CN111290064A - Polarization-independent optical filter - Google Patents
Polarization-independent optical filter Download PDFInfo
- Publication number
- CN111290064A CN111290064A CN201811401140.4A CN201811401140A CN111290064A CN 111290064 A CN111290064 A CN 111290064A CN 201811401140 A CN201811401140 A CN 201811401140A CN 111290064 A CN111290064 A CN 111290064A
- Authority
- CN
- China
- Prior art keywords
- polarization
- refractive
- substrate
- index film
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010287 polarization Effects 0.000 title claims abstract description 45
- 230000003287 optical effect Effects 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 229910020211 SiOxHy Inorganic materials 0.000 claims abstract description 11
- 230000008033 biological extinction Effects 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 12
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 8
- 238000000926 separation method Methods 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 5
- 239000002210 silicon-based material Substances 0.000 claims description 5
- 229910020776 SixNy Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 238000004891 communication Methods 0.000 abstract description 6
- 238000010521 absorption reaction Methods 0.000 abstract description 3
- 238000003384 imaging method Methods 0.000 abstract description 3
- 238000002834 transmittance Methods 0.000 description 14
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000028161 membrane depolarization Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/207—Filters comprising semiconducting materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Polarising Elements (AREA)
Abstract
The invention discloses a polarization-independent optical filter, which comprises a substrate, wherein a film system formed by alternately stacking a plurality of high-refractive-index film layers and low-refractive-index film layers is arranged on the substrate, and the high-refractive-index film layers are made of SiH and SiOxHyOr SiH and SiOxHyThe scheme of the invention can be applied to the fields of 3D sensing, laser radar, imaging instruments, detecting instruments, data centers, comb filters (interleavers) of optical communication and the like, wherein the passband is at least partially overlapped with the wavelength range of 800nm to 4000nm, and each SiH/SiOxHyThe refractive index of the layers is greater than 3 in the wavelength range of 800nm to 4000nm, the extinction coefficient in the wavelength range of 800nm to 4000nm is less than 0.0005, the whole film system is partially overlapped in the wavelength range of 800nm to 4000nm, low absorption is realized, and the polarization-independent optical filter under a large angle or in a wide angle range is realized.
Description
Technical Field
The invention relates to the fields of 3D sensing, laser radar and optical communication, in particular to a polarization-independent optical filter.
Background
In the conventional case, polarization independent filters, due to depolarizationThe resonator design requires two or more kinds of dielectric films or metal films having refractive indexes to be alternately stacked. The high refractive index film layer is typically formed using different oxides, such as TiO2、Nb2O5、Ta2O5And mixtures thereof, with the intermediate refractive index film layer usually being made of Al2O3And oxide mixture (Al)xPryOz、AlxLayOz、AlxTayOzEtc.), a low refractive index film layer is usually made of SiO2、MgF2And metal Ag. The polarization-independent filter prepared by the mixed plating of the metal film and the dielectric film has low service life due to extremely poor reliability, and is far inferior to a hard dielectric oxide film. However, polarization independent filters based on hard dielectric oxide films can only achieve depolarization over a very small range of angles.
In order to achieve depolarization over a larger angular range with polarization independent filters, it is desirable to maintain the P and S light polarization spectra to have a consistent angular wavelength shift effect.
Disclosure of Invention
In view of the state of the prior art, it is an object of the present invention to provide a polarization independent filter that is reliable in implementation, easy to manufacture and capable of being used in a range of incident angles from 0 to 40 degrees.
In order to achieve the technical purpose, the invention adopts the technical scheme that:
the polarization-independent optical filter comprises a substrate, wherein a film system formed by alternately stacking a plurality of high-refractive-index film layers and low-refractive-index film layers is arranged on the substrate, and the ratio of the refractive index of the material of the high-refractive-index film layers to the refractive index of the material of the low-refractive-index film layers is less than 2.
Further, the high refractive index film layer is made of SiH and SiOxHyOr SiH and SiOxHyA mixture of (a).
Further, the material of the low-refractive-index film layer is Nb2O5、Ta2O5、TiO2、SixNyAt least one kind of mixtures thereof.
Further, the substrate is formed by a silicon dioxide material, or colored glass based on the silicon dioxide material, or a silicon material.
Furthermore, the refractive indexes of the high-refractive-index film layers in the wavelength range of 800-4000 nm are all larger than 3, and the extinction coefficients are all smaller than 0.0005.
In one embodiment, the substrate is provided with a long wavelength pass having no polarization on one end surface and a short wavelength pass having no polarization on the other end surface.
As another implementation on the substrate, further, a long-wavelength and short-wavelength light-polarized and non-light-polarized light pass is superposed on the same end face of the substrate, and an AR antireflection film is plated on the other end face.
Further, within the range of 0-40 degrees, the Cut-ON wavelength separation of P light and S light under each angle is less than 3nm, and the typical value is less than 1 nm; the Cut-OFF wavelength separation of P and S light at each angle is less than 3nm, typically less than 1 nm.
Further, within the range of 0-40 degrees, the FWHM difference of the P light and the S light under each angle is less than 5nm, and the typical value is less than 3 nm.
Furthermore, the polarization-independent filter is applied to angle tuning within the range of 0-40 degrees.
By adopting the technical scheme, compared with the prior art, the invention has the beneficial effects that: the substrate material is a glass material based on a silicon dioxide material, or colored glass forming based on the silicon dioxide material, or silicon material forming, and SiH/SiO is adoptedxHyA high refractive index film layer made of the mixture, and Nb2O5、Ta2O5、Al2O3、AlxPryOz、AlxLayOz、AlxTayOzAt least one mixed low refractive index film layer is alternately stacked on the substrate to form a film system, each SiH/SiOxHyThe refractive index of the layer (i.e., the high refractive index film layer) is greater than 3 in the wavelength range of 800nm to 4000nm, and the extinction coefficient is less than 0.0005 in the wavelength range of 800nm to 4000 nm. Complete film systemThe partial overlapping is realized in the wavelength range of 800nm to 4000nm, the low absorption is realized, and the polarization-independent partial optical filter under a large angle or in a large angle range is realized, so that the scheme can also be applied to the fields of 3D sensing, laser radars, imaging instruments, detecting instruments, data centers, comb filters (interleavers) of optical communication and the like.
Drawings
The invention will be further elucidated with reference to the drawings and the detailed description:
FIG. 1 is a schematic diagram of an embodiment of the present invention;
FIG. 2 is a graph of transmittance versus wavelength for 40 degrees of P and S light polarization for example 1 of the present invention;
FIG. 3 is a graph of transmittance versus wavelength for 30 degrees of P and S light polarization for example 1 of the present invention;
FIG. 4 is a graph of transmittance versus wavelength for 40 degrees of P and S light polarization for example 2 of the present invention;
FIG. 5 is a graph of transmittance versus wavelength for 30 degrees of P and S light polarization for example 2 of the present invention;
FIG. 6 is a graph of transmittance versus wavelength for 40 degrees of P and S light polarization for example 3 of the present invention;
FIG. 7 is a graph of transmittance versus wavelength for 30 degrees of P and S light polarization for example 3 of the present invention;
FIG. 8 is a graph of transmittance versus wavelength for P-polarization and S-polarization at 0 degrees, 30 degrees, and 40 degrees for example 3 of the present invention.
Detailed Description
As shown in fig. 1, the polarization independent optical filter of the present invention includes a substrate 1, wherein the substrate 1 has a film system formed by alternately stacking a plurality of high refractive index film layers 2 and low refractive index film layers 3, and a ratio of a refractive index of a material of the high refractive index film layers 2 to a refractive index of the material of the low refractive index film layers 3 is less than 2.
Wherein the high refractive index film layer is made of SiH and SiOxHyOr SiH and SiOxHyA mixture of (a); the low-refractive-index film layer is made of Nb2O5、Ta2O5、TiO2、SixNyAt least one mixture of (a); the substrate is formed by a silicon dioxide material, or colored glass based on the silicon dioxide material, or a silicon material.
In addition, the refractive indexes of the high-refractive-index film layers in the wavelength range of 800-4000 nm are all larger than 3, and the extinction coefficients are all smaller than 0.0005; as one of the preferred embodiments of the substrate, one end surface of the substrate is plated with long wave pass which is not related to polarization, and the other end surface is plated with short wave pass which is not polarized; in another preferred implementation, the long and short wavelength beams without polarized light are superposed on the same end face of the substrate, and an AR antireflection film is plated on the other end face.
In addition, within the range of 0-40 degrees, the Cut-ON wavelength separation of P light and S light under each angle is less than 3nm, and the typical value is less than 1 nm; Cut-OFF wavelength separation of P light and S light under each angle is less than 3nm, and the typical value is less than 1 nm; the FWHM difference between P and S light at each angle is less than 5nm, typically less than 3 nm.
The invention adopts the technical scheme that the substrate 1 is made of glass material based on silicon dioxide material, or colored glass forming based on silicon dioxide material, or silicon material forming, and SiH/SiO is adoptedxHyA high refractive index film layer 2 made of the mixture, and Nb2O5、Ta2O5、Al2O3、AlxPryOz、AlxLayOz、AlxTayOzAt least one mixed low refractive index film layer 3 is alternately stacked on the substrate to form a film system, each SiH/SiOxHyThe refractive index of the layer (i.e., the high refractive index film layer) is greater than 3 in the wavelength range of 800nm to 4000nm, and the extinction coefficient is less than 0.0005 in the wavelength range of 800nm to 4000 nm. The whole film system is partially overlapped in the wavelength range of 800nm to 4000nm, low absorption is realized, and the polarization-independent light splitting filter under a large angle or in a large angle range is realized, so that the scheme can also be applied to 3D sensing, laser radar, imaging instruments, detecting instruments, data centers and comb filters (in) for optical communicationInterlaver), and the like.
Example 1
This example is one implementation of the present invention in which high and low index film layers are alternately stacked on a substrate
For example, it has a short pass with a depolarization effect in the range of 0 to 40 degrees and has a structure comprising 30 layers of a film system in which two materials are alternately stacked.
The hierarchical order of the stacks is shown in the following table:
wherein,
the material of the high refractive index film layer is SiH, and the refractive index of the high refractive index film layer is 3.6546 near 940 nm.
The low refractive index film layer is made of Ta2O5The refractive index in the vicinity of 940nm is 2.1056.
The substrate material is ordinary K9 optical glass.
The film is formed by stacking 30 layers of two kinds of materials alternately.
The implementation has the following beneficial effects: the polarized lightless short wave pass is implemented, the Cut-Off wavelengths of P polarization and S polarization are not separated within the range of 0-40 ℃, and the difference is less than 1.5 nm; and (4) coating with a sputtered hard medium. And can meet the reliability requirements of friction resistance, high temperature and high humidity resistance of communication and automobile products; FIG. 2 is a graph showing the transmittance of the P-polarization and the S-polarization at 40 degrees versus wavelength for this example; FIG. 3 is a graph of transmittance versus wavelength for the P-polarization and S-polarization at 30 degrees for this example.
Example 2
This example is one implementation of the present invention in which high and low index film layers are alternately stacked on a substrate
For example, it has a long-wave pass with a depolarization effect in the range of 0 to 40 degrees and has a structure comprising 29 layers of film systems formed by alternately stacking two materials.
The hierarchical order of the stacks is shown in the following table:
wherein,
the material of the high refractive index film layer is SiH, and the refractive index of the high refractive index film layer is 3.6546 near 940 nm.
The low refractive index film layer is made of Ta2O5The refractive index in the vicinity of 940nm is 2.1056.
The substrate material is ordinary K9 optical glass.
The film is formed by stacking 29 layers of two kinds of materials alternately.
The implementation has the following beneficial effects: the polarized lightless long-wave transmission is realized, the Cut-ON wavelengths of P polarization and S polarization are not separated within the range of 0-40 ℃, and the difference is less than 1 nm; and (4) coating with a sputtered hard medium. And can meet the reliability requirements of friction resistance, high temperature and high humidity resistance of communication and automobile products; FIG. 4 is a graph of transmittance versus wavelength for the present example at 40 degrees for P-polarization and S-polarization; FIG. 5 is a graph of transmittance versus wavelength for the P-polarization and S-polarization at 30 degrees for this example.
Example 3
This example is a method of plating example 1 and example 2 on both sides of a substrate, respectively, with long wave pass and no light with independent polarization
The short wavelength of (a) forms a band pass filter that polarizes the absence of light.
The implementation has the following beneficial effects: in the band-pass filter without polarized light, the difference of the waveform separation of P polarization and S polarization is less than 1.5nm and the variation of the FWHM difference is less than 2nm within the range of 0-40 ℃; and (4) coating with a sputtered hard medium. And can meet the reliability requirements of friction resistance, high temperature and high humidity resistance of communication and automobile products; FIG. 6 is a graph of transmittance versus wavelength for the present example at 40 degrees for P-polarization and S-polarization; FIG. 7 is a graph of transmittance versus wavelength for the P-polarization and S-polarization at 30 degrees for this example; FIG. 8 is a graph of transmittance versus wavelength for P-polarization and S-polarization at 0, 30, and 40 degrees for this example.
The foregoing detailed description of the preferred embodiments of the invention has been presented. It should be understood that numerous modifications and variations could be devised by those skilled in the art in light of the present teachings without departing from the inventive concepts. Therefore, the technical solutions available to those skilled in the art through logic analysis, reasoning and limited experiments based on the prior art according to the concept of the present invention should be within the scope of protection defined by the claims.
Claims (10)
1. The polarization-independent optical filter comprises a substrate, wherein a film system formed by alternately stacking a plurality of high-refractive-index film layers and low-refractive-index film layers is arranged on the substrate, and the polarization-independent optical filter is characterized in that: the ratio of the refractive index of the material of the high-refractive-index film layer to the refractive index of the material of the low-refractive-index film layer is less than 2.
2. The polarization independent filter of claim 1, wherein: the high refractive index film layer is made of SiH and SiOxHyOr SiH and SiOxHyA mixture of (a).
3. The polarization independent filter of claim 1, wherein: the low-refractive-index film layer is made of Nb2O5、Ta2O5、TiO2、SixNyAt least one kind of mixtures thereof.
4. The polarization independent filter of claim 1, wherein: the substrate is formed by a silicon dioxide material, or colored glass based on the silicon dioxide material, or a silicon material.
5. The polarization independent filter of claim 1, wherein: the refractive index of the high-refractive-index film layer in the wavelength range of 800-4000 nm is larger than 3, and the extinction coefficient is smaller than 0.0005.
6. The polarization independent filter of claim 1, wherein: one end face of the substrate is plated with long-wave pass irrelevant to polarization, and the other end face of the substrate is plated with short-wave pass irrelevant to polarization.
7. The polarization independent filter of claim 1, wherein: the long and short wavelength channels without polarized light are superposed on the same end face of the substrate, and an AR antireflection film is plated on the other end face.
8. The polarization independent filter of claim 1, wherein: within the range of 0-40 degrees, the Cut-ON wavelength separation of P light and S light at each angle is less than 3nm, and the typical value is less than 1 nm; the Cut-OFF wavelength separation of P and S light at each angle is less than 3nm, typically less than 1 nm.
9. The polarization independent filter of claim 1, wherein: within the range of 0-40 degrees, the FWHM difference of the P light and the S light under each angle is less than 5nm, and the typical value is less than 3 nm.
10. The polarization independent filter of claim 1, wherein: the method is applied to angle tuning within the range of 0-40 degrees.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811401140.4A CN111290064A (en) | 2018-11-22 | 2018-11-22 | Polarization-independent optical filter |
| PCT/CN2018/119814 WO2020103206A1 (en) | 2018-11-22 | 2018-12-07 | Polarization-independent filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811401140.4A CN111290064A (en) | 2018-11-22 | 2018-11-22 | Polarization-independent optical filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111290064A true CN111290064A (en) | 2020-06-16 |
Family
ID=70773765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811401140.4A Pending CN111290064A (en) | 2018-11-22 | 2018-11-22 | Polarization-independent optical filter |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN111290064A (en) |
| WO (1) | WO2020103206A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109683225A (en) * | 2019-02-27 | 2019-04-26 | 成都国泰真空设备有限公司 | A kind of flat sheet membranes edge filter for depolarization |
| CN113960707A (en) * | 2021-10-13 | 2022-01-21 | 苏州众为光电有限公司 | Angle-tunable depolarizing filter |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110737036A (en) | 2018-07-18 | 2020-01-31 | 福州高意光学有限公司 | Wide angle application high reflector |
| CN112114402A (en) * | 2020-10-12 | 2020-12-22 | 东莞市微科光电科技有限公司 | CWDM optical filter |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1959447A (en) * | 2006-11-24 | 2007-05-09 | 中国科学院上海技术物理研究所 | Method for constructing depolarization filter of wide spectrum and 45 degree angle of incidence |
| CN101893730A (en) * | 2010-07-26 | 2010-11-24 | 无锡海达安全玻璃有限公司 | High anti-reflection filter and processing method thereof |
| CN203178510U (en) * | 2013-03-29 | 2013-09-04 | 杭州科汀光学技术有限公司 | Cut-off filter |
| CN104471449A (en) * | 2012-07-16 | 2015-03-25 | Jds尤尼弗思公司 | Optical Filters and Sensor Systems |
| CN204631282U (en) * | 2015-05-15 | 2015-09-09 | 杭州科汀光学技术有限公司 | A kind of two short-pass optical filter that disappears |
| CN105717564A (en) * | 2016-04-12 | 2016-06-29 | 三明福特科光电有限公司 | Depolarization pentagonal prism and manufacturing method thereof |
| CN106405716A (en) * | 2016-11-24 | 2017-02-15 | 福建福特科光电股份有限公司 | Depolarization beam splitter |
| CN107515438A (en) * | 2017-09-06 | 2017-12-26 | 天津津航技术物理研究所 | A kind of infrared wide spectrum cut-off laser of narrowband beam splitter |
| CN108427154A (en) * | 2017-02-13 | 2018-08-21 | 唯亚威解决方案股份有限公司 | Optical polarization optical filter |
| CN108761614A (en) * | 2018-08-06 | 2018-11-06 | 信阳舜宇光学有限公司 | Optical filter and infrared image sensing system comprising the optical filter |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI274177B (en) * | 2005-03-09 | 2007-02-21 | Asia Optical Co Inc | Film layer structure of spectroscope |
| CN103713395A (en) * | 2014-01-15 | 2014-04-09 | 福建福特科光电股份有限公司 | Infrared depolarization beamsplitting device |
| CN105242340B (en) * | 2015-11-17 | 2019-02-05 | 沈阳仪表科学研究院有限公司 | Fluorescence analysis depolarization color separation filter |
-
2018
- 2018-11-22 CN CN201811401140.4A patent/CN111290064A/en active Pending
- 2018-12-07 WO PCT/CN2018/119814 patent/WO2020103206A1/en not_active Ceased
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1959447A (en) * | 2006-11-24 | 2007-05-09 | 中国科学院上海技术物理研究所 | Method for constructing depolarization filter of wide spectrum and 45 degree angle of incidence |
| CN101893730A (en) * | 2010-07-26 | 2010-11-24 | 无锡海达安全玻璃有限公司 | High anti-reflection filter and processing method thereof |
| CN104471449A (en) * | 2012-07-16 | 2015-03-25 | Jds尤尼弗思公司 | Optical Filters and Sensor Systems |
| CN203178510U (en) * | 2013-03-29 | 2013-09-04 | 杭州科汀光学技术有限公司 | Cut-off filter |
| CN204631282U (en) * | 2015-05-15 | 2015-09-09 | 杭州科汀光学技术有限公司 | A kind of two short-pass optical filter that disappears |
| CN105717564A (en) * | 2016-04-12 | 2016-06-29 | 三明福特科光电有限公司 | Depolarization pentagonal prism and manufacturing method thereof |
| CN106405716A (en) * | 2016-11-24 | 2017-02-15 | 福建福特科光电股份有限公司 | Depolarization beam splitter |
| CN108427154A (en) * | 2017-02-13 | 2018-08-21 | 唯亚威解决方案股份有限公司 | Optical polarization optical filter |
| CN107515438A (en) * | 2017-09-06 | 2017-12-26 | 天津津航技术物理研究所 | A kind of infrared wide spectrum cut-off laser of narrowband beam splitter |
| CN108761614A (en) * | 2018-08-06 | 2018-11-06 | 信阳舜宇光学有限公司 | Optical filter and infrared image sensing system comprising the optical filter |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109683225A (en) * | 2019-02-27 | 2019-04-26 | 成都国泰真空设备有限公司 | A kind of flat sheet membranes edge filter for depolarization |
| CN113960707A (en) * | 2021-10-13 | 2022-01-21 | 苏州众为光电有限公司 | Angle-tunable depolarizing filter |
| CN113960707B (en) * | 2021-10-13 | 2024-09-10 | 苏州众为光电有限公司 | Angle-tunable depolarization filter |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020103206A1 (en) | 2020-05-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1979230B (en) | Dielectric multilayer filter | |
| CN111290064A (en) | Polarization-independent optical filter | |
| US20080013178A1 (en) | Dielectric multilayer filter | |
| US20130188254A1 (en) | Thin film optical filters with an integral air layer | |
| US7019906B2 (en) | Indium-tin oxide thin film filter for dense wavelength division multiplexing | |
| JP2025175201A (en) | Optical Filters | |
| EP2698655B1 (en) | Optical multilayered film bandpass filter | |
| JP4339755B2 (en) | Optical multilayer film bandpass filter | |
| JP2007171735A (en) | Broadband antireflection coating | |
| CN110737099B (en) | Polarization independent beam splitter | |
| CN112526656B (en) | Four-direction depolarization beam splitter prism and preparation method thereof | |
| JP3584257B2 (en) | Polarizing beam splitter | |
| CN109343167B (en) | Visible and infrared extensible polarizing prism with high extinction ratio | |
| JPS61141402A (en) | Polarized light separating film | |
| JP2004177658A (en) | Dielectric multilayer band-pass filter | |
| JP2006053200A (en) | Edge filter | |
| CN211236474U (en) | Large-angle polarization beam splitter prism | |
| CN100529801C (en) | Film layer structure of optical lens | |
| CN114089460A (en) | Low-angle offset optical filter | |
| CN113960707A (en) | Angle-tunable depolarizing filter | |
| CN115877494A (en) | Optical filter | |
| US10145999B2 (en) | Polarizing beamsplitter that passes s-polarization and reflects p-polarization | |
| CN114325910B (en) | Step characteristic passband narrowband optical filter | |
| CN112462461A (en) | Infrared band-pass filtering structure and infrared band-pass filter using same | |
| JP3113376B2 (en) | Multi-layer anti-reflective coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200616 |