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CN1137160C - Reversible photosensitive resin containing heteroaryl vinyl side chain and preparation method thereof - Google Patents

Reversible photosensitive resin containing heteroaryl vinyl side chain and preparation method thereof Download PDF

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Publication number
CN1137160C
CN1137160C CNB001357735A CN00135773A CN1137160C CN 1137160 C CN1137160 C CN 1137160C CN B001357735 A CNB001357735 A CN B001357735A CN 00135773 A CN00135773 A CN 00135773A CN 1137160 C CN1137160 C CN 1137160C
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sensitive resin
formula
lateral chain
preparation
reversible light
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CN1319617A (en
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张文勤
庄俊鹏
郑艳
郑鹏武
王淑丽
赵海涛
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Tianjin University
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Tianjin University
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Abstract

The present invention discloses a reversible light-sensitive resin containing a heteroaryl ethylene lateral chain and a preparation method thereof. The resin can form non-meltable insoluble three-dimensional macromolecules for forming films or images in a crosslinking mode under the condition of the radiation of long-wavelength ultraviolet light; crosslinked three-dimensional macromolecules are depolymerized for a new forming linear polymer under the condition of the radiation of short-wavelength ultraviolet light; the present invention has the characteristics of oxidation resistance, moisture resistance and stable storage. The present invention has the preparation method that the present invention can graft a heteroaryl ethylene light functional group which can carry out reversible light loop addition reaction on a polymer molecule chain of polystyrene, etc. The preparation process is simple.

Description

Contain reversible light-sensitive resin of heteroaryl ethylene lateral chain and preparation method thereof
The present invention relates to a kind of reversible light-sensitive resin that contains heteroaryl ethylene lateral chain and preparation method thereof, belong to the technology of preparing of reversible light-sensitive resin.
Photosensitive resin is the simple linear polymer that a class can issue biochemical reaction (normally crosslinking reaction) in rayed, and they obtain widespread use in industries such as opticfiber communication, decorating film material, laser plate-making and printed ICs.More typically have in these photosensitive resins:
1, with the free radical be the acrylate type photosensitive resin of initiator, the crosslinking polymerization of this type of photosensitive resin belongs to radical chain reaction, and is very responsive to oxygen in the air, often needs protection of inert gas during use, and often causes surface aggregate incomplete.
2, with diaryl group iodized salt and uncle's sulfonium salt be the Resins, epoxy type photosensitive resin of cationic photosensitizers, this type of photosensitive resin is very responsive to water in air vapour, needs the exsiccant workshop during curing, uses summer solidification effect bad.
The shelf lives of above photosensitive resin is shorter, the condition of cure harshness.And in case through the illumination crosslinking curing, depolymerization reaction can not take place again generate original oligopolymer.
The object of the present invention is to provide a class to contain reversible light-sensitive resin of heteroaryl ethylene lateral chain and preparation method thereof.This photosensitive resin has the high advantage of oxytolerant, moisture-proof, stable storing, luminous sensitivity and resolving power.Its preparation method is simpler.
For achieving the above object, the present invention is realized by following technical proposals.The invention provides two class reversible light-sensitive resins, it is characterized in that: a class formation formula is shown in 1~3 formula, another kind of structural formula is shown in 4~7 formulas, this two class contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain, at wavelength is the insoluble three-dimensional polymeric molecule of crosslinking polymerization formation not melting under 300~450nm ultraviolet-visible rayed, but and film forming or imaging, be that three-dimensional polymer generation photodepolymerization crosslinked under 250~350nm UV-irradiation regenerates simple linear polymer at wavelength.
Prepare method that the above-mentioned first kind contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain and be that to adopt chloromethylated polystyrene or bromomethylation polystyrene or polyene propyl chloride or the bright basic bromine of polyene or Hydrin be polymer backbone, be solvent then with the dimethyl formamide, with salt of wormwood is acid binding agent, to contain phenolic hydroxyl group or thiol or amino substituted benzaldehyde is grafted on the above-mentioned polymer backbone through nucleophilic substitution reaction, last again will the above-mentioned substituted benzaldehyde of grafting polymkeric substance and the heteroaromatic ring compounds that contains labile methyl group carry out the class aldol reaction or with the heteroaromatic compounds that contains monochloromethyl Wittig (Wittig) reagent carry out condensation reaction and form.
Figure C0013577300041
Formula 1 formula 2 formulas 3
Figure C0013577300042
Y=O, S, NH, NR, NRCH 2X=O, S, NHR 1=H, F, Cl, Br, CN, R, RO, R 2N, RCONH, SO 3HR=is no more than the alkyl of 12 carbon atoms, cyclopentyl, cyclohexyl, vinyl, allyl group, phenyl, benzyl
Prepare method that above-mentioned second class contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain and be that to adopt chloromethylated polystyrene or bromomethylation polystyrene or polyene propyl chloride or the bright basic bromine of polyene or Hydrin or resol be polymer backbone, be solvent then with the dimethyl formamide, with salt of wormwood is acid binding agent, to contain phenolic hydroxyl group or thiol or heteroaromatic ring compounds amino and that contain labile methyl group is grafted on the above-mentioned polymer backbone through nucleophilic substitution reaction, and carry out the class aldol reaction with aromatic aldehyde more at last and form. Formula 4 formulas 5
Figure C0013577300052
Formula 6 formulas 7 Y=O, S, NH, NCH 3, OC; H 2, NRCH 2, X (CH 2) n ' X; N '=1~12X=O, S, NHX '=CH, NR 1=H, F, Cl, Br, CN, R, RO, R 2N, RCONHR 2=H, F, Cl, Br, CN, R, RO, R 2N, RCONHR=are no more than the alkyl of 12 carbon atoms, cyclopentyl, cyclohexyl, vinyl, allyl group, phenyl, benzyl
The electron-microscope scanning picture of accompanying drawing for obtaining after adopting photosensitive resin of the present invention illumination under 2000 order copper mesh cover crosslinked.
Resin of the present invention, because the polymer that has good reversable light sensitive characteristics and be cross-linked into build is easy to the film forming imaging, Therefore oxytolerant, moisture-proof can replace existing acrylic ester type and cationic photosensitive resin, are widely used in fiber optic communication, swash In the industries such as light plate-making, integrated circuit. In the manufacturing process, environmentally safe, process is simple.
With embodiment the present invention is further specified below.
Embodiment one:
Grafting 4-[2-[2-(5-methylbenzoxazole base)] vinyl] chloromethylated polystyrene (CPS-p-P) synthetic of phenoxy group
Get the adding of 3g chloromethylated polystyrene and be equipped with in the 50mL flask of 25mL DMF, add 2.4g 4-hydroxy benzaldehyde and 2.7g Anhydrous potassium carbonate again, on constant temperature blender with magnetic force, be heated to 130 ℃, constant temperature stirring reaction 5 hours.While hot the reaction product impouring is contained in the beaker of 100mL distilled water, separate out a large amount of khaki color precipitations, standing over night, suction filtration gets the khaki color powder.Handle the molten small molecules product that goes with 30mL methyl alcohol, suction filtration again, the chloromethylated polystyrene 4.25g of dry the Powdered grafting 4-of khaki color formyl benzyloxy, 115 ℃-125 ℃ of softening temperatures.
The chloromethylated polystyrene of getting the above-mentioned grafting 4-of 2.38g formyl benzyloxy adds and to be equipped with in the 50mL flask of 15mL DMF, adds 3gKOH and 1.35mL (0.01mol) 2 again, and the 5-benzoxazole dimethyl was in stirring at room 2 hours.The reactant impouring is contained in the large beaker of 200mL distilled water, generate precipitation in a large number, standing over night, the dry light-yellow precipitate that gets of suction filtration.This precipitation adding is contained in the 50mL flask of 20mL methyl alcohol, stirred 30 minutes, get 3.42g yellow powder powder product (CPS-p-PEBOMe) after the suction filtration drying, softening temperature is 140 ℃-150 ℃.
Embodiment two:
Grafting 6-(synthesizing of the chloromethylated polystyrene of 2-styryl) benzoxazole oxygen base
In being housed, the 100mL round-bottomed flask of reflux condensing tube adds 4g 2-methyl-6-Qiang base benzoxazole, 5g chloromethylated polystyrene, 4.5g salt of wormwood and 50mL DMF.Magnetic agitation, hot water bath after 4 hours, in reaction solution impouring 200mL water, form precipitation in a large number in 80 ℃ of heating, leave standstill, and suction filtration, drying gets light grey powdery product 8.66g, 100 ℃-110 ℃ of product softening temperatures.
In the 100mL there-necked flask of reflux condensing tube, micro-dropping funnel is housed, add the above-mentioned grafting 2-methyl of the 1.33g-chloromethylated polystyrene of 6-benzoxazole oxygen base, the potassium hydroxide 2g of grinding, excessive phenyl aldehyde and 15mLDMF.In room temperature magnetic agitation reaction 2 hours.In reaction solution impouring 100mL water, standing over night, suction filtration, washing, methyl alcohol drip washing make the light salmon target product at last, 160 ℃-170 ℃ of softening temperatures.
Embodiment three:
Reversible light-sensitive resin among the embodiment one 1 gram is dissolved in the tetrahydrofuran (THF) of 40mL, coats on the copper coin, cover 2000 order copper mesh after the seasoning, lamp and high pressure mercury 30 minutes, tetrahydrofuran (THF) flushing.Scanning electron microscope analysis imaging situation as shown in drawings.

Claims (4)

1. the reversible light-sensitive resin that contains heteroaryl ethylene lateral chain, its structural formula is shown in 1~3 formula, this contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain, at wavelength is the insoluble three-dimensional polymeric molecule of crosslinking polymerization formation not melting under 300~450nm ultraviolet-visible rayed, but and film forming or imaging, be that three-dimensional polymer generation photodepolymerization crosslinked under 250~350nm UV-irradiation regenerates simple linear polymer at wavelength;
Figure C0013577300021
Formula 1 formula 2 formulas 3
Figure C0013577300022
Y=O, S, NH, NR, NRCH 2X=O, S, NHR 1=H, F, Cl, Br, CN, R, RO, R 2N, RCONH, SO 3HR=is no more than the alkyl of 12 carbon atoms, cyclopentyl, cyclohexyl, vinyl, allyl group, phenyl, benzyl.
2, the reversible light-sensitive resin that contains heteroaryl ethylene lateral chain, its structural formula is shown in 4~7 formulas, this contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain, at wavelength is the insoluble three-dimensional polymeric molecule of crosslinking polymerization formation not melting under 300~450nm ultraviolet-visible rayed, but and film forming or imaging, be that three-dimensional polymer generation photodepolymerization crosslinked under 250~350nm UV-irradiation regenerates simple linear polymer at wavelength;
Figure C0013577300023
Formula 4 formulas 5 Formula 6 formulas 7
Figure C0013577300031
Y=O, S, NH, NCH 3, OCH 2, NRCH 2, X (CH 2) n ' X; N '=1~12X=O, S, NHX '=CH, NR 1=H, F, Cl, Br, CN, R, RO, R 2N, RCONHR 2=H, F, Cl, Br, CN, R, RO, R 2N, RCONHR=are no more than the alkyl of 12 carbon atoms, cyclopentyl, cyclohexyl, vinyl, allyl group, phenyl, benzyl.
3, the said method that contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain of preparation claim 1, it is characterized in that: adopting chloromethylated polystyrene or bromomethylation polystyrene or polyene propyl chloride or polyene propyl bromide or Hydrin is polymer backbone, be solvent then with the dimethyl formamide, with salt of wormwood is acid binding agent, to contain phenolic hydroxyl group or thiol or amino substituted benzaldehyde is grafted on the above-mentioned polymer backbone through nucleophilic substitution reaction, last again will the above-mentioned substituted benzaldehyde of grafting polymkeric substance and the heteroaromatic ring compounds that contains labile methyl group carry out the class aldol reaction or with the heteroaromatic compounds that contains monochloromethyl Wittig (Wittig) reagent carry out condensation reaction and form.
4, the said method that contains the reversible light-sensitive resin of heteroaryl ethylene lateral chain of preparation claim 2, it is characterized in that: adopting chloromethylated polystyrene or bromomethylation polystyrene or polyene propyl chloride or polyene propyl bromide or Hydrin or resol is polymer backbone, be solvent then with the dimethyl formamide, with salt of wormwood is acid binding agent, to contain phenolic hydroxyl group or thiol or heteroaromatic ring compounds amino and that contain labile methyl group is grafted on the above-mentioned polymer backbone through nucleophilic substitution reaction, and carry out the class aldol reaction with aromatic aldehyde more at last and form.
CNB001357735A 2000-12-20 2000-12-20 Reversible photosensitive resin containing heteroaryl vinyl side chain and preparation method thereof Expired - Fee Related CN1137160C (en)

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