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CN111817132A - Modulated Laser Diode Improved Structure - Google Patents

Modulated Laser Diode Improved Structure Download PDF

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CN111817132A
CN111817132A CN201910294614.8A CN201910294614A CN111817132A CN 111817132 A CN111817132 A CN 111817132A CN 201910294614 A CN201910294614 A CN 201910294614A CN 111817132 A CN111817132 A CN 111817132A
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diffraction grating
distributed feedback
semiconductor layer
feedback laser
end diffraction
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颜胜宏
内田俊一
林楷滨
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Jinglian Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0601Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising an absorbing region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures

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  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

一种调变激光二极管改良结构,包括一半导体基板及形成于半导体基板之上的一分布式回馈激光。分布式回馈激光分为一前端部及一后端部。分布式回馈激光由下至上依次包括一下半导体层、一主动层、一上半导体层、一前光栅、及一后光栅。前光栅形成于分布式回馈激光的前端部的下半导体层中或上半导体层中。后光栅形成于分布式回馈激光的后端部的下半导体层中或上半导体层中。前光栅的一光栅长度大于或等于后光栅的一光栅长度。前光栅的一光栅周期等于后光栅的一光栅周期。前光栅的一光栅责务周期大于或等于40%且小于或等于60%。后光栅的一光栅责务周期大于0%且小于40%或大于60%且小于100%。

Figure 201910294614

An improved structure of a modulated laser diode includes a semiconductor substrate and a distributed feedback laser formed on the semiconductor substrate. The distributed feedback laser is divided into a front end and a rear end. The distributed feedback laser includes a lower semiconductor layer, an active layer, an upper semiconductor layer, a front grating, and a rear grating from bottom to top. The front grating is formed in the lower semiconductor layer or the upper semiconductor layer of the front end of the distributed feedback laser. The rear grating is formed in the lower semiconductor layer or the upper semiconductor layer of the rear end of the distributed feedback laser. A grating length of the front grating is greater than or equal to a grating length of the rear grating. A grating period of the front grating is equal to a grating period of the rear grating. A grating duty period of the front grating is greater than or equal to 40% and less than or equal to 60%. A grating duty period of the rear grating is greater than 0% and less than 40% or greater than 60% and less than 100%.

Figure 201910294614

Description

调变激光二极管改良结构Modulated Laser Diode Improved Structure

技术领域technical field

本发明有关一种调变激光二极管,尤指一种具有抗反射结构的调变激光二极管。The present invention relates to a modulation laser diode, in particular to a modulation laser diode with an anti-reflection structure.

背景技术Background technique

请参阅图6,其为现有技术的一种调变激光二极管的一具体实施例。现有技术的调变激光二极管为一电致光吸收调变激光(EML:Electroabsorption Modulation Laser)二极管,包括一半导体基板90、一分布式回馈激光9、一电致光吸收调变器96(EAM:Electroabsorption Modulator)、一抗反射膜(Anti-reflection coating)94以及一高反射膜(High reflection coating)95。其中分布式回馈激光9以及电致光吸收调变器96形成于半导体基板90之上。其中分布式回馈激光9包括一n型半导体层91、一主动层92、一p型半导体层93以及一绕射光栅97。其中n型半导体层91形成于半导体基板90之上;主动层92形成于n型半导体层91之上;p型半导体层93形成于主动层92之上。其中绕射光栅97形成于p型半导体层93中。抗反射膜94形成于电致光吸收调变器96的前端。高反射膜95形成于分布式回馈激光9的后端。其中绕射光栅97具有一绕射光栅周期P9以及一绕射光栅责务周期D9/P9(duty cycle)。绕射光栅责务周期D9/P9等于50%。现有技术的调变激光二极管的设计,激光会由电致光吸收调变器96的前端输出。虽然在电致光吸收调变器96的前端有抗反射膜94可以抑制激光的反射,然而还是有很少部分的激光会被反射回电致光吸收调变器96以及分布式回馈激光9,然后再被分布式回馈激光9的后端的高反射膜95反射回分布式回馈激光9以及电致光吸收调变器96,因而造成激光的输出功率会随时间激烈地震荡(稍后请参见图2M)。Please refer to FIG. 6 , which is a specific embodiment of a modulated laser diode in the prior art. The modulation laser diode in the prior art is an Electroabsorption Modulation Laser (EML) diode, which includes a semiconductor substrate 90 , a distributed feedback laser 9 , and an electro-optical absorption modulator 96 (EAM). : Electroabsorption Modulator), an anti-reflection coating (Anti-reflection coating) 94 and a high reflection coating (High reflection coating) 95. The distributed feedback laser 9 and the electro-optical absorption modulator 96 are formed on the semiconductor substrate 90 . The distributed feedback laser 9 includes an n-type semiconductor layer 91 , an active layer 92 , a p-type semiconductor layer 93 and a diffraction grating 97 . The n-type semiconductor layer 91 is formed on the semiconductor substrate 90 ; the active layer 92 is formed on the n-type semiconductor layer 91 ; the p-type semiconductor layer 93 is formed on the active layer 92 . Among them, the diffraction grating 97 is formed in the p-type semiconductor layer 93 . The anti-reflection film 94 is formed on the front end of the electro-optical absorption modulator 96 . The high reflection film 95 is formed at the rear end of the distributed feedback laser 9 . The diffraction grating 97 has a diffraction grating period P9 and a diffraction grating duty cycle D9/P9 (duty cycle). The duty cycle D9/P9 of the diffraction grating is equal to 50%. In the design of the modulated laser diode in the prior art, the laser light is output from the front end of the electro-optical absorption modulator 96 . Although there is an anti-reflection film 94 at the front end of the electro-optical absorption modulator 96 to suppress the reflection of the laser light, a small part of the laser light is still reflected back to the electro-optical absorption modulator 96 and the distributed feedback laser 9, and then The high reflection film 95 at the rear end of the distributed feedback laser 9 is then reflected back to the distributed feedback laser 9 and the electro-optical absorption modulator 96, so that the output power of the laser will oscillate violently with time (see FIG. 2M later). ).

有鉴于此,本案发明人开发出简便组装的设计,能够避免上述的缺点,安装方便,又具有成本低廉的优点,以兼顾使用弹性与经济性等考虑,因此遂有本发明的产生。In view of this, the inventor of the present application has developed a design that is easy to assemble, can avoid the above shortcomings, is easy to install, and has the advantages of low cost, so as to take into account the flexibility of use and economy, and thus the invention is born.

发明内容SUMMARY OF THE INVENTION

本发明所欲解决的技术问题在于如何有效降低调变激光二极管的激光输出功率随时间的震荡幅度。The technical problem to be solved by the present invention is how to effectively reduce the oscillation amplitude of the laser output power of the modulated laser diode with time.

为解决前述问题,以达到所预期的功效,本发明提供一种调变激光二极管改良结构,包括一半导体基板以及一分布式回馈激光。其中分布式回馈激光形成于半导体基板之上。分布式回馈激光分为一前端部以及一后端部。分布式回馈激光包括一下半导体层、一主动层、一上半导体层、一前端绕射光栅以及一第一后端绕射光栅。其中下半导体层形成于半导体基板之上;下半导体层形成于半导体基板之上;上半导体层形成于主动层之上。其中前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中或上半导体层中,前端绕射光栅具有一前端绕射光栅长度,前端绕射光栅具有一前端绕射光栅周期以及一前端绕射光栅责务周期。其中第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中或上半导体层中,第一后端绕射光栅具有一第一后端绕射光栅长度,第一后端绕射光栅具有一第一后端绕射光栅周期以及一第一后端绕射光栅责务周期。其中前端绕射光栅长度大于或等于第一后端绕射光栅长度,前端绕射光栅周期等于第一后端绕射光栅周期,前端绕射光栅责务周期大于或等于40%且小于或等于60%,第一后端绕射光栅责务周期(1)大于0%且小于40%,或(2)大于60%且小于100%。藉此有效降低本发明的调变激光二极管的激光输出功率随时间的震荡幅度。In order to solve the aforementioned problems and achieve the desired effect, the present invention provides an improved structure of a modulated laser diode, which includes a semiconductor substrate and a distributed feedback laser. The distributed feedback laser is formed on the semiconductor substrate. The distributed feedback laser is divided into a front end and a rear end. The distributed feedback laser includes a lower semiconductor layer, an active layer, an upper semiconductor layer, a front-end diffraction grating and a first rear-end diffraction grating. The lower semiconductor layer is formed on the semiconductor substrate; the lower semiconductor layer is formed on the semiconductor substrate; and the upper semiconductor layer is formed on the active layer. The front-end diffraction grating is formed in the lower semiconductor layer or the upper semiconductor layer at the front end of the distributed feedback laser, the front-end diffraction grating has a front-end diffraction grating length, and the front-end diffraction grating has a front-end diffraction grating period and a Front-end diffraction grating duty cycle. The first rear diffraction grating is formed in the lower semiconductor layer or the upper semiconductor layer at the rear end of the distributed feedback laser, the first rear diffraction grating has a first rear diffraction grating length, and the first rear diffraction grating has a first rear diffraction grating length. The end diffraction grating has a first back end diffraction grating period and a first back end diffraction grating duty period. The length of the front-end diffraction grating is greater than or equal to the length of the first back-end diffraction grating, the period of the front-end diffraction grating is equal to the period of the first back-end diffraction grating, and the duty period of the front-end diffraction grating is greater than or equal to 40% and less than or equal to 60 %, the duty cycle of the first back-end diffraction grating (1) is greater than 0% and less than 40%, or (2) is greater than 60% and less than 100%. Thereby, the oscillation amplitude of the laser output power of the modulated laser diode of the present invention with time is effectively reduced.

于一实施例中,其中前端绕射光栅与主动层之间的一距离等于第一后端绕射光栅与主动层之间的一距离。In one embodiment, a distance between the front-end diffraction grating and the active layer is equal to a distance between the first rear-end diffraction grating and the active layer.

于一实施例中,其中(1)前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,或(2)前端绕射光栅形成于分布式回馈激光的前端部的上半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中;其中第二后端绕射光栅与主动层之间的一距离等于前端绕射光栅与主动层之间的距离,其中第二后端绕射光栅具有一第二后端绕射光栅长度,其中第二后端绕射光栅具有一第二后端绕射光栅周期以及一第二后端绕射光栅责务周期,其中第二后端绕射光栅长度等于第一后端绕射光栅长度,其中前端绕射光栅周期等于第二后端绕射光栅周期,其中第二后端绕射光栅责务周期等于100%。In one embodiment, (1) the front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed in the upper semiconductor layer of the rear-end portion of the distributed feedback laser layer, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the lower semiconductor layer at the rear end of the distributed feedback laser, or (2) front-end diffraction grating The grating is formed in the upper semiconductor layer of the front end of the distributed feedback laser, and the first rear diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second Back-end diffraction grating, wherein the second back-end diffraction grating is formed in the upper semiconductor layer of the rear end of the distributed feedback laser; wherein a distance between the second back-end diffraction grating and the active layer is equal to the front-end diffraction grating The distance between the grating and the active layer, wherein the second back-end diffraction grating has a second back-end diffraction grating length, wherein the second back-end diffraction grating has a second back-end diffraction grating period and a second back-end diffraction grating The duty cycle of the back-end diffraction grating, wherein the length of the second back-end diffraction grating is equal to the length of the first back-end diffraction grating, wherein the period of the front-end diffraction grating is equal to the period of the second back-end diffraction grating, wherein the second back-end diffraction grating is equal to the period of the second back-end diffraction grating The radiation grating duty cycle is equal to 100%.

于一实施例中,其中前端绕射光栅与主动层之间的一距离小于第一后端绕射光栅与主动层之间的一距离。In one embodiment, a distance between the front-end diffraction grating and the active layer is smaller than a distance between the first rear-end diffraction grating and the active layer.

于一实施例中,其中(1)前端绕射光栅形成于分布式回馈激光的前端部的上半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,且第二后端绕射光栅位于第一后端绕射光栅与主动层之间;(2)前端绕射光栅形成于分布式回馈激光的前端部的上半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中;(3)前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,且第二后端绕射光栅位于第一后端绕射光栅与主动层之间;或(4)前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中;其中第二后端绕射光栅与主动层之间的一距离等于前端绕射光栅与主动层之间的距离,其中第二后端绕射光栅具有一第二后端绕射光栅长度,其中第二后端绕射光栅具有一第二后端绕射光栅周期以及一第二后端绕射光栅责务周期,其中第二后端绕射光栅长度等于第一后端绕射光栅长度,其中前端绕射光栅周期等于第二后端绕射光栅周期,其中第二后端绕射光栅责务周期等于100%。In one embodiment, (1) the front-end diffraction grating is formed in the upper semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed in the upper semiconductor layer of the rear-end portion of the distributed feedback laser layer, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the upper semiconductor layer of the rear end of the distributed feedback laser, and the second rear-end diffraction grating The grating is located between the first back-end diffraction grating and the active layer; (2) the front-end diffraction grating is formed in the upper semiconductor layer of the front-end portion of the distributed feedback laser, and the first back-end diffraction grating is formed in the distributed feedback laser In the lower semiconductor layer of the rear end of the laser, the distributed feedback laser further includes a second rear diffraction grating, wherein the second rear diffraction grating is formed in the upper semiconductor layer of the rear end of the distributed feedback laser (3) The front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed in the lower semiconductor layer of the rear-end portion of the distributed feedback laser, wherein the distributed feedback laser The feedback laser further includes a second back-end diffraction grating, wherein the second back-end diffraction grating is formed in the lower semiconductor layer at the back end of the distributed feedback laser, and the second back-end diffraction grating is located at the first back-end between the diffraction grating and the active layer; or (4) the front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed at the back-end portion of the distributed feedback laser In the upper semiconductor layer of the distributed feedback laser, the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the lower semiconductor layer at the rear end of the distributed feedback laser; A distance between the end diffraction grating and the active layer is equal to the distance between the front end diffraction grating and the active layer, wherein the second back end diffraction grating has a second back end diffraction grating length, wherein the second back end diffraction grating has a length. The diffraction grating has a second back-end diffraction grating period and a second back-end diffraction grating duty period, wherein the length of the second back-end diffraction grating is equal to the length of the first back-end diffraction grating, and the front-end diffraction grating period is is equal to the second back-end diffraction grating period, wherein the second back-end diffraction grating duty period is equal to 100%.

于一实施例中,其中第一后端绕射光栅责务周期(1)大于0%且小于或等于25%,或(2)大于或等于75%且小于100%。In one embodiment, the duty cycle of the first back-end diffraction grating is (1) greater than 0% and less than or equal to 25%, or (2) greater than or equal to 75% and less than 100%.

本发明更提供一种调变激光二极管改良结构,包括一半导体基板以及一分布式回馈激光。其中分布式回馈激光形成于半导体基板之上。分布式回馈激光分为一前端部以及一后端部。分布式回馈激光包括一下半导体层、一主动层、一上半导体层、一前端绕射光栅以及一第一后端绕射光栅。其中下半导体层形成于半导体基板之上;下半导体层形成于半导体基板之上;上半导体层形成于主动层之上。其中前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中或上半导体层中,前端绕射光栅具有一前端绕射光栅长度,前端绕射光栅具有一前端绕射光栅周期以及一前端绕射光栅责务周期。其中第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中或上半导体层中,第一后端绕射光栅具有一第一后端绕射光栅长度,第一后端绕射光栅具有一第一后端绕射光栅周期以及一第一后端绕射光栅责务周期。其中前端绕射光栅长度大于或等于第一后端绕射光栅长度,其中前端绕射光栅周期等于第一后端绕射光栅周期,其中前端绕射光栅责务周期大于或等于40%且小于或等于60%,其中前端绕射光栅与主动层之间的一距离小于第一后端绕射光栅与主动层之间的一距离。藉此有效降低本发明的调变激光二极管的激光输出功率随时间的震荡幅度。The present invention further provides an improved structure of a modulated laser diode, comprising a semiconductor substrate and a distributed feedback laser. The distributed feedback laser is formed on the semiconductor substrate. The distributed feedback laser is divided into a front end and a rear end. The distributed feedback laser includes a lower semiconductor layer, an active layer, an upper semiconductor layer, a front-end diffraction grating and a first rear-end diffraction grating. The lower semiconductor layer is formed on the semiconductor substrate; the lower semiconductor layer is formed on the semiconductor substrate; and the upper semiconductor layer is formed on the active layer. The front-end diffraction grating is formed in the lower semiconductor layer or the upper semiconductor layer at the front end of the distributed feedback laser, the front-end diffraction grating has a front-end diffraction grating length, and the front-end diffraction grating has a front-end diffraction grating period and a Front-end diffraction grating duty cycle. The first rear diffraction grating is formed in the lower semiconductor layer or the upper semiconductor layer at the rear end of the distributed feedback laser, the first rear diffraction grating has a first rear diffraction grating length, and the first rear diffraction grating has a first rear diffraction grating length. The end diffraction grating has a first back end diffraction grating period and a first back end diffraction grating duty period. The length of the front-end diffraction grating is greater than or equal to the length of the first back-end diffraction grating, wherein the period of the front-end diffraction grating is equal to the period of the first back-end diffraction grating, and the duty period of the front-end diffraction grating is greater than or equal to 40% and less than or is equal to 60%, wherein a distance between the front-end diffraction grating and the active layer is smaller than a distance between the first rear-end diffraction grating and the active layer. Thereby, the oscillation amplitude of the laser output power of the modulated laser diode of the present invention with time is effectively reduced.

于一实施例中,其中第一后端绕射光栅责务周期大于或等于40%且小于或等于60%。In one embodiment, the duty cycle of the first rear-end diffraction grating is greater than or equal to 40% and less than or equal to 60%.

于一实施例中,其中(1)前端绕射光栅形成于分布式回馈激光的前端部的上半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,且第二后端绕射光栅位于第一后端绕射光栅与主动层之间;(2)前端绕射光栅形成于分布式回馈激光的前端部的上半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中;(3)前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中,且第二后端绕射光栅位于第一后端绕射光栅与主动层之间;或(4)前端绕射光栅形成于分布式回馈激光的前端部的下半导体层中,且第一后端绕射光栅形成于分布式回馈激光的后端部的上半导体层中,其中分布式回馈激光更包括一第二后端绕射光栅,其中第二后端绕射光栅形成于分布式回馈激光的后端部的下半导体层中;其中第二后端绕射光栅与主动层之间的一距离等于前端绕射光栅与主动层之间的距离,其中第二后端绕射光栅具有一第二后端绕射光栅长度,其中第二后端绕射光栅具有一第二后端绕射光栅周期以及一第二后端绕射光栅责务周期,其中第二后端绕射光栅长度等于第一后端绕射光栅长度,其中前端绕射光栅周期等于第二后端绕射光栅周期,其中第二后端绕射光栅责务周期等于100%。In one embodiment, (1) the front-end diffraction grating is formed in the upper semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed in the upper semiconductor layer of the rear-end portion of the distributed feedback laser layer, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the upper semiconductor layer of the rear end of the distributed feedback laser, and the second rear-end diffraction grating The grating is located between the first back-end diffraction grating and the active layer; (2) the front-end diffraction grating is formed in the upper semiconductor layer of the front-end portion of the distributed feedback laser, and the first back-end diffraction grating is formed in the distributed feedback laser In the lower semiconductor layer of the rear end of the laser, the distributed feedback laser further includes a second rear diffraction grating, wherein the second rear diffraction grating is formed in the upper semiconductor layer of the rear end of the distributed feedback laser (3) The front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed in the lower semiconductor layer of the rear-end portion of the distributed feedback laser, wherein the distributed feedback laser The feedback laser further includes a second back-end diffraction grating, wherein the second back-end diffraction grating is formed in the lower semiconductor layer at the back end of the distributed feedback laser, and the second back-end diffraction grating is located at the first back-end between the diffraction grating and the active layer; or (4) the front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end diffraction grating is formed at the back-end portion of the distributed feedback laser In the upper semiconductor layer of the distributed feedback laser, the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the lower semiconductor layer at the rear end of the distributed feedback laser; A distance between the end diffraction grating and the active layer is equal to the distance between the front end diffraction grating and the active layer, wherein the second back end diffraction grating has a second back end diffraction grating length, wherein the second back end diffraction grating has a length. The diffraction grating has a second back-end diffraction grating period and a second back-end diffraction grating duty period, wherein the length of the second back-end diffraction grating is equal to the length of the first back-end diffraction grating, and the front-end diffraction grating period is is equal to the second back-end diffraction grating period, wherein the second back-end diffraction grating duty period is equal to 100%.

于一实施例中,其中下半导体层为一n型半导体层。In one embodiment, the lower semiconductor layer is an n-type semiconductor layer.

于一实施例中,其中上半导体层为一p型半导体层。In one embodiment, the upper semiconductor layer is a p-type semiconductor layer.

于一实施例中,其中调变激光二极管为一直接调变激光二极管。In one embodiment, the modulated laser diode is a direct modulated laser diode.

于一实施例中,其更包括一电致光吸收调变器,其中电致光吸收调变器形成于半导体基板之上,其中分布式回馈激光的前端部位于分布式回馈激光的后端部以及电致光吸收调变器之间,其中调变激光二极管为一电致光吸收调变激光二极管。In one embodiment, it further includes an electro-optical absorption modulator, wherein the electro-optical absorption modulator is formed on the semiconductor substrate, and the front end of the distributed feedback laser is located at the rear end of the distributed feedback laser and between the electro-optical absorption modulators, wherein the modulation laser diode is an electro-optical absorption modulation laser diode.

于一实施例中,其中前端绕射光栅长度与第一后端绕射光栅长度的比大于或等于1,且小于或等于4。In one embodiment, the ratio of the length of the front-end diffraction grating to the length of the first back-end diffraction grating is greater than or equal to 1 and less than or equal to 4.

为进一步了解本发明,以下举较佳的实施例,配合图式、图号,将本发明的具体构成内容及其所达成的功效详细说明如下。In order to further understand the present invention, the preferred embodiments are given below, and the specific components of the present invention and the effects achieved are described in detail as follows in conjunction with the drawings and drawing numbers.

附图说明Description of drawings

图1A为本发明一种调变激光二极管改良结构的一具体实施例的剖面示意图。1A is a schematic cross-sectional view of a specific embodiment of an improved structure of a modulated laser diode according to the present invention.

图1B为本发明一种调变激光二极管改良结构的一具体实施例的剖面示意图。1B is a schematic cross-sectional view of a specific embodiment of an improved structure of a modulated laser diode according to the present invention.

图2A~图2L为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。2A-2L are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention.

图2M为本发明一种调变激光二极管改良结构的具体实施例与现有技术的一具体实施例的输出功率随时间变化图比较。FIG. 2M is a graph comparing the variation of output power with time between a specific embodiment of an improved structure of a modulated laser diode according to the present invention and a specific embodiment of the prior art.

图2N为本发明一种调变激光二极管改良结构的具体实施例的输出功率随时间变化图比较。FIG. 2N is a graph comparison of output power versus time of a specific embodiment of an improved structure of a modulating laser diode according to the present invention.

图3A~图3H为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。3A to 3H are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention.

图4A~图4H为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。4A to 4H are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention.

图5A~图5H为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。5A-5H are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention.

图6为现有技术的一种调变激光二极管的一具体实施例。FIG. 6 is a specific embodiment of a modulated laser diode in the prior art.

附图标记说明:1-分布式回馈激光;2-分布式回馈激光的前端部;3-分布式回馈激光的后端部;4-电致光吸收调变器;10-半导体基板;20-下半导体层;30-主动层;40-上半导体层;50-前端绕射光栅;51-第一后端绕射光栅;52-第二后端绕射光栅;6-抗反射膜;7-高反射膜;9-分布式回馈激光;90-半导体基板;91-n型半导体层;92-主动层;93-p型半导体层;94-抗反射膜;95-高反射膜;96-电致光吸收调变器;97-绕射光栅;D0/P0-前端绕射光栅责务周期;D1/P1-第一后端绕射光栅责务周期;D2/P2-第二后端绕射光栅责务周期;D9/P9-绕射光栅责务周期;L0-前端绕射光栅长度;L1-第一后端绕射光栅长度;L2-第二后端绕射光栅长度;P0-前端绕射光栅周期;P1-第一后端绕射光栅周期;P2-第二后端绕射光栅周期;P9-绕射光栅周期;X0-前端绕射光栅与主动层的距离;X1-第一后端绕射光栅与主动层的距离;X2-第二后端绕射光栅与主动层的距离。Description of reference numerals: 1-distributed feedback laser; 2-front end of distributed feedback laser; 3-back end of distributed feedback laser; 4-electro-optical absorption modulator; 10-semiconductor substrate; 20- Lower semiconductor layer; 30-active layer; 40-upper semiconductor layer; 50-front-end diffraction grating; 51-first back-end diffraction grating; 52-second back-end diffraction grating; 6-anti-reflection film; 7- High reflection film; 9-distributed feedback laser; 90-semiconductor substrate; 91-n-type semiconductor layer; 92-active layer; 93-p-type semiconductor layer; 94-anti-reflection film; 95-high-reflection film; 96-electrical Optical absorption modulator; 97-diffraction grating; D0/P0- the duty period of the front-end diffraction grating; D1/P1- the duty period of the first back-end diffraction grating; D2/P2- the second back-end diffraction grating duty cycle; D9/P9-diffraction grating duty cycle; L0-front-end diffraction grating length; L1-first back-end diffraction grating length; L2-second back-end diffraction grating length; P0-front-end diffraction grating length Diffraction grating period; P1-the first back-end diffraction grating period; P2-the second back-end diffraction grating period; P9-diffraction grating period; X0-the distance between the front-end diffraction grating and the active layer; X1-the first back-end diffraction grating The distance between the end diffraction grating and the active layer; X2 - the distance between the second rear end diffraction grating and the active layer.

具体实施方式Detailed ways

请参阅图1A,其为本发明一种调变激光二极管改良结构的一具体实施例的剖面示意图。此实施例的调变激光二极管为一直接调变激光(DML:Direct Modulation Laser)二极管,包括一半导体基板10、一分布式回馈激光1、一抗反射膜6以及一高反射膜7。其中分布式回馈激光1形成于半导体基板10之上。其中分布式回馈激光1分为一前端部2以及一后端部3。其中抗反射膜6形成于分布式回馈激光1的前端部2的前端;而高反射膜7形成于分布式回馈激光1的后端部3的后端。激光由分布式回馈激光1的前端部2的前端输出。请同时参阅图2A~图2L、图3A~图3H、图4A~图4H、以及图5A~图5H的本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图1A的实施例中的分布式回馈激光1的细部结构可与图2A~图2L、图3A~图3H、图4A~图4H、以及图5A~图5H的任一实施例中的分布式回馈激光1的结构相同。Please refer to FIG. 1A , which is a schematic cross-sectional view of a specific embodiment of an improved structure of a modulated laser diode according to the present invention. The modulated laser diode of this embodiment is a Direct Modulation Laser (DML) diode, which includes a semiconductor substrate 10 , a distributed feedback laser 1 , an anti-reflection film 6 and a high-reflection film 7 . The distributed feedback laser 1 is formed on the semiconductor substrate 10 . The distributed feedback laser 1 is divided into a front end 2 and a rear end 3 . The anti-reflection film 6 is formed at the front end of the front end portion 2 of the distributed feedback laser 1 ; and the high reflection film 7 is formed at the rear end of the rear end portion 3 of the distributed feedback laser 1 . The laser light is output from the front end of the front end portion 2 of the distributed feedback laser 1 . Please refer to FIGS. 2A to 2L, 3A to 3H, 4A to 4H, and 5A to 5H for cross-sectional schematic diagrams of specific embodiments of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. . The detailed structure of the distributed feedback laser 1 in the embodiment of FIG. 1A can be the same as the distribution in any of the embodiments of FIGS. 2A to 2L, 3A to 3H, 4A to 4H, and 5A to 5H. The structure of the feedback laser 1 is the same.

请参阅图1B,其为本发明一种调变激光二极管改良结构的一具体实施例的剖面示意图。此实施例的调变激光二极管为一电致光吸收调变激光二极管,包括一半导体基板10、一分布式回馈激光1、一电致光吸收调变器4、一抗反射膜6以及一高反射膜7。其中分布式回馈激光1以及电致光吸收调变器4形成于半导体基板10之上。其中分布式回馈激光1分为一前端部2以及一后端部3。其中分布式回馈激光1的前端部2位于分布式回馈激光1的后端部3以及电致光吸收调变器4之间。其中抗反射膜6形成于电致光吸收调变器4的前端;而高反射膜7形成于分布式回馈激光1的后端部3的后端。激光由电致光吸收调变器4的前端输出。请同时参阅图2A~图2L、图3A~图3H、图4A~图4H、以及图5A~图5H的本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图1B的实施例中的分布式回馈激光1的细部结构可与图2A~图2L、图3A~图3H、图4A~图4H、以及图5A~图5H的任一实施例中的分布式回馈激光1的结构相同。Please refer to FIG. 1B , which is a schematic cross-sectional view of a specific embodiment of an improved structure of a modulated laser diode according to the present invention. The modulated laser diode of this embodiment is an electro-optical absorption modulated laser diode, including a semiconductor substrate 10 , a distributed feedback laser 1 , an electro-optical absorption modulator 4 , an anti-reflection film 6 and a high Reflective film 7. The distributed feedback laser 1 and the electro-optical absorption modulator 4 are formed on the semiconductor substrate 10 . The distributed feedback laser 1 is divided into a front end 2 and a rear end 3 . The front end 2 of the distributed feedback laser 1 is located between the rear end 3 of the distributed feedback laser 1 and the electro-optical absorption modulator 4 . The anti-reflection film 6 is formed at the front end of the electro-optical absorption modulator 4 ; and the high-reflection film 7 is formed at the rear end of the rear end portion 3 of the distributed feedback laser 1 . The laser light is output from the front end of the electro-optical absorption modulator 4 . Please refer to FIGS. 2A to 2L, 3A to 3H, 4A to 4H, and 5A to 5H for cross-sectional schematic diagrams of specific embodiments of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. . The detailed structure of the distributed feedback laser 1 in the embodiment of FIG. 1B can be the same as the distribution in any of the embodiments of FIGS. 2A to 2L, 3A to 3H, 4A to 4H, and 5A to 5H. The structure of the feedback laser 1 is the same.

请参阅图2A,其为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。在此实施例中,本发明的一种调变激光二极管改良结构包括一半导体基板10以及一分布式回馈激光1。其中分布式回馈激光1形成于半导体基板10之上。分布式回馈激光1分为一前端部2以及一后端部3。其中分布式回馈激光1包括一下半导体层20、一主动层30、一上半导体层40、一前端绕射光栅50以及一第一后端绕射光栅51。下半导体层20形成于半导体基板10之上,其中下半导体层20为一n型半导体层。主动层30形成于下半导体层20之上。上半导体层40形成于主动层30之上,其中上半导体层40为一p型半导体层。前端绕射光栅50形成于分布式回馈激光1的前端部2的上半导体层40中,其中前端绕射光栅50具有一前端绕射光栅长度L0,其中前端绕射光栅50具有一前端绕射光栅周期P0以及一前端绕射光栅责务周期D0/P0。其中第一后端绕射光栅51形成于分布式回馈激光1的后端部3的上半导体层40中。第一后端绕射光栅51具有一第一后端绕射光栅长度L1。第一后端绕射光栅51具有一第一后端绕射光栅周期P1以及一第一后端绕射光栅责务周期D1/P1。其中前端绕射光栅50与主动层30之间的一距离X0等于第一后端绕射光栅51与主动层30之间的一距离X1。其中前端绕射光栅长度L0大于第一后端绕射光栅长度L1。前端绕射光栅周期P0等于第一后端绕射光栅周期P1。其中前端绕射光栅责务周期D0/P0大于或等于40%且小于或等于60%。其中第一后端绕射光栅责务周期D1/P1大于0%且小于40%。其中前端绕射光栅责务周期D0/P0不等于第一后端绕射光栅责务周期D1/P1。其中图1A或图1B的实施例中的本发明一种调变激光二极管改良结构可具有如图2A的分布式回馈激光1的结构,藉此可有效地降低调变激光二极管的激光输出功率随时间的震荡幅度。在一些实施例中,前端绕射光栅长度L0等于第一后端绕射光栅长度L1。在另一些实施例中,其中前端绕射光栅长度L0与第一后端绕射光栅长度L1的比大于或等于1,且小于或等于4。在一些实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于35%。在另一些实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于30%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于25%。在另一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于23%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于20%。在另一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于18%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于15%。在另一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于10%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于5%。Please refer to FIG. 2A , which is a schematic cross-sectional view of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. In this embodiment, an improved structure of a modulated laser diode of the present invention includes a semiconductor substrate 10 and a distributed feedback laser 1 . The distributed feedback laser 1 is formed on the semiconductor substrate 10 . The distributed feedback laser 1 is divided into a front end 2 and a rear end 3 . The distributed feedback laser 1 includes a lower semiconductor layer 20 , an active layer 30 , an upper semiconductor layer 40 , a front-end diffraction grating 50 and a first rear-end diffraction grating 51 . The lower semiconductor layer 20 is formed on the semiconductor substrate 10 , wherein the lower semiconductor layer 20 is an n-type semiconductor layer. The active layer 30 is formed on the lower semiconductor layer 20 . The upper semiconductor layer 40 is formed on the active layer 30 , wherein the upper semiconductor layer 40 is a p-type semiconductor layer. The front-end diffraction grating 50 is formed in the upper semiconductor layer 40 of the front-end portion 2 of the distributed feedback laser 1, wherein the front-end diffraction grating 50 has a front-end diffraction grating length L0, and the front-end diffraction grating 50 has a front-end diffraction grating The period P0 and a front-end diffraction grating are responsible for the period D0/P0. The first rear-end diffraction grating 51 is formed in the upper semiconductor layer 40 of the rear-end portion 3 of the distributed feedback laser 1 . The first rear diffraction grating 51 has a first rear diffraction grating length L1. The first back-end diffraction grating 51 has a first back-end diffraction grating period P1 and a first back-end diffraction grating duty period D1/P1. A distance X0 between the front-end diffraction grating 50 and the active layer 30 is equal to a distance X1 between the first rear-end diffraction grating 51 and the active layer 30 . The length L0 of the front-end diffraction grating is greater than the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the first rear-end diffraction grating period P1. The duty cycle D0/P0 of the front-end diffraction grating is greater than or equal to 40% and less than or equal to 60%. The duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than 40%. The duty period D0/P0 of the front-end diffraction grating is not equal to the duty period D1/P1 of the first rear-end diffraction grating. An improved structure of the modulated laser diode of the present invention in the embodiment of FIG. 1A or FIG. 1B may have the structure of the distributed feedback laser 1 as shown in FIG. 2A , thereby effectively reducing the laser output power of the modulated laser diode. The amplitude of the oscillations in time. In some embodiments, the front diffraction grating length L0 is equal to the first rear diffraction grating length L1. In other embodiments, the ratio of the front-end diffraction grating length L0 to the first back-end diffraction grating length L1 is greater than or equal to 1 and less than or equal to 4. In some embodiments, the duty cycle D1/P1 of the first back-end diffraction grating is greater than 0% and less than or equal to 35%. In other embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 30%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 25%. In some other preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 23%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 20%. In some other preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 18%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 15%. In some other preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 10%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 5%.

请参阅图2M以及图2N,其为本发明一种调变激光二极管改良结构的具体实施例与现有技术的一具体实施例的输出功率随时间变化图比较。其中图2M以及图2N的实施例的本发明一种调变激光二极管改良结构为一电致光吸收调变激光二极管,其结构如图1B的实施例所示,其中分布式回馈激光1的结构如图2A所示。在图2M中,有一个特例,其第一后端绕射光栅责务周期D1/P1等于50%的结构与现有技术的绕射光栅97具有相同的结构。而在图2M中,第一后端绕射光栅责务周期D1/P1等于40%、30%、或20%,则为本发明的分布式回馈激光1所具有的结构。从图2M中可以轻易观察得知,当第一后端绕射光栅责务周期D1/P1等于50%(与现有技术的绕射光栅97具有相同结构)时,激光的输出功率随时间的震荡幅度很大。而本发明的分布式回馈激光1所具有的结构(不论是第一后端绕射光栅责务周期D1/P1等于40%、D1=30%、或D1=20%),其激光的输出功率随时间的震荡幅度都大幅小于第一后端绕射光栅责务周期D1/P1等于50%(与现有技术的绕射光栅97具有相同结构)的输出功率随时间的震荡幅度。尤其是当第一后端绕射光栅责务周期D1/P1等于20%,其激光的输出功率随时间的震荡幅度更是远小于第一后端绕射光栅责务周期D1/P1等于50%(与现有技术的绕射光栅97具有相同结构)的输出功率随时间的震荡幅度。由于当第一后端绕射光栅责务周期D1/P1等于10%、或5%时,激光的输出功率随时间的震荡幅度都太小了,若放在图2M将看不出其差异,故另以图2N来显示。从图2N可以明显看出,第一后端绕射光栅责务周期D1/P1等于10%、或5%的输出功率随时间的震荡幅度比第一后端绕射光栅责务周期D1/P1等于20%的输出功率随时间的震荡幅度还来得更小一些。因此,本发明的一种调变激光二极管改良结构确实能增强抗反射功能,显著降低其光输出功率随时间的震荡幅度。图2N有一个特例,是当第一后端绕射光栅责务周期D1/P1等于0%时,表示为没有第一后端绕射光栅51的状况。但没有第一后端绕射光栅51的状况,其输出功率随时间的震荡幅度却大于第一后端绕射光栅责务周期D1/P1等于20%、10%、或5%的输出功率随时间的震荡幅度。Please refer to FIG. 2M and FIG. 2N , which are graphs comparing the output power with time of a specific embodiment of an improved structure of a modulating laser diode according to the present invention and a specific embodiment of the prior art. An improved structure of the modulated laser diode of the present invention in the embodiments of FIG. 2M and FIG. 2N is an electro-optical absorption modulated laser diode, the structure of which is shown in the embodiment of FIG. 1B , wherein the structure of the distributed feedback laser 1 is As shown in Figure 2A. In FIG. 2M, there is a special case, the structure of which the duty period D1/P1 of the first rear-end diffraction grating is equal to 50% has the same structure as the diffraction grating 97 of the prior art. In FIG. 2M, the duty cycle D1/P1 of the first rear-end diffraction grating is equal to 40%, 30%, or 20%, which is the structure of the distributed feedback laser 1 of the present invention. It can be easily observed from FIG. 2M that when the duty period D1/P1 of the first rear-end diffraction grating is equal to 50% (which has the same structure as the diffraction grating 97 of the prior art), the output power of the laser varies with time. The vibration is huge. And the structure of the distributed feedback laser 1 of the present invention (whether the duty cycle D1/P1 of the first rear-end diffraction grating is equal to 40%, D1=30%, or D1=20%), the output power of the laser The oscillation amplitude over time is significantly smaller than the oscillation amplitude of the output power over time when the duty period D1/P1 of the first rear-end diffraction grating is equal to 50% (which has the same structure as the diffraction grating 97 of the prior art). Especially when the duty cycle D1/P1 of the first back-end diffraction grating is equal to 20%, the oscillation amplitude of the output power of the laser over time is much smaller than the duty cycle D1/P1 of the first back-end diffraction grating is equal to 50%. (Has the same structure as the diffraction grating 97 of the prior art) the oscillation amplitude of the output power with time. Since when the duty period D1/P1 of the first rear-end diffraction grating is equal to 10% or 5%, the oscillation amplitude of the output power of the laser with time is too small, and the difference will not be seen if it is placed in Figure 2M, Therefore, it is also shown in FIG. 2N. It can be clearly seen from Fig. 2N that the oscillation amplitude of the output power with the duty period D1/P1 of the first back-end diffraction grating equal to 10% or 5% over time is larger than that of the duty period D1/P1 of the first back-end diffraction grating. An output power equal to 20% has a smaller oscillation amplitude over time. Therefore, an improved structure of the modulated laser diode of the present invention can indeed enhance the anti-reflection function and significantly reduce the oscillation amplitude of its optical output power with time. There is a special case in FIG. 2N, which is a situation in which there is no first rear-end diffraction grating 51 when the duty cycle D1/P1 of the first rear-end diffraction grating is equal to 0%. However, without the first back-end diffraction grating 51, the oscillation amplitude of its output power with time is greater than that of the first back-end diffraction grating duty cycle D1/P1 equal to 20%, 10%, or 5% of the output power The amplitude of the oscillations in time.

请参阅图2B,其为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图2B的实施例的主要结构与图2A的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。在一些实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于65%。在另一些实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于70%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于75%。在另一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于77%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于80%。在另一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于82%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于85%。在另一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于90%。在一些较佳的实施例中,第一后端绕射光栅责务周期D1/P1大于0%且小于或等于95%。图1A或图1B的实施例中的本发明一种调变激光二极管改良结构可具有如图2B的分布式回馈激光1的结构,藉此可有效地降低调变激光二极管的激光输出功率随时间的震荡幅度。Please refer to FIG. 2B , which is a schematic cross-sectional view of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. The main structure of the embodiment of FIG. 2B is substantially the same as that of the embodiment of FIG. 2A , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. In some embodiments, the duty cycle D1/P1 of the first back-end diffraction grating is greater than 0% and less than or equal to 65%. In other embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 70%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 75%. In some other preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 77%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 80%. In some other preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 82%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 85%. In some other preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 90%. In some preferred embodiments, the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 0% and less than or equal to 95%. An improved structure of the modulated laser diode of the present invention in the embodiment of FIG. 1A or FIG. 1B may have the structure of the distributed feedback laser 1 as shown in FIG. 2B , thereby effectively reducing the laser output power of the modulated laser diode over time. vibration amplitude.

请参阅图2C~图2L,其为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图2C的实施例的主要结构与图2A的实施例的结构大致相同,惟,其中第一后端绕射光栅51形成于分布式回馈激光1的后端部3的下半导体层20中,且其中前端绕射光栅50与主动层30之间的距离X0等于第一后端绕射光栅51与主动层30之间的距离X1。其中图2D的实施例的主要结构与图2C的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图2E的实施例的主要结构与图2A的实施例的结构大致相同,惟,其中前端绕射光栅50形成于分布式回馈激光1的前端部2的下半导体层20中,且其中前端绕射光栅50与主动层30之间的距离X0等于第一后端绕射光栅51与主动层30之间的距离X1。其中图2F的实施例的主要结构与图2E的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图2G的实施例的主要结构与图2E的实施例的结构大致相同,惟,其中第一后端绕射光栅51形成于分布式回馈激光1的后端部3的下半导体层20中,且其中前端绕射光栅50与主动层30之间的距离X0等于第一后端绕射光栅51与主动层30之间的距离X1。其中图2H的实施例的主要结构与图2G的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图2I的实施例的主要结构与图2C的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的上半导体层40中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图2J的实施例的主要结构与图2I的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图2K的实施例的主要结构与图2E的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的下半导体层20中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图2L的实施例的主要结构与图2K的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。图1A或图1B的实施例中的本发明一种调变激光二极管改良结构可具有如图2C~图2L中任一个实施例的分布式回馈激光1的结构,藉此可有效地降低调变激光二极管的激光输出功率随时间的震荡幅度。Please refer to FIG. 2C to FIG. 2L , which are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. The main structure of the embodiment of FIG. 2C is substantially the same as that of the embodiment of FIG. 2A , except that the first rear-end diffraction grating 51 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 , And the distance X0 between the front diffraction grating 50 and the active layer 30 is equal to the distance X1 between the first rear diffraction grating 51 and the active layer 30 . The main structure of the embodiment of FIG. 2D is substantially the same as that of the embodiment of FIG. 2C , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 2E is substantially the same as that of the embodiment of FIG. 2A , except that the front-end diffraction grating 50 is formed in the lower semiconductor layer 20 of the front-end portion 2 of the distributed feedback laser 1 , and the front-end diffraction grating 50 is wound around The distance X0 between the diffraction grating 50 and the active layer 30 is equal to the distance X1 between the first rear-end diffraction grating 51 and the active layer 30 . The main structure of the embodiment of FIG. 2F is substantially the same as that of the embodiment of FIG. 2E , except that the duty period D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 2G is substantially the same as that of the embodiment of FIG. 2E , except that the first rear-end diffraction grating 51 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 , And the distance X0 between the front diffraction grating 50 and the active layer 30 is equal to the distance X1 between the first rear diffraction grating 51 and the active layer 30 . The main structure of the embodiment of FIG. 2H is substantially the same as that of the embodiment of FIG. 2G , except that the duty period D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 2I is substantially the same as that of the embodiment of FIG. 2C , except that the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the upper semiconductor layer 40 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 2J is substantially the same as that of the embodiment of FIG. 2I , except that the duty cycle D1 / P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 2K is substantially the same as that of the embodiment of FIG. 2E , but the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 2L is substantially the same as that of the embodiment of FIG. 2K , except that the duty period D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. An improved structure of the modulated laser diode of the present invention in the embodiment of FIG. 1A or FIG. 1B can have the structure of the distributed feedback laser 1 in any of the embodiments of FIGS. 2C to 2L , thereby effectively reducing the modulation. The oscillation amplitude of the laser output power of a laser diode over time.

请参阅图3A~图3H,其为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图3A的实施例的主要结构与图2A的实施例的结构大致相同,惟,其中前端绕射光栅50与主动层30之间的距离X0小于第一后端绕射光栅51与主动层30之间的距离X1。其中图3B的实施例的主要结构与图3A的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图3C的实施例的主要结构与图2C的实施例的结构大致相同,惟,其中前端绕射光栅50与主动层30之间的距离X0小于第一后端绕射光栅51与主动层30之间的距离X1。其中图3D的实施例的主要结构与图3C的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图3E的实施例的主要结构与图2E的实施例的结构大致相同,惟,其中前端绕射光栅50与主动层30之间的距离X0小于第一后端绕射光栅51与主动层30之间的距离X1。其中图3F的实施例的主要结构与图3E的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图3G的实施例的主要结构与图2G的实施例的结构大致相同,惟,其中前端绕射光栅50与主动层30之间的距离X0小于第一后端绕射光栅51与主动层30之间的距离X1。其中图3H的实施例的主要结构与图3G的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。图1A或图1B的实施例中的本发明一种调变激光二极管改良结构可具有如图3A~图3H中任一个实施例的分布式回馈激光1的结构,藉此可有效地降低调变激光二极管的激光输出功率随时间的震荡幅度。Please refer to FIGS. 3A to 3H , which are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. The main structure of the embodiment of FIG. 3A is substantially the same as that of the embodiment of FIG. 2A , except that the distance X0 between the front-end diffraction grating 50 and the active layer 30 is smaller than the first back-end diffraction grating 51 and the active layer 30 The distance between X1. The main structure of the embodiment of FIG. 3B is substantially the same as that of the embodiment of FIG. 3A , except that the duty period D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 3C is substantially the same as that of the embodiment of FIG. 2C , except that the distance X0 between the front-end diffraction grating 50 and the active layer 30 is smaller than the first rear-end diffraction grating 51 and the active layer 30 The distance between X1. The main structure of the embodiment of FIG. 3D is substantially the same as that of the embodiment of FIG. 3C , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 3E is substantially the same as that of the embodiment of FIG. 2E , except that the distance X0 between the front-end diffraction grating 50 and the active layer 30 is smaller than the first rear-end diffraction grating 51 and the active layer 30 The distance between X1. The main structure of the embodiment of FIG. 3F is substantially the same as that of the embodiment of FIG. 3E, but the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 3G is substantially the same as that of the embodiment of FIG. 2G , except that the distance X0 between the front-end diffraction grating 50 and the active layer 30 is smaller than the first back-end diffraction grating 51 and the active layer 30 The distance between X1. The main structure of the embodiment of FIG. 3H is substantially the same as that of the embodiment of FIG. 3G , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. An improved structure of the modulated laser diode of the present invention in the embodiment of FIG. 1A or FIG. 1B can have the structure of the distributed feedback laser 1 in any of the embodiments of FIGS. 3A to 3H , thereby effectively reducing the modulation. The oscillation amplitude of the laser output power of a laser diode over time.

请参阅图4A~图4H,其为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图4A的实施例的主要结构与图3A的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的上半导体层40中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图4B的实施例的主要结构与图4A的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图4C的实施例的主要结构与图3C的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的上半导体层40中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图4D的实施例的主要结构与图4C的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图4E的实施例的主要结构与图3E的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的下半导体层20中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图4F的实施例的主要结构与图4E的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。其中图4G的实施例的主要结构与图3G的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的下半导体层20中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图4H的实施例的主要结构与图4G的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于60%且小于100%。图1A或图1B的实施例中的本发明一种调变激光二极管改良结构可具有如图4A~图4H中任一个实施例的分布式回馈激光1的结构,藉此可有效地降低调变激光二极管的激光输出功率随时间的震荡幅度。Please refer to FIGS. 4A to 4H , which are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. The main structure of the embodiment of FIG. 4A is substantially the same as that of the embodiment of FIG. 3A , but the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the upper semiconductor layer 40 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 4B is substantially the same as that of the embodiment of FIG. 4A , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 4C is substantially the same as that of the embodiment of FIG. 3C , except that the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the upper semiconductor layer 40 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 4D is substantially the same as that of the embodiment of FIG. 4C , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 4E is substantially the same as that of the embodiment of FIG. 3E , but the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 4F is substantially the same as that of the embodiment of FIG. 4E , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. The main structure of the embodiment of FIG. 4G is substantially the same as that of the embodiment of FIG. 3G , except that the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 4H is substantially the same as that of the embodiment of FIG. 4G , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than 60% and less than 100%. An improved structure of the modulated laser diode of the present invention in the embodiment of FIG. 1A or FIG. 1B can have the structure of the distributed feedback laser 1 in any of the embodiments of FIGS. 4A to 4H , thereby effectively reducing the modulation. The oscillation amplitude of the laser output power of a laser diode over time.

请参阅图5A~图5H,其为本发明一种调变激光二极管改良结构的分布式回馈激光的具体实施例的剖面示意图。其中图5A的实施例的主要结构与图3A的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于或等于40%且小于或等于60%。其中图5B的实施例的主要结构与图3C的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于或等于40%且小于或等于60%。其中图5C的实施例的主要结构与图3E的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于或等于40%且小于或等于60%。其中图5D的实施例的主要结构与图3G的实施例的结构大致相同,惟,其中第一后端绕射光栅责务周期D1/P1大于或等于40%且小于或等于60%。其中图5E的实施例的主要结构与图5A的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的上半导体层40中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图5F的实施例的主要结构与图5E的实施例的结构大致相同,惟,其中第一后端绕射光栅51形成于分布式回馈激光1的后端部3的下半导体层20中,且其中前端绕射光栅50与主动层30之间的距离X0小于第一后端绕射光栅51与主动层30之间的距离X1。其中图5G的实施例的主要结构与图5C的实施例的结构大致相同,惟,其中分布式回馈激光1更包括一第二后端绕射光栅52。其中第二后端绕射光栅52形成于分布式回馈激光1的后端部3的下半导体层20中。第二后端绕射光栅52与主动层30之间的一距离X2等于前端绕射光栅50与主动层30之间的距离X0。其中第二后端绕射光栅52具有一第二后端绕射光栅长度L2。第二后端绕射光栅52具有一第二后端绕射光栅周期P2以及一第二后端绕射光栅责务周期D2/P2。其中第二后端绕射光栅长度L2等于第一后端绕射光栅长度L1。其中前端绕射光栅周期P0等于第二后端绕射光栅周期P2。其中第二后端绕射光栅责务周期D2/P2等于100%。其中图5H的实施例的主要结构与图5G的实施例的结构大致相同,惟,其中第一后端绕射光栅51形成于分布式回馈激光1的后端部3的下半导体层20中,且其中前端绕射光栅50与主动层30之间的距离X0小于第一后端绕射光栅51与主动层30之间的距离X1。图1A或图1B的实施例中的本发明一种调变激光二极管改良结构可具有如图5A~图5H中任一个实施例的分布式回馈激光1的结构,藉此可有效地降低调变激光二极管的激光输出功率随时间的震荡幅度。Please refer to FIGS. 5A to 5H , which are schematic cross-sectional views of a specific embodiment of a distributed feedback laser with an improved structure of a modulated laser diode according to the present invention. The main structure of the embodiment of FIG. 5A is substantially the same as that of the embodiment of FIG. 3A, except that the duty period D1/P1 of the first rear-end diffraction grating is greater than or equal to 40% and less than or equal to 60%. The main structure of the embodiment of FIG. 5B is substantially the same as that of the embodiment of FIG. 3C, except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than or equal to 40% and less than or equal to 60%. The main structure of the embodiment of FIG. 5C is substantially the same as that of the embodiment of FIG. 3E, except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than or equal to 40% and less than or equal to 60%. The main structure of the embodiment of FIG. 5D is substantially the same as that of the embodiment of FIG. 3G , except that the duty cycle D1/P1 of the first rear-end diffraction grating is greater than or equal to 40% and less than or equal to 60%. The main structure of the embodiment of FIG. 5E is substantially the same as that of the embodiment of FIG. 5A , except that the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the upper semiconductor layer 40 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 5F is substantially the same as that of the embodiment of FIG. 5E , except that the first rear-end diffraction grating 51 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 , And the distance X0 between the front-end diffraction grating 50 and the active layer 30 is smaller than the distance X1 between the first rear-end diffraction grating 51 and the active layer 30 . The main structure of the embodiment of FIG. 5G is substantially the same as that of the embodiment of FIG. 5C , except that the distributed feedback laser 1 further includes a second rear-end diffraction grating 52 . The second rear-end diffraction grating 52 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 . A distance X2 between the second rear diffraction grating 52 and the active layer 30 is equal to a distance X0 between the front diffraction grating 50 and the active layer 30 . The second rear diffraction grating 52 has a second rear diffraction grating length L2. The second back-end diffraction grating 52 has a second back-end diffraction grating period P2 and a second back-end diffraction grating duty period D2/P2. The length L2 of the second rear-end diffraction grating is equal to the length L1 of the first rear-end diffraction grating. The front-end diffraction grating period P0 is equal to the second rear-end diffraction grating period P2. The duty cycle D2/P2 of the second rear-end diffraction grating is equal to 100%. The main structure of the embodiment of FIG. 5H is substantially the same as that of the embodiment of FIG. 5G , except that the first rear-end diffraction grating 51 is formed in the lower semiconductor layer 20 of the rear-end portion 3 of the distributed feedback laser 1 , And the distance X0 between the front-end diffraction grating 50 and the active layer 30 is smaller than the distance X1 between the first rear-end diffraction grating 51 and the active layer 30 . An improved structure of the modulated laser diode of the present invention in the embodiment of FIG. 1A or FIG. 1B can have the structure of the distributed feedback laser 1 in any of the embodiments of FIGS. 5A to 5H , thereby effectively reducing the modulation The oscillation amplitude of the laser output power of a laser diode over time.

以上所述是本发明的具体实施例及所运用的技术手段,根据本文的揭露或教导可衍生推导出许多的变更与修正,仍可视为本发明的构想所作的等效改变,其所产生的作用仍未超出说明书及图式所涵盖的实质精神,均应视为在本发明的技术范畴之内,合先陈明。The above are the specific embodiments of the present invention and the technical means used. According to the disclosure or teaching herein, many changes and modifications can be derived and deduced, which can still be regarded as equivalent changes made by the concept of the present invention. The effect of the invention does not exceed the substantial spirit covered by the description and drawings, and should be regarded as being within the technical scope of the present invention, and should be stated first.

Claims (20)

1.一种调变激光二极管改良结构,其特征在于,包括:1. An improved structure of a modulated laser diode, characterized in that, comprising: 一半导体基板;以及a semiconductor substrate; and 一分布式回馈激光,形成于该半导体基板之上,其中该分布式回馈激光分为一前端部以及一后端部,其中该分布式回馈激光包括:A distributed feedback laser is formed on the semiconductor substrate, wherein the distributed feedback laser is divided into a front end portion and a rear end portion, wherein the distributed feedback laser includes: 一下半导体层,形成于该半导体基板之上;A lower semiconductor layer is formed on the semiconductor substrate; 一主动层,形成于该下半导体层之上;an active layer formed on the lower semiconductor layer; 一上半导体层,形成于该主动层之上;an upper semiconductor layer formed on the active layer; 一前端绕射光栅,形成于该分布式回馈激光的该前端部的该下半导体层中或该上半导体层中,其中该前端绕射光栅具有一前端绕射光栅长度,其中该前端绕射光栅具有一前端绕射光栅周期以及一前端绕射光栅责务周期;以及A front-end diffraction grating formed in the lower semiconductor layer or in the upper semiconductor layer of the front-end portion of the distributed feedback laser, wherein the front-end diffraction grating has a front-end diffraction grating length, wherein the front-end diffraction grating having a front-end diffraction grating period and a front-end diffraction grating duty period; and 一第一后端绕射光栅,形成于该分布式回馈激光的该后端部的该下半导体层中或该上半导体层中,其中该第一后端绕射光栅具有一第一后端绕射光栅长度,其中该第一后端绕射光栅具有一第一后端绕射光栅周期以及一第一后端绕射光栅责务周期;A first rear diffraction grating is formed in the lower semiconductor layer or in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the first rear diffraction grating has a first rear diffraction the length of the diffraction grating, wherein the first back-end diffraction grating has a first back-end diffraction grating period and a first back-end diffraction grating duty period; 其中该前端绕射光栅长度大于或等于该第一后端绕射光栅长度,其中该前端绕射光栅周期等于该第一后端绕射光栅周期,其中该前端绕射光栅责务周期大于或等于40%且小于或等于60%,其中该第一后端绕射光栅责务周期大于0%且小于40%或大于60%且小于100%。The length of the front-end diffraction grating is greater than or equal to the length of the first back-end diffraction grating, wherein the period of the front-end diffraction grating is equal to the period of the first back-end diffraction grating, and the duty period of the front-end diffraction grating is greater than or equal to 40% and less than or equal to 60%, wherein the duty cycle of the first back-end diffraction grating is greater than 0% and less than 40% or greater than 60% and less than 100%. 2.如权利要求1所述的调变激光二极管改良结构,其特征在于,该前端绕射光栅与该主动层之间的一距离等于该第一后端绕射光栅与该主动层之间的一距离。2. The improved structure of claim 1, wherein a distance between the front-end diffraction grating and the active layer is equal to a distance between the first rear-end diffraction grating and the active layer a distance. 3.如权利要求2所述的调变激光二极管改良结构,其特征在于,(1)该前端绕射光栅形成于该分布式回馈激光的该前端部的该下半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,或(2)该前端绕射光栅形成于该分布式回馈激光的该前端部的该上半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中;其中该第二后端绕射光栅与该主动层之间的一距离等于该前端绕射光栅与该主动层之间的该距离,其中该第二后端绕射光栅具有一第二后端绕射光栅长度,其中该第二后端绕射光栅具有一第二后端绕射光栅周期以及一第二后端绕射光栅责务周期,其中该第二后端绕射光栅长度等于该第一后端绕射光栅长度,其中该前端绕射光栅周期等于该第二后端绕射光栅周期,其中该第二后端绕射光栅责务周期等于100%。3 . The improved structure of a modulated laser diode as claimed in claim 2 , wherein (1) the front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first A rear-end diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, or (2) the front-end diffraction grating is formed in the upper semiconductor layer of the front end of the distributed feedback laser, and the first A rear-end diffraction grating is formed in the lower semiconductor layer at the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating Formed in the upper semiconductor layer of the rear end of the distributed feedback laser; wherein a distance between the second rear diffraction grating and the active layer is equal to the distance between the front diffraction grating and the active layer the distance, wherein the second back-end diffraction grating has a second back-end diffraction grating length, wherein the second back-end diffraction grating has a second back-end diffraction grating period and a second back-end diffraction grating grating duty period, wherein the second back-end diffraction grating length is equal to the first back-end diffraction grating length, wherein the front-end diffraction grating period is equal to the second back-end diffraction grating period, wherein the second back-end diffraction grating period The duty cycle of the diffraction grating is equal to 100%. 4.如权利要求1所述的调变激光二极管改良结构,其特征在于,该前端绕射光栅与该主动层之间的一距离小于该第一后端绕射光栅与该主动层之间的一距离。4. The improved structure of claim 1, wherein a distance between the front-end diffraction grating and the active layer is smaller than a distance between the first rear-end diffraction grating and the active layer a distance. 5.如权利要求4所述的调变激光二极管改良结构,其特征在于,(1)该前端绕射光栅形成于该分布式回馈激光的该前端部的该上半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,且该第二后端绕射光栅位于该第一后端绕射光栅与该主动层之间;(2)该前端绕射光栅形成于该分布式回馈激光的该前端部的该上半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中;(3)该前端绕射光栅形成于该分布式回馈激光的该前端部的该下半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,且该第二后端绕射光栅位于该第一后端绕射光栅与该主动层之间;或(4)该前端绕射光栅形成于该分布式回馈激光的该前端部的该下半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中;其中该第二后端绕射光栅与该主动层之间的一距离等于该前端绕射光栅与该主动层之间的该距离,其中该第二后端绕射光栅具有一第二后端绕射光栅长度,其中该第二后端绕射光栅具有一第二后端绕射光栅周期以及一第二后端绕射光栅责务周期,其中该第二后端绕射光栅长度等于该第一后端绕射光栅长度,其中该前端绕射光栅周期等于该第二后端绕射光栅周期,其中该第二后端绕射光栅责务周期等于100%。5 . The improved structure of a modulated laser diode as claimed in claim 4 , wherein (1) the front-end diffraction grating is formed in the upper semiconductor layer of the front-end portion of the distributed feedback laser, and the first A rear-end diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating Formed in the upper semiconductor layer of the rear end of the distributed feedback laser, and the second rear diffraction grating is located between the first rear diffraction grating and the active layer; (2) the front diffraction grating A diffraction grating is formed in the upper semiconductor layer of the front end of the distributed feedback laser, and the first rear diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, wherein the The distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser; (3) the front-end diffraction A grating is formed in the lower semiconductor layer of the front end of the distributed feedback laser, and the first rear diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, wherein the distribution The distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, and the second rear-end diffraction grating is A grating is located between the first rear-end diffraction grating and the active layer; or (4) the front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end A diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second rear diffraction grating, wherein the second rear diffraction grating is formed in In the lower semiconductor layer of the rear end of the distributed feedback laser; wherein a distance between the second rear diffraction grating and the active layer is equal to the distance between the front diffraction grating and the active layer , wherein the second back-end diffraction grating has a second back-end diffraction grating length, wherein the second back-end diffraction grating has a second back-end diffraction grating period and a second back-end diffraction grating duty service period, wherein the second back-end diffraction grating length is equal to the first back-end diffraction grating length, wherein the front-end diffraction grating period is equal to the second back-end diffraction grating period, wherein the second back-end diffraction grating period The grating duty cycle is equal to 100%. 6.如权利要求1所述的调变激光二极管改良结构,其特征在于,该下半导体层为一n型半导体层。6. The improved structure of claim 1, wherein the lower semiconductor layer is an n-type semiconductor layer. 7.如权利要求1所述的调变激光二极管改良结构,其特征在于,该上半导体层为一p型半导体层。7. The improved structure of claim 1, wherein the upper semiconductor layer is a p-type semiconductor layer. 8.如权利要求1所述的调变激光二极管改良结构,其特征在于,该调变激光二极管为一直接调变激光二极管。8. The improved structure of the modulated laser diode as claimed in claim 1, wherein the modulated laser diode is a direct modulated laser diode. 9.如权利要求1所述的调变激光二极管改良结构,其特征在于,更包括一电致光吸收调变器,其中该电致光吸收调变器形成于该半导体基板之上,其中该分布式回馈激光的该前端部位于该分布式回馈激光的该后端部以及该电致光吸收调变器之间,其中该调变激光二极管为一电致光吸收调变激光二极管。9 . The improved modulated laser diode structure of claim 1 , further comprising an electro-optical absorption modulator, wherein the electro-optical absorption modulator is formed on the semiconductor substrate, wherein the The front end of the distributed feedback laser is located between the rear end of the distributed feedback laser and the electro-optical absorption modulator, wherein the modulation laser diode is an electro-optical absorption modulation laser diode. 10.如权利要求1至9中任一所述的调变激光二极管改良结构,其特征在于,该前端绕射光栅长度与该第一后端绕射光栅长度之比大于或等于1,且小于或等于4。10 . The improved structure of a modulated laser diode as claimed in claim 1 , wherein the ratio of the length of the front-end diffraction grating to the length of the first back-end diffraction grating is greater than or equal to 1 and less than 10 . or equal to 4. 11.如权利要求1至9中任一所述的调变激光二极管改良结构,其特征在于,该第一后端绕射光栅责务周期大于0%且小于或等于25%或大于或等于75%且小于100%。11. The modulated laser diode improvement structure of any one of claims 1 to 9, wherein the duty cycle of the first rear-end diffraction grating is greater than 0% and less than or equal to 25% or greater than or equal to 75% % and less than 100%. 12.如权利要求11所述的调变激光二极管改良结构,其特征在于,该前端绕射光栅长度与该第一后端绕射光栅长度之比大于或等于1,且小于或等于4。12 . The improved modulated laser diode structure of claim 11 , wherein the ratio of the length of the front-end diffraction grating to the length of the first back-end diffraction grating is greater than or equal to 1 and less than or equal to 4. 13 . 13.一种调变激光二极管改良结构,其特征在于,包括:13. An improved structure of a modulated laser diode, characterized in that it comprises: 一半导体基板;以及a semiconductor substrate; and 一分布式回馈激光,形成于该半导体基板之上,其中该分布式回馈激光分为一前端部以及一后端部,其中该分布式回馈激光包括:A distributed feedback laser is formed on the semiconductor substrate, wherein the distributed feedback laser is divided into a front end portion and a rear end portion, wherein the distributed feedback laser includes: 一下半导体层,形成于该半导体基板之上;A lower semiconductor layer is formed on the semiconductor substrate; 一主动层,形成于该下半导体层之上;an active layer formed on the lower semiconductor layer; 一上半导体层,形成于该主动层之上;an upper semiconductor layer formed on the active layer; 一前端绕射光栅,形成于该分布式回馈激光的该前端部的该下半导体层中或该上半导体层中,其中该前端绕射光栅具有一前端绕射光栅长度,其中该前端绕射光栅具有一前端绕射光栅周期以及一前端绕射光栅责务周期;以及A front-end diffraction grating formed in the lower semiconductor layer or in the upper semiconductor layer of the front-end portion of the distributed feedback laser, wherein the front-end diffraction grating has a front-end diffraction grating length, wherein the front-end diffraction grating having a front-end diffraction grating period and a front-end diffraction grating duty period; and 一第一后端绕射光栅,形成于该分布式回馈激光的该后端部的该下半导体层中或该上半导体层中,其中该第一后端绕射光栅具有一第一后端绕射光栅长度,其中该第一后端绕射光栅具有一第一后端绕射光栅周期以及一第一后端绕射光栅责务周期;A first rear diffraction grating is formed in the lower semiconductor layer or in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the first rear diffraction grating has a first rear diffraction the length of the diffraction grating, wherein the first back-end diffraction grating has a first back-end diffraction grating period and a first back-end diffraction grating duty period; 其中该前端绕射光栅长度大于或等于该第一后端绕射光栅长度,其中该前端绕射光栅周期等于该第一后端绕射光栅周期,其中该前端绕射光栅责务周期大于或等于40%且小于或等于60%,其中该前端绕射光栅与该主动层之间的一距离小于该第一后端绕射光栅与该主动层之间的一距离。The length of the front-end diffraction grating is greater than or equal to the length of the first back-end diffraction grating, wherein the period of the front-end diffraction grating is equal to the period of the first back-end diffraction grating, and the duty period of the front-end diffraction grating is greater than or equal to 40% and less than or equal to 60%, wherein a distance between the front-end diffraction grating and the active layer is smaller than a distance between the first rear-end diffraction grating and the active layer. 14.如权利要求13所述的调变激光二极管改良结构,其特征在于,该第一后端绕射光栅责务周期大于或等于40%且小于或等于60%。14. The improved structure of claim 13, wherein the duty cycle of the first rear-end diffraction grating is greater than or equal to 40% and less than or equal to 60%. 15.如权利要求14所述的调变激光二极管改良结构,其特征在于,(1)该前端绕射光栅形成于该分布式回馈激光的该前端部的该上半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,且该第二后端绕射光栅位于该第一后端绕射光栅与该主动层之间;(2)该前端绕射光栅形成于该分布式回馈激光的该前端部的该上半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中;(3)该前端绕射光栅形成于该分布式回馈激光的该前端部的该下半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中,且该第二后端绕射光栅位于该第一后端绕射光栅与该主动层之间;或(4)该前端绕射光栅形成于该分布式回馈激光的该前端部的该下半导体层中,且该第一后端绕射光栅形成于该分布式回馈激光的该后端部的该上半导体层中,其中该分布式回馈激光更包括一第二后端绕射光栅,其中该第二后端绕射光栅形成于该分布式回馈激光的该后端部的该下半导体层中;其中该第二后端绕射光栅与该主动层之间的一距离等于该前端绕射光栅与该主动层之间的该距离,其中该第二后端绕射光栅具有一第二后端绕射光栅长度,其中该第二后端绕射光栅具有一第二后端绕射光栅周期以及一第二后端绕射光栅责务周期,其中该第二后端绕射光栅长度等于该第一后端绕射光栅长度,其中该前端绕射光栅周期等于该第二后端绕射光栅周期,其中该第二后端绕射光栅责务周期等于100%。15. The improved structure of claim 14, wherein (1) the front-end diffraction grating is formed in the upper semiconductor layer of the front-end portion of the distributed feedback laser, and the first A rear-end diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating Formed in the upper semiconductor layer of the rear end of the distributed feedback laser, and the second rear diffraction grating is located between the first rear diffraction grating and the active layer; (2) the front diffraction grating A diffraction grating is formed in the upper semiconductor layer of the front end of the distributed feedback laser, and the first rear diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, wherein the The distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser; (3) the front-end diffraction A grating is formed in the lower semiconductor layer of the front end of the distributed feedback laser, and the first rear diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, wherein the distribution The distributed feedback laser further includes a second rear-end diffraction grating, wherein the second rear-end diffraction grating is formed in the lower semiconductor layer of the rear end of the distributed feedback laser, and the second rear-end diffraction grating is A grating is located between the first rear-end diffraction grating and the active layer; or (4) the front-end diffraction grating is formed in the lower semiconductor layer of the front-end portion of the distributed feedback laser, and the first rear-end A diffraction grating is formed in the upper semiconductor layer at the rear end of the distributed feedback laser, wherein the distributed feedback laser further includes a second rear diffraction grating, wherein the second rear diffraction grating is formed in In the lower semiconductor layer of the rear end of the distributed feedback laser; wherein a distance between the second rear diffraction grating and the active layer is equal to the distance between the front diffraction grating and the active layer , wherein the second back-end diffraction grating has a second back-end diffraction grating length, wherein the second back-end diffraction grating has a second back-end diffraction grating period and a second back-end diffraction grating duty service period, wherein the second back-end diffraction grating length is equal to the first back-end diffraction grating length, wherein the front-end diffraction grating period is equal to the second back-end diffraction grating period, wherein the second back-end diffraction grating period The grating duty cycle is equal to 100%. 16.如权利要求13所述的调变激光二极管改良结构,其特征在于,该下半导体层为一n型半导体层。16. The improved structure of claim 13, wherein the lower semiconductor layer is an n-type semiconductor layer. 17.如权利要求13所述的调变激光二极管改良结构,其特征在于,该上半导体层为一p型半导体层。17. The improved structure of claim 13, wherein the upper semiconductor layer is a p-type semiconductor layer. 18.如权利要求13所述的调变激光二极管改良结构,其特征在于,该调变激光二极管为一直接调变激光二极管。18. The improved structure of the modulated laser diode as claimed in claim 13, wherein the modulated laser diode is a direct modulated laser diode. 19.如权利要求13所述的调变激光二极管改良结构,其特征在于,更包括一电致光吸收调变器,其中该电致光吸收调变器形成于该半导体基板之上,其中该分布式回馈激光的该前端部位于该分布式回馈激光的该后端部以及该电致光吸收调变器之间,其中该调变激光二极管为一电致光吸收调变激光二极管。19. The improved structure of claim 13, further comprising an electro-optical absorption modulator, wherein the electro-optical absorption modulator is formed on the semiconductor substrate, wherein the The front end of the distributed feedback laser is located between the rear end of the distributed feedback laser and the electro-optical absorption modulator, wherein the modulation laser diode is an electro-optical absorption modulation laser diode. 20.如权利要求13至19中任一所述的调变激光二极管改良结构,其特征在于,该前端绕射光栅长度与该第一后端绕射光栅长度之比大于或等于1,且小于或等于4。20. The improved structure of a modulated laser diode as claimed in any one of claims 13 to 19, wherein the ratio of the length of the front-end diffraction grating to the length of the first back-end diffraction grating is greater than or equal to 1 and less than or equal to 4.
CN201910294614.8A 2019-04-12 2019-04-12 Modulated Laser Diode Improved Structure Pending CN111817132A (en)

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Application publication date: 20201023