CN111555006A - Ka-band grounded coplanar waveguide gold wire transition structure - Google Patents
Ka-band grounded coplanar waveguide gold wire transition structure Download PDFInfo
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Abstract
Description
技术领域technical field
本申请属于微波无线电技术领域,更具体地说,是涉及一种Ka波段接地共面波导金丝过渡结构。The present application belongs to the technical field of microwave radio, and more particularly, relates to a Ka-band grounded coplanar waveguide gold wire transition structure.
背景技术Background technique
Ka波段是指频率在26.5~40GHz的无线电波波段。多芯片组件(Multi-ChipModule,多芯片组件,简称MCM)将多个集成电路芯片和其它片式元器件组装在一块高密度多层互连基板上,是微波/毫米波组件主流的实现方案。其中,传输线与芯片的连接是微波/毫米波组件组装流程的关键环节。常见的传输线结构有微带线、共面波导(CPW,Coplanarwaveguide)、带状线等。其中,共面波导的大面积接地与信号线处于同一平面,可以有效抑制辐射损耗和高频色散,且结构设计灵活,可衍生出接地共面波导、非对称共面波导等,并可与多芯片组件中其它部件能更好的进行集成。对于较低频段的多芯片组件,传输线与芯片可通过金丝键合直接相连。然而,由于接地共面波导与金丝的阻抗差异巨大,将金丝与接地共面波导中信号线直接相连,会因阻抗失配引起较大的电磁波反射,使整个结构的回波损耗和驻波比性能恶化,且频率越高,恶化越严重。Ka-band refers to the radio wave band with frequencies between 26.5 and 40 GHz. Multi-Chip Module (Multi-Chip Module, MCM for short) assembles multiple integrated circuit chips and other chip components on a high-density multi-layer interconnect substrate, and is the mainstream implementation solution for microwave/millimeter wave components. Among them, the connection between the transmission line and the chip is a key link in the assembly process of microwave/millimeter wave components. Common transmission line structures include a microstrip line, a coplanar waveguide (CPW, Coplanar waveguide), a stripline, and the like. Among them, the large-area grounding of the coplanar waveguide is in the same plane as the signal line, which can effectively suppress radiation loss and high-frequency dispersion, and the structure design is flexible. Other components in the chip assembly can be better integrated. For lower frequency multi-chip assemblies, the transmission line and chip can be directly connected by gold wire bonding. However, due to the huge difference in impedance between the grounded coplanar waveguide and the gold wire, directly connecting the gold wire to the signal line in the grounded coplanar waveguide will cause a large electromagnetic wave reflection due to impedance mismatch, which will make the return loss and standing of the entire structure. The wave ratio performance deteriorates, and the higher the frequency, the more severe the deterioration.
发明内容SUMMARY OF THE INVENTION
本申请实施例的目的在于提供一种Ka波段接地共面波导金丝过渡结构,以解决相关技术中存在的Ka波段接地共面波导与金丝连接,会因阻抗失配引起回波损耗和驻波比性能恶化的问题。The purpose of the embodiments of the present application is to provide a Ka-band grounded coplanar waveguide gold wire transition structure, so as to solve the problem that the connection between the Ka-band grounded coplanar waveguide and the gold wire existing in the related art will cause return loss and standing due to impedance mismatch. The problem of deteriorating Burpee performance.
为实现上述目的,本申请实施例采用的技术方案是:提供一种Ka波段接地共面波导金丝过渡结构,包括接地共面波导、芯片和连接所述芯片与所述接地共面波导的金丝,所述接地共面波导包括基板、设于所述基板背面的接地底层、设于所述基板正面的信号线和分别位于所述信号线两侧的接地表层,各所述接地表层设于所述基板正面,所述信号线与各所述接地表层间隔设置,所述基板正面开设有容置槽,所述芯片安装于所述容置槽中,所述信号线延伸至所述容置槽的一端,所述金丝与所述芯片相连,所述信号线邻近所述芯片的一端与所述金丝之间级联用于与所述金丝进行阻抗匹配的阻抗变换枝节,所述阻抗变换支节设于所述基板的正面,所述阻抗变换支节位于两个所述接地表层之间。In order to achieve the above purpose, the technical solution adopted in the embodiments of the present application is to provide a Ka-band grounded coplanar waveguide gold wire transition structure, including a grounded coplanar waveguide, a chip, and a gold wire connecting the chip and the grounded coplanar waveguide. The grounded coplanar waveguide includes a substrate, a grounding bottom layer arranged on the back of the substrate, a signal line arranged on the front of the substrate, and a grounding surface layer respectively located on both sides of the signal line, each of the grounding surface layers is arranged on On the front surface of the substrate, the signal lines are arranged at intervals from each of the grounding surfaces, an accommodating groove is opened on the front surface of the substrate, the chip is installed in the accommodating groove, and the signal line extends to the accommodating groove At one end of the slot, the gold wire is connected to the chip, an impedance transformation branch used for impedance matching with the gold wire is cascaded between one end of the signal line adjacent to the chip and the gold wire, and the The impedance transformation branch is arranged on the front surface of the substrate, and the impedance transformation branch is located between the two grounding surface layers.
在一个实施例中,所述阻抗变换枝节包括高阻抗枝节和低阻抗枝节,所述高阻抗枝节的一端与所述信号线相连,所述高阻抗枝节的另一端与所述低阻抗枝节沿所述信号线宽度方向的中部相连,所述金丝与所述低阻抗枝节相连。In one embodiment, the impedance transformation branch includes a high-impedance branch and a low-impedance branch, one end of the high-impedance branch is connected to the signal line, and the other end of the high-impedance branch is connected to the low-impedance branch along the The middle part of the signal line in the width direction is connected, and the gold wire is connected to the low-impedance branch.
在一个实施例中,所述接地共面波导的特征阻抗为50Ω,所述阻抗变换枝节为金层;所述高阻抗枝节沿所述信号线长度方向的长度为0.25mm,所述高阻抗枝节沿所述信号线宽度方向的宽度为0.1mm,所述低阻抗枝节沿所述信号线长度方向的长度为0.25mm,所述低阻抗枝节沿所述信号线宽度方向的宽度为0.75mm。In one embodiment, the characteristic impedance of the grounded coplanar waveguide is 50Ω, and the impedance transformation branch is a gold layer; the length of the high-impedance branch along the length direction of the signal line is 0.25 mm, and the high-impedance branch is 0.25 mm. The width along the width direction of the signal line is 0.1 mm, the length of the low impedance branch along the length direction of the signal line is 0.25 mm, and the width of the low impedance branch along the width direction of the signal line is 0.75 mm.
在一个实施例中,所述信号线及所述接地表层均为金层,所述信号线的宽度为0.38mm,所述信号线与各所述接地表层之间的间隙为0.4mm。In one embodiment, both the signal line and the ground surface layer are gold layers, the width of the signal line is 0.38 mm, and the gap between the signal line and each of the ground surface layers is 0.4 mm.
在一个实施例中,所述阻抗变换支节通过两根所述金丝与所述芯片相连,两根所述金丝沿所述信号线长度方向呈八字型排布,两根所述金丝靠近所述芯片一端的距离小于两根所述金丝靠近所述阻抗变换支节一端的距离。In one embodiment, the impedance transformation branch is connected to the chip through two gold wires, the two gold wires are arranged in a figure-eight shape along the length direction of the signal line, and the two gold wires are The distance close to one end of the chip is smaller than the distance of the two gold wires close to one end of the impedance transformation branch.
在一个实施例中,各所述金丝的跨距的范围为小于或等于300μm,各所述金丝的拱高的范围为100μm-200μm,两根所述金丝靠近所述芯片一端的距离的范围为小于或等于50μm,两根所述金丝靠近所述阻抗变换支节一端的距离的范围为100μm-250μm。In one embodiment, the span of each of the gold wires is in the range of less than or equal to 300 μm, the range of the arch height of each of the gold wires is in the range of 100 μm to 200 μm, and the distance between the two gold wires is close to one end of the chip. The range is less than or equal to 50 μm, and the range of the distance between the two gold wires close to one end of the impedance transformation branch is 100 μm-250 μm.
在一个实施例中,所述阻抗变换支节关于所述信号线长度方向的中线对称设置,所述接地共面波导关于所述信号线长度方向的中线对称设置,两根所述金丝关于所述信号线长度方向的中线对称设置。In one embodiment, the impedance transformation branch is symmetrically arranged with respect to the center line in the length direction of the signal line, the grounded coplanar waveguide is symmetrically arranged with respect to the center line in the length direction of the signal line, and the two gold wires are arranged about the center line in the length direction of the signal line. The center line in the length direction of the signal line is symmetrically arranged.
在一个实施例中,所述信号线为两段,两段所述信号线分别位于所述容置槽的两端,各所述信号线邻近所述芯片的一端分别连接有所述阻抗变换支节,两个所述阻抗变换支节分别通过所述金丝与所述芯片的两端相连。In one embodiment, the signal line has two sections, the two sections of the signal line are respectively located at two ends of the accommodating slot, and one end of each of the signal lines adjacent to the chip is respectively connected with the impedance transformation branch The two impedance transformation branches are respectively connected to two ends of the chip through the gold wires.
在一个实施例中,所述基板上于所述信号线的两侧分别设有至少两排接地通孔,各所述接地通孔连接相应所述接地表层与所述接地底层;所述信号线各侧邻近该信号线的两排所述接地通孔中:各排所述接地通孔中相邻两个所述接地通孔之间的距离范围为0.5-1.1mm,该两排所述接地通孔之间的距离范围为0.5mm-1.5mm,该两排所述接地通孔沿所述信号线长度方向错位设置。In one embodiment, at least two rows of ground through holes are respectively provided on both sides of the signal line on the substrate, and each of the ground through holes connects the corresponding ground surface layer and the ground bottom layer; the signal line In the two rows of ground through holes adjacent to the signal line on each side: the distance between two adjacent ground through holes in each row of the ground through holes is in the range of 0.5-1.1 mm, and the ground through holes in the two rows are in the range of 0.5-1.1 mm. The distance between the through holes ranges from 0.5mm to 1.5mm, and the two rows of the ground through holes are arranged in a staggered position along the length direction of the signal line.
在一个实施例中,所述阻抗变换支节与各所述接地表层之间的间隙大于或等于0.225mm。In one embodiment, the gap between the impedance transformation branch and each of the ground surface layers is greater than or equal to 0.225mm.
本申请实施例提供的Ka波段接地共面波导金丝过渡结构的有益效果在于:与现有技术相比,本申请通过在信号线与金丝加入阻抗变换枝节,既可以良好的实现接地共面波导与金丝之间的阻抗匹配,有效解决因阻抗失配引起回波损耗和驻波比性能恶化的问题,又符合平面电路制作工艺要求,易于加工制作。The beneficial effect of the Ka-band grounded coplanar waveguide gold wire transition structure provided by the embodiment of the present application is that compared with the prior art, the present application can well realize grounding coplanarity by adding impedance transformation branches to the signal line and the gold wire. The impedance matching between the waveguide and the gold wire can effectively solve the problems of return loss and VSWR performance deterioration caused by impedance mismatch.
附图说明Description of drawings
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例或示范性技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions in the embodiments of the present application more clearly, the following briefly introduces the accompanying drawings that are used in the description of the embodiments or exemplary technologies. Obviously, the drawings in the following description are only for the present application. In some embodiments, for those of ordinary skill in the art, other drawings can also be obtained according to these drawings without any creative effort.
图1为本申请实施例提供的Ka波段接地共面波导金丝过渡结构的立体结构示意图;1 is a schematic three-dimensional structural diagram of a Ka-band grounded coplanar waveguide gold wire transition structure provided by an embodiment of the present application;
图2为图1的Ka波段接地共面波导金丝过渡结构的俯视结构示意图;FIG. 2 is a top-view structural schematic diagram of the Ka-band grounded coplanar waveguide gold wire transition structure of FIG. 1;
图3为图1中A部分的放大图;Fig. 3 is the enlarged view of A part in Fig. 1;
图4为沿图3中B-B线剖视的部分结构示意图;Fig. 4 is a partial structural schematic diagram taken along line B-B in Fig. 3;
图5为图1中部分结构的放大图;Fig. 5 is an enlarged view of part of the structure in Fig. 1;
图6为接地共面波导的信号线通过金丝直接与芯片相连时的等效电路图。FIG. 6 is an equivalent circuit diagram when the signal line of the grounded coplanar waveguide is directly connected to the chip through a gold wire.
图7为本申请实施例提供的Ka波段接地共面波导金丝过渡结构中一个阻抗变换枝节与相应金丝形成的等效电路图。FIG. 7 is an equivalent circuit diagram formed by an impedance transformation branch and a corresponding gold wire in the Ka-band grounded coplanar waveguide gold wire transition structure provided by the embodiment of the present application.
图8为本申请实施例提供的Ka波段接地共面波导金丝过渡结构的传输性能仿真的效果图。FIG. 8 is an effect diagram of the simulation of the transmission performance of the Ka-band grounded coplanar waveguide gold wire transition structure provided by the embodiment of the present application.
其中,图中各附图主要标记:Among them, the main symbols of each accompanying drawing in the figure are:
100-Ka波段接地共面波导金丝过渡结构;100-Ka band grounded coplanar waveguide gold wire transition structure;
10-接地共面波导;11-基板;111-容置槽;112-;12-接地底层;13-接地表层;14-信号线;10-ground coplanar waveguide; 11-substrate; 111-accommodating slot; 112-; 12-ground bottom layer; 13-ground surface layer; 14-signal line;
20-芯片;20-chip;
30-金丝;30 - gold wire;
40-阻抗变换枝节;41-高阻抗枝节;42-低阻抗枝节。40-impedance transform branch; 41-high impedance branch; 42-low impedance branch.
具体实施方式Detailed ways
为了使本申请所要解决的技术问题、技术方案及有益效果更加清楚明白,以下结合附图及实施例,对本申请进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本申请,并不用于限定本申请。In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application clearer, the present application will be described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application.
需要说明的是,当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者间接在该另一个元件上。当一个元件被称为是“连接于”另一个元件,它可以是直接连接到另一个元件或间接连接至该另一个元件上。It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.
在本申请的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。“若干”的含义是一个或一个以上,除非另有明确具体的限定。In the description of the present application, "plurality" means two or more, unless otherwise expressly and specifically defined. "Several" means one or more than one, unless expressly specifically defined otherwise.
在本申请的描述中,需要理解的是,术语“中心”、“长度”、“宽度”、“厚度”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。In the description of the present application, it should be understood that the orientation or positional relationship indicated by the terms "center", "length", "width", "thickness", "inner", "outer", etc. are based on those shown in the accompanying drawings The orientation or positional relationship is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the indicated device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the present application.
在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; may be mechanical connection or electrical connection; may be direct connection or indirect connection through an intermediate medium, may be internal communication between two elements or an interaction relationship between the two elements. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific situations.
在本申请说明书中描述的参考“一个实施例”、“一些实施例”或“实施例”意味着在本申请的一个或多个实施例中包括结合该实施例描述的特定特征、结构或特点。由此,在本说明书中的不同之处出现的语句“在一个实施例中”、“在一些实施例中”、“在其他一些实施例中”、“在另外一些实施例中”等不是必然都参考相同的实施例,而是意味着“一个或多个但不是所有的实施例”,除非是以其他方式另外特别强调。此外,在一个或多个实施例中,可以以任何合适的方式组合特定的特征、结构或特性。Reference in this specification to "one embodiment," "some embodiments," or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in one or more embodiments of the application . Thus, appearances of the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in other embodiments," etc. in various places in this specification are not necessarily All refer to the same embodiment, but mean "one or more but not all embodiments" unless specifically emphasized otherwise. Furthermore, the particular features, structures or characteristics may be combined in any suitable manner in one or more embodiments.
请参阅图1,为了方便描述,定义空间上相互垂直的三个坐标轴分别为X轴、Y轴和Z轴,其中,X轴为沿信号线的长度方向,Y轴为沿信号线的宽度方向,Z轴为沿信号线的厚度方向。Please refer to FIG. 1. For the convenience of description, three coordinate axes that are perpendicular to each other in space are defined as the X axis, the Y axis and the Z axis, wherein the X axis is the length direction along the signal line, and the Y axis is the width along the signal line. direction, the Z axis is along the thickness direction of the signal line.
请参阅图1、图2和图3,现对本申请提供的Ka波段接地共面波导金丝过渡结构100进行说明。所述Ka波段接地共面波导金丝过渡结构100,包括接地共面波导10、芯片20、金丝30和阻抗变换枝节40。接地共面波导10包括基板11、接地底层12、信号线14和两个接地表层13,接地底层12设于基板11背面,信号线14和两个接地表层13设于基板11正面,两个接地表层13分别位于的信号线14两侧,信号线14与各接地表层13间隔设置,从而形成接地共面波导10。基板11正面开设有容置槽111,信号线14延伸至容置槽111的一端,即容置槽111设于信号线14对应的位置,芯片20安装于容置槽111中,以方便安装芯片20,并且符合平面电路制作工艺要求,易于加工制作。金丝30与芯片20相连,阻抗变换支节设于基板11的正面,阻抗变换枝节40用于与金丝30进行阻抗匹配,并且阻抗变换枝节40连接信号线14邻近芯片20的一端与金丝30,即通过阻抗变换枝节40将信号线14与金丝30进行阻抗匹配相连,以有效解决因阻抗失配引起回波损耗和驻波比性能恶化的问题。Referring to FIG. 1 , FIG. 2 and FIG. 3 , the Ka-band grounded coplanar waveguide gold
本申请提供的Ka波段接地共面波导金丝过渡结构100,与现有技术相比,通过在信号线14与金丝30加入阻抗变换枝节40,既可以良好的实现接地共面波导10与金丝30之间的阻抗匹配,有效解决因阻抗失配引起回波损耗和驻波比性能恶化的问题,又符合平面电路制作工艺要求,易于加工制作。Compared with the prior art, in the Ka-band grounded coplanar waveguide gold
在一个实施例中,请参阅图3和图5,阻抗变换枝节40包括高阻抗枝节41和低阻抗枝节42,高阻抗枝节41的一端与信号线14相连,高阻抗枝节41的另一端与低阻抗枝节42沿信号线14宽度方向的中部相连,金丝30与低阻抗枝节42相连,从而实现信号线14与金丝30的连接,并且该阻抗变换枝节40可以形成T型结构。以更好的实现金丝30与信号线14之间的阻抗匹配。In one embodiment, please refer to FIG. 3 and FIG. 5 , the
请参阅图6,图6所示的电路为使用金丝30直接将芯片20与信号线14连接时,金丝30的等效电路。该等效电路包括两个电感L1、两个电阻R1、两个电容C1和一个电容C2,其中电感L1、电阻R1、电阻R1和电感L1依次串联,且一个电感L1远离两个电阻R1的一端为用于连接芯片20的芯片端,另一个电感L1远离两个电阻R1的一端为用于连接信号线14的信号线端,即从芯片端到信号线端,电感L1、电阻R1、电阻R1和电感L1依次串联;并且芯片端通过一个电容C1接地,信号线端通过另一个电容C1接地,两个电阻R1之间通过电容C2接地。Please refer to FIG. 6 . The circuit shown in FIG. 6 is an equivalent circuit of the
请参阅图7,使用上述T型的阻抗变换枝节40连接金丝30与信号线14,阻抗变换枝节40与金丝30的等效电路,该等效电路包括两个电感L1、两个电阻R1、一个电感Lp一个电容Cp、两个电容C1和一个电容C2,其中电感L1、电阻R1、电阻R1、电感L1和电感Lp依次串联,且远离电感Lp的一个电感L1的一端为用于连接芯片20的芯片端,电感Lp远离两个电阻R1的一端为用于连接信号线14的信号线端,即从芯片端到信号线端,电感L1、电阻R1、电阻R1、电感L1和电感Lp依次串联;并且芯片端通过一个电容C1接地,两个电阻R1之间通过电容C2接地,另一个电容C1与电容Cp并联,并且电感Lp远离信号线端的一端通过电容Cp接地。则电感Lp与电容Cp可以形成L型阻抗匹配网络,即该使用阻抗变换枝节40的等效电路相当于在直接使用金丝30连接信号线14的等效电路的信号线端加入L型阻抗匹配网络,从而可以较好地实现接地共面波导10和金丝30的超宽带阻抗匹配。当然,在一些实施例中,也可以使用其他形状的阻抗变换枝节40,以实现金丝30与信号线14的阻抗匹配。Please refer to FIG. 7 , the above-mentioned T-shaped
在一个实施例中,请参阅图3至图5,接地共面波导10的特征阻抗为50Ω,阻抗变换枝节40为金层;高阻抗枝节41沿信号线14长度方向的长度为0.25mm,高阻抗枝节41沿信号线14宽度方向的宽度为0.1mm,低阻抗枝节42沿信号线14长度方向的长度为0.25mm,低阻抗枝节42沿信号线14宽度方向的宽度为0.75mm,该结构的阻抗变换枝节40,可以良好的实现金丝30与50Ω特征阻抗的接地共面波导10之间在Ka波段的阻抗匹配,保证良好的链路传输性能。In one embodiment, referring to FIGS. 3 to 5 , the characteristic impedance of the grounded
在一个实施例中,请参阅图1至图3,信号线14及接地表层13均为金层,信号线14的宽度为0.38mm,信号线14与各接地表层13之间的间隙为0.4mm,以使该接地共面波导10具有良好的传输性能,并且使该接地共面波导10具有50Ω特征阻抗,提升该接地共面波导10的适用范围。In one embodiment, please refer to FIG. 1 to FIG. 3 , the
在一个实施例中,请参阅图3和图4,金层的厚度范围为10-20μm,即上述阻抗变换枝节40使用金材料制作,阻抗变换枝节40的厚度范围为10-20μm,信号线14及接地表层13使用金材料制作,信号线14及接地表层13的厚度范围为10-20μm,以保证该接地共面波导10具有良好的传输性能,并使阻抗变换枝节40良好的实现金丝30与信号线14间的阻抗匹配。在一些实施例中,各金层的厚度为15μm,以保证接地共面波导10和阻抗变换枝节40良好的传输性能和阻抗匹配特性。In one embodiment, please refer to FIG. 3 and FIG. 4 , the thickness of the gold layer is in the range of 10-20 μm, that is, the
在一个实施例中,阻抗变换枝节40、信号线14及接地表层13的厚度相等,以方便加工制作,如可以印刷制作于基板11上。In one embodiment, the thicknesses of the
在一个实施例中,请参阅图3和图5,阻抗变换支节通过两根金丝30与芯片20相连,两根金丝30沿信号线14长度方向呈八字型排布,两根金丝30靠近芯片20一端的距离小于两根金丝30靠近阻抗变换支节一端的距离。使用两根金丝30连接阻抗变换支节与芯片20,使两根金丝30更好的形成对称结构,降低阻抗,提升传输性能。In one embodiment, please refer to FIG. 3 and FIG. 5 , the impedance transformation branch is connected to the
在一个实施例中,请参阅图3至图5,各金丝30的跨距的范围为小于或等于300μm,各金丝30的拱高的范围为100μm-200μm,两根金丝30靠近芯片20一端的距离的范围为小于或等于50μm,两根金丝30靠近阻抗变换支节一端的距离的范围为100μm-250μm,以使金丝30具有更小的电阻与电感特性,即减小金丝30的阻抗,提升金丝30的传输性能,并良好的与阻抗变换枝节40匹配,同时也方便加工制作。In one embodiment, please refer to FIG. 3 to FIG. 5 , the span of each
在一些实施例中,各金丝30的跨距为260μm,各金丝30的拱高为150μm,两根金丝30靠近芯片20一端的距离为25μm,两根金丝30靠近阻抗变换支节一端的距离为175μm,以使金丝30具有更小的电阻与电感特性,即减小金丝30的阻抗,提升金丝30的传输性能,以更好的保证金丝30良好的连接阻抗变换枝节40与芯片20,并且使金丝30更好的阻抗变换枝节40匹配。In some embodiments, the span of each
在一个实施例中,请参阅图1、图3和图5,阻抗变换支节关于信号线14长度方向的中线对称设置,接地共面波导10关于信号线14长度方向的中线对称设置,两根金丝30关于信号线14长度方向的中线对称设置,从而使该接地共面波导10、金丝30及阻抗变换支节形成对称结构,方便加工制作,且保证Ka波段接地共面波导金丝过渡结构100良好的传输性能和较低的回波损耗。当然,在一些实施例中,若基板11或芯片20本身为非对称结构,只需要将信号线14、阻抗变换支节和金丝30位置做相应调整,也可以实现金丝30与信号线14间良好的阻抗匹配,保证良好的传输性。In one embodiment, please refer to FIG. 1 , FIG. 3 and FIG. 5 , the impedance transformation branches are arranged symmetrically with respect to the center line in the length direction of the
在一个实施例中,请参阅图1、图3和图5,信号线14为两段,两段信号线14分别位于容置槽111的两端,各信号线14邻近芯片20的一端分别连接有阻抗变换支节,两个阻抗变换支节分别通过金丝30与芯片20的两端相连,即方便安装芯片20,又可以实现芯片20的两端与两根信号线14的匹配连接。在其它一些实施例中,当芯片20仅需要一端与信号线14相连时,容置槽111可以设在基板11的一端,从而将芯片20安装在基板11的边缘。In one embodiment, please refer to FIG. 1 , FIG. 3 and FIG. 5 , the
在一个实施例中,请参阅图1和图2,当信号线14为两段时,两段信号线14的长度相等,容置槽111位于基板11的中部位置,从在使接地共面波导10关于基板11长度方向的中线对称设置,以方便设计制作,并保证接地共面波导10良好的传输性能。In one embodiment, please refer to FIG. 1 and FIG. 2 , when the
在一个实施例中,请参阅图1和图2,基板11上于信号线14的两侧分别设有至少两排接地通孔,各接地通孔连接相应接地表层13与接地底层12,以提升该接地共面波导10的传输性,提升传输效率,降低损耗。In one embodiment, please refer to FIG. 1 and FIG. 2 , at least two rows of ground vias are respectively provided on both sides of the
在一个实施例中,请参阅图1和图2,信号线14各侧邻近该信号线14的两排接地通孔中:各排接地通孔中相邻两个接地通孔之间的距离范围为0.5-1.1mm;该两排接地通孔之间的距离范围为0.5mm-1.5mm,相邻两排接地通孔沿信号线14长度方向错位设置,以更好的提升该接地共面波导10的传输效率,降低损耗。In one embodiment, please refer to FIG. 1 and FIG. 2 , in the two rows of ground vias adjacent to the
在一个实施例中,各接地通孔的孔径范围为0.1-0.3mm,以方便加工制作。在一个实施例中,各接地通孔的孔径为0.2mm,即方便制作,又可以提升该接地共面波导10的传输效率,使提升该接地共面波导10的传输效率与制作工艺简单性达到平衡。In one embodiment, the diameter of each ground through hole is in the range of 0.1-0.3 mm, so as to facilitate processing and fabrication. In one embodiment, the diameter of each grounding via is 0.2 mm, which is convenient for fabrication, and can improve the transmission efficiency of the grounded
在一个实施例中,信号线14各侧邻近该信号线14的两排接地通孔中:任意相邻三个接地通孔之轴线之间的连线呈等腰三角形,以更好的防止电磁泄露,提升该接地共面波导10的传输效率。In one embodiment, in the two rows of ground through holes adjacent to the
在一个实施例中,信号线14各侧邻近该信号线14的两排接地通孔中:任意相邻三个接地通孔之轴线之间的连线呈等边三角形,即方便设计制作,又可以提升该接地共面波导10的传输效率。In one embodiment, in the two rows of ground through holes adjacent to the
在一个实施例中,信号线14各侧邻近该信号线14的两排接地通孔中:各排接地通孔中相邻两个接地通孔之间的距离为1mm,以方便加工制作。In one embodiment, each side of the
在一个实施例中,请参阅图3,阻抗变换支节与各接地表层13之间的间隙大于或等于0.225mm,以满足大多数平面电路加工工艺的要求,方便加工制作,降低成本。In one embodiment, please refer to FIG. 3 , the gap between the impedance transformation branch and each
在一个实施例中,请参阅图1和图4,基板11的介电常数范围为5.0~10.0,基板11的介质损耗因子tanα≤0.004,以保证该接地共面波导10良好的传输性能。在一些实施例中,基板11可以使用陶瓷材料,以便该接地共面波导10可以进行低温共烧陶瓷工艺制作。当然,在一些实施例中,基板11也可以使用其他材料制作。In one embodiment, please refer to FIG. 1 and FIG. 4 , the dielectric constant of the
在一个实施例中,基板11呈矩形,信号线14沿基板11的长度方向设置,则基板11的长度方向为信号线14的长度方向,即为X轴方向;基板11的宽度方向为信号线14的宽度方向,即Y轴方向;基板11的厚度方向为信号线14的厚度方向,即Z轴方向。该结构可以更好的将接地共面波导10制作为对称结构,提升传输性能,降低传输损耗。In one embodiment, the
在一个实施例中,基板11的长度为25.4mm,基板11的宽度为12.7mm,基板11的厚度为0.31mm,以使该Ka波段接地共面波导金丝过渡结构100体积尺寸较小,方便使用。In one embodiment, the length of the
在一个实施例中,容置槽111的内壁与芯片20侧面之间的距离范围为60-100μm,以方便将芯片20安装在容置槽111中。在一个实施例中容置槽111的内壁与芯片20侧面之间的距离为80μm,既方便将芯片20安装在容置槽111中,也便于固定芯片20。In one embodiment, the distance between the inner wall of the
在一个实施例中,芯片20正面与接地共面波导10的正面持平,可以更好的满足平面电路加工工艺要求,提升制作精确。In one embodiment, the front surface of the
在一些实施例中,可以将芯片20的底面通过金属垫片与接地底层12接地相连,以减小传输损耗。In some embodiments, the bottom surface of the
请参阅图8,本申请实施例提供的Ka波段接地共面波导金丝过渡结构100的传输性能仿真的效果图,其中使用50Ω特征阻抗的背敷金属共面波导替代芯片20进行电磁仿真。图中横座标轴Freq为频率,单位为GHz;左侧的纵座标轴Insertion/Return Loss为插入/回波损耗,单位dB;VSWR(Voltage Standing Wave Ratio,驻波比,全称为电压驻波比,简写VSWR),右侧的纵座标轴VSWR为驻波比。Curve Info曲线信息,Y Axis Y轴(即纵座标轴)。其中,线S(1,1)为各频率对应回波损耗的曲线,线S(1,1)上高点m2处的频率为32.98GHz,回波损耗为-23.0291dB;线S(2,1)为各频率对应插入损耗的曲线,线S(2,1)上低点m1处的频率为40GHz,插入损耗为-1.0347dB;线V(1)为各频率对应驻波比的曲线,线V(1)上高点m3处的频率为-23.0291GHz,驻波比为1.1518。由图可知,本申请实施例的Ka波段接地共面波导金丝过渡结构100,在Ka波段内的传输性能优异,插入损耗小于1.1dB,回波损耗大于23.0dB,驻波比小于1.2。Please refer to FIG. 8 , which is an effect diagram of the transmission performance simulation of the Ka-band grounded coplanar waveguide gold
本申请实施例的Ka波段接地共面波导金丝过渡结构100,可以采用LTCC(LowTemperature Co-fired Ceramic,低温共烧陶瓷,简称LTCC)工艺,或其它平面印刷工艺进行制作,例如可以在生瓷片对应位置掏出空腔,从下往上进行堆叠并印制各层金属图案和填孔;再烧结成型,当然,还可以对基板11进行电镀与清洗,再依次采用贴片工艺安装芯片20、金丝30键合。The Ka-band grounded coplanar waveguide gold
本申请实施例的Ka波段接地共面波导金丝过渡结构100,可以应用于Ka波段收发组件中,也可以应用在微波通信、雷达系统、电子对抗等设备中。The Ka-band grounded coplanar waveguide gold
以上所述仅为本申请的可选实施例而已,并不用以限制本申请,凡在本申请的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本申请的保护范围之内。The above descriptions are only optional embodiments of the present application, and are not intended to limit the present application. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present application shall be included in the protection of the present application. within the range.
Claims (10)
- The Ka-band grounding coplanar waveguide gold wire transition structure comprises a grounding coplanar waveguide, a chip and a gold wire, wherein the gold wire is connected with the chip and the grounding coplanar waveguide, the grounding coplanar waveguide comprises a substrate, a grounding bottom layer arranged on the back surface of the substrate, a signal wire arranged on the front surface of the substrate and grounding surface layers respectively arranged on two sides of the signal wire, the grounding surface layers are arranged on the front surface of the substrate, the signal wire and the grounding surface layers are arranged at intervals, a containing groove is formed in the front surface of the substrate, the chip is arranged in the containing groove, the signal wire extends to one end of the containing groove, and the gold wire is connected with the chip, and the Ka-band grounding coplanar waveguide gold wire transition structure is characterized: and an impedance transformation branch which is used for carrying out impedance matching with the gold wire is cascaded between one end of the signal wire, which is adjacent to the chip, and the gold wire, the impedance transformation branch is arranged on the front surface of the substrate, and the impedance transformation branch is positioned between the two grounding surface layers.
- 2. The Ka band ground coplanar waveguide gold wire transition structure of claim 1, wherein: the impedance transformation branch comprises a high-impedance branch and a low-impedance branch, one end of the high-impedance branch is connected with the signal wire, the other end of the high-impedance branch is connected with the middle of the low-impedance branch along the width direction of the signal wire, and the gold wire is connected with the low-impedance branch.
- 3. The Ka band ground coplanar waveguide gold wire transition structure of claim 2, wherein: the characteristic impedance of the grounding coplanar waveguide is 50 omega, and the impedance transformation branch is a gold layer; the high impedance stub is followed the length of signal line length direction is 0.25mm, the high impedance stub is followed the width of signal line width direction is 0.1mm, the low impedance stub is followed the length of signal line length direction is 0.25mm, the low impedance stub is followed the width of signal line width direction is 0.75 mm.
- 4. The Ka-band grounded coplanar waveguide gold wire transition structure of claim 3, wherein: the signal lines and the grounding surface layers are all made of gold layers, the width of each signal line is 0.38mm, and gaps between the signal lines and the grounding surface layers are 0.4 mm.
- 5. The Ka-band grounded coplanar waveguide gold wire transition structure of any one of claims 1 to 4, wherein: the impedance transformation branch is connected with the chip through the two gold wires, the two gold wires are arranged in a splayed shape along the length direction of the signal wire, and the distance between the two gold wires and the end, close to the chip, of the two gold wires is smaller than the distance between the two gold wires and the end, close to the impedance transformation branch, of the two gold wires.
- 6. The Ka-band grounded coplanar waveguide gold wire transition structure of claim 5, wherein: the span range of each gold wire is less than or equal to 300 mu m, the arch height range of each gold wire is 100 mu m-200 mu m, the distance range of one end, close to the chip, of each gold wire is less than or equal to 50 mu m, and the distance range of one end, close to the impedance transformation branch, of each gold wire is 100 mu m-250 mu m.
- 7. The Ka-band grounded coplanar waveguide gold wire transition structure of claim 5, wherein: the impedance transformation branch sections are symmetrically arranged relative to the central line of the length direction of the signal wire, the grounding coplanar waveguide is symmetrically arranged relative to the central line of the length direction of the signal wire, and the two gold wires are symmetrically arranged relative to the central line of the length direction of the signal wire.
- 8. The Ka-band grounded coplanar waveguide gold wire transition structure of any one of claims 1 to 4, wherein: the signal lines are two sections, the two sections of signal lines are respectively located at two ends of the accommodating groove, one end, adjacent to the chip, of each signal line is respectively connected with the impedance transformation branch sections, and the two impedance transformation branch sections are respectively connected with two ends of the chip through the gold wires.
- 9. The Ka-band grounded coplanar waveguide gold wire transition structure of any one of claims 1 to 4, wherein: at least two rows of grounding through holes are respectively arranged on the two sides of the signal line on the substrate, and each grounding through hole is connected with the corresponding grounding surface layer and the corresponding grounding bottom layer; in two rows of the ground vias, each side of the signal line is adjacent to the signal line: the distance range between two adjacent ground through holes in each row of ground through holes is 0.5-1.1mm, the distance range between the two rows of ground through holes is 0.5-1.5 mm, and the two rows of ground through holes are arranged along the length direction of the signal wire in a staggered mode.
- 10. The Ka-band grounded coplanar waveguide gold transition structure of any one of claims 1 to 4, wherein the gap between the impedance transformation stub and each of the grounding surfaces is greater than or equal to 0.225 mm.
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| CN113036377A (en) * | 2020-12-21 | 2021-06-25 | 安徽大学 | Gold wire interconnection vertical compensation structure in radio frequency micro system and design method thereof |
| CN113113750A (en) * | 2021-05-07 | 2021-07-13 | 深圳振华富电子有限公司 | Gold wire transition structure of Ka-band grounding coplanar waveguide |
| CN113191036A (en) * | 2021-03-19 | 2021-07-30 | 西安电子科技大学 | Coplanar waveguide equivalent circuit structure and parameter extraction method thereof |
| CN114200211A (en) * | 2020-09-02 | 2022-03-18 | 日本梅克特隆株式会社 | Inspection method and inspection apparatus |
| CN115173010A (en) * | 2022-05-25 | 2022-10-11 | 北京无线电测量研究所 | Microwave transmission device |
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Application publication date: 20200818 |