CN111996501B - 原料气化装置和镀膜设备及其气化方法 - Google Patents
原料气化装置和镀膜设备及其气化方法 Download PDFInfo
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- CN111996501B CN111996501B CN202010729972.XA CN202010729972A CN111996501B CN 111996501 B CN111996501 B CN 111996501B CN 202010729972 A CN202010729972 A CN 202010729972A CN 111996501 B CN111996501 B CN 111996501B
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- gasification
- raw material
- chamber
- feed
- heating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (23)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010729972.XA CN111996501B (zh) | 2020-07-27 | 2020-07-27 | 原料气化装置和镀膜设备及其气化方法 |
| US18/016,847 US12492470B2 (en) | 2020-07-27 | 2021-06-25 | Raw material gasification device, film coating device, film coating apparatus and feeding method therefor |
| EP21851416.4A EP4190939A4 (en) | 2020-07-27 | 2021-06-25 | RAW MATERIAL GASIFICATION DEVICE, FILM COATING DEVICE, FILM COATING APPARATUS AND FEEDING METHOD THEREFOR |
| PCT/CN2021/102447 WO2022022188A1 (zh) | 2020-07-27 | 2021-06-25 | 原料气化装置和镀膜装置以及镀膜设备及其进料方法 |
| JP2023503491A JP7556128B2 (ja) | 2020-07-27 | 2021-06-25 | 原料気化装置、コーティング装置、コーティング機器及びその材料投入方法 |
| TW110127270A TWI830038B (zh) | 2020-07-27 | 2021-07-23 | 原料氣化裝置以及鍍膜設備 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010729972.XA CN111996501B (zh) | 2020-07-27 | 2020-07-27 | 原料气化装置和镀膜设备及其气化方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111996501A CN111996501A (zh) | 2020-11-27 |
| CN111996501B true CN111996501B (zh) | 2022-03-04 |
Family
ID=73467765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010729972.XA Active CN111996501B (zh) | 2020-07-27 | 2020-07-27 | 原料气化装置和镀膜设备及其气化方法 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111996501B (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022022188A1 (zh) * | 2020-07-27 | 2022-02-03 | 江苏菲沃泰纳米科技股份有限公司 | 原料气化装置和镀膜装置以及镀膜设备及其进料方法 |
| CN114686852A (zh) * | 2020-12-28 | 2022-07-01 | 江苏菲沃泰纳米科技股份有限公司 | 镀膜系统、供料设备及其方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106119781A (zh) * | 2016-07-27 | 2016-11-16 | 京东方科技集团股份有限公司 | 蒸发装置、蒸镀设备和蒸镀方法 |
| CN206502865U (zh) * | 2017-02-14 | 2017-09-19 | 无锡荣坚五金工具有限公司 | 一种纳米镀膜设备化学原料汽化装置 |
| CN108103450A (zh) * | 2017-12-28 | 2018-06-01 | 成都中建材光电材料有限公司 | 一种薄膜沉积装置及沉积方法 |
| CN110983300A (zh) * | 2019-12-04 | 2020-04-10 | 江苏菲沃泰纳米科技有限公司 | 镀膜设备及其应用 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI415961B (zh) * | 2011-04-21 | 2013-11-21 | Creating Nano Technologies Inc | 抗汙薄膜之常壓蒸鍍方法 |
| DE102014109195A1 (de) * | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung |
-
2020
- 2020-07-27 CN CN202010729972.XA patent/CN111996501B/zh active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106119781A (zh) * | 2016-07-27 | 2016-11-16 | 京东方科技集团股份有限公司 | 蒸发装置、蒸镀设备和蒸镀方法 |
| CN206502865U (zh) * | 2017-02-14 | 2017-09-19 | 无锡荣坚五金工具有限公司 | 一种纳米镀膜设备化学原料汽化装置 |
| CN108103450A (zh) * | 2017-12-28 | 2018-06-01 | 成都中建材光电材料有限公司 | 一种薄膜沉积装置及沉积方法 |
| CN110983300A (zh) * | 2019-12-04 | 2020-04-10 | 江苏菲沃泰纳米科技有限公司 | 镀膜设备及其应用 |
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| Publication number | Publication date |
|---|---|
| CN111996501A (zh) | 2020-11-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: No.182, East Ring Road, Yuqi supporting area, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Applicant after: Jiangsu feiwotai nanotechnology Co.,Ltd. Address before: No. 108, Xixian Road, Meicun street, Xinwu District, Wuxi City, Jiangsu Province, 214112 Applicant before: Jiangsu Favored Nanotechnology Co.,Ltd. |
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| CB02 | Change of applicant information | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Raw material gasification equipment and coating equipment and their gasification methods Granted publication date: 20220304 Pledgee: Wuxi Branch of China CITIC Bank Co.,Ltd. Pledgor: Jiangsu feiwotai nanotechnology Co.,Ltd. Registration number: Y2024980016337 |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Granted publication date: 20220304 Pledgee: Wuxi Branch of China CITIC Bank Co.,Ltd. Pledgor: Jiangsu feiwotai nanotechnology Co.,Ltd. Registration number: Y2024980016337 |
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| PC01 | Cancellation of the registration of the contract for pledge of patent right |