CN1116751A - Method for making anti-fake trade mark or mark - Google Patents
Method for making anti-fake trade mark or mark Download PDFInfo
- Publication number
- CN1116751A CN1116751A CN 94104555 CN94104555A CN1116751A CN 1116751 A CN1116751 A CN 1116751A CN 94104555 CN94104555 CN 94104555 CN 94104555 A CN94104555 A CN 94104555A CN 1116751 A CN1116751 A CN 1116751A
- Authority
- CN
- China
- Prior art keywords
- heavy ion
- film
- imaging
- mark
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 30
- 238000003384 imaging method Methods 0.000 claims abstract description 20
- 230000004992 fission Effects 0.000 claims abstract description 19
- 239000012634 fragment Substances 0.000 claims abstract description 19
- 229920003023 plastic Polymers 0.000 claims abstract description 17
- 239000002985 plastic film Substances 0.000 claims abstract description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 34
- 238000005530 etching Methods 0.000 claims description 9
- 239000004033 plastic Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 4
- 229920006255 plastic film Polymers 0.000 claims 2
- 239000007858 starting material Substances 0.000 claims 2
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 abstract description 21
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000013461 design Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 4
- 238000011160 research Methods 0.000 description 3
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920006289 polycarbonate film Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- LBDSXVIYZYSRII-IGMARMGPSA-N alpha-particle Chemical compound [4He+2] LBDSXVIYZYSRII-IGMARMGPSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000032696 parturition Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000000391 smoking effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Measurement Of Radiation (AREA)
Abstract
The making method of anti-fake trade mark or mark. After passing through the imaging mould, the high-energy heavy ions or fission fragments are irradiated on the transparent plastic film, and after irradiation, a milky white pattern with bright contrast can be formed on the film. The pattern can be used as a trademark or a commodity mark. The irradiated area of the film has a plurality of micropores, so that the film can be breathable and permeable, and consumers can easily identify the authenticity of the film. The trademark or mark thus produced is not easy to be imitated and has low production cost.
Description
The present invention relates to the manufacture method of anti-false trademark or sign, particularly relate to the method for utilizing heavy ion or the imaging of fission fragment irradiation to make anti-false trademark or sign.
In current commodity market, fake products often appears, and give consumer, manufacturer so that cause heavy losses to country, the anti-vacation of therefore cracking down on counterfeit goods becomes pressing problem in the current commodity market.Reach the anti-vacation of cracking down on counterfeit goods effectively, at first will solve the anti-pseudo problem of trade mark or product marking.Present common anti-false trademark or sign, some is easily by imitated, and some is difficult for being differentiated by the consumer, though and some difficult copying is difficult to popularization owing to cost is too high.
The objective of the invention is to provide a kind of both being not easy easily to be differentiated again simultaneously by the consumer by imitated, and the manufacture method of cheap anti-false trademark or sign.
The inventor has carried out all research at the shortcoming of existing anti-false trademark and sign existence, found that, utilize heavy ion (referring to the ion of quality) or fission fragment to come the transparent plastic sheeting of irradiation greater than the α particle, handle this film with NaOH solution then, can make radiation exposed zone become opaque or translucent milky, and can air-and water-permeable.If the mould with hollow out floral designs is installed in the passage of heavy ion or fission fragment irradiation in advance, make heavy ion or fission fragment to pass through, so just can on plastic sheeting, form corresponding milky and floral designs that can air-and water-permeable from the openwork part of this mould.Because therefore this pattern air-and water-permeable is made trade mark with it and can be easy to be discerned by the consumer.And because generation heavy ion or fission fragment need use main equipments such as accelerator or atomic pile, therefore trade mark or the sign with this method manufacturing is difficult for being copied.Also be easy to find the source even someone copys, count seldom because have the unit of accelerator or atomic pile at home.In addition, manufacturing mark in this way, cost is lower than general anti-false trademark, is therefore easily accepted by producer.Owing to found this manufacturing anti-false trademark or denotation approach, so far just finished the present invention.
The principle of the inventive method is to utilize high-energy heavy ion or the fission fragment of energy more than 80MeV to come the transparent plastic sheeting of irradiation, heavy ion or fission fragment can make the radiation exposed wound that is partially damaged on the film, after damaged portion being eroded with Na0H solution, just on plastic sheeting, form some irregular small ducts, its diameter is about 0.1 μ m-12 μ m, the tube wall in these ducts reflects by different directions incident light and reflects, therefore play a kind of scattered beam, most of light can not be seen through, so on transparent plastic film, formed milky pattern with required form.
The inventor has proposed two kinds of methods that are used to make anti-false trademark or sign altogether on the basis of many experiments.Method 1 wherein is to utilize heavy ion as the irradiation energy, and method 2 is to utilize fission fragment as the irradiation energy.
Explain the present invention particularly below with reference to accompanying drawing.
Fig. 1 utilizes the heavy ion imaging method to make the schematic flow diagram of anti-false trademark or sign;
Fig. 2 utilizes the fission fragment imaging method to make the schematic flow diagram of anti-false trademark or sign.
Method 1 of the present invention is to utilize the heavy ion imaging method to make anti-false trademark Or sign, it is characterized in that utilizing thickness is 5-30 μ m, be preferably 8-The transparent plastic film of 20 μ m is raw material, utilizes the heavy ion generator to produce The heavy ion of giving birth to is the irradiation energy, with heavy ion avcceleration heavy ion is accelerated to Its energy reaches more than the 80MeV, is as the criterion can penetrate plastic sheeting, The imaging mould is installed on the passage of heavy ion, makes the HIB spoke after the imaging Impinge upon on the plastic sheeting, exposure time is 0.5-2 seconds, is preferably 0.8-1 second, with NaOH solution film is carried out the etching video picture then and process 1 More than hour, image is as the criterion can show clearly after the drying, and last water is clear Wash and be dried.
The energy of used heavy ion does not have strict restriction in this method 1, But generally should more than 80MeV, be preferably in more than the 130MeV, This will depend on kind and the thickness of used plastic sheeting, the energy of heavy ion with Can penetrate radiation exposed film is as the criterion. The thickness of film is with 5-30 μ m Be advisable, be preferably 8-20 μ m, if thickness then exists less than 5 μ m Trade mark is easy to film is torn when commodity take off, does not so just reach mirror The purpose of the other true and false. If film is thicker than 30 μ m, then require the heavy ion tool There is higher energy just can penetrate film, so economically inadvisable. But In the necessary situation, also can make film thicker. Time during the irradiation film As long as the not strict restriction of length is can imaging on film, for thinner Film, only need 0.5 second or 1 second can imaging, but the time be longer also not Affect quality. In etching step, not tight to the concentration of NaOH solution The requirement of lattice, when just NaOH solution was rarer, etching period is corresponding will be grown A bit. In the ordinary course of things, the NaOH solution concentration is with 10-50 weights Amount % (take solution weight as benchmark) is advisable, and is preferably 20-40 weights Amount %. The not strict restriction of etching period can clearly show with image Be as the criterion.
Method 2 of the present invention is to utilize the fission fragment imaging method to make anti-false trademark or sign, it is characterized in that utilizing thickness is 5-30 μ m, the transparent plastic film that is preferably 8-20 μ m is raw material, the neutron that utilizes atomic pile to produce is primary energy, makes the neutron beam bombardment235The U target so that its Emit fission fragment, make these fission fragments by the imaging mould after irradiation moulding On the material film, exposure time is 10-20 minutes, then with NaOH solution film is carried out the etching video picture and processes more than 1 hour, can show after the drying Go out clearly that image is as the criterion, last water cleans also and is dried.
In method 2, because from235The energy of the fission fragment that the U target is emitted Amount has on average reached more than the 80MeV, does not therefore usually need further to carry High its energy. But because the particle density of fission fragment is less than the weight in the method 1 The ion particle density, so imaging time will grow, but when irradiation, can With235Around the U target a lot of sheet films are set, have so just remedied it The deficiency that the imaging time is long. In method 2 to film thickness, NaOH concentration and to the grasp of other conditions except exposure time all with above-mentioned Method 1 identical.
With trade mark or sign that the inventive method is made, its antifalse effect is obviously excellent In common anti-false trademark. The consumer only needs trade mark or sign are got from commodity Get off, with being applied in milky zone behind the finger-dipping water, see whether it is permeable, Or the smog that produces during with smoking blows and sprays, and sees whether it ventilative, every can not be saturating Water, ventilative person must for counterfeit trademark undoubtedly. In addition, utilize method of the present invention Make anti-false trademark or sign, with low cost, high productivity is easy to automation. Having is the trade mark made from the inventive method again, copys difficulty, even there is the people imitative Make, also find easily the imitator. So method of the present invention and prior art Method is compared, and has outstanding substantive distinguishing features and significant progressive.
Enumerate preferred embodiment of the present invention below, but the present invention is not subjected to the restriction of these embodiment.
Embodiment 1:
On the tandem accelerator of China Atomic Energy Science Research Institute, produce S with anion source
-1Ion is peeled off into it S of 11 positive charge attitudes again after it is quickened
+ 11Ion, making accelerator head high pressure is 10MeV, produce power is the sulphion bundle of 120MeV after quickening, beam intensity is 40 nanoamperes, on the 10 degree pipelines of a left side is on the polycarbonate film of 12 ± 1 μ m at thickness by the radiation of imaging mould, irradiation time is 0.8 second, and etching 2 hours in the NaOH solution of 25 weight % (is benchmark with the solution weight) is then cleaned with tap water and 40 ℃ of oven dry down again.The result has obtained a kind of milky floral designs that have the sharp contrast degree on transparent membrane.The plastic sheeting of this band milky pattern can directly be affixed on the commodity as trade mark.If the background color of commodity packaging also is milky, then can below the trade mark film, serve as a contrast the dark film of last layer, so still can obtain the effect of pattern distinctness.
Embodiment 2:
On the heavy water reactor of China Atomic Energy Science Research Institute, utilize thermal beam to shine
235The U target, making the fission fragment that produces on the target is on the polycarbonate film of 12 ± 1 μ m at thickness by imaging mould irradiation, irradiation time is 15 minutes, and etching 2 hours in the NaOH solution of 25 weight % (based on solution weight) is then cleaned with tap water and 40 ℃ of oven dry down again.The result has obtained the milky floral designs with sharp contrast degree identical with embodiment 1.
At length explained the present invention by embodiment above, those skilled in the art can make various improvement or variation in basic design of the present invention, yet only otherwise deviate from basic design of the present invention and essence, all variations or improve and all should be considered to belong to scope of the present invention.
Claims (6)
1, a kind of method of utilizing the heavy ion imaging to make anti-false trademark or sign, it is characterized in that, utilizing thickness is that the transparent plastic film of 5-30 μ m is starting material, the heavy ion that utilizes the heavy ion generator to produce is the irradiation energy, with heavy ion accelerator heavy ion being accelerated to its energy reaches more than the 80MeV, be as the criterion can penetrate plastic sheeting, the imaging mould is installed on the passage of heavy ion, make heavy ion beam irradiation after the imaging on plastic sheeting, exposure time is 0.5-2 seconds, with NaOH solution film is carried out the etching video picture then and handle more than 1 hour, be as the criterion can show distinct image after the drying, last water cleans and is dried.
2, the method for claim 1 is characterized in that wherein said plastic film thickness is 8-20 μ m.
3, the method for claim 1 is characterized in that wherein said exposure time is 0.8-1 second.
4, a kind of method of utilizing the fission fragment imaging to make anti-false trademark or sign is characterized in that, utilizing thickness is that the transparent plastic film of 5-30 μ m is starting material, and the neutron that utilizes atomic pile to produce is primary energy, makes the neutron beam bombardment
235The U target is so that it emits fission fragment, irradiation is on plastic sheeting after making these fission fragments by the imaging mould, exposure time is 10-20 minutes, then with NaOH solution film being carried out the etching video picture handles more than 1 hour, be as the criterion can show distinct image after the drying, last water cleans and is dried.
5, method as claimed in claim 4 is characterized in that wherein said plastic film thickness is 8-20 μ m.
6, method as claimed in claim 4 is characterized in that wherein said exposure time is 12-15 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94104555 CN1033191C (en) | 1994-05-03 | 1994-05-03 | Method for making anti-fake trade mark or mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94104555 CN1033191C (en) | 1994-05-03 | 1994-05-03 | Method for making anti-fake trade mark or mark |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1116751A true CN1116751A (en) | 1996-02-14 |
| CN1033191C CN1033191C (en) | 1996-10-30 |
Family
ID=5031671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 94104555 Expired - Fee Related CN1033191C (en) | 1994-05-03 | 1994-05-03 | Method for making anti-fake trade mark or mark |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1033191C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999038145A1 (en) * | 1998-01-25 | 1999-07-29 | Beijing Superenergetic Heavy-Ion S & T Co., Ltd. | Anti-counterfeit method and product using the method |
| CN109118947A (en) * | 2018-07-20 | 2019-01-01 | 四川理工学院 | The method that one-pass molding makes the nucleopore false-proof film of target security pattern |
-
1994
- 1994-05-03 CN CN 94104555 patent/CN1033191C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999038145A1 (en) * | 1998-01-25 | 1999-07-29 | Beijing Superenergetic Heavy-Ion S & T Co., Ltd. | Anti-counterfeit method and product using the method |
| US6450536B1 (en) | 1998-01-25 | 2002-09-17 | Beijing Superenergetic Heavy-Ion S&T Co. Ltd. | Anti-forgery method and apparatus |
| CN109118947A (en) * | 2018-07-20 | 2019-01-01 | 四川理工学院 | The method that one-pass molding makes the nucleopore false-proof film of target security pattern |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1033191C (en) | 1996-10-30 |
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| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |