CN1207580C - Wide-angle and wide-spectrum reflective film and manufacturing method thereof - Google Patents

Abstract

The wide-angle and wide-spectrum reflecting film includes glass substrate, and first transition layer, second transition layer, metal film layer and reinforcing film layer deposited successively on the glass substrate. The invention is characterized in that a plating double-transition layer structure is adopted, the whole film layer can resist high temperature and deliquescence, and the film layer, the film layer and the substrate are not easy to fall off, and the spectral reflectivity is high.

Description

Wide-angle wide-spectrum reflective film and manufacturing method thereof

technical field

The invention relates to a reflective film, in particular to a high-performance wide-angle wide-spectrum reflective film and a manufacturing method thereof.

Background technique

The network technology in the information age has made the need for sharing and collecting information increasingly prominent, which has created a great demand for super-large screen display. The traditional display technology that uses CRT as the source of image generation is due to its large size, heavy weight and its own limitations. The limitation of brightness has gradually become a bottleneck restricting its development, replaced by large-screen projection display systems based on LCD (Liquid Crystal Display), DLP (Digital Light Processing), and LCOS (Liquid Crystal on Silicon), especially for DLP-based display systems are popular for their fast response, high light utilization, and high resolution.

However, the performance of the key component of the DLP display system, the light tunnel, has always been a bottleneck restricting its further performance improvement. The wide-angle wide-spectrum reflective film used in the light pipe system made by the existing technology has the following shortcomings:

(1). Low spectral reflectance;

(2). The adhesion between the film layer and the substrate and between the film layer and the film layer is poor, and it is easy to fall off;

(3). High temperature resistance and deliquescence resistance are not strong. High temperature or deliquescence environment can easily damage the surface of the film, and the spectrum is prone to drift.

Contents of the invention

The technical problem to be solved by the present invention is to overcome the deficiencies of the above-mentioned prior art, and provide a wide-angle wide-spectrum reflective film and its manufacturing method. The reflective film not only has excellent optical reflectivity, but also is not easy to fall off between the film layer and the substrate. , At the same time, it has good high temperature resistance and deliquescence resistance.

Technical solution of the present invention is as follows:

A wide-angle wide-spectrum reflective film, including a glass substrate, is characterized in that a first transition layer, a metal film layer and a strengthening film layer are sequentially evaporated on the glass substrate, and between the first transition layer and the metal film layer There is also a second transition layer in between.

The first transition layer is formed by evaporation of high-purity chromium, with a thickness of 20-100 nm.

The first transition layer is formed by evaporation of high-purity nickel, palladium or titanium, and its thickness is 20-100 nm.

The metal film layer is formed by evaporation of pure silver with a purity greater than 99.9%, and its thickness is 130-4000nm.

The metal film layer is formed by evaporation of pure aluminum with a purity greater than 99.9%, and its thickness is 130-4000nm.

The second transition layer is formed by vapor-depositing a mixed material of the first transition layer material and the metal film layer material at the same time, and the atomic percentage of the two materials mixed is 30%/70%～70%/30%. The thickness of the film layer is 10-100nm.

The reinforcing film layer is a combined film layer formed by interlacing high and low refractive index materials. The film system is LH, or LHLH. The low refractive index material is MgF ₂ or Al 2 O ₃ , and the high refractive index material is MgF 2 or Al ₂ O 3 . ZrO ₂ or TiO ₂ or HfO ₂ or ZnS or ZnSe, the optical thickness of the L, H layer is 80nm-150nm.

The first and second transition layers and the metal film are plated by thermal evaporation, ion beam sputtering or magnetron sputtering, and the reinforced film is plated by electron beam evaporation.

The preparation method of the wide-angle wide-spectrum reflective film includes the following steps:

① Cleaning of the glass substrate, first use an organic solvent to ultrasonically clean, and then use an ion source to clean before evaporation;

② According to the design of the film layer, the evaporation material of each film layer is selected;

③The glass substrate is placed in a vacuum chamber, and its vacuum degree is controlled at 9×10 ^-4 ~ 2×10 ^-1 Pa;

④ Evaporate the first transition layer on the glass substrate first;

⑤ Evaporating the second transition layer on the first transition layer;

6. Evaporating a metal film layer on the second transition layer;

⑦Using an optical control method or a time control method, the reinforced film layer is plated with electron beams on the surface of the metal film layer.

Advantages and characteristics of the present invention

(1) Characteristic one of the present invention is to adopt the plated double transition layer structure, the first transition layer selects metal chromium (nickel, palladium, titanium). Because of its relatively strong affinity with the glass surface, it presents good adhesion. After the second transition layer is plated with chromium (nickel, palladium, titanium) silver (aluminum) mixed film layer on the surface of the first transition layer, due to the chromium (Nickel, palladium, titanium) silver (aluminum) two elements exist simultaneously, so this layer can show good affinity and adhesion between the first transition layer and the pure silver (aluminum) film layer at the same time. Therefore, the first three layers of film and the substrate are not only firmly bonded but also show a good thermal matching effect due to their good transition, so that the film layer does not fall off and is not damaged after high temperature and high humidity treatment, and its spectrum does not produce drift. .

(2) MgF2 and Al2O3 are used in the reinforcing layer as the direct combination between the low refractive index material and the metal silver (aluminum) film. Due to the characteristics of MgF2 and Al2O3, it has good adhesion with silver, and because of L, H They are all medium layers, and the bonding force between them is very strong, so there will be no falling off between the entire reinforcement layer and the silver (aluminum).

(3) Due to the existence of the strengthening film, the spectral reflectance is high.

(4) The entire film layer can withstand high temperature and deliquescence, and it is not easy to fall off between the film layers and between the film layer and the substrate.

Description of drawings

Fig. 1 is the structural representation of wide-angle wide-spectrum reflective film of the present invention

In the figure: 1-Glass substrate 2-First transition layer 3-Second transition layer 4-Metal layer 5-Strengthening film layer

Detailed ways

The structure of the wide-angle wide-spectrum reflective film of the present invention is shown in FIG. 1 . in

The first transition layer 2 is formed by evaporation of high-purity chromium (nickel, palladium, titanium) (purity is 90%-100%), and the thickness is controlled between 20-100nm;

The second transition layer 3 is a chromium (nickel, palladium, titanium) silver (aluminum) mixed layer adopting the film layer of the mixed material obtained by vapor-depositing chromium (nickel, palladium, titanium) silver (aluminum) two kinds of materials simultaneously, the atoms of the two The percentage ratio can be controlled between 30%/70% and 70%/30%, and the thickness of the entire film layer is between 10-100nm;

The metallic silver (aluminum) film layer 4 is formed by evaporation of pure silver (aluminum) with a purity greater than 99.9%, and the thickness is between 130nm and 4000nm;

The strengthening film layer 5 is a film layer combination composed of high and low refractive index materials interlaced: if the optical thickness of each layer of high refractive index material film is represented by H, and the optical thickness of each layer of low refractive index material film layer is represented by L, then The film system of the reinforcement film can be LH or LHLH. The size of L and H is any value within the range of 80nm-150nm. Among them, MgF _{2 and} Al ₂ O ₃ can be selected for low refractive index materials, and ZrO ₂ , TiO ₂ , HfO ₂ , ZnS, ZnSe, etc. can be selected for high refractive index materials.

Evaporation processes and methods for various coatings

Before the glass substrate 1 is placed in the vacuum chamber, it must be cleaned with an organic solvent and ultrasonic waves, and it must be cleaned with an ion source before evaporation;

All metal layer 2.3.4 materials can be finished by thermal evaporation, ion beam sputtering or magnetron sputtering;

The strengthening film layer 5 is completed by electron beam evaporation;

The vacuum degree of the whole process is controlled at 9×10 ^-4 Pa～2×10 ^-1 Pa, and baking can be used at the same time, and the temperature range can be controlled within 80～300℃;

Production sequence: First, vapor-deposit chromium (nickel, palladium, titanium) on the glass substrate as the first transition layer, and then simultaneously vapor-deposit a mixed material of chromium (nickel, palladium, titanium) and silver (aluminum) on the basis of the first transition layer Form the second transitional layer, the third step is to vapor-deposit a certain thickness of silver (aluminum) film on the surface of the second transitional layer, and finally use the method of optical control to plate the surface of the silver (aluminum) layer with electron beams designed before. Strengthen the membrane.

In the following table are several embodiments of the present invention, all of which are completed in the same coating vacuum chamber, the substrate of the film is glass, the vacuum is better than 5 × 10 ^-3 Pa, the first, second transition layer and Metal silver (aluminum) film adopts thermal evaporation plating method, and the purity of the coating film material is greater than 99.9%, and the strengthening film adopts electron beam evaporation method. Before coating, the substrate is cleaned by ultrasonic wave, and then cleaned with organic solvent.

0.64Cr0.36Ag in the table means that the atomic percentages of Cr and Ag in the film layer are 64% and 36% respectively, and so on.

The above reflective film may also not need the second transition layer, as shown in Embodiment 5.

The samples of the above examples all have excellent optical properties, the film layer is resistant to high temperature, deliquescence resistance and does not fall off.

Example table case number first transition layer second transition layer Silver (aluminum) film reinforced film Example 1 Chromium (thickness 20nm) 0.64Cr0.36Ag (40nm) Ag(250nm) Film structure: LHL: MgF ₂ H: TiO ₂ L=H=100nm Example 2 Chromium (thickness 35nm) 0.52Cr0.48Ag (50nm) Ag(285nm) Film structure: LHL: MgF ₂ H: TiO ₂ L=H=100nm Example 3 Chromium (thickness 35nm) 0.52Cr0.48Ag (57nm) Ag(1000nm) Film structure: LHLHL: Al ₂ O ₃ H: ZrO ₂ L=H=110nm Example 4 Chromium (thickness 100nm) 0.47Cr0.53Ag (50nm) Ag(400nm) Film structure: LHLHL: MgF ₂ H: TiO ₂ L=H=125nm Example 5 Chromium (thickness 100nm) 0.0nm Ag(900nm) Film structure: LHLHL: MgF ₂ H: TiO ₂ L=H=125nm Example 6 Chromium (thickness 45nm) 0.52Cr0.48Al (50nm) Al(285nm) Film structure: LHLHL: MgF ₂ H: TiO ₂ L=H=125nm Example 7 Nickel (thickness 35nm) 0.52Ni0.48Ag(20nm) Ag(600nm) Film structure: LHLHL: MgF ₂ H: ZrO ₂ L=H=125nm Example 8 Palladium (thickness 35nm) 0.52Pd0.48Ag (57nm) Ag(1200nm) Film structure: LHLHL: MgF ₂ H: ZnSeL=H=125nm Example 9 Titanium (thickness 35nm) 0.52Ti0.48Ag (90nm) Ag(1500nm) Film structure: LHLHL: MgF ₂ H: HfO ₂ L=H=125nm

Claims (9)

1, a kind of wide angle and wide spectrum reflectance coating, comprise substrate of glass (1), it is characterized in that on substrate of glass (1) evaporation has first transition bed (2), metallic diaphragm (4) and strengthens rete (5) successively, second transition bed (3) in addition between described first transition bed (2) and metallic diaphragm (4).

2, wide angle and wide spectrum reflectance coating according to claim 1 is characterized in that described first transition bed (2) forms for high-purity chromium evaporation, and thickness is 20～100nm.

3, wide angle and wide spectrum reflectance coating according to claim 1 is characterized in that described first transition bed (2) is to be formed by high purity nickel or palladium or titanium evaporation, and its thickness is 20～100nm.

4, wide angle and wide spectrum reflectance coating according to claim 1 is characterized in that described metallic diaphragm (4) is to be formed greater than 99.9% fine silver evaporation by purity, and its thickness is 130～4000nm.

5, wide angle and wide spectrum reflectance coating according to claim 4 is characterized in that described metallic diaphragm (4) is to be formed greater than 99.9% fine aluminium evaporation by purity, and its thickness is 130～4000nm.

6, wide angle and wide spectrum reflectance coating according to claim 1, it is characterized in that described second transition bed (3) be by the composite material of first transition bed (2) material and metallic diaphragm (4) material simultaneously evaporation form, the atomic percent that these two kinds of materials mix is 30%/70%～70%/30%, and the thickness of whole rete is 10～100nm.

7, wide angle and wide spectrum reflectance coating according to claim 1 is characterized in that described reinforcement rete (5) is the combination rete that is staggered to form by the high and low refractive index material, and its film is LH, or LHLH, and its low-index material is selected MgF for use ₂Or Al ₂O ₃, its high-index material is selected ZrO for use ₂Or TiO ₂Or HfO ₂Or ZnS or ZnSe, L, the optical thickness of H layer are 80nm～150nm.

8, wide angle and wide spectrum reflectance coating according to claim 1, it is characterized in that described first transition bed (2), second transition bed (3) and metallic diaphragm (4) adopt thermal evaporation, ion beam sputtering or magnetron sputtering method to be coated with, and strengthen rete (5) and adopt electron beam evaporation method.

9, a kind of preparation method of wide angle and wide spectrum reflectance coating is characterized in that comprising following step:

The organic solvent ultrasonic cleaning is used earlier in the cleaning of substrate of glass (1), cleans with ion gun before the evaporation;

According to the design of rete, the deposition material of selected each rete;

Substrate of glass (1) is placed in the vacuum chamber, and its vacuum degree control is 9 * 10 ^-4～2 * 10 ^-1Pa;

Tide over layer (2) at substrate of glass (1) evaporation first earlier;

Go up evaporation second transition bed (3) at first transition bed (2);

Go up evaporation metal rete (4) at second transition bed (3);

By optical control method or duration control method, be coated with reinforcement rete (5) with electron beam on metallic diaphragm (4) surface.