CN111505896A - Mask plate, display substrate, preparation method of display substrate and display device - Google Patents

Abstract

The invention provides a mask for exposing a photosensitive material layer, the photosensitive material layer includes a to-be-removed area, a to-be-retained area, and a slope formed between the to-be-removed area and the to-be-reserved area The mask plate includes a light-transmitting area corresponding to the to-be-removed area and a light-shielding area located outside the light-transmitting area, wherein a light-shielding layer is provided in the light-shielding area, and a light-shielding layer is provided on the light-shielding layer. There is a light diffraction pattern corresponding to the slope forming area, and the light diffraction pattern is used to diffract light during exposure, so that the photosensitive material layer forms a slope angle in the slope forming area after exposure and development are completed Slopes less than or equal to 30°. The present invention also provides a display substrate, a preparation method thereof, and a display device. The invention can make the slope angle of the slope surface more gentle, which is beneficial to improve the product yield.

Description

Mask plate, display substrate and preparation method thereof, and display device

technical field

The invention relates to the field of display technology, in particular to a mask plate, a display substrate, a preparation method thereof, and a display device.

Background technique

In the field of Organic Light-Emitting Diode (OLED) displays, for some film layers, the smaller the slope angle of the side surface is, the better the yield of products is improved. For example, when the pixel definition layer is used for evaporation The smaller the slope angle of the side surface of the pixel opening coated with the organic light-emitting material, the more favorable it is for the uniform deposition of the organic light-emitting material, thereby improving the uniformity of the light-emitting layer formed in the pixel opening.

At present, the slope angle of the side can be reduced by adjusting the process parameters, however, the slope angle of the side can only be reduced to 40°. If you want to further reduce the slope angle of the side, only by adjusting the process parameters is difficult to achieve. Therefore, a more effective method is urgently needed to further reduce the slope angle of the side.

SUMMARY OF THE INVENTION

The present invention aims to solve at least one of the technical problems existing in the prior art, and provides a mask plate, a display substrate, a preparation method thereof, and a display device.

In order to achieve the above object, the present invention provides a mask for exposing a photosensitive material layer, the photosensitive material layer includes a to-be-removed area, a to-be-retained area, and a mask connected to the to-be-removed area and the to-be-reserved area A slope forming area between the mask plate includes a light-transmitting area corresponding to the to-be-removed area and a light-shielding area located outside the light-transmitting area, wherein,

A light-shielding layer is arranged in the light-shielding area, and a light-diffraction pattern corresponding to the slope forming area is arranged on the light-shielding layer, and the light-diffraction pattern is used for diffracting light during exposure, so as to make the photosensitive material layer After exposure and development are completed, a slope surface with a slope angle of less than or equal to 30° is formed in the slope forming region.

Optionally, the light-transmitting regions are in one-to-one correspondence with the pixel units of the display substrate, the light diffraction pattern includes at least one slit, and the slit is a ring-shaped structure surrounding the light-transmitting region.

Optionally, the width of the slit is not greater than the width of the interval between the slit and the light-transmitting area.

Optionally, the width of the interval between the slit and the light-transmitting region is between 0.6 μm and 1.8 μm, and the width of the slit is between 0.6 μm and 1.8 μm.

Optionally, the light-transmitting regions correspond to the pixel units of the display substrate one-to-one, the light diffraction pattern includes a plurality of spaced light-transmitting patterns, and a plurality of the light-transmitting patterns are arranged around the light-transmitting region, and correspond to the light-transmitting regions. The light-transmitting area has no space.

Optionally, the light-transmitting pattern is rectangular or triangular.

Optionally, the mask plate further includes a transparent substrate, and the light shielding layer is disposed on the transparent substrate.

The present invention also provides a method for preparing a display substrate, comprising:

forming a photosensitive material layer on the substrate, the photosensitive material layer comprising a region to be removed, a region to be retained, and a slope forming region connected between the region to be removed and the region to be retained;

The photosensitive material layer is patterned by using the above-mentioned mask, so that the part of the photosensitive material layer corresponding to the to-be-removed area is removed, the part corresponding to the to-be-retained area is retained, and the part corresponding to the slope The portion forming the area forms a slope surface, the slope angle of which is less than or equal to 30°.

The present invention also provides a display substrate, comprising a substrate and a photosensitive pattern layer disposed on the substrate, the photosensitive pattern layer having a bottom surface facing the substrate, a top surface away from the substrate, and The side surface connected between the top surface and the bottom surface is a slope surface, and the slope angle of the slope surface is less than or equal to 30°.

Optionally, the slope angle of the slope surface is less than 20°.

The present invention also provides a display device comprising the above-mentioned display substrate.

Description of drawings

The accompanying drawings are used to provide a further understanding of the present invention, and constitute a part of the specification, and together with the following specific embodiments, are used to explain the present invention, but do not constitute a limitation to the present invention. In the attached image:

FIG. 1 is one of the structural schematic diagrams of a mask plate provided by an embodiment of the present invention;

FIG. 2 is a second schematic structural diagram of a mask plate provided by an embodiment of the present invention;

3a is one of the schematic structural diagrams of the diffraction pattern provided by the embodiment of the present invention;

3b is a second schematic structural diagram of a diffraction pattern provided by an embodiment of the present invention;

3c is a third schematic structural diagram of a diffraction pattern provided by an embodiment of the present invention;

3d is a fourth schematic structural diagram of a diffraction pattern provided by an embodiment of the present invention;

Fig. 4 is the longitudinal sectional view along section line CC' of Fig. 3a;

5a is one of the topographical schematic diagrams of pixel openings formed by slits of different widths according to an embodiment of the present invention;

5b is the second schematic diagram of the topography of pixel openings formed by slits of different widths according to an embodiment of the present invention;

6 is a flowchart of a preparation method provided in an embodiment of the present invention;

FIG. 7 is a schematic structural diagram of a display substrate provided by an embodiment of the present invention.

Detailed ways

The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present invention, but not to limit the present invention.

Unless otherwise defined, the technical or scientific terms used in the embodiments of the present invention shall have the usual meanings understood by those with ordinary skill in the art to which the present invention belongs. The terms "first," "second," and similar terms used herein do not denote any order, quantity, or importance, but are merely used to distinguish different components. Likewise, words like "comprising" or "comprising" mean that the elements or things appearing before the word encompass the elements or things recited after the word and their equivalents, but do not exclude other elements or things. Words like "connected" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "Down", "Left", "Right", etc. are only used to represent the relative positional relationship, and when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

Embodiments of the present invention provide a mask for exposing a photosensitive material layer, where the photosensitive material layer includes a to-be-removed area, a to-be-reserved area, and a slope forming area connected between the to-be-removed area and the to-be-reserved area. FIG. 1 is a schematic structural diagram of a mask provided by an embodiment of the present invention. As shown in FIG. 1 , the mask includes a light-transmitting area A corresponding to the area to be removed and a light-shielding area located outside the light-transmitting area A B, a light-shielding layer 1 is arranged in the light-shielding area B, and a light-diffraction pattern 2 corresponding to the slope-forming area is arranged on the light-shielding layer 1. The light-diffraction pattern 2 is used to diffract light during exposure, so that the photosensitive material layer is exposed to After and development, a slope surface with a slope angle of less than or equal to 30° is formed in the slope forming area.

In this embodiment of the present invention, the material of the photosensitive material layer may include a positive photoresist material. During exposure, the light-transmitting area A may be located above the to-be-removed area of the photosensitive material layer, and the light-shielding area B may be located above the photosensitive material layer. Above the area to be reserved, the light diffraction pattern 2 is located above the slope forming area of the photosensitive material layer. Since the light-shielding layer 1 is arranged in the light-shielding area B, the light-shielding layer 1 shields the light, so the light can only be emitted through the light-transmitting area A and the light diffraction pattern 2, wherein the light diffraction pattern 2 diffracts the incident light and makes the incident light diffract. The diffracted light irradiates the slope forming region of the photosensitive material layer, so that the photosensitive material layer in the slope forming region receives a small amount of light, thereby causing partial denaturation. In this embodiment of the present invention, the size and position of the light diffraction pattern 2 may be preset according to actual needs (for example, when the light diffraction pattern 2 is a slit, the size of the light diffraction pattern 2 may refer to the width of the slit), so that After the photosensitive material layer is subjected to a patterning process such as exposure and development, a slope surface with a slope angle of less than or equal to 30° is formed in the slope forming region.

After the photosensitive material layer is patterned using the mask provided in the embodiment of the present invention, a slope surface with a slope angle less than or equal to 30° can be formed in the slope formation region of the photosensitive material layer, and the slope surface is conducive to improving the yield of products For example, using the slope surface as the side of the pixel opening can improve the uniformity of the deposition of the luminescent material, or a gentler slope surface can effectively improve the problems such as film breakage or stamping caused by the step difference.

In some specific embodiments, a mask can be used to expose the pixel-defining material layer to form a pixel-defining layer having a plurality of pixel openings. The following takes the mask for exposing the pixel-defining layer as an example, The mask provided by the embodiment of the present invention is introduced in detail. Specifically, FIG. 2 is the second schematic diagram of the structure of the mask provided by the embodiment of the present invention, and FIG. 3a is the one of the schematic structural diagrams of the diffraction pattern provided by the embodiment of the present invention. 4 is a longitudinal cross-sectional view of FIG. 3a along the section line CC', combined with FIG. 2, FIG. 3a and FIG. The light-transmitting area A corresponds to the pixel units of the display substrate one-to-one, the light-shielding area B separates a plurality of light-transmitting areas A from each other, and the light diffraction pattern 2 includes at least one slit 21, and the slit 21 surrounds the corresponding light-transmitting area A. the ring structure.

In the embodiment of the present invention, the slit 21 may be located above the position of the side surface of the pixel defining material layer for forming the pixel opening. The slit 21 diffracts the incident light, and makes the diffracted light irradiate to a position on the pixel defining material layer corresponding to the side surface of the pixel opening. After exposure, the pixel defining material layer is developed to obtain a pixel defining layer having a plurality of pixel openings. In the embodiment of the present invention, the slit 21 is a continuous annular structure, so that the slope angles of the sides of the pixel opening in all directions can be reduced, and the uniformity of the deposition of the luminescent material can be further improved. As shown in FIG. 4 , in some specific embodiments, the mask plate further includes a transparent substrate 3 , and the light shielding layer 1 is disposed on the transparent substrate 3 . The material of the transparent substrate 3 includes quartz glass, and the material of the light shielding layer 1 includes chrome. In the embodiment of the present invention, a chromium material layer can be formed on the transparent substrate 3 by sputtering, and then the chromium material layer is etched to form an opening at a position of the chromium material layer corresponding to the light-transmitting area A, And the slits 21 are formed on the periphery of the light-transmitting area A, so as to obtain the light-shielding layer 1 . The mask plate prepared by the above method is simple in process, which is beneficial to saving production cost.

In some specific embodiments, the width of the slit 21 is not greater than the width of the interval between the slit 21 and the light-transmitting area A. Specifically, as shown in FIG. 4 , in the embodiment of the present invention, the interval width a is the distance between the inner side of the slit 21 and the outer side of the light-transmitting area A, and the width b of the slit 21 is the slit The distance between the inner side of 21 and the outer side of slit 21 . FIG. 5a is one of the topographical schematic diagrams of pixel openings formed by slits of different widths according to an embodiment of the present invention. As shown in FIG. 5a, the pixel defining layer 42 is formed on the substrate 41, and the slope angle is the side surface of the pixel opening. The included angle with the substrate 41, the interval width a between the slit 21 and the light-transmitting area A is 1.3 μm, and along the direction from left to right in FIG. 5a, the width b of the slit 21 is 1.0 μm, 1.5μm, 2.0μm, 2.5μm and 3.0μm, the slope angle of the left side of the pixel opening is 24.4°, 21.0°, 25.8°, 32.7° and 34.1°, and the slope angle of the right side of the pixel opening is 28.6° °, 14.5°, 14.7°, 33.7° and 33.7°. As the width b of the slit 21 increases, the diffraction phenomenon gradually weakens. When the width b of the slit 21 is greater than the width a of the interval between the slit 21 and the light-transmitting area A, it can be clearly seen that there is residual in the pixel opening. The pixel-defining material of the luminescent material in turn affects the evaporation of the luminescent material in the pixel opening. In the embodiment of the present invention, by making the width b of the slit 21 not greater than the interval width a between the slit 21 and the light-transmitting area A, the above problems can be improved.

In some specific embodiments, by adjusting the width b of the slit 21 and the interval width a between the slit 21 and the light-transmitting area A, the slope angle of the side surface of the pixel opening can also be reduced to less than 20°, Therefore, the pixel opening is more conducive to the uniform evaporation of the light-emitting material, and the thickness uniformity of the light-emitting layer in the pixel opening is further improved.

In some specific embodiments, the interval width a between the slit 21 and the light-transmitting area A is between 0.6 μm and 1.8 μm, and the width b of the slit 21 is between 0.6 μm and 1.8 μm. FIG. 5b is the second schematic diagram of the topography of pixel openings formed by slits of different widths according to an embodiment of the present invention. As shown in FIG. 5b, the pixel defining layer 42 is formed on the substrate 41, and the slope angle is the side surface of the pixel opening. The included angle with the substrate 41, the interval width a is 2.2 μm, and along the direction from left to right in FIG. 5b, the width b of the slit 21 is 1.0 μm, 1.5 μm, 2.0 μm, 2.5 μm and 3.0 μm in sequence , the slope angles of the left side of the pixel opening are 32.0°, 36.2°, 39.6°, 38.7° and 41.3°, and the slope angles of the right side of the pixel opening are 36.3°, 35.3°, 39.8°, 39.6° and 39.2°. Compared with the topography of the leftmost pixel opening in FIG. 5a, the gap width a between the slit 21 and the light transmission area A of the topography of the leftmost pixel opening in FIG. 5b is larger, and the side of the pixel opening is larger. Roughness appears on the surface, and as the width b of the slit 21 gradually increases, more residual pixel-defining material appears in the pixel opening than in FIG. 5a. Therefore, in the embodiment of the present invention, by setting the interval width a between the slit 21 and the light-transmitting area A to be between 0.6 μm and 1.8 μm, and the width b of the slit 21 to be between 0.6 μm and 1.8 μm, it is possible to The surface of the side surface of the pixel opening is prevented from being undulating, and at the same time, residual pixel-defining material is avoided in the pixel opening, and the thickness uniformity of the light-emitting layer in the pixel opening is improved.

FIG. 3b is the second schematic structural diagram of the diffraction pattern provided by the embodiment of the present invention. As shown in FIG. 3b, in some specific embodiments, the light diffraction pattern 2 includes a plurality of slits 21, and the width b of the plurality of slits 21 is equal to The same, and the distances between the plurality of slits 21 are also the same, which are equal to the interval width a between the slit 21 closest to the light-transmitting area A and the light-transmitting area A. In the embodiment of the present invention, by arranging a plurality of slits 21, the slope angle of the side surface of the pixel opening can be further reduced.

FIG. 3c is a third schematic structural diagram of a diffraction pattern provided by an embodiment of the present invention, and FIG. 3d is a fourth schematic structural diagram of a diffraction pattern provided by an embodiment of the present invention. As shown in FIG. 3c and FIG. 3d, in some specific embodiments, The light-transmitting areas A correspond one-to-one with the pixel units of the display substrate. The light diffraction pattern 2 includes a plurality of spaced light-transmitting patterns 22 . Thus, a structure with jagged edges is formed. As shown in FIG. 3c, the light-transmitting pattern 22 may be rectangular, and as shown in FIG. 3d, the light-transmitting pattern 22 may be triangular. It can be understood that, in the embodiment of the present invention, the light-transmitting pattern 22 can also be in other shapes, as long as it can diffract the incident light, and make the diffracted light irradiate on the slope forming area, so that the slope forming area can be formed in the slope forming area. A slope surface with a slope angle less than or equal to 30° is sufficient.

It should be noted that the above content is only explained by taking the mask used for preparing the pixel definition layer as an example. For preparing other film layers, for example, the mask of the embodiment of the present invention can be used to prepare structures such as dams around the AA area, and even to prepare the photoresist required for the etching process of the inorganic layer. The small slope angle of the slope surface of the photoresist is beneficial to slow down the slope angle of the slope surface of the prepared inorganic layer in the subsequent etching process. Taking the mask plate according to the embodiment of the present invention for preparing a dam surrounding the AA area as an example, the dam has a top surface facing away from the substrate, a bottom surface facing the substrate, and a side surface connected between the top surface and the bottom surface, and the top surface of the dam has The area where it is located is the area to be reserved, the area where the side of the dam is located is the area where the slope is formed, and the other areas are the area to be removed.

An embodiment of the present invention also provides a method for preparing a display substrate. FIG. 6 is a flowchart of the preparation method provided by an embodiment of the present invention. As shown in FIG. 6 , the preparation method includes the following steps:

S1, forming a photosensitive material layer on the substrate; the photosensitive material layer includes a to-be-removed area, a to-be-retained area, and a slope forming area connected between the to-be-removed area and the to-be-reserved area;

S2, using a mask to perform a patterning process on the photosensitive material layer, so that the part of the photosensitive material layer corresponding to the area to be removed is removed, the part corresponding to the area to be reserved is retained, and the part corresponding to the slope forming area forms a slope surface, The slope angle of the slope surface is less than or equal to 30°;

Wherein, the mask is the above-mentioned mask.

In this embodiment of the present invention, the material of the photosensitive material layer may include a positive photoresist material. During exposure, the light-transmitting area of the mask may be located above the to-be-removed area of the photosensitive material layer, and the light-shielding area may be located on the photosensitive material. Above the to-be-retained area of the layer, the light diffraction pattern is located above the slope-forming area of the photosensitive material layer. Since a light-shielding layer is provided in the light-shielding area of the mask, the light-shielding layer shields the light, so the light can only be emitted through the light-transmitting area and the light diffraction pattern. The light is irradiated to the slope forming region of the photosensitive material layer. In this embodiment of the present invention, the size and position of the light diffraction pattern may be preset according to actual needs (for example, when the light diffraction pattern is a slit, the size of the light diffraction pattern may refer to the width of the slit) to make the photosensitive material layer After a patterning process such as exposure and development, a slope surface with a slope angle less than or equal to 30° is formed in the slope forming region.

Using the preparation method provided by the embodiment of the present invention, a slope surface with a slope angle of less than or equal to 30° can be formed in the slope formation region of the photosensitive material layer, and the slope surface is beneficial to improve the yield of the product. For example, when the side surface of the pixel opening is When the slope angle is less than or equal to 30°, the uniformity of the deposition of the luminescent material can be improved; of course, the sides of other film layers can also be set as the slope surface with the slope angle less than or equal to 30°, thereby effectively improving the film layer difference. This leads to problems such as cracking or stamping of the upper film layer.

An embodiment of the present invention further provides a display substrate, which can be prepared by the above-mentioned preparation method. The display substrate is especially suitable for an organic electroluminescence (Organic Light-Emitting Diode, OLED) display substrate. FIG. 7 shows the present invention. A schematic structural diagram of a display substrate provided by an embodiment, as shown in FIG. 7 , the display substrate includes: a substrate 51 and a photosensitive pattern layer 52 disposed on the substrate 51. The photosensitive pattern layer 52 has a bottom surface facing the substrate 51 and a The top surface of the substrate 51 and the side surfaces connected between the top surface and the bottom surface are slope surfaces 53, and the slope angle of the slope surfaces 53 is less than or equal to 30°.

Specifically, the display substrate can be divided into a plurality of pixel units, and the display substrate further includes a light-emitting unit and a pixel driving circuit arranged in each pixel unit, and an insulating layer (for example, a thin film transistor) arranged between the conductive film layers The gate insulating layer between the gate of the thin film transistor and the active layer, the planarization layer between the drain of the thin film transistor and the anode of the light-emitting unit), etc. The pixel driving circuit includes a plurality of thin film transistors. The light-emitting unit may be a bottom-emitting structure or a top-emitting structure. Wherein, the pixel driving circuit is located between the pixel defining layer and the substrate, the light emitting unit includes an anode and a cathode disposed oppositely, and a light emitting layer located between the anode and the cathode, and the anode of the light emitting unit is located between the pixel defining layer and the substrate, The light-emitting layer of the light-emitting unit is formed by evaporating a light-emitting material to the pixel opening. The material of the pixel defining layer may include organic insulating materials such as polyimide, polyphthalimide, polyphthalamide, acrylic resin, benzocyclobutene or phenolic resin.

The slope angle of the slope surface of the display substrate provided by the embodiment of the present invention is less than or equal to 30°, which is beneficial to improve the yield of the product. Uniformity of luminescent material deposition; of course, the sides of other film layers can also be set to slope surfaces with a slope angle of less than or equal to 30°, so as to effectively improve the problems such as breakage or stamping of the upper film layer caused by step differences.

In some specific embodiments, the size and position of the light diffraction pattern can be preset according to actual needs, so that the slope angle of the slope surface is less than 20°, so that the slope surface is more conducive to improving product yield.

In some specific embodiments, the photosensitive pattern layer may be a pixel definition layer, the pixel definition layer has a plurality of pixel openings, and the slope surface is a side surface of the pixel opening.

An embodiment of the present invention further provides a display device, which includes the above-mentioned display substrate.

The display device can be any product or component with display function, such as electronic paper, OLED panel, mobile phone, tablet computer, TV, monitor, notebook computer, digital photo frame, and navigator.

The display device adopts the above-mentioned display substrate. Therefore, the slope angle of the side surface of the pixel opening on the pixel defining layer is less than or equal to 30°, which is beneficial to improve the yield of the product.

It can be understood that the above embodiments are only exemplary embodiments adopted to illustrate the principle of the present invention, but the present invention is not limited thereto. For those skilled in the art, without departing from the spirit and essence of the present invention, various modifications and improvements can be made, and these modifications and improvements are also regarded as the protection scope of the present invention.

Claims (12)

1. A mask for exposing a photosensitive material layer, the photosensitive material layer comprising a to-be-removed area, a to-be-retained area, and a slope-forming area connected between the to-be-removed area and the to-be-retained area , the mask plate includes a light-transmitting area corresponding to the to-be-removed area and a light-shielding area located outside the light-transmitting area, characterized in that: A light-shielding layer is arranged in the light-shielding area, and a light-diffraction pattern corresponding to the slope forming area is arranged on the light-shielding layer, and the light-diffraction pattern is used for diffracting light during exposure, so as to make the photosensitive material layer After exposure and development are completed, a slope surface with a slope angle of less than or equal to 30° is formed in the slope forming region. 2 . The mask according to claim 1 , wherein the light-transmitting regions correspond to the pixel units of the display substrate one-to-one, and the light diffraction pattern comprises at least one slit, and the slit is a surrounding area. 3 . The annular structure of the light-transmitting region. 3 . The mask according to claim 2 , wherein the width of the slit is not greater than the width of the interval between the slit and the light-transmitting area. 4 . 4 . The mask according to claim 2 , wherein the width of the interval between the slit and the light-transmitting region is between 0.6 μm and 1.8 μm, and the width of the slit is 0.6 μm. 5 . to 1.8 μm. 5 . The mask according to claim 1 , wherein the light-transmitting regions correspond to the pixel units of the display substrate one-to-one, the light diffraction pattern comprises a plurality of spaced light-transmitting patterns, and a plurality of the The light-transmitting pattern is arranged around the light-transmitting area and is not spaced from the light-transmitting area. 6 . The mask according to claim 5 , wherein the light-transmitting pattern is a rectangle or a triangle. 7 . 7 . The mask according to claim 1 , wherein the mask further comprises a transparent substrate, and the light shielding layer is disposed on the transparent substrate. 8 . 8. A method for preparing a display substrate, comprising: forming a photosensitive material layer on the substrate, the photosensitive material layer comprising a region to be removed, a region to be retained, and a slope forming region connected between the region to be removed and the region to be retained; A patterning process is performed on the photosensitive material layer by using the mask according to any one of claims 1 to 7, so that the part of the photosensitive material layer corresponding to the to-be-removed area is removed, and the part corresponding to the to-be-retained area is removed. The portion of the slope is reserved, and the portion corresponding to the slope forming region forms a slope surface, and the slope angle of the slope surface is less than or equal to 30°. 9. A display substrate, characterized in that it comprises a substrate and a photosensitive graphic layer disposed on the substrate, the photosensitive graphic layer having a bottom surface facing the substrate, a top surface away from the substrate and The side surface connected between the top surface and the bottom surface is a slope surface, and the slope angle of the slope surface is less than or equal to 30°. 10 . The display substrate of claim 9 , wherein the slope angle of the slope surface is less than 20°. 11 . 11 . The display substrate of claim 9 , wherein the photosensitive pattern layer is a pixel defining layer, the pixel defining layer has a plurality of pixel openings, and the slope surface is a side surface of the pixel opening. 12 . 12. A display device, comprising the display substrate according to any one of claims 9 to 11.

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