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CN110408913B - Pressure control device of tubular PECVD equipment - Google Patents

Pressure control device of tubular PECVD equipment Download PDF

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Publication number
CN110408913B
CN110408913B CN201910790348.8A CN201910790348A CN110408913B CN 110408913 B CN110408913 B CN 110408913B CN 201910790348 A CN201910790348 A CN 201910790348A CN 110408913 B CN110408913 B CN 110408913B
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Prior art keywords
main
pipeline
reaction chamber
pump
valve
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CN110408913A (en
Inventor
肖洁
吴德轶
朱辉
成秋云
张春成
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Hunan Red Sun Photoelectricity Science and Technology Co Ltd
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Hunan Red Sun Photoelectricity Science and Technology Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)

Abstract

The invention discloses a pressure control device of tubular PECVD equipment, which comprises at least one group of reaction chambers, wherein each group of reaction chambers is correspondingly provided with a VAT valve and a main suction pump, each group of reaction chambers share one pre-suction pump, each group of reaction chambers comprises a first reaction chamber and a second reaction chamber, the first reaction chamber in each group of reaction chambers is communicated with the main suction pump through a first main pipeline, the second reaction chamber is communicated with the main suction pump through a second main pipeline, the first main pipeline and the second main pipeline are connected in parallel to form a confluence pipeline, the confluence pipeline is connected with the main suction pump, the VAT valve is arranged on the confluence pipeline, the first reaction chambers in each group of reaction chambers are connected with the pre-suction pumps through first branch pipelines, and the second reaction chambers in each group of reaction chambers are connected with the pre-suction pumps through second branch pipelines. The core of the invention is that when two pipes share the main pump, the technological process is staggered, namely only one main pump works as a reaction chamber at any time, and the other pipe works by using the pre-pump at the rest time, thereby greatly reducing the cost of equipment.

Description

Pressure control device of tubular PECVD equipment
Technical Field
The invention relates to tubular PECVD equipment in photovoltaic manufacturing, in particular to a pressure control device of the tubular PECVD equipment.
Background
In recent years, with the rapid development of the photovoltaic industry in China, photovoltaic products have come into our lives, the popularization of the photovoltaic products is accompanied by the reduction of product cost, and most of the cost for producing the cell slice comes from equipment, so how to reduce the equipment cost by a method becomes an important aspect of the research of the photovoltaic equipment at present.
The existing general tubular PECVD is provided with one pump for each tube (reaction chamber), each tube is independently controlled, the cost is higher, and the technical scheme is that two tubes share one vacuum pump with higher power, namely, one pump is used for pumping two tubes simultaneously. The cost of the scheme is lower than that of the first scheme, but the power of the pump is increased compared with the original power, the cost is not reduced, and how to realize the two-tube vacuum pumping by using the pump without power becomes the key for reducing the cost.
Disclosure of Invention
The technical problem to be solved by the invention is to overcome the defects of the prior art and provide a pressure control device of tubular PECVD equipment, which effectively reduces the cost.
In order to solve the technical problems, the invention adopts the following technical scheme:
the utility model provides a pressure control device of tubular PECVD equipment, includes at least a set of reaction chamber, every group reaction chamber corresponds and is equipped with VAT valve and main pumper, and each group reaction chamber sharing pumper in advance, every group reaction chamber includes first reaction chamber and second reaction chamber, and the first reaction chamber in every group reaction chamber is through first main line and main pumper intercommunication, and the second reaction chamber in every group reaction chamber is through second main line and main pumper intercommunication, and first main line and second main line are parallelly connected and form the pipeline of converging, the pipeline of converging is connected with main pumper, the VAT valve is located on the pipeline of converging, and the first reaction chamber in each group reaction chamber all is connected with the pumper in advance through first branch pipeline, and the second reaction chamber in each group reaction chamber all is connected with the pumper in advance through second branch pipeline.
As a further improvement of the above technical solution:
the first main pipeline is provided with a first film gauge.
The first branch line is arranged on the first main line and is located at the upstream of the VAT valve, and the first film gauge is located at the upstream of the first branch line.
And a second film gauge is arranged on the second main pipeline.
The second branch pipeline is arranged on the second main pipeline and is positioned at the upstream of the VAT valve, and the second film gauge is positioned at the upstream of the second branch pipeline.
And a first pressure valve is arranged at the position of the first main pipeline corresponding to the first film gauge.
And a second pressure valve is arranged at the position of the second main pipeline corresponding to the second film gauge.
And a first main pumping valve is arranged between the first branch pipeline and the confluence pipeline on the first main pipeline, and a second main pumping valve is arranged between the second branch pipeline and the confluence pipeline on the second main pipeline.
And a first pre-pumping valve is arranged on the first branch pipeline, and a second pre-pumping valve is arranged on the second branch pipeline.
Compared with the prior art, the invention has the advantages that:
the pressure control device of the tubular PECVD equipment utilizes a low-power pump to pump vacuum of two tubes, and simultaneously adds a common pre-pump, for example, ten tubes share 6 pumps, thereby achieving the purpose of reducing the cost. Meanwhile, the vacuum pipelines of the two pipes are integrated, so that the occupied space is reduced, and the integration degree of the equipment is higher.
Drawings
FIG. 1 is a schematic diagram of a set of reaction chambers in the present invention.
FIG. 2 is a schematic diagram of two sets of reaction chambers in the present invention.
Fig. 3 is a schematic structural diagram of the interfaces between the pipes and the valves in the present invention.
The reference numerals in the figures denote:
1. a VAT valve; 2. a main pump; 3. a pre-pump; 4. a first reaction chamber; 5. a second reaction chamber; 6. a first main pipeline; 7. a second main pipeline; 8. a confluence pipeline; 9. a first branch line; 10. a second branch pipe; 11. a first film gauge; 12. a second film gauge; 13. a first pressure valve; 14. a second pressure valve; 15. a first main suction valve; 16. a second main suction valve; 17. a first pre-pumping valve; 18. a second pre-pump valve.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples of the specification.
The pressure control device of the tubular PECVD apparatus of the present embodiment is exemplified by having five sets (ten tubes) of reaction chambers. Each group of reaction chambers is correspondingly provided with a VAT valve 1 and a main suction pump 2, five groups of reaction chambers share one pre-suction pump 3, each group of reaction chambers comprises a first reaction chamber 4 and a second reaction chamber 5, the first reaction chamber 4 in each group of reaction chambers is communicated with the main suction pump 2 through a first main pipeline 6, the second reaction chamber 5 in each group of reaction chambers is communicated with the main suction pump 2 through a second main pipeline 7, the first main pipeline 6 is connected with the second main pipeline 7 in parallel to form a confluence pipeline 8, the confluence pipeline 8 is connected with the main suction pump 2, the VAT valve 1 is arranged on the confluence pipeline 8, the first reaction chambers 4 in the five groups of reaction chambers are connected with the pre-suction pump 3 through first branch pipelines 9, and the second reaction chambers 5 in the five groups of reaction chambers are connected with the pre-suction pump 3 through second branch pipelines 10. The VAT valve 1 is a precision control butterfly valve for controlling the pressure in the first 4 and second 5 reaction chambers.
FIG. 1 shows a schematic diagram of one of the five reaction chambers, FIG. 2 shows a schematic diagram of two of the five reaction chambers, and the remaining three reaction chambers are connected similarly. Every two pipes in ten pipes (reaction chambers) share one low-power main suction pump 2 for main suction, one high-power pre-suction pump 3 is used for pre-suction shared by the ten pipes, so that only 6 pumps are needed totally, when the two pipes work, the process time of the two pipes is staggered, when the first reaction chamber 4 carries out a process, the first main pipeline 6 is connected (the main suction pump 2 and the VAT valve 1 need to be opened during the process, at the moment, the internal pressure of the first reaction chamber 4 is accurately controlled, namely the low-power main suction pump 2 is applied), the first branch pipeline 9 is disconnected, the second reaction chamber 5 only needs to carry out pre-suction, the second branch pipeline 10 is connected (the high-power pre-suction pump 3 is used, at the moment, the internal pressure of the second reaction chamber 5 does not need to be accurately controlled, and a certain vacuum degree is reached), and the second main pipeline 7 is disconnected.
When the process time of the first reaction chamber 4 is finished, the first main pipeline 6 is cut off, the first branch pipeline 9 is connected, the first reaction chamber 4 is connected with the pre-pumping pump 3 and is cut off from the main pumping pump 2, the pre-pumping stage is carried out, meanwhile, the second main pipeline 7 is connected, the second branch pipeline 10 is cut off, the second reaction chamber 5 is connected with the main pumping pump 2 and is cut off from the pre-pumping pump 3, the main pumping can be carried out after the pre-pumping of the second reaction chamber 5 is finished, and the low-power main pumping pump 2 and the shared VAT valve 1 are used for carrying out the process. After the first reaction chamber 41 is pre-pumped, the next cycle can be entered.
The invention utilizes a low-power pump to pump vacuum of two pipes on the premise of considering the defects of the prior art, and a common pre-pump is added, so that ten pipes share 6 pumps (5 small and 1 large), and the purpose of reducing the cost is achieved (in the prior art, 10 small pumps or 5 high-power pumps). The core of the invention lies in that on the premise of not influencing the normal process flow of the reaction chamber, the cost of the equipment is greatly reduced, because when two pipes share the main pump 2, the process is staggered, which means that only one main pump 2 works for one reaction chamber at any time, and the other pipe works by using the shared pre-pump 3 at the rest time.
In this embodiment, the first main pipe 6 is provided with a first film gauge 11. A first branch line 9 is provided on the first main line 6 upstream of the VAT valve 1, and a first membrane gauge 11 is provided upstream of the first branch line 9. The second main pipeline 7 is provided with a second film gauge 12. A second branch line 10 is provided on the second main line 7 upstream of the VAT valve 1, and a second membrane gauge 12 is provided upstream of the second branch line 10. The first gauge 11 is used to measure the pressure in the first reaction chamber 4, the second gauge 12 is used to measure the pressure in the second reaction chamber 5, the measured pressures are fed back to the controller, the controller feeds back to the VAT valve 1 according to the pressure values, and the VAT valve 1 regulates the pressure in each reaction chamber.
In this embodiment, the first main pipe 6 is provided with a first pressure valve 13 at a position corresponding to the first gauge 11. The second main pipe 7 is provided with a second pressure valve 14 at a position corresponding to the second film gauge 12. When the first reaction chamber 4 does not perform the process preparation pre-pumping, the precision requirement is not high, and the first pressure valve 13 can be used for detection, and similarly, when the second reaction chamber 5 does not perform the process preparation pre-pumping, the precision requirement is not high, and the second pressure valve 14 can be used for detection. The first and second film gauges 11 and 12 are detected while the first and second reaction chambers 4 and 5 are performing a process (main pumping).
In this embodiment, a first main pumping valve 15 is disposed on the first main pipeline 6 between the first branch pipeline 9 and the collecting pipeline 8, and a second main pumping valve 16 is disposed on the second main pipeline 7 between the second branch pipeline 10 and the collecting pipeline 8. The first branch pipeline 9 is provided with a first pre-pumping valve 17, and the second branch pipeline 10 is provided with a second pre-pumping valve 18. The on-off of each pipeline is controlled by each valve.
Fig. 3 is a structural diagram of each valve and pipeline in the embodiment. a is a port of a common main pump 2 of the fifth layer, b is a port of a two-tube reaction chamber of the fifth layer, c is a VAT valve 7 of the fifth layer, d is a port of two pre-pump valves of the fifth layer, e is a port of the common main pump 2 of the first layer to the fourth layer, f is a port of a common pre-pump 3 of ten tubes, and a pre-pump pipeline of each layer is connected to a port f of the pre-pump 3 through a port d of the pre-pump valve (d is the fifth layer, and other layers are similar). The vacuum pipelines of the two pipes are integrated, so that the occupied space is reduced, and the integration degree of the equipment is higher.
It should be noted that, in this embodiment, a common ten-tube five-group reaction chamber is taken as an example, and besides this embodiment, there may be more or less than five groups.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Those skilled in the art can make numerous possible variations and modifications to the present invention, or modify equivalent embodiments to equivalent variations, without departing from the scope of the invention, using the teachings disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.

Claims (5)

1. A pressure control device of tubular PECVD equipment is characterized in that: the device comprises a plurality of groups of reaction chambers, each group of reaction chambers is correspondingly provided with a VAT valve (1) and a main pump (2), each group of reaction chambers shares a pre-pump (3), each group of reaction chambers comprises a first reaction chamber (4) and a second reaction chamber (5), the first reaction chamber (4) in each group of reaction chambers is communicated with the main pump (2) through a first main pipeline (6), the second reaction chamber (5) in each group of reaction chambers is communicated with the main pump (2) through a second main pipeline (7), the first main pipeline (6) and the second main pipeline (7) are connected in parallel to form a confluence pipeline (8), the confluence pipeline (8) is connected with the main pump (2), the VAT valve (1) is arranged on the confluence pipeline (8) and used for controlling the pressure of the first reaction chamber (4) and the second reaction chamber (5), and the first reaction chamber (4) in each group of reaction chambers is connected with the pre-pump (3) through a first branch pipeline (9), the second reaction chamber (5) in each group of reaction chambers is connected with the pre-pumping pump (3) through a second branch pipeline (10), a first film gauge (11) is arranged on the first main pipeline (6), a second film gauge (12) is arranged on the second main pipeline (7), the first film gauge 11 is used for measuring the pressure of the first reaction chamber (4) when the process is performed, the second film gauge 12 is used for measuring the pressure of the second reaction chamber (5) when the process is performed, a first pressure valve (13) is arranged at the position of the first main pipeline (6) corresponding to the first film gauge (11), a second pressure valve (14) is arranged at the position of the second main pipeline (7) corresponding to the second film gauge (12), the first pressure valve 13 is used for detecting when the pre-pumping is not performed on the first reaction chamber (4), and the second pressure valve 14 is used for detecting when the pre-pumping is not performed on the second reaction chamber (5).
2. The pressure control apparatus for tubular PECVD equipment as claimed in claim 1, wherein: the first branch pipeline (9) is arranged on the first main pipeline (6) and is located at the upstream of the VAT valve (1), and the first film gauge (11) is located at the upstream of the first branch pipeline (9).
3. The pressure control apparatus for tubular PECVD equipment as claimed in claim 1, wherein: the second branch pipeline (10) is arranged on the second main pipeline (7) and is located at the upstream of the VAT valve (1), and the second film gauge (12) is located at the upstream of the second branch pipeline (10).
4. The pressure control apparatus for a tubular PECVD apparatus according to any one of claims 1 to 3, characterized in that: a first main pumping valve (15) is arranged on the first main pipeline (6) between the first branch pipeline (9) and the confluence pipeline (8), and a second main pumping valve (16) is arranged on the second main pipeline (7) between the second branch pipeline (10) and the confluence pipeline (8).
5. The pressure control apparatus for a tubular PECVD apparatus according to any one of claims 1 to 3, characterized in that: and a first pre-pumping valve (17) is arranged on the first branch pipeline (9), and a second pre-pumping valve (18) is arranged on the second branch pipeline (10).
CN201910790348.8A 2019-08-26 2019-08-26 Pressure control device of tubular PECVD equipment Active CN110408913B (en)

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CN110408913B true CN110408913B (en) 2021-09-10

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113416944B (en) * 2021-06-22 2022-04-19 江苏微导纳米科技股份有限公司 Coating equipment and its working method

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US7585141B2 (en) * 2005-02-01 2009-09-08 Varian Semiconductor Equipment Associates, Inc. Load lock system for ion beam processing
CN102741975A (en) * 2010-04-30 2012-10-17 应用材料公司 Twin chamber processing system
JP2015045075A (en) * 2013-08-29 2015-03-12 株式会社アルバック Film deposition device and film deposition method
CN105552001A (en) * 2015-12-10 2016-05-04 武汉华星光电技术有限公司 Vacuum system
JP2017089512A (en) * 2015-11-11 2017-05-25 株式会社アルバック Evacuation device
CN107675145A (en) * 2017-11-23 2018-02-09 湖南顶立科技有限公司 A kind of vacuum equipment pressure regulator control system and vacuum equipment
CN109023305A (en) * 2018-08-28 2018-12-18 湖南红太阳光电科技有限公司 The Tubular PECVD device of resource sharing between a kind of pipe

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JPH11230036A (en) * 1998-02-18 1999-08-24 Ebara Corp Evacuating system
DE102017214687A1 (en) * 2017-08-22 2019-02-28 centrotherm international AG Processing apparatus for substrates and method for operating such a treatment apparatus

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Publication number Priority date Publication date Assignee Title
US5575853A (en) * 1994-07-01 1996-11-19 Tokyo Electron Limited Vacuum exhaust system for processing apparatus
US7585141B2 (en) * 2005-02-01 2009-09-08 Varian Semiconductor Equipment Associates, Inc. Load lock system for ion beam processing
CN102741975A (en) * 2010-04-30 2012-10-17 应用材料公司 Twin chamber processing system
JP2015045075A (en) * 2013-08-29 2015-03-12 株式会社アルバック Film deposition device and film deposition method
JP2017089512A (en) * 2015-11-11 2017-05-25 株式会社アルバック Evacuation device
CN105552001A (en) * 2015-12-10 2016-05-04 武汉华星光电技术有限公司 Vacuum system
CN107675145A (en) * 2017-11-23 2018-02-09 湖南顶立科技有限公司 A kind of vacuum equipment pressure regulator control system and vacuum equipment
CN109023305A (en) * 2018-08-28 2018-12-18 湖南红太阳光电科技有限公司 The Tubular PECVD device of resource sharing between a kind of pipe

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