选用作不可聚合的化合物(B):
其中R3是单价有机基团,R4是氢原子或单价有机基团,R3和R4可以相同或不同,n是对应于分子量的正整数。
在上式(2)中单价有机基团的例子包括烷基、脂环基、芳基、烯丙基和缩水甘油基。烷基的例子包括甲基、乙基、丙基。烷基基团的碳原子数目优选1-5。烷基基团可以是线形的或支化的。脂环基的例子包括环己基和降冰片基。芳基的例子包括苯基、萘基和甲苯基。此外,烷基、芳基、烯丙基和缩水甘油基中的氢原子可以被卤素原子如氟原子所取代。
生产具有上式(2)结构的化合物的方法公开于,例如JP-A 56-157885、JP-A 57-40526和JP-A 58-69217中。该化合物的市售产品包括GR-100、GR-650、GR-908、和GR-950(Showa Denko KK公司)。
由上式(2)代表的化合物的水解反应和缩合反应可以在与由上式(1)代表的化合物的水解/缩合反应类似的条件下进行(催化剂、水、反应温度)。由上式(2)代表的化合物、其水解产物和水解产物的缩合物的重均分子量(以聚苯乙烯为标准)优选为500-500,000,更优选500-300,000。
组分(B)的用量优选为10-95重量份,更优选10-90重量份,非常优选20-90重量份,特别优选20-70重量份,基于100重量份组分(A)和(B)的总重量。当组分(B)的用量小于10重量份时,得到的折射率变化材料容易变脆,而当用量大于90重量份时,得到的折射率差别趋于变小。
(C)辐射敏感的聚合引发剂
本发明中使用的辐射敏感的聚合引发剂(C)可以是一种辐射敏感的酸发生剂、辐射敏感的碱发生剂或辐射敏感的自由基发生剂。在此情况下,当酸反应化合物被用作可聚合化合物(A)时,优选使用辐射敏感的酸发生剂作为辐射敏感的聚合引发剂(C);当碱反应化合物被用作可聚合化合物(A)时,优选使用辐射敏感的碱发生剂作为辐射敏感的聚合引发剂(C);当自由基反应化合物被用作可聚合化合物(A)时,优选使用辐射敏感的自由基发生剂作为辐射敏感的聚合引发剂(C)。
上述辐射敏感的酸发生剂选自三氯甲基-s-三嗪类、二芳基碘鎓盐类、三芳基锍盐类、季铵盐类和磺酸酯类。
上述三氯甲基-s-三嗪类的例子包括2,4,6-三(三氯甲基)-s-三嗪、2-苯基-4,6-二(三氯甲基)-s-三嗪、2-(4-氯苯基)-4,6-二(三氯甲基)-s-三嗪、2-(3-氯苯基)-4,6-二(三氯甲基)-s-三嗪、2-(2-氯苯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲氧基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(3-甲氧基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(2-甲氧基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲硫基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(3-甲硫基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(2-甲硫基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲氧基萘基)-4,6-二(三氯甲基)-s-三嗪、2-(3-甲氧基萘基)-4,6-二(三氯甲基)-s-三嗪、2-(2-甲氧基萘基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲氧基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-(3-甲氧基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-(2-甲氧基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-(3,4,5-三甲氧基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲硫基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-(3-甲硫基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-(3-甲硫基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-胡椒基-4,6-二(三氯甲基)-s-三嗪、2-[2-(呋喃-2-基)乙烯基]-4,6-二(三氯甲基)-s-三嗪、2-[2-(5-甲基呋喃-2-基)乙烯基]-4,6-二(三氯甲基)-s-三嗪、2-[2-(4-二乙基氨基-2-甲基苯基)乙烯基]-4,6-二(三氯甲基)-s-三嗪等。
上述二芳基碘鎓盐类的例子包括二苯基碘鎓四氟硼酸盐、二苯基碘鎓六氟膦酸盐、二苯基碘鎓六氟砷酸盐、二苯基碘鎓三氟甲磺酸盐、二苯基碘鎓三氟乙酸盐、二苯基碘鎓对甲苯磺酸盐、二苯基碘鎓丁基三(2,6-二氟苯基)硼酸盐、二苯基碘鎓己基三(对氯苯基)硼酸盐、二苯基碘鎓己基三(3-三氟甲基苯基)硼酸盐、4-甲氧基苯基苯基碘鎓四氟硼酸盐、4-甲氧基苯基苯基碘鎓六氟膦酸盐、4-甲氧基苯基苯基碘鎓六氟砷酸盐、4-甲氧基苯基苯基碘鎓三氟甲磺酸盐、4-甲氧基苯基苯基碘鎓三氟乙酸盐、4-甲氧基苯基苯基碘鎓对甲苯磺酸盐、4-甲氧基苯基苯基碘鎓丁基三(2,6-二氟苯基)硼酸盐、4-甲氧基苯基苯基碘鎓己基三(对氯苯基)硼酸盐、4-甲氧基苯基苯基碘鎓己基三(3-三氟甲基苯基)硼酸盐、二(4-叔丁基苯基)碘鎓四氟硼酸盐、二(4-叔丁基苯基)碘鎓六氟砷酸盐、二(4-叔丁基苯基)碘鎓三氟甲磺酸盐、二(4-叔丁基苯基)碘鎓三氟乙酸盐、二(4-叔丁基苯基)碘鎓对甲苯磺酸盐、二(4-叔丁基苯基)碘鎓丁基三(2,6-二氟苯基)硼酸盐、二(4-叔丁基苯基)碘鎓己基三(对氯苯基)硼酸盐、二(4-叔丁基苯基)碘鎓己基三(3-三氟甲基苯基)硼酸盐。
上述三芳基锍盐类的例子包括三苯基锍四氟硼酸盐、三苯基锍六氟膦酸盐、三苯基锍六氟砷酸盐、三苯基锍三氟甲磺酸盐、三苯基锍三氟乙酸盐、三苯基锍对甲苯磺酸盐、三苯基锍丁基三(2,6-二氟苯基)硼酸盐、三苯基锍己基三(对氯苯基)硼酸盐、三苯基锍己基三(3-三氟甲基苯基)硼酸盐、4-甲氧基苯基二苯基锍四氟硼酸盐、4-甲氧基苯基二苯基锍六氟膦酸盐、4-甲氧基苯基二苯基锍六氟砷酸盐、4-甲氧基苯基二苯基锍三氟甲磺酸盐、4-甲氧基苯基二苯基锍三氟乙酸盐、4-甲氧基苯基二苯基锍对甲苯磺酸盐、4-甲氧基苯基二苯基锍丁基三(2,6-二氟苯基)硼酸盐、4-甲氧基苯基二苯基锍己基三(对氯苯基)硼酸盐、4-甲氧基苯基二苯基锍己基三(3-三氟甲基苯基)硼酸盐、4-苯硫基苯基二苯基锍四氟硼酸盐、4-苯硫基苯基二苯基锍六氟膦酸盐、4-苯硫基苯基二苯基锍六氟砷酸盐、4-苯硫基苯基二苯基锍三氟甲磺酸盐、4-苯硫基苯基二苯基锍三氟乙酸盐、4-苯硫基苯基二苯基锍对甲苯磺酸盐、4-苯硫基苯基二苯基锍丁基三(2,6-二氟苯基)硼酸盐、4-苯硫基苯基二苯基锍己基三(对氯苯基)硼酸盐、4-苯硫基苯基二苯基锍己基三(3-三氟甲基苯基)硼酸盐、4-羟基-1-萘基二甲基锍四氟硼酸盐、4-羟基-1-萘基二甲基锍六氟膦酸盐、4-羟基-1-萘基二甲基锍六氟砷酸盐、4-羟基-1-萘基二甲基锍三氟甲磺酸盐、4-羟基-1-萘基二甲基锍三氟乙酸盐、4-羟基-1-萘基二甲基锍对甲苯磺酸盐、4-羟基-1-萘基二甲基锍丁基三(2,6-二氟苯基)硼酸盐、4-羟基-1-萘基二甲基锍己基三(对氯苯基)硼酸盐、4-羟基-1-萘基二甲基锍己基三(3-三氟甲基苯基)硼酸盐。
上述季铵盐类的例子包括四甲基铵四氟硼酸盐、四甲基铵六氟膦酸盐、四甲基铵六氟砷酸盐、四甲基铵三氟甲磺酸盐、四甲基铵三氟乙酸盐、四甲基铵对甲苯磺酸盐、四甲基铵丁基三(2,6-二氟苯基)硼酸盐、四甲基铵己基三(对氯苯基)硼酸盐、四甲基铵己基三(3-三氟甲基苯基)硼酸盐、四丁基铵四氟硼酸盐、四丁基铵六氟膦酸盐、四丁基铵六氟砷酸盐、四丁基铵三氟甲磺酸盐、四丁基铵三氟乙酸盐、四丁基铵对甲苯磺酸盐、四丁基铵丁基三(2,6-二氟苯基)硼酸盐、四丁基铵己基三(对氯苯基)硼酸盐、四丁基铵己基三(3-三氟甲基苯基)硼酸盐、苯甲基三甲基铵四氟硼酸盐、苯甲基三甲基铵六氟膦酸盐、苯甲基三甲基铵六氟砷酸盐、苯甲基三甲基铵三氟甲磺酸盐、苯甲基三甲基铵三氟乙酸盐、苯甲基三甲基铵对甲苯磺酸盐、苯甲基三甲基铵丁基三(2,6-二氟苯基)硼酸盐、苯甲基三甲基铵己基三(对氯苯基)硼酸盐、苯甲基三甲基铵己基三(3-三氟甲基苯基)硼酸盐、苯甲基二甲基苯基铵四氟硼酸盐、苯甲基二甲基苯基铵六氟膦酸盐、苯甲基二甲基苯基铵六氟砷酸盐、苯甲基二甲基苯基铵三氟甲磺酸盐、苯甲基二甲基苯基铵三氟乙酸盐、苯甲基二甲基苯基铵对甲苯磺酸盐、苯甲基二甲基苯基铵丁基三(2,6-二氟苯基)硼酸盐、苯甲基二甲基苯基铵己基三(对氯苯基)硼酸盐、苯甲基二甲基苯基铵己基三(3-三氟甲基苯基)硼酸盐、N-亚肉桂基乙基苯基铵四氟硼酸盐、N-亚肉桂基乙基苯基铵六氟膦酸盐、N-亚肉桂基乙基苯基铵六氟砷酸盐、N-亚肉桂基乙基苯基铵三氟甲磺酸盐、N-亚肉桂基乙基苯基铵三氟乙酸盐、N-亚肉桂基乙基苯基铵对甲苯磺酸盐、N-亚肉桂基乙基苯基铵丁基三(2,6-二氟苯基)硼酸盐、N-亚肉桂基乙基苯基铵己基三(对氯苯基)硼酸盐、N-亚肉桂基乙基苯基铵己基三(3-三氟甲基苯基)硼酸盐。
上述磺酸酯类的例子包括α-羟甲基安息香对甲苯磺酸酯、α-羟甲基安息香-三氟甲磺酸酯、α-羟甲基安息香-甲磺酸酯、连苯三酚-三(对甲苯磺酸)酯、连苯三酚-三(三氟甲磺酸)酯、连苯三酚-三甲磺酸酯、2,4-二硝基苯甲基对甲苯磺酸酯、2,4-二硝基苯甲基-三氟甲磺酸酯、2,4-二硝基苯甲基-甲磺酸酯、2,4-二硝基苯甲基-1,2-萘醌二叠氮基-5-磺酸酯、2,6-二硝基苯甲基对甲苯磺酸酯、2,6-二硝基苯甲基-三氟甲磺酸酯、2,6-二硝基苯甲基-甲磺酸酯、2,6-二硝基苯甲基-1,2-萘醌二叠氮基-5-磺酸酯、2-硝基苯甲基对甲苯磺酸酯、2-硝基苯甲基-三氟甲磺酸酯、2-硝基苯甲基-甲磺酸酯、2-硝基苯甲基-1,2-萘醌二叠氮基-5-磺酸酯、4-硝基苯甲基对甲苯磺酸酯、4-硝基苯甲基-三氟甲磺酸酯、4-硝基苯甲基-甲磺酸酯、4-硝基苯甲基-1,2-萘醌二叠氮基-5-磺酸酯、N-羟基萘二甲酰亚氨基对甲苯磺酸酯、N-羟基萘二甲酰亚氨基-三氟甲磺酸酯、N-羟基萘二甲酰亚氨基-甲磺酸酯、N-羟基-5-降冰片烯-2,3-二羧基亚氨基对甲苯磺酸酯、N-羟基-5-降冰片烯-2,3-二羧基亚氨基-三氟甲磺酸酯、N-羟基-5-降冰片烯-2,3-二羧基亚氨基-甲磺酸酯、2,4,6,3’,4’,5’-六羟基二苯酮-1,2-萘醌二叠氮基-4-磺酸酯、1,1,1-三(对羟基苯基)乙烷-1,2-萘醌二叠氮基-4-磺酸酯。
这些化合物中,作为三氯甲基-s-三嗪类,优选的物质例如2-(3-氯苯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲氧基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲硫基苯基)-4,6-二(三氯甲基)-s-三嗪、2-(4-甲氧基-β-苯乙烯基)-4,6-二(三氯甲基)-s-三嗪、2-胡椒基-4,6-二(三氯甲基)-s-三嗪、2-〔2-(呋喃-2-基)乙烯基〕-4,6-二(三氯甲基)-s-三嗪、2-〔2-(5-甲基呋喃-2-基)乙烯基〕-4,6-二(三氯甲基)-s-三嗪、2-〔2-(4-二乙基氨基-2-甲基苯基)乙烯基〕-4,6-二(三氯甲基)-s-三嗪或2-(4-甲氧基萘基)-4,6-二(三氯甲基)-s-三嗪;
作为二芳基碘鎓盐类,优选的物质例如二苯基碘鎓三氟乙酸盐、二苯基碘鎓三氟甲磺酸盐、4-甲氧基苯基苯基碘鎓三氟甲磺酸盐或4-甲氧基苯基苯基碘鎓三氟乙酸盐;
作为三芳基锍盐类,优选的物质例如三苯基锍三氟甲磺酸盐、三苯基锍三氟乙酸盐、4-甲氧基苯基二苯基锍三氟甲磺酸盐、4-甲氧基苯基二苯基锍三氟乙酸盐、4-苯硫基苯基二苯基锍三氟甲磺酸盐或4-苯硫基苯基二苯基锍三氟乙酸盐;
作为季铵盐类,优选的物质例如四甲基铵丁基三(2,6-二氟苯基)硼酸盐、四甲基铵己基三(对氯苯基)硼酸盐、四甲基铵己基三(3-三氟甲基苯基)硼酸盐、苯甲基二甲基苯基铵丁基三(2,6-二氟苯基)硼酸盐、苯甲基二甲基苯基铵己基三(对氯苯基)硼酸盐、苯甲基二甲基苯基铵己基三(3-三氟甲基苯基硼酸盐);
作为磺酸酯类,优选的物质例如2,6-二硝基苯甲基对甲苯磺酸酯;2,6-二硝基苯甲基-三氟甲磺酸酯、N-羟基萘二甲酰亚氨基对甲苯磺酸酯、N-羟基萘二甲酰亚氨基-三氟甲磺酸酯。
作为上述辐射敏感的碱发生剂,适合使用JP-A 4-330444、“高分子”p242-248,46卷6期(1997年)、美国专利5,627,010中公开的物质。但是,辐射敏感的碱发生剂并不限于这些,只要通过照射放射线能产生碱的即可。
在本发明中优选的辐射敏感的碱发生剂选自例如三苯基甲醇、氨基甲酸苯甲酯和苯偶姻氨基甲酸酯等的光活性的氨基甲酸酯;O-氨基甲酰基羟基酰胺、O-氨基甲酰基肟、芳香族磺酰胺、α-内酰胺和N-(2-烯丙基乙炔基)酰胺等的酰胺以及其它酰胺;肟酯、α-氨基苯乙酮、钴络合物等。
辐射敏感的碱发生剂的说明性例子包括下式(3)~(13)代表的化合物。
其中,R5为碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数1~6的烷硫基、每个烷基的碳原子数为1~6的二烷基氨基、哌啶基、硝基、羟基、巯基、碳原子数2~6的烯基或炔基、碳原子数6~2 0的芳基、氟原子、氯原子或溴原子,k为0~3的整数,R6为氢原于、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R7和R8各自独立地为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基或苯甲基,或者,R7和R8也可以和氮原子结合在一起形成碳原子数5~6的环状结构。
其中,R9为碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数1~6的烷硫基、每个烷基的碳原子数为1~6的二烷基氨基、哌啶基、硝基、羟基、巯基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R10为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R11和R12各自独立地为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数620的芳基或苯甲基,或者,R11和R12也可以和氮原子结合在一起形成碳原子数5~6的环状结构。
其中,R13为碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R14和R15各自独立地为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基或苯甲基,或者,R14和R15也可以和氮原子结合在一起形成碳原子数5~6的环状结构。
其中,R16和R17各自独立地为碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基。
其中,R18、R19和R20各自独立地为碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基。
其中,R21为碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数1~6的烷硫基、每个烷基的碳原子数为1~6的二烷基氨基、哌啶基、硝基、羟基、巯基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R22为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R23、R24和R25各自独立地为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基或苯甲基。
其中,R26为碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数1~6的烷硫基、每个烷基的碳原子数为1~6的二烷基氨基、哌啶基、硝基、羟基、巯基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R27和R28各自独立地为氢原子、羟基、巯基、氰基、苯氧基、碳原子数1~6的烷基、氟原子、氯原子、溴原子、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R29和R30各自独立地为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基或苯甲基,或者,R29和R30也可以和氮原子结合在一起形成碳原子数5~6的环状结构。
其中,R31和R32各自独立地为碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数1~6的烷硫基、每个烷基的碳原子数为1~6的二烷基氨基、哌啶基、硝基、羟基、巯基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R33~R36各自独立地为氢原子、羟基、巯基、氰基、苯氧基、碳原子数1~6的烷基、氟原子、氯原子、溴原子、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,A1为除去在单烷基胺、哌嗪、芳香族二胺和脂肪族二胺的1个或2个氮原子上结合的2个氢原子而产生的二价原子团。
其中,R37和R38各自独立地为碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数1~6的烷硫基、每个烷基的碳原子数为1~6的二烷基氨基、哌啶基、硝基、羟基、巯基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R39和R40各自独立地为氢原子、羟基、巯基、氰基、苯氧基、碳原子数1~6的烷基、氟原子、氯原子、溴原子、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R41~R44各自独立地为氢原子、碳原子数1~6的烷基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基或苯甲基,或者,R41和R42或者R43和R44也可以和氮原子结合在一起形成碳原子数5~6的环状结构,A2为碳原子1~6的亚烷基、亚环己基、亚苯基或单键。
其中,R45~R47各自独立地为氢原子、氟原子、氯原子、溴原子、碳原子数1~6的烷基、碳原子数1~6的烷氧基、碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基。
LmCO3+·3[(R48)3R49]- (13)
其中,L为选自氨、吡啶、咪唑、乙二胺、亚丙基二胺、亚丁基二胺、亚己基二胺、丙二胺、1,2-环己二胺、N,N-二乙基乙二胺、二亚乙基三胺的至少一种配位体,m为2~6的整数,R48为碳原子数2~6的烯基或炔基或者碳原子数6~20的芳基,R49为碳原子数1~18的烷基。
在所有上述式(3)~(13)中,烷基可以为直链状、支链状或环状。烯基的例子包括乙烯基和丙烯基等,炔基的例子包括乙炔基等。芳基的例子包括苯基、萘基和蒽基等。另外,这些基团中含有的氢原子被氟原子、氯原子、溴原子、卤代烷基、羟基、羧基、巯基、氰基、硝基、叠氮基、二烷基氨基、烷氧基或烷硫基取代的物质也包括在内。
这些辐射敏感的碱发生剂中,优选的是例如2-硝基苯甲基环己基氨基甲酸酯、三苯基甲醇、邻氨基甲酰基羟基酰胺、邻氨基甲酰基肟、[[(2,6-二硝基苯甲基)氧]羰基]环己胺、二[[(2-硝基苯甲基)氧]羰基]己烷1,6-二胺、4-(甲硫基苯甲酰基)-1-甲基-1-吗啉基乙烷、(4-吗啉基苯甲酰基)-1-苯甲基-1-二甲基氨基丙烷、N-(2-硝基苯甲氧基羰基)吡咯烷、六氨合高钴(III)三(三苯基甲基硼酸盐)、2-苯甲基-2-二甲基氨基-1-(4-吗啉基苯基)-丁酮。
上述辐射敏感的自由基发生剂的例子包括α-二酮类,例如苄基和二乙酰基;偶姻类例如苯偶姻;偶姻醚类例如苯偶姻甲基醚、苯偶姻乙基醚和苯偶姻异丙基醚;二苯甲酮类例如噻吨酮、2,4-二乙基噻吨酮、噻吨酮-4-磺酸、二苯甲酮、4,4’-双(二甲基氨基)二苯甲酮和4,4’-双(二乙基氨基)二苯甲酮;乙酰苯如苯乙酮、对二甲基氨基苯乙酮、α,α’-二甲氧基乙酰氧基二苯甲酮、2,2’-二甲氧基-2-苯基苯乙酮、对甲氧基苯乙酮、2-甲基[4-(甲基硫)苯基]-2-吗啉基-1-丙烷和2-苄基-2-二甲基氨基-1-(4-吗啉基苯基)-丁-1-酮;醌如蒽醌和1,4-萘醌;卤代化合物如苯酰甲基氯、三溴甲基苯基砜和三(三氯甲基)-s-三嗪;酰基氧化膦如2,4,6-三甲基苯甲酰基二苯基氧化膦、双(2,6-二甲氧基苯甲酰基)-2,4,4-三甲基-戊基氧化膦和双(2,4,6-三甲基苯甲酰基)苯基氧化膦;以及过氧化物如过氧化二叔丁基。
这些辐射敏感的自由基聚合引发剂的市售产品包括IRGACURE-184、369、500、651、907、1700、819、1000、2959、149、1800和1850,Darocur-1173、1116、2959、1664、4043(Ciba精细化学品公司),KUYACURE-DETX、MBP、DMBI、EPA和OA(Nippon Kayaku公司),VICURE-10和55(STAUFFER公司),TRIGONALPI(AKZO公司),SANDORAY1000(SANDOZ公司),DEAP(APJOHN公司),和QUANTACURE-PDO、ITX和EPD(WAED BLEKINSOP公司)。
通过使用上述辐射敏感自由基聚合引发剂之一和一种辐射敏感的敏化剂可以得到一种具有高敏感度的辐射敏感树脂组合物。
当辐射敏感的聚合引发剂(C)是一种辐射敏感的酸发生剂或碱发生剂时,上述辐射敏感的聚合引发剂(C)的用量优选为0.01重量份或更多,更优选0.05重量份或更多,基于可聚合化合物(A)和不可聚合化合物(B)的总重量为100重量份。当组分(C)的用量小于0.01重量份时,对辐射的敏感度会下降。上限值优选为30重量份,更优选20重量份。
辐射敏感的自由基发生剂的含量优选为1-50重量份,更优选5-30重量份,基于可聚合化合物(A)和不可聚合化合物(B)的总重量为100重量份。当辐射敏感的自由基发生剂(C)的用量小于1重量份时,对辐射的敏感度会下降。
(其它成分)
只要不损害本发明的目的,也可以在本发明的折射率变化组合物中含有其它添加剂。这些添加剂包括紫外线吸收剂、敏化剂、表面活性剂、耐热性改良剂、粘结助剂等。
上述紫外线吸收剂选自苯并三唑类、水杨酸酯类、二苯酮类、取代丙烯腈类、氧杂蒽类、香豆素类、黄酮类和查耳酮类。紫外线吸收剂的具体例子包括Tinubin234(2-(2-羟基-3,5-二(α,α-二甲基苯甲基)苯基)-2H-苯并三唑)、Tinubin571(羟基苯基苯并三唑衍生物)、Tinubin1130(甲基-3-(3-叔丁基-5-(2H-苯并三唑-2-基)-4-羟基苯基)丙酸酯和聚乙二醇(分子量300)的缩聚物)(Ciba精细化学品公司);1,7-二(4-羟基-3-甲氧基苯基)-1,6-庚二烯-3,5-二酮和二亚苄基丙酮等。
通过添加紫外线吸收剂,随着距离本发明折射率变化组合物的暴露部分表面的深度增加,可以逐渐减少由组分(C)形成的酸、碱或自由基的量,这可用作形成GRIN的一种方法。紫外线吸收剂的用量优选30重量份或更少,更优选20重量份或更少,基于100重量份组分(A)和组分(B)。
上述敏化剂选自3-位和/或7-位具有取代基的香豆素类、黄酮类、二亚苄基丙酮类、二亚苄基环己烷类、查耳酮类、氧杂蒽类、噻吨类、卟啉类、酞菁类、吖啶类、蒽类等。
敏化剂的用量优选30重量份或更少,更优选20重量份或更少,基于100重量份组分(A)和组分(B)。
为了改善涂布性能,例如防止条纹,和改善显像性,可以添加下述表面活性剂。
表面活性剂的例子包括非离子表面活性剂如聚氧乙烯月桂基醚、聚氧乙烯十八烷基醚、聚氧乙烯油基醚等聚氧乙烯烷基醚类、聚氧乙烯辛基苯基醚、聚氧乙烯壬基苯基醚等聚氧乙烯芳基醚类、聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯等聚乙二醇二烷基酯类;以F TopEF301、EF303、EF352(Shin Akita Kasei公司)、Megafac F171、F172、F173(Dainippon油墨和化学品公司)、Florade FC430、FC431(Sumitomo 3M公司)、Asahi Guard AG710、Surflon S-382、SC-101、SC-102、SC-103、SC-104、SC-105、SC-106(Asahi Glass公司)等商品名市售的氟类表面活性剂;以有机硅氧烷聚合物KP341(Shin-Etsu化学品公司)、丙烯酸类或甲基丙烯酸类(共)聚合物Polyflow No.57和95(Kyoeisha Kagaku公司)等商品名市售的其它表面活性剂。
表面活性剂的用量优选2重量份或更少,更优选1重量份或更少,基于100重量份组分(A)和组分(B)。
为了改良与基材的粘合性,可以添加上述粘结助剂,优选使用硅烷偶联剂等。
上述耐热性改良剂是一种不饱和化合物,如多价丙烯酸酯等。
在本发明使用的折射率变化组合物中,如果需要还可以进一步添加抗静电剂、保存稳定剂、光晕抑制剂、消泡剂、颜料和热酸发生剂。
<折射率图案的形成>
在本发明中,由上述折射率变化组合物,例如如下所示可以形成折射率图案。
首先,将折射率变化组合物溶解或分散在溶剂中,制备固体含量为5~70重量%的组合物溶液。在使用前,如果需要,可以用孔径约0.1~10μm的过滤器过滤该组合物溶液。
然后,将该组合物溶液涂覆在硅片等基材的表面上,进行预烘焙除去溶剂,从而形成折射率变化组合物的涂膜。接着,通过图案掩模对形成的部分涂膜进行辐射处理并加热,从而在折射率变化组合物的曝光和未曝光部分之间产生折射率差。
通过上述辐射处理,由辐射敏感的聚合引发剂(C)生成酸、碱或自由基,开始进行组分(A)的聚合或反应。未曝光部分的该组分(A)在暴露后加热的同时分散,结果,在曝光和未曝光部分之间产生折射率差。
用于配制含有本发明使用的折射率变化组合物的溶液的溶剂可以均匀地溶解上述组分(A)、(B)、(C)和其它任选加入的添加剂,并且不与这些组分反应。
溶剂的说明性例子包括甲醇、乙醇、丙醇、异丙醇、丁醇、乙二醇、丙二醇等醇类;四氢呋喃等醚类;乙二醇单甲基醚、乙二醇单乙基醚等二醇醚类;甲基溶纤剂乙酸酯、乙基溶纤剂乙酸酯等乙二醇烷基醚乙酸酯类;二甘醇单甲基醚、二甘醇单乙基醚、二甘醇二甲基醚、二甘醇甲基乙基醚等二甘醇类;丙二醇甲基醚、丙二醇乙基醚、丙二醇丙基醚、丙二醇丁基醚等丙二醇单烷基醚类;丙二醇甲基醚乙酸酯、丙二醇乙基醚乙酸酯、丙二醇丙基醚乙酸酯、丙二醇丁基醚乙酸酯等丙二醇烷基醚乙酸酯类;丙二醇甲基醚丙酸酯、丙二醇乙基醚丙酸酯、丙二醇丙基醚丙酸酯、丙二醇丁基醚丙酸酯等丙二醇烷基醚丙酸酯类;甲苯、二甲苯等芳香族烃类;甲基乙基酮、环己酮、4-羟基-4-甲基-2-戊酮等酮类;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、2-羟基丙酸乙酯、2-羟基-2-甲基丙酸甲酯、2-羟基-2-甲基丙酸乙酯、羟基乙酸甲酯、羟基乙酸乙酯、羟基乙酸丁酯、乳酸甲酯、乳酸乙酯、乳酸丙酯、乳酸丁酯、3-羟基丙酸甲酯、3-羟基丙酸乙酯、3-羟基丙酸丙酯、3-羟基丙酸丁酯、2-羟基-3-甲基丁酸甲酯、甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯、乙氧基乙酸丙酯、乙氧基乙酸丁酯、丙氧基乙酸甲酯、丙氧基乙酸乙酯、丙氧基乙酸丙酯、丙氧基乙酸丁酯、丁氧基乙酸甲酯、丁氧基乙酸乙酯、丁氧基乙酸丙酯、丁氧基乙酸丁酯、2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-甲氧基丙酸丁酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯、2-乙氧基丙酸丙酯、2-乙氧基丙酸丁酯、2-丁氧基丙酸甲酯、2-丁氧基丙酸乙酯、2-丁氧基丙酸丙酯、2-丁氧基丙酸丁酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-乙氧基丙酸丙酯、3-乙氧基丙酸丁酯、3-丙氧基丙酸甲酯、3-丙氧基丙酸乙酯、3-丙氧基丙酸丙酯、3-丙氧基丙酸丁酯、3-丁氧基丙酸甲酯、3-丁氧基丙酸乙酯、3-丁氧基丙酸丙酯、3-丁氧基丙酸丁酯等酯类;三氟甲基苯、1,3-二(三氟甲基)苯、六氟苯、六氟环己烷、全氟二甲基环己烷、全氟甲基环己烷、八氟萘烷、1,1,2-三氯-1,2,2-三氟乙烷等含氟原子溶剂。
这些溶剂中,从溶解性、与各组分的反应性以及形成涂膜的难易度的角度考虑,优选醇类、二醇醚类、乙二醇烷基醚乙酸酯类、丙二醇烷基醚乙酸酯类、酮类、酯类和二甘醇类。
而且上述溶剂也可以与高沸点溶剂组合使用。高沸点溶剂的例子包括N-甲基甲酰胺、N,N-二甲基甲酰胺、N-甲基甲酰苯胺、N-甲基乙酰胺、N,N-二甲基乙酰胺、N-甲基吡咯烷酮、二甲基亚砜、苯甲基乙基醚、二己基醚、丙酮基丙酮、异佛尔酮、己酸、辛酸、1-辛醇、1-壬醇、苯甲醇、乙酸苯甲酯、安息香酸乙酯、草酸二乙酯、马来酸二乙酯、γ-丁内酯、碳酸乙二酯、碳酸丙二酯、苯基溶纤剂乙酸酯等。
在进行辐射前,本发明中使用的折射率变化组合物可以根据相应的用途成型为各种形状。例如成型为棒状、纤维状、长板状、球状、薄膜状、透镜状等,对其并没有限定。可以使用通常使用的模塑技术,例如注射成型、压缩成型、吹塑成型、挤出、箱形框架内聚合法、刮面法、拉伸法、加热/冷却法、CVD蒸镀法、烧成法和扫描法等。另外,根据光学模塑产品的用途,也可以使用旋涂法、狭缝法、棒涂法、溶剂浇铸法、LB法、喷雾法、滚涂法、凸版印刷法、丝网印刷法等。
在该成型处理中优选进行加热处理(以下称为“预烘焙”)。其加热条件根据本发明材料的组成、各种添加剂的种类等变化,优选30~200℃,更优选40~150℃,可以使用电炉、烘箱或红外线等进行加热。
用来照射处理的辐射是波长365nm的I射线、波长404nm的h射线、波长436nm的g射线、来自宽范围波长光源如氙灯等的紫外线辐射、远紫外线辐射如波长248nm的KrF准分子激光束或波长193nm的ArF准分子激光束等、X射线如同步加速器辐射、电荷粒子射线如电子束等、可见光以及它们的混合射线。其中,优选紫外线和可见光辐射。照射度取决于辐射的波长,优选0.1mW/cm2~100mW/cm2,因为此范围可以获得最高的反应效率。经由图案掩模照射这些射线,可以使辐射敏感的折射率变化材料形成图案。图案精度受使用的光源影响,可以制造折射率变化分布的分辨率约0.2μm的光学部件。
本发明中,曝光后优选进行加热处理(曝光后烘焙(PEB))。PEB加热处理可以使用与上述预烘焙类似的装置,PEB条件可以任意设定。优选的加热温度为30~150℃,更优选30~130℃。如果在常压下加热时未曝光部分的组分(A)没有完全分散,则可以在减压下进行加热,由此可以有效地形成折射率图案。
可以进一步进行重复曝光以将未曝光部分中存在的残留组分(C)分解,并且进一步改善材料的稳定性。
重复曝光可以由以下方式进行,例如,将波长与用来改变折射率的辐射相同的辐射以相同的量施加到图案的整个表面上。
任选地,材料的稳定性可以通过加热得到进一步提高。加热可以使用与成型材料时所采用的预烘焙装置类似的装置,并且加热条件可以任意设定。
根据本发明,本发明的折射率图案形成方法还可以按照如下方式进行:经由图案掩模将包含上述组分(A)、(B)、(C)的折射率变化组合物暴露于辐射中,并用一种显影剂处理。
至于上述显影剂的类型,能够溶解组分(A)和任选加入的催化剂但不溶解由组分(A)和组分(B)形成的聚合物的显影剂是优选的,在选择这种显影剂时,得到的折射率图案表面没有被粗糙化。
显影剂是一种包含下列成分的碱性水溶液:无机碱如氢氧化钠、氢氧化钾、碳酸钠、硅酸钠、偏硅酸钠或氨水;伯胺如乙胺或正丙胺;仲胺如二乙基胺或二正丁基胺;叔胺如三乙基胺、甲基二乙基胺或N-甲基吡咯烷酮;醇胺如二甲基乙醇胺或三乙醇胺;季铵盐如四甲基氢氧化胺、四乙基氢氧化铵或氯化铵;或环胺如吡咯、哌啶、1,8-二氮杂双环[5.4.0]-7-十一碳烯或1,5-二氮杂双环[4.3.0]-5-壬烷。还可以用作显影剂的是有机溶剂,选自;甲醇、乙醇、异丙醇、正丙醇、正丁醇、异丁醇、叔丁醇、环己醇、乙二醇、丙二醇、二甘醇等醇类;二乙基醚、四氢呋喃等醚类;乙二醇单甲基醚、乙二醇单乙基醚等二醇醚类;甲基溶纤剂乙酸酯、乙基溶纤剂乙酸酯等乙二醇烷基醚乙酸酯类;二甘醇单甲基醚、二甘醇单乙基醚、二甘醇二甲基醚等二甘醇类;丙二醇甲基醚、丙二醇乙基醚等丙二醇单烷基醚类;丙二醇甲基醚乙酸酯、丙二醇乙基醚乙酸酯等丙二醇烷基醚乙酸酯类;丙二醇甲基醚丙酸酯、丙二醇乙基醚丙酸酯、丙二醇丙基醚丙酸酯、丙二醇丁基醚丙酸酯等丙二醇烷基醚乙酸酯类;甲苯、二甲苯等芳香族烃类;正己烷、正庚烷、正辛烷等脂肪族烃类;甲基乙基酮、环己酮、甲基异丁基酮、甲基戊基酮、4-羟基-4-甲基-2-戊酮等酮类;或乙酸乙酯、乙酸丙酯、乙酸丁酯、2-羟基丙酸乙酯、2-羟基-2-甲基丙酸甲酯、羟基乙酸乙酯、羟基乙酸丁酯、乳酸乙酯、乳酸丙酯、乳酸丁酯、3-羟基丙酸甲酯、2-羟基-3-甲基丁酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丁酯、2-乙氧基丙酸丁酯、2-丁氧基丙酸丁酯、3-甲氧基丙酸丁酯、3-乙氧基丙酸丁酯、3-丙氧基丙酸丁酯、3-丁氧基丙酸丁酯等酯类。
这些溶剂中,优选使用水、醇类、二醇醚类和乙二醇烷基醚乙酸酯类。
显影时间通常为30-180秒,还可以使用胶泥显影或浸渍显影。显影后,涂膜用流动水漂洗30-90秒,然后用压缩空气或压缩氮气干燥,以除去基材上的水,由此形成折射率图案。
此外,可以进行重复曝光以分解存在于未曝光部分的残留组分(C),并进一步改善材料的稳定性。
至于折射率图案形成方法(包括上述稳定化作用)中没有描述的内容,应该理解以上描述的折射率图案形成方法对于本领域内的普通技术人员而言可以直接使用,或者稍加变动也是很明显的。
存在于未曝光部分的残留可聚合化合物(A)通过上述加热处理除去,以优选地形成孔。
在由以上不同方法中任意一种形成的本发明折射率图案中,曝光部分(第一区域)的折射率优选大于未曝光部分(第二区域)的折射率。这种差别可以通过控制本发明中使用的折射率变化组合物中组分(A)和(B)的类型和含量而调节到希望的值。例如,折射率差别的最大值可以设定在一个大于0.02的值。
本发明的折射率图案在未曝光部分具有孔或没有任何孔。
当未曝光部分具有孔时,其孔隙率优选10-99.9%,更优选15-99.9%,特别优选20-99.9%。
另外,由于本发明的折射率图案即使在如上所述为了使折射率变化而使用的波长附近的光通过的条件下使用,也不会引起折射率的变化,不会发生劣化,因此作为光电子或显示领域中使用的光学材料非常有用。
由于本发明的折射率图案具有足够大的折射率差别,并且所产生的折射率差别对光和热稳定,因此作为光电子或显示领域中使用的光学材料也非常有用。本发明的折射率图案还可以用于光学部件如光敏元件阵列、透镜、光耦合器、光学断路器、偏振光分束器、全息照相、单模态和多模态光学纤维、光纤束、光导纤维、单芯/多芯/光电耦合光连接器、光隔离器、偏光镜、光传感器如光二极管/光晶体管/光集成电路/CCD图象传感器/CMOS图象传感器/光纤维传感器和光纤维陀螺仪、CD/LD/PD/DVD等各种光盘、光开关、波导管、光学触摸屏、衍射光栅、导光板、光扩散板、防反射板、光学密封材料。
<生产光学部件的方法>
在接受辐射处理前,该辐射敏感的折射率变化组合物可以根据用途的不同成型为各种形状。
例如,成型为棒状、纤维状、长板状、球状、薄膜状或透镜状等,并且本发明并不限于这些。可以使用通常使用的模塑技术,例如注射成型、压缩成型、吹塑成型、挤出、箱形框架内聚合法、刮面法、拉伸法、加热/冷却法、CVD蒸镀法、烧成法和扫描法等。根据光学模塑产品的用途,也可以使用旋涂法、狭缝法、棒涂法、溶剂浇铸法、LB法、喷雾法、辊涂法、凸版印刷法或丝网印刷法等。
用来照射处理的辐射是波长365nm的I射线、波长404nm的h射线、波长436nm的g射线、来自宽范围波长光源如氙灯等的紫外线辐射、远紫外线辐射如波长248nm的KrF准分子激光束或波长193nm的ArF准分子激光束等、X射线如同步加速器辐射、电荷粒子射线如电子束等、可见光以及它们的混合射线。其中,优选紫外线和可见光辐射。照射度取决于辐射的波长,优选0.1mW/cm2~100mW/cm2,因为此范围可以获得最高的反应效率。经由图案掩模照射这些射线,可以使辐射敏感的折射率变化组合物形成图案。图案精度受使用的光源影响,可以制造折射率变化分布的分辨率约0.2μm的光学部件。
在本发明中,优选进行曝光后烘焙(PEB)。其加热条件根据本发明材料的组成、各种添加剂的种类等变化,优选30~200℃,更优选40~150℃,可以使用电炉、烘箱或红外线等进行加热。未曝光部分的组分(A)可以通过减压下加热除去或采用如上所述的显影剂。
在本发明光学部件的折射率分布中,最大折射率和最小折射率之间的差别可以根据如上所述的用途设定在一个希望的值。例如,它可以设定在0.02或更大,任选地0.03或更大,0.05或更大,0.08或更大。
实施例
下面通过下述实施例进一步说明本发明,但本发明并不限定于这些实施例。
聚合物的重均分子量(以聚苯乙烯为标准物)使用Showa DenkaK.K的GPC色谱仪SYSTEM-21进行测定。
组分(B)的合成实施例
合成实施例1
在1L的三颈烧瓶中,15.22g四甲氧基硅烷和27.24g甲基三甲氧基硅烷溶解在100g乙二醇乙基甲基醚中,用磁力搅拌器搅拌得到混合溶液,同时加热至60℃。1小时内向混合溶液中连续添加5.20g离子交换水。在60℃下反应4小时后,将得到的反应溶液冷却至室温。然后,将作为反应副产物的9.20g甲醇从反应溶液中减压蒸馏除去。所得聚合物(B-1)的溶液的固体含量是33.2%,并且聚合物的重均分子量为2,200。
合成实施例2
在装配有电磁搅拌器的1.5L不锈钢高压釜内完全充满氮气之后,500g乙酸乙酯、57.2g乙基乙烯基醚(EVE)、10.2g羟丁基乙烯基醚(HBVE)和3g过氧化月桂酰基加入到高压釜中并用干冰和甲醇冷却至-50℃,用氮气再次除去该体系内的氧气。随后加入146g六氟丙烯(HFP)并且温度开始上升。当高压釜的内部温度达到60℃时压力为5.3kg/cm2。此后,反应在60℃搅拌下继续进行20小时,当压力下降到1.5kg/cm2时用水冷却高压釜以终止反应。在温度达到室温后,排出未反应的单体并将高压釜打开,得到固体含量为28.1%的聚合物溶液。得到的聚合物溶液注入甲醇以使聚合物沉淀,随后用甲醇洗涤,并在50℃真空干燥,得到193g含氟的共聚物。得到的聚合物(B-2)的重均分子量为17,000。
合成实施例3
8g2,2’-偶氮二(2,4-二甲基戊腈)和200g二甘醇二甲基醚加入到500ml的三颈烧瓶中。随后向烧瓶中加入20g甲基丙烯酸、30g甲基丙烯酸甘油酯、和50g五氟乙基甲基丙烯酸酯,烧瓶内部充以氮气,开始温和搅拌。溶液的温度提高到70℃,并在此温度下保持3小时以得到聚合物(B-3)的溶液。所得聚合物溶液的固体含量为31.0%,聚合物的重均分子量为12,000。
合成实施例4
50g甲基三甲氧基硅烷加入到1L的三颈烧瓶中,加入100g1-乙氧基-2-丙醇并溶解在甲基三甲氧基硅烷中,得到的混合溶液在用磁力搅拌器搅拌下加热到60℃。1小时内向混合溶液中连续添加19.85g离子交换水。在60℃下反应4小时后,得到的反应溶液冷却至室温。
此后,将作为反应副产物的甲醇从反应溶液中减压蒸馏除去,然后反应溶液浓缩到固体含量为20重量%以得到含有化合物(B-4)的溶液,化合物(B-4)的重均分子量为8,000。
实施例1
40重量份二乙烯基苯作为组分(A),60重量份甲基三甲氧基硅烷和四甲氧基硅烷(重量比为55∶5)的混合物的缩合物(分子量2,000)作为组分(B)和3重量份2-(4-甲氧基苯基)-4,6-二(三氯甲基)-s-三嗪作为组分(C)溶解在二甘醇乙基甲基醚中,直至总固体含量为20重量%。用孔径为0.2微米的薄膜过滤器过滤所得溶液,以制备含有辐射敏感的折射率变化组合物的溶液。
形成涂膜
用旋涂器将上述溶液涂布在硅基材上,并用加热板在90℃预烘焙2分钟,以形成1.0微米厚度的涂膜。
形成折射率图案
对上述得到的涂膜,用NSR1505i6A缩小投影射线照射机(Nikon公司,NA=0.45,λ=365nm)在最佳聚焦深度以辐射量70mJ/cm2处理以在折射率变化组合物的曝光和未曝光部分之间产生折射率的差别。随后涂膜在100℃用加热板在0.5乇的减压下进行2分钟的曝光后烘培处理,并在200℃的烘箱中常压下处理10分钟。
折射率的测定
使用Auto EL IV NIR III椭圆光度计(Rudolf Research公司),在633nm室温下测定硅基材上的曝光和未曝光部分的折射率。结果示于表1中。
透明性的评价
除使用玻璃基材Corning1737(Corning公司)代替硅基材以外,以上述相同的方式得到涂有辐射敏感的折射率变化组合物的玻璃基材。
接着,用150-20双光束分光光度计(日立公司)在400~800nm的波长测定所得玻璃基材的透过率。可以假设最低透过率超过95%时,透过率为良好,而当最低透过率为95%或更低时,透过率为不良。结果示于表1中。
实施例2
重复实施例1的步骤以评价折射率和透明性,除了辐射处理的量变为250mJ/cm2,结果示于表1中。
实施例3
以与实施例1相同的方式进行评价,除了60重量份的GR-650梯形聚倍半硅氧烷(Showa Denko K.K公司)被用作组分(B)。结果示于表1中。
实施例4
以与实施例1相同的方式进行评价,除了65重量份的二乙烯基苯被用作组分(A)和35重量份的甲基三甲氧基硅烷缩合物(分子量2,000)被用作组分(B)。结果示于表1中。
实施例5
50重量份的甲基丙烯酸苯甲酯和40重量份的双(4-丙烯酰基硫代苯基)硫化物作为组分(A),含有聚合物(B-3)的溶液(相当于50重量份的聚合物(B-3)(固体含量))作为组分(B),以及25重量份的2-苄基-2-二甲基氨基-1-(4-吗啉基苯基)-丁-1-酮(IRGACURE-369,Ciba精细化学品公司)作为组分(C)溶解于二甘醇乙基甲基醚中,直至总固体含量为20重量%。用孔径为0.2微米的薄膜过滤器过滤所得溶液,以制备含有辐射敏感的折射率变化组合物的溶液。以与实施例1相同的方式进行涂膜的形成、折射率的测定和透明性的评价。如下进行折射率图案的形成,结果示于表1中。
形成折射率图案
对上述得到的涂膜,用NSR1505i6A缩小投影射线照射机(Nikon公司,NA=0.45,λ=365nm)在最佳聚焦深度以辐射量100mJ/cm2处理以在折射率变化组合物的曝光和未曝光部分之间产生折射率的差别。随后涂膜在100℃用加热板在0.5乇的减压下进行2分钟的曝光后烘培处理,在25℃用异丙醇处理60秒,然后用流动的纯水清洗1分钟。最后在200℃的烘箱中加热10分钟。
实施例6
以与实施例5相同的方式进行评价,除了含有聚合物(B-1)的溶液(相当于50重量份的聚合物(B-1)(固体含量))被用作组分(B),结果示于表1中。
实施例7
以与实施例5相同的方式进行评价,除了40重量份的甲基丙烯酸苯甲酯、20重量份的乙烯基萘和40重量份的双(4-丙烯酰基硫代苯基)硫化物被用作组分(A),并且含有聚合物(B-3)的溶液(相当于40重量份的聚合物(B-3)(固体含量))被用作组分(B)。结果示于表1中。
实施例8
以与实施例5相同的方式进行评价,除了30重量份的2-甲基-1-[4-(硫代甲基)苯基]-2-吗啉基丙-1-酮(IRGACURE-907,Ciba精细化学品公司)和3重量份的2,4-二乙基噻吨酮被用作组分(C),并且用于形成折射率图案的辐射量如表1所示变化。结果示于表1中。
实施例9
60重量份的二(4-乙烯基氧基)丁基对苯二甲酸酯和30重量份的四(β-环氧丙基硫代甲基)甲烷作为组分(A),含有聚合物(B-4)的溶液(相当于40重量份的聚合物(B-4)(固体含量))作为组分(B),以及3重量份的4-苯基硫代苯基联苯锍三氟甲烷磺酸盐作为组分(C)溶解于二甘醇乙基甲基醚中,直至总固体含量为20重量%。用孔径为0.2微米的薄膜过滤器过滤所得溶液,以制备含有辐射敏感的折射率变化组合物的溶液。以与实施例1相同的方式进行涂膜的形成、折射率的测定和透明性的评价。用于形成折射率图案的辐射量和曝光后烘培的温度如表1所示变化。除了上述不同之外重复实施例5的步骤,结果示于表1中。
实施例10
以与实施例9相同的方式进行评价,除了含有聚合物(B-2)的溶液(相当于40重量份的聚合物(B-2)(固体含量))被用作组分(B),结果示于表1中。
实施例11
以与实施例9相同的方式进行评价,除了1重量份的二苯基碘鎓三氟乙酸盐被用作组分(C),用于形成折射率图案的辐射量如表1所示变化。结果示于表1中。
实施例12
以与实施例9相同的方式进行评价,除了60重量份的二(4-乙烯基氧基)丁基对苯二甲酸酯和30重量份的双[(3-乙基-3-氧杂环丁基甲氧基)甲基-苯基]砜被用作组分(A),结果示于表1中。
表1
| 折射率图案形成条件 | 光学性能 | |||||
| 辐射量(mJ/cm2) | 温度(℃) | 折射率 | 透明性 | |||
| 曝光部分 | 未曝光部分 | 曝光部分 | 未曝光部分 | |||
| Ex.1 | 70 | 100 | 1.51 | 1.42 | 98.6% | 98.7% |
| Ex.2 | 250 | 100 | 1.51 | 1.42 | 98.5% | 98.7% |
| Ex.3 | 70 | 100 | 1.51 | 1.42 | 98.8% | 99.1% |
| Ex.4 | 70 | 100 | 1.54 | 1.42 | 98.5% | 99.0% |
| Ex.5 | 100 | 100 | 1.53 | 1.42 | 98.6% | 98.7% |
| Ex.6 | 100 | 100 | 1.53 | 1.42 | 98.6% | 99.0% |
| Ex.7 | 100 | 100 | 1.55 | 1.42 | 98.4% | 99.1% |
| Ex.8 | 140 | 100 | 1.53 | 1.42 | 98.2% | 98.6% |
| Ex.9 | 90 | 130 | 1.50 | 1.42 | 98.5% | 98.9% |
| Ex.10 | 90 | 130 | 1.46 | 1.38 | 98.5% | 99.0% |
| Ex.11 | 120 | 130 | 1.50 | 1.42 | 98.5% | 98.9% |
| Ex.12 | 90 | 130 | 1.48 | 1.42 | 98.9% | 98.9% |
Ex.:实施例
Claims (5)
1.一种辐射敏感的折射率变化组合物,包含(A)一种可聚合的化合物,(B)一种不可聚合的化合物,它的折射率低于可聚合的化合物(A)的聚合物,和(C)一种辐射敏感的聚合引发剂,所述不可聚合的化合物(B)选自
(a)一种通过用氟原子取代下列树脂中的氢原子而得到的聚合物:丙烯酸树脂、聚氨酯树脂、聚酯树脂、聚碳酸酯树脂、降冰片烯树脂、苯乙烯树脂、聚醚砜树脂、有机硅树脂、聚酰胺树脂、聚酰亚胺树脂、聚硅氧烷树脂、氟树脂、聚丁二烯树脂、乙烯基醚树脂或乙烯基酯树脂,
(b)由下式(1)代表的化合物的水解产物或水解产物的缩合物
R1 nSi(OR2)4-n (1)
其中R1和R2可以相同或不同,并且都是单价有机基团,n是0-2的整数,以及
(c)由下式(2)代表的梯型聚倍半硅氧烷、其水解产物或水解产物的缩合物
其中R3是单价有机基团,R4是氢原子或单价有机基团,R3和R4可以相同或不同,n是对应于分子量的正整数。
2.一种改变折射率的方法,包括将权利要求1的辐射敏感的折射率变化组合物暴露于辐射中。
3.一种形成折射率图案的方法,包括将权利要求1的辐射敏感的折射率变化组合物通过图案掩模暴露于辐射中。
4.一种由权利要求3的方法形成的折射率图案。
5.一种具有由权利要求3的方法形成的折射率图案的光学材料。
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| JP2001389777A JP2003185820A (ja) | 2001-12-21 | 2001-12-21 | 感放射線性屈折率変化性組成物および屈折率変化法 |
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Families Citing this family (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100789583B1 (ko) * | 2000-12-11 | 2007-12-28 | 제이에스알 가부시끼가이샤 | 감방사선성 굴절율 변화성 조성물 및 굴절율 변화법 |
| CA2408217A1 (en) * | 2001-03-13 | 2002-11-12 | Jsr Corporation | Radiation sensitive refractive index changing composition and use thereof |
| US7297731B2 (en) * | 2003-03-11 | 2007-11-20 | 3M Innovative Properties Company | Coating dispersions for optical fibers |
| WO2004090646A1 (ja) * | 2003-04-09 | 2004-10-21 | Konica Minolta Medical & Graphic, Inc. | ホログラフィック記録メディア及びその記録方法 |
| JP4217886B2 (ja) * | 2003-06-25 | 2009-02-04 | Jsr株式会社 | 感放射線性屈折率変化性組成物、パターン形成法および光学材料 |
| JP2005037668A (ja) | 2003-07-14 | 2005-02-10 | Jsr Corp | パターン形成法および光学素子 |
| US20050069718A1 (en) * | 2003-09-30 | 2005-03-31 | Voss-Kehl Jessica L. | Printable insulating compositions and printable articles |
| JP4560672B2 (ja) * | 2003-10-24 | 2010-10-13 | 株式会社スリーボンド | 硬化性樹脂組成物 |
| JP3914211B2 (ja) * | 2004-03-03 | 2007-05-16 | 株式会社東芝 | ホログラム記録媒体 |
| DE602005014984D1 (de) * | 2004-04-14 | 2009-07-30 | Rohm & Haas Elect Mat | Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter |
| US20060194145A1 (en) * | 2004-06-30 | 2006-08-31 | Darrell Irvine | Photogenerated polyelectrolyte bilayers from an aqueous-processible photoresist |
| US20060063014A1 (en) * | 2004-07-12 | 2006-03-23 | Debbie Forray | Polyalkylsilsesquioxane-filled adhesive compositions and methods for use thereof |
| JP4185026B2 (ja) * | 2004-07-16 | 2008-11-19 | 株式会社東芝 | ホログラム記録媒体およびその製造方法 |
| JP4556639B2 (ja) * | 2004-11-26 | 2010-10-06 | 東レ株式会社 | ネガ型感光性樹脂組成物、それから形成された透明硬化膜、および硬化膜を有する素子 |
| JP2006154083A (ja) * | 2004-11-26 | 2006-06-15 | Toshiba Corp | ホログラム記録媒体 |
| US7736818B2 (en) * | 2004-12-27 | 2010-06-15 | Inphase Technologies, Inc. | Holographic recording medium and method of making it |
| KR101271783B1 (ko) * | 2005-10-28 | 2013-06-07 | 도레이 카부시키가이샤 | 실록산 수지 조성물 및 그의 제조 방법 |
| KR100732763B1 (ko) | 2005-10-31 | 2007-06-27 | 주식회사 하이닉스반도체 | 유기 반사 방지막 중합체, 이를 포함하는 유기 반사 방지막조성물 및 이를 이용한 포토레지스트의 패턴 형성 방법 |
| JP5045052B2 (ja) * | 2005-11-10 | 2012-10-10 | Jsr株式会社 | 硬化性樹脂組成物及び反射防止膜 |
| JP4949692B2 (ja) * | 2006-02-07 | 2012-06-13 | 東京応化工業株式会社 | 低屈折率シリカ系被膜形成用組成物 |
| JP5009690B2 (ja) | 2006-06-15 | 2012-08-22 | 日東電工株式会社 | 偏光板、画像表示装置および偏光板の製造方法 |
| US20080001320A1 (en) * | 2006-06-28 | 2008-01-03 | Knox Wayne H | Optical Material and Method for Modifying the Refractive Index |
| JP4197721B2 (ja) * | 2006-12-18 | 2008-12-17 | 株式会社東芝 | ホログラム記録媒体およびその製造方法 |
| US7875408B2 (en) * | 2007-01-25 | 2011-01-25 | International Business Machines Corporation | Bleachable materials for lithography |
| WO2009041745A1 (en) * | 2007-09-28 | 2009-04-02 | Optonest Corporation | A temperature-sensitive and photo-sensitive fiber, a temperature-insensitive and photo-sensitive fiber, and an fiber sensor using the same |
| TWI456785B (zh) * | 2008-07-10 | 2014-10-11 | Mitsui Chemicals Inc | 記錄折射率調變之薄膜 |
| TWI503334B (zh) * | 2009-02-19 | 2015-10-11 | Jsr Corp | 聚合物及敏輻射線性組成物、及單體 |
| JP5914351B2 (ja) * | 2009-12-21 | 2016-05-11 | ダウ コーニング コーポレーションDow Corning Corporation | アルキル官能性シルセスキオキサン樹脂を使用した柔軟性導波路の製造方法 |
| KR101592297B1 (ko) * | 2011-09-30 | 2016-02-05 | 후지필름 가부시키가이샤 | 경화성 수지 조성물, 광학 부재 세트, 그 제조 방법, 이것을 사용한 고체 촬상 소자 |
| JP5839934B2 (ja) * | 2011-10-27 | 2016-01-06 | 株式会社ダイセル | 樹脂組成物及びその硬化物 |
| US9017934B2 (en) | 2013-03-08 | 2015-04-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist defect reduction system and method |
| US9502231B2 (en) | 2013-03-12 | 2016-11-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist layer and method |
| US9175173B2 (en) | 2013-03-12 | 2015-11-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Unlocking layer and method |
| US9245751B2 (en) | 2013-03-12 | 2016-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-reflective layer and method |
| US9256128B2 (en) | 2013-03-12 | 2016-02-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for manufacturing semiconductor device |
| US9543147B2 (en) | 2013-03-12 | 2017-01-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method of manufacture |
| US8932799B2 (en) | 2013-03-12 | 2015-01-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9354521B2 (en) | 2013-03-12 | 2016-05-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9110376B2 (en) | 2013-03-12 | 2015-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9117881B2 (en) | 2013-03-15 | 2015-08-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive line system and process |
| US9341945B2 (en) | 2013-08-22 | 2016-05-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method of formation and use |
| US9690021B2 (en) * | 2013-10-11 | 2017-06-27 | Transitions Optical, Inc. | Photochromic optical article having allophanate protective coating and process for making same |
| US10036953B2 (en) | 2013-11-08 | 2018-07-31 | Taiwan Semiconductor Manufacturing Company | Photoresist system and method |
| US10095113B2 (en) | 2013-12-06 | 2018-10-09 | Taiwan Semiconductor Manufacturing Company | Photoresist and method |
| US9761449B2 (en) | 2013-12-30 | 2017-09-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Gap filling materials and methods |
| US9599896B2 (en) | 2014-03-14 | 2017-03-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9581908B2 (en) | 2014-05-16 | 2017-02-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method |
| US9653307B1 (en) * | 2016-07-14 | 2017-05-16 | Micron Technology, Inc. | Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures |
| EP3673306B1 (en) * | 2017-08-24 | 2021-08-25 | Dow Global Technologies LLC | Method for optical waveguide fabrication |
| KR102166848B1 (ko) | 2017-12-11 | 2020-10-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| TWI799606B (zh) * | 2018-07-24 | 2023-04-21 | 日商三菱瓦斯化學股份有限公司 | 環硫化合物及光學材料用組成物 |
| US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
| CN112062936B (zh) * | 2019-06-10 | 2025-02-25 | 松下知识产权经营株式会社 | 紫外线固化性树脂组合物、发光装置的制造方法及发光装置 |
| US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
| US20210155639A1 (en) * | 2019-11-27 | 2021-05-27 | Facebook Technologies, Llc | Thiophosphate and phosphine sulfide derivatized monomers and polymers for volume bragg gratings |
| JP7335975B2 (ja) * | 2019-11-28 | 2023-08-30 | 東京応化工業株式会社 | 感光性インク組成物、硬化物、ディスプレイパネル、及び硬化物の製造方法 |
| CN114761497B (zh) * | 2019-11-28 | 2024-02-20 | 东京应化工业株式会社 | 感光性油墨组合物、固化物、显示面板、及固化物的制造方法 |
| US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
| CN112363255A (zh) * | 2020-12-29 | 2021-02-12 | 信利(仁寿)高端显示科技有限公司 | 一种可自动调节照度均匀性的蝇眼透镜及曝光系统 |
| KR102881600B1 (ko) * | 2021-08-25 | 2025-11-11 | 동우 화인켐 주식회사 | 감광성 수지 조성물, 이를 이용한 돌출형 패턴 및 화상표시장치 |
| JP2023137519A (ja) * | 2022-03-18 | 2023-09-29 | 三菱ケミカル株式会社 | ポリデカメチレングリコールジ(メタ)アクリレート、重合体、樹脂組成物、単量体組成物、及び製造方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR863142A (fr) | 1939-02-02 | 1941-03-24 | Cie Des Meules Norton | Résine synthétique pour la fabrication des corps optiques |
| JPS5740526A (en) | 1980-08-26 | 1982-03-06 | Japan Synthetic Rubber Co Ltd | Preparation of silicone resin |
| JPS5869217A (ja) | 1981-10-22 | 1983-04-25 | Japan Synthetic Rubber Co Ltd | 感光性シリコ−ン樹脂組成物 |
| JPH0638125B2 (ja) | 1985-07-26 | 1994-05-18 | 三菱電機株式会社 | 光集束性プラスチツクの製造方法 |
| JPH03192310A (ja) | 1989-12-22 | 1991-08-22 | Mitsubishi Rayon Co Ltd | プラスチック光伝送体の製造方法 |
| JP2583364B2 (ja) | 1990-06-19 | 1997-02-19 | 三菱電機株式会社 | 感光性樹脂組成物 |
| JPH0560931A (ja) | 1991-09-02 | 1993-03-12 | Fujitsu Ltd | 屈折率分布型プラスチツク樹脂成形体 |
| JP3332922B2 (ja) | 1991-10-22 | 2002-10-07 | 康博 小池 | 屈折率分布型光学樹脂材料とその製造方法並びに光伝送体 |
| EP0555749B1 (en) | 1992-02-14 | 1999-05-19 | Shipley Company Inc. | Radiation sensitive compositions and processes |
| JPH05275789A (ja) | 1992-03-26 | 1993-10-22 | Res Dev Corp Of Japan | ポリマー光ファイバーアンプ |
| DE69316792T2 (de) * | 1992-06-17 | 1998-05-28 | Nitto Denko Corp | Verfahren zur Herstellung von Polymerisation oder vernetzter Rate-distribuierte Produkte und Verfahren zur Herstellung einer Linse, Linsenanordnung oder Lichtwellenleiter durch dieses Verfahren |
| US5593621A (en) | 1992-08-17 | 1997-01-14 | Koike; Yasuhiro | Method of manufacturing plastic optical transmission medium |
| JP3291854B2 (ja) | 1993-08-16 | 2002-06-17 | 住友電気工業株式会社 | 光伝送用プラスチック部材の製造方法 |
| JPH0792313A (ja) | 1993-09-20 | 1995-04-07 | Toshiba Corp | 光ファイバー型回折格子 |
| JP3530630B2 (ja) | 1995-06-09 | 2004-05-24 | 康博 小池 | 屈折率分布型光ファイバー及びその母材の製造方法 |
| JP3679155B2 (ja) | 1995-06-09 | 2005-08-03 | 康博 小池 | 屈折率分布型光学樹脂材料の製造方法 |
| JPH09133813A (ja) | 1995-11-07 | 1997-05-20 | Fujikura Ltd | 光ファイバ接続部収納ユニットと光ファイバ接続部収納構造 |
| JP2914486B2 (ja) | 1995-12-26 | 1999-06-28 | 清藏 宮田 | 光ファイバ、及びその製造方法 |
| US6291561B1 (en) * | 1997-06-26 | 2001-09-18 | Corning S.A. | Photochromic compositions, photochromic compounds (co)polymer matrices |
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| CN1427306A (zh) | 2003-07-02 |
| JP2003185820A (ja) | 2003-07-03 |
| US6787289B2 (en) | 2004-09-07 |
| ATE498634T1 (de) | 2011-03-15 |
| DE60239184D1 (de) | 2011-03-31 |
| EP1323742A2 (en) | 2003-07-02 |
| US20030139486A1 (en) | 2003-07-24 |
| TWI254731B (en) | 2006-05-11 |
| RU2271365C2 (ru) | 2006-03-10 |
| AU2002323913B2 (en) | 2007-10-18 |
| CA2414760A1 (en) | 2003-06-21 |
| EP1323742A3 (en) | 2003-10-08 |
| KR20030053033A (ko) | 2003-06-27 |
| EP1323742B1 (en) | 2011-02-16 |
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