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CN1257542C - Image sensor manufacturing method - Google Patents

Image sensor manufacturing method Download PDF

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Publication number
CN1257542C
CN1257542C CNB031020429A CN03102042A CN1257542C CN 1257542 C CN1257542 C CN 1257542C CN B031020429 A CNB031020429 A CN B031020429A CN 03102042 A CN03102042 A CN 03102042A CN 1257542 C CN1257542 C CN 1257542C
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substrate
image sensor
groove
medium
adhesive medium
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CN1521819A (en
Inventor
谢志鸿
吴志成
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Kingpak Technology Inc
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Kingpak Technology Inc
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    • H10W72/01515
    • H10W72/075
    • H10W90/754

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  • Solid State Image Pick-Up Elements (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)

Abstract

A method for fabricating an image sensor. In order to provide a sensor manufacturing method for preventing impurities from entering the sensor and improving the quality of the sensor, the invention is provided, which comprises the following steps: providing a substrate having upper and lower surfaces; step two: fixedly arranging a flange layer with a groove formed on the substrate on the upper surface of the substrate; step three: fixing the image sensing chip with a plurality of welding pads on the upper surface of the substrate and locating in the groove; step four: electrically connecting a plurality of wires between the bonding pads of the image sensor chip and the substrate; step five: arranging an adhesive medium in the groove; step six: covering the transparent layer on the flange layer to cover the image sensing chip to form an image sensor; step seven: the image sensor is centrifugally rotated to uniformly diffuse the adhesive medium to the upper surface of the substrate, and the impurities in the groove and the impurities electrostatically adsorbed on the image sensing chip and the light-transmitting layer can fall onto the adhesive medium and be adhered by the adhesive medium.

Description

影像感测器制造方法Image sensor manufacturing method

技术领域technical field

本发明属于感测器制造方法,特别是一种影像感测器制造方法。The invention belongs to a sensor manufacturing method, in particular to an image sensor manufacturing method.

背景技术Background technique

一般感测器可用来感测为光讯号或声音讯号的讯号。影像感测器系用来接收光讯号或影像讯号。当接收光讯号后,可透过影像感测器将光讯号转变成电讯号,藉由基板传递至电路板上。General sensors can be used to sense signals that are either light signals or sound signals. The image sensor is used to receive light signals or image signals. After receiving the light signal, the light signal can be converted into an electrical signal through the image sensor, and transmitted to the circuit board through the substrate.

如图1所示,习知的影像感测器包括基板10、凸缘层18、影像感测晶片26、复数条导线28及透光层34。As shown in FIG. 1 , a conventional image sensor includes a substrate 10 , a flange layer 18 , an image sensing chip 26 , a plurality of wires 28 and a transparent layer 34 .

基板10设有形成有第一接点15的上表面12及形成有第二接点16的下表面14。The substrate 10 has an upper surface 12 formed with a first contact 15 and a lower surface 14 formed with a second contact 16 .

凸缘层18设有黏着固定于基板10上表面12上并与基板10形成凹槽24的第一表面20及第二表面22。The flange layer 18 is provided with a first surface 20 and a second surface 22 which are adhesively fixed on the upper surface 12 of the substrate 10 and form a groove 24 with the substrate 10 .

影像感测晶片26系设于基板10与凸缘层18形成的凹槽24内,并固定于基板10上表面12上。The image sensor chip 26 is disposed in the groove 24 formed by the substrate 10 and the flange layer 18 , and fixed on the upper surface 12 of the substrate 10 .

复数条导线28具有电连接至影像感测晶片26的第一端点30及电连接至基板10第一接点15上的第二端点32。The plurality of wires 28 have a first terminal 30 electrically connected to the image sensor chip 26 and a second terminal 32 electrically connected to the first contact 15 of the substrate 10 .

透光层34系黏设于凸缘层18的第一表面20上。The transparent layer 34 is adhered on the first surface 20 of the flange layer 18 .

此种习知的影像感测器必须在非常洁净的无尘室内进行封装作业,否则空气内中的杂质(particle)将进入凹槽24内并静电附着于透光层34与影像感测晶片26上,从而使其像素无法有效提高。然,即使在洁净的无尘室内作业,仍有些微的粒子会掉入凹槽24内而影响到影像感测器的像素提升;且致使影像感测器的制造业者必须不断的提升无尘室的等级,以致其厂房设备支出相当高昂,亦无法达到完全无杂质的需求。This conventional image sensor must be packaged in a very clean, dust-free room, otherwise impurities in the air will enter the groove 24 and electrostatically adhere to the light-transmitting layer 34 and the image sensor chip 26 , so that its pixels cannot be effectively improved. However, even in a clean clean room, some tiny particles will fall into the groove 24 and affect the pixel enhancement of the image sensor; and the manufacturer of the image sensor must continuously improve the clean room. grades, so that the cost of its plant equipment is quite high, and it cannot meet the requirement of being completely free of impurities.

发明内容Contents of the invention

本发明的目的是提供一种防止杂质进入感测器、提高感测器品质的影像感测器制造方法。The object of the present invention is to provide a method for manufacturing an image sensor that prevents impurities from entering the sensor and improves the quality of the sensor.

本发明包括步骤一:提供设有上、下表面的基板;步骤二:于基板上表面固定设置与基板形成有凹槽的凸缘层;步骤三:将设有复数个焊垫的影像感测晶片固定于基板的上表面,并位于凹槽内;步骤四:将复数条导线电连接影像感测晶片的焊垫与基板之间;步骤五:将黏着介质设于凹槽内;步骤六:将透光层盖设于凸缘层上,以包覆住影像感测晶片而构成成影像感测器;步骤七:将影像感测器进行离心旋转,以使黏着介质均匀地扩散至基板上表面,且使凹槽内的杂质及影像感测晶片、透光层上静电吸附的杂质可掉落至黏着介质上而被黏着介质黏着住。The present invention includes step 1: providing a substrate with upper and lower surfaces; step 2: fixing a flange layer on the upper surface of the substrate and forming a groove with the substrate; step 3: installing an image sensor with a plurality of welding pads The chip is fixed on the upper surface of the substrate and located in the groove; step 4: electrically connect a plurality of wires between the pads of the image sensor chip and the substrate; step 5: set the adhesive medium in the groove; step 6: Covering the light-transmitting layer on the flange layer to cover the image sensor chip to form an image sensor; Step 7: Centrifugally rotate the image sensor to spread the adhesive medium evenly on the substrate surface, and the impurities in the groove, the image sensing chip, and the electrostatically adsorbed impurities on the light-transmitting layer can fall onto the adhesive medium and be stuck by the adhesive medium.

其中:in:

基板上表面形成有复数个第一接点;复数导线系电连接像感测晶片的焊垫与基板第一接点之间。A plurality of first contacts are formed on the upper surface of the substrate; a plurality of wires are electrically connected between the welding pads of the sensing chip and the first contacts of the substrate.

于凹槽内设置黏着介质步骤后进行离心旋转步骤。After the step of setting the adhesive medium in the groove, the centrifugation step is carried out.

于凹槽内设置黏着介质步骤系以涂布或喷洒方式将黏着介质设于凹槽内。The step of setting the adhesive medium in the groove is to set the adhesive medium in the groove by coating or spraying.

由于本发明步骤一:提供设有上、下表面的基板;步骤二:于基板上表面固定设置与基板形成有凹槽的凸缘层;步骤三:将设有复数个焊垫的影像感测晶片固定于基板的上表面,并位于凹槽内;步骤四:将复数条导线电连接影像感测晶片的焊垫与基板之间;步骤五:将黏着介质设于凹槽内;步骤六:将透光层盖设于凸缘层上,以包覆住影像感测晶片而构成成影像感测器;步骤七:将影像感测器进行离心旋转,以使黏着介质均匀地扩散至基板上表面,且使凹槽内的杂质及影像感测晶片、透光层上静电吸附的杂质可掉落至黏着介质上而被黏着介质黏着住。将影像感测器进行离心旋转时,使黏着介质均匀地扩散至基板上表面,且使凹槽内的杂质及影像感测晶片、透光层上静电吸附的杂质可掉落至黏着介质上而被黏着介质黏着住,防止杂质进入感测器、提高感测器品质,从而达到本发明的目的。Step 1 of the present invention: providing a substrate with upper and lower surfaces; Step 2: fixing a flange layer on the upper surface of the substrate and forming a groove with the substrate; Step 3: installing an image sensor with a plurality of welding pads The chip is fixed on the upper surface of the substrate and located in the groove; step 4: electrically connect a plurality of wires between the pads of the image sensor chip and the substrate; step 5: set the adhesive medium in the groove; step 6: Covering the light-transmitting layer on the flange layer to cover the image sensor chip to form an image sensor; Step 7: Centrifugally rotate the image sensor to spread the adhesive medium evenly on the substrate surface, and the impurities in the groove, the image sensing chip, and the electrostatically adsorbed impurities on the light-transmitting layer can fall onto the adhesive medium and be stuck by the adhesive medium. When the image sensor is centrifugally rotated, the adhesive medium is evenly diffused to the upper surface of the substrate, and the impurities in the groove and the electrostatically adsorbed impurities on the image sensing chip and the light-transmitting layer can fall onto the adhesive medium and It is stuck by the adhesive medium, prevents impurities from entering the sensor, improves the quality of the sensor, and thus achieves the purpose of the present invention.

附图说明Description of drawings

图1、为习知影像感测器结构示意剖视图。FIG. 1 is a schematic cross-sectional view of a conventional image sensor structure.

图2、为本发明实施例一步骤一、二、三、四、五示意图。Fig. 2 is a schematic diagram of Steps 1, 2, 3, 4 and 5 of Embodiment 1 of the present invention.

图3、为本发明实施例一步骤六示意图。Fig. 3 is a schematic diagram of Step 6 of Embodiment 1 of the present invention.

图4、为本发明实施例一步骤七示意图。Fig. 4 is a schematic diagram of Step 7 of Embodiment 1 of the present invention.

图5、为本发明实施例二示意图。Fig. 5 is a schematic diagram of Embodiment 2 of the present invention.

具体实施方式Detailed ways

实施例一Embodiment one

本发明包括如下步骤:The present invention comprises the steps:

步骤一step one

提供基板40Provide substrate 40

如图2所示,基板40上设有形成有复数个第一接点46的上表面42及形成有复数个第二接点48的下表面44;As shown in FIG. 2 , the substrate 40 is provided with an upper surface 42 formed with a plurality of first contacts 46 and a lower surface 44 formed with a plurality of second contacts 48;

步骤二step two

固设凸缘层50Fixed flange layer 50

如图2所示,凸缘层50系固定于基板40上表面42上,并与基板40形成有凹槽52;As shown in FIG. 2, the flange layer 50 is fixed on the upper surface 42 of the substrate 40, and forms a groove 52 with the substrate 40;

步骤三step three

固设影像感测晶片54Fixed image sensor chip 54

如图2所示,将设有复数个焊垫55的影像感测晶片54固定于基板40的上表面42,并位于凹槽52内;As shown in FIG. 2 , an image sensor chip 54 with a plurality of welding pads 55 is fixed on the upper surface 42 of the substrate 40 and is located in the groove 52;

步骤四step four

连接复数导线56Connect multiple wires 56

如图2所示,复数条导线56系电连接影像感测晶片54的焊垫55与基板40的第一接点46之间,以使影像感测晶片54的讯号传递至基板40上;As shown in FIG. 2 , a plurality of wires 56 are electrically connected between the bonding pad 55 of the image sensing chip 54 and the first contact 46 of the substrate 40, so that the signal of the image sensing chip 54 is transmitted to the substrate 40;

步骤五step five

于凹槽内设置黏着介质58Adhesive medium 58 is set in the groove

如图2所示,将为胶体的黏着介质58涂布或喷洒于凹槽52内;As shown in Figure 2, will be coated or sprayed in the groove 52 for the adhesive medium 58 of colloid;

步骤六step six

设置透光层60Set light-transmitting layer 60

如图3所示,将透光层60盖设于凸缘层50上,以包覆住影像感测晶片54而构成成影像感测器;As shown in FIG. 3 , the transparent layer 60 is covered on the flange layer 50 to cover the image sensor chip 54 to form an image sensor;

步骤七step seven

离心旋转Centrifugal rotation

如图4所示,将影像感测器进行离心旋转,使黏着介质58均匀地扩散至基板40上表面42,且使凹槽52内的杂质及影像感测晶片54、透光层60上静电吸附的杂质可掉落至黏着介质58上而被黏着介质58黏着住。As shown in FIG. 4 , the image sensor is rotated centrifugally, so that the adhesive medium 58 is evenly diffused to the upper surface 42 of the substrate 40, and the impurities in the groove 52 and the static electricity on the image sensor chip 54 and the light-transmitting layer 60 The adsorbed impurities may fall onto the adhesive medium 58 and be stuck by the adhesive medium 58 .

实施例二Embodiment two

如图5所示,本发明包括如下步骤:As shown in Figure 5, the present invention comprises the following steps:

步骤一step one

提供基板40Provide substrate 40

基板40上设有形成有复数个第一接点46的上表面42及形成有复数个第二接点48的下表面44;The substrate 40 is provided with an upper surface 42 formed with a plurality of first contacts 46 and a lower surface 44 formed with a plurality of second contacts 48;

步骤二step two

固设凸缘层50Fixed flange layer 50

凸缘层50系固定于基板40上表面42上,并与基板40形成有凹槽52;The flange layer 50 is fixed on the upper surface 42 of the substrate 40, and forms a groove 52 with the substrate 40;

步骤三step three

固设影像感测晶片54Fixed image sensor chip 54

将设有复数个焊垫55的影像感测晶片54固定于基板40的上表面42,并位于凹槽52内;An image sensor chip 54 with a plurality of pads 55 is fixed on the upper surface 42 of the substrate 40 and located in the groove 52;

步骤四step four

连接复数导线56Connect multiple wires 56

复数条导线56系电连接影像感测晶片54的焊垫55与基板40的第一接点46之间,以使影像感测晶片54的讯号传递至基板40上;A plurality of wires 56 are electrically connected between the bonding pad 55 of the image sensing chip 54 and the first contact 46 of the substrate 40, so that the signal of the image sensing chip 54 is transmitted to the substrate 40;

步骤五step five

于凹槽内设置黏着介质58Adhesive medium 58 is set in the groove

将为胶体的黏着介质58涂布或喷洒于凹槽52内;Coating or spraying the colloidal adhesive medium 58 in the groove 52;

步骤六step six

离心旋转Centrifugal rotation

进行离心旋转,使黏着介质58均匀地扩散至基板40上表面42;performing centrifugal rotation to spread the adhesive medium 58 evenly to the upper surface 42 of the substrate 40;

步骤七step seven

设置透光层60Set light-transmitting layer 60

如图4所示,将透光层60盖设于凸缘层50上,以包覆住影像感测晶片54而构成成影像感测器;As shown in FIG. 4 , the transparent layer 60 is covered on the flange layer 50 to cover the image sensing chip 54 to form an image sensor;

步骤八step eight

离心旋转Centrifugal rotation

将影像感测器进行离心旋转,使凹槽52内的杂质及影像感测晶片54、透光层60上静电吸附的杂质可掉落至黏着介质58上而被黏着介质58黏着住。The image sensor is rotated centrifugally, so that the impurities in the groove 52 and the electrostatically adsorbed impurities on the image sensor chip 54 and the light-transmitting layer 60 can fall onto the adhesive medium 58 and be stuck by the adhesive medium 58 .

如上所述,凹槽52内的杂质可被黏着介质58黏住,以提高影像感测器的感测品质,且藉由离心旋转方式,原静电附着于影像感测晶片54及透光层60的杂质,亦可掉落至黏着介质58上,故更可提高影像感测器的感测品质。As mentioned above, the impurities in the groove 52 can be stuck by the adhesive medium 58 to improve the sensing quality of the image sensor, and the original static electricity adheres to the image sensor chip 54 and the light-transmitting layer 60 by means of centrifugal rotation. Impurities can also fall onto the adhesive medium 58, thus improving the sensing quality of the image sensor.

Claims (4)

1, a kind of image sensor manufacture method, it comprises step 1: the substrate that is provided with upper and lower surface is provided; Step 2: fixedly install with substrate in upper surface of base plate and to form reeded flange layer; Step 3: the image sensing wafer that will be provided with a plurality of weld pads is fixed in the upper surface of substrate, and is positioned at groove; Step 4: plural wires is electrically connected between the weld pad and substrate of image sensing wafer; After it is characterized in that described electrical connection plural wires step 4, also comprise step 5: will stick together medium and be located in the groove; Step 6: photic zone is covered on the flange layer, constitutes into image sensor to envelope image sensing wafer; Step 7: image sensor is carried out centrifugal rotation, so that diffuse to upper surface of base plate, and the impurity of Electrostatic Absorption on impurity in the groove and image sensing wafer, the photic zone can be fallen to stick together on the medium and the medium that gets adhered sticks together with sticking together homogeneous media.
2, image sensor manufacture method according to claim 1 is characterized in that described upper surface of base plate is formed with a plurality of first contacts; Between the weld pad and substrate first contact of complex lead system electrical connection as sensing wafer.
3, image sensor manufacture method according to claim 1 is characterized in that described the setting carry out centrifugal rotation step after sticking together the medium step in groove.
4, image sensor manufacture method according to claim 1 is characterized in that described the setting stick together medium step system and will stick together medium with coating or spray pattern and be located in the groove in groove.
CNB031020429A 2003-01-27 2003-01-27 Image sensor manufacturing method Expired - Fee Related CN1257542C (en)

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CN1257542C true CN1257542C (en) 2006-05-24

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CN101924081A (en) * 2009-06-15 2010-12-22 鸿富锦精密工业(深圳)有限公司 Image sensor package and image sensor module

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