CN111128816A - Multifunctional quartz carrier for photoetching and processing technology thereof - Google Patents
Multifunctional quartz carrier for photoetching and processing technology thereof Download PDFInfo
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- CN111128816A CN111128816A CN201911331290.7A CN201911331290A CN111128816A CN 111128816 A CN111128816 A CN 111128816A CN 201911331290 A CN201911331290 A CN 201911331290A CN 111128816 A CN111128816 A CN 111128816A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
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Abstract
The invention discloses a processing technology of a multifunctional quartz carrier for photoetching, which comprises an inner cylinder and an outer cylinder, wherein the inner cylinder and the outer cylinder are fixedly welded into a whole, the size of the inner cylinder is smaller than that of the outer cylinder, a closed interlayer is formed between the inner cylinder and the outer cylinder, the inner cylinder comprises a first inner side plate, a second inner side plate, a third inner side plate, a fourth inner side plate and an inner bottom plate, the first inner side plate, the second inner side plate, the third inner side plate and the fourth inner side plate are fixedly welded into a whole with the inner bottom plate, the outer cylinder comprises a first outer side plate, a second outer side plate, a third outer side plate and an outer bottom plate, the first outer side plates are arranged in two numbers, and the two first outer side plates are fixedly welded with the second outer side plate, the third outer side plate and the outer bottom plate into a whole.
Description
Technical Field
The invention relates to the technical field of quartz, in particular to a multifunctional quartz carrier for photoetching and a processing technology thereof.
Background
The existing quartz cylinder is of a single-layer cylinder body structure, automatic overflow and exhaust cannot be achieved, the original cylinder body is poor in welding stability and high in breakage rate, stress generated in machining cannot be removed, the annealing times of the whole structure are multiple, and the cleaning process is complex. The application designs a novel multifunctional quartz carrier for lithography according to requirements.
Disclosure of Invention
The invention aims to provide a multifunctional quartz carrier for photoetching and a processing technology thereof, so as to solve the problems in the background technology.
The purpose of the invention is realized by the following technical scheme: a multifunctional quartz carrier for photoetching comprises an inner cylinder and an outer cylinder, wherein the inner cylinder and the outer cylinder are fixedly welded into a whole, the size of the inner cylinder is smaller than that of the outer cylinder, a closed interlayer is formed between the inner cylinder and the outer cylinder, the inner cylinder comprises a first inner side plate, a second inner side plate, a third inner side plate, a fourth inner side plate and an inner bottom plate, and the first inner side plate, the second inner side plate, the third inner side plate and the fourth inner side plate are fixedly welded into a whole with the inner bottom plate;
the outer cylinder comprises two first outer side plates, two second outer side plates, two third outer side plates and an outer bottom plate, wherein the two first outer side plates, the second outer side plates, the third outer side plates and the outer bottom plate are fixedly welded into a whole;
the inner cylinder is fixedly welded with a flange, supporting blocks are fixedly welded between the outer bottom plate and the flange, and the supporting blocks are at least 6 in number and different in size.
Furthermore, quartz nails are fixedly and symmetrically arranged on the inner bottom plate.
Furthermore, an upper rectangular through groove and a lower rectangular through groove are fixedly and symmetrically formed in the first inner side plate, a first punching plate is fixedly welded in the upper rectangular through groove, and a second punching plate is fixedly welded in the lower rectangular through groove.
Further, arc through holes are fixedly formed at the bottoms of the first inner side plate and the second inner side plate, and the arc through holes are fixedly welded with the first flow guide pipe and the second flow guide pipe into a whole;
the first flow guide pipe is L-shaped and is fixedly welded with a second flow guide branch pipe into a whole, and a plurality of through holes are fixedly formed in the second flow guide branch pipe;
the second flow guide pipe is of a frame structure and is fixedly welded with the fourth flow guide branch pipe into a whole, and the first flow guide branch pipe is fixedly provided with a plurality of through holes.
Furthermore, the flange is formed by welding a plurality of flange plates with different sizes, two through holes are fixedly formed in the flange and are positioned on the same central axis with the through holes in the outer bottom plate, and a first vent pipe and a second vent pipe are fixedly welded in the through holes in an inserting mode;
the first vent pipe and the second vent pipe are positioned on the outer side of the inner cylinder;
the first vent pipe penetrates through the through hole in the outer bottom plate and extends into a closed interlayer formed between the inner cylinder and the outer cylinder, and the second vent pipe extends to the bottom surface of the outer bottom plate and is communicated with the outer bottom plate.
Further, the joints of four sides of the first inner side plate, the second inner side plate, the third inner side plate and the fourth inner side plate are fixedly welded with quartz blocks, and the two sides of each quartz block are chamfered on single sides.
Furthermore, a plurality of arc slotted holes are fixed at the upper ends of the first inner side plate, the second inner side plate, the third inner side plate and the fourth inner side plate;
the bottom edges of the first inner side plate and the second inner side plate are fixedly provided with an inclination angle;
and a bead is fixedly arranged on the third inner side plate and matched with the bead on the inner bottom plate.
Furthermore, the number of the first outer side plates is two, and the bottom edges of the first outer side plates are fixedly provided with inclined angles.
Furthermore, through holes are fixedly formed in the first perforated plate and the second perforated plate, and the size of the first perforated plate is larger than that of the second perforated plate.
A processing technology of a multifunctional quartz carrier for photoetching comprises the following steps:
1) blanking all parts integrally, soaking by 2% HF, and cleaning by pure water;
2) fully annealing the flange, keeping the temperature for 120 minutes, and chamfering;
3) soaking the flow guide pipe by 2% HF, cleaning with pure water, sealing the end and connecting the pipe (annealing by a lathe) (paying attention to the pipe orifice after processing to be flush), soaking by 2% HF, cleaning with pure water, punching, fully annealing, and keeping the temperature for 120 minutes;
3) soaking the punched plate by 27% HF, cleaning by pure water, fully annealing, keeping the temperature for 120 minutes, and chamfering;
4) machining and cutting the vent pipe;
5) soaking the quartz block in 2% HF, cleaning with pure water, fully annealing, keeping the temperature for 120 minutes, processing a threaded hole, and chamfering;
6) soaking the supporting block by 2% HF, cleaning by pure water, fully annealing, keeping the temperature for 120 minutes, and chamfering;
7) quartz nail lathe threaded hole
8) Assembling the inner cylinder body-the outer flange, fully annealing, keeping the temperature for 120 minutes, soaking by 2% HF, and cleaning by pure water;
9) assembling, auxiliary welding of a flange, an air pipe and a flow guide pipe, full annealing, constant temperature maintaining for 120 minutes, 2% HF soaking, and pure water cleaning;
10) polishing the whole, fully annealing, keeping the temperature for 120 minutes, checking the stress, checking the appearance, checking the size according to a finished product drawing, and finally cleaning, drying and packaging the inner bag.
Compared with the prior art, the invention has the beneficial effects that: compared with other quartz cylinders, the product is more complex to process, more in parts and more complete in function. For example, the bubbling function is added to make the liquid in the cylinder more uniform in fluidity, and the stirring function is realized. In addition, the temperature measuring function is added, and the use convenience is greatly enhanced. The water is gone into and goes out to a plurality of mouths of pipe, can increase different liquid when using the product, no longer is single liquid and manual injection during the use, and the technical requirement and the ability requirement to product processing have also been improved to the complexity of this product simultaneously.
Drawings
FIG. 1 is an overall front view of the present invention;
FIG. 2 is a top view of the present invention;
FIG. 3 is a side view of the present invention;
FIG. 4 is a schematic view of a first draft tube of the present invention;
FIG. 5 is a schematic view of a second draft tube of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments, and all other embodiments obtained by a person of ordinary skill in the art without creative efforts based on the embodiments of the present invention belong to the protection scope of the present invention.
As shown in fig. 1-5, a multifunctional quartz carrier for lithography comprises an inner cylinder and an outer cylinder, wherein the inner cylinder and the outer cylinder are fixedly welded into a whole, the size of the inner cylinder is smaller than that of the outer cylinder, a closed interlayer is formed between the inner cylinder and the outer cylinder, the inner cylinder comprises a first inner side plate 1, a second inner side plate 2, a third inner side plate 3, a fourth inner side plate 4 and an inner bottom plate 5, and the first inner side plate 1, the second inner side plate 2, the third inner side plate 3, the fourth inner side plate 4 and the inner bottom plate 5 are fixedly welded into a whole;
the outer cylinder comprises two first outer side plates 6, two second outer side plates 7, two third outer side plates 8 and two outer bottom plates 9, wherein the two first outer side plates 6, the second outer side plates 7, the third outer side plates 8 and the outer bottom plates 9 are fixedly welded into a whole;
the inner cylinder is fixedly welded with a flange 10, supporting blocks 11 are fixedly welded between the outer bottom plate 9 and the flange 10, and the supporting blocks 11 are at least 6 and different in size.
In this embodiment, quartz pins 12 are fixed and symmetrically arranged on the inner bottom plate 5.
In this embodiment, the first inner side plate 1 is fixed and symmetrically provided with an upper rectangular through groove and a lower rectangular through groove, the upper rectangular through groove is fixedly welded with the first perforated plate 13, and the lower rectangular through groove is fixedly welded with the second perforated plate 14.
In this embodiment, the bottom of the first inner side plate 1 and the bottom of the second inner side plate 2 are fixedly provided with arc through holes, and the arc through holes are fixedly welded with the first draft tube 16 and the second draft tube 17 into a whole;
the first flow guide pipe 16 is L-shaped and is fixedly welded with a first flow guide branch pipe 161 and a second flow guide branch pipe 162 into a whole, and a plurality of through holes are fixedly formed in the second flow guide branch pipe 162;
the second flow guide pipe 17 is a frame-shaped structure and is fixedly welded with a third flow guide branch pipe 171 and a fourth flow guide branch pipe 172 into a whole, and a plurality of through holes are fixedly formed in the first flow guide branch pipe 172.
In this embodiment, the flange 10 is formed by welding a plurality of flange plates with different sizes, two through holes are fixedly formed in the flange 10 and are positioned on the same central axis with the through hole in the outer bottom plate 9, and a first vent pipe 18 and a second vent pipe 19 are fixedly welded in the through holes in an inserting manner;
the first vent pipe 18 and the second vent pipe 19 are positioned outside the inner cylinder;
the first vent pipe 18 passes through the through hole on the outer bottom plate 9 and extends into the closed interlayer formed between the inner cylinder and the outer cylinder, and the second vent pipe 19 extends to the bottom surface of the outer bottom plate 9 and is communicated with the outer bottom plate 9.
In this embodiment, the quartz block 20 is fixedly welded at the four-side connection of the first inner side plate 1, the second inner side plate 2, the third inner side plate 3 and the fourth inner side plate 4, and two sides of the quartz block 20 are chamfered.
In this embodiment, a plurality of arc slot holes are fixedly formed at the upper ends of the first inner side plate 1, the second inner side plate 2, the third inner side plate 3 and the fourth inner side plate 4;
the bottom edges of the first inner side plate 1 and the second inner side plate 2 are fixedly provided with an inclination angle;
and a bead is fixedly arranged on the third inner side plate 3 and matched with the bead on the inner bottom plate 5.
In this embodiment, two first outer panels 6 are provided, and the bottom edge of the first outer panel 6 is fixedly provided with an inclined angle.
In this embodiment, the first perforated plate 13 and the second perforated plate 14 are fixed with through holes, and the size of the first perforated plate 13 is larger than that of the second perforated plate 14.
A processing technology of a multifunctional quartz carrier for photoetching comprises the following steps:
1) blanking all parts integrally, soaking by 2% HF, and cleaning by pure water;
2) fully annealing the flange, keeping the temperature for 120 minutes, and chamfering;
3) soaking the flow guide pipe by 2% HF, cleaning with pure water, sealing the end and connecting the pipe (annealing by a lathe) (paying attention to the pipe orifice after processing to be flush), soaking by 2% HF, cleaning with pure water, punching, fully annealing, and keeping the temperature for 120 minutes;
3) soaking the punched plate in 2% HF, washing with pure water, fully annealing, keeping the temperature for 120 minutes, and chamfering;
4) machining and cutting the vent pipe;
5) soaking the quartz block in 2% HF, cleaning with pure water, fully annealing, keeping the temperature for 120 minutes, processing a threaded hole, and chamfering;
6) soaking the supporting block in 2% HF, washing with pure water, annealing, maintaining the temperature for 120 min, and chamfering;
7) quartz nail lathe threaded hole
8) Assembling the inner cylinder body-the outer flange, fully annealing, keeping the temperature for 120 minutes, soaking by 2% HF, and cleaning by pure water;
9) assembling, auxiliary welding of a flange, an air pipe and a flow guide pipe, full annealing, constant temperature maintaining for 120 minutes, 2% HF soaking, and pure water cleaning;
10) polishing the whole, fully annealing, keeping the temperature for 120 minutes, checking the stress, checking the appearance, checking the size according to a finished product drawing, and finally cleaning, drying and packaging the inner bag.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (10)
1. A multifunctional quartz carrier for lithography is characterized in that: the quartz carrier comprises an inner cylinder and an outer cylinder, wherein the inner cylinder and the outer cylinder are fixedly welded into a whole, the size of the inner cylinder is smaller than that of the outer cylinder, a closed interlayer is formed between the inner cylinder and the outer cylinder, the inner cylinder comprises a first inner side plate (1), a second inner side plate (2), a third inner side plate (3), a fourth inner side plate (4) and an inner bottom plate (5), and the first inner side plate (1), the second inner side plate (2), the third inner side plate (3), the fourth inner side plate (4) and the inner bottom plate (5) are fixedly welded into a whole;
the outer cylinder comprises two first outer side plates (6), two second outer side plates (7), two third outer side plates (8) and an outer bottom plate (9), wherein the two first outer side plates (6), the second outer side plates (7), the third outer side plates (8) and the outer bottom plate (9) are fixedly welded into a whole;
the inner cylinder is fixedly welded with a flange (10), supporting blocks (11) are fixedly welded between the outer bottom plate (9) and the flange (10), and the supporting blocks (11) are at least 6 and different in size.
2. The multifunctional quartz carrier for lithography according to claim 1, wherein: the inner bottom plate (5) is fixedly and symmetrically provided with quartz nails (12).
3. The multifunctional quartz carrier for lithography according to claim 1, wherein: an upper rectangular through groove and a lower rectangular through groove are fixedly and symmetrically formed in the first inner side plate (1), a first punching plate (13) is fixedly welded in the upper rectangular through groove, and a second punching plate (14) is fixedly welded in the lower rectangular through groove.
4. The multifunctional quartz carrier for lithography according to claim 1, wherein: arc through holes are fixedly formed at the bottoms of the first inner side plate (1) and the second inner side plate (2), and the arc through holes are fixedly welded with the first guide pipe (16) and the second guide pipe (17) into a whole;
the first flow guide pipe (16) is L-shaped, and is fixedly welded into a whole by a first flow guide branch pipe (161) and a second flow guide branch pipe (162), and a plurality of through holes are fixedly formed in the second flow guide branch pipe (162);
the second flow guide pipe (17) is of a frame-shaped structure, a third flow guide branch pipe (171) and a fourth flow guide branch pipe (172) are fixedly welded into a whole, and a plurality of through holes are fixedly formed in the first flow guide branch pipe (172).
5. The multifunctional quartz carrier for lithography according to claim 1, wherein: the flange (10) is formed by welding a plurality of flange plates with different sizes, two through holes are fixedly formed in the flange (10) and are positioned on the same central axis with the through holes in the outer bottom plate (9), and a first vent pipe (18) and a second vent pipe (19) are fixedly welded in the through holes in an inserting mode;
the first vent pipe (18) and the second vent pipe (19) are positioned outside the inner cylinder;
the first vent pipe (18) penetrates through the through hole in the outer bottom plate (9) and extends into a closed interlayer formed between the inner cylinder and the outer cylinder, and the second vent pipe (19) extends to the bottom surface of the outer bottom plate (9) and is communicated with the outer bottom plate (9).
6. The multifunctional quartz carrier for lithography according to claim 1, wherein: the quartz plate is characterized in that quartz blocks (20) are fixedly welded at four edge joints of the first inner side plate (1), the second inner side plate (2), the third inner side plate (3) and the fourth inner side plate (4), and single-side chamfers are arranged on two sides of each quartz block (20).
7. The multifunctional quartz carrier for lithography according to claim 1, wherein: a plurality of arc slotted holes are fixedly formed at the upper ends of the first inner side plate (1), the second inner side plate (2), the third inner side plate (3) and the fourth inner side plate (4);
the bottom edges of the first inner side plate (1) and the second inner side plate (2) are fixedly provided with an inclination angle;
and a bead is fixedly arranged on the third inner side plate (3) and matched with the bead on the inner bottom plate (5).
8. The multifunctional quartz carrier for lithography according to claim 1, wherein: the number of the first outer side plates (6) is two, and the bottom edges of the first outer side plates (6) are fixedly provided with inclined angles.
9. The multifunctional quartz carrier for lithography according to claim 1, wherein: through holes are fixedly formed in the first perforated plate (13) and the second perforated plate (14), and the size of the first perforated plate (13) is larger than that of the second perforated plate (14).
10. The process for manufacturing a multifunctional quartz carrier for lithography according to claims 1 to 9, wherein the process comprises the following steps:
1) blanking all parts integrally, soaking by 2% HF, and cleaning by pure water;
2) fully annealing the flange, keeping the temperature for 120 minutes, and chamfering;
3) soaking the flow guide pipe by 2% HF, cleaning with pure water, sealing the end and connecting the pipe (annealing by a lathe) (paying attention to the pipe orifice after processing to be flush), soaking by 2% HF, cleaning with pure water, punching, fully annealing, and keeping the temperature for 120 minutes;
3) soaking the punched plate in 2% HF, washing with pure water, fully annealing, keeping the temperature for 120 minutes, and chamfering;
4) machining and cutting the vent pipe;
5) soaking the quartz block in 2% HF, cleaning with pure water, fully annealing, keeping the temperature for 120 minutes, processing a threaded hole, and chamfering;
6) soaking the supporting block by 2% HF, cleaning by pure water, fully annealing, keeping the temperature for 120 minutes, and chamfering;
7) quartz nail lathe threaded hole
8) Assembling the inner cylinder body-the outer flange, fully annealing, keeping the temperature for 120 minutes, soaking by 2% HF, and cleaning by pure water;
9) assembling, auxiliary welding of a flange, an air pipe and a flow guide pipe, full annealing, constant temperature maintaining for 120 minutes, 2% HF soaking, and pure water cleaning;
10) polishing the whole, fully annealing, keeping the temperature for 120 minutes, checking the stress, checking the appearance, checking the size according to a finished product drawing, and finally cleaning, drying and packaging the inner bag.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911331290.7A CN111128816A (en) | 2019-12-21 | 2019-12-21 | Multifunctional quartz carrier for photoetching and processing technology thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911331290.7A CN111128816A (en) | 2019-12-21 | 2019-12-21 | Multifunctional quartz carrier for photoetching and processing technology thereof |
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| Publication Number | Publication Date |
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| CN111128816A true CN111128816A (en) | 2020-05-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201911331290.7A Pending CN111128816A (en) | 2019-12-21 | 2019-12-21 | Multifunctional quartz carrier for photoetching and processing technology thereof |
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| CN101819920A (en) * | 2009-02-27 | 2010-09-01 | 株式会社日立国际电气 | Substrate processing device |
| CN102184840A (en) * | 2011-05-11 | 2011-09-14 | 苏州凯西石英电子有限公司 | Method for manufacturing dual-layer quartz cylinder |
| US20140120487A1 (en) * | 2012-10-31 | 2014-05-01 | Tokyo Electron Limited | Heat treatment apparatus |
| CN104902592A (en) * | 2015-05-07 | 2015-09-09 | 合肥彩虹蓝光科技有限公司 | High-temperature quartz heating trough and manufacturing method |
| CN208023116U (en) * | 2018-02-23 | 2018-10-30 | 苏州浩锐石英科技有限公司 | A kind of double-deck quartzy rinse bath |
| CN212113653U (en) * | 2019-12-21 | 2020-12-08 | 北京凯德石英股份有限公司 | Multifunctional quartz carrier for photoetching |
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2019
- 2019-12-21 CN CN201911331290.7A patent/CN111128816A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020056414A1 (en) * | 2000-10-12 | 2002-05-16 | Kyu-Hwan Shim | Apparatus for perpendicular-type ultra vacuum chemical vapor deposition |
| CN101338414A (en) * | 2007-06-29 | 2009-01-07 | 应用材料股份有限公司 | Thermal batch reactor with removable base |
| CN101819920A (en) * | 2009-02-27 | 2010-09-01 | 株式会社日立国际电气 | Substrate processing device |
| CN102184840A (en) * | 2011-05-11 | 2011-09-14 | 苏州凯西石英电子有限公司 | Method for manufacturing dual-layer quartz cylinder |
| US20140120487A1 (en) * | 2012-10-31 | 2014-05-01 | Tokyo Electron Limited | Heat treatment apparatus |
| CN104902592A (en) * | 2015-05-07 | 2015-09-09 | 合肥彩虹蓝光科技有限公司 | High-temperature quartz heating trough and manufacturing method |
| CN208023116U (en) * | 2018-02-23 | 2018-10-30 | 苏州浩锐石英科技有限公司 | A kind of double-deck quartzy rinse bath |
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