CN111192803A - Ion source device for preventing ion bombardment - Google Patents
Ion source device for preventing ion bombardment Download PDFInfo
- Publication number
- CN111192803A CN111192803A CN202010128512.1A CN202010128512A CN111192803A CN 111192803 A CN111192803 A CN 111192803A CN 202010128512 A CN202010128512 A CN 202010128512A CN 111192803 A CN111192803 A CN 111192803A
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- Prior art keywords
- pole
- piece
- ion source
- anode
- magnet
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
本发明涉及离子源技术领域,具体而言,涉及一种防离子轰击的离子源装置,包括:壳体、磁铁、导磁件、阳极件、石墨阴极、第一极靴和第二极靴。壳体开设有第一凹槽;第一极靴设置于第一凹槽内,磁铁设置于第一极靴的两端并贴合于第一凹槽的内壁,导磁件设置于第一极靴与磁铁所形成的第二凹槽内,阳极件设置于导磁件的内腔,第二极靴设置于导磁件与磁铁形成的承载平台上,石墨阴极包裹于第二极靴,石墨阴极用于阻挡从阳极件发射的电子对第二极靴进行轰击。如此,离子在阳极的加速下轰击产品时,石墨阴极能够阻挡从阳极件发射的离子对第二极靴进行轰击,从而有效的保护第二极靴,同时避免对环境造成污染。
The invention relates to the technical field of ion sources, in particular, to an ion source device for preventing ion bombardment, comprising: a casing, a magnet, a magnetic conductive part, an anode part, a graphite cathode, a first pole piece and a second pole piece. The shell is provided with a first groove; the first pole piece is arranged in the first groove, the magnet is arranged at both ends of the first pole piece and is attached to the inner wall of the first groove, and the magnetic conducting member is arranged in the first pole In the second groove formed by the shoe and the magnet, the anode piece is arranged in the inner cavity of the magnetic conducting piece, the second pole piece is arranged on the bearing platform formed by the magnetic conducting piece and the magnet, the graphite cathode is wrapped in the second pole piece, the graphite The cathode serves to block the electrons emitted from the anode piece from bombarding the second pole piece. In this way, when ions bombard the product under the acceleration of the anode, the graphite cathode can prevent the ions emitted from the anode from bombarding the second pole piece, thereby effectively protecting the second pole piece and avoiding environmental pollution.
Description
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010128512.1A CN111192803B (en) | 2020-02-28 | 2020-02-28 | Ion source device for preventing ion bombardment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010128512.1A CN111192803B (en) | 2020-02-28 | 2020-02-28 | Ion source device for preventing ion bombardment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111192803A true CN111192803A (en) | 2020-05-22 |
| CN111192803B CN111192803B (en) | 2025-03-28 |
Family
ID=70710198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010128512.1A Active CN111192803B (en) | 2020-02-28 | 2020-02-28 | Ion source device for preventing ion bombardment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111192803B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112963544A (en) * | 2021-03-17 | 2021-06-15 | 清华大学 | Magnetic liquid sealing device with porous medium material layer |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080017112A1 (en) * | 2006-07-18 | 2008-01-24 | Guardian Industries Corp. | Ion source with recess in electrode |
| US20080136309A1 (en) * | 2006-12-06 | 2008-06-12 | Chu Paul K | Ion source |
| CN101447274A (en) * | 2008-09-26 | 2009-06-03 | 东莞宏威数码机械有限公司 | Magnetic circuit mechanism, magnetron sputtering cathode with same and manufacturing method |
| CN201508820U (en) * | 2009-09-22 | 2010-06-16 | 冯毓材 | Electron bombardment ion source discharge chamber |
| CN102254775A (en) * | 2011-03-29 | 2011-11-23 | 核工业西南物理研究院 | Magnetic field reinforced type linear ion source |
| CN103887133A (en) * | 2014-04-01 | 2014-06-25 | 南京迪奥赛真空科技有限公司 | Magnetic field reinforced type linear large-area ion source |
| CN109559962A (en) * | 2017-09-26 | 2019-04-02 | 深圳市鼎力真空科技有限公司 | A kind of narrow beam Linear ion source |
| CN211062682U (en) * | 2020-02-28 | 2020-07-21 | 成都国泰真空设备有限公司 | Anode layer ion source device of graphite cathode |
-
2020
- 2020-02-28 CN CN202010128512.1A patent/CN111192803B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080017112A1 (en) * | 2006-07-18 | 2008-01-24 | Guardian Industries Corp. | Ion source with recess in electrode |
| US20080136309A1 (en) * | 2006-12-06 | 2008-06-12 | Chu Paul K | Ion source |
| CN101447274A (en) * | 2008-09-26 | 2009-06-03 | 东莞宏威数码机械有限公司 | Magnetic circuit mechanism, magnetron sputtering cathode with same and manufacturing method |
| CN201508820U (en) * | 2009-09-22 | 2010-06-16 | 冯毓材 | Electron bombardment ion source discharge chamber |
| CN102254775A (en) * | 2011-03-29 | 2011-11-23 | 核工业西南物理研究院 | Magnetic field reinforced type linear ion source |
| CN103887133A (en) * | 2014-04-01 | 2014-06-25 | 南京迪奥赛真空科技有限公司 | Magnetic field reinforced type linear large-area ion source |
| CN109559962A (en) * | 2017-09-26 | 2019-04-02 | 深圳市鼎力真空科技有限公司 | A kind of narrow beam Linear ion source |
| CN211062682U (en) * | 2020-02-28 | 2020-07-21 | 成都国泰真空设备有限公司 | Anode layer ion source device of graphite cathode |
Non-Patent Citations (1)
| Title |
|---|
| 冉彪;李刘合;: "阳极层离子源的发展及应用", 真空, no. 05, 25 September 2018 (2018-09-25) * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112963544A (en) * | 2021-03-17 | 2021-06-15 | 清华大学 | Magnetic liquid sealing device with porous medium material layer |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111192803B (en) | 2025-03-28 |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20210218 Address after: 611130 group 6, Xinhua, Liucheng, Wenjiang District, Chengdu City, Sichuan Province Applicant after: Lu Cheng Address before: 611130 No. 618, Kelin West Road, Chengdu cross strait science and Technology Industrial Development Park, Wenjiang District, Chengdu City, Sichuan Province Applicant before: CHENGDU GUOTAI VACUUM EQUIPMENT Co.,Ltd. |
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| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20210715 Address after: 618 Kelin West Road, Chengdu cross strait science and Technology Industrial Development Park, Wenjiang District, Chengdu, Sichuan 610000 Applicant after: Sichuan Jincheng Guotai Vacuum Equipment Co.,Ltd. Address before: 611130 group 6, Xinhua, Liucheng, Wenjiang District, Chengdu City, Sichuan Province Applicant before: Lu Cheng |
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Effective date of registration: 20220106 Address after: 618 Kelin West Road, Chengdu cross strait science and Technology Industrial Development Park, Wenjiang District, Chengdu, Sichuan 610000 Applicant after: CHENGDU GUOTAI VACUUM EQUIPMENT CO.,LTD. Address before: 618 Kelin West Road, Chengdu cross strait science and Technology Industrial Development Park, Wenjiang District, Chengdu, Sichuan 610000 Applicant before: Sichuan Jincheng Guotai Vacuum Equipment Co.,Ltd. |
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