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CN111446311A - Optical sensing device - Google Patents

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Publication number
CN111446311A
CN111446311A CN202010298923.5A CN202010298923A CN111446311A CN 111446311 A CN111446311 A CN 111446311A CN 202010298923 A CN202010298923 A CN 202010298923A CN 111446311 A CN111446311 A CN 111446311A
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light
sensing device
optical sensing
optical
layer
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钟炜竣
林苏逸
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Hangzhou Silergy Semiconductor Technology Ltd
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Hangzhou Silergy Semiconductor Technology Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/40Optical elements or arrangements
    • H10F77/413Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors

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Abstract

本发明提供了一种光学感测装置,包括:至少一个具有感光区域的半导体,一光学结构;以及波长带通层,其中,所述光学感测装置外部的光通过叠放至所述感光区域上的所述光学结构和所述波长带通层到达所述感光区域,所述波长带通层仅使得在特定波长范围内的光通过,所述光学结构包括角度限制层,以阻挡大角度范围的入射光通过,提高入射光的准直性。

Figure 202010298923

The present invention provides an optical sensing device, comprising: at least one semiconductor with a photosensitive region, an optical structure; and a wavelength band pass layer, wherein light from outside the optical sensing device is stacked to the photosensitive region by stacking The optical structure and the wavelength band pass layer on the photosensitive region reach the photosensitive region, the wavelength band pass layer only allows light within a specific wavelength range to pass through, and the optical structure includes an angle limiting layer to block a large angle range The incident light passes through, improving the collimation of the incident light.

Figure 202010298923

Description

光学感测装置Optical sensing device

技术领域technical field

本发明涉及半导体技术领域,更具体地,涉及一种光学感测装置。The present invention relates to the technical field of semiconductors, and more particularly, to an optical sensing device.

背景技术Background technique

光感测器的原理为外部光入射至光电二极管(Photo Diode),并由其所接收后,将光能量转换成电讯号,藉由电讯号的强弱来判定外部光的强弱。而特定波长光感测器为只接收特定波长的光进入光电二极管来判定特定波长的光的强弱,一般使用的方式是在光电二极管上镀膜形成特定波长的带通(band pass)膜来达到目的。The principle of the light sensor is that the external light is incident on the photodiode (Photo Diode), and after it is received, the light energy is converted into an electrical signal, and the intensity of the external light is determined by the intensity of the electrical signal. The specific wavelength light sensor only receives light of a specific wavelength into the photodiode to determine the intensity of the light of a specific wavelength. The general method is to coat the photodiode to form a band pass film of a specific wavelength to achieve Purpose.

Band pass膜的带通频谱范围定义是正向光所量测结果,但现实应用存在不同角度的光,不同角度的光在穿透Band pass膜中所行进的等效路径长度与正向光的路径长度不同,可穿透频谱的波段会发生位移改变,因此造成非设计波长的光入射。一般的设计解决方法为在封装外壳开一开孔,来限制入射光的角度,以避免不同角度光的波长发生位移的现象。但封装外壳开孔的制程能力有限,孔洞无法开得太小。在孔洞无法太小的情况下又要入射光只准直集中,就必须将靠口的高度设置高,来达到限制入射光的角度,增加了光感测器的厚度和成本。The band pass spectrum range of the Band pass film is defined as the measurement result of the forward light, but there are different angles of light in practical applications, the equivalent path length of the light of different angles traveling through the Band pass film and the path of the forward light With different lengths, the wavelength band that penetrates the spectrum will shift, thus causing incident light at non-design wavelengths. A general design solution is to open a hole in the package to limit the angle of the incident light, so as to avoid the phenomenon that the wavelength of light with different angles is shifted. However, the process capability of opening holes in the package shell is limited, and the holes cannot be opened too small. When the hole cannot be too small and the incident light is only collimated and concentrated, the height of the mouth must be set high to limit the angle of the incident light, which increases the thickness and cost of the light sensor.

发明内容SUMMARY OF THE INVENTION

有鉴于此,本发明的目的在于提供一种光学感测装置,阻挡大角度光入射至感光区域,减小非设计波长的光入射。In view of this, the purpose of the present invention is to provide an optical sensing device, which can block the incidence of light with a large angle to the photosensitive region and reduce the incidence of light with non-design wavelengths.

根据本发明的一方面,提供一种光学感测装置,包括:至少一个具有感光区域的半导体,一光学结构;以及波长带通层,其中,所述光学感测装置外部的光通过叠放至所述感光区域上方的所述光学结构和所述波长带通层到达所述感光区域,所述波长带通层仅使得在特定波长范围内的光通过,所述光学结构包括角度限制层,以阻挡大角度范围的入射光通过。According to an aspect of the present invention, an optical sensing device is provided, comprising: at least one semiconductor having a photosensitive region, an optical structure; and a wavelength band pass layer, wherein the light outside the optical sensing device is stacked to The optical structure and the wavelength band pass layer above the photosensitive region reach the photosensitive region, the wavelength band pass layer only allows light within a specific wavelength range to pass, and the optical structure includes an angle limiting layer to Blocks a wide angular range of incident light from passing through.

优选地,所述光学结构包括至少一层透光层。Preferably, the optical structure includes at least one light-transmitting layer.

优选地,所述光学结构包括交替层叠的滤光层和透光层。Preferably, the optical structure includes alternately stacked filter layers and light-transmitting layers.

优选地,所述滤光层包括透光区域和不透光区域。Preferably, the filter layer includes a light-transmitting area and an opaque area.

优选地,所述不透光区域通过反射所述入射光以阻挡大角度的入射光通过。Preferably, the opaque area reflects the incident light so as to block the passage of incident light with a large angle.

优选地,所述不透光区域通过吸收所述入射光以阻挡大角度的入射光通过。Preferably, the opaque area blocks the passage of incident light with a large angle by absorbing the incident light.

优选地,所述透光区域的尺寸相同。Preferably, the light-transmitting regions have the same size.

优选地,所述光学结构的厚度和所述透光区域的尺寸决定所述入射光通过所述光学结构的最大入射角度。Preferably, the thickness of the optical structure and the size of the light-transmitting area determine the maximum incident angle of the incident light passing through the optical structure.

优选地,所述入射光通过所述光学结构的最大入射角度不大于60°。Preferably, the maximum incident angle of the incident light passing through the optical structure is not greater than 60°.

优选地,在所述层叠方向,每层所述滤光层的透光区域对齐设置。Preferably, in the stacking direction, the light-transmitting regions of each filter layer are aligned.

优选地,在所述层叠方向,至少一层所述滤光层的透光区域错位设置。Preferably, in the stacking direction, the light-transmitting regions of at least one layer of the filter layer are arranged in a staggered manner.

优选地,所述透光区域错位的距离范围足以使得所述最大入射角度的入射光通过。Preferably, the distance range in which the light-transmitting regions are displaced is sufficient to allow the incident light at the maximum incident angle to pass through.

优选地,所述透光区域被设置为圆形或多边形。Preferably, the light-transmitting area is configured as a circle or a polygon.

优选地,所述透光区域按预设顺序排列成规则图案。Preferably, the light-transmitting regions are arranged in a regular pattern in a preset order.

优选地,所述不透光区域被设置为金属。Preferably, the opaque area is provided as metal.

优选地,所述不透光区域被设置为黑光阻。Preferably, the opaque area is configured as a black photoresist.

优选地,所述透光层和所述透光区域被设置为介质层。Preferably, the light-transmitting layer and the light-transmitting region are configured as a medium layer.

优选地,所述波长带通层位于所述光学结构的上方。Preferably, the wavelength band pass layer is located above the optical structure.

优选地,所述光学结构位于所述波长带通层的上方。Preferably, the optical structure is located above the wavelength band pass layer.

优选地,还包括包封所述半导体,所述光学结构和所述波长带通层的封装体。Preferably, an encapsulation body encapsulating the semiconductor, the optical structure and the wavelength bandpass layer is also included.

优选地,所述封装体被设置为包括散射粒子的封装胶体。Preferably, the encapsulation body is provided as an encapsulation colloid comprising scattering particles.

优选地,所述封装体被设置为透明封装胶体。Preferably, the encapsulation body is configured as a transparent encapsulation colloid.

优选地,还包括位于所述封装体上的扩散膜片。Preferably, a diffusion membrane on the package body is also included.

优选地,所述具有感光区域的半导体被配置为光电二极管。Preferably, the semiconductor with the photosensitive region is configured as a photodiode.

本发明提出光学感测装置包括一光学结构,所述光学结构通过层叠设置的滤光层和透光层来限制大角度的入射光通过,增加入射光的准直性,防止大角度的特定波长的光入射时位移发生改变,减小非设计波长的光入射,提高了装置的感测准确性。进一步地,本发明将滤光层的不透光区域设置为与具有感光区域的半导体周边的金属线路相同的金属,无需增加额外的设计成本。The present invention proposes that the optical sensing device includes an optical structure, and the optical structure restricts the passage of incident light with a large angle by stacking a filter layer and a light-transmitting layer, increases the collimation of the incident light, and prevents the specific wavelength of the large angle. The displacement changes when the light is incident, which reduces the incidence of light of non-design wavelengths and improves the sensing accuracy of the device. Further, in the present invention, the opaque area of the filter layer is set to the same metal as the metal circuit around the semiconductor having the photosensitive area, without adding additional design cost.

附图说明Description of drawings

通过以下参照附图对本发明实施例的描述,本发明的上述以及其他目的、特征和优点将更为清楚,在附图中:The above and other objects, features and advantages of the present invention will become more apparent from the following description of embodiments of the present invention with reference to the accompanying drawings, in which:

图1示出根据本发明实施例的光学感测装置的截面图;1 shows a cross-sectional view of an optical sensing device according to an embodiment of the present invention;

图2a和2b示出根据本发明第一实施例的光学结构的截面图;Figures 2a and 2b show cross-sectional views of an optical structure according to a first embodiment of the invention;

图3示出根据本发明第一实施例的光学结构的俯视图。Figure 3 shows a top view of an optical structure according to a first embodiment of the present invention.

具体实施方式Detailed ways

以下将参照附图更详细地描述本发明。在各个附图中,相同的元件采用类似的附图标记来表示。为了清楚起见,附图中的各个部分没有按比例绘制。此外,可能未示出某些公知的部分。为了简明起见,可以在一幅图中描述经过数个步骤后获得的半导体结构。The present invention will be described in more detail below with reference to the accompanying drawings. In the various figures, like elements are designated by like reference numerals. For the sake of clarity, various parts in the figures have not been drawn to scale. Additionally, some well-known parts may not be shown. For the sake of simplicity, the semiconductor structure obtained after several steps can be depicted in one figure.

应当理解,在描述器件的结构时,当将一层、一个区域称为位于另一层、另一个区域“上面”或“上方”时,可以指直接位于另一层、另一个区域上面,或者在其与另一层、另一个区域之间还包含其它的层或区域。并且,如果将器件翻转,该一层、一个区域将位于另一层、另一个区域“下面”或“下方”。It will be understood that, in describing the structure of a device, when a layer or region is referred to as being "on" or "over" another layer or region, it can be directly on the other layer or region, or Other layers or regions are also included between it and another layer, another region. And, if the device is turned over, the layer, one region, will be "under" or "under" another layer, another region.

如果为了描述直接位于另一层、另一个区域上面的情形,本文将采用“A直接在B上面”或“A在B上面并与之邻接”的表述方式。在本申请中,“A直接位于B中”表示A位于B中,并且A与B直接邻接,而非A位于B中形成的掺杂区中。In order to describe the situation directly above another layer, another area, the expression "A is directly above B" or "A is above and adjacent to B" will be used herein. In this application, "A is located directly in B" means that A is located in B, and A is directly adjacent to B, rather than A located in a doped region formed in B.

在本申请中,术语“冲丝”是指在引线框上固定晶片以及进行引线键合之后,在注入封装料的过程中,彼此相邻的引线由于封装料的冲击而彼此接触导致短路的现象。In this application, the term "punch wire" refers to the phenomenon that after the chip is fixed on the lead frame and the wire bonding is performed, during the process of injecting the encapsulation compound, the leads adjacent to each other contact each other due to the impact of the encapsulation compound, resulting in a short circuit. .

在下文中描述了本发明的许多特定的细节,例如器件的结构、材料、尺寸、处理工艺和技术,以便更清楚地理解本发明。但正如本领域的技术人员能够理解的那样,可以不按照这些特定的细节来实现本发明。Numerous specific details of the present invention are described below, such as device structures, materials, dimensions, processing techniques and techniques, in order to provide a clearer understanding of the present invention. However, as can be understood by one skilled in the art, the present invention may be practiced without these specific details.

本发明提供了一种光学感测装置,包括:至少一个具有感光区域的半导体,一光学结构;以及波长带通层,其中,所述光学结构和所述波长带通层位于所述感光区域的上方,所述光学感测装置外部的光通过所述光学结构和所述波长带通层到达所述感光区域,所述波长带通层仅使得在特定波长范围内的光通过,所述光学结构包括角度限制层,以阻挡大角度范围的入射光通过,提高入射光的准直性。The present invention provides an optical sensing device, comprising: at least one semiconductor with a photosensitive region, an optical structure; and a wavelength bandpass layer, wherein the optical structure and the wavelength bandpass layer are located in the photosensitive region Above, the light outside the optical sensing device reaches the photosensitive region through the optical structure and the wavelength band pass layer, the wavelength band pass layer only allows light in a specific wavelength range to pass, and the optical structure An angle limiting layer is included to block the passage of incident light in a wide angle range and improve the collimation of incident light.

如图1所示为本发明实施例提供的光学感测装置,所述光学感测装置包括具有感光区域的半导体501,位于所述感光区域上方的光学结构502,以及位于所述光学结构502上方的波长带通层503。其中,所述波长带通层503仅使得在特定波长范围内的光通过,所述光学结构502仅使得在预定角度范围的入射光通过。具体地,所述光学结构502包括角度限制层,以阻挡大角度的入射光通过。在本实施例中,所述光学结构502包括交替层叠的滤光层和透光层。在其他实施例中,所述光学结构也可只包括层叠的滤光层。当外部的入射光通过光学结构502和波长带通层503到达所述感光区域,所述具有感光区域的半导体将所述特定波长的入射光信号转换为电信号,以检测所述特定波长的入射光的强弱。在本实施例中,所述波长带通层允许通过的光为480nm到780nm可见光范围,但不以此为限,也可设置所述波长带通层允许通过其他波长范围的光。所述光学结构阻挡大角度的入射光通过,是防止大角度的光进入所述波长带通层503后发生位移改变,导致非设计波长的光到达所述感光区域,提高入射光的准直性。FIG. 1 shows an optical sensing device provided by an embodiment of the present invention. The optical sensing device includes a semiconductor 501 having a photosensitive region, an optical structure 502 located above the photosensitive region, and an optical structure 502 located above the optical structure 502 . The wavelength band pass layer 503 . Wherein, the wavelength band pass layer 503 only allows light within a specific wavelength range to pass, and the optical structure 502 only allows incident light within a predetermined angle range to pass. Specifically, the optical structure 502 includes an angle limiting layer to block incident light with a large angle from passing through. In this embodiment, the optical structure 502 includes alternately stacked filter layers and light-transmitting layers. In other embodiments, the optical structure may also include only laminated filter layers. When external incident light passes through the optical structure 502 and the wavelength band pass layer 503 and reaches the photosensitive region, the semiconductor with the photosensitive region converts the incident light signal of the specific wavelength into an electrical signal to detect the incident light of the specific wavelength. The strength of light. In this embodiment, the wavelength band pass layer allows light to pass through the visible light range of 480 nm to 780 nm, but is not limited thereto, and the wavelength band pass layer may also be configured to allow light in other wavelength ranges to pass through. The optical structure blocks large-angle incident light from passing through, which prevents the large-angle light from entering the wavelength bandpass layer 503 and changes in displacement, causing light with non-design wavelengths to reach the photosensitive area and improving the collimation of incident light. .

在本实施例中,所述具有感光区域的半导体被配置为光电二极管,在其他实施例中,也可配置为其他光电结构。在另一实施例中,所述光学感测装置也可只包括具有感光区域的半导体501,以及位于所述感光区域上方的光学结构502。In this embodiment, the semiconductor with the photosensitive region is configured as a photodiode, and in other embodiments, it can also be configured as other photoelectric structures. In another embodiment, the optical sensing device may also only include a semiconductor 501 having a photosensitive area, and an optical structure 502 located above the photosensitive area.

所述光学感测装置还包括包封所述具有感光区域的半导体501,所所述光学结构502,以及所述波长带通层503的包封体504。具体地,在本实施例中,所述包封体504中含有散射粒子,以用于将入射光散射成各个角度的分量,让入射到达感光区域的光含各角度的分量,增加视角(FOV)范围。在其他实施例中,所述包封体504也可设置为透明胶体,在所述包封体504的上表面粘贴一扩散膜片。The optical sensing device further includes an encapsulation body 504 encapsulating the semiconductor 501 having a photosensitive region, the optical structure 502 , and the wavelength bandpass layer 503 . Specifically, in this embodiment, the encapsulation body 504 contains scattering particles to scatter the incident light into components of various angles, so that the incident light reaching the photosensitive region contains components of various angles, increasing the viewing angle (FOV )scope. In other embodiments, the encapsulation body 504 can also be configured as a transparent colloid, and a diffusion film is pasted on the upper surface of the encapsulation body 504 .

在本实施例中,所述滤波层503位于所述光学结构502的上方,而在其他实施例中,所述光学结构502也可设置为位于所述滤波层503的上方,可达到相同的技术效果,在此不作限制。In this embodiment, the filter layer 503 is located above the optical structure 502, and in other embodiments, the optical structure 502 can also be located above the filter layer 503, and the same technology can be achieved The effect is not limited here.

如图2a和2b所示为本发明第一实施例的光学结构的截面图,图3所示为本发明第一实施例的光学结构的俯视图。所述光学结构包括交替层叠的滤光层11和透光层12,所述滤光层11包括透光区域112和不透光区域111,当光入射至所述光学结构时,小角度的入射光可以直接通过透光区域112和透光层12,大角度的光被所述不透光区域反射,再通过透光区域反射出去。其中,所述透光层12和所述滤光层的透光区域112被设置为介质层,例如氧化硅或其他氧化层。所述滤光层的不透光区域111被设置为金属,例如铝合金,铜合金或其他合金金属。所述金属和与接收光的感光元件周围的金属线路选择同样的材料,也可与所述感光元件周围的金属线路同步形成。在其他实施例中,所述滤光层的不透光区域111也可被设置为黑光阻,所述黑光阻用于吸收大角度的入射光。在本实施例中,每层所述滤光层的厚度相同,厚度为0.4-0.6微米,每层所述透光层的厚度相同,厚度为0.6-0.7微米,但设计并不以此为限。在本实施例中,所述透光区域112的尺寸相同,在所述层叠方向,每层所述滤光层的对应的透光区域的位置对齐,如图2a所示。当然,因为工艺误差或者设计误差,每层所述滤光层对应的透光区域的位置也可存在偏差或错位,如图2b所示。当然本领域的技术人员也知在实际的工艺中,所述透光区的尺寸也会因为工艺误差存在一些小的偏差。2a and 2b are cross-sectional views of the optical structure according to the first embodiment of the present invention, and FIG. 3 is a top view of the optical structure according to the first embodiment of the present invention. The optical structure includes alternately stacked optical filter layers 11 and light-transmitting layers 12. The optical filter layer 11 includes a light-transmitting area 112 and a non-transmitting area 111. When light is incident on the optical structure, a small-angle incident The light can directly pass through the light-transmitting area 112 and the light-transmitting layer 12, and light with a large angle is reflected by the non-light-transmitting area, and then reflected out through the light-transmitting area. Wherein, the light-transmitting layer 12 and the light-transmitting region 112 of the filter layer are set as dielectric layers, such as silicon oxide or other oxide layers. The opaque area 111 of the filter layer is set to be metal, such as aluminum alloy, copper alloy or other alloy metals. The metal and the metal circuit around the light-receiving element are selected from the same material, and can also be formed synchronously with the metal circuit around the photosensitive element. In other embodiments, the opaque area 111 of the filter layer can also be configured as a black photoresist, which is used to absorb incident light with a large angle. In this embodiment, the thickness of each layer of the filter layer is the same, and the thickness is 0.4-0.6 μm, and the thickness of each layer of the light-transmitting layer is the same, and the thickness is 0.6-0.7 μm, but the design is not limited to this. . In this embodiment, the light-transmitting regions 112 have the same size, and in the stacking direction, the positions of the corresponding light-transmitting regions of each of the filter layers are aligned, as shown in FIG. 2 a . Of course, due to process errors or design errors, there may also be deviations or dislocations in the positions of the light-transmitting regions corresponding to each of the filter layers, as shown in FIG. 2b. Of course, those skilled in the art also know that in the actual process, the size of the light-transmitting region also has some small deviations due to process errors.

图3所示为本发明的一种滤光层的俯视图。所述滤光层包括多个透光区域112和不透光区域111,其中,所述滤光层11包括至少两个所述透光区域。所述透光区域112被设置为圆形,所述圆形的直径相同。所述滤光层的所述透光区域按预设顺序排列成规则图案。当然,本发明的滤光层的透光区域的排列方式并不仅限于本实施例的排列方式,本领域的技术人员可根据实际的应用要求改变其排列方式。FIG. 3 is a top view of an optical filter layer of the present invention. The filter layer includes a plurality of transparent regions 112 and opaque regions 111 , wherein the filter layer 11 includes at least two of the transparent regions. The light-transmitting regions 112 are arranged in a circular shape, and the diameters of the circles are the same. The light-transmitting regions of the filter layer are arranged in a regular pattern in a preset order. Of course, the arrangement of the light-transmitting regions of the filter layer of the present invention is not limited to the arrangement of this embodiment, and those skilled in the art can change the arrangement according to actual application requirements.

在本实施例中,所述光学结构的层叠厚度和所述透光区域的尺寸决定入射光可通过的最大入射角度,如图2a和2b所示,所述光学结构的层叠厚度为H,所述透光区域的尺寸为D(在本实施例中,所述透光区域的尺寸D为圆的直径),则可通过的入射光的最大入射角θ=arctan(D/H)。因此,图2b中每层滤光层的错位的范围不能太大,要足以使得所述最大入射角度的入射光通过。根据上述公式也可以得到,所述层叠的层数越多,即光学结构的厚度越大,所述入射光的最大入射角越小,所述透光区域的尺寸越大,所述入射光的最大入射角越大。在本实施例中,通过设置所述光学结构的层叠厚度和所述透光区域的尺寸以使得所述最大入射角θ不大于60°,当然,本领域的技术人员也可根据实际需要相应的增大或减小最大入射角。In this embodiment, the stack thickness of the optical structure and the size of the light-transmitting area determine the maximum incident angle through which the incident light can pass. As shown in Figures 2a and 2b, the stack thickness of the optical structure is H, so The size of the light-transmitting area is D (in this embodiment, the size D of the light-transmitting area is the diameter of a circle), then the maximum incident angle θ=arctan(D/H) of the incident light that can pass through. Therefore, the range of the dislocation of each filter layer in FIG. 2b cannot be too large, and is sufficient to allow the incident light with the maximum incident angle to pass. According to the above formula, it can also be obtained that the greater the number of layers stacked, that is, the greater the thickness of the optical structure, the smaller the maximum incident angle of the incident light, the larger the size of the light-transmitting area, and the greater the size of the incident light. The larger the maximum angle of incidence. In this embodiment, the stacking thickness of the optical structure and the size of the light-transmitting area are set so that the maximum incident angle θ is not greater than 60°. Of course, those skilled in the art can also make corresponding adjustments according to actual needs. Increase or decrease the maximum angle of incidence.

在本实施例中,每层所述滤光层的所述透光区域的形状设置为圆形,在其他实施例中,所述透光区域的形状也可设置为多边形,方形,三角形等其他形状,在此我们不作任何限制。In this embodiment, the shape of the light-transmitting area of each filter layer is set to be a circle. In other embodiments, the shape of the light-transmitting area can also be set to a polygon, a square, a triangle, etc. shape, we do not make any restrictions here.

本发明提出光学感测装置包括一光学结构,所述光学结构通过层叠设置的滤光层和透光层来限制大角度的入射光通过,增加入射光的准直性,防止大角度的特定波长的光入射时位移发生改变,减小非设计波长的光入射,提高了装置的感测准确性。进一步地,本发明将滤光层的不透光区域设置为与具有感光区域的半导体周边的金属线路相同的金属,无需增加额外的设计成本。The present invention proposes that the optical sensing device includes an optical structure, and the optical structure restricts the passage of incident light with a large angle by stacking a filter layer and a light-transmitting layer, increases the collimation of the incident light, and prevents the specific wavelength of the large angle. The displacement changes when the light is incident, which reduces the incidence of light of non-design wavelengths and improves the sensing accuracy of the device. Further, in the present invention, the opaque area of the filter layer is set to the same metal as the metal circuit around the semiconductor having the photosensitive area, without adding additional design cost.

应当说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。It should be noted that, in this document, relational terms such as first and second are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any relationship between these entities or operations. any such actual relationship or sequence exists. Moreover, the terms "comprising", "comprising" or any other variation thereof are intended to encompass a non-exclusive inclusion such that a process, method, article or device that includes a list of elements includes not only those elements, but also includes not explicitly listed or other elements inherent to such a process, method, article or apparatus. Without further limitation, an element qualified by the phrase "comprising a..." does not preclude the presence of additional identical elements in a process, method, article or apparatus that includes the element.

依照本发明实施例如上文所述,这些实施例并没有详尽叙述所有的细节,也不限制该发明仅为所述的具体实施例。显然,根据以上描述,可作很多的修改和变化。本说明书选取并具体描述这些实施例,是为了更好地解释本发明的原理和实际应用,从而使所属技术领域技术人员能很好地利用本发明以及在本发明基础上的修改使用。本发明仅受权利要求书及其全部范围和等效物的限制。In accordance with the embodiments of the present invention as described above, these embodiments do not describe all the details and do not limit the invention to only the specific embodiments described. Obviously, many modifications and variations are possible in light of the above description. This specification selects and specifically describes these embodiments in order to better explain the principle and practical application of the present invention, so that those skilled in the art can make good use of the present invention and modifications based on the present invention. The present invention is to be limited only by the claims and their full scope and equivalents.

Claims (24)

1.一种光学感测装置,包括:1. An optical sensing device, comprising: 至少一个具有感光区域的半导体,at least one semiconductor having a photosensitive region, 一光学结构;以及an optical structure; and 波长带通层,wavelength bandpass layer, 其中,所述光学感测装置外部的光通过叠放至所述感光区域上方的所述光学结构和所述波长带通层到达所述感光区域,所述波长带通层仅使得在特定波长范围内的光通过,所述光学结构包括角度限制层,以阻挡大角度范围的入射光通过。Wherein, the light outside the optical sensing device reaches the photosensitive region through the optical structure and the wavelength band pass layer stacked above the photosensitive region, and the wavelength band pass layer only makes the light in a specific wavelength range The optical structure includes an angle-limiting layer to block the passage of incident light in a wide angular range. 2.根据权利要求1所述的光学感测装置,其中,所述光学结构包括至少一层透光层。2. The optical sensing device of claim 1, wherein the optical structure comprises at least one light-transmitting layer. 3.根据权利要求1所述的光学感测装置,所述光学结构包括交替层叠的滤光层和透光层。3 . The optical sensing device according to claim 1 , wherein the optical structure comprises filter layers and light-transmitting layers alternately stacked. 4 . 4.根据权利要求3所述的光学感测装置,其中,所述滤光层包括透光区域和不透光区域。4. The optical sensing device of claim 3, wherein the filter layer comprises a light-transmitting area and a light-opaque area. 5.根据权利要求3所述的光学感测装置,其中,所述不透光区域通过反射所述入射光以阻挡大角度的入射光通过。5 . The optical sensing device of claim 3 , wherein the opaque area blocks the passage of incident light with a large angle by reflecting the incident light. 6 . 6.根据权利要求3所述的光学感测装置,其中,所述不透光区域通过吸收所述入射光以阻挡大角度的入射光通过。6 . The optical sensing device of claim 3 , wherein the light-tight region blocks the passage of incident light at large angles by absorbing the incident light. 7 . 7.根据权利要求3所述的光学感测装置,其中,所述透光区域的尺寸相同。7. The optical sensing device of claim 3, wherein the light-transmitting regions have the same size. 8.根据权利要求3所述的光学感测装置,其中,所述光学结构的厚度和所述透光区域的尺寸决定所述入射光通过所述光学结构的最大入射角度。8 . The optical sensing device of claim 3 , wherein the thickness of the optical structure and the size of the light-transmitting area determine the maximum incident angle of the incident light through the optical structure. 9 . 9.根据权利要求8所述的光学感测装置,其中,所述入射光通过所述光学结构的最大入射角度不大于60°。9 . The optical sensing device of claim 8 , wherein a maximum incident angle of the incident light passing through the optical structure is not greater than 60°. 10 . 10.根据权利要求3所述的光学感测装置,其中,在所述层叠方向,每层所述滤光层的透光区域对齐设置。10 . The optical sensing device according to claim 3 , wherein, in the stacking direction, the light-transmitting regions of each of the filter layers are arranged in alignment. 11 . 11.根据权利要求3所述的光学感测装置,其中,在所述层叠方向,至少一层所述滤光层的透光区域错位设置。11 . The optical sensing device according to claim 3 , wherein, in the stacking direction, the light-transmitting regions of at least one of the filter layers are dislocated. 12 . 12.根据权利要求11所述的光学感测装置,其中,所述透光区域错位的距离范围足以使得所述最大入射角度的入射光通过。12 . The optical sensing device of claim 11 , wherein the light-transmitting regions are displaced by a distance range sufficient to allow the incident light of the maximum incident angle to pass through. 13 . 13.根据权利要求3所述的光学感测装置,其中,所述透光区域被设置为圆形或多边形。13 . The optical sensing device of claim 3 , wherein the light-transmitting area is configured as a circle or a polygon. 14 . 14.根据权利要求3所述的光学感测装置,其中,所述透光区域按预设顺序排列成规则图案。14. The optical sensing device of claim 3, wherein the light-transmitting regions are arranged in a regular pattern in a preset order. 15.根据权利要求3所述的光学感测装置,其中,所述不透光区域被设置为金属。15. The optical sensing device of claim 3, wherein the opaque area is provided as metal. 16.根据权利要求3所述的光学感测装置,其中,所述不透光区域被设置为黑光阻。16. The optical sensing device of claim 3, wherein the opaque area is configured as a black photoresist. 17.根据权利要求3所述的光学感测装置,其中,所述透光层和所述透光区域被设置为介质层。17. The optical sensing device of claim 3, wherein the light-transmitting layer and the light-transmitting region are configured as a dielectric layer. 18.根据权利要求1所述的光学感测装置,其中,所述波长带通层位于所述光学结构的上方。18. The optical sensing device of claim 1, wherein the wavelength bandpass layer is located above the optical structure. 19.根据权利要求1所述的光学感测装置,其中,所述光学结构位于所述波长带通层的上方。19. The optical sensing device of claim 1, wherein the optical structure is located above the wavelength bandpass layer. 20.根据权利要求1所述的光学感测装置,其中,还包括包封所述半导体,所述光学结构和所述波长带通层的封装体。20. The optical sensing device of claim 1, further comprising an encapsulation body encapsulating the semiconductor, the optical structure and the wavelength bandpass layer. 21.根据权利要求20所述的光学感测装置,其中,所述封装体被设置为包括散射粒子的封装胶体。21. The optical sensing device of claim 20, wherein the encapsulant is configured as an encapsulant comprising scattering particles. 22.根据权利要求20所述的光学感测装置,其中,所述封装体被设置为透明封装胶体。22. The optical sensing device of claim 20, wherein the encapsulation body is provided as a transparent encapsulant. 23.根据权利要求22所述的光学感测装置,其中,还包括位于所述封装体上的扩散膜片。23. The optical sensing device of claim 22, further comprising a diffuser film on the package body. 24.根据权利要求1所述的光学感测装置,所述具有感光区域的半导体被配置为光电二极管。24. The optical sensing device of claim 1, the semiconductor having a photosensitive region configured as a photodiode.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100106263A (en) * 2010-08-27 2010-10-01 주식회사 나노브릭 Method for controlling light transmission and reflection using particles having electical charge
CN106873063A (en) * 2017-02-23 2017-06-20 京东方科技集团股份有限公司 A kind of display device
CN109271829A (en) * 2017-07-17 2019-01-25 金佶科技股份有限公司 Image capturing device
CN211828785U (en) * 2020-04-16 2020-10-30 矽力杰半导体技术(杭州)有限公司 Optical sensing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100106263A (en) * 2010-08-27 2010-10-01 주식회사 나노브릭 Method for controlling light transmission and reflection using particles having electical charge
CN106873063A (en) * 2017-02-23 2017-06-20 京东方科技集团股份有限公司 A kind of display device
CN109271829A (en) * 2017-07-17 2019-01-25 金佶科技股份有限公司 Image capturing device
CN211828785U (en) * 2020-04-16 2020-10-30 矽力杰半导体技术(杭州)有限公司 Optical sensing device

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