CN112147090B - A biochemical analyzer and a method for determining substrate exhaustion in a biochemical reaction - Google Patents
A biochemical analyzer and a method for determining substrate exhaustion in a biochemical reaction Download PDFInfo
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Abstract
一种生化分析仪和生化反应中发生底物耗尽的判断方法，获取样本的反应数据；至少对底物耗尽阈值因试剂干扰引起的变化进行修正，得到修正后的底物耗尽阈值；根据所述样本的反应数据和修正后的底物耗尽阈值判断样本的反应是否发生底物耗尽。
A biochemical analyzer and a method for judging substrate exhaustion in a biochemical reaction, comprising: obtaining reaction data of a sample; correcting at least a change in a substrate exhaustion threshold due to reagent interference to obtain a corrected substrate exhaustion threshold; and judging whether substrate exhaustion occurs in the reaction of the sample based on the reaction data of the sample and the corrected substrate exhaustion threshold.
Description
Technical Field
The invention relates to a biochemical analyzer and a method for judging substrate exhaustion in biochemical reaction.
Background
In biochemical reactions such as kinetic assay, when the enzyme content of the sample is too high, the substrate of the enzyme in the reaction is consumed in a short time, i.e., a substrate depletion phenomenon occurs, which may lead to inaccurate test results. To detect this, manufacturers have provided corresponding schemes to identify and determine whether substrate depletion has occurred in the biochemical reaction.
For recognition and judgment of substrate exhaustion, the following are mainly available.
Scheme one: and comparing the absorbance difference value of the multiple wavelengths of the photometric points in the reaction time with a threshold value to judge whether substrate exhaustion occurs.
Scheme II: and (3) utilizing the absorbance of the dominant wavelength, correcting absorbance change caused by sample interference, and comparing with a threshold value to judge whether substrate exhaustion occurs.
Scheme one is a traditional algorithm scheme, but in a real-time situation, misjudgment or missed judgment of substrate exhaustion often occurs, and the algorithm scheme is not basically adopted at present. When the first scheme is improved, the technician realizes that the inaccuracy of the first scheme is caused by sample interference, so that a second scheme is provided, and the second scheme is a mainstream algorithm scheme for judging whether substrate exhaustion occurs in biochemical reaction.
However, when a biochemical analyzer is used to test a sample, it is still found that the second solution may still generate missed judgment or misjudgment in some cases.
Disclosure of Invention
In view of the above, the present application provides a biochemical analyzer and a method for determining the occurrence of substrate exhaustion in a biochemical reaction.
According to a first aspect, there is provided in one embodiment a biochemical analyzer comprising:
a sample component for carrying a sample;
The sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
A reagent component for carrying a reagent;
The reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
a reaction part having at least one placement position for placing a reaction cup and incubating a reaction liquid in the reaction cup;
The mixing mechanism is used for uniformly mixing the reaction liquid to be uniformly mixed in the reaction cup;
the photodetection component is used for photodetecting the reaction liquid after incubation to obtain reaction data of the sample; wherein:
The processor is used for controlling the sample dispensing mechanism to suck the sample from the sample component and controlling the reagent dispensing mechanism to suck the reagent from the reagent component so as to add the reagent and the sample into the reaction cup; the processor controls the mixing mechanism to mix the reaction liquid formed by the sample and the reagent in the reaction cup, controls the reaction part to incubate the reaction liquid in the reaction cup, and controls the light measurement part to optically measure the incubated reaction liquid to obtain reaction data of the sample; the processor is used for correcting the change of the substrate exhaustion threshold value caused by reagent interference and sample interference to obtain a corrected substrate exhaustion threshold value, and judging whether the reaction of the sample is exhausted or not according to the reaction data of the sample and the corrected substrate exhaustion threshold value: if the reaction of the sample is the reaction of the rising method, judging that the reaction of the sample generates substrate exhaustion when judging that the absorbance in the reaction data of the sample is larger than the substrate exhaustion threshold value after correction; if the reaction of the sample is a reaction of a drop method, when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the reaction of the sample is judged to be substrate depleted.
In one embodiment, the processor corrects the change in the substrate depletion threshold due to reagent interference based on the absorbance at the end of the reaction time in the reaction data for the reagent blank; and correcting the change of the substrate depletion threshold value caused by sample interference according to the absorbance of the first photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, the processor multiplies the absorbance of the end point of the reaction time in the reaction data of the reagent blank by a value obtained by multiplying a liquid amount correction coefficient by a difference value of the absorbance of the first photometric point after the addition of the sample in the reaction data of the sample and the reaction data of the reagent blank, and by adding a substrate depletion conversion threshold to obtain a corrected substrate depletion threshold;
When the reaction of the sample is the reaction of the descent method, the processor multiplies the absorbance of the reaction time end point in the reaction data of the reagent blank by the value obtained by multiplying the difference value of the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and subtracts the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value.
According to a second aspect, there is provided in one embodiment a biochemical analyzer comprising:
a sample component for carrying a sample;
The sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
A reagent component for carrying a reagent;
The reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
a reaction part having at least one placement position for placing a reaction cup and incubating a reaction liquid in the reaction cup;
The mixing mechanism is used for uniformly mixing the reaction liquid to be uniformly mixed in the reaction cup;
the photodetection component is used for photodetecting the reaction liquid after incubation to obtain reaction data of the sample;
A processor for obtaining reaction data of the sample; at least correcting the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold; and judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
In one embodiment, the processor obtains absorbance at the end of the reaction time in the reaction data for the reagent blank, and corrects for changes in the substrate depletion threshold due to reagent interference based on the absorbance.
In one embodiment, when the reaction of the sample is a reaction of a rising method, the processor adds the absorbance to a substrate depletion conversion threshold to correct for a change in the substrate depletion threshold due to reagent interference;
When the reaction of the sample is a reaction of a drop method, the processor subtracts the substrate depletion conversion threshold from the absorbance to correct for a change in the substrate depletion threshold due to reagent interference.
In one embodiment, the processor obtains the reaction data of the reagent blank, and corrects the change of the substrate depletion threshold caused by the sample interference according to the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, the processor corrects the change of the substrate depletion threshold caused by the interference of the sample according to a value obtained by multiplying a liquid quantity correction coefficient by a difference of absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, the processor multiplies the absorbance of the end point of the reaction time in the reaction data of the reagent blank by a value obtained by multiplying a liquid amount correction coefficient by a difference value of absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank, and adds a substrate depletion conversion threshold to obtain a corrected substrate depletion threshold; and when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value, judging that the reaction of the sample is exhausted;
when the reaction of the sample is the reaction of the descent method, the processor multiplies the absorbance of the reaction time end point in the reaction data of the reagent blank by the value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and subtracts a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value; and when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value, judging that the reaction of the sample is subjected to substrate exhaustion.
According to a third aspect, in one embodiment, there is provided a method for determining the occurrence of substrate exhaustion in a biochemical reaction, comprising:
obtaining reaction data of a sample;
At least correcting the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold;
And judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
In one embodiment, the at least correcting for a change in the substrate depletion threshold due to reagent interference comprises:
acquiring reaction data of reagent blank;
And correcting the change of the substrate depletion threshold value caused by reagent interference according to the reaction data of the reagent blank.
In one embodiment, the absorbance at the end of the reaction time in the reaction data of the reagent blank is obtained, and the change of the substrate depletion threshold value due to the reagent interference is corrected according to the absorbance.
In one embodiment, correcting for a change in the substrate depletion threshold due to reagent interference based on the absorbance comprises:
When the reaction of the sample is the reaction of the rising method, adding the absorbance to the substrate depletion conversion threshold value so as to correct the change of the substrate depletion threshold value caused by reagent interference;
when the reaction of the sample is a reaction of a drop method, the substrate depletion conversion threshold value is subtracted from the absorbance to correct the change of the substrate depletion threshold value due to the reagent interference.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, adding the absorbance to the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
And when the reaction of the sample is the reaction of the descent method, subtracting the substrate depletion conversion threshold value from the absorbance to obtain a corrected substrate depletion conversion threshold value.
In one embodiment, the at least correcting for a change in the substrate depletion threshold due to reagent interference comprises: the change in substrate depletion threshold due to sample interference is also corrected.
In one embodiment, correcting for variations in the substrate depletion threshold due to sample interference includes:
acquiring reaction data of reagent blank;
and correcting the change of the substrate depletion threshold value caused by sample interference according to the absorbance of the same photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, the same light measurement point is the first light measurement point.
In an embodiment, the correcting the change of the substrate exhaustion threshold caused by the sample interference according to the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank includes: and correcting the change of the substrate depletion threshold value caused by sample interference according to the value obtained by multiplying the difference value of absorbance of the same measuring point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid quantity correction coefficient.
In one embodiment, the at least correcting for a change in the substrate depletion threshold due to reagent interference comprises:
When the reaction of the sample is the reaction of the rising method, adding the absorbance of the reaction time end point in the reaction data of the reagent blank, adding the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and adding a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
When the reaction of the sample is the reaction of the descent method, the absorbance of the reaction time end point in the reaction data of the reagent blank is added with the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and the substrate depletion conversion threshold value is subtracted, so that the corrected substrate depletion threshold value is obtained.
In one embodiment, the determining method further includes:
if the reaction of the sample is the reaction of the rising method, judging that the reaction of the sample generates substrate exhaustion when judging that the absorbance in the reaction data of the sample is larger than the substrate exhaustion threshold value after correction;
if the reaction of the sample is a reaction of a drop method, when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the reaction of the sample is judged to be substrate depleted.
According to a fourth aspect, there is provided in one embodiment a method for determining the occurrence of substrate depletion in a biochemical reaction, comprising:
adding a reagent and a sample into a reaction cup;
mixing the reaction liquid formed by the sample and the reagent in the reaction cup uniformly;
incubating the reaction liquid in the reaction cup;
Carrying out light measurement on the reaction liquid after incubation to obtain reaction data of a sample;
Correcting the change of the substrate depletion threshold caused by reagent interference and sample interference to obtain a corrected substrate depletion threshold;
Judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value;
if the reaction of the sample is the reaction of the rising method, judging that the reaction of the sample generates substrate exhaustion when judging that the absorbance in the reaction data of the sample is larger than the substrate exhaustion threshold value after correction;
if the reaction of the sample is a reaction of a drop method, when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the reaction of the sample is judged to be substrate depleted.
In one embodiment, the correction for the change in the substrate depletion threshold due to reagent interference and sample interference comprises:
Correcting the change of the substrate depletion threshold value caused by reagent interference according to the absorbance of the reaction time end point in the reaction data of the reagent blank; and
And correcting the change of the substrate depletion threshold value caused by sample interference according to the absorbance of the first photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, adding the absorbance of the reaction time end point in the reaction data of the reagent blank, adding the value obtained by multiplying the difference value of the absorbance of the first photometric point after adding the sample in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and adding a substrate depletion conversion threshold to obtain a corrected substrate depletion threshold;
When the reaction of the sample is the reaction of the descent method, the absorbance of the reaction time end point in the reaction data of the reagent blank is added with the value obtained by multiplying the difference value of the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and the substrate depletion conversion threshold value is subtracted, so that the corrected substrate depletion threshold value is obtained.
According to a fourth aspect, there is provided in one embodiment a computer readable storage medium comprising a program executable by a processor to implement the method disclosed in any one of the embodiments herein.
According to the biochemical analyzer, the judging method of substrate exhaustion in biochemical reaction and the computer readable storage medium of the embodiment, reaction data of a sample are obtained; at least correcting the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold; judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value, and finding that the substrate exhaustion is missed or misjudged due to reagent interference (such as reagent batch difference, reagent bottle opening and other factors) and introducing a new scheme to eliminate the interference, so that the substrate exhaustion missed or misjudgment due to the reagent interference is reduced as much as possible, and a reliable technical scheme for detecting the substrate exhaustion is provided.
Drawings
FIGS. 1 (a) and 1 (b) are graphs showing some of the reactions of the descent method and the ascent method of two reagents, respectively;
FIGS. 2 (a) and 2 (b) are schematic structural views of biochemical analyzers of two embodiments, respectively;
FIG. 3 (a) is a schematic representation of several reaction curves of the descent method;
FIG. 3 (b) is a schematic diagram illustrating how the corrected substrate depletion threshold value is calculated in conjunction with FIG. 3 (a);
FIG. 4 (a) is a schematic representation of several reaction curves of the ascending method;
FIG. 4 (b) is a schematic diagram illustrating how the corrected substrate depletion threshold value is calculated in conjunction with FIG. 4 (a);
FIG. 5 is a flow chart of a method for determining substrate depletion in a biochemical reaction according to one embodiment;
FIG. 6 is a flow chart of an embodiment for correcting for variations in substrate depletion threshold due to reagent interference.
Detailed Description
The application will be described in further detail below with reference to the drawings by means of specific embodiments. Wherein like elements in different embodiments are numbered alike in association. In the following embodiments, numerous specific details are set forth in order to provide a better understanding of the present application. However, one skilled in the art will readily recognize that some of the features may be omitted, or replaced by other elements, materials, or methods in different situations. In some instances, related operations of the present application have not been shown or described in the specification in order to avoid obscuring the core portions of the present application, and may be unnecessary to persons skilled in the art from a detailed description of the related operations, which may be presented in the description and general knowledge of one skilled in the art.
Furthermore, the described features, operations, or characteristics of the description may be combined in any suitable manner in various embodiments. Also, various steps or acts in the method descriptions may be interchanged or modified in a manner apparent to those of ordinary skill in the art. Thus, the various orders in the description and drawings are for clarity of description of only certain embodiments, and are not meant to be required orders unless otherwise indicated.
The numbering of the components itself, e.g. "first", "second", etc., is used herein merely to distinguish between the described objects and does not have any sequential or technical meaning. The term "coupled" as used herein includes both direct and indirect coupling (coupling), unless otherwise indicated.
Aiming at the situation that whether substrate exhaustion occurs in biochemical reaction is still missed or misjudged at time of identification and judgment in each algorithm scheme at present, the inventor carries out intensive research, finally discovers that when the reagent has batch difference, reagent bottle opening and other situations, absorbance change of sample reaction is caused, the misjudgment or missed judgment of substrate exhaustion is likely to be caused, the inventor refers to the phenomenon as misjudgment or missed judgment of substrate exhaustion caused by reagent interference, and therefore the influence of reagent interference on identification and judgment of substrate exhaustion needs to be eliminated.
Several concepts will be described and clarified.
The existing substrate depletion threshold, or pre-correction substrate depletion threshold as described herein, is obtained and formulated in a manner well known to those skilled in the art by testing a plurality of high concentration samples with a reagent to obtain a response curve, and obtaining the substrate depletion threshold based on the test parameters, the response curve, and the test results. Referring to fig. 1 (a) and 1 (b), there are some reaction curves in the reactions of the falling method and the rising method of two reagents, respectively, wherein the lowest dotted line in the falling method is the substrate depletion threshold formulated above, the uppermost dotted line in the rising method is the substrate depletion threshold formulated above, S represents a sample, and R1 and R2 represent the first added reagent and the second added reagent, respectively. The reaction curve in the figure is a reaction curve of a reagent blank, and the reagent blank is a concept commonly used in biochemical tests, for example, a reaction curve of a reagent blank refers to a reaction curve obtained by measuring a sample by replacing the sample with physiological saline according to the amount of the reagent and the sample amount of a normal test. The reagents used in the reagent blank reaction curve of FIG. 1 are the same batch of reagents used to establish the substrate depletion threshold, and may even be the same vial of reagents. The inventors obtained the absorbance at the start or end of the reaction time in the reaction curve of the same batch of reagent blank, noted Lm', and then defined the substrate depletion shift threshold referred to herein as follows: in the descent method, the substrate depletion conversion threshold is equal to Lm' minus the pre-correction substrate depletion threshold (i.e., the substrate depletion threshold formulated above); in the ascending method, the substrate depletion conversion threshold is equal to the pre-correction substrate depletion threshold (i.e., the substrate depletion threshold formulated above) minus Lm'.
The present invention will be described below.
Referring to fig. 2 (a) and 2 (b), a biochemical analyzer is disclosed in an embodiment, and the biochemical analyzer may include a sample component 10, a sample dispensing mechanism 20, a reagent component 30, a reagent dispensing mechanism 40, a reaction component 50, a mixing mechanism 60, a photometric component 70, and a processor 80, which will be described in detail below.
The sample member 10 is for carrying a sample. In some examples, the sample assembly 10 may include a sample distribution Module (SDM, sample Delivery modules) and a front-end rail; in other examples, the sample portion 10 may be a sample tray that includes a plurality of sample locations where sample can be placed, such as sample tubes, and the sample tray may be rotated to dispense the sample to a corresponding location, such as a location for the sample dispensing mechanism 20 to aspirate the sample.
The sample dispensing mechanism 20 is used to aspirate and discharge a sample into a cuvette to be loaded. For example, the sample dispensing mechanism 20 may comprise a sample needle that is moved in two or three dimensions spatially by a two or three dimensional drive mechanism so that the sample needle can be moved to aspirate a sample carried by the sample part 10 and to move to a cuvette to be loaded and discharge the sample to the cuvette.
The reagent component 30 is for carrying a reagent. In one embodiment, the reagent component 30 may be a reagent disk, where the reagent disk is configured in a disk-shaped structure and has a plurality of positions for carrying reagent containers, and the reagent component 30 can rotate and drive the reagent containers carried by the reagent component to rotate to a specific position, for example, a position where the reagent is sucked by the reagent dispensing mechanism 40. The number of reagent components 30 may be one or more.
The reagent dispensing mechanism 40 is used to aspirate and discharge the reagent into the cuvette to be filled with the reagent. In one embodiment, the reagent dispensing mechanism 40 may include a reagent needle that is moved in two or three dimensions by a two or three dimensional drive mechanism so that the reagent needle can be moved to aspirate reagent carried by the reagent component 30 and to move to and discharge reagent to a cuvette to be probed.
The reaction part 50 has at least one place for placing a reaction cup and incubating a reaction solution in the reaction cup. For example, the reaction component 50 may be a reaction disk, which is arranged in a disk-shaped structure, and has one or more placement positions for placing reaction cups, and the reaction disk can rotate and drive the reaction cups in the placement positions to rotate, so as to schedule the reaction cups in the reaction disk and incubate the reaction liquid in the reaction cups.
The mixing mechanism 60 is used for mixing the reaction liquid to be mixed in the reaction cup. The number of blending mechanisms 60 may be one or more.
The photodetection unit 70 is used for photodetecting the reaction solution after incubation, and obtaining reaction data of the sample. For example, the light measuring unit 70 detects the light emission intensity of the reaction solution to be measured, and calculates the concentration of the component to be measured in the sample from the calibration curve. In one embodiment, the photodetection member 70 is separately provided outside the reaction member 50.
The processor 80 is used for acquiring reaction data of the sample; at least correcting the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold; and judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value. The following describes how to correct the change in the substrate depletion threshold due to reagent interference.
In one embodiment, the processor 80 obtains the reaction data of the reagent blank and corrects the change in the substrate depletion threshold (i.e., the substrate depletion threshold formulated above, or the substrate depletion threshold prior to correction) due to the reagent disturbance based on the reaction data of the reagent blank.
In one example, the processor 80 may obtain the absorbance at the start or end of the reaction time in the reaction data for the reagent blank, and correct for the change in the substrate depletion threshold due to reagent interference based on the absorbance. It is to be noted and understood by those skilled in the art that the processor 80 obtains the absorbance at the start or end of the reaction time in the reaction data of the reagent blank, and the reagent used in the actual reaction of the sample to be judged whether the substrate exhaustion occurs are the same condition reagents, for example, the same lot or even the same bottle, and it is understood that they are all reagents sucked from the same bottle of the reagent in a short time interval.
The processor 80 corrects the change of the substrate depletion threshold value due to the reagent interference based on the absorbance, specifically: when the reaction of the sample is a reaction of the rising method, the processor 80 adds the absorbance to the substrate depletion conversion threshold value to correct the change of the substrate depletion threshold value due to the reagent interference; when the reaction of the sample is a reaction of a drop method, the processor 80 subtracts the substrate depletion conversion threshold from the absorbance to correct for a change in the substrate depletion threshold due to reagent interference.
In some examples, when no sample interference only considers reagent interference, the processor 80 adds or subtracts the absorbance to or from the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value, specifically, when the reaction of the sample is a reaction of a rising method, the processor 80 adds the absorbance to the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value, and when the absorbance in the reaction data of the sample is judged to be greater than the corrected substrate depletion threshold value, the processor 80 judges that the reaction of the sample is subjected to substrate depletion; when the reaction of the sample is a reaction of a descent method, the processor 80 subtracts the substrate depletion conversion threshold value from the absorbance to obtain a corrected substrate depletion threshold value, and when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the processor judges that the reaction of the sample is substrate depleted. It is understood that the absorbance herein refers to the absorbance at the start or end of the reaction time in the reaction data of the reagent blank in the first example described above.
In some examples, the reagent interference is considered as well as the sample interference. The processor 80 therefore corrects for variations in the substrate depletion threshold due to sample interference in addition to variations in the substrate depletion threshold due to reagent interference. The processor 80 corrects for variations in the substrate depletion threshold due to sample interference, which may include: the processor 80 acquires the reaction data of the reagent blank, and corrects the change of the substrate depletion threshold value caused by the sample interference according to the reaction data of the sample and the absorbance of the same photometric point, such as the first photometric point, after the sample is added in the reaction data of the reagent blank; it is to be noted and understood by those skilled in the art that the processor 80 obtains the reaction data of the reagent blank, and the reagent is the same as the reagent used in the actual reaction of the sample. For example, the processor 80 corrects the change of the substrate depletion threshold value due to the sample disturbance based on the value obtained by multiplying the difference in absorbance of the same photometric point after adding the sample to the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient. Thus, when the reaction of the sample is a reaction of the rising method, the processor 80 calculates the corrected substrate depletion threshold value by the following formula, taking the reagent interference and the sample interference into consideration at the same time:
Corrected substrate depletion threshold = lm+k (L1-Lb) ± substrate depletion shift threshold.
Wherein Lm refers to absorbance at the start or end of the reaction time in the reaction data for the reagent blank;
L1 and Lb respectively refer to the absorbance of the same photometric point, such as the first photometric point, after the sample is added to the reaction data of the sample and the reaction data of the reagent blank, and K is a liquid amount correction coefficient; it can be seen that Lm and Lb are the absorbance at two different time points in a reagent blank (the reagent used in the reagent blank and the reagent used in the actual reaction of the sample for which it is necessary to determine whether or not the substrate depletion has occurred are the same conditions), one is the absorbance at the start or end of the reaction time, and one is the absorbance at the first photometric point, for example, after the sample is added.
When the reaction of the sample is a reaction of the rising method, the above formula is to add a substrate depletion conversion threshold, for example, the absorbance at the end of the reaction time in the reaction data of the reagent blank, the difference between the absorbance at the same measuring point after adding the sample in the reaction data of the sample and the reaction data of the reagent blank is multiplied by a liquid amount correction coefficient, and the substrate depletion conversion threshold is added, so as to obtain a corrected substrate depletion threshold. Processor 80 determines that the reaction of the sample is substrate depleted when it is determined that the absorbance in the reaction data of the sample is greater than the corrected substrate depletion threshold.
When the reaction of the sample is a reaction of a descent method, the above formula is to subtract the substrate depletion conversion threshold, for example, the absorbance at the end point of the reaction time in the reaction data of the reagent blank is added to the difference between the absorbance at the same measuring point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank, and the substrate depletion conversion threshold is subtracted to obtain the corrected substrate depletion threshold. Processor 80 determines that the reaction of the sample is under substrate depletion when it determines that the absorbance in the reaction data of the sample is less than the modified substrate depletion threshold. In one embodiment, the fluid quantity correction factor may be determined by:
K1＝VR1/(VR1+VS)；
K2＝(VR1+VS)/(VR1+VS+VR2)；
K3＝(VR1+VS+VR2)/(VR1+VS+VR2+VR3)；
K3＝(VR1+VS+VR2+VR3)/(VR1+VS+VR2+VR3+VR4);
S represents a sample, R1, R2, R3 and R4 represent four reagents, and correspondingly, V S、VR1、VR2、VR3 and V R4 represent the volumes of the sample, the reagent R1, the reagent R2, the reagent R3 and the reagent R4 added in the reaction respectively; for example, a single reagent reaction, the addition of which is not limited to reagent R1; the reaction of the double reagents can be sequentially added with a reagent R1, a sample S and a reagent R2; the reaction of the three reagents can be sequentially added with a reagent R1, a sample S, a reagent R2 and a reagent R3; the reaction of four reagents may be sequentially added as reagent R1, sample S, reagent R2, reagent R3 and reagent R4. K1, K2, K3 and K4 represent the liquid amount correction coefficient of the single reagent reaction, the liquid amount correction coefficient of the double reagent reaction, the liquid amount correction coefficient of the three reagent reaction and the liquid amount correction coefficient of the four reagent reaction, respectively. The flow correction coefficients for five-reagent or other multi-reagent reactions are similarly calculated and will not be described in detail herein.
For example, please refer to fig. 3 (a) and fig. 3 (b). 3 (a) is four reaction curves or reaction data of the descent method, line 1 is a reaction curve which is interfered (for example, sample interference and reagent interference) and in which substrate depletion occurs, line 2 is a reaction curve which is not interfered and in which substrate depletion occurs, line 3 is a reaction curve which is not interfered and in which substrate depletion does not occur, line 4 is a reaction curve of a reagent blank, and similarly, a reagent used in the reagent blank of line 4 and a reagent used in a sample actual reaction which needs to determine whether substrate depletion occurs are the same conditions, for example, if a line which needs to determine whether substrate depletion occurs in the sample actual reaction is line 1, a reagent used in line 4 and line 1 are the same conditions. FIG. 3 (b) shows lines 1, 2 and 4 of FIG. 3 (a), where Lm is first obtained from the reagent blank reaction curve line 4, for example, the example shown in the figure is absorbance at the end of reaction time in the reaction data where Lm is the reagent blank; lb can also be obtained from the line 4 in the figure, for example, lb is the absorbance of the first photometric point after adding the sample to the reaction data of the reagent blank; if it is to be judged whether the substrate is exhausted in the sample reaction of the line 1, L1 can be obtained from the reaction curve line 1 of the sample, for example, L1 is the absorbance of the first photometric point after the sample is added in the reaction data of the sample, wherein the reaction of two reagents is shown in the figure, for example, the reagent R1 can be added first, then the sample S can be added, then the absorbance of the first photometric point after the sample S is added can be obtained, and finally the reagent R2 can be added; similarly, if it is to be determined whether the reaction of the sample of line 2 is substrate depleted, L1 is obtained from the reaction curve of the sample line 2, and it can be seen that the value of L1 is waiting for Lb. According to the formula, the substrate depletion threshold value after correction=lm+k (L1-Lb) -substrate depletion conversion threshold value, and the substrate depletion conversion threshold value is equal to Lm' minus the substrate depletion threshold value before correction is substituted into the formula, so that the following can be obtained:
post-correction substrate depletion threshold = lm+k (L1-Lb) - (Lm' -pre-correction substrate depletion threshold value)
=Lm-Lm' +k (L1-Lb) +pre-correction substrate depletion threshold;
it can be seen that Lm is the absorbance in the reagent blank using the same reagent as that used in the actual reaction of the sample, while Lm 'is the absorbance in the reagent blank using the same or the same lot of reagent as that used in the determination of substrate depletion before the correction, and that the interference of the reagent in the determination of substrate depletion can be eliminated or reduced by Lm-Lm'. In fig. 3 (b), by taking an example of determining whether the substrate is depleted in the sample reaction of line 1, it can be seen that the absorbance of the disturbed reaction curve represented by line 1 is less than the modified substrate depletion threshold after a certain time, so that the processor 80 can correctly determine that the substrate is depleted in the reaction of the sample represented by the disturbed line 1.
Similarly, please refer to fig. 4 (a) and fig. 4 (b). Fig. 4 (a) shows four reaction curves or reaction data of the rising method, line 1 shows a reaction curve in which substrate depletion occurs due to interference (for example, sample interference and reagent interference), line 2 shows a reaction curve in which substrate depletion occurs due to interference, line 3 shows a reaction curve in which substrate depletion does not occur due to interference, line 4 shows a reaction curve in which substrate depletion does not occur, and similarly, the reagent used in the reagent blank of line 4 shows a reagent in which the same condition is applied to the reagent used in the actual reaction of the sample in which substrate depletion occurs or not, and for example, if the line in which substrate depletion occurs or not is required to be determined is line 1, the reagent used in line 4 and the reagent used in line 1 show a reagent in which the same condition is applied. FIG. 4 (b) shows lines 1,2 and 4 of FIG. 4 (a), where Lm is first obtained from the reagent blank reaction curve line 4, for example, the example shown in the figure is absorbance at the end of reaction time in the reaction data where Lm is the reagent blank; lb can also be obtained from the line 4 in the figure, for example, lb is the absorbance of the first photometric point after adding the sample to the reaction data of the reagent blank; if it is to be judged whether the substrate is exhausted in the sample reaction of the line 1, L1 can be obtained from the reaction curve line 1 of the sample, for example, L1 is the absorbance of the first photometric point after the sample is added in the reaction data of the sample, wherein the reaction of two reagents is shown in the figure, for example, the reagent R1 can be added first, then the sample S can be added, then the absorbance of the first photometric point after the sample S is added can be obtained, and finally the reagent R2 can be added; similarly, if it is to be determined whether the reaction of the sample of line 2 is substrate depleted, L1 is obtained from the reaction curve of the sample line 2, and it can be seen that the value of L1 is waiting for Lb. According to the formula, the substrate depletion threshold value=lm+k (L1-Lb) +the substrate depletion conversion threshold value after correction can be calculated, and the substrate depletion conversion threshold value is equal to the substrate depletion threshold value before correction minus Lm' and is substituted into the formula, so that the following can be obtained:
post-correction substrate depletion threshold = Lm + K (L1-Lb) + (pre-correction substrate depletion threshold-Lm')
=Lm-Lm' +k (L1-Lb) +pre-correction substrate depletion threshold;
It can be seen that Lm is the absorbance in the reagent blank using the same reagent as that used in the actual reaction of the sample, while Lm 'is the absorbance in the reagent blank using the same or the same lot of reagent as that used in the determination of substrate depletion before the correction, and that the interference of the reagent in the determination of substrate depletion can be eliminated or reduced by Lm-Lm'. ; in fig. 4 (b), by taking the example of determining whether the substrate is depleted in the sample reaction of line 1, it can be seen that the absorbance of the disturbed reaction curve represented by line 1 is greater than the modified substrate depletion threshold after a certain period of time, so that the processor 80 can correctly determine that the substrate is depleted in the reaction of the sample represented by the disturbed line 1.
After the processor 80 judges that the reaction of the sample is exhausted, various measures can be taken, for example, the processor 80 can search the scope of the light measuring points participating in the calculation of the reactivity according to the corrected substrate exhaustion threshold value to complete the expansion calculation of the test result in the reaction time or outside the reaction time; for example, processor 80 may also give different outcome identifications depending on the degree of substrate depletion; for another example, the processor 80 may also alert to the user.
The absorbance herein may refer to absorbance of the dominant wavelength, absorbance of the sub wavelength, absorbance of the dominant wavelength-sub wavelength, and the like.
In an embodiment of the present invention, a method for determining substrate exhaustion in biochemical reaction (hereinafter referred to as a determination method) is further disclosed, referring to fig. 5, the determination method includes steps 100 to 300, which are specifically described below.
Step 100: reaction data of the sample is obtained. For example, in one embodiment reagents and samples may be added to the cuvette; mixing the reaction liquid formed by the sample and the reagent in the reaction cup uniformly; incubating the reaction liquid in the reaction cup; and carrying out light measurement on the reaction liquid after incubation to obtain reaction data of the sample.
Step 200: and correcting at least the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold.
Step 300: and judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
Step 200 is described in detail below.
Referring to fig. 6, step 200 may include steps 210 and 220 in one embodiment.
Step 210: reaction data for reagent blanks were obtained. Similar to the above, step 210 obtains reaction data for a reagent blank, where the reagent is the same as that used in the actual reaction of the sample.
Step 220: and correcting the change of the substrate depletion threshold value caused by reagent interference according to the reaction data of the reagent blank.
In one example, step 220 may obtain absorbance at the beginning or end of the reaction time in the reaction data for the reagent blank, and correct for a change in the substrate depletion threshold due to reagent interference based on the absorbance. In the above example, step 220 may be to correct the change of the substrate depletion threshold caused by the reagent interference according to the absorbance, i.e. the absorbance at the start or end of the reaction time in the reaction data of the reagent blank:
When the reaction of the sample is the reaction of the rising method, adding the absorbance to the substrate depletion conversion threshold value so as to correct the change of the substrate depletion threshold value caused by reagent interference;
when the reaction of the sample is a reaction of a drop method, the substrate depletion conversion threshold value is subtracted from the absorbance to correct the change of the substrate depletion threshold value due to the reagent interference.
Under the condition that no sample interference only considers reagent interference, step 220 adds or subtracts the absorbance to or from a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value, specifically, when the reaction of the sample is a reaction of an ascending method, step 220 adds the absorbance to the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value, and step 300 judges that the reaction of the sample generates substrate depletion when judging that the absorbance in the reaction data of the sample is greater than the corrected substrate depletion threshold value; when the reaction of the sample is a reaction of a descent method, step 220 subtracts the substrate depletion conversion threshold value from the absorbance to obtain a corrected substrate depletion threshold value, and step 300 judges that the reaction of the sample is substrate depleted when judging that the absorbance in the reaction data of the sample is smaller than the corrected substrate depletion threshold value.
In some examples, the reagent interference is considered as well as the sample interference. Step 200 therefore corrects for variations in the substrate depletion threshold due to sample interference in addition to variations in the substrate depletion threshold due to reagent interference. Step 200 corrects for variations in the substrate depletion threshold due to sample interference, which may include: step 200 obtains reaction data of the reagent blank, and corrects a change of the substrate depletion threshold caused by sample interference according to the reaction data of the sample and absorbance of the same photometric point, for example, a first photometric point, after the sample is added to the reaction data of the reagent blank. For example, step 200 corrects the change of the substrate depletion threshold caused by the sample interference according to the value obtained by multiplying the difference of absorbance of the same photometric point after adding the sample to the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient. Therefore, when the reaction of the sample is a reaction of the rising method while considering both the reagent interference and the sample interference, step 200 adds the absorbance of the start point or the end point of the reaction time in the reaction data of the reagent blank, the value obtained by multiplying the difference of the absorbance of the same photometric point, for example, the first photometric point, by a liquid amount correction coefficient after adding the sample to the reaction data of the sample and the reaction data of the reagent blank, and adds the substrate depletion conversion threshold to obtain the corrected substrate depletion threshold, and step 300 judges that the substrate depletion occurs in the reaction of the sample when judging that the absorbance in the reaction data of the sample is greater than the corrected substrate depletion threshold; when the reaction of the sample is a reaction of a descent method, step 200 multiplies the absorbance of the start point or the end point of the reaction time in the reaction data of the reagent blank by a liquid amount correction coefficient, and subtracts the substrate depletion conversion threshold to obtain a corrected substrate depletion threshold, and step 300 judges that the reaction of the sample is substrate depleted when judging that the absorbance in the reaction data of the sample is less than the corrected substrate depletion threshold.
The application discloses a biochemical analyzer and a judging method for substrate exhaustion in biochemical reaction, which find that the substrate exhaustion is missed or misjudged caused by reagent interference (such as reagent batch difference, reagent bottle opening and other factors), and introduce a new scheme to eliminate the interference, thereby reducing the substrate exhaustion missed or misjudgment caused by reagent interference as much as possible and providing a reliable technical scheme for detecting the substrate exhaustion.
Those skilled in the art will appreciate that all or part of the functions of the various methods in the above embodiments may be implemented by hardware, or may be implemented by a computer program. When all or part of the functions in the above embodiments are implemented by means of a computer program, the program may be stored in a computer readable storage medium, and the storage medium may include: read-only memory, random access memory, magnetic disk, optical disk, hard disk, etc., and the program is executed by a computer to realize the above-mentioned functions. For example, the program is stored in the memory of the device, and when the program in the memory is executed by the processor, all or part of the functions described above can be realized. In addition, when all or part of the functions in the above embodiments are implemented by means of a computer program, the program may be stored in a storage medium such as a server, another computer, a magnetic disk, an optical disk, a flash disk, or a removable hard disk, and the program in the above embodiments may be implemented by downloading or copying the program into a memory of a local device or updating a version of a system of the local device, and when the program in the memory is executed by a processor.
The foregoing description of the invention has been presented for purposes of illustration and description, and is not intended to be limiting. Several simple deductions, modifications or substitutions may also be made by a person skilled in the art to which the invention pertains, based on the idea of the invention.
Claims (24)
1. A biochemical analyzer, comprising:
a sample component for carrying a sample;
The sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
A reagent component for carrying a reagent;
The reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
a reaction part having at least one placement position for placing a reaction cup and incubating a reaction liquid in the reaction cup;
The mixing mechanism is used for uniformly mixing the reaction liquid to be uniformly mixed in the reaction cup;
the photodetection component is used for photodetecting the reaction liquid after incubation to obtain reaction data of the sample; wherein:
The processor is used for controlling the sample dispensing mechanism to suck the sample from the sample component and controlling the reagent dispensing mechanism to suck the reagent from the reagent component so as to add the reagent and the sample into the reaction cup; the processor controls the mixing mechanism to mix the reaction liquid formed by the sample and the reagent in the reaction cup, controls the reaction part to incubate the reaction liquid in the reaction cup, and controls the light measurement part to optically measure the incubated reaction liquid to obtain reaction data of the sample; the processor is used for correcting the change of the substrate exhaustion threshold value caused by reagent interference and sample interference to obtain a corrected substrate exhaustion threshold value, and judging whether the reaction of the sample is exhausted or not according to the reaction data of the sample and the corrected substrate exhaustion threshold value: if the reaction of the sample is the reaction of the rising method, judging that the reaction of the sample generates substrate exhaustion when judging that the absorbance in the reaction data of the sample is larger than the substrate exhaustion threshold value after correction; if the reaction of the sample is a reaction of a drop method, when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the reaction of the sample is judged to be substrate depleted.
2. The biochemical analyzer of claim 1, wherein the processor corrects for a change in the substrate depletion threshold due to reagent interference based on absorbance at the end of reaction time in the reaction data for the reagent blank; and correcting the change of the substrate depletion threshold value caused by sample interference according to the absorbance of the first photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
3. The biochemical analyzer of claim 2, wherein:
When the reaction of the sample is the reaction of the rising method, the processor multiplies the absorbance of the reaction time end point in the reaction data of the reagent blank by the value obtained by multiplying the difference value of the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and adds a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
When the reaction of the sample is the reaction of the descent method, the processor multiplies the absorbance of the reaction time end point in the reaction data of the reagent blank by the value obtained by multiplying the difference value of the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and subtracts the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value.
4. A biochemical analyzer, comprising:
a sample component for carrying a sample;
The sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
A reagent component for carrying a reagent;
The reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
a reaction part having at least one placement position for placing a reaction cup and incubating a reaction liquid in the reaction cup;
The mixing mechanism is used for uniformly mixing the reaction liquid to be uniformly mixed in the reaction cup;
the photodetection component is used for photodetecting the reaction liquid after incubation to obtain reaction data of the sample;
A processor for obtaining reaction data of the sample; correcting the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold; and judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
5. The biochemical analyzer of claim 4, wherein the processor obtains absorbance at the end of a reaction time in the reaction data for the reagent blank, and corrects for a change in the substrate depletion threshold due to reagent interference based on the absorbance.
6. The biochemical analyzer of claim 5, wherein:
When the reaction of the sample is a reaction of a rising method, the processor adds the absorbance to a substrate depletion conversion threshold value to correct the change of the substrate depletion threshold value caused by reagent interference;
When the reaction of the sample is a reaction of a drop method, the processor subtracts the substrate depletion conversion threshold from the absorbance to correct for a change in the substrate depletion threshold due to reagent interference.
7. The biochemical analyzer according to any one of claims 4 to 6, wherein the processor acquires reaction data of the reagent blank, and corrects a change in the substrate exhaustion threshold due to interference of the sample based on absorbance of the same photometric point after adding the sample to the reaction data of the sample and the reaction data of the reagent blank.
8. The biochemical analyzer of claim 7, wherein the processor corrects for variations in the substrate depletion threshold due to sample interference based on a value obtained by multiplying a liquid volume correction factor by a difference in absorbance at the same photometric point after adding the sample to the reaction data of the sample and the reaction data of the reagent blank.
9. The biochemical analyzer of claim 8, wherein:
When the reaction of the sample is the reaction of the rising method, the processor multiplies the absorbance of the reaction time end point in the reaction data of the reagent blank by the value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and adds a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value; and when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value, judging that the reaction of the sample is exhausted;
when the reaction of the sample is the reaction of the descent method, the processor multiplies the absorbance of the reaction time end point in the reaction data of the reagent blank by the value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and subtracts a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value; and when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value, judging that the reaction of the sample is subjected to substrate exhaustion.
10. A method for determining the occurrence of substrate exhaustion in a biochemical reaction, comprising:
Obtaining reaction data of a sample, wherein the reaction data is obtained by carrying out light measurement on reaction liquid after incubation is completed, and the reaction liquid is formed by the sample and a reagent;
Correcting the change of the substrate depletion threshold caused by reagent interference to obtain a corrected substrate depletion threshold;
And judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
11. The method of determining according to claim 10, wherein correcting for a change in the substrate depletion threshold due to reagent interference comprises:
acquiring reaction data of reagent blank;
And correcting the change of the substrate depletion threshold value caused by reagent interference according to the reaction data of the reagent blank.
12. The method according to claim 11, wherein the absorbance at the end of the reaction time in the reaction data of the reagent blank is obtained, and the change in the substrate depletion threshold due to the reagent interference is corrected based on the absorbance.
13. The method according to claim 11, wherein correcting the change in the substrate depletion threshold due to the reagent interference based on the absorbance comprises:
When the reaction of the sample is the reaction of the rising method, adding the absorbance to the substrate depletion conversion threshold value so as to correct the change of the substrate depletion threshold value caused by reagent interference;
when the reaction of the sample is a reaction of a drop method, the substrate depletion conversion threshold value is subtracted from the absorbance to correct the change of the substrate depletion threshold value due to the reagent interference.
14. The method of determining as claimed in claim 13, wherein:
when the reaction of the sample is the reaction of the rising method, adding the absorbance to the substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
And when the reaction of the sample is the reaction of the descent method, subtracting the substrate depletion conversion threshold value from the absorbance to obtain a corrected substrate depletion threshold value.
15. The judgment method according to any one of claims 10 to 13, further comprising: the change in substrate depletion threshold due to sample interference is also corrected.
16. The method of determining according to claim 15, wherein correcting for a change in the substrate depletion threshold due to sample interference comprises:
acquiring reaction data of reagent blank;
and correcting the change of the substrate depletion threshold value caused by sample interference according to the absorbance of the same photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
17. The method of claim 16, wherein the same spot is the first spot.
18. The method of claim 17, wherein the step of correcting the change in the substrate depletion threshold due to sample interference based on the absorbance of the same photometric point after adding the sample to the reaction data of the sample and the reaction data of the reagent blank comprises: and correcting the change of the substrate depletion threshold value caused by sample interference according to the value obtained by multiplying the difference value of absorbance of the same measuring point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid quantity correction coefficient.
19. The method of determining as claimed in claim 18, wherein:
When the reaction of the sample is the reaction of the rising method, adding the absorbance of the reaction time end point in the reaction data of the reagent blank, adding the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and adding a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
When the reaction of the sample is the reaction of the descent method, the absorbance of the reaction time end point in the reaction data of the reagent blank is added with the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and the substrate depletion conversion threshold value is subtracted, so that the corrected substrate depletion threshold value is obtained.
20. The method of determining as claimed in claim 19, further comprising:
if the reaction of the sample is the reaction of the rising method, judging that the reaction of the sample generates substrate exhaustion when judging that the absorbance in the reaction data of the sample is larger than the substrate exhaustion threshold value after correction;
if the reaction of the sample is a reaction of a drop method, when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the reaction of the sample is judged to be substrate depleted.
21. A method for determining the occurrence of substrate exhaustion in a biochemical reaction, comprising:
adding a reagent and a sample into a reaction cup;
mixing the reaction liquid formed by the sample and the reagent in the reaction cup uniformly;
incubating the reaction liquid in the reaction cup;
Carrying out light measurement on the reaction liquid after incubation to obtain reaction data of a sample;
Correcting the change of the substrate depletion threshold caused by reagent interference and sample interference to obtain a corrected substrate depletion threshold;
Judging whether the reaction of the sample is subjected to substrate exhaustion according to the reaction data of the sample and the corrected substrate exhaustion threshold value;
if the reaction of the sample is the reaction of the rising method, judging that the reaction of the sample generates substrate exhaustion when judging that the absorbance in the reaction data of the sample is larger than the substrate exhaustion threshold value after correction;
if the reaction of the sample is a reaction of a drop method, when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold value, the reaction of the sample is judged to be substrate depleted.
22. The method of determining according to claim 21, wherein correcting for variations in the substrate depletion threshold due to reagent interference and sample interference comprises:
Correcting the change of the substrate depletion threshold value caused by reagent interference according to the absorbance of the reaction time end point in the reaction data of the reagent blank; and
And correcting the change of the substrate depletion threshold value caused by sample interference according to the absorbance of the first photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
23. The method of determining as claimed in claim 22, wherein:
When the reaction of the sample is the reaction of the rising method, adding the absorbance of the reaction time end point in the reaction data of the reagent blank, adding the value obtained by multiplying the difference value of the absorbance of the first light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and adding a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
When the reaction of the sample is the reaction of the descent method, the absorbance of the reaction time end point in the reaction data of the reagent blank is added with the value obtained by multiplying the difference value of the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and the substrate depletion conversion threshold value is subtracted, so that the corrected substrate depletion threshold value is obtained.
24. A computer readable storage medium comprising a program executable by a processor to implement the method of any one of claims 10 to 23.
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