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CN110349933A - A kind of encapsulating structure and preparation method of wafer bonding stacked chips - Google Patents

A kind of encapsulating structure and preparation method of wafer bonding stacked chips Download PDF

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Publication number
CN110349933A
CN110349933A CN201910667794.XA CN201910667794A CN110349933A CN 110349933 A CN110349933 A CN 110349933A CN 201910667794 A CN201910667794 A CN 201910667794A CN 110349933 A CN110349933 A CN 110349933A
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Prior art keywords
wafer
bonding
chip
packaging structure
level
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任玉龙
曹立强
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Shanghai Xianfang Semiconductor Co Ltd
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Shanghai Xianfang Semiconductor Co Ltd
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Priority to CN201910667794.XA priority Critical patent/CN110349933A/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/732Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between stacked chips

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

本发明公开了一种晶圆键合堆叠芯片的封装结构及制备方法,封装结构包括,芯片键合体,包括堆叠设置的多个单体晶圆级芯片,所述单体晶圆级芯片之间通过键合层键合,即晶圆键合后形成堆叠芯片;导电通孔,实现堆叠芯片焊盘功能引出端子连通,本发明实施例提供的封装结构由晶圆键合形成的堆叠芯片通过侧壁信号互连,封装体积小。本发明实施例提供的制备方法,无需复杂TSV工艺,避免了由于对芯片直接或间接制作通孔导致的芯片内应力及损伤问题,制程过程简单,产能高。

The invention discloses a packaging structure and a preparation method of a wafer bonding stacked chip. The packaging structure includes a chip bonding body, including a plurality of single wafer level chips arranged in a stack, and between the single wafer level chips Bonding through the bonding layer, that is, after wafer bonding, a stacked chip is formed; conductive through holes are used to realize the connection of the lead-out terminals of the stacked chip pad function. The packaging structure provided by the embodiment of the present invention is formed by wafer bonding. Wall signal interconnection, small package size. The preparation method provided by the embodiment of the present invention does not require a complicated TSV process, avoids the problem of internal stress and damage to the chip caused by directly or indirectly making through holes on the chip, and has a simple manufacturing process and high productivity.

Description

一种晶圆键合堆叠芯片的封装结构及制备方法A packaging structure and preparation method of a wafer bonded stacked chip

技术领域technical field

本发明涉及半导体封装技术领域,具体涉及一种晶圆键合堆叠芯片的封装结构及制备方法。The invention relates to the technical field of semiconductor packaging, in particular to a packaging structure and a preparation method of a wafer-bonded stacked chip.

背景技术Background technique

近几年来,在3D芯片封装或晶圆级封装时,倒焊封装(Flip-Chip,FC)工艺的出现可以使芯片封装的体积减小,为了增加输入/输出(Input/Output,I/O)接口,一般在FC工艺的基础上对芯片进行硅通孔(Through Silicon Via,TSV)作业,但是对芯片或晶圆进行硅通孔作业,会导致晶圆产生内应力,对晶圆造成损伤。In recent years, in 3D chip packaging or wafer level packaging, the emergence of the Flip-Chip (FC) process can reduce the volume of the chip package, in order to increase the input/output (Input/Output, I/O) ) interface, generally on the basis of the FC process, through silicon via (TSV) operation is performed on the chip, but the through silicon via operation on the chip or wafer will cause internal stress to the wafer and cause damage to the wafer .

发明内容SUMMARY OF THE INVENTION

因此,本发明一种晶圆键合堆叠芯片的封装结构及制备方法,克服现有技术中的在3D芯片封装或晶圆级封装时,通过对芯片作业TSV,会产生内应力及损伤的缺陷。Therefore, the present invention provides a wafer bonding stack chip packaging structure and preparation method, which overcomes the defects in the prior art that internal stress and damage will be generated by operating TSV on the chip during 3D chip packaging or wafer level packaging. .

第一方面,本发明提供一种晶圆键合堆叠芯片的封装结构,包括:芯片键合体,包括堆叠设置的多个单体晶圆级芯片,所述单体晶圆级芯片之间通过键合层键合;导电通孔,与各个单体晶圆级芯片的功能引出端子连通。In a first aspect, the present invention provides a packaging structure for wafer bonding stacked chips, including: a chip bonding body, including a plurality of single wafer-level chips arranged in a stack, and the single wafer-level chips are connected by bonds. The bonding layer is bonded; the conductive through holes are connected with the functional lead-out terminals of each single wafer-level chip.

在一实施例中,所述的晶圆键合堆叠芯片的封装结构,还包括:模封材料,包覆所述芯片键合体。In one embodiment, the packaging structure of the wafer-bonded stacked chip further includes: a molding material covering the chip bonding body.

在一实施例中,所述的晶圆键合堆叠芯片的封装结构,还包括:重布线层,形成于所述芯片键合体一侧,通过导电通孔实现与所述芯片键合体的电连接。In an embodiment, the packaging structure of the wafer-bonded stacked chip further includes: a redistribution layer, formed on one side of the chip-bonded body, and electrically connected to the chip-bonded body through conductive vias .

在一实施例中,所述的晶圆键合堆叠芯片的封装结构,还包括:多个凸点,设置于所述重布线层的多个焊盘上。In an embodiment, the packaging structure of the wafer-bonded stacked chip further includes: a plurality of bumps disposed on the plurality of pads of the redistribution layer.

在一实施例中,所述导电通孔内填充导电胶或导电金属。In one embodiment, the conductive through holes are filled with conductive glue or conductive metal.

第二方面,本发明实施例提供一种圆级芯片封装结构的制备方法,包括如下步骤:将预设数量晶圆级芯片通过键合层进行键合,形成芯片键合体;将所述芯片键合体进行切割,形成多个单颗模块;将所述多个单颗模块进行封装,形成重组晶圆;在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔。In a second aspect, an embodiment of the present invention provides a method for preparing a wafer-level chip package structure, including the following steps: bonding a predetermined number of wafer-level chips through a bonding layer to form a chip bond body; bonding the chip The combination is cut to form multiple single modules; the multiple single modules are packaged to form a reconstituted wafer; conductive through holes are formed at the corresponding positions of the wafer-level chip function lead-out terminals located on the bonding layer.

在一实施例中,所述将预设数量晶圆级芯片通过键合层进行键合的步骤之前,还包括:将晶圆级芯片键合面的相对面进行减薄处理。In an embodiment, before the step of bonding a preset number of wafer-level chips through the bonding layer, the step further includes: thinning the opposite surface of the bonding surface of the wafer-level chips.

在一实施例中,所述在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔的步骤之后,还包括:在通孔中填充导电介质,并将导电介质进行电镀互连,形成重布线层。In an embodiment, after the step of forming conductive vias at corresponding positions of the wafer-level chip function lead-out terminals located in the bonding layer, the method further includes: filling the vias with a conductive medium, and performing electroplating on the conductive medium. connected to form a redistribution layer.

在一实施例中,所述在通孔中填充导电介质,并将导电介质进行电镀互连,形成重布线层的步骤之后,还包括:在重布线层进行凸点制备。In one embodiment, after the steps of filling the conductive medium in the through holes and performing electroplating and interconnecting the conductive medium to form the redistribution layer, the method further includes: preparing bumps on the redistribution layer.

在一实施例中,所述在重布线层进行凸点制备的步骤之后,还包括:对重组晶圆进行切割,形成单颗晶圆级芯片结构。In one embodiment, after the step of preparing bumps on the redistribution layer, the method further includes: cutting the reconstituted wafer to form a single wafer-level chip structure.

1、本发明提供的晶圆键合堆叠芯片的封装结构,包括,芯片键合体,其包括堆叠设置的多个单体晶圆级芯片,单体晶圆级芯片之间通过键合层键合;导电通孔,与各个单体芯片的功能引出端子连通,本发明实施例提供的封装结构由晶圆键合形成的堆叠芯片通过侧壁信号互连,封装体积小。1. The packaging structure of the wafer bonding stacked chip provided by the present invention includes a chip bonding body, which includes a plurality of single wafer level chips arranged in a stack, and the single wafer level chips are bonded through a bonding layer. The conductive through holes are connected with the function lead-out terminals of each single chip. The package structure provided by the embodiment of the present invention is formed by wafer bonding. The stacked chips are interconnected through sidewall signals, and the package volume is small.

2、本发明提供的晶圆键合堆叠芯片的封装结构的制备方法,将预设数量晶圆级芯片通过键合层进行键合,形成芯片键合体;将芯片键合体进行切割,形成多个单颗模块;将多个单颗模块进行封装,形成重组晶圆;在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔,本发明实施例提供的制备方法无需TSV工艺,避免了由于对芯片直接或间接制作通孔导致的芯片内应力及损伤问题,制程过程简单,产能高。2. The present invention provides a method for preparing a packaging structure of wafer-bonded stacked chips, wherein a predetermined number of wafer-level chips are bonded through a bonding layer to form a chip bonding body; the chip bonding body is cut to form a plurality of Single module; multiple single modules are packaged to form a reconstituted wafer; conductive vias are formed at the corresponding positions of the wafer-level chip function lead-out terminals located in the bonding layer, and the preparation method provided by the embodiment of the present invention does not require a TSV process , to avoid the problem of internal stress and damage of the chip caused by directly or indirectly making through holes on the chip, the manufacturing process is simple, and the production capacity is high.

附图说明Description of drawings

为了更清楚地说明本发明具体实施方式或现有技术中的技术方案,下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本发明的一些实施方式,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the specific embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the specific embodiments or the prior art. Obviously, the accompanying drawings in the following description The drawings are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without creative efforts.

图1为本发明实施例提供的晶圆键合堆叠芯片的封装结构的一个具体示例的示意图;FIG. 1 is a schematic diagram of a specific example of a packaging structure of a wafer-bonded stacked chip according to an embodiment of the present invention;

图2为本发明实施例提供的晶圆键合堆叠芯片的封装结构的另一个具体示例的示意图;FIG. 2 is a schematic diagram of another specific example of a packaging structure of a wafer-bonded stacked chip provided by an embodiment of the present invention;

图3为本发明实施例提供的晶圆键合堆叠芯片的封装结构的另一个具体示例的示意图;3 is a schematic diagram of another specific example of a packaging structure of a wafer-bonded stacked chip provided by an embodiment of the present invention;

图4为本发明实施例提供的晶圆键合堆叠芯片的封装结构的另一个具体示例的示意图;FIG. 4 is a schematic diagram of another specific example of a packaging structure of a wafer-bonded stacked chip according to an embodiment of the present invention;

图5为本发明实施例提供的晶圆键合堆叠芯片的封装结构制备方法一个具体示例的流程图;FIG. 5 is a flowchart of a specific example of a method for preparing a package structure of a wafer-bonded stacked chip according to an embodiment of the present invention;

图6为本发明实施例提供的芯片键合减薄前的示意图;FIG. 6 is a schematic diagram of chip bonding before thinning according to an embodiment of the present invention;

图7为本发明实施例提供的芯片减薄处理后的示意图;7 is a schematic diagram of a chip after thinning processing provided by an embodiment of the present invention;

图8为本发明实施例提供的芯片键合体的示意图;8 is a schematic diagram of a die bond body provided by an embodiment of the present invention;

图9为本发明实施例提供的单颗模块的示意图;FIG. 9 is a schematic diagram of a single module provided by an embodiment of the present invention;

图10为本发明实施例提供的重组晶圆的示意图;10 is a schematic diagram of a reconstituted wafer provided by an embodiment of the present invention;

图11为本发明实施例提供的形成导电通孔的示意图;11 is a schematic diagram of forming conductive vias according to an embodiment of the present invention;

图12为本发明实施例提供的晶圆键合堆叠芯片的封装结构制备方法另一个具体示例的流程图;12 is a flowchart of another specific example of a method for preparing a package structure of a wafer-bonded stacked chip according to an embodiment of the present invention;

图13为本发明实施例提供的形成重布线层的示意图;13 is a schematic diagram of forming a redistribution layer according to an embodiment of the present invention;

图14为本发明实施例提供的在重布线层进行凸点制备的示意图。FIG. 14 is a schematic diagram of bump preparation on a redistribution layer according to an embodiment of the present invention.

具体实施方式Detailed ways

下面将结合附图对本发明的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,还可以是两个元件内部的连通,可以是无线连接,也可以是有线连接。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本发明中的具体含义。In the description of the present invention, it should be noted that the terms "installed", "connected" and "connected" should be understood in a broad sense, unless otherwise expressly specified and limited, for example, it may be a fixed connection or a detachable connection connection, or integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal connection of two components, which can be a wireless connection or a wired connection connect. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood in specific situations.

此外,下面所描述的本发明不同实施方式中所涉及的技术特征只要彼此之间未构成冲突就可以相互结合。In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

实施例1Example 1

本实施例提供一种晶圆键合堆叠芯片的封装结构,如图1所示,包括:芯片键合体1,包括堆叠设置的多个单体晶圆级芯片11,所述单体晶圆级芯片之间通过键合层12键合;导电通孔2,与各个单体晶圆级芯片11的功能引出端子13连通。在本发明实施例中芯片为存储芯片,将单体晶圆级芯片之间通过键合层在一起,通过导电通孔2与各个单体晶圆级芯片11的功能引出端子13连通,可以扩大芯片的存储容量。The present embodiment provides a packaging structure for wafer bonding stacked chips, as shown in FIG. 1 , including: a chip bonding body 1 including a plurality of single wafer level chips 11 arranged in a stack, the single wafer level The chips are bonded through the bonding layer 12 ; the conductive vias 2 are connected to the function lead-out terminals 13 of each single wafer-level chip 11 . In the embodiment of the present invention, the chip is a memory chip, the single wafer-level chips are bonded together, and the conductive through holes 2 are connected to the function lead-out terminals 13 of each single wafer-level chip 11, which can be expanded. The memory capacity of the chip.

本发明提供的晶圆键合堆叠芯片的封装结构,包括,芯片键合体,其包括堆叠设置的多个单体晶圆级芯片,单体晶圆级芯片之间通过键合层键合,即晶圆键合后形成堆叠芯片;导电通孔,与各个单体芯片的功能引出端子连通,本发明实施例提供的封装结构通过芯片键合体的侧壁进行信号互连,封装体积较小。The packaging structure of the wafer-bonded stacked chips provided by the present invention includes a chip bonding body, which includes a plurality of single wafer-level chips arranged in a stack, and the single wafer-level chips are bonded through a bonding layer, that is, After wafer bonding, stacked chips are formed; conductive vias are connected to the functional lead-out terminals of each single chip, and the package structure provided by the embodiment of the present invention performs signal interconnection through the sidewall of the chip bonding body, and the package volume is small.

在一实施例中,晶圆键合堆叠芯片的封装结构,如图2所示,还包括:模封材料3,包覆芯片键合体1及导电通孔2。通过模封材料3将芯片键合体1及导电通孔2进行封装。本实施例中,模封材料3为环氧树脂模塑料,环氧树脂模塑料是由环氧树脂为基体树脂,以高性能酚醛树脂为固化剂,加入硅微粉等为填料,以及添加多种助剂混配而成的粉状模塑料。塑封过程是用传递成型法将EMC挤压入模腔并将其中的半导体芯片包埋,同时交联固化成型,成为具有一定结构外型的半导体器件。In an embodiment, the packaging structure of the wafer-bonded stacked chip, as shown in FIG. 2 , further includes: a molding material 3 , covering the chip bonding body 1 and the conductive via 2 . The die-bonded body 1 and the conductive vias 2 are encapsulated by the molding material 3 . In this embodiment, the molding material 3 is an epoxy resin molding compound, and the epoxy resin molding compound is made of epoxy resin as the matrix resin, high-performance phenolic resin as the curing agent, adding silicon micropowder as filler, and adding various Powder molding compound made of additives. The plastic packaging process is to extrude the EMC into the mold cavity by transfer molding and embed the semiconductor chips in it, and at the same time cross-link and solidify to form a semiconductor device with a certain structural appearance.

在一实施例中,晶圆键合堆叠芯片的封装结构,如图3所示,还包括:重布线层4,形成于芯片键合体1一侧,通过导电通孔2实现与芯片键合体1的电连接。本发明实施例通过重布线层4将各个单体晶圆级芯片进行电镀互连,将芯片功能引出。In one embodiment, the packaging structure of the wafer-bonded stacked chip, as shown in FIG. 3 , further includes: a redistribution layer 4 , which is formed on one side of the chip-bonded body 1 , and is connected to the chip-bonded body 1 through the conductive through holes 2 . electrical connection. In the embodiment of the present invention, each single wafer-level chip is electroplated and interconnected through the rewiring layer 4, and the function of the chip is led out.

在一实施例中,晶圆键合堆叠芯片的封装结构,如图4所示,还包括:多个凸点5,设置于重布线层3的多个焊盘上。形成的多个凸点5方便与其他器件进行电连接。本实施例凸点都为锡球,但是并不限于此,在其他实施例中也可以为其他材料,例如铜球。In one embodiment, the packaging structure of the wafer-bonded stacked chip, as shown in FIG. 4 , further includes: a plurality of bumps 5 disposed on a plurality of pads of the redistribution layer 3 . The plurality of bumps 5 are formed to facilitate electrical connection with other devices. In this embodiment, the bumps are all tin balls, but not limited to this. In other embodiments, the bumps can also be made of other materials, such as copper balls.

在一实施例中,在重布线层3的焊盘表面做凸点下金属化层处理凸点下金属化层简称UBM(Under Ball Metal),UBM的上面通常会做锡球(Solder Ball),UBM的下面是铜导线或铜焊盘。UBM的目的是防止锡球回流时将铜导线或铜焊盘的金属铜与金属锡形成合金,导致锡球无法牢固的与芯片连接,出现可靠性失效的问题。In one embodiment, an under-bump metallization layer is used on the pad surface of the redistribution layer 3 to process the under-bump metallization layer for short as UBM (Under Ball Metal). Below the UBM are copper wires or copper pads. The purpose of UBM is to prevent the metal copper of the copper wire or the copper pad from forming an alloy with metal tin during the reflow of the solder balls, resulting in the failure of the solder balls to be firmly connected to the chip and the problem of reliability failure.

在本发明实施例中,键合层为有机粘合剂,例如有机胶;导电通孔内填充导电胶或导电金属,其中导电胶的导电填料可以是银、铜、铝、锌、铁、镍的粉末和石墨及一些导电化合物,导电金属为铜、铝、锌、铁、镍或合金,以上仅以此举例,不以此为限。In the embodiment of the present invention, the bonding layer is an organic adhesive, such as organic adhesive; the conductive through hole is filled with conductive adhesive or conductive metal, wherein the conductive filler of the conductive adhesive can be silver, copper, aluminum, zinc, iron, nickel The powder and graphite and some conductive compounds, the conductive metal is copper, aluminum, zinc, iron, nickel or alloys, the above is only an example, not limited to this.

实施例2Example 2

本发明实施例提供一种晶圆键合堆叠芯片的封装结构的制备方法,如图5所示,包括如下步骤:An embodiment of the present invention provides a method for preparing a packaging structure of a wafer-bonded stacked chip, as shown in FIG. 5 , including the following steps:

步骤S10:将晶圆级芯片键合面的相对面进行减薄处理。通过减薄处理后有利于缩小封装的尺寸,如图6所示为减薄前的示意图,如图7所示的为减薄处理后的示意图。Step S10 : thinning the opposite surface of the wafer-level chip bonding surface. After the thinning process, it is beneficial to reduce the size of the package. FIG. 6 is a schematic diagram before thinning, and FIG. 7 is a schematic diagram after the thinning process.

步骤S11:将预设数量晶圆级芯片通过键合层进行键合,形成芯片键合体。在本发明实施例中,晶圆级芯片为存储芯片,键合层为有机粘合剂,例如有机胶,形成的芯片键合体如图8所示。Step S11 : bonding a preset number of wafer-level chips through a bonding layer to form a chip bonding body. In the embodiment of the present invention, the wafer-level chip is a memory chip, and the bonding layer is an organic adhesive, such as organic glue, and the formed chip bonding body is shown in FIG. 8 .

步骤S12:将所述芯片键合体进行切割,形成多个单颗模块。本发明实施例形成的单颗模块如图9所示。Step S12 : cutting the die bonding body to form a plurality of single modules. The single module formed by the embodiment of the present invention is shown in FIG. 9 .

步骤S13:将所述多个单颗模块进行封装,形成重组晶圆。本发明实施例形成的芯片键合体如图10所示。Step S13 : encapsulating the plurality of single modules to form a reconstituted wafer. The die bond body formed in the embodiment of the present invention is shown in FIG. 10 .

步骤S14:在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔。在本发明实施例中,通过激光烧蚀或者刻蚀形成导电通孔,如图11所示。Step S14 : forming conductive vias at corresponding positions of the wafer-level chip function lead-out terminals located in the bonding layer. In the embodiment of the present invention, the conductive via is formed by laser ablation or etching, as shown in FIG. 11 .

在一实施例中,在执行步骤S14之后,如图12所示,还包括:In one embodiment, after step S14 is performed, as shown in FIG. 12 , it further includes:

步骤S15:在通孔中填充导电介质,并将导电介质进行电镀互连,形成重布线层。本发明实施例,如图13所示,通过重布线层将各个单体晶圆级芯片进行电镀互连,将芯片功能引出。Step S15: Filling the conductive medium in the through hole, and performing electroplating and interconnecting the conductive medium to form a redistribution layer. In the embodiment of the present invention, as shown in FIG. 13 , each single wafer-level chip is interconnected by electroplating through the rewiring layer, and the function of the chip is led out.

步骤S16:在重布线层进行凸点制备。本发明实施例,如图14所示,通过印刷锡膏或直接放置成型锡球的方法制作凸点作为焊球,方便与其他器件进行电连接。Step S16: Bump preparation is performed on the redistribution layer. In the embodiment of the present invention, as shown in FIG. 14 , bumps are fabricated as solder balls by printing solder paste or directly placing solder balls to facilitate electrical connection with other devices.

步骤S17:对重组晶圆进行切割,形成单颗晶圆级芯片结构。本发明实施例将重组晶圆切割后,形成如图4所示单颗晶圆级芯片结构。本发明采用晶圆级的封装形式,其生产效率更高,成本优势更大。Step S17 : cutting the reconstituted wafer to form a single wafer-level chip structure. In the embodiment of the present invention, the reconstituted wafer is cut to form a single-wafer-level chip structure as shown in FIG. 4 . The present invention adopts the packaging form of wafer level, and has higher production efficiency and greater cost advantage.

本发明提供的晶圆键合堆叠芯片的封装结构的制备方法,将预设数量晶圆级芯片通过键合层进行键合,形成芯片键合体;将芯片键合体进行切割,形成多个单颗模块;将多个单颗模块进行封装,形成重组晶圆;在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔,本发明实施例提供的制备方法无需TSV工艺,避免了由于对芯片直接或间接制作通孔导致的芯片内应力及损伤问题,制程过程简单,产能高。The present invention provides a method for preparing a packaging structure of wafer-bonded stacked chips, wherein a predetermined number of wafer-level chips are bonded through a bonding layer to form a chip bonding body; the chip bonding body is cut to form a plurality of single chips module; encapsulate a plurality of single modules to form a reconstituted wafer; form conductive vias at the corresponding positions of the wafer-level chip function lead-out terminals located in the bonding layer, the preparation method provided by the embodiment of the present invention does not require a TSV process, avoiding The problem of internal stress and damage caused by directly or indirectly making through holes on the chip is eliminated, the manufacturing process is simple, and the productivity is high.

显然,上述实施例仅仅是为清楚地说明所作的举例,而并非对实施方式的限定。对于所属领域的普通技术人员来说,在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。而由此所引伸出的显而易见的变化或变动仍处于本发明创造的保护范围之中。Obviously, the above-mentioned embodiments are only examples for clear description, and are not intended to limit the implementation manner. For those of ordinary skill in the art, changes or modifications in other different forms can also be made on the basis of the above description. There is no need and cannot be exhaustive of all implementations here. And the obvious changes or changes derived from this are still within the protection scope of the present invention.

Claims (11)

1.一种晶圆键合堆叠芯片的封装结构,其特征在于,包括:1. a packaging structure for wafer bonding stacked chips, characterized in that, comprising: 芯片键合体,包括堆叠设置的多个单体晶圆级芯片,所述单体晶圆级芯片之间通过键合层键合;The chip bonding body includes a plurality of single wafer-level chips arranged in a stack, and the single wafer-level chips are bonded through a bonding layer; 导电通孔,与各个单体晶圆级芯片的功能引出端子连通。The conductive through holes are connected with the function lead-out terminals of each single wafer-level chip. 2.根据权利要求1所述的晶圆键合堆叠芯片的封装结构,其特征在于,还包括:模封材料,包覆所述芯片键合体。2 . The packaging structure for stacked chips by wafer bonding according to claim 1 , further comprising: a molding material for covering the chip bonding body. 3 . 3.根据权利要求1或2所述的晶圆键合堆叠芯片的封装结构,其特征在于,还包括:重布线层,形成于所述芯片键合体一侧,通过导电通孔实现与所述芯片键合体的电连接。3. The packaging structure of wafer bonding stacked chips according to claim 1 or 2, further comprising: a redistribution layer, formed on one side of the chip bonding body, and connected to the Electrical connection of the die bond. 4.根据权利要求3所述的晶圆键合堆叠芯片的封装结构,其特征在于,还包括:多个凸点,设置于所述重布线层的多个焊盘上。4 . The packaging structure for stacked chips by wafer bonding according to claim 3 , further comprising: a plurality of bumps disposed on a plurality of pads of the redistribution layer. 5 . 5.根据权利要求1所述的晶圆键合堆叠芯片的封装结构,其特征在于,所述键合层为有机粘合剂。5 . The packaging structure of wafer-bonded stacked chips according to claim 1 , wherein the bonding layer is an organic adhesive. 6 . 6.根据权利要求1所述的晶圆键合堆叠芯片的封装结构,其特征在于,所述导电通孔内填充导电胶或导电金属。6 . The packaging structure of wafer-bonded stacked chips according to claim 1 , wherein the conductive through holes are filled with conductive glue or conductive metal. 7 . 7.一种晶圆键合堆叠芯片的封装结构的制备方法,其特征在于,包括如下步骤:7. A method for preparing a packaging structure for wafer bonding stacked chips, characterized in that it comprises the following steps: 将预设数量晶圆级芯片通过键合层进行键合,形成芯片键合体;Bonding a preset number of wafer-level chips through a bonding layer to form a chip bonding body; 将所述芯片键合体进行切割,形成多个单颗模块;cutting the chip bonding body to form a plurality of single modules; 将所述多个单颗模块进行封装,形成重组晶圆;packaging the plurality of single modules to form a reconstituted wafer; 在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔。Conductive vias are formed at corresponding positions of the functional lead-out terminals of the wafer-level chip on the bonding layer. 8.根据权利要求7所述的晶圆键合堆叠芯片的封装结构的制备方法,其特征在于,所述将预设数量晶圆级芯片通过键合层进行键合的步骤之前,还包括:8 . The method for preparing the packaging structure of wafer-bonded stacked chips according to claim 7 , wherein, before the step of bonding a preset number of wafer-level chips through a bonding layer, the method further comprises: 9 . 将晶圆级芯片键合面的相对面进行减薄处理。The opposite side of the wafer-level chip bonding surface is thinned. 9.根据权利要求7所述的晶圆键合堆叠芯片的封装结构的制备方法,其特征在于,所述在位于键合层的晶圆级芯片功能引出端子的相应位置形成导电通孔的步骤之后,还包括:9 . The method for preparing the packaging structure of wafer-bonded stacked chips according to claim 7 , wherein the step of forming conductive vias at corresponding positions of the wafer-level chip function lead-out terminals located in the bonding layer. 10 . After that, also include: 在通孔中填充导电介质,并将导电介质进行电镀互连,形成重布线层。A conductive medium is filled in the through holes, and the conductive medium is plated and interconnected to form a redistribution layer. 10.根据权利要求9所述的晶圆键合堆叠芯片的封装结构的制备方法,其特征在于,所述在通孔中填充导电介质,并将导电介质进行电镀互连,形成重布线层的步骤之后,还包括:10 . The method for preparing the packaging structure of wafer-bonded stacked chips according to claim 9 , wherein the conductive medium is filled in the through holes, and the conductive medium is electroplated and interconnected to form a redistribution layer. 11 . After the steps, also include: 在重布线层进行凸点制备。Bump preparation is performed on the redistribution layer. 11.根据权利要求10所述的晶圆键合堆叠芯片的封装结构的制备方法,其特征在于,所述在重布线层进行凸点制备的步骤之后,还包括:11. The method for preparing a packaging structure of a wafer-bonded stacked chip according to claim 10, wherein after the step of performing bump preparation on the redistribution layer, the method further comprises: 对重组晶圆进行切割,形成单颗晶圆级芯片结构。The reconstituted wafer is diced to form a single wafer-level chip structure.
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