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CN111600307A - Harmonic monitoring system and monitoring method of radio frequency power supply and semiconductor equipment system - Google Patents

Harmonic monitoring system and monitoring method of radio frequency power supply and semiconductor equipment system Download PDF

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Publication number
CN111600307A
CN111600307A CN202010485542.8A CN202010485542A CN111600307A CN 111600307 A CN111600307 A CN 111600307A CN 202010485542 A CN202010485542 A CN 202010485542A CN 111600307 A CN111600307 A CN 111600307A
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China
Prior art keywords
harmonic
radio frequency
power supply
frequency power
process equipment
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Chinese (zh)
Inventor
崔珍善
周娜
李琳
李俊杰
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Institute of Microelectronics of CAS
Zhenxin Beijing Semiconductor Co Ltd
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Institute of Microelectronics of CAS
Zhenxin Beijing Semiconductor Co Ltd
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Priority to CN202010485542.8A priority Critical patent/CN111600307A/en
Publication of CN111600307A publication Critical patent/CN111600307A/en
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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J3/00—Circuit arrangements for AC mains or AC distribution networks
    • H02J3/01—Arrangements for reducing harmonics or ripples
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/16—Spectrum analysis; Fourier analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/16—Spectrum analysis; Fourier analysis
    • G01R23/20—Measurement of non-linear distortion
    • H02J13/10—
    • H02J13/12—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/40—Arrangements for reducing harmonics
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y04—INFORMATION OR COMMUNICATION TECHNOLOGIES HAVING AN IMPACT ON OTHER TECHNOLOGY AREAS
    • Y04S—SYSTEMS INTEGRATING TECHNOLOGIES RELATED TO POWER NETWORK OPERATION, COMMUNICATION OR INFORMATION TECHNOLOGIES FOR IMPROVING THE ELECTRICAL POWER GENERATION, TRANSMISSION, DISTRIBUTION, MANAGEMENT OR USAGE, i.e. SMART GRIDS
    • Y04S40/00—Systems for electrical power generation, transmission, distribution or end-user application management characterised by the use of communication or information technologies, or communication or information technology specific aspects supporting them
    • Y04S40/12—Systems for electrical power generation, transmission, distribution or end-user application management characterised by the use of communication or information technologies, or communication or information technology specific aspects supporting them characterised by data transport means between the monitoring, controlling or managing units and monitored, controlled or operated electrical equipment
    • Y04S40/126—Systems for electrical power generation, transmission, distribution or end-user application management characterised by the use of communication or information technologies, or communication or information technology specific aspects supporting them characterised by data transport means between the monitoring, controlling or managing units and monitored, controlled or operated electrical equipment using wireless data transmission

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  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)

Abstract

本发明公开了一种射频电源的谐波监控系统以及监控方法、半导体设备系统，该射频电源用于为铁氧体耦合感应等离子体工艺设备供电，该射频电源的谐波监控系统包括：与射频电源连接的谐波分析仪，谐波分析仪用于测定射频电源的谐波，获得射频电源的总谐波失真；与谐波分析仪连接的监视器，监视器用于实时显示总谐波失真。本发明提供的射频电源的谐波监控系统以及监控方法、半导体设备系统，可以实时对射频电源的谐波进行监测。

Figure 202010485542

The invention discloses a harmonic monitoring system of a radio frequency power supply, a monitoring method, and a semiconductor equipment system. The radio frequency power supply is used for supplying power to ferrite coupled induction plasma process equipment. The harmonic monitoring system of the radio frequency power supply includes: The harmonic analyzer connected to the power supply is used to measure the harmonics of the RF power supply and obtain the total harmonic distortion of the RF power supply; the monitor connected to the harmonic analyzer is used to display the total harmonic distortion in real time. The harmonic monitoring system, the monitoring method and the semiconductor equipment system of the radio frequency power supply provided by the present invention can monitor the harmonics of the radio frequency power supply in real time.

Figure 202010485542

Description

Harmonic monitoring system and monitoring method of radio frequency power supply and semiconductor equipment system
Technical Field
The invention relates to the technical field of semiconductor process equipment, in particular to a harmonic monitoring system and a monitoring method of a radio frequency power supply and a semiconductor equipment system.
Background
Plasma (plasma), also called plasma, is an ionized gaseous substance consisting of positive and negative ions generated by ionization of atoms and radicals, from which part of electrons are deprived, the motion of which is dominated by electromagnetic force and exhibits a remarkable collective behavior. Plasma is widely used in the production process of semiconductor devices, and in plasma etching or plasma deposition systems, an rf power source is required to provide rf energy to a process chamber to generate plasma.
When Ferrite Coupled Induction Plasma (FCIP) process equipment works, a magnetic field generated by the toroidal core may affect harmonics of the radio frequency power supply, so that the harmonics of the radio frequency power supply are easily too large, and power supply of the Ferrite Coupled Induction Plasma process equipment and other semiconductor process equipment sharing a power distribution board is abnormal, so that the Ferrite Coupled Induction Plasma process equipment and other semiconductor process equipment sharing the power distribution board work abnormally, and a poor process condition occurs.
Disclosure of Invention
The invention aims to solve the problem that ferrite coupling induction plasma process equipment influences harmonic waves of a radio frequency power supply to cause poor process.
The invention is realized by the following technical scheme:
a harmonic monitoring system for a radio frequency power supply for powering ferrite coupled inductive plasma processing equipment, comprising:
the harmonic analyzer is connected with the radio frequency power supply and is used for measuring the harmonic of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
a monitor connected to the harmonic analyzer, the monitor for displaying the total harmonic distortion in real time.
Optionally, the radio frequency power supply includes an AC input module, an AC-DC conversion module, and a radio frequency module, where the AC input module includes a transformer and a filter inductor;
the transformer is connected with the power distribution board and is used for carrying out transformation processing on the alternating current provided by the power distribution board;
the filter inductor is connected with the transformer and is used for filtering the alternating current output by the transformer;
the AC-DC conversion module is connected with the filter inductor and is used for converting the alternating current output by the filter inductor into direct current;
the radio frequency module is connected with the AC-DC conversion module and is used for converting the direct current output by the AC-DC conversion module into radio frequency current.
Optionally, the input of the harmonic analyzer is connected to an ac transmission line between the power distribution board and the transformer; or,
the input end of the harmonic analyzer is connected with an alternating current transmission line between the transformer and the filter inductor; or,
and the input end of the harmonic analyzer is connected with an alternating current transmission line between the filter inductor and the AC-DC conversion module.
Optionally, the monitor is further configured to display the harmonic upper limit value, the harmonic lower limit value, and the harmonic reference value.
Optionally, the harmonic monitoring system of the radio frequency power supply further includes:
a controller coupled to the monitor, the controller to store the total harmonic distortion.
Optionally, the controller is further configured to send an alarm signal to the ferrite-coupled inductive plasma processing apparatus and associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, where the associated equipment is processing equipment sharing a power distribution board with the ferrite-coupled inductive plasma processing apparatus; and/or the presence of a gas in the gas,
the controller is further configured to perform interlock control on the ferrite coupled inductive plasma process equipment and associated equipment to stop the operation of the ferrite coupled inductive plasma process equipment and the associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, where the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
Based on the same inventive concept, the present invention also provides a harmonic monitoring method of a radio frequency power supply, the radio frequency power supply is used for supplying power to ferrite coupling induction plasma process equipment, and the method comprises the following steps:
measuring the harmonic wave of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
and displaying the total harmonic distortion in real time.
Optionally, the harmonic monitoring method of the radio frequency power supply further includes:
and displaying the harmonic upper limit value, the harmonic lower limit value and the harmonic reference value.
Optionally, the harmonic monitoring method of the radio frequency power supply further includes:
when the total harmonic distortion is larger than the harmonic upper limit value or the harmonic reference value, sending an alarm signal to the ferrite coupled inductive plasma process equipment and associated equipment, wherein the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment; and/or the presence of a gas in the gas,
displaying a harmonic upper limit value, a harmonic lower limit value and a harmonic reference value, and performing interlocking control on the ferrite coupling induction plasma process equipment and associated equipment to stop the ferrite coupling induction plasma process equipment and the associated equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, wherein the associated equipment shares a power distribution board with the ferrite coupling induction plasma process equipment.
Based on the same inventive concept, the invention also provides a semiconductor equipment system which comprises the harmonic monitoring system of the radio frequency power supply.
Compared with the prior art, the invention has the following advantages and beneficial effects:
according to the harmonic monitoring system and the monitoring method of the radio frequency power supply, provided by the invention, the total harmonic distortion of the radio frequency power supply is obtained by measuring the harmonic of the radio frequency power supply, the total harmonic distortion is displayed in real time, and a process operator can monitor the harmonic of the radio frequency power supply in real time, so that corresponding measures can be taken for ferrite coupling induction plasma process equipment and associated equipment when the harmonic of the radio frequency power supply is too large, and the condition that the process is poor due to abnormal power supply of the ferrite coupling induction plasma process equipment and the associated equipment is avoided.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the principles of the invention. In the drawings:
FIG. 1 is a schematic circuit diagram of an RF power supply for powering ferrite coupled inductive plasma processing equipment;
FIG. 2 is a schematic structural diagram of a harmonic monitoring system of a radio frequency power supply according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a harmonic analyzer in connection with a radio frequency power supply according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a harmonic analyzer in accordance with another embodiment of the present invention connected to a radio frequency power supply;
FIG. 5 is a schematic diagram of a harmonic analyzer in connection with a radio frequency power supply according to yet another embodiment of the present invention;
FIG. 6 is a schematic diagram of a monitor displaying total harmonic distortion according to an embodiment of the present invention;
fig. 7 is a flow chart of a harmonic monitoring method of a radio frequency power supply according to an embodiment of the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to examples and accompanying drawings, and the exemplary embodiments and descriptions thereof are only used for explaining the present invention and are not meant to limit the present invention.
The present embodiments provide a harmonic monitoring system for a radio frequency power supply used to power ferrite coupled inductive plasma processing equipment. Fig. 1 is a schematic circuit diagram of the rf power supply, which includes an AC input module 11, an AC-DC conversion module 12, and an rf module 13. The AC input module 11 is configured to transform and filter AC power provided by the power distribution board, the AC-DC conversion module 12 is configured to convert AC power output by the AC input module 11 into DC power, and the rf module 13 is configured to invert DC power output by the AC-DC conversion module 12 to generate rf current, where the rf current passes through the toroidal core 14 in the ferrite coupling induction plasma processing apparatus.
Fig. 2 is a schematic structural diagram of a harmonic monitoring system of a radio frequency power supply provided in this embodiment, where the harmonic monitoring system of a radio frequency power supply provided in this embodiment includes a harmonic analyzer 21 and a monitor 22.
Specifically, the Harmonic analyzer 21 is connected to the rf power supply, and is configured to measure a Harmonic of the rf power supply and obtain a total Harmonic distortion thd (total Harmonic distortion) of the rf power supply. In power systems, the root cause of harmonic generation is due to nonlinear loads. When current flows through a load, the current is not in a linear relation with the applied voltage, and non-sinusoidal current is formed, namely, harmonic waves are generated in the circuit. According to different detection principles, the harmonic analyzer 21 may be an analyzer that uses an analog band-stop or band-pass filter for detection, an analyzer that uses a neural network as a basis, an analyzer that uses a wavelet analysis method, or an analyzer that uses an FFT variation method. The specific structure of the harmonic analyzer 21 is not an improvement of the present invention, and it can be implemented using an existing harmonic analyzer, and thus the specific structure of the harmonic analyzer 21 will not be described.
The harmonic of the rf power supply, i.e. the harmonic of the ac power input to the rf power supply, is measured, and therefore the input of the harmonic analyzer 21 needs to be connected to the ac input module 11 in the rf power supply. Referring to fig. 3 to 5, the connection relationship between the input terminal of the harmonic analyzer 21 and the radio frequency power supply will be described below by taking an example in which the ac input module 11 includes a transformer TR and a filter inductor ACL. The transformer TR is connected to the power distribution board and is used for transforming the ac power supplied from the power distribution board. The filter inductor ACL is connected to the transformer TR, and is configured to filter the ac power output by the transformer TR. The AC-DC conversion module 12 is connected to the filter inductor ACL, and is configured to convert the AC power output by the filter inductor ACL into DC power. The rf module 13 is connected to the AC-DC conversion module 12, and is configured to convert the DC power output by the AC-DC conversion module 12 into an rf current. The input of the harmonic analyzer 21 can be connected to the AC power line between the filter inductor ACL and the AC-DC conversion module 12, as shown in fig. 3; the input of the harmonic analyzer 21 can also be connected to the ac line between the transformer TR and the filter inductor ACL, as shown in fig. 4; the input of the harmonic analyzer 21 can also be connected to the alternating current transmission line between the power distribution board and the transformer TR, as shown in fig. 5.
The structure of the ac input module 11 is not limited to the structure shown in fig. 3 to 5. According to different practical application requirements, the structure of the alternating current input module 11 is changed correspondingly. For example, in some application scenarios, the voltage value provided by the power distribution board matches the voltage value required by the equipment, and the ac input module 11 does not need to be provided with the transformer TR; in other application scenarios, the process equipment has a higher requirement on the reliability of the radio frequency power supply, and the ac input module 11 needs to be provided with a fuse.
With continued reference to fig. 2, a monitor 22 is connected to the harmonic analyzer 21 for displaying the total harmonic distortion THD in real time. The monitor 22 is provided with a display device that can display the total harmonic distortion THD in real time. It should be noted that the monitor 22 and the harmonic analyzer 21 may be separately installed or may be integrated. When the monitor 22 and the harmonic analyzer 21 are integrated together, an isolation device needs to be disposed between the monitor 22 and the harmonic analyzer 21 to prevent the monitor 22 from interfering with the harmonic analyzer 21, which results in a decrease in the accuracy of the detection result of the harmonic analyzer 21.
In the harmonic monitoring system of the radio frequency power supply provided by this embodiment, the harmonic analyzer 21 is used to measure the harmonic of the radio frequency power supply, so as to obtain the total harmonic distortion THD of the radio frequency power supply, and the monitor 22 is used to display the total harmonic distortion THD in real time, so that a process operator can monitor the harmonic of the radio frequency power supply in real time, and thus when the harmonic of the radio frequency power supply is too large, corresponding measures can be taken for the ferrite coupled inductive plasma process equipment and the associated equipment, so as to avoid the situation that the process is not good due to abnormal power supply of the ferrite coupled inductive plasma process equipment and the associated equipment, where the associated equipment is the process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
Referring to fig. 6, in an alternative implementation, the monitor 22 may display the harmonic upper value USL, the harmonic lower value LSL, and the harmonic reference value I/L in addition to the total harmonic distortion THD. The harmonic upper limit value USL, the harmonic lower limit value LSL, and the harmonic reference value I/L may be input to the monitor 22 by a user through an input device such as a key, a touch screen, or a voice capture device. By displaying the harmonic upper limit value USL, the harmonic lower limit value LSL and the harmonic reference value I/L, contrast data can be provided for total harmonic distortion THD, and process operators can conveniently and visually compare the data.
Referring to fig. 2, in an alternative implementation, the harmonic monitoring system of the radio frequency power supply provided in the present embodiment further includes a controller 23 connected to the monitor 22, where the controller 23 is configured to store the total harmonic distortion THD. Through the total harmonic distortion THD, the historical data of the total harmonic distortion THD can be recorded, and fault analysis personnel can conveniently call and check the historical data.
In an alternative implementation, the controller 23 is further configured to send an alarm signal to the ferrite coupled inductive plasma processing tool and associated tools when the total harmonic distortion THD is greater than the harmonic upper value USL or the harmonic reference value I/L, wherein the associated tools are process tools sharing a power distribution board with the ferrite coupled inductive plasma processing tool. By sending alarm signals to the ferrite coupling induction plasma process equipment and the associated equipment, the ferrite coupling induction plasma process equipment and the associated equipment can record the condition of the radio frequency power supply with overlarge harmonic waves, so that fault analysis personnel can conveniently call and check alarm records.
In an optional implementation manner, the controller 23 is further configured to perform interlock control on the ferrite coupled inductive plasma processing apparatus and associated equipment to stop the operation of the ferrite coupled inductive plasma processing apparatus and associated equipment when the total harmonic distortion THD is greater than the harmonic upper limit value USL or the harmonic reference value I/L, where the associated equipment is a processing equipment sharing a power distribution board with the ferrite coupled inductive plasma processing apparatus. By performing interlocking control on the ferrite coupling induction plasma process equipment and the associated equipment, the ferrite coupling induction plasma process equipment and the associated equipment can be automatically controlled to stop working when the radio frequency power supply has overlarge harmonic.
Based on the same inventive concept, the present embodiment further provides a harmonic monitoring method for a radio frequency power supply, which is the radio frequency power supply shown in fig. 1 and used for supplying power to the ferrite coupled induction plasma processing equipment. Fig. 7 is a flowchart of a harmonic monitoring method of the radio frequency power supply provided in this embodiment, where the harmonic monitoring method of the radio frequency power supply provided in this embodiment includes:
step S71, measuring the harmonic wave of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply;
and step S72, displaying the total harmonic distortion in real time.
Specifically, the harmonic analyzer may be used to measure the harmonic of the rf power source to obtain the total harmonic distortion THD of the rf power source. The harmonic analyzer may be an analyzer for detecting by using an analog band-stop or band-pass filter, an analyzer based on a neural network, an analyzer using a wavelet analysis method, or an analyzer using an FFT variation method. The harmonic of the rf power supply, i.e. the harmonic of the ac power input to the rf power supply, is measured, and therefore the input of the harmonic analyzer needs to be connected to the ac input module 11 in the rf power supply. The input end of the harmonic analyzer may be connected to the input end of the ac input module 11, may also be connected to the output end of the ac input module 11, and may also be connected to an ac power line between devices in the ac input module 11.
After obtaining the total harmonic distortion THD, the total harmonic distortion THD may be displayed in real time by using a monitor provided with a display device. The monitor and the harmonic analyzer may be separately installed or may be integrated together. When the monitor and the harmonic analyzer are integrated, an isolation device needs to be arranged between the monitor and the harmonic analyzer to prevent the monitor from interfering the harmonic analyzer, so that the accuracy of the detection result of the harmonic analyzer is reduced.
In the harmonic monitoring method of the radio frequency power supply provided by this embodiment, the total harmonic distortion THD of the radio frequency power supply is obtained by measuring the harmonic of the radio frequency power supply, and the total harmonic distortion THD is displayed in real time, so that a process operator can monitor the harmonic of the radio frequency power supply in real time, and when the harmonic of the radio frequency power supply is too large, corresponding measures can be taken for ferrite coupled inductive plasma process equipment and associated equipment, thereby avoiding a situation that the process is not good due to power supply abnormality of the ferrite coupled inductive plasma process equipment and the associated equipment, where the associated equipment is process equipment sharing a power distribution board with the ferrite coupled inductive plasma process equipment.
In an optional implementation manner, the harmonic monitoring method for a radio frequency power supply provided in this embodiment further includes: and displaying the harmonic upper limit value USL, the harmonic lower limit value LSL and the harmonic reference value I/L. By displaying the harmonic upper limit value USL, the harmonic lower limit value LSL and the harmonic reference value I/L, contrast data can be provided for total harmonic distortion THD, and process operators can conveniently and visually compare the data.
In an optional implementation manner, the harmonic monitoring method for a radio frequency power supply provided in this embodiment further includes: and when the total harmonic distortion THD is greater than the harmonic upper limit value USL or the harmonic reference value I/L, sending an alarm signal to ferrite coupling induction plasma process equipment and associated equipment, wherein the associated equipment is the process equipment sharing a power distribution board with the ferrite coupling induction plasma process equipment. By sending alarm signals to the ferrite coupling induction plasma process equipment and the associated equipment, the condition that the radio frequency power supply has overlarge harmonic waves can be recorded by the ferrite coupling induction plasma process equipment and the associated equipment, and fault analysis personnel can conveniently call and check the alarm records.
In an optional implementation manner, the harmonic monitoring method for a radio frequency power supply provided in this embodiment further includes: and when the total harmonic distortion THD is greater than the harmonic upper limit value USL or the harmonic reference value I/L, performing interlocking control on the ferrite coupling induction plasma process equipment and associated equipment to stop the ferrite coupling induction plasma process equipment and the associated equipment from working, wherein the associated equipment is process equipment sharing a power distribution board with the ferrite coupling induction plasma process equipment. By performing interlocking control on the ferrite coupling induction plasma process equipment and the associated equipment, the ferrite coupling induction plasma process equipment and the associated equipment can be automatically controlled to stop working when the radio frequency power supply has overlarge harmonic.
Based on the same inventive concept, the present embodiment also provides a semiconductor apparatus system including a radio frequency power supply and a harmonic monitoring system. The rf power supply is the rf power supply shown in fig. 1 for supplying power to the ferrite coupled inductive plasma processing apparatus, and the harmonic monitoring system is the harmonic monitoring system described in the previous embodiment.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are merely exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention, and any modifications, equivalent substitutions, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.

Claims (10)

1.一种射频电源的谐波监控系统，所述射频电源用于为铁氧体耦合感应等离子体工艺设备供电，其特征在于，包括：1. a harmonic monitoring system of radio frequency power supply, described radio frequency power supply is used to supply power for ferrite coupled induction plasma process equipment, it is characterized in that, comprising: 与所述射频电源连接的谐波分析仪，所述谐波分析仪用于测定所述射频电源的谐波，获得所述射频电源的总谐波失真；a harmonic analyzer connected to the radio frequency power supply, the harmonic analyzer is used to measure the harmonics of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply; 与所述谐波分析仪连接的监视器，所述监视器用于实时显示所述总谐波失真。A monitor connected with the harmonic analyzer, the monitor is used for displaying the total harmonic distortion in real time. 2.根据权利要求1所述的射频电源的谐波监控系统，其特征在于，所述射频电源包括交流输入模块、AC-DC变换模块以及射频模块，所述交流输入模块包括变压器和滤波电感；2. The harmonic monitoring system of a radio frequency power supply according to claim 1, wherein the radio frequency power supply comprises an AC input module, an AC-DC conversion module and a radio frequency module, and the AC input module comprises a transformer and a filter inductor; 所述变压器与电力配电盘连接，用于对所述电力配电盘提供的交流电进行变压处理；The transformer is connected to the power distribution board, and is used for transforming the alternating current provided by the power distribution board; 所述滤波电感与所述变压器连接，用于对所述变压器输出的交流电进行滤波处理；The filter inductor is connected to the transformer, and is used for filtering the alternating current output by the transformer; 所述AC-DC变换模块与所述滤波电感连接，用于将所述滤波电感输出的交流电变换为直流电；The AC-DC conversion module is connected to the filter inductor, and is used for converting the AC power output by the filter inductor into DC power; 所述射频模块与所述AC-DC变换模块连接，用于将所述AC-DC变换模块输出的直流电变换为射频电流。The radio frequency module is connected to the AC-DC conversion module, and is used for converting the direct current output by the AC-DC conversion module into a radio frequency current. 3.根据权利要求2所述的射频电源的谐波监控系统，其特征在于，所述谐波分析仪的输入端连接所述电力配电盘和所述变压器之间的交流输电线；或者，3. The harmonic monitoring system of a radio frequency power supply according to claim 2, wherein the input end of the harmonic analyzer is connected to the AC transmission line between the power distribution board and the transformer; or, 所述谐波分析仪的输入端连接所述变压器和所述滤波电感之间的交流输电线；或者，The input end of the harmonic analyzer is connected to the AC transmission line between the transformer and the filter inductor; or, 所述谐波分析仪的输入端连接所述滤波电感和所述AC-DC变换模块之间的交流输电线。The input end of the harmonic analyzer is connected to the AC transmission line between the filter inductor and the AC-DC conversion module. 4.根据权利要求1所述的射频电源的谐波监控系统，其特征在于，所述监视器还用于显示谐波上限值、谐波下限值以及谐波参考值。4 . The harmonic monitoring system of the radio frequency power supply according to claim 1 , wherein the monitor is further used to display the upper harmonic value, the lower harmonic value and the harmonic reference value. 5 . 5.根据权利要求4所述的射频电源的谐波监控系统，其特征在于，还包括：5. The harmonic monitoring system of radio frequency power supply according to claim 4, is characterized in that, also comprises: 与所述监视器连接的控制器，所述控制器用于存储所述总谐波失真。a controller connected to the monitor, the controller for storing the total harmonic distortion. 6.根据权利要求5所述的射频电源的谐波监控系统，其特征在于，所述控制器还用于在所述总谐波失真大于所述谐波上限值或者所述谐波参考值时，向所述铁氧体耦合感应等离子体工艺设备和关联设备发送报警信号，所述关联设备为与所述铁氧体耦合感应等离子体工艺设备共用电力配电盘的工艺设备；和/或，6 . The harmonic monitoring system of the radio frequency power supply according to claim 5 , wherein the controller is further configured to: when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value When , send an alarm signal to the ferrite coupled induction plasma process equipment and associated equipment, and the associated equipment is a process equipment that shares a power distribution board with the ferrite coupled induction plasma process equipment; and/or, 所述控制器还用于在所述总谐波失真大于所述谐波上限值或者所述谐波参考值时，对所述铁氧体耦合感应等离子体工艺设备和关联设备进行联锁控制，使所述铁氧体耦合感应等离子体工艺设备和所述关联设备停止工作，所述关联设备为与所述铁氧体耦合感应等离子体工艺设备共用电力配电盘的工艺设备。The controller is further configured to perform interlock control on the ferrite coupled induction plasma process equipment and related equipment when the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value , stopping the ferrite coupled induction plasma process equipment and the associated equipment, and the associated equipment is a process equipment that shares a power distribution board with the ferrite coupled induction plasma process equipment. 7.一种射频电源的谐波监控方法，所述射频电源用于为铁氧体耦合感应等离子体工艺设备供电，其特征在于，包括：7. A harmonic monitoring method for a radio frequency power supply, the radio frequency power supply is used for supplying power to a ferrite coupled induction plasma process equipment, characterized in that, comprising: 测定所述射频电源的谐波，获得所述射频电源的总谐波失真；measuring the harmonics of the radio frequency power supply to obtain the total harmonic distortion of the radio frequency power supply; 实时显示所述总谐波失真。The total harmonic distortion is displayed in real time. 8.根据权利要求7所述的射频电源的谐波监控方法，其特征在于，还包括：8. The harmonic monitoring method of radio frequency power supply according to claim 7, is characterized in that, also comprises: 显示谐波上限值、谐波下限值以及谐波参考值。Displays the upper harmonic value, lower harmonic value, and harmonic reference value. 9.根据权利要求8所述的射频电源的谐波监控方法，其特征在于，还包括：9. The harmonic monitoring method of radio frequency power supply according to claim 8, is characterized in that, also comprises: 在所述总谐波失真大于所述谐波上限值或者所述谐波参考值时，向所述铁氧体耦合感应等离子体工艺设备和关联设备发送报警信号，所述关联设备为与所述铁氧体耦合感应等离子体工艺设备共用电力配电盘的工艺设备；和/或，When the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, an alarm signal is sent to the ferrite coupled induction plasma process equipment and associated equipment, where the associated equipment is related to the Process equipment in which the ferrite-coupled induction plasma process equipment shares a power distribution panel; and/or, 在所述总谐波失真大于所述谐波上限值或者所述谐波参考值时，对所述铁氧体耦合感应等离子体工艺设备和关联设备进行联锁控制，使所述铁氧体耦合感应等离子体工艺设备和所述关联设备停止工作，所述关联设备为与所述铁氧体耦合感应等离子体工艺设备共用电力配电盘的工艺设备。When the total harmonic distortion is greater than the harmonic upper limit value or the harmonic reference value, interlock control is performed on the ferrite coupled induction plasma process equipment and related equipment, so that the ferrite The coupled induction plasma process equipment and the associated equipment are stopped, and the associated equipment is a process equipment that shares a power distribution board with the ferrite coupled induction plasma process equipment. 10.一种半导体设备系统，其特征在于，包括射频电源以及权利要求1至6任一项所述的谐波监控系统。10. A semiconductor equipment system, characterized by comprising a radio frequency power supply and the harmonic monitoring system according to any one of claims 1 to 6.
CN202010485542.8A 2020-06-01 2020-06-01 Harmonic monitoring system and monitoring method of radio frequency power supply and semiconductor equipment system Pending CN111600307A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325019A (en) * 1992-08-21 1994-06-28 Sematech, Inc. Control of plasma process by use of harmonic frequency components of voltage and current
US5472561A (en) * 1993-12-07 1995-12-05 Sematech, Inc. Radio frequency monitor for semiconductor process control
US5576629A (en) * 1994-10-24 1996-11-19 Fourth State Technology, Inc. Plasma monitoring and control method and system
CN101595767A (en) * 2007-02-16 2009-12-02 Mks仪器有限公司 Harmonic derived arc detectors
CN101720563A (en) * 2007-06-08 2010-06-02 E2V技术（英国）有限公司 Power supply for radio frequency heating apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325019A (en) * 1992-08-21 1994-06-28 Sematech, Inc. Control of plasma process by use of harmonic frequency components of voltage and current
US5472561A (en) * 1993-12-07 1995-12-05 Sematech, Inc. Radio frequency monitor for semiconductor process control
US5576629A (en) * 1994-10-24 1996-11-19 Fourth State Technology, Inc. Plasma monitoring and control method and system
CN101595767A (en) * 2007-02-16 2009-12-02 Mks仪器有限公司 Harmonic derived arc detectors
CN101720563A (en) * 2007-06-08 2010-06-02 E2V技术（英国）有限公司 Power supply for radio frequency heating apparatus

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