CN1204061A - Method for producing high-temp resisting high-humidity resisting polaroid - Google Patents
Method for producing high-temp resisting high-humidity resisting polaroid Download PDFInfo
- Publication number
- CN1204061A CN1204061A CN 98111328 CN98111328A CN1204061A CN 1204061 A CN1204061 A CN 1204061A CN 98111328 CN98111328 CN 98111328 CN 98111328 A CN98111328 A CN 98111328A CN 1204061 A CN1204061 A CN 1204061A
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- CN
- China
- Prior art keywords
- polaroid
- resisting
- chip
- humidity
- treating fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000001035 drying Methods 0.000 claims abstract description 16
- 239000002253 acid Substances 0.000 claims abstract description 12
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 11
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims abstract description 3
- 238000010438 heat treatment Methods 0.000 claims abstract 3
- 239000012530 fluid Substances 0.000 claims description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 3
- 238000004090 dissolution Methods 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- 239000011630 iodine Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 235000008733 Citrus aurantifolia Nutrition 0.000 claims description 2
- 235000011941 Tilia x europaea Nutrition 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 238000007603 infrared drying Methods 0.000 claims description 2
- 239000004571 lime Substances 0.000 claims description 2
- 238000002604 ultrasonography Methods 0.000 claims description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 abstract 1
- 238000002791 soaking Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The production method of polaroid includes the following steps: firstly, soaking raw material polyvinyl alcohol in water, heating to dissolve one fully, adding a proper quantity of iodine, then applying the mixed dissolved solution to the flat surface of the horizontally-placed plane material with high smoothness, drying to obtain polaroid chip, then using acid to regulate pH value of silicasol to 2-4 to obtain silicasol solution, and applying the prepared silicasol treating solution to both sides of polaroid chip, drying by heating to 40 deg.C-300 deg.C, taking out and drying in the air so as to obtain the invented polaroid capable of resisting high-temperature and high-humidity.
Description
The present invention relates to a kind of production method of polarized light piece.
Existing polaroid can lose the polarisation effect after using a period of time under the temperature conditions more than 50 ℃, do not have resistance to elevated temperatures, and request for utilization is harsh.And existing polaroid is also higher to humidity requirement, in case working environment is more abominable, high humidity, polaroid also can lose the polarisation effect, will could use with behind the plastic sheet involution when therefore existing polaroid uses, and has increased the thickness of polaroid.In addition, existing polaroid mostly is planar chip, and finished product can't change shape again, can not change system into the cambered surface sheet as required.
Purpose of the present invention is exactly above-mentioned with topic in order to solve, and proposes a kind of production method of high-temp resisting high-humidity resisting polaroid.
Technical solution of the present invention:
A kind of production method of high-temp resisting high-humidity resisting polaroid, after earlier the polyvinyl alcohol (PVA) raw material being soaked in water, heat, they are fully dissolved, add an amount of iodine again, on the higher material plane of the smooth finish that its mixed dissolution liquid is poured on horizontal positioned, after slightly doing, orientation stretches, and makes the polaroid chip again after the drying, it is characterized in that:
A, preparation treating fluid:
Get silicasol and transfer to the solution for later use that pH value is 2-4 with acid;
B, making high-temp resisting high-humidity resisting polaroid:
The treating fluid for preparing evenly is coated in the two sides of polaroid chip, wait treating fluid dried slightly after again in 40 ℃ to 300 ℃ the temperature drying that heats up, take out nature and dry and be high-temp resisting high-humidity resisting polaroid of the present invention.
Polaroid of the present invention adopts special process to handle, it is high temperature resistant, high wet performance improves greatly, can under the working temperature more than 200 ℃, normally use, can not lose the polarisation effect, though its moisture-proof in water, use, even without the plastic sheet involution, can not lose the polarisation effect yet, the raising of matter has been arranged in the field of polaroid, can under particular surroundings, use long product lifecycle.Properties of product of the present invention are good, use widely, are specially adapted to the polarizing lamp for vehicle cover, solve and meet the problem that heat loses the polarisation effect, also be applicable to eyeglass, solve chance heat and meet the wet problem that loses the polarisation effect, also be applicable to contact lens, have very big social benefit and economic benefit.
Below production method of the present invention is described in detail as follows:
1, produce the polaroid chip:
Polyvinyl alcohol (PVA) (be as the trade mark 1799 polyvinyl alcohol (PVA)) soaked a period of time earlier in water after, heat then to 90 ℃, polyvinyl alcohol (PVA) is 5～8: 100 with the ratio of water, they are fully dissolved, add an amount of iodine again, on the higher material plane of the smooth finish that its mixed dissolution liquid is poured on horizontal positioned (as glass, corrosion resistant plate etc.), the nature levelling, do not forming a flexible film layer before the bone dry, taking this flexible film course both direction then off stretches, relocate after the stretching and continue drying, promptly obtain the polaroid chip after the drying.
2, preparation treating fluid:
Get silicasol and transfer to the solution for later use that pH value is 2-4,, use the diluted acid of 6% following concentration, to prevent the silicasol gel, if can directly use with weak acid if use strong acid with acid.Preferably adopt the hydrochloric acid of concentration 5% that silicasol is transferred to the solution that pH value is 2-4.Among the present invention, can adopt 5% hydrochloric acid that silicasol is transferred to pH value is 3 solution for later use.
3, make high-temp resisting high-humidity resisting polaroid:
The treating fluid for preparing evenly is coated in the two sides of polaroid chip.The polaroid chip preferably is in and anhydrously applies than under the soft state, if the polaroid chip is harder, then polaroid should be immersed in the treating fluid, treat that it brings out then coating one deck treating fluid naturally after soft slightly, should guarantee the planarity of polaroid chip in coating procedure, drying again heats up under 40 ℃ to 300 ℃ temperature after waiting treating fluid dried slightly.Dry run preferably is divided into two sections, and first section is dried to polaroid with 40-140 ℃ of intensification and fades, and second section with 140-300 ℃ of temperature drying.Preferably adopt infrared drying in the drying.During dry the end, can be placed in the water after the cooling slightly and soak, make dried treating fluid on the polaroid chip come off (also available ultrasound wave or dilute alkaline soln clean), make the clear printing opacity of polaroid chip, if polaroid chip colourity is too dark, handle to required colourity with chlorinated lime, the taking-up nature dries and is high-temp resisting high-humidity resisting polaroid of the present invention again.With the silicon melten gel force acid at high temperature with the effect of polaroid chip, silicasol plays the involution effect, acid has changed the inner structure of polaroid chip after just at high temperature acting on the polaroid chip, so have performance high temperature resistant, high humidity.
Polaroid behind the finished product, if will make arc surfaced, only need soak finished product and make its softness in water, typing is drying to obtain the cambered surface polaroid on the arc object plane then, can be used for making automobile lampshade etc.
Polaroid of the present invention according to the request for utilization difference, can directly be used, but also single face adhesive glass face is formed the polaroid use, and perhaps two-sided equal adhesive glass face is formed polaroid and used.
Claims (7)
1, a kind of production method of high-temp resisting high-humidity resisting polaroid, after earlier the polyvinyl alcohol (PVA) raw material being soaked in water, heat, they are fully dissolved, add an amount of iodine again, on the higher material plane of the smooth finish that its mixed dissolution liquid is poured on horizontal positioned, after slightly doing, orientation stretches, and makes the polaroid chip again after the drying, it is characterized in that:
A, preparation treating fluid: get silicasol and transfer to the solution for later use that pH value is 2-4 with acid;
B, make high-temp resisting high-humidity resisting polaroid: the treating fluid for preparing evenly is coated in the two sides of polaroid chip, wait treating fluid dried slightly after again in 40 ℃ to 300 ℃ the temperature drying that heats up, take out nature and dry and be high-temp resisting high-humidity resisting polaroid of the present invention.
2,, it is characterized in that in the operation of preparation treating fluid,, using the diluted acid of 6% following concentration, to prevent the silicasol gel, if can directly use with weak acid if use strong acid by the production method of the described high-temp resisting high-humidity resisting polaroid of claim 1.
3, by the production method of the described high-temp resisting high-humidity resisting polaroid of claim 2, it is that the solution of 2-4 is as treating fluid that the hydrochloric acid that it is characterized in that preferably adopting concentration 5% transfers to pH value with silicasol.
4, press the production method of the described high-temp resisting high-humidity resisting polaroid of claim 1, it is characterized in that the polaroid chip preferably is in anhydrously applies than under the soft state, if the polaroid chip is harder, then the polaroid chip should be immersed in the treating fluid, treat that it brings out then coating one deck treating fluid naturally after soft slightly, should guarantee the planarity of polaroid chip in coating procedure.
5, by the production method of the described high-temp resisting high-humidity resisting polaroid of claim 1, the drying process that it is characterized in that heating up preferably is divided into two sections, and first section is dried to polaroid with 40-140 ℃ of intensification and fades, and second section with 140-300 ℃ of temperature drying.
6, by the production method of the described high-temp resisting high-humidity resisting polaroid of claim 5, it is characterized in that preferably adopting in the drying infrared drying.
7, press the production method of the described high-temp resisting high-humidity resisting polaroid of claim 1, when it is characterized in that dry the end, can be placed in the water after the cooling slightly and soak, dried treating fluid on the polaroid chip is come off, also available ultrasound wave or dilute alkaline soln clean, make the clear printing opacity of polaroid chip,, handle to required colourity with chlorinated lime again if polaroid chip colourity is too dark.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 98111328 CN1204061A (en) | 1998-06-01 | 1998-06-01 | Method for producing high-temp resisting high-humidity resisting polaroid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 98111328 CN1204061A (en) | 1998-06-01 | 1998-06-01 | Method for producing high-temp resisting high-humidity resisting polaroid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1204061A true CN1204061A (en) | 1999-01-06 |
Family
ID=5221317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 98111328 Pending CN1204061A (en) | 1998-06-01 | 1998-06-01 | Method for producing high-temp resisting high-humidity resisting polaroid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1204061A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100362390C (en) * | 2000-11-13 | 2008-01-16 | 松下电器产业株式会社 | LCD projector |
| CN100399074C (en) * | 2006-01-17 | 2008-07-02 | 达信科技股份有限公司 | Polarizing film, polarizing plate and method for producing same |
| CN101371172B (en) * | 2006-12-08 | 2012-01-11 | 日东电工株式会社 | Method for producing polarizer, polarizer, polarizing plate, optical film and image display |
-
1998
- 1998-06-01 CN CN 98111328 patent/CN1204061A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100362390C (en) * | 2000-11-13 | 2008-01-16 | 松下电器产业株式会社 | LCD projector |
| CN100399074C (en) * | 2006-01-17 | 2008-07-02 | 达信科技股份有限公司 | Polarizing film, polarizing plate and method for producing same |
| CN101371172B (en) * | 2006-12-08 | 2012-01-11 | 日东电工株式会社 | Method for producing polarizer, polarizer, polarizing plate, optical film and image display |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C01 | Deemed withdrawal of patent application (patent law 1993) | ||
| WD01 | Invention patent application deemed withdrawn after publication |