[go: up one dir, main page]

CN111813263A - Thermoforming repair particles and method - Google Patents

Thermoforming repair particles and method Download PDF

Info

Publication number
CN111813263A
CN111813263A CN202010663326.8A CN202010663326A CN111813263A CN 111813263 A CN111813263 A CN 111813263A CN 202010663326 A CN202010663326 A CN 202010663326A CN 111813263 A CN111813263 A CN 111813263A
Authority
CN
China
Prior art keywords
repair
inner core
conductive
cracks
stack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202010663326.8A
Other languages
Chinese (zh)
Other versions
CN111813263B (en
Inventor
许雅筑
林柏青
李嘉甄
余蕙均
萧靖平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interface Optoelectronics Shenzhen Co Ltd
Interface Technology Chengdu Co Ltd
General Interface Solution Ltd
Original Assignee
Interface Optoelectronics Shenzhen Co Ltd
Interface Technology Chengdu Co Ltd
General Interface Solution Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Interface Optoelectronics Shenzhen Co Ltd, Interface Technology Chengdu Co Ltd, General Interface Solution Ltd filed Critical Interface Optoelectronics Shenzhen Co Ltd
Priority to CN202010663326.8A priority Critical patent/CN111813263B/en
Priority to TW109123964A priority patent/TWI757796B/en
Publication of CN111813263A publication Critical patent/CN111813263A/en
Application granted granted Critical
Publication of CN111813263B publication Critical patent/CN111813263B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/10Forming by pressure difference, e.g. vacuum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B29C51/14Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor using multilayered preforms or sheets
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/20Design optimisation, verification or simulation
    • G06F30/25Design optimisation, verification or simulation using particle-based methods
    • H10W70/092
    • H10W70/65
    • H10W70/66
    • H10W90/701
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2119/00Details relating to the type or aim of the analysis or the optimisation
    • G06F2119/08Thermal analysis or thermal optimisation
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Computer Hardware Design (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • Laminated Bodies (AREA)

Abstract

A method for thermoplastic forming includes adding multiple repairing particles in a laminated layer, heating the laminated layer to make the inner cores of the repairing particles form conductive liquid, stretching the laminated layer to make the conductive layer of the laminated layer form multiple cracks and make the shells of the repairing particles break under stress, releasing the conductive liquid formed by the inner cores of the repairing particles and filling the cracks with the repairing particles, and forming multiple repairing conductors in the cracks by the conductive liquid. The method can reduce the resistance value of the conductive layer raised by cracks in the stretching process and improve the stretching capability of the conductive material.

Description

热塑成形的修复粒子及方法Thermoforming repair particles and method

技术领域technical field

本公开涉及热塑成形的修复粒子和方法。The present disclosure relates to thermoforming repair particles and methods.

背景技术Background technique

在非平面电子产品的制程中,形成曲面或任意形状的非平面是重要的步骤,其中又以热塑成形较适合应用于已承载导线或电子元件的电子产品。然而在热塑成形的拉伸制程中,极易破坏基板上的导电材料造成断线。在各种导电材料具有拉伸极限限制的情况下,需要新的开发方向以增加导电材料的拉伸能力和塑形可能性。In the manufacturing process of non-planar electronic products, forming a curved surface or a non-planar surface of any shape is an important step, and thermoplastic forming is more suitable for electronic products that already carry wires or electronic components. However, in the stretching process of thermoplastic forming, it is easy to damage the conductive material on the substrate and cause wire breakage. With various conductive materials having stretch limit limitations, new development directions are required to increase the stretchability and shapeability of conductive materials.

发明内容SUMMARY OF THE INVENTION

一种应用于热塑成形的修复粒子,修复粒子包括内核和外壳,其中内核具有导电性和低于热塑成形制程温度的内核熔点,包覆内核的外壳则具有高于热塑成形之制程温度的外壳熔点,且外壳受力破裂后会释出内核形成的导电液。在一些实施例中,内核包括镓、镓铟合金或锡铋合金。在一些实施例中,内核包括溶于有机溶剂中的碳黑。在一些实施例中,外壳包括聚尿素甲醛树脂或金属氧化物。A repair particle for thermoplastic forming, the repair particle includes an inner core and an outer shell, wherein the inner core has electrical conductivity and a melting point of the inner core lower than the temperature of the thermoplastic forming process, and the outer shell covering the inner core has a process temperature higher than the thermoplastic forming process temperature. The melting point of the outer shell, and the conductive liquid formed by the inner core will be released after the outer shell is ruptured by force. In some embodiments, the core includes gallium, a gallium-indium alloy, or a tin-bismuth alloy. In some embodiments, the inner core includes carbon black dissolved in an organic solvent. In some embodiments, the outer shell includes polyurea formaldehyde resin or metal oxide.

一种应用于热塑成形的叠层,包括基板、位于基板上的导电层、位于导电层上的保护层和添加于叠层中的复数个修复粒子,其中修复粒子包括内核和外壳,内核在热塑成形中形成导电液,外壳在热塑成形中破裂释出导电液。在一些实施例中,修复粒子的添加位置包括导电层之中、导电层与基板之间、导电层与保护层之间或保护层之中。在一些实施例中,以导电层和修复粒子的体积为分母,修复粒子的添加量在范围10vol%至30vol%。在一些实施例中,经过热塑成形后,叠层进一步包括复数个裂痕和复数个修复导体,其中裂痕位于导电层之中且裂痕的长边方向约垂直于热塑成形的拉伸方向,修复导体由导电液位于裂痕中所形成且修复导体连接裂痕的相对侧壁。在一些实施例中,叠层为触控面板的触控层。A laminate for thermoplastic forming, comprising a substrate, a conductive layer on the substrate, a protective layer on the conductive layer, and a plurality of repair particles added to the laminate, wherein the repair particles include an inner core and an outer shell, and the inner core is in the The conductive fluid is formed during the thermoplastic forming, and the casing is ruptured during the thermoplastic forming to release the conductive fluid. In some embodiments, the location where the repair particles are added includes in the conductive layer, between the conductive layer and the substrate, between the conductive layer and the protective layer, or in the protective layer. In some embodiments, with the volume of the conductive layer and the repair particles as the denominator, the addition amount of the repair particles ranges from 10 vol% to 30 vol%. In some embodiments, after thermoplastic forming, the laminate further includes a plurality of cracks and a plurality of repair conductors, wherein the cracks are located in the conductive layer and the longitudinal direction of the cracks is approximately perpendicular to the stretching direction of the thermoplastic forming, the repair The conductor is formed by the conductive liquid located in the crack and repairs the opposite side walls of the conductor connection crack. In some embodiments, the stack is a touch layer of a touch panel.

一种热塑成形的方法,包括在叠层中添加复数个修复粒子、加热叠层使修复粒子的内核形成导电液、拉伸平直的叠层成曲形、使叠层的导电层形成复数个裂痕并且使修复粒子的外壳受力破裂、修复粒子释出内核形成的导电液并填入裂痕,以及导电液形成复数个修复导体在裂痕中。在一些实施例中,内核在加热后为熔融态,且内核形成的导电液在降温后形成修复导体。在一些实施例中,内核在加热后为液态,且内核形成的导电液在干燥后形成修复导体。在一些实施例中,方法可应用于模内成形或模内电子制程。A method of thermoplastic forming, comprising adding a plurality of repair particles in a stack, heating the stack to form a conductive liquid in the inner core of the repair particles, stretching the straight stack into a curved shape, and forming a plurality of conductive layers of the stack to form a conductive liquid. A crack is caused and the outer shell of the repair particle is ruptured by force, the repair particle releases the conductive liquid formed by the inner core and fills the crack, and the conductive liquid forms a plurality of repair conductors in the crack. In some embodiments, the inner core is in a molten state after heating, and the conductive liquid formed by the inner core forms a repair conductor after cooling down. In some embodiments, the inner core is in a liquid state after heating, and the conductive liquid formed by the inner core forms a repair conductor after drying. In some embodiments, the method may be applied to in-mold forming or in-mold electronics processes.

附图说明Description of drawings

当结合附图阅读时,从以下详细描述中可以最好地理解本公开的各方面。应注意,根据工业中的标准方法,各种特征未按比例绘制。实际上,为了清楚地谈及,可任意增加或减少各种特征的尺寸。Aspects of the present disclosure are best understood from the following detailed description when read in conjunction with the accompanying drawings. It should be noted that in accordance with standard methods in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or decreased for clarity of reference.

图1A至图1C根据一些实施例,绘示在热塑成形制程各步骤中,热塑成形设备的截面图。1A-1C illustrate cross-sectional views of a thermoplastic forming apparatus during various steps of a thermoplastic forming process, according to some embodiments.

图2根据一些实施例,绘示在拉伸制程中导电材料的俯视图。2 illustrates a top view of a conductive material during a stretching process, according to some embodiments.

图3根据一些实施例,绘示添加修复粒子于导电层中的叠层截面图。3 is a cross-sectional view of a stack of adding repair particles to a conductive layer, according to some embodiments.

图4根据一些实施例,绘示修复粒子的截面图。4 illustrates a cross-sectional view of a repair particle, according to some embodiments.

图5根据一些实施例,绘示在拉伸制程中,添加修复粒子之导电材料的俯视图。5 illustrates a top view of a conductive material to which repair particles are added during a stretching process, according to some embodiments.

图6至图8根据一些实施例,绘示添加修复粒子于导电层以外之材料层的叠层截面图。FIGS. 6-8 are stacked cross-sectional views illustrating adding repair particles to material layers other than the conductive layer, according to some embodiments.

附图标记:Reference number:

100:叠层 104:导电层100: Laminate 104: Conductive layer

110:模具 120:加热器110: Mould 120: Heater

200,500:裂痕 300,600,700,800:叠层200,500: Crack 300,600,700,800: Laminate

302,602,702,802:基板 304,604,704,804:导电层302,602,702,802: Substrate 304,604,704,804: Conductive layer

306,606,706,806:保护层 400:修复粒子306, 606, 706, 806: Protective Layer 400: Repair Particles

402:内核 404:外壳402: kernel 404: shell

402′:修复导体 708,808:粒子层402′: Repair conductor 708, 808: Particle layer

A:干净干燥空气 H:进气孔A: Clean and dry air H: Air intake

R:区域 W:直径R: area W: diameter

X,Y,Z:轴X, Y, Z: axis

具体实施方式Detailed ways

为了实现提及主题的不同特征,以下公开内容提供了许多不同的实施例或示例。以下描述组件、材料、配置等等的具体示例以简化本公开。当然,这些仅仅是示例,而不是限制性的。其他组件、材料、配置等等也在考虑中。例如,在以下的描述中,在第二特征之上或上方形成第一特征可以包括第一特征和第二特征以直接接触形成的实施例,并且还可以包括在第一特征和第二特征之间形成附加特征,使得第一特征和第二特征可以不直接接触的实施例。另外,本公开可以在各种示例中重复参考数字和/或字母。此重复是为了简单和清楚的目的,并且本身并不表示所谈及的各种实施例和/或配置之间的关系。The following disclosure provides many different embodiments or examples for implementing different features of the mentioned subject matter. Specific examples of components, materials, configurations, etc. are described below to simplify the present disclosure. Of course, these are only examples and not limiting. Other components, materials, configurations, etc. are also under consideration. For example, in the following description, forming a first feature on or over a second feature may include embodiments in which the first feature and the second feature are formed in direct contact, and may also include an embodiment between the first feature and the second feature Embodiments in which additional features are formed between the first and second features so that the first and second features may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and/or letters in various instances. This repetition is for the purpose of simplicity and clarity, and does not in itself represent a relationship between the various embodiments and/or configurations discussed.

此外,本文可以使用空间相对术语,诸如「在…下面」、「在…下方」、「偏低」、「在…上面」、「偏上」等,以便于描述一个元件或特征与如图所示的另一个元件或特征的关系。除了图中所示的取向之外,空间相对术语旨在包括使用或操作中的装置的不同取向。装置可以以其他方式定向(旋转90度或在其他方向上),并且同样可以相应地解释在此使用的空间相对描述符号。Furthermore, spatially relative terms, such as "below", "below", "lower", "above", "above", etc., may be used herein to facilitate describing an element or feature as relationship to another element or feature shown. In addition to the orientation shown in the figures, spatially relative terms are intended to encompass different orientations of the device in use or operation. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

本公开揭露一种修复粒子,可应用于包括热塑成形的塑形制程,例如模内成形(In-MoldForming,IMF)、模内电子(In-Mold Electron,IME)等。在热塑成形制程中加热并拉伸具有导线之基板,例如可挠式或曲形触控面板的触控层。后续将以热塑成形的实施例进行说明,然而应理解,含有加热并拉伸的其他变化制程也在本公开的范围内。The present disclosure discloses a repair particle, which can be applied to a molding process including thermoplastic forming, such as in-mold forming (In-Mold Forming, IMF), in-mold electron (In-Mold Electron, IME) and the like. Substrates with wires, such as touch layers of flexible or curved touch panels, are heated and stretched in a thermoplastic forming process. Thermoforming examples will be described below, however it should be understood that other variations involving heating and stretching are within the scope of the present disclosure.

本公开揭露一种具有低熔点内核的修复粒子,并将修复粒子添加到具有导电层的叠层中。当导电层在热塑成形中因每个部份受力不同而产生程度不一的裂痕时,修复粒子同时释出内核形成的导电液。导电液在导电层的裂痕中形成稳定导体,降低导电层原先因受损而升高的电阻值,以解决热塑成形造成的断线问题。The present disclosure discloses a repair particle with a low melting point core, and the repair particle is added to a stack having a conductive layer. When the conductive layer has different degrees of cracks due to different forces on each part during the thermoplastic forming, the repair particles release the conductive liquid formed by the inner core at the same time. The conductive liquid forms a stable conductor in the cracks of the conductive layer, and reduces the resistance value of the conductive layer that was originally increased due to damage, so as to solve the problem of wire breakage caused by thermoplastic forming.

根据一些实施例,图1A至图1C是热塑成形装置在X-Z平面的截面图。为绘示清楚的目的,图1A至图1C仅绘示简化后的热塑成形装置。因此,在本公开的范围内,热塑成形装置可包括未绘示于图示中的额外部件。热塑成型的步骤包括加热、拉伸、冷却,分别绘示于图1A至图1C中。包括加热、拉伸、冷却以外步骤的热塑成形,也在本公开的范围内。1A-1C are cross-sectional views of a thermoplastic forming apparatus in the X-Z plane, according to some embodiments. For the purpose of illustration clarity, FIGS. 1A to 1C only illustrate a simplified thermoplastic forming apparatus. Accordingly, within the scope of the present disclosure, the thermoplastic forming apparatus may include additional components not shown in the figures. The steps of thermoplastic forming include heating, stretching, and cooling, which are shown in FIGS. 1A to 1C , respectively. Thermoforming, including steps other than heating, stretching, and cooling, is also within the scope of this disclosure.

根据一些实施例,图1A是热塑成形装置在加热步骤的截面图。叠层100在模具110上,且加热器120在叠层100上并覆盖叠层100。叠层100包括基板、导电层和保护层形成的叠层,并可包括其他材料层或电子元件在其中或其上。模具110用于拉伸制程中,可包括叠层100经热塑成形后的任意形状。加热器120可将叠层100加热至制程温度使基板软化,软化程度足以在后续制程中将基板拉伸塑形成预期的形状。1A is a cross-sectional view of a thermoplastic forming apparatus during a heating step, according to some embodiments. The stack 100 is on the mold 110 and the heater 120 is on and covering the stack 100 . The stack 100 includes a stack of substrates, conductive layers, and protective layers, and may include layers of other materials or electronic components therein or thereon. The mold 110 is used in the stretching process, and may include any shape of the laminate 100 after being thermoformed. The heater 120 may heat the stack 100 to a process temperature to soften the substrate, to a degree sufficient to stretch the substrate into a desired shape during subsequent processes.

根据一些实施例,图1B是热塑成形装置在拉伸步骤,且叠层100正拉伸变形的截面图。在一些实施例中,加热器120可具有进气孔H,使干净干燥空气(Clean Dry Air,CDA)A可穿过进气孔H并加压在模具110中的叠层100上,如图1B所绘示。在模具110中已软化的叠层100受到干净干燥空气A的加压而逐渐拉伸变形,使原本平直的叠层100拉伸成曲形,最终叠层100贴合模具110的上表面。在一些实施例中,加热器120为不具有进气孔H的压板,且模具110的底部可具有穿透模具110的抽气孔,抽气孔可抽取叠层100和模具110之间的空气,使叠层100在拉伸步骤是受到真空吸引而拉伸贴合模具110的上表面。在一些实施例中,加热器120可具有进气孔H,且模具110的底部可具有穿透模具110的抽气孔,使叠层100同时受到干净干燥空气A的加压和真空吸引而拉伸贴合模具110的上表面。1B is a cross-sectional view of a thermoplastic forming apparatus in a stretching step, and the laminate 100 is being stretched, according to some embodiments. In some embodiments, the heater 120 may have an air inlet H, so that Clean Dry Air (CDA) A may pass through the air inlet H and be pressurized on the stack 100 in the mold 110, as shown in FIG. 1B is shown. In the mold 110 , the softened laminate 100 is gradually stretched and deformed by the pressure of clean and dry air A, so that the originally flat laminate 100 is stretched into a curved shape, and finally the laminate 100 is attached to the upper surface of the mold 110 . In some embodiments, the heater 120 is a pressing plate without an air intake hole H, and the bottom of the mold 110 may have an air suction hole penetrating the mold 110, and the air suction hole can extract the air between the stack 100 and the mold 110, so that the In the stretching step, the laminate 100 is drawn by vacuum to be stretched against the upper surface of the mold 110 . In some embodiments, the heater 120 may have an air inlet hole H, and the bottom of the mold 110 may have an air suction hole penetrating the mold 110 , so that the laminate 100 can be stretched by the pressure and vacuum suction of the clean dry air A at the same time. Fit the upper surface of the mold 110 .

根据一些实施例,图1C是热塑成形装置在冷却步骤的截面图。叠层100贴合模具110的上表面,并逐渐冷却到非软化温度,使叠层100脱离模具110时具有拉伸后形状。1C is a cross-sectional view of a thermoplastic forming apparatus during a cooling step, according to some embodiments. The laminate 100 is attached to the upper surface of the mold 110 and is gradually cooled to a non-softening temperature so that the laminate 100 has a stretched shape when released from the mold 110 .

根据一些实施例,图2是图1B中区域R在X-Y平面的俯视放大图。为清楚绘示的目的,图2仅绘示叠层100中的导电材料104,然而如上述,叠层100可包括基板、保护层、其他材料层、电子元件等。在拉伸步骤中,基板拉伸变形对导电材料具有破坏力,使叠层100中的导电材料104可产生裂痕200。裂痕200可为不规则形状并多为狭长型,裂痕200的长边方向约垂直于叠层100拉伸变形的方向。裂痕200可出现在导电材料104之中,亦可出现在导电材料104的边缘。裂痕200可使叠层100电阻值上升、产生断线现象。FIG. 2 is an enlarged top view of the region R in FIG. 1B in the X-Y plane, according to some embodiments. For the purpose of clarity of illustration, FIG. 2 only shows the conductive material 104 in the stack 100 , however, as mentioned above, the stack 100 may include substrates, protective layers, layers of other materials, electronic components, and the like. During the stretching step, the stretching deformation of the substrate has a destructive force on the conductive material, so that the conductive material 104 in the stack 100 may generate cracks 200 . The cracks 200 may be irregular in shape and are mostly elongated, and the longitudinal direction of the cracks 200 is approximately perpendicular to the direction of the tensile deformation of the laminate 100 . Cracks 200 may occur in conductive material 104 or may occur at the edges of conductive material 104 . The cracks 200 can increase the resistance value of the laminate 100 and cause disconnection.

为克服导电材料在热塑成形拉伸过程中产生裂痕并断线之现象,本公开提供一种修复粒子,并将修复粒子添加于包括导电材料的叠层之中,使导电材料在拉伸过程中受损的同时,修复粒子可修补导电材料中的裂痕,降低拉伸造成的电阻差异和元件驱动问题。In order to overcome the phenomenon that the conductive material is cracked and broken during the thermoplastic forming and stretching process, the present disclosure provides a repair particle, and the repair particle is added to the stack including the conductive material, so that the conductive material is stretched during the stretching process. Repairing particles repair cracks in conductive materials, reducing resistance differences and component drive issues caused by stretching.

根据一些实施例,图3是叠层300在X-Z平面的截面图。叠层300的组成类似于叠层100,包括但不限于基板、导电材料、保护层、其他材料层、电子元件等,且叠层300也可用于如图1A至图1C所绘示的热塑拉伸制程中。在一些实施例中,平直的叠层300经过图1B中所示拉伸制程后为曲形,使叠层300可成为曲形或可挠式触控面板的触控层。3 is a cross-sectional view of the stack 300 in the X-Z plane, according to some embodiments. The composition of the stack 300 is similar to the stack 100, including but not limited to substrates, conductive materials, protective layers, other material layers, electronic components, etc., and the stack 300 can also be used for thermoplastics as shown in FIGS. 1A-1C during the stretching process. In some embodiments, the flat laminate 300 is curved after the stretching process shown in FIG. 1B , so that the laminate 300 can be a touch layer of a curved or flexible touch panel.

在一些实施例中,叠层300包括基板302、在基板302上的导电层304和保护层306。基板302的材料可以是塑胶薄膜(例如聚碳酸酯(Polycarbonate,PC)薄膜)。基板302的熔点(例如,大于200℃)高于热塑成形中加热步骤的制程温度(例如,145℃),但在制程温度下,基板302可软化以进行后续拉伸塑形。导电层304的材料可以是银胶(silver paste)、纳米银、聚二氧乙基噻吩与聚苯乙烯磺酸的复合物(PEDOT:PSS)等导电材料,导电材料的熔点可选择在热塑成形的制程温度中不会形成熔融态,例如当制程温度为145℃时,可选用银胶(熔点为960℃)、纳米银(熔点为150℃)等。保护层306的材料可以是氧化物,并覆盖保护层306下方的导电层304。In some embodiments, stack 300 includes substrate 302 , conductive layer 304 and protective layer 306 on substrate 302 . The material of the substrate 302 may be a plastic film (eg, a polycarbonate (PC) film). The melting point (eg, greater than 200° C.) of the substrate 302 is higher than the process temperature (eg, 145° C.) of the heating step in thermoplastic forming, but at the process temperature, the substrate 302 can be softened for subsequent stretching. The material of the conductive layer 304 can be a conductive material such as silver paste, nano-silver, a composite of polydioxyethylthiophene and polystyrene sulfonic acid (PEDOT:PSS), and the melting point of the conductive material can be selected in the thermoplastic resin. The forming process temperature will not form a molten state. For example, when the process temperature is 145°C, silver glue (melting point is 960°C), nano silver (melting point is 150°C), etc. can be used. The material of the protective layer 306 may be oxide, and covers the conductive layer 304 under the protective layer 306 .

和叠层100不同的地方是,叠层300添加了修复粒子400在导电层304中。在一些实施例中,修复粒子400添加于导电层304的溶液中,并一同涂布于基板302上形成叠层300的导电层304,如图3所绘示。Unlike stack 100 , stack 300 incorporates repair particles 400 in conductive layer 304 . In some embodiments, the repair particles 400 are added to the solution of the conductive layer 304 and coated on the substrate 302 together to form the conductive layer 304 of the stack 300 , as shown in FIG. 3 .

根据一些实施例,图4是导电粒子400的截面图。修复粒子400为球状双层结构,包括内核402和外壳404。在一些实施例中,修复粒子400的直径W可为1微米至5微米,然而也可使用更大或更小的直径W。4 is a cross-sectional view of conductive particle 400, according to some embodiments. The repair particle 400 is a spherical double-layer structure including a core 402 and an outer shell 404 . In some embodiments, the diameter W of the repair particles 400 may be 1 to 5 microns, although larger or smaller diameters W may also be used.

修复粒子400的内核402是导电材料,同时亦为修补导电层304中裂痕的主成分。在一些实施例中,内核402具有在热塑成形的加热步骤形成可流动态的特性。可选择内核402的熔点介于热塑成形的制程温度和室温之间,使内核402在拉伸步骤处于熔融态。熔融的内核402形成之导电液在导电层304拉伸受力的过程中,可同时填补拉伸造成的裂痕,使导电层304因受损而升高的电阻值下降,以达到修补导电层304的目的。The inner core 402 of the repairing particle 400 is a conductive material, and is also the main component of the repairing crack in the conductive layer 304 . In some embodiments, the inner core 402 has the property of being flowable during the heating step of thermoforming. The melting point of the inner core 402 may be selected to be between the thermoplastic forming process temperature and room temperature, so that the inner core 402 is in a molten state during the stretching step. The conductive liquid formed by the molten inner core 402 can simultaneously fill the cracks caused by the stretching during the process of the conductive layer 304 being stretched and stressed, so that the increased resistance value of the conductive layer 304 due to damage decreases, so as to repair the conductive layer 304 the goal of.

在一些实施例中,熔融态的内核402在热塑成形的冷却步骤,可于室温中形成固体,并成为连接导电层304裂痕处的稳定导体。在其他的一些实施例中,内核402熔点可低于室温,在修补导电层304之后,内核402的导电液在热塑成形冷却步骤可形成氧化层于流体表面,限制内核402流体的流动行为,以形成导电层304裂痕中的稳定导体。在一些实施例中,内核402的材料包括镓(熔点为29.76℃)、镓铟合金(共熔点为21.4℃)或锡铋合金(共熔点为139℃)。In some embodiments, the molten core 402 can form a solid at room temperature during the cooling step of thermoplastic forming and become a stable conductor connecting the cracks in the conductive layer 304 . In other embodiments, the melting point of the inner core 402 may be lower than room temperature. After the conductive layer 304 is repaired, the conductive liquid of the inner core 402 may form an oxide layer on the surface of the fluid during the thermoplastic forming and cooling step to limit the flow behavior of the inner core 402 fluid. to form stable conductors in the cracks of the conductive layer 304 . In some embodiments, the material of the core 402 includes gallium (melting point 29.76°C), gallium indium alloy (eutectic point 21.4°C) or tin-bismuth alloy (eutectic point 139°C).

在一些实施例中,内核402可包括溶于有机溶剂(例如,甲苯)中的碳黑。包括碳黑的内核402在热塑成形的拉伸步骤具有可流动的特性,填补导电层304中的裂痕,并透过干燥去除有机溶剂,使内核402中的碳黑在裂痕中形成稳定连接的导电固体。In some embodiments, the inner core 402 may include carbon black dissolved in an organic solvent (eg, toluene). The inner core 402 comprising carbon black has flowable properties during the stretching step of thermoplastic forming, fills the cracks in the conductive layer 304, and removes the organic solvent by drying, so that the carbon black in the inner core 402 forms a stable connection in the cracks. Conductive solid.

修复粒子400的外壳404是保持修复粒子400分散的材料层。在一些实施例中,内核402在热塑成形的加热步骤会形成或维持导电液状态,但在导电层304由于拉伸而产生裂痕之前,外壳404可保护内核402并隔离内核402的导电液与导电层304。当导电层304在拉伸步骤产生裂痕时,外壳404也受到拉伸的应力而破裂,使内核402形成的导电液释出并修补导电层304。在一些实施例中,为避免外壳404在导电层304拉伸断裂之前,提早破裂而提早释出内核402,外壳404可包括耐热性和耐溶剂性,使外壳404在制程温度不会融化或产生化学反应,其中溶剂为涂布导电层304溶液的溶剂(例如,水、乙醇、乙醚、异丙醇、二乙二醇单丁醚等)。在一些实施例中,外壳404包括有机高分子(例如聚尿素甲醛树脂(poly(urea-formaldehyde),PUF))或金属氧化物(例如,二氧化锡、氧化镓)。The outer shell 404 of the repair particles 400 is a layer of material that keeps the repair particles 400 dispersed. In some embodiments, the inner core 402 forms or maintains a conductive liquid state during the heating step of thermoplastic forming, but before the conductive layer 304 cracks due to stretching, the outer shell 404 can protect the inner core 402 and isolate the conductive liquid of the inner core 402 from the conductive liquid. Conductive layer 304 . When the conductive layer 304 is cracked during the stretching step, the outer shell 404 is also broken by the tensile stress, so that the conductive liquid formed by the inner core 402 is released and the conductive layer 304 is repaired. In some embodiments, in order to prevent the outer shell 404 from prematurely breaking and releasing the inner core 402 before the conductive layer 304 is stretched and fractured, the outer shell 404 may include heat resistance and solvent resistance, so that the outer shell 404 will not melt or melt at the process temperature. A chemical reaction occurs, wherein the solvent is the solvent for coating the conductive layer 304 solution (eg, water, ethanol, diethyl ether, isopropanol, diethylene glycol monobutyl ether, etc.). In some embodiments, the housing 404 includes an organic polymer (eg, poly(urea-formaldehyde) (PUF)) or a metal oxide (eg, tin dioxide, gallium oxide).

根据上述的一些实施例,修复粒子400添加于导电层304中,当叠层300加热到制程温度时,修复粒子400的内核402为导电液的型态并透过外壳404与导电层304分隔。当导电层304拉伸塑型而产生断裂程度不一的裂痕时,在裂痕周围修复粒子400的外壳404也一同破裂,释出的内核402之导电液填补导电层304中的裂痕。当叠层300冷却时,裂痕中内核402的导电液也形成稳定导体,连接导电层304中的裂痕,降低原本因导电层304受损而上升的电阻值。在一些实施例中,以导电层304和修复粒子400的体积为分母时,修复粒子400的添加量在10vol%至30vol%时具有修复效果。According to some of the above embodiments, the repairing particles 400 are added in the conductive layer 304 . When the stack 300 is heated to the process temperature, the inner core 402 of the repairing particles 400 is in the form of conductive liquid and is separated from the conductive layer 304 through the outer shell 404 . When the conductive layer 304 is stretched and molded to produce cracks with different degrees of fracture, the outer shells 404 of the repair particles 400 around the cracks are also cracked, and the released conductive liquid of the inner core 402 fills the cracks in the conductive layer 304 . When the laminate 300 is cooled, the conductive liquid in the inner core 402 in the cracks also forms a stable conductor, connecting the cracks in the conductive layer 304 and reducing the resistance value originally increased due to the damage of the conductive layer 304 . In some embodiments, when the volume of the conductive layer 304 and the repairing particles 400 is used as the denominator, the addition amount of the repairing particles 400 has a repairing effect when the amount is 10 vol% to 30 vol%.

参考图3和图5,其中图5绘示叠层300在图1B的拉伸步骤中,区域R之导电层304在X-Y平面的俯视放大图。在拉伸步骤中,因制程温度而软化的基板302拉伸变形,导致基板302上的导电层304随之变形并产生裂痕500。同时,在导电层304中裂痕500周围的修复粒子400之外壳404受到拉伸应力而破裂,释出内核402形成的导电液。内核402形成的导电液在导电层304中的裂痕500形成修复导体402′,并在后续制程中固化形成裂痕500中的稳定导体。在一些实施例中,修复导体402′填补导电层304的裂痕500可为完全填充。在一些实施例中,修复导体402′填补导电层304的裂痕500,可为修复导体402′接触到裂痕两侧相对的部分侧壁。在一些实施例中,裂痕500中可具有复数个修复导体402′。Referring to FIGS. 3 and 5 , FIG. 5 shows an enlarged top view of the conductive layer 304 in the region R in the X-Y plane during the stretching step of the stack 300 in FIG. 1B . In the stretching step, the substrate 302 softened by the process temperature is stretched and deformed, so that the conductive layer 304 on the substrate 302 is deformed and cracks 500 are generated. At the same time, the outer shells 404 of the repair particles 400 around the cracks 500 in the conductive layer 304 are ruptured by tensile stress, and the conductive liquid formed by the inner core 402 is released. The crack 500 in the conductive layer 304 formed by the conductive liquid formed by the inner core 402 forms the repair conductor 402 ′, and is cured to form a stable conductor in the crack 500 in the subsequent process. In some embodiments, the repair conductor 402' filling the crack 500 in the conductive layer 304 may be completely filled. In some embodiments, the repair conductor 402 ′ fills the crack 500 in the conductive layer 304 , and the repair conductor 402 ′ can contact the opposite part of the sidewall on both sides of the crack. In some embodiments, the crack 500 may have a plurality of repair conductors 402' in it.

根据一些实施例,图6至图8是叠层600、叠层700和叠层800在X-Z平面的截面图。叠层600至叠层800的组成类似于含有修复粒子400的叠层300,包括但不限于基板、导电材料、保护层、其他材料层、电子元件等,且叠层600至叠层800也可用于如图1A至图1C所绘示的热塑拉伸制程中。6-8 are cross-sectional views of stack 600, stack 700, and stack 800 in the X-Z plane, according to some embodiments. The composition of stacks 600 to 800 is similar to that of stack 300 containing repair particles 400, including but not limited to substrates, conductive materials, protective layers, other material layers, electronic components, etc., and stacks 600 to 800 can also be used In the thermoplastic stretching process as shown in FIGS. 1A to 1C .

叠层600至叠层800与叠层300不同的地方是,修复粒子400添加于叠层中不同的位置。在一些实施例中,如图6所示,修复粒子400可添加于保护层606的溶液中,并一同涂布于导电层604上形成叠层600的保护层606。在一些实施例中,如图7所示,修复粒子400可添加于溶剂中,并涂布在基板702上以形成导电层704下的粒子层708,其中溶剂可为水或有机溶剂(例如,乙醇、乙醚)。在一些实施例中,如图8所示,修复粒子400可添加于溶剂中,并涂布在导电层804上以形成导电层804上的粒子层808,其中溶剂可为水或有机溶剂(例如,乙醇、乙醚)。尽管修复粒子400的添加位置不同,叠层600至叠层800中修复粒子400修补导电层中裂痕的方式和叠层300是相同的。Stacks 600 to 800 differ from stack 300 in that repair particles 400 are added at different locations in the stack. In some embodiments, as shown in FIG. 6 , the repair particles 400 may be added to the solution of the protective layer 606 and coated on the conductive layer 604 together to form the protective layer 606 of the stack 600 . In some embodiments, as shown in FIG. 7, the repair particles 400 may be added in a solvent and coated on the substrate 702 to form a particle layer 708 under the conductive layer 704, wherein the solvent may be water or an organic solvent (eg, ethanol, ether). In some embodiments, as shown in FIG. 8, the repair particles 400 can be added in a solvent and coated on the conductive layer 804 to form a particle layer 808 on the conductive layer 804, wherein the solvent can be water or an organic solvent (eg , ethanol, ether). The repair particles 400 in the stacks 600 to 800 repair the cracks in the conductive layer in the same manner as the stack 300, although the locations where the repairing particles 400 are added are different.

本公开揭露一种应用于热塑成形的修复粒子,修复粒子包括内核和外壳,其中内核具有导电性和低于热塑成形制程温度的内核熔点,外壳受力破裂后会释出内核形成的导电液。本公开亦揭露一种热塑成形的方法,包括在叠层中添加复数个修复粒子,修复粒子在热塑成形的拉伸制程中因外壳受力而释出内核形成的导电液,导电液填入导电层中的裂痕并形成修复导体在裂痕中,降低导电层因裂痕产生而升高的电阻值,提升导电材料的拉伸能力。The present disclosure discloses a repair particle for thermoplastic forming. The repair particle includes a core and a shell, wherein the core has conductivity and a melting point of the core lower than the temperature of the thermoplastic forming process. liquid. The present disclosure also discloses a method of thermoplastic forming, which includes adding a plurality of repairing particles in a laminate, and the repairing particles release a conductive liquid formed by an inner core due to the force of the outer shell during the stretching process of the thermoplastic forming, and the conductive liquid fills Into the cracks in the conductive layer and form repair conductors in the cracks, reduce the resistance value of the conductive layer increased due to cracks, and improve the tensile ability of the conductive material.

前面概述一些实施例的特征,使得本领域技术人员可更好地理解本公开的观点。本领域技术人员应该理解,他们可以容易地使用本公开作为设计或修改其他制程和结构的基础,以实现相同的目的和/或实现与本文介绍之实施例相同的优点。本领域技术人员还应该理解,这样的等同构造不脱离本公开的精神和范围,并且在不脱离本公开的精神和范围的情况下,可以进行各种改变、替换和变更。The foregoing outlines the features of some embodiments so that those skilled in the art may better understand the concepts of the disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments described herein. It should also be understood by those skilled in the art that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the present disclosure.

Claims (13)

1.一种应用于热塑成形的修复粒子,其特征在于,包括:1. a repair particle applied to thermoplastic forming, is characterized in that, comprises: 一内核,该内核具有导电性和一内核熔点,该内核熔点低于该热塑成形的一制程温度;a core, the core has conductivity and a core melting point, the core melting point is lower than a process temperature of the thermoplastic forming; 一外壳,包覆该内核,该外壳具有一外壳熔点高于该热塑成形的该制程温度,其中该外壳受力破裂后会释出该内核形成的一导电液。an outer shell covering the inner core, the outer shell has a melting point of the outer shell higher than the process temperature of the thermoplastic forming, wherein the outer shell will release a conductive liquid formed by the inner core after being ruptured by force. 2.如权利要求1所述之修复粒子,其中该内核包括镓、镓铟合金或锡铋合金。2. The repair particle of claim 1, wherein the inner core comprises gallium, a gallium-indium alloy, or a tin-bismuth alloy. 3.如权利要求1所述之修复粒子,其中该内核包括溶于有机溶剂中的碳黑。3. The remediation particle of claim 1, wherein the inner core comprises carbon black dissolved in an organic solvent. 4.如权利要求1所述之修复粒子,其中该外壳包括聚尿素甲醛树脂或金属氧化物。4. The repair particle of claim 1, wherein the shell comprises polyurea formaldehyde resin or metal oxide. 5.一种应用于热塑成形的叠层,其特征在于,包括:5. A laminate for thermoplastic forming, comprising: 一基板;a substrate; 一导电层,位于该基板上;a conductive layer on the substrate; 一保护层,位于该导电层上;a protective layer on the conductive layer; 复数个修复粒子,添加于该叠层中,其中各该修复粒子包括一内核和一外壳,该内核在该热塑成形中形成一导电液,该外壳在该热塑成形中破裂释出该导电液。A plurality of repair particles are added to the stack, wherein each repair particle includes an inner core and an outer shell, the inner core forms a conductive liquid during the thermoplastic forming, and the outer shell ruptures during the thermoplastic forming to release the conductive liquid liquid. 6.如权利要求5所述之叠层,其中该些修复粒子的添加位置包括该导电层之中、该导电层与该基板之间、该导电层与该保护层之间或该保护层之中。6. The laminate of claim 5, wherein the addition positions of the repairing particles include in the conductive layer, between the conductive layer and the substrate, between the conductive layer and the protective layer, or in the protective layer . 7.如权利要求5所述之叠层,其中以该导电层和该些修复粒子的体积为分母,该些修复粒子的添加量在范围10vol%至30vol%。7 . The laminate of claim 5 , wherein with the volume of the conductive layer and the repair particles as the denominator, the addition amount of the repair particles is in the range of 10 vol % to 30 vol %. 8 . 8.如权利要求5所述之叠层,其中经过该热塑成形后,该叠层进一步包括:8. The laminate of claim 5, wherein after the thermoplastic forming, the laminate further comprises: 复数个裂痕,位于该导电层之中,该些裂痕的长边方向约垂直于该热塑成形的拉伸方向;A plurality of cracks are located in the conductive layer, and the longitudinal direction of the cracks is approximately perpendicular to the stretching direction of the thermoplastic forming; 复数个修复导体,由该导电液位于该些裂痕中所形成,该些修复导体连接各该裂痕的相对侧壁。A plurality of repair conductors are formed by the conductive liquid located in the cracks, and the repair conductors are connected to opposite side walls of the cracks. 9.如权利要求5所述之叠层,其中该叠层为触控面板的触控层。9. The stack of claim 5, wherein the stack is a touch layer of a touch panel. 10.一种热塑成形的方法,其特征在于,包括:10. A method of thermoplastic forming, comprising: 在一叠层中添加复数个修复粒子;Add multiple repair particles to a stack; 加热该叠层,使各该修复粒子的一内核形成一导电液;heating the stack to make a core of each repair particle form a conductive liquid; 拉伸该叠层,使平直的该叠层拉伸成曲形,该叠层的一导电层形成复数个裂痕,同时各该修复粒子的一外壳受力破裂;stretching the stack, so that the straight stack is stretched into a curved shape, a conductive layer of the stack forms a plurality of cracks, and at the same time, a shell of each repair particle is broken by force; 各该修复粒子释出该内核形成的该导电液,该导电液填入该些裂痕;以及Each of the repair particles releases the conductive liquid formed by the inner core, and the conductive liquid fills the cracks; and 该导电液形成复数个修复导体在该些裂痕中。The conductive liquid forms repair conductors in the cracks. 11.如权利要求10所述之方法,其中该内核在加热后为熔融态,且该内核形成的该导电液在降温后形成该些修复导体。11. The method of claim 10, wherein the inner core is in a molten state after being heated, and the conductive liquid formed by the inner core is cooled to form the repair conductors. 12.如权利要求10所述之方法,其中该内核在加热后为液态,且该内核形成的该导电液在干燥后形成该些修复导体。12. The method of claim 10, wherein the inner core is liquid after heating, and the conductive liquid formed by the inner core is dried to form the repair conductors. 13.如权利要求10所述之方法,其中该方法应用于模内成形或模内电子制程。13. The method of claim 10, wherein the method is applied to in-mold forming or in-mold electronic manufacturing.
CN202010663326.8A 2020-07-10 2020-07-10 Thermoformed repair particles and method Active CN111813263B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202010663326.8A CN111813263B (en) 2020-07-10 2020-07-10 Thermoformed repair particles and method
TW109123964A TWI757796B (en) 2020-07-10 2020-07-15 Healing particle and method for thermoforming

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010663326.8A CN111813263B (en) 2020-07-10 2020-07-10 Thermoformed repair particles and method

Publications (2)

Publication Number Publication Date
CN111813263A true CN111813263A (en) 2020-10-23
CN111813263B CN111813263B (en) 2022-09-20

Family

ID=72843489

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010663326.8A Active CN111813263B (en) 2020-07-10 2020-07-10 Thermoformed repair particles and method

Country Status (2)

Country Link
CN (1) CN111813263B (en)
TW (1) TWI757796B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110109569A (en) * 2019-05-07 2019-08-09 业成科技(成都)有限公司 Touch-control structure and preparation method thereof and touch device

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020111434A1 (en) * 2001-02-13 2002-08-15 White Scott R. Multifunctional autonomically healing composite material
JP2005307186A (en) * 2004-03-22 2005-11-04 Sumitomo Chemical Co Ltd Thermoplastic resin-coated conductive composition
JP2007035575A (en) * 2005-07-29 2007-02-08 Sekisui Chem Co Ltd Conductive fine particles, anisotropic conductive material, and connection structure
US20070063347A1 (en) * 2005-09-19 2007-03-22 Taiwan Semiconductor Manufacturing Co., Ltd. Packages, anisotropic conductive films, and conductive particles utilized therein
JP2010083954A (en) * 2008-09-30 2010-04-15 Nippon Shokubai Co Ltd Polymer microparticle, method for manufacturing the same, and electroconductive microparticle
KR20120103023A (en) * 2011-03-09 2012-09-19 삼성전기주식회사 Touch screen panel
TWM488681U (en) * 2013-09-13 2014-10-21 Tpk Touch Solutions Xiamen Inc Touch panel
US20150306789A1 (en) * 2012-12-04 2015-10-29 Sartorius Stedim Biotech Gmbh Hot stamping method
US20170014958A1 (en) * 2015-07-14 2017-01-19 Iowa State University Research Foundation, Inc. Stable undercooled metallic particles for engineering at ambient conditions
CN106486183A (en) * 2015-08-31 2017-03-08 三星电子株式会社 Anisotropic conductive material and the electronic installation including it
CN106782758A (en) * 2017-01-05 2017-05-31 京东方科技集团股份有限公司 Conducting particles and its manufacture method and anisotropy conductiving glue
CN109448889A (en) * 2018-12-05 2019-03-08 业成科技(成都)有限公司 Selfreparing conductive structure and preparation method thereof
US20200019656A1 (en) * 2018-07-16 2020-01-16 Uchicago Argonne, Llc Systems and methods for designing new materials for superlubricity
JP2020094170A (en) * 2018-12-06 2020-06-18 東洋インキScホールディングス株式会社 Conductive composition for molded film, molded film and production method of the same, and molded article and production method of the same
US20200219634A1 (en) * 2017-01-19 2020-07-09 Centre National De La Recherche Scientifique Method for preparation an electrically conductive stratified composite structure

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI356425B (en) * 2005-03-24 2012-01-11 Nippon Catalytic Chem Ind Coated fine particle and their manufacturing metho
TW201017499A (en) * 2008-10-27 2010-05-01 Tpk Touch Solutions Inc Manufacturing method and structure of curved-surface capacitive touch panel
EP2624258A1 (en) * 2012-02-06 2013-08-07 Siemens Aktiengesellschaft Self-healing isolating layer for an electric machine
EP3356136A1 (en) * 2015-09-28 2018-08-08 SABIC Global Technologies B.V. Integrated transparent conductive films for thermal forming applications

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020111434A1 (en) * 2001-02-13 2002-08-15 White Scott R. Multifunctional autonomically healing composite material
JP2005307186A (en) * 2004-03-22 2005-11-04 Sumitomo Chemical Co Ltd Thermoplastic resin-coated conductive composition
JP2007035575A (en) * 2005-07-29 2007-02-08 Sekisui Chem Co Ltd Conductive fine particles, anisotropic conductive material, and connection structure
US20070063347A1 (en) * 2005-09-19 2007-03-22 Taiwan Semiconductor Manufacturing Co., Ltd. Packages, anisotropic conductive films, and conductive particles utilized therein
JP2010083954A (en) * 2008-09-30 2010-04-15 Nippon Shokubai Co Ltd Polymer microparticle, method for manufacturing the same, and electroconductive microparticle
KR20120103023A (en) * 2011-03-09 2012-09-19 삼성전기주식회사 Touch screen panel
US20150306789A1 (en) * 2012-12-04 2015-10-29 Sartorius Stedim Biotech Gmbh Hot stamping method
TWM488681U (en) * 2013-09-13 2014-10-21 Tpk Touch Solutions Xiamen Inc Touch panel
US20170014958A1 (en) * 2015-07-14 2017-01-19 Iowa State University Research Foundation, Inc. Stable undercooled metallic particles for engineering at ambient conditions
CN106486183A (en) * 2015-08-31 2017-03-08 三星电子株式会社 Anisotropic conductive material and the electronic installation including it
CN106782758A (en) * 2017-01-05 2017-05-31 京东方科技集团股份有限公司 Conducting particles and its manufacture method and anisotropy conductiving glue
US20200219634A1 (en) * 2017-01-19 2020-07-09 Centre National De La Recherche Scientifique Method for preparation an electrically conductive stratified composite structure
US20200019656A1 (en) * 2018-07-16 2020-01-16 Uchicago Argonne, Llc Systems and methods for designing new materials for superlubricity
CN109448889A (en) * 2018-12-05 2019-03-08 业成科技(成都)有限公司 Selfreparing conductive structure and preparation method thereof
JP2020094170A (en) * 2018-12-06 2020-06-18 東洋インキScホールディングス株式会社 Conductive composition for molded film, molded film and production method of the same, and molded article and production method of the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110109569A (en) * 2019-05-07 2019-08-09 业成科技(成都)有限公司 Touch-control structure and preparation method thereof and touch device
CN110109569B (en) * 2019-05-07 2022-04-15 业成科技(成都)有限公司 Touch structure, preparation method thereof and touch device

Also Published As

Publication number Publication date
TWI757796B (en) 2022-03-11
TW202203253A (en) 2022-01-16
CN111813263B (en) 2022-09-20

Similar Documents

Publication Publication Date Title
Guymon et al. Multifunctional liquid metal polymer composites
JP6542843B2 (en) ANISOTROPIC CONDUCTIVE FILM, CONNECTION STRUCTURE, AND METHOD FOR MANUFACTURING CONNECTION STRUCTURE
CN103013370B (en) Anisotropic conductive adhesive film and electronic device
US9960145B2 (en) Flip chip module with enhanced properties
WO2014190689A1 (en) Printing plate, scattering film layer and manufacturing methods thereof, and display device
US20160064298A1 (en) Embedding additive particles in encapsulant of electronic device
TWI757796B (en) Healing particle and method for thermoforming
CN103408993A (en) Conductive ink, transparent conductor and preparation method thereof
JP2016536763A (en) Fixed array anisotropic conductive film using conductive particles and block copolymer paint
CN114121680A (en) Multi-chip three-dimensional packaging structure and packaging method
CN206460905U (en) Solid sealed pole of vacuum circuit breaker
US20180187052A1 (en) Conductive particle, its manufacturing method and anisotropic conductive adhesive
CN102959702A (en) Cooling apparatus for electronic components and method for manufacturing same
CN103759867A (en) Protrusion type flexible pressure-sensitive element and method for developing and manufacturing protrusion type flexible pressure-sensitive element
CN109231149B (en) Preparation method of fatigue-resistant flexible electronic device and product
CN108140624A (en) Flip-chip modules with enhanced properties
CN205827011U (en) 3D polymer dispersed liquid crystal composite layer structure
KR101148143B1 (en) Insulated conductive particles and anisotropic conductive film composition using the same
CN113991000A (en) Locally-stretched packaging structure and manufacturing method thereof
CN109841300B (en) Anisotropic conductive film and method for producing same
JP4211100B2 (en) Circuit connection member and manufacturing method thereof
KR20100130260A (en) Filling method of via hole and semiconductor package method
CN119342816A (en) Semiconductor device and manufacturing method thereof, and electronic device
CN113131052A (en) Packaging film, battery using packaging film and electronic device using battery
CN205573204U (en) An antistatic plastic sheet structure

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant