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CN111509027B - QD display structure and display device - Google Patents

QD display structure and display device Download PDF

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CN111509027B
CN111509027B CN202010474681.0A CN202010474681A CN111509027B CN 111509027 B CN111509027 B CN 111509027B CN 202010474681 A CN202010474681 A CN 202010474681A CN 111509027 B CN111509027 B CN 111509027B
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CN111509027A (en
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王琳琳
尤娟娟
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BOE Technology Group Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/127Active-matrix OLED [AMOLED] displays comprising two substrates, e.g. display comprising OLED array and TFT driving circuitry on different substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/35Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/38Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]

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Abstract

The application discloses a QD display structure and a display device, which comprise a first substrate and a second substrate which are oppositely arranged, wherein a color film layer is arranged on one side of the first substrate close to the second substrate, and a quantum dot layer is formed on one side of the color film layer close to the second substrate; a blue EL layer is arranged on one side, close to the first substrate, of the second substrate, a cathode layer is arranged on the blue EL layer, a TFE film layer is further arranged on the cathode layer, a plurality of microstructures are arranged on the TFE film layer, and a composite material grows on each microstructure; the composite material has negative dielectric constant performance. According to the technical scheme provided by the embodiment of the application, the material with the negative dielectric constant is provided, the cathode layer with the negative dielectric constant or the microstructure is arranged, the material with the negative dielectric constant performance grows on the cathode layer, the material has the characteristics of small-angle light penetration and large-angle light reflection, secondary emergence is carried out on red and green light of a lower hemisphere scattered by the QD layer, and meanwhile, secondary absorption is carried out on the scattered blue light, so that the QD conversion efficiency is improved.

Description

QD显示结构和显示装置QD display structure and display device

技术领域technical field

本发明一般涉及显示技术领域,尤其涉及QD显示结构和显示装置。The present invention generally relates to the field of display technology, and in particular, to a QD display structure and a display device.

背景技术Background technique

目前,量子点在显示技术领域的应用大致分为电致发光和光致发光两类,主要包括以下三个方面的应用:(1)基于光致发光特性的量子点背光源(QDEF);(2)基于光致发光特性的量子点分色滤光器(QDCF);(3)基于电致发光特性的量子点发光二极管(QD-LED)。At present, the application of quantum dots in the field of display technology is roughly divided into two categories: electroluminescence and photoluminescence, mainly including the following three applications: (1) Quantum dot backlight (QDEF) based on photoluminescence characteristics; (2) ) quantum dot dichroic filters (QDCF) based on photoluminescence properties; (3) quantum dot light emitting diodes (QD-LEDs) based on electroluminescence properties.

目前应用量子点技术的产品如已上市的三星SUHD电视等,主要使用的就是QDEF技术,其具体方式就是将含有量子点的量子薄膜插入在发光的背光模组之上,让穿过薄膜的光通过液晶和彩色滤光片的方式展现颜色。构造虽与LCD的方式无异,但通过QDEF技术可以得到相当好的色彩再现效果。与QDEF的方式在LCD的背光模组上添加量子薄膜不同,QDCF技术是直接将基准的LCD彩色滤光片(color filter)材料换成QD(量子点)来表现所需的颜色。近来,三星提出将量子点和OLED结合的新技术,将OLED的蓝光应用在背光模组,使光通过由量子点组成的红色和绿色彩色滤光片来实现全彩化。使用彩色滤光片与LCD相似,同时不选用液晶而是OLED材料又与OLED相似,因而被叫做OLED量子点混合型技术。由于背光模组的材质是OLED并且不含液晶材料,理论上是可以实现柔性显示技术的。At present, products using quantum dot technology, such as Samsung SUHD TVs that have been on the market, mainly use QDEF technology. Colors are displayed by means of liquid crystals and color filters. Although the structure is the same as that of LCD, it can get quite good color reproduction effect through QDEF technology. Unlike QDEF, which adds quantum thin films to the LCD backlight module, QDCF technology directly replaces the standard LCD color filter material with QD (quantum dots) to express the desired color. Recently, Samsung proposed a new technology that combines quantum dots and OLEDs. The blue light of OLEDs is applied to the backlight module, so that the light can pass through the red and green color filters composed of quantum dots to achieve full color. The use of color filters is similar to LCD, and at the same time, it does not use liquid crystal but OLED materials are similar to OLED, so it is called OLED quantum dot hybrid technology. Since the material of the backlight module is OLED and does not contain liquid crystal material, it is theoretically possible to realize flexible display technology.

由于QD层含有散射粒子,所以经过QD后可以近似看成是朗伯体,朗伯体的分布在各个方向几乎是相同的,所以除了正向半球的光发射外,剩余反向半球的光被禁锢在器件内而影响了整体的转换效率。Since the QD layer contains scattering particles, it can be approximately regarded as a Lambertian after the QD, and the distribution of the Lambertian is almost the same in all directions, so in addition to the light emission of the forward hemisphere, the light of the remaining reverse hemisphere is Being confined in the device affects the overall conversion efficiency.

发明内容SUMMARY OF THE INVENTION

鉴于现有技术中的上述缺陷或不足,期望提供一种QD显示结构和显示装置。In view of the above-mentioned defects or deficiencies in the prior art, it is desirable to provide a QD display structure and a display device.

第一方面,提供一种QD显示结构,包括相对设置的第一基板和第二基板,所述第一基板靠近所述第二基板的一侧设有彩膜层,所述彩膜层靠近所述第二基板的一侧形成有量子点层;In a first aspect, a QD display structure is provided, comprising a first substrate and a second substrate arranged opposite to each other, a color filter layer is provided on the side of the first substrate close to the second substrate, and the color filter layer is close to the second substrate. A quantum dot layer is formed on one side of the second substrate;

所述第二基板靠近所述第一基板的一侧设有蓝色EL层,所述蓝色EL层上设有阴极层,所述阴极层材料为负介电常数性能。A blue EL layer is arranged on the side of the second substrate close to the first substrate, a cathode layer is arranged on the blue EL layer, and the material of the cathode layer has negative dielectric constant properties.

第二方面,提供一种QD显示结构,包括相对设置的第一基板和第二基板,所述第一基板靠近所述第二基板的一侧设有彩膜层,所述彩膜层靠近所述第二基板的一侧形成有量子点层;In a second aspect, a QD display structure is provided, comprising a first substrate and a second substrate disposed opposite to each other, a color filter layer is provided on the side of the first substrate close to the second substrate, and the color filter layer is close to the second substrate. A quantum dot layer is formed on one side of the second substrate;

所述第二基板靠近所述第一基板的一侧设有蓝色EL层,所述蓝色EL层上设有阴极层,所述阴极层上还设有TFE膜层,所述TFE膜层上设有多个微结构,每个所述微结构上生长有复合材料,所述复合材料沿所述微结构生长;所述复合材料为负介电常数性能。A blue EL layer is arranged on the side of the second substrate close to the first substrate, a cathode layer is arranged on the blue EL layer, a TFE film layer is also arranged on the cathode layer, and the TFE film layer is arranged on the blue EL layer. A plurality of microstructures are arranged thereon, and a composite material is grown on each of the microstructures, and the composite material grows along the microstructure; the composite material has negative dielectric constant performance.

第三方面,提供一种显示装置,包括上述QD显示结构,In a third aspect, a display device is provided, comprising the above-mentioned QD display structure,

所述彩膜层包括阵列分布的蓝色子像素、红色子像素和绿色子像素,所述量子点层包括绿色量子点和红色量子点,所述绿色量子点与所述绿色子像素对应设置,所述红色量子点与所述红色子像素对应设置,相邻所述蓝色子像素、红色子像素和绿色子像素之间设有遮光层。The color filter layer includes blue sub-pixels, red sub-pixels and green sub-pixels distributed in an array, the quantum dot layer includes green quantum dots and red quantum dots, and the green quantum dots are arranged corresponding to the green sub-pixels, The red quantum dots are arranged corresponding to the red sub-pixels, and a light shielding layer is provided between the adjacent blue sub-pixels, red sub-pixels and green sub-pixels.

根据本申请实施例提供的技术方案,通过提供负介电常数的材料,可以是负介电常数的阴极层或者设置一个微结构,其上生长负介电常数性能的材料,该材料具有小角度光穿过,大角度光反射的特性,对被QD层散射的下半球的红绿光进行二次出射,同时,被散射的蓝光进行二次吸收,提高QD转换效率。According to the technical solutions provided in the embodiments of the present application, by providing a material with a negative permittivity, it can be a cathode layer with a negative permittivity or a microstructure on which a material with negative permittivity properties is grown, and the material has a small angle The characteristics of large-angle light reflection through light passing through, secondary emission of red and green light in the lower hemisphere scattered by the QD layer, and secondary absorption of the scattered blue light to improve the QD conversion efficiency.

附图说明Description of drawings

通过阅读参照以下附图所作的对非限制性实施例所作的详细描述,本申请的其它特征、目的和优点将会变得更明显:Other features, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:

图1为一实施例中QD显示结构示意图;1 is a schematic diagram of a QD display structure in an embodiment;

图2为另一实施例中QD显示结构示意图;2 is a schematic diagram of a QD display structure in another embodiment;

图3为阴极层不同材料下光角度和反射率关系图。FIG. 3 is a graph showing the relationship between light angle and reflectivity under different materials of the cathode layer.

具体实施方式Detailed ways

下面结合附图和实施例对本申请作进一步的详细说明。可以理解的是,此处所描述的具体实施例仅仅用于解释相关发明,而非对该发明的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与发明相关的部分。The present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the related invention, but not to limit the invention. In addition, it should be noted that, for the convenience of description, only the parts related to the invention are shown in the drawings.

需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互组合。下面将参考附图并结合实施例来详细说明本申请。It should be noted that the embodiments in the present application and the features of the embodiments may be combined with each other in the case of no conflict. The present application will be described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.

请参考图1,本实施例提供一种QD显示结构,包括相对设置的第一基板1和第二基板11,所述第一基板1靠近所述第二基板11的一侧设有彩膜层2,所述彩膜层2靠近所述第二基板11的一侧形成有量子点层3;Referring to FIG. 1 , this embodiment provides a QD display structure, including a first substrate 1 and a second substrate 11 disposed opposite to each other, and a color filter layer is provided on the side of the first substrate 1 close to the second substrate 11 . 2. A quantum dot layer 3 is formed on the side of the color filter layer 2 close to the second substrate 11;

所述第二基板11靠近所述第一基板1的一侧设有蓝色EL层9,所述蓝色EL层9上设有阴极层81,所述阴极层81材料为负介电常数性能。A blue EL layer 9 is formed on the side of the second substrate 11 close to the first substrate 1 , a cathode layer 81 is formed on the blue EL layer 9 , and the material of the cathode layer 81 is of negative dielectric constant performance .

本实施例中提供的QD显示结构在蓝色EL层上设置了阴极层,该阴极层为负介电常数性能,可以通过该电极将大于30°角的光大量反射,小于30°角的光透过,当蓝色EL层发出的蓝光经过量子点层是,被量子点层的量子点散射,量子点层上半球的红绿光可以透过彩膜层发射出去,下半球的红绿光可以被阴极层部分反射,再经过量子点层和彩膜层发射出去,同时,被量子点层散射的蓝光可以二次经过量子点层,进行二次吸收和转换,最后发射出去,这样能够提高该QD显示结构的转换效率。The QD display structure provided in this embodiment is provided with a cathode layer on the blue EL layer. The cathode layer has negative dielectric constant performance, and can reflect a large amount of light at an angle greater than 30° through the electrode, and light at an angle less than 30° can be reflected through the electrode. Through, when the blue light emitted by the blue EL layer passes through the quantum dot layer, it is scattered by the quantum dots in the quantum dot layer, the red and green light in the upper hemisphere of the quantum dot layer can be emitted through the color filter layer, and the red and green light in the lower hemisphere It can be partially reflected by the cathode layer, and then emitted through the quantum dot layer and the color filter layer. At the same time, the blue light scattered by the quantum dot layer can pass through the quantum dot layer twice, undergo secondary absorption and conversion, and finally be emitted, which can improve the This QD shows the conversion efficiency of the structure.

进一步的,所述阴极层81蒸镀在所述蓝色EL层9上,所述阴极层81包括负介电常数金属和银,所述负介电常数金属和银的厚度比为5nm:5nm,或者5nm:10nm。Further, the cathode layer 81 is evaporated on the blue EL layer 9, and the cathode layer 81 includes a negative dielectric constant metal and silver, and the thickness ratio of the negative dielectric constant metal and silver is 5nm:5nm , or 5nm:10nm.

本实施例中的阴极层采用蒸镀的方式进行设置,采用两种金属进行蒸镀,两种金属共蒸形成阴极层,通过控制各类金属的蒸镀速度进行各金属蒸镀厚度的控制;本实施例中优选的采用金属钙和金属银进行阴极层的制备,如图3所示为阴极层不同材料下光角度和反射率关系图,横坐标为不同角度的光,纵坐标为该材料的反射率,图中示出了六种不同厚度的金属钙和金属银复合进行阴极层制备,各材料不同光角度下的反射率,本申请中需要提供一种小角度下不反射,大角度下反射的配比,因此,优选的采用厚度比为5nm:5nm,或者5nm:10nm进行阴极层的制备。The cathode layer in this embodiment is set by means of evaporation, and two metals are used for evaporation, and the two metals are co-evaporated to form a cathode layer, and the evaporation thickness of each metal is controlled by controlling the evaporation speed of various metals; In this embodiment, metal calcium and metal silver are preferably used to prepare the cathode layer. As shown in FIG. 3, the relationship between light angle and reflectivity under different materials of the cathode layer is shown. The abscissa is the light at different angles, and the ordinate is the material. The reflectivity of six different thicknesses of metal calcium and metal silver is shown in the figure to prepare the cathode layer. The reflectivity of each material under different light angles needs to be provided in this application. Therefore, it is preferable to use a thickness ratio of 5nm:5nm, or 5nm:10nm to prepare the cathode layer.

进一步的,所述负介电常数金属为钙或者镁或者锂或者钠。本实施例中采用负的介电常数的金属进行阴极层的制备,可以但不限于为钙或者镁或者锂或者钠。Further, the negative dielectric constant metal is calcium or magnesium or lithium or sodium. In this embodiment, a metal with a negative dielectric constant is used to prepare the cathode layer, which may be, but not limited to, calcium, magnesium, lithium or sodium.

本实施例中的QD显示结构包括有相对设置的第一基板1和第二基板11,第二基板11上设置阳极层10,阳极层10上制备蓝色EL层9,随后在蓝色EL层9上采用蒸镀的方式进行阴极层81的制备,该阴极层81为负介电常数的特性,同时第一基板1上制备彩膜层2,该彩膜层2包括阵列分布的蓝色子像素22、红色子像素21和绿色子像素23,在彩膜层2上制备量子点层3,该量子点层3可以采用光刻或者打印的方式进行制备,所述量子点层3包括绿色量子点32和红色量子点31,所述绿色量子点32与所述绿色子像素23对应设置,所述红色量子点31与所述红色子像素21对应设置,相邻所述蓝色子像素22、红色子像素21和绿色子像素23之间设有遮光层;The QD display structure in this embodiment includes a first substrate 1 and a second substrate 11 that are opposite to each other, an anode layer 10 is provided on the second substrate 11, a blue EL layer 9 is prepared on the anode layer 10, and then a blue EL layer is formed on the blue EL layer. 9, the cathode layer 81 is prepared by vapor deposition. The cathode layer 81 is characterized by a negative dielectric constant. At the same time, a color filter layer 2 is prepared on the first substrate 1. Pixel 22, red sub-pixel 21 and green sub-pixel 23, a quantum dot layer 3 is prepared on the color filter layer 2, the quantum dot layer 3 can be prepared by photolithography or printing, and the quantum dot layer 3 includes green quantum dots. dots 32 and red quantum dots 31, the green quantum dots 32 are arranged corresponding to the green sub-pixels 23, the red quantum dots 31 are arranged corresponding to the red sub-pixels 21, adjacent to the blue sub-pixels 22, A light shielding layer is provided between the red sub-pixel 21 and the green sub-pixel 23;

量子点3层靠近所述第二基板11的一侧设有屏障层4,该屏障层4覆盖遮光结构和量子点层3。A barrier layer 4 is provided on the side of the quantum dot layer 3 close to the second substrate 11 , and the barrier layer 4 covers the light-shielding structure and the quantum dot layer 3 .

请参考图2,本实施例提供一种QD显示结构,包括相对设置的第一基板1和第二基板11,所述第一基板1靠近所述第二基板11的一侧设有彩膜层2,所述彩膜层2靠近所述第二基板11的一侧形成有量子点层3;Referring to FIG. 2 , the present embodiment provides a QD display structure, including a first substrate 1 and a second substrate 11 disposed opposite to each other, and a color filter layer is provided on the side of the first substrate 1 close to the second substrate 11 2. A quantum dot layer 3 is formed on the side of the color filter layer 2 close to the second substrate 11;

所述第二基板11靠近所述第一基板1的一侧设有蓝色EL层9,所述蓝色EL层9上设有阴极层82,所述阴极层82上还设有TFE膜层7,所述TFE膜层7上设有多个微结构6,每个所述微结构6上生长有复合材料5,所述复合材料5沿所述微结构6生长;所述复合材料5为负介电常数性能。A blue EL layer 9 is disposed on the side of the second substrate 11 close to the first substrate 1 , a cathode layer 82 is disposed on the blue EL layer 9 , and a TFE film layer is disposed on the cathode layer 82 7. A plurality of microstructures 6 are arranged on the TFE film layer 7, and a composite material 5 is grown on each of the microstructures 6, and the composite material 5 grows along the microstructure 6; the composite material 5 is Negative dielectric constant performance.

本实施例中提供的QD显示结构在阴极层上设置TFE(四氟乙烯树脂)膜层,随后在TFE膜层上设置微结构,微结构上生长复合材料,该复合材料为负介电常数性能的材料,通过该复合材料将大于30°角的光大量反射,小于30°角的光透过,当蓝色EL层发出的蓝光经过量子点层是,被量子点层的量子点散射,量子点层上半球的红绿光可以透过彩膜层发射出去,下半球的红绿光可以被阴极层部分反射,再经过量子点层和彩膜层发射出去,同时,被量子点层散射的蓝光可以二次经过量子点层,进行二次吸收和转换,最后发射出去,这样能够提高该QD显示结构的转换效率。In the QD display structure provided in this embodiment, a TFE (tetrafluoroethylene resin) film layer is arranged on the cathode layer, and then a microstructure is arranged on the TFE film layer, and a composite material is grown on the microstructure, and the composite material has a negative dielectric constant property. Through the composite material, a large amount of light with an angle greater than 30° is reflected, and light with an angle less than 30° is transmitted. When the blue light emitted by the blue EL layer passes through the quantum dot layer, it is scattered by the quantum dots of the quantum dot layer, and the quantum The red and green light in the upper hemisphere of the dot layer can be emitted through the color filter layer, and the red and green light in the lower hemisphere can be partially reflected by the cathode layer, and then emitted through the quantum dot layer and the color filter layer. The blue light can pass through the quantum dot layer twice, undergo secondary absorption and conversion, and finally be emitted, which can improve the conversion efficiency of the QD display structure.

进一步的,每个所述微结构6包括多个凹槽,所述彩膜层2包括阵列分布的蓝色子像素22、红色子像素21和绿色子像素23,每个所述绿色子像素23和所述红色子像素21均对应设有一个所述微结构6。Further, each of the microstructures 6 includes a plurality of grooves, the color filter layer 2 includes blue sub-pixels 22 , red sub-pixels 21 and green sub-pixels 23 distributed in an array, and each of the green sub-pixels 23 Each of the red sub-pixels 21 is provided with one of the microstructures 6 .

本实施例提供的微结构设置多个凹槽,通过凹槽结构对被量子点层散射的下半球的红绿光进行二次出射,其中主要是将红色光和绿色光进行二次出射,因此,只需要在每个绿色子像素和红色子像素对应的位置设置微结构即可,相应的在微结构上生长复合材料;该微结构的大小设置的与每个绿色量子点结构或者红色量子点结构大小相同即可,即能实现对红绿光的二次出射,同时该微结构设置的凸起和凹槽个数可以不进行限制,当凹槽个数设置的越多,对红绿光二次出射的效果越好,图2中示出的微结构上设有三个凹槽,凹槽越多,效果越好,但是工艺难度也会相应的增加,可以根据实际情况进行制备。The microstructure provided in this embodiment is provided with a plurality of grooves, and the red and green light in the lower hemisphere scattered by the quantum dot layer is re-emitted through the groove structure. , it is only necessary to set a microstructure at the corresponding position of each green sub-pixel and red sub-pixel, and the composite material is grown on the microstructure accordingly; the size of the microstructure is set to the same as that of each green quantum dot structure or red quantum dot. The size of the structure is the same, that is, the secondary emission of red and green light can be realized. At the same time, the number of protrusions and grooves set by the microstructure can be unlimited. The better the effect of the secondary shot is, the microstructure shown in Figure 2 is provided with three grooves. The more grooves, the better the effect, but the difficulty of the process will increase accordingly, which can be prepared according to the actual situation.

进一步的,所述复合材料5为石墨烯和酚醛树脂复合材料,所述石墨烯和酚醛树脂的质量比为(0.25~0.5):1。Further, the composite material 5 is a graphene and phenolic resin composite material, and the mass ratio of the graphene and the phenolic resin is (0.25-0.5):1.

本实施例中采用石墨烯和酚醛树脂复合材料在微结构上进行生长,此时复合材料具有负的介电常数特性,具有照射在该复合材料上的光大角度反射,小角度穿过的特性,其中优选的该石墨烯和酚醛树脂的质量比为0.33:1。In this embodiment, graphene and phenolic resin composite materials are used to grow on the microstructure. At this time, the composite material has negative dielectric constant characteristics, and the light irradiated on the composite material has the characteristics of large-angle reflection and small-angle passing through. Wherein the preferred mass ratio of this graphene and phenolic resin is 0.33:1.

进一步的,所述复合材料5蒸镀或者溅射在所述微结构6上。本实施例中在微结构上进行复合材料的生长,具体可以通过蒸镀或者溅射的方法进行制备。Further, the composite material 5 is evaporated or sputtered on the microstructure 6 . In this embodiment, the growth of the composite material is performed on the microstructure, which can be specifically prepared by evaporation or sputtering.

进一步的,所述微结构6通过光刻或者纳米压印或者转印的方式设置在所述TFE膜层7上。Further, the microstructure 6 is disposed on the TFE film layer 7 by means of photolithography, nanoimprinting or transfer printing.

本实施例中在TFE膜层上设置微结构,通过该TFE膜层对EL层的材料进行保护,随后在TFE膜层上进行微结构的制备,具体的可以采用光刻或者纳米压印的方式进行,不会对TFE膜层的表面造成损伤,或者还可以先进行包括微结构的薄膜,再通过转印的方式转移到TFE膜层上,或者直接将设置了微结构的薄膜贴附在TFE膜层上,具体的工艺可根据实际情况进行选择。In this embodiment, a microstructure is arranged on the TFE film layer, the material of the EL layer is protected by the TFE film layer, and then the microstructure is prepared on the TFE film layer, specifically, photolithography or nano-imprinting can be used. It will not cause damage to the surface of the TFE film layer, or the film including the microstructure can be carried out first, and then transferred to the TFE film layer by transfer, or the film with the microstructure can be directly attached to the TFE. On the film layer, the specific process can be selected according to the actual situation.

本实施例中的QD显示结构包括有相对设置的第一基板1和第二基板11,第二基板11上设置阳极层10,阳极层10上制备蓝色EL层9,随后在蓝色EL层9上采用蒸镀的方式进行阴极层82的制备,该阴极层82可以为常规的阴极层,例如镁银材料进行阴极层的制备;随后在阴极层82上制备TFE膜层7,在TFE膜层7制备后制作一层微结构6,该微结构6与红色子像素21和绿色子像素23进行一一对应设置,在微结构6上蒸镀或者溅射上述复合材料5;The QD display structure in this embodiment includes a first substrate 1 and a second substrate 11 that are opposite to each other, an anode layer 10 is provided on the second substrate 11, a blue EL layer 9 is prepared on the anode layer 10, and then a blue EL layer is formed on the blue EL layer. 9, the cathode layer 82 is prepared by evaporation, and the cathode layer 82 can be a conventional cathode layer, such as magnesium-silver material to prepare the cathode layer; then the TFE film layer 7 is prepared on the cathode layer 82, and the TFE film is After the layer 7 is prepared, a layer of microstructure 6 is made, and the microstructure 6 is arranged in a one-to-one correspondence with the red sub-pixel 21 and the green sub-pixel 23, and the above-mentioned composite material 5 is evaporated or sputtered on the microstructure 6;

同时在第一基板1上制备彩膜层2,该彩膜层2包括阵列分布的蓝色子像素22、红色子像素21和绿色子像素23,在彩膜层2上制备量子点层3,该量子点层3可以采用光刻或者打印的方式进行制备,所述量子点层3包括绿色量子点32和红色量子点31,所述绿色量子点32与所述绿色子像素23对应设置,所述红色量子点31与所述红色子像素21对应设置,相邻所述蓝色子像素22、红色子像素21和绿色子像素23之间设有遮光层;当蓝光经过红色量子点和绿色量子点时,被红绿量子点散射,上半球的红绿光可以透过彩膜层发射出去,下半球的红绿光可以被部分反射再次经过红绿量子点后穿过彩膜层发射出去,当被红绿量子点散射的蓝光被反射后可以二次经过该量子点层,被二次吸收再转换,最后发射出去,提高转换效率。At the same time, a color filter layer 2 is prepared on the first substrate 1, the color filter layer 2 includes blue sub-pixels 22, red sub-pixels 21 and green sub-pixels 23 distributed in an array, and a quantum dot layer 3 is prepared on the color filter layer 2, The quantum dot layer 3 can be prepared by photolithography or printing. The quantum dot layer 3 includes green quantum dots 32 and red quantum dots 31. The green quantum dots 32 are arranged corresponding to the green sub-pixels 23, so The red quantum dots 31 are arranged corresponding to the red sub-pixels 21, and a light shielding layer is arranged between the adjacent blue sub-pixels 22, red sub-pixels 21 and green sub-pixels 23; When the light is on, it is scattered by the red and green quantum dots, the red and green light in the upper hemisphere can be emitted through the color filter layer, and the red and green light in the lower hemisphere can be partially reflected and then pass through the red and green quantum dots and then be emitted through the color filter layer. When the blue light scattered by the red and green quantum dots is reflected, it can pass through the quantum dot layer twice, be absorbed and converted twice, and finally emitted to improve the conversion efficiency.

量子点层3靠近所述第二基板11的一侧设有屏障层4,该屏障层4覆盖遮光结构和量子点层3。A barrier layer 4 is provided on the side of the quantum dot layer 3 close to the second substrate 11 , and the barrier layer 4 covers the light-shielding structure and the quantum dot layer 3 .

本实施例还提供一种显示装置,包括上述的QD显示结构。This embodiment also provides a display device including the above-mentioned QD display structure.

以上描述仅为本申请的较佳实施例以及对所运用技术原理的说明。本领域技术人员应当理解,本申请中所涉及的发明范围,并不限于上述技术特征的特定组合而成的技术方案,同时也应涵盖在不脱离所述发明构思的情况下,由上述技术特征或其等同特征进行任意组合而形成的其它技术方案。例如上述特征与本申请中公开的(但不限于)具有类似功能的技术特征进行互相替换而形成的技术方案。The above description is only a preferred embodiment of the present application and an illustration of the applied technical principles. Those skilled in the art should understand that the scope of the invention involved in this application is not limited to the technical solution formed by the specific combination of the above-mentioned technical features, and should also cover the above-mentioned technical features without departing from the inventive concept. Other technical solutions formed by any combination of its equivalent features. For example, a technical solution is formed by replacing the above-mentioned features with the technical features disclosed in this application (but not limited to) with similar functions.

Claims (6)

1.一种量子点显示结构,其特征在于,包括相对设置的第一基板和第二基板,所述第一基板靠近所述第二基板的一侧设有彩膜层,所述彩膜层靠近所述第二基板的一侧形成有量子点层;1. A quantum dot display structure, characterized in that it comprises a first substrate and a second substrate that are oppositely arranged, a side of the first substrate close to the second substrate is provided with a color filter layer, and the color filter layer is A quantum dot layer is formed on one side close to the second substrate; 所述第二基板靠近所述第一基板的一侧设有蓝色EL层,所述蓝色EL层上设有阴极层,所述阴极层上还设有TFE膜层,所述TFE膜层上设有多个微结构,每个所述微结构上生长有复合材料,所述复合材料沿所述微结构生长;所述复合材料为负介电常数性能;A blue EL layer is arranged on the side of the second substrate close to the first substrate, a cathode layer is arranged on the blue EL layer, a TFE film layer is also arranged on the cathode layer, and the TFE film layer is arranged on the blue EL layer. A plurality of microstructures are arranged thereon, and a composite material is grown on each of the microstructures, and the composite material grows along the microstructure; the composite material has negative dielectric constant performance; 每个所述微结构包括多个凹槽,所述彩膜层包括阵列分布的蓝色子像素、红色子像素和绿色子像素,每个所述绿色子像素和所述红色子像素均对应设有一个所述微结构。Each of the microstructures includes a plurality of grooves, the color filter layer includes blue sub-pixels, red sub-pixels and green sub-pixels distributed in an array, and each of the green sub-pixels and the red sub-pixels is correspondingly arranged There is one such microstructure. 2.根据权利要求1所述的量子点显示结构,其特征在于,所述复合材料为石墨烯和酚醛树脂复合材料,所述石墨烯和酚醛树脂的质量比为(0.25~0.5):1。2 . The quantum dot display structure according to claim 1 , wherein the composite material is a graphene and phenolic resin composite material, and the mass ratio of the graphene to the phenolic resin is (0.25-0.5):1. 3 . 3.根据权利要求1所述的量子点显示结构,其特征在于,所述复合材料蒸镀或者溅射在所述微结构上。3 . The quantum dot display structure according to claim 1 , wherein the composite material is evaporated or sputtered on the microstructure. 4 . 4.根据权利要求1所述的量子点显示结构,其特征在于,所述微结构通过光刻或者纳米压印或者转印的方式设置在所述TFE膜层上。4 . The quantum dot display structure according to claim 1 , wherein the microstructure is arranged on the TFE film layer by means of photolithography, nanoimprinting or transfer printing. 5 . 5.一种显示装置,其特征在于,包括权利要求1-4任一所述的量子点显示结构,5. A display device, characterized in that, comprising the quantum dot display structure according to any one of claims 1-4, 所述彩膜层包括阵列分布的蓝色子像素、红色子像素和绿色子像素,所述量子点层包括绿色量子点和红色量子点,所述绿色量子点与所述绿色子像素对应设置,所述红色量子点与所述红色子像素对应设置,相邻所述蓝色子像素、红色子像素和绿色子像素之间设有遮光层。The color filter layer includes blue sub-pixels, red sub-pixels and green sub-pixels distributed in an array, the quantum dot layer includes green quantum dots and red quantum dots, and the green quantum dots are arranged corresponding to the green sub-pixels, The red quantum dots are arranged corresponding to the red sub-pixels, and a light shielding layer is provided between the adjacent blue sub-pixels, red sub-pixels and green sub-pixels. 6.根据权利要求5所述的显示装置,其特征在于,所述量子点层靠近所述第二基板的一侧设有屏障层,所述第二基板与所述蓝色EL层之间还设有阳极层。6 . The display device according to claim 5 , wherein a barrier layer is provided on a side of the quantum dot layer close to the second substrate, and a barrier layer is provided between the second substrate and the blue EL layer. 7 . An anode layer is provided.
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