CN1119300C - Process for preparing low-hydroxyl quartz tube - Google Patents
Process for preparing low-hydroxyl quartz tube Download PDFInfo
- Publication number
- CN1119300C CN1119300C CN00112310A CN00112310A CN1119300C CN 1119300 C CN1119300 C CN 1119300C CN 00112310 A CN00112310 A CN 00112310A CN 00112310 A CN00112310 A CN 00112310A CN 1119300 C CN1119300 C CN 1119300C
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- China
- Prior art keywords
- quartz tube
- hydroxyl
- temperature
- production method
- heating chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 77
- 239000010453 quartz Substances 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 25
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 238000001354 calcination Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 21
- 238000005516 engineering process Methods 0.000 abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 6
- 238000005086 pumping Methods 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 239000012535 impurity Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 229960001866 silicon dioxide Drugs 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
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- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
The present invention relates to a production method for a low-hydroxyl quartz tube. A quartz tube which is already treated by drawing is placed in a closed heating chamber. The internal pressure of the closed heating chamber can reach 5*10<-1>-5*10<-4> pascals by pumping air to the outside, and the temperature is gradually raised to 950 to 1250 DEG C; the quartz tube is calcined for 3 to 20 hours at a constant temperature, and the internal air pressure is stabilized to 5*10<-1>-5*10<-4> pascals by continuously pumping air out. The quartz tube is cooled, normal pressure is recovered, and the quartz tube can be taken out after the chamber is opened. Due to the adoption of high temperature and high vacuum de-hydroxyl technology, large negative pressure is formed inside and outside the quartz glass tube; thus, hydroxyls in the deep layers among lattices of silicon dioxide are easier to escape, the de-hydroxyl operation is more thorough, and the content of hydroxyls in the quartz tube treated by the de-hydroxyl operation can be greatly reduced.
Description
The present invention relates to a kind of production method of silica tube, particularly reduce the method for hydroxy radical content in the silica tube.
Have now in the manufacturing process of public low-hydroxyl quartz tube, the deshydroxy way that reduces hydroxy radical content in the silica tube is: will draw good silica tube and insert in the airtight heating chamber, carry out under nitrogen atmosphere 1000-1050 ℃ of following high-temperature roasting 3-5 hour.Hydroxyl in the silica tube is present between the silicon-dioxide lattice; comparatively stable under the normal temperature; can slowly discharge under the high temperature, overflow; but owing to pass to the malleation that nitrogen protection forms 111.46 pascals in the conventional deshydroxy process; the deep layer hydroxyl is overflowed comparatively difficult; so adopt this method can only slough the hydroxyl on surface and top layer, and silica tube deep layer and whole deshydroxy can not be thorough.As: to original impurity 30ppm, the silica tube of hydroxy radical content 130ppm, adopt this method deshydroxy after, hydroxy radical content still reaches 8-20ppm in the silica tube.In addition, if nitrogen gas purity also can cause new pollution to silica tube inadequately.
The purpose of invention is to overcome above-mentioned the deficiencies in the prior art part exactly, and a kind of production method of utilizing the low-hydroxyl quartz tube of the hydroxy radical content in the negative pressure drop low quartz pipe is provided.
Purpose of the present invention and task can be finished by implementing following technical proposal: a kind of production method of low-hydroxyl quartz tube, good silica tube will be drawn, insert in the airtight heating chamber, carry out high-temperature roasting, be characterized in: before high-temperature roasting, make airtight heating chamber internal pressure reach 5 * 10 by outside pump drainage air earlier
-1-5 * 10
-4Pascal rises to 950-1250 ℃ gradually with temperature then, keeps constant temperature calcining 3-20 hour, and the pump drainage air makes airtight heating chamber internal gas pressure be stabilized in 5 * 10 continuously simultaneously
-1-5 * 10
-4Pascal after high-temperature roasting, through cooling, recovers normal pressure, and the chamber of opening goes out pipe.Significantly reduce the technique effect of the hydroxy radical content in the silica tube with negative pressure with the Dary.
Purpose of the present invention can also further reach by following scheme.The production method of aforesaid low-hydroxyl quartz tube is characterized in that in the process of high-temperature roasting, the pressure-stabilisation that makes heating chamber is 3 * 10
-3Near the pascal.To obtain best effect, value at cost.
Purpose of the present invention can also further reach by following scheme.The production method of aforesaid low-hydroxyl quartz tube is characterized in that temperature remains on 1000-1200 ℃ in above-mentioned roasting process, and keeps constant temperature 5-8 hour.To obtain best effect, value at cost.
Purpose of the present invention can also further reach by following scheme.The production method of aforesaid low-hydroxyl quartz tube is characterized in before blow-on goes out pipe, feeds the protection of high pure nitrogen or argon gas or helium.To prevent atmospheric pollution.
The present invention compared with prior art, owing to adopted high temperature, high vacuum deshydroxy technology, formed very big negative pressure inside and outside the quartz glass tube, the feasible hydroxyl that was present in the deep layer between quartz glass tube silicon-dioxide lattice originally, easier effusion, the quartz glass tube deshydroxy is more thorough, behind the deshydroxy in the silica tube hydroxy radical content reduce significantly.As: original impurity 30ppm, the silica tube of hydroxy radical content 130ppm, behind method deshydroxy of the present invention, its hydroxy radical content is no more than 3ppm, and hydroxy radical content is well below original technology.
Embodiment one.The following examples have further described summary of the invention of the present invention.The production method of the low-hydroxyl quartz tube of present embodiment is with original impurity 30ppm, and the silica tube of hydroxy radical content 130ppm places in the airtight process furnace, opens vacuum system, treats that vacuum tightness reaches 3 * 10 in the stove
-3Behind the pascal, progressively temperature in the stove is increased to 1200 ℃, the pump drainage air makes the interior vacustat of stove 3 * 10 continuously
-3Pascal.Keep constant temperature calcining progressively cooling after 6 hours, lead to into an amount of high-pure helium gas shiled at last before blow-on, prevent atmospheric pollution, recover normal pressure, blow-on goes out pipe.Its silica tube product hydroxy radical content is reduced to 2.5ppm after testing, has reduced 8ppm than the same raw produce of original technology.
Embodiment two.The following examples continue to describe summary of the invention of the present invention, and the production method of the low-hydroxyl quartz tube of present embodiment is with original impurity 30ppm, and the silica tube of hydroxy radical content 130ppm places in the airtight process furnace, open vacuum system, treat that furnace pressure reaches 5 * 10
-1After pascal's vacuum tightness, progressively temperature in the stove is increased to 1000 ℃, the pump drainage air makes the interior vacustat of stove 5 * 10 continuously
-1Pascal.Keep constant temperature calcining progressively cooling after 20 hours, recover normal pressure, blow-on goes out pipe.Its silica tube product hydroxy radical content is reduced to below the 3ppm after testing, has reduced 7.5ppm than the same raw produce of original technology.
Embodiment three.The following examples continue to describe summary of the invention of the present invention.The production method of the low-hydroxyl quartz tube of present embodiment is with original impurity 30ppm, and the silica tube of hydroxy radical content 130ppm places in the airtight process furnace, opens vacuum system, treats that vacuum tightness reaches 5 * 10 in the stove
-4Behind the pascal, progressively temperature in the stove is increased to 1250 ℃, the pump drainage air makes the interior vacustat of stove 5 * 10 continuously
-4Pascal.Keep constant temperature calcining progressively cooling after 3 hours, lead to into an amount of high-purity argon gas protection at last and prevent atmospheric pollution before blow-on, recover normal pressure, blow-on goes out pipe.Its silica tube product hydroxy radical content is reduced to 2.8ppm after testing, has reduced 7.7ppm than the same raw produce of original technology.
Embodiment four.The following examples continue to describe summary of the invention of the present invention.The production method of the low-hydroxyl quartz tube of present embodiment is with original impurity 30ppm, and the silica tube of hydroxy radical content 130ppm places in the airtight process furnace, opens vacuum system, treats that vacuum tightness reaches 3 * 10 in the stove
-3Behind the pascal, progressively temperature in the stove is increased to 950 ℃, the pump drainage air makes the interior vacustat of stove 3 * 10 continuously
-3Pascal.Keep constant temperature calcining progressively cooling after 8 hours, lead to into an amount of high pure nitrogen protection at last and prevent atmospheric pollution before blow-on, recover normal pressure, blow-on goes out pipe.Its silica tube product hydroxy radical content is reduced to 2.9ppm after testing, has reduced 7.6ppm than the same raw produce of original technology.
Claims (4)
1, a kind of production method of low-hydroxyl quartz tube with drawing good silica tube, is inserted in the airtight heating chamber, carries out high-temperature roasting, it is characterized in that: before high-temperature roasting, make airtight heating chamber internal pressure reach 5 * 10 by outside pump drainage air earlier
-1-5 * 10
-4Pascal rises to 950-1250 ℃ gradually with temperature then, keeps constant temperature calcining 3-20 hour, and the pump drainage air makes airtight heating chamber internal gas pressure be stabilized in 5 * 10 continuously simultaneously
-1-5 * 10
-4Pascal after high-temperature roasting, through cooling, recovers normal pressure, and the chamber of opening goes out pipe.
2, the production method of low-hydroxyl quartz tube according to claim 1 is characterized in that in the process of high-temperature roasting, the pressure-stabilisation that makes heating chamber is 3 * 10
-3Pascal.
3, the production method of low-hydroxyl quartz tube according to claim 1 is characterized in that temperature remains on 1000-1200 ℃ in above-mentioned roasting process, and keeps constant temperature 5-8 hour.
4, the production method of low-hydroxyl quartz tube according to claim 1 is characterized in that before blow-on goes out pipe, feeds the protection of high pure nitrogen or argon gas or helium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN00112310A CN1119300C (en) | 2000-05-25 | 2000-05-25 | Process for preparing low-hydroxyl quartz tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN00112310A CN1119300C (en) | 2000-05-25 | 2000-05-25 | Process for preparing low-hydroxyl quartz tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1273948A CN1273948A (en) | 2000-11-22 |
| CN1119300C true CN1119300C (en) | 2003-08-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN00112310A Expired - Fee Related CN1119300C (en) | 2000-05-25 | 2000-05-25 | Process for preparing low-hydroxyl quartz tube |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1119300C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105859112A (en) * | 2016-03-30 | 2016-08-17 | 江苏圣达石英制品有限公司 | Treating process for photosensitive quartz tube |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1942081B1 (en) | 2007-01-02 | 2011-11-09 | Draka Comteq B.V. | Extended baking process for quartz glass deposition tubes. |
| CN102311219A (en) * | 2011-09-29 | 2012-01-11 | 连云港华源石英制品有限公司 | Production method of low-hydroxylic bactericidal deodorant quartz tube |
| CN111087179B (en) * | 2019-12-03 | 2021-09-21 | 连云港海源石英制品有限公司 | Preparation method of colorless transparent low-hydroxyl ultraviolet-filtering quartz glass tube for car lamp |
| CN111362565A (en) * | 2020-02-24 | 2020-07-03 | 东海县奥博石英制品有限公司 | Large-diameter quartz tube expanding and shrinking method |
| CN115557677B (en) * | 2022-10-21 | 2024-03-15 | 高晓云 | Quartz tube manufacturing method and quartz tube |
| CN115872606B (en) * | 2022-10-21 | 2024-05-14 | 高晓云 | Method for melting quartz tube by utilizing electric arc and quartz tube electric arc melting equipment |
| CN117682753B (en) * | 2023-03-31 | 2025-04-15 | 福耀高性能玻璃科技(福建)有限公司 | Glass body exhaust method and device, vacuum glass and manufacturing method thereof |
| CN118598505A (en) * | 2024-06-24 | 2024-09-06 | 中天科技精密材料有限公司 | A kind of low hydroxyl quartz glass and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1122783A (en) * | 1994-05-26 | 1996-05-22 | 赫罗伊斯石英玻璃有限公司 | Method and apparatus for making quartz glass plate |
-
2000
- 2000-05-25 CN CN00112310A patent/CN1119300C/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1122783A (en) * | 1994-05-26 | 1996-05-22 | 赫罗伊斯石英玻璃有限公司 | Method and apparatus for making quartz glass plate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105859112A (en) * | 2016-03-30 | 2016-08-17 | 江苏圣达石英制品有限公司 | Treating process for photosensitive quartz tube |
| CN105859112B (en) * | 2016-03-30 | 2018-10-23 | 江苏圣达石英制品有限公司 | A kind for the treatment of process of photosensitive quartz ampoule |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1273948A (en) | 2000-11-22 |
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