CN1258180C - 高密度只读光盘 - Google Patents
高密度只读光盘 Download PDFInfo
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Abstract
本发明提供了一种高密度只读光盘,其具有大的存储容量。该光盘包括具有凹坑的基底;和具有超分辨近场结构的一个或多个掩膜层,该掩膜层由介电材料和金属粒子的混合物构成。该光盘可以在不减小激光二极管的波长或增大物镜的数值孔径的情况下获得。
Description
本申请要求2002年9月28日在韩国知识产权局提出的韩国专利申请第2002-59139号和2003年7月18日在韩国知识产权局提出的韩国专利申请第2003-49132号的优先权,其公开在此全部参考引用。
技术领域
本发明涉及一种光盘,更具体地涉及一种高密度只读光盘(readable onlyoptical disk),其具有超分辨近场结构(super resolution near field structure),其可以读取尺寸比激光束的分辨率更小的标记。
背景技术
由于光盘与现有的磁记录介质相比具有非常小的每记录单元记录面积,因此被广泛用作高密度记录介质。根据其特性,光盘被分为只读存储(ROM)型、一次写入多次读取(WORM)型和可擦除型。ROM型光盘只能读取预先记录的数据,WORM型光盘仅允许用户将数据写入到盘上一次,可擦除型光盘允许用户擦除数据和再次记录数据。
WORM光盘的一个例子就是小型盘可记录(CD-R)盘(compact diskrecordable disk)。在CD-R盘上,当波长为780nm的记录激光束聚焦在由诸如花青和酞花青的有机染色材料制成的记录层上时,有机染色材料中的键被断开。同时,基底和反射层的结构光学地改变。在这种过程中,数据被记录在CD-R盘上。记录的数据以小于等于1mW的低功率被读出。CD-R盘具有约650MB的存储容量,并由此被广泛用于记录和和读取诸如视频和音频的多种类型的数据。
然而,需要780nm的记录波长的诸如CD-R或CD可重写(CD-RW)的光记录介质的存储容量不足以记录动态图像数据。因此,这种具有小存储容量的光记录介质在今天的复杂的多媒体环境下是不实用的。
为了解决上述问题,开发了数字通用盘(digital versatile disk)(DVD),这种盘需要630-680nm的较短的激光波长。DVD(在一面上)具有2.7到4.7GB的存储容量。通常,DVD可分为DVD只读存储(DVD-ROM)型、DVD可记录(DVD-R)型、DVD随机存取存储(DVD-RAM)型和DVD可重写(DVD-RW)型。通过使用一种记录层,完成在DVD-R盘上的记录,在该记录层中,有机染色材料的键因暴露于记录激光束下而断开。至于DVD-RAM和DVD-RW盘,记录层的相变改变了盘的光学特性,由此可以向盘上记录数据或从盘上擦除数据。具体地,使用有机染色材料的DVD-R盘与DVD-ROM兼容,成本低,相比于其他记录介质具有大存储容量。基于这些原因,DVD-R盘的发展正在受着特别的关注。
从上述说明可以看出,现在许多光学介质中所需要解决的最重要的问题就是提高存储容量。在这方面,已经尝试了多种方法来提高存储容量。光盘存储容量主要取决于光盘预定表面上小凹坑的数量和用于正确读取凹坑的激光束的特性。通常,从激光二极管输出的光以一定宽度的光束的形式传播,这是由于不管是否使用了光学拾取的物镜,都会发生衍射。该光束尺寸被称为“衍射极限”。通常的光盘具有读取分辨率极限,由下述表达式给出:λ/4NA,其中,λ是光源的波长,NA是物镜的数值孔径。从上述表达式可以看出,光盘的存储容量可以通过缩短光源的波长或使用高NA的物镜来增大。然而,这存在着局限性,这是因为现有的激光技术不能提供这种短波长激光,且大NA的物镜价格昂贵。此外,随着物镜的NA的增加,拾取器和盘之间的距离(工作距离)显著缩短,因此拾取器和盘有可能彼此相撞。结果,可能引起盘的表面的损坏,导致数据丢失。
为了克服读取分辨率极限,现已研究了一种具有超分辨近场结构(超RENS)的光盘。在具有这种超RENS的光盘上,主要使用由氧化银构成的掩膜层(mask layer)。图1示意性示出了具有氧化银掩膜层的光盘。在具有图1的结构的光盘中,氧化银分离为银粒子和氧,用于数据记录。另一方面,为了进行数据读取,等离子体激元(plasmon)形成在银粒子的表面上。这种表面等离子体激元导致近场读取(near field reading)(NFR)。因此,超过衍射极限的非常小的标记可以被读取。
由诸如氧化银的金属氧化物构成的掩膜层可以用在WORM光学记录介质中,其中,氧化银分离为银粒子和氧,用于数据记录。这意味着导致超分辨效应的金属粒子在记录过程中产生。因此,产生了这样一个问题,即氧化银掩膜层不能用在ROM光盘中,该光盘以其基底上的凹坑的形式存储数据,取代了记录过程。
发明内容
本发明提供一种具有高存储容量的高密度只读光盘。该光盘可以在不减小激光二极管的波长或不增加物镜的数值孔径的情况下实现。
根据本发明的一个方面,提供了一种高密度只读光盘,其包括:具有凹坑的基底;以及具有超分辨近场结构的一个或多个掩膜层,其由介电材料和金属粒子的混合物构成。
介电材料可以是金属氧化物、氮化物、硫化物、氟化物或其混合物。优选地,介电材料是ZnS-SiO2。
金属粒子可以来自金、铂、铑、钯或其混合物。优选地,金属粒子为铂粒子。
光盘还可以包括一个或多个反射层。
光盘还可以包括掩膜层的上表面和下表面上的介电层。
附图说明
通过参考附图对优选实施例的详细描述,本发明的上述和其他特点和优点将更加明显,其中:
图1是传统结构的光盘的示意图;
图2是具有本发明实施例1中所构造的结构的光盘的示意图;以及
图3是曲线图,显示实施例1-3和对比例1中制备的光盘的性能评测结果。
具体实施方式
下面,将参考附图对本发明进行详细说明。
图2示出了根据本发明的一个实施例的光盘。图2的光盘包括具有凹坑17的透明基底10、以及顺序形成在基底10上的掩膜层11。基底10对记录激光的波长非常透明。基底10通过诸如注塑的传统基底制造方法,使用具有良好耐冲击、耐热和耐气候性的材料来形成。该基底材料的例子包括聚碳酸酯、聚甲基丙烯酸甲酯、环氧树脂、聚脂和非晶聚烯烃。
本发明的掩膜层11利用分散在介电材料中的细小金属粒子形成,而不使用传统的氧化银。细小金属粒子的尺寸小于激光光束的尺寸。掩膜层11由于自聚焦效应而用作近场光的光圈(aperture)。因此,尺寸小于等于100nm的细小标记可以使用波长为680nm的激光进行读取。根据本发明,由于细小金属粒子用作表面等离子体激元之源,因此其适用于只读光盘。
用在掩膜层11中的介电材料为金属氧化物、氮化物、硫化物、氟化物或其混合物。例如,可以使用SiO2、Al2O3、Si3N4、SiN、ZnS或MgF2。优选地,将要散布在掩膜层11中的金属粒子来源于诸如金、铂、铑和钯的贵金属。在这种情况下,由于介电材料和金属粒子彼此不起化学反应,所以可以保持细小金属粒子的原始形状。然而,银粒子的使用不是优选的。这是因为银粒子与介电材料的硫发生反应,从而劣化了掩膜层11的性能。
同时,掩膜层11可以通过溅射工艺沉积。溅射工艺的目标是介电材料和细小金属粒子的混合物。因此,使用溅射工艺,尺寸小于激光束的细小金属粒子可以散布在介电材料中。
虽然图2中未示出,但是本发明的光盘还可以包括一个或多个反射层。反射层用于在记录或读取数据时确保高反射率。在这一点上,优选的是,使用具有高热导率和反射率的金属作为反射层的材料。反射层可以由自Au、Al、Cu、Cr、Ag、Ti、Pd、Ni、Zn、Mg和其合金组成的组中选出的一种制成。反射层通过诸如真空沉积、e-束(e-beam)和溅射的传统方法形成至50到150nm厚。优选的是,将反射层的厚度限定在60到120nm的范围内,以确保充足的反射率和可靠性。
本发明的光盘还可以包括介电层,其位于掩膜层和基底之间、掩膜层和反射层之间、或在掩膜层的上表面和下表面上。掩膜层和基底之间的介电层用来防止基底受到热损伤。另一方面,掩膜层和反射层之间的介电层用作扩散防止层。
本发明的光盘还可以包括保护层。保护层用以保护其他层,特别是反射层。保护层可以使用例如旋涂的传统方法形成。具体地,可以在反射层上旋涂环氧树脂基或丙烯酸酯基紫外线固化树脂-一种具有高冲击强度并可以使用紫外线固化的透明材料-然后以紫外线固化,从而形成保护层。
下面,将通过实施例来详细描述本发明,但本发明并不局限于此。
实施例1
准备厚度为0.6mm的聚碳酸酯(PC)基底。基底具有凹坑和0.74μm的轨道间距,其与数字通用盘(DVD)的相同。ZnS-SiO2靶和Pt靶分别通过400W和160W的溅射而共沉积(co-deposit)在基底上,从而形成混合薄膜。这时,以20sccm的速率提供Ar气,沉积压力为1.5mTorr,薄膜中ZnS-SiO2对Pt的体积比为80比20。
实施例2
准备厚度为0.6mm的聚碳酸酯(PC)基底。基底具有凹坑和0.74μm的轨道间距。ZnS-SiO2介电层和ZnS-SiO2+Pt掩膜层通过溅射沉积在基底上。然后,通过溅射沉积银反射层至100nm厚。之后,光固化树脂基保护层被旋涂在反射层上。然后,所得结构在真空电炉中以40℃干燥12小时,以制备光盘。在这种情况下,通过分别在400W和160W共溅射ZnS-SiO2靶和Pt靶,以厚50nm的混合薄膜的形式形成ZnS-SiO2+Pt掩膜层。Ar气以20sccm的速率提供,沉积压力为1.5mTorr,薄膜中ZnS-SiO2对Pt的体积比为80比20。
实施例3
以与实施例2相同的方式准备只读盘,不同之处在于在掩膜层和反射层之间还形成了ZnS-SiO2层。
对比例1
准备厚度为0.6mm的聚碳酸酯(PC)基底。基底具有凹坑和轨道间距为0.74μm的预置槽(pre-groove)。银反射层通过溅射沉积在基底上。然后,光固化树脂基保护层旋涂在反射层上。结果,形成了没有掩膜层的只读光盘。
试验例1
实施例1-3和对比例1的盘的性能采用用于DVD的评测设备进行评测,该设备采用635nm的光束波长和数值孔径为0.60的拾取器。为此,在6m/s的线速度和4mW的读取功率下测定载波噪声比(C/N)数值,结果如图3所示。如图3所示,读取分辨率极限(λ/4NA)为265nm,DVD的最小凹坑长度为400nm。在对比例1的光盘中,在小于读取分辨率极限(265nm)的250和200nm的凹坑中没有获得C/N值。然而,在实施例1的光盘中,约40dB的实际电平的C/N值在250nm凹坑处获得。该试验结果证实了本发明的光盘可以获得超分辨效果。
从上述说明中明显可知,本发明提供了一种具有高存储容量的高密度只读光盘。该光盘可以在不减小激光二极管波长或增加物镜的数值孔径的情况下获得。
虽然已经参考本发明的示例性实施例示出和描述了本发明,但是应当理解,本领域普通技术人员可以在不背离由权利要求所定义的本发明的精神和范围的条件下作出多种形式和细节上的改变。
Claims (7)
1.一种高密度只读光盘,包括:
具有凹坑的基底;以及
具有超分辨近场结构的一个或多个掩膜层,该掩膜层由介电材料和金属粒子的混合物构成。
2.根据权利要求1所述的光盘,其中,介电材料为金属氧化物、氮化物、硫化物、氟化物或其混合物。
3.根据权利要求1所述的光盘,其中,介电材料为ZnS-SiO2。
4.根据权利要求1所述的光盘,其中,金属粒子选自金、铂、铑、钯或其混合物。
5.根据权利要求1所述的光盘,其中,金属粒子为铂粒子。
6.根据权利要求1所述的光盘,还包括一个或多个反射层。
7.根据权利要求1所述的光盘,还包括在掩膜层的上表面和下表面上的介电层。
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| JP2005025842A (ja) * | 2003-07-01 | 2005-01-27 | Tdk Corp | 光記録ディスク |
| JP2005044438A (ja) * | 2003-07-22 | 2005-02-17 | Tdk Corp | 光記録ディスク |
| KR20050029765A (ko) * | 2003-09-22 | 2005-03-28 | 삼성전자주식회사 | 고밀도 재생전용 광디스크 및 그 제조방법 |
| US7232598B2 (en) * | 2003-10-22 | 2007-06-19 | Lg Electronics Inc. | Super resolution optical disc |
| JP2005129181A (ja) * | 2003-10-27 | 2005-05-19 | National Institute Of Advanced Industrial & Technology | 光記録ディスク |
| US20050221228A1 (en) * | 2004-03-30 | 2005-10-06 | General Electric Company | Near field optical storage mask layer, disk, and fabrication method |
| KR100582498B1 (ko) * | 2004-05-21 | 2006-05-23 | 엘지전자 주식회사 | 복합 마스크 층이 형성된 초해상 광디스크 |
| US8254227B2 (en) * | 2005-05-10 | 2012-08-28 | The Trustees Of The University Of Pennsylvania | Frequency-modulated coding and data recording and storage using plasmonic nanostructures |
| JP4591379B2 (ja) * | 2005-05-12 | 2010-12-01 | ソニー株式会社 | 光記録媒体及び光記録再生方法 |
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| EP1826758A1 (en) * | 2006-02-24 | 2007-08-29 | THOMSON Licensing | Optical multilayer storage medium using nanoparticles |
| EP1950759A1 (en) | 2007-01-23 | 2008-07-30 | Deutsche Thomson OHG | Optical storage medium with a mask layer providing a super resolution near filed effect and respective manufacturing method |
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| EP1067534A2 (en) * | 1999-07-02 | 2001-01-10 | TDK Corporation | Optical information medium and reading method |
| JP4313517B2 (ja) * | 2000-01-26 | 2009-08-12 | セイコーインスツル株式会社 | 記録媒体、近視野光ヘッド、光記録装置、及びそれらの製造方法 |
| JP4370715B2 (ja) * | 2000-10-30 | 2009-11-25 | 日本ビクター株式会社 | 光記録媒体及びその再生方法 |
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| KR20050029765A (ko) * | 2003-09-22 | 2005-03-28 | 삼성전자주식회사 | 고밀도 재생전용 광디스크 및 그 제조방법 |
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| US7348124B2 (en) | 2008-03-25 |
| KR100922870B1 (ko) | 2009-10-20 |
| EP1403860B1 (en) | 2005-04-06 |
| DE60300474D1 (de) | 2005-05-12 |
| JP3995644B2 (ja) | 2007-10-24 |
| TW200405307A (en) | 2004-04-01 |
| JP2004119007A (ja) | 2004-04-15 |
| EP1403860A1 (en) | 2004-03-31 |
| TWI246683B (en) | 2006-01-01 |
| US20040161575A1 (en) | 2004-08-19 |
| KR20040028488A (ko) | 2004-04-03 |
| CN1523594A (zh) | 2004-08-25 |
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