CN111625153B - Touch device and method for improving yield of double-line laser splicing positions - Google Patents
Touch device and method for improving yield of double-line laser splicing positions Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及电容式触摸屏领域,具体是涉及一种触控装置及其改善双线激光拼接位良率方法。The invention relates to the field of capacitive touch screens, in particular to a touch device and a method for improving the bit yield of two-line laser splicing.
背景技术Background technique
电容式触摸屏技术是利用人体的电流感应进行工作的。电容式触摸屏是一块四层复合玻璃屏,玻璃屏的内表面和夹层各涂有一层ITO,最外层是一薄层矽土玻璃保护层,夹层ITO涂层作为工作面,四个角上引出四个电极,内层ITO为屏蔽层以保证良好的工作环境。当手指触摸在金属层上时,由于人体电场,用户和触摸屏表面形成以一个耦合电容,对于高频电流来说,电容是直接导体,于是手指从接触点吸走一个很小的电流。这个电流分别从触摸屏的四角上的电极中流出,并且流经这四个电极的电流与手指到四角的距离成正比,控制器通过对这四个电流比例的精确计算,得出触摸点的位置。电容屏要实现多点触控,靠的就是增加互电容的电极,简单地说,就是将屏幕分块,在每一个区域里设置一组互电容模块都是独立工作,所以电容屏就可以独立检测到各区域的触控情况,进行处理后,简单地实现多点触控。电容技术触摸面板CTP(CapacityTouchPanel)是利用人体的电流感应进行工作的。电容屏是一块四层复合玻璃屏,玻璃屏的内表面和夹层各涂一层ITO(纳米铟锡金属氧化物),最外层是只有0.一种触控装置及其改善双线激光拼接位良率方法15mm厚的矽土玻璃保护层,夹层ITO涂层作工作面,四个角引出四个电极,内层ITO为屏层以保证工作环境。当用户触摸电容屏时,由于人体电场,用户手指和工作面形成一个耦合电容,因为工作面上接有高频信号,于是手指吸收走一个很小的电流,这个电流分别从屏的四个角上的电极中流出,且理论上流经四个电极的电流与手指头到四角的距离成比例,控制器通过对四个电流比例的精密计算,得出位置。可以达到99%的精确度,具备小于3ms的响应速度。Capacitive touch screen technology uses the current induction of the human body to work. The capacitive touch screen is a four-layer composite glass screen. The inner surface and interlayer of the glass screen are each coated with a layer of ITO. The outermost layer is a thin layer of silica glass protective layer. The interlayer ITO coating is used as the working surface. Four electrodes, the inner ITO is the shielding layer to ensure a good working environment. When a finger touches the metal layer, due to the electric field of the human body, a coupling capacitance is formed between the user and the surface of the touch screen. For high-frequency currents, the capacitance is a direct conductor, so the finger absorbs a small current from the contact point. This current flows out of the electrodes on the four corners of the touch screen respectively, and the current flowing through these four electrodes is proportional to the distance from the finger to the four corners. The controller obtains the position of the touch point through accurate calculation of the four current ratios. . Capacitive screens need to achieve multi-touch by adding mutual capacitance electrodes. Simply put, the screen is divided into blocks, and a group of mutual capacitance modules are set in each area to work independently, so the capacitive screen can work independently. The touch situation of each area is detected and processed to realize multi-touch easily. Capacitive technology touch panel CTP (CapacityTouchPanel) uses the current induction of the human body to work. The capacitive screen is a four-layer composite glass screen. The inner surface and the interlayer of the glass screen are each coated with a layer of ITO (nano indium tin oxide), and the outermost layer is only 0. A touch device and its improved two-line laser splicing Bit yield method 15mm thick silica glass protective layer, interlayer ITO coating as the working surface, four electrodes are drawn from the four corners, and the inner layer of ITO is the screen layer to ensure the working environment. When the user touches the capacitive screen, due to the electric field of the human body, the user's finger and the working surface form a coupling capacitance. Because the working surface is connected with a high-frequency signal, the finger absorbs a small current, which flows from the four corners of the screen respectively. Theoretically, the current flowing through the four electrodes is proportional to the distance from the finger to the four corners. The controller obtains the position through precise calculation of the four current ratios. It can achieve 99% accuracy and has a response speed of less than 3ms.
伴随电子产品的日益发展成熟,触摸屏的应用范围逐步扩大,其生产制造技术也呈现出多样性。目前常见的电容式触摸屏结构有,以G+G(玻璃对玻璃电容式触摸屏)、OGS(单片玻璃电容式触摸屏)、GF(玻璃对软膜电容式触摸屏)、GFF(玻璃对双层软膜电容式触摸屏)等为代表的外挂式电容屏,以及以Oncell(触摸面板功能嵌入到彩色滤光片基板和偏光板之间)、Incell(触摸面板功能嵌入到液晶像素中)为代表的嵌入式电容屏。在产品性能稳步提升的同时,产品尺寸也越做越大,不断提高产品的屏占比,尽量减少盖板BM(黑矩阵)区面积,提高显示区域面积成为业内人员不断追求的目标。With the development and maturity of electronic products, the scope of application of touch screens has gradually expanded, and its manufacturing technologies have also shown diversity. At present, the common structures of capacitive touch screens are G+G (glass to glass capacitive touch screen), OGS (single glass capacitive touch screen), GF (glass to soft film capacitive touch screen), GFF (glass to double layer soft touch screen) film capacitive touch screen), etc., and embedded capacitive screens represented by Oncell (the touch panel function is embedded between the color filter substrate and the polarizer), Incell (the touch panel function is embedded in the liquid crystal pixel) capacitive screen. While the product performance is steadily improving, the size of the product is getting bigger and bigger. Continuously increasing the screen-to-body ratio of the product, minimizing the area of the BM (black matrix) area of the cover, and increasing the area of the display area have become the constant pursuit of the industry.
传统的电容式显示屏主要是通过以下两种方法制成的:Traditional capacitive displays are mainly made by the following two methods:
第一种方法是,在已经蚀刻好VA(显示区域)图层的纯ITO(氧化铟锡)导电膜上印刷银浆,通过激光工艺蚀刻完成周边触控感应线路。然而,由于印刷银浆的膜厚不易控制,且在生产过程中因加工次数的增多导致银浆稀释剂挥发从而粘度增大、银浆颗粒的均匀性、无尘环境对线路影响大等原因,使得电容屏的制程精细化存在较大困难,生产良率较低。The first method is to print silver paste on the pure ITO (indium tin oxide) conductive film that has etched the VA (display area) layer, and complete the peripheral touch sensing circuit by laser etching. However, because the film thickness of the printed silver paste is not easy to control, and due to the increase in the number of processing times in the production process, the silver paste diluent volatilizes and the viscosity increases, the uniformity of the silver paste particles, and the dust-free environment have a great impact on the circuit. It is difficult to refine the manufacturing process of the capacitive screen, and the production yield is low.
第二种方法是,采用金属ITO导电膜作为电容屏的导电膜,通过一次化学蚀刻完成VA区图案和周边走线,然后通过二次蚀刻去除VA区的金属,保留VA区的ITO作为导电感应层。该制程由于金属层是通过真空溅镀工艺镀在ITO层上的,金属层存在微小的透空区,正常视觉检验无法排除,透空区经过一次金属蚀刻和一次ITO蚀刻,容易发生侧蚀,导致透空区显著增大,造成触控感应线路断线,影响生产良率,给制程带来不稳定性。The second method is to use the metal ITO conductive film as the conductive film of the capacitive screen, complete the VA area pattern and peripheral wiring through one chemical etching, and then remove the metal in the VA area by secondary etching, and retain the ITO in the VA area as a conductive sensor. Floor. In this process, since the metal layer is plated on the ITO layer through a vacuum sputtering process, there are tiny voids in the metal layer, which cannot be ruled out by normal visual inspection. The voids are prone to side erosion after one metal etching and one ITO etching. This leads to a significant increase in the air-through area, resulting in disconnection of the touch sensing circuit, which affects the production yield and brings instability to the process.
中国专利CN201610578836.9公开了一种电容屏及其制备方法,通过在透明基板上设置表面为金属导电层的ITO层,对金属导电层及ITO层进行化学蚀刻形成电容屏的显示区域及其周边走线区域,并进一步对周边走线区域进行激光蚀刻,形成触控感应线路。通过上述方式,该制备方法可以有效降低电容屏触控感应线路所占的空间,提高产品的屏占比,从而使产品实现窄边框的外观效果,并且还有效提升了产品的制程良率及工艺稳定性。Chinese patent CN201610578836.9 discloses a capacitive screen and its preparation method. By setting an ITO layer whose surface is a metal conductive layer on a transparent substrate, the metal conductive layer and the ITO layer are chemically etched to form the display area of the capacitive screen and its surroundings. routing area, and further laser etching is performed on the surrounding routing area to form a touch sensing circuit. Through the above method, the preparation method can effectively reduce the space occupied by the capacitive touch sensing circuit, increase the screen ratio of the product, so that the product can achieve the appearance effect of narrow borders, and also effectively improve the process yield and process of the product. stability.
但是在制作电容屏过程中有一道工序为激光雕刻线路,是利用光把不需要的地方烧掉,从而留下需要的导电通道;至于烧掉的大小是由激光的光斑大小决定,按目前行业电容屏激光机光斑大小一般为0.03-0.035mm之间,所以被蚀刻掉的线间距一般为0.035mm左右;为了提高减少短路的风险,有空间的产品会加大这个蚀刻的线间距,通过双线激光的方法,即为设计2根平行的激光线,相距0.01-0.02mm之间,具体根据实际需要所调,这样蚀刻的间距就可以变为0.05mm左右,同时电容屏的激光设备是通过振镜分块激光,而块与块之间就会有一个交接拼接位,而这个拼接位就是整个激光出问题最多的地方,双线的情况下更加是更多的问题,所以本申请为一种改善双线激光拼接位良率的方法。However, in the process of making a capacitive screen, there is a process of laser engraving the circuit, which is to use light to burn off the unnecessary places, so as to leave the required conductive channels; as for the size of the burnt spot, it is determined by the size of the laser spot. According to the current industry The spot size of capacitive screen laser machine is generally between 0.03-0.035mm, so the etched line spacing is generally about 0.035mm; in order to reduce the risk of short circuit, products with space will increase the etched line spacing, through double The method of line laser is to design two parallel laser lines with a distance of 0.01-0.02mm, which is adjusted according to actual needs, so that the etching distance can be changed to about 0.05mm. At the same time, the laser equipment of the capacitive screen is passed The galvanometer divides the laser into blocks, and there will be a splicing position between the blocks, and this splicing position is the most problematic part of the entire laser, and there are more problems in the case of double lines, so this application is a A method to improve the bit yield of two-line laser splicing.
发明内容Contents of the invention
本发明所要解决的技术问题是提供一种触控装置及其改善双线激光拼接位良率方法,该技术方案解决了现有激光蚀刻的方法容易激光爆点的问题,该触控装置及其改善双线激光拼接位良率方法通过对打断银浆激光线进行沿着拼接线打断,这样打断银浆激光线的走线就可以避免了拼接位,就不会出现拼接延时带来的问题。The technical problem to be solved by the present invention is to provide a touch device and its method for improving the yield rate of two-line laser splicing. This technical solution solves the problem that the existing laser etching method is prone to laser explosion. The method of improving the yield rate of the two-line laser splicing position is to interrupt the silver paste laser line along the splicing line, so that the line of the interrupted silver paste laser line can avoid the splicing position, and there will be no splicing delay zone come the question.
为解决上述技术问题,本发明提供以下技术方案:In order to solve the above technical problems, the present invention provides the following technical solutions:
提供一种触控装置,包括电容触摸屏,所述电容触摸屏具有视窗区,所述视窗的边缘区域设有至少一个触摸传感单元电极,每一个所述触摸传感单元电极通过一个触摸连接通道连接有一个银浆层,所述银浆层从所述触摸连接通道中引出后与对应的触摸传感单元电极连接,银浆层为双端引出方式,银浆层内设有数量相等的第一银浆激光线和打断银浆激光线,所述第一银浆激光线为一条完整段,所述打断银浆激光线上设有若干拼接切断点,所述拼接切断点将打断银浆激光线分隔成若干段,每一段的打断银浆激光线相互独立且互不连接。A touch control device is provided, comprising a capacitive touch screen, the capacitive touch screen has a window area, at least one touch sensing unit electrode is provided on the edge area of the window, each of the touch sensing unit electrodes is connected through a touch connection channel There is a silver paste layer, the silver paste layer is drawn out from the touch connection channel and connected to the corresponding touch sensor unit electrode, the silver paste layer is a double-terminal lead-out method, and the silver paste layer is equipped with an equal number of first The silver paste laser line and the interrupted silver paste laser line, the first silver paste laser line is a complete section, and the interrupted silver paste laser line is provided with several splicing and cutting points, and the splicing and cutting points will interrupt the silver paste. The paste laser line is divided into several sections, and the interrupted silver paste laser lines of each section are independent and not connected to each other.
作为种触控装置一种优选方案,所述电容触摸屏为GG结构、GF结构、GFF结构、GF结构或者OGS结构。As a preferred solution of the touch device, the capacitive touch screen has a GG structure, a GF structure, a GFF structure, a GF structure or an OGS structure.
作为种触控装置一种优选方案,电容触摸屏包括若干激光蚀刻区块,相邻的两块激光蚀刻区块连接在一起,且相邻的两块激光蚀刻区块之间设有拼接线,所述拼接切断点设置在所述拼接线处。As a preferred solution of this kind of touch device, the capacitive touch screen includes several laser-etched blocks, two adjacent laser-etched blocks are connected together, and a stitching line is provided between the adjacent two laser-etched blocks, so The splicing cutting point is set at the splicing line.
作为种触控装置一种优选方案,所述打断银浆激光线沿拼接线向两端打断,形成凹陷,所述第一银浆激光线与打断银浆激光线一一对应,构成多组双引出线,同组间第一银浆激光线与打断银浆激光线之间线距为0.01-0.02mm。As a preferred solution of the touch control device, the interrupted silver paste laser line is interrupted to both ends along the splicing line to form a depression, and the first silver paste laser line corresponds to the interrupted silver paste laser line one by one, forming a Multiple sets of double lead-out lines, the line distance between the first silver paste laser line and the interrupted silver paste laser line in the same group is 0.01-0.02mm.
作为种触控装置一种优选方案,打断银浆激光线设置在激光蚀刻区块内,打断银浆激光线的数量小于等于激光蚀刻区块的数量。As a preferred solution of the touch device, the laser lines for breaking the silver paste are arranged in the laser-etched block, and the number of the laser lines for breaking the silver paste is less than or equal to the number of the laser-etched blocks.
还提供一种改善双线激光拼接位良率方法,包括以下步骤:Also provided is a method for improving the bit yield of two-line laser splicing, including the following steps:
在电容触摸屏的ITO薄膜层上形成ITO线路,所述ITO线路包括ITO电极线和ITO引出线;Forming an ITO line on the ITO film layer of the capacitive touch screen, the ITO line includes an ITO electrode line and an ITO lead-out line;
利用缩水老化处理使ITO线路上的ITO电极线和ITO引出线完全结晶;Using shrinkage aging treatment to completely crystallize the ITO electrode lines and ITO lead-out lines on the ITO circuit;
在ITO线路上贴合干膜,进行紫外曝光处理,使所述干膜沿导电线路图案的方向硬化;Paste the dry film on the ITO circuit, and carry out ultraviolet exposure treatment, so that the dry film is hardened along the direction of the conductive circuit pattern;
将未硬化的所述干膜利用显影液清洗掉,暴露出ITO线路;Cleaning off the unhardened dry film with a developing solution to expose the ITO circuit;
将暴露出ITO线路利用蚀刻液蚀刻掉;Etch the exposed ITO lines with etching solution;
对已经硬化的干膜进行退膜处理,使ITO薄膜层上仅存留形成导电线路的ITO线路层;Removing the hardened dry film, so that only the ITO circuit layer forming the conductive circuit remains on the ITO film layer;
在形成所述导电线路的ITO线路层的边框区域上印刷导电银胶,对导电银胶进行激光刻蚀以形成银胶搭接线路。Printing conductive silver glue on the frame area of the ITO circuit layer forming the conductive circuit, and performing laser etching on the conductive silver glue to form a silver glue overlapping circuit.
作为种触控装置的改善双线激光拼接位良率方法的一种优选方案,在形成所述导电线路的ITO线路层的边框区域上印刷导电银胶,对导电银胶进行激光刻蚀以形成银胶搭接线路,具体包括:As a preferred solution for improving the yield rate of two-line laser splicing of a touch device, conductive silver glue is printed on the frame area of the ITO circuit layer forming the conductive line, and the conductive silver glue is laser etched to form Silver glue lap lines, including:
确定ITO线路层的边框区域的面积,将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块;Determine the area of the frame area of the ITO circuit layer, and divide the frame area of the ITO circuit layer into several laser-etched blocks with equal areas;
确定相邻两块激光蚀刻区块之间的拼接线;Determine the stitching line between two adjacent laser-etched blocks;
在ITO线路层的边框区域丝印块状的银浆块和多组双通道的第一银浆激光线和打断银浆激光线;In the frame area of the ITO circuit layer, silk screen block-shaped silver paste blocks and multiple sets of dual-channel first silver paste laser lines and interrupted silver paste laser lines;
对所述银浆块、第一银浆激光线和打断银浆激光线进行烘烤,加热烘干,形成银浆层和走线银浆;Baking the silver paste block, the first silver paste laser line and interrupting the silver paste laser line, heating and drying to form a silver paste layer and a wiring silver paste;
将烘干后的打断银浆激光线以拼接线为临界线,将打断银浆激光线分隔成若干段;The interrupted silver paste laser line after drying is divided into several sections with the stitching line as the critical line;
对具有银浆块和走线银浆的激光蚀刻区块进行激光蚀刻,形成银胶搭接线路。Laser etching is performed on the laser-etched block with the silver paste block and the trace silver paste to form the silver paste bonding circuit.
作为种触控装置的改善双线激光拼接位良率方法的一种优选方案,确定ITO线路层的边框区域的面积,将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块之前,还包括:As an optimal solution for improving the yield rate of two-line laser splicing of a touch device, the area of the frame area of the ITO line layer is determined, and before the frame area of the ITO line layer is divided into several laser-etched blocks with equal areas, Also includes:
确定ITO薄膜层的视窗区和非视窗区;Determine the window area and non-window area of the ITO film layer;
在所述视窗区印刷装饰层;printing a decorative layer on the window area;
在所述非视窗区上形成触摸传感单元电极;forming touch sensing unit electrodes on the non-window area;
在所述印刷装饰层表面印刷激光屏蔽层。A laser shielding layer is printed on the surface of the printing decoration layer.
作为种触控装置的改善双线激光拼接位良率方法的一种优选方案,所述边缘金属层与触摸传感单元电极搭接。As a preferred solution of the method for improving the yield rate of two-line laser splicing of a touch device, the edge metal layer is overlapped with the electrodes of the touch sensing unit.
作为种触控装置的改善双线激光拼接位良率方法的一种优选方案,在ITO线路层的边框区域丝印块状的银浆块和多组双通道的第一银浆激光线和打断银浆激光线中,是在激光屏蔽层上丝印块状的银浆块和多组双通道的第一银浆激光线和打断银浆激光线。As an optimal solution for improving the yield rate of two-line laser splicing of a touch device, block-shaped silver paste blocks and multiple sets of dual-channel first silver paste laser lines and interruptions are printed on the frame area of the ITO circuit layer. Among the silver paste laser lines, block-shaped silver paste blocks and multiple sets of dual-channel first silver paste laser lines and interrupted silver paste laser lines are silk-screened on the laser shielding layer.
本发明与现有技术相比具有的有益效果是:The beneficial effect that the present invention has compared with prior art is:
先确定ITO薄膜层的视窗区和非视窗区,在视窗区印刷装饰层,在非视窗区上形成触摸传感单元电极,其中边缘金属层与触摸传感单元电极搭接,之后在印刷装饰层表面印刷激光屏蔽层。将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块,确定相邻两块激光蚀刻区块之间的拼接线,即找出第一激光蚀刻区块和第一激光蚀刻区块之间的拼接线,在激光屏蔽层上丝印块状的银浆块和多组双通道的第一银浆激光线和打断银浆激光线,对银浆块、第一银浆激光线和打断银浆激光线进行烘烤,加热烘干,形成银浆层和走线银浆,将烘干后的打断银浆激光线以拼接线为临界线,将打断银浆激光线分隔成若干段,对具有银浆块和走线银浆的激光蚀刻区块进行激光蚀刻,形成银胶搭接线路。First determine the window area and non-window area of the ITO thin film layer, print the decorative layer on the window area, and form the touch sensing unit electrode on the non-window area, wherein the edge metal layer overlaps with the touch sensing unit electrode, and then print the decorative layer Laser shielding layer printed on the surface. Divide the frame area of the ITO circuit layer into several laser-etched blocks with the same area, and determine the stitching line between two adjacent laser-etched blocks, that is, find out the difference between the first laser-etched block and the first laser-etched block. The splicing line between the laser shielding layer is silk-screened with block-shaped silver paste blocks and multiple sets of dual-channel first silver paste laser lines and interrupted silver paste laser lines, and the silver paste blocks, first silver paste laser lines and printing The broken silver paste laser line is baked, heated and dried to form a silver paste layer and a silver paste for routing. After drying, the broken silver paste laser line is divided into splice lines as the critical line, and the broken silver paste laser line is divided into In several sections, laser etching is performed on the laser etching block with the silver paste block and the wiring silver paste to form a silver glue lap circuit.
该触控装置及其改善双线激光拼接位良率方法,通过对打断银浆激光线进行沿着拼接线打断,这样打断银浆激光线的走线就可以避免了拼接位,就不会出现拼接延时带来的问题,经生产验证,第一银浆激光线是完整的,而打断银浆激光线是有间断的,从而导致打断银浆激光线间断的凹陷点处有凸台感,此凸台的距离是可以根据实际激光设备的精度调整优化,而这个稍微的凸台不影响整个通道的性能,反而有效的改善一个拼接位的激光爆点的问题。经过验证该改善双线激光拼接位良率方法可以有效的改善双线激光拼接位爆点的问题,提高了双线激光蚀刻拼接位的良率。The touch control device and its method for improving the yield rate of the two-line laser splicing position, by interrupting the silver paste laser line along the splicing line, the splicing position can be avoided by interrupting the alignment of the silver paste laser line. There will be no problems caused by splicing delay. According to the production verification, the first silver paste laser line is complete, while the interruption of the silver paste laser line is intermittent, which leads to the depression point where the interruption of the silver paste laser line is interrupted. There is a feeling of a boss, the distance of this boss can be adjusted and optimized according to the accuracy of the actual laser equipment, and this slight boss does not affect the performance of the entire channel, but effectively improves the problem of the laser burst point of a splicing position. It has been verified that the method for improving the yield rate of the two-line laser splicing can effectively improve the problem of the explosion point of the two-line laser splicing, and improve the yield of the two-line laser etching splicing.
附图说明Description of drawings
图1为现有技术中普通的改善双线激光拼接位良率方法的示意图;FIG. 1 is a schematic diagram of a common method for improving the yield rate of two-line laser splicing in the prior art;
图2为现有技术中普通的改善双线激光拼接位良率方法的局部示意图;FIG. 2 is a partial schematic diagram of a common method for improving the bit yield of two-line laser splicing in the prior art;
图3为现有技术中双改善双线激光拼接位良率方法的示意图;FIG. 3 is a schematic diagram of a double-improved two-line laser splicing bit yield method in the prior art;
图4为本发明改善双线激光拼接位良率方法的示意图;Fig. 4 is a schematic diagram of the method for improving the yield rate of two-line laser splicing according to the present invention;
图5为现有技术中双改善双线激光拼接位良率方法的流程示意图;FIG. 5 is a schematic flow diagram of a double-improved two-line laser splicing bit yield method in the prior art;
图6为现有技术中双改善双线激光拼接位良率方法中S700")的流程示意图;Fig. 6 is a schematic flow diagram of S700 ") in the dual-improved double-line laser splicing bit yield method in the prior art;
图7为本发明的改善双线激光拼接位良率方法的示意图;Fig. 7 is a schematic diagram of the method for improving the yield rate of two-line laser splicing according to the present invention;
图8为本发明的改善双线激光拼接位良率方法中S700)的流程示意图一;Fig. 8 is a schematic flow diagram of S700) in the method for improving the yield rate of two-line laser splicing according to the present invention;
图9为本发明的改善双线激光拼接位良率方法中S700)的流程示意图二;Fig. 9 is a schematic flow diagram 2 of S700) in the method for improving the yield rate of two-line laser splicing according to the present invention;
图10本发明的改善双线激光拼接位良率方法中S707)具体的流程示意图。FIG. 10 is a schematic flowchart of S707) in the method for improving the yield rate of two-line laser splicing according to the present invention.
图中标号为:The labels in the figure are:
1-触摸连接通道;1- Touch the connection channel;
2-银浆层;2-silver paste layer;
3-第一银浆激光线;3-The first silver paste laser line;
4-第二银浆激光线;4- the second silver paste laser line;
5-第一激光蚀刻区块;5 - the first laser etching block;
6-第一激光蚀刻区块;6 - the first laser etching block;
7-拼接线;7- splicing line;
8-打断银浆激光线。8- Interrupt the silver paste laser line.
具体实施方式detailed description
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“前”、“后”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性。In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "front", "rear", "vertical", "horizontal", The orientation or positional relationship indicated by "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have Certain orientations, constructed and operative in certain orientations, therefore are not to be construed as limitations on the invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and should not be construed as indicating or implying relative importance.
伴随电子产品的日益发展成熟,触摸屏的应用范围逐步扩大,其生产制造技术也呈现出多样性。目前常见的电容式触摸屏结构有,以G+G(玻璃对玻璃电容式触摸屏)、OGS(单片玻璃电容式触摸屏)、GF(玻璃对软膜电容式触摸屏)、GFF(玻璃对双层软膜电容式触摸屏)等为代表的外挂式电容屏,以及以On cell(触摸面板功能嵌入到彩色滤光片基板和偏光板之间)、In cell(触摸面板功能嵌入到液晶像素中)为代表的嵌入式电容屏。在产品性能稳步提升的同时,产品尺寸也越做越大,不断提高产品的屏占比,尽量减少盖板BM(黑矩阵)区面积,提高显示区域面积成为业内人员不断追求的目标。With the development and maturity of electronic products, the scope of application of touch screens has gradually expanded, and its manufacturing technologies have also shown diversity. At present, the common capacitive touch screen structures are G+G (glass to glass capacitive touch screen), OGS (single glass capacitive touch screen), GF (glass to soft film capacitive touch screen), GFF (glass to double layer soft touch screen) Film capacitive touch screen) and other external capacitive screens, as well as On cell (touch panel function embedded between the color filter substrate and polarizer), In cell (touch panel function embedded in liquid crystal pixels) as representatives Embedded capacitive screen. While the product performance is steadily improving, the size of the product is also getting bigger and bigger. Continuously increasing the screen-to-body ratio of the product, minimizing the area of the BM (black matrix) area of the cover, and increasing the area of the display area have become the goals that people in the industry are constantly pursuing.
请参阅图1和图2,现有技术中的触控装置包括电容触摸屏,电容触摸屏为GG结构、GF结构、GFF结构、GF2结构或者OGS结构。电容触摸屏具有视窗区,视窗的边缘区域设有至少一个触摸传感单元电极,每一个触摸传感单元电极通过一个触摸连接通道1连接有一个银浆层2,银浆层2从触摸连接通道1中引出后与对应的触摸传感单元电极连接,银浆层2为双端引出方式,银浆层2内设有数量相等的第一银浆激光线3和第二银浆激光线4,第一银浆激光线3和第二银浆激光线4均为一条完整段,第一银浆激光线3与第二银浆激光线4一一对应,构成多组双引出线。Please refer to FIG. 1 and FIG. 2 , the touch control device in the prior art includes a capacitive touch screen, and the capacitive touch screen has a GG structure, a GF structure, a GFF structure, a GF2 structure or an OGS structure. The capacitive touch screen has a window area, and at least one touch sensor unit electrode is provided on the edge area of the window, and each touch sensor unit electrode is connected to a
现有技术中的触摸装置直接经过激光蚀刻后,同一组的第一银浆激光线3与第二银浆激光线4之间线距为0.035mm左右(即光斑的大小),当做大尺寸电容屏时(15寸以上),产品的走线空间相对会大些,最要还是因为线路比较长和比较多,出现问题短路等问题的情况也会加大,所以这时为了解决由于线距太小而带来的问题,需要采用双线激光蚀刻的方式,激光蚀刻之前的同一组的第一银浆激光线3与第二银浆激光线4之间线距约为0.01-0.02m之间,激光蚀刻后同一组的第一银浆激光线3与第二银浆激光线4之间的线距可以加大到0.05mm左右。After the touch device in the prior art is directly etched by laser, the line distance between the first silver
双线激光蚀刻是把电容触摸屏分块激光的,也就是说激光不是一根线不管多长都从头打到尾,然后再激光另外一根的,而是分好块,激光会一次性把分到这一块范围内的所有线全部激光好,然后再移动到下一个块激光,至于分块的大小会根据各设备振镜决定,目前市面上的一般分块大小为120mm-180mm之间。这也说明目前做小尺寸手机的,单个触摸屏里是不需要分块的,只有产品大于分块的范围才需要分块激光。请参阅图3,电容触摸屏包括若干激光蚀刻区块,相邻的两块激光蚀刻区块连接在一起,且相邻的两块激光蚀刻区块之间设有拼接线,例如图中相邻的第一激光蚀刻区块5和第一激光蚀刻区块6,拼接线7即为第一激光蚀刻区块5和第一激光蚀刻区块6之间的拼接线。进行双线激光蚀刻时,会先激光蚀刻好第一激光蚀刻区块5区域范围的所有第一银浆激光线3和所有第二银浆激光线4,然后再移到第一激光蚀刻区块6区域范围激光蚀刻,同理需要把所有第一银浆激光线3和所有第二银浆激光线4激光蚀刻走一遍,这时就会出现了激光蚀刻区块与激光蚀刻区块之间的一个拼接位激光的情况。拼接线7的位置刚好是上一块第一激光蚀刻区块5激光结束和下一块第一激光蚀刻区块6激光的开始,是光最不稳定的时候。这时激光蚀刻设备为了解决这个问题,就通过延时补偿的方法;即让上一块结束时延长到下一个块一小段范围,而下一个块开始时延长进上一个块一小段的激光。这时就会出现了拼接位的地方激光会是正常激光的双倍重复打了,总是会出现非设计所选的激光爆点,从而导致线路容易出现开短路的那问题。Two-line laser etching is to laser the capacitive touch screen into blocks, that is to say, the laser is not one line no matter how long it is from the beginning to the end, and then laser another one, but divided into good blocks, and the laser will divide the points at one time. All the lines within this range are lasered, and then move to the next block of lasers. As for the size of the block, it will be determined according to the galvanometer of each device. The general block size on the market is between 120mm-180mm. This also shows that for small-sized mobile phones, there is no need to divide into blocks in a single touch screen. Only when the product is larger than the range of the blocks, the block laser is required. Please refer to Figure 3, the capacitive touch screen includes several laser-etched blocks, two adjacent laser-etched blocks are connected together, and there is a stitching line between the adjacent two laser-etched blocks, such as the adjacent ones in the figure The first laser-etched
请参阅图5,现有技术中双线改善双线激光拼接位良率方法包括以下步骤:Please refer to FIG. 5 , the method for improving the bit yield of double-line laser splicing in the prior art includes the following steps:
S100")在电容触摸屏的ITO薄膜层上形成ITO线路,ITO线路包括ITO电极线和ITO引出线;S100") form ITO lines on the ITO film layer of the capacitive touch screen, and the ITO lines include ITO electrode lines and ITO lead-out lines;
S200")利用缩水老化处理使ITO线路上的ITO电极线和ITO引出线完全结晶;S200") uses shrinkage aging treatment to completely crystallize the ITO electrode wires and ITO lead wires on the ITO circuit;
S300")在ITO线路上贴合干膜,进行紫外曝光处理,使干膜沿导电线路图案的方向硬化;S300") Lay the dry film on the ITO circuit and perform ultraviolet exposure treatment to harden the dry film along the direction of the conductive circuit pattern;
S400")将未硬化的干膜利用显影液清洗掉,暴露出ITO线路;S400") wash off the unhardened dry film with a developer to expose the ITO circuit;
S500")将暴露出ITO线路利用蚀刻液蚀刻掉;S500") will expose the ITO line to be etched away with etching solution;
S600")对已经硬化的干膜进行退膜处理,使ITO薄膜层上仅存留形成导电线路的ITO线路层;S600") to remove the hardened dry film, so that only the ITO circuit layer that forms the conductive circuit remains on the ITO film layer;
S700")在形成导电线路的ITO线路层的边框区域上印刷导电银胶,对导电银胶进行激光刻蚀以形成银胶搭接线路。S700") printing conductive silver glue on the frame area of the ITO circuit layer forming the conductive line, and performing laser etching on the conductive silver glue to form silver glue overlapping lines.
请参阅图6,S700")在形成导电线路的ITO线路层的边框区域上印刷导电银胶,对导电银胶进行激光刻蚀以形成银胶搭接线路,具体包括以下步骤:Please refer to Figure 6, S700") Print conductive silver glue on the frame area of the ITO circuit layer forming the conductive line, and perform laser etching on the conductive silver glue to form silver glue lap lines, specifically including the following steps:
S701")确定ITO线路层的边框区域的面积,将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块;S701") Determine the area of the frame area of the ITO circuit layer, and divide the frame area of the ITO circuit layer into several laser-etched blocks with equal areas;
S702")确定相邻两块激光蚀刻区块之间的拼接线;S702") Determine the stitching line between two adjacent laser-etched blocks;
S703")在ITO线路层的边框区域丝印块状的银浆块和多组双通道的第一银浆激光线3和第二银浆激光线4;S703") Silk-screen block-shaped silver paste blocks and multiple sets of dual-channel first silver
S704")对银浆块、第一银浆激光线3和第二银浆激光线4进行烘烤,加热烘干,形成银浆层2和走线银浆;S704") Baking the silver paste block, the first silver
S705")对具有银浆块和走线银浆的激光蚀刻区块进行激光蚀刻,形成银胶搭接线路。S705") Laser etching is performed on the laser etching block with the silver paste block and the wiring silver paste to form a silver glue lap line.
请参阅图4,该触控装置包括电容触摸屏,电容触摸屏为GG结构、GF结构、GFF结构、GF2结构或者OGS结构。电容触摸屏具有视窗区,视窗的边缘区域设有至少一个触摸传感单元电极,每一个触摸传感单元电极通过一个触摸连接通道1连接有一个银浆层2,银浆层2从触摸连接通道1中引出后与对应的触摸传感单元电极连接,银浆层2为双端引出方式,银浆层2内设有数量相等的第一银浆激光线3和打断银浆激光线8,第一银浆激光线3为一条完整段,打断银浆激光线8上设有若干拼接切断点,拼接切断点将打断银浆激光线8分隔成若干段,每一段的打断银浆激光线8相互独立且互不连接。Please refer to FIG. 4 , the touch control device includes a capacitive touch screen, and the capacitive touch screen has a GG structure, a GF structure, a GFF structure, a GF2 structure or an OGS structure. The capacitive touch screen has a window area, and at least one touch sensor unit electrode is provided on the edge area of the window, and each touch sensor unit electrode is connected to a
电容触摸屏包括若干激光蚀刻区块,相邻的两块激光蚀刻区块连接在一起,且相邻的两块激光蚀刻区块之间设有拼接线,拼接切断点设置在拼接线处。如图中相邻的第一激光蚀刻区块5和第一激光蚀刻区块6,拼接线7即为第一激光蚀刻区块5和第一激光蚀刻区块6之间的拼接线。The capacitive touch screen includes several laser-etched blocks, two adjacent laser-etched blocks are connected together, and a splicing line is provided between the two adjacent laser-etched blocks, and the splicing cut-off point is set at the splicing line. As shown in the adjacent first laser-etched
打断银浆激光线8沿拼接线向两端打断,形成凹陷,第一银浆激光线3与打断银浆激光线8一一对应,构成多组双引出线,同组间第一银浆激光线3与打断银浆激光线8之间线距为0.01-0.02mm,打断银浆激光线8设置在激光蚀刻区块内,打断银浆激光线8的数量小于等于激光蚀刻区块的数量。The interrupted silver
请参阅图7,该触控装置的改善双线激光拼接位良率方法包括以下步骤:Please refer to FIG. 7, the method for improving the yield rate of two-line laser splicing of the touch device includes the following steps:
S100)在电容触摸屏的ITO薄膜层上形成ITO线路,ITO线路包括ITO电极线和ITO引出线;S100) forming an ITO line on the ITO film layer of the capacitive touch screen, the ITO line includes an ITO electrode line and an ITO lead-out line;
S200)利用缩水老化处理使ITO线路上的ITO电极线和ITO引出线完全结晶;S200) using shrinkage aging treatment to completely crystallize the ITO electrode wires and ITO lead wires on the ITO circuit;
S300)在ITO线路上贴合干膜,进行紫外曝光处理,使干膜沿导电线路图案的方向硬化;S300) Attaching a dry film on the ITO circuit, and performing ultraviolet exposure treatment, so that the dry film is hardened along the direction of the conductive circuit pattern;
S400)将未硬化的干膜利用显影液清洗掉,暴露出ITO线路;S400) Cleaning the unhardened dry film with a developer to expose the ITO circuit;
S500)将暴露出ITO线路利用蚀刻液蚀刻掉;S500) Etching the exposed ITO lines with an etching solution;
S600)对已经硬化的干膜进行退膜处理,使ITO薄膜层上仅存留形成导电线路的ITO线路层;S600) Removing the hardened dry film so that only the ITO circuit layer forming the conductive circuit remains on the ITO film layer;
S700)在形成导电线路的ITO线路层的边框区域上印刷导电银胶,对导电银胶进行激光刻蚀以形成银胶搭接线路。S700) Print conductive silver glue on the frame area of the ITO circuit layer forming the conductive lines, and perform laser etching on the conductive silver glue to form silver glue overlapping lines.
请参阅图8,S700)在形成导电线路的ITO线路层的边框区域上印刷导电银胶,对导电银胶进行激光刻蚀以形成银胶搭接线路,具体包括以下步骤:Please refer to Figure 8, S700) Print conductive silver glue on the frame area of the ITO circuit layer forming the conductive line, and perform laser etching on the conductive silver glue to form a silver glue lap line, specifically including the following steps:
S705)确定ITO线路层的边框区域的面积,将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块;S705) Determine the area of the frame area of the ITO circuit layer, and divide the frame area of the ITO circuit layer into several laser-etched blocks with equal areas;
S706)确定相邻两块激光蚀刻区块之间的拼接线;S706) Determine the stitching line between two adjacent laser etching blocks;
S707)在ITO线路层的边框区域丝印块状的银浆块和多组双通道的第一银浆激光线3和打断银浆激光线8;S707) Silk-print block-shaped silver paste blocks and multiple sets of dual-channel first silver
S708)对银浆块、第一银浆激光线3和打断银浆激光线8进行烘烤,加热烘干,形成银浆层2和走线银浆;S708) Baking the silver paste block, the first silver
S709)将烘干后的打断银浆激光线8以拼接线为临界线,将打断银浆激光线8分隔成若干段;S709) Divide the interrupted silver
S710)对具有银浆块和走线银浆的激光蚀刻区块进行激光蚀刻,形成银胶搭接线路。S710) Laser etching is performed on the laser etching block having the silver paste block and the wiring silver paste to form a silver adhesive bonding circuit.
请参阅图9,S705)确定ITO线路层的边框区域的面积,将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块之前,还包括以下步骤:Please refer to FIG. 9, S705) Determine the area of the frame area of the ITO line layer, and before dividing the frame area of the ITO line layer into several laser-etched blocks with equal areas, the following steps are also included:
S701)确定ITO薄膜层的视窗区和非视窗区;S701) Determine the window area and non-window area of the ITO thin film layer;
S702)在视窗区印刷装饰层;S702) printing a decoration layer on the window area;
S703)在非视窗区上形成触摸传感单元电极,边缘金属层与触摸传感单元电极搭接;S703) Form a touch sensing unit electrode on the non-window area, and the edge metal layer overlaps with the touch sensing unit electrode;
S704)在印刷装饰层表面印刷激光屏蔽层。S704) Printing a laser shielding layer on the surface of the printing decoration layer.
请参阅图10,S707)具体是在激光屏蔽层上丝印块状的银浆块和多组双通道的第一银浆激光线3和打断银浆激光线8。Please refer to FIG. 10 , S707) Specifically, silk-screen block-shaped silver paste blocks and multiple sets of dual-channel first silver
这样打断银浆激光线8的走线就可以避免了拼接位,就不会出现拼接延时带来的问题,经生产验证,第一银浆激光线3是完整的,而打断银浆激光线8是有间断的,从而导致打断银浆激光线8间断的凹陷点处有凸台感,此凸台的距离是可以根据实际激光设备的精度调整优化,而这个稍微的凸台不影响整个通道的性能,反而有效的改善一个拼接位的激光爆点的问题。对于一个86寸的产品长宽约2000*1100mm,按最大振镜180mm来算,需要分开约7*12=84个块,而在中间位置的块会出现4个方向都需要有拼接,如果每个方向的拼接位都出现过多爆点,只要出现有某一个爆点过大,而把银浆层2给炸裂,出现断线,或者把激光炸到走线银浆导致短路,都会引起产品变成不良。经过验证该改善双线激光拼接位良率方法可以有效的改善双线激光拼接位爆点的问题,提高了双线激光蚀刻拼接位的良率。In this way, interrupting the routing of the silver
本发明在制造时:先确定ITO薄膜层的视窗区和非视窗区,在视窗区印刷装饰层,在非视窗区上形成触摸传感单元电极,其中边缘金属层与触摸传感单元电极搭接,之后在印刷装饰层表面印刷激光屏蔽层。将ITO线路层的边框区域划分为若干面积相等的激光蚀刻区块,确定相邻两块激光蚀刻区块之间的拼接线,即找出第一激光蚀刻区块5和第一激光蚀刻区块6之间的拼接线7,在激光屏蔽层上丝印块状的银浆块和多组双通道的第一银浆激光线3和打断银浆激光线8,对银浆块、第一银浆激光线3和打断银浆激光线8进行烘烤,加热烘干,形成银浆层2和走线银浆,将烘干后的打断银浆激光线8以拼接线为临界线,将打断银浆激光线8分隔成若干段,对具有银浆块和走线银浆的激光蚀刻区块进行激光蚀刻,形成银胶搭接线路。When the present invention is manufactured: first determine the window area and non-window area of the ITO thin film layer, print a decorative layer on the window area, and form a touch sensing unit electrode on the non-window area, wherein the edge metal layer overlaps with the touch sensing unit electrode , and then print the laser shielding layer on the surface of the printing decoration layer. Divide the frame area of the ITO circuit layer into several laser-etched blocks with the same area, determine the stitching line between two adjacent laser-etched blocks, that is, find out the first laser-etched
该触控装置及其改善双线激光拼接位良率方法,通过对打断银浆激光线8进行沿着拼接线7打断,这样打断银浆激光线8的走线就可以避免了拼接位,就不会出现拼接延时带来的问题,经生产验证,第一银浆激光线3是完整的,而打断银浆激光线8是有间断的,从而导致打断银浆激光线8间断的凹陷点处有凸台感,此凸台的距离是可以根据实际激光设备的精度调整优化,而这个稍微的凸台不影响整个通道的性能,反而有效的改善一个拼接位的激光爆点的问题。经过验证该改善双线激光拼接位良率方法可以有效的改善双线激光拼接位爆点的问题,提高了双线激光蚀刻拼接位的良率。In the touch control device and its method for improving the yield rate of two-line laser splicing, by interrupting the silver
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