CN110330344A - A method of high porosity silicon nitride ceramics is prepared based on selective laser sintering - Google Patents
A method of high porosity silicon nitride ceramics is prepared based on selective laser sintering Download PDFInfo
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Abstract
本发明公开了一种基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法,属于增材制造技术制备无机非金属陶瓷领域,该方法包括步骤:(1)采用机械混合法制备纳米烧结助剂和氮化硅聚空心球的混合均匀的复合粉体,或者通过化学共沉淀法制备纳米烧结助剂包覆氮化硅聚空心球的复合粉体;(2)设计CAD模型,进行切片处理后保存为STL文件,导入SLS成形设备中;(3)采用SLS成形设备对复合粉体进行激光选区烧结,制备出预烧结氮化硅陶瓷;(4)高温烧结后,制备出CAD模型结构的多孔氮化硅陶瓷。本发明方法制备出复合粉体后,通过激光选区烧结制备出预烧氮化硅陶瓷,并经过后处理工艺制备出高孔隙率氮化硅陶瓷,无需排胶、可成形复杂结构、成形件孔隙率高。
The invention discloses a method for preparing high-porosity silicon nitride ceramics based on laser selective sintering, which belongs to the field of inorganic non-metallic ceramics prepared by additive manufacturing technology. The method includes the steps of: (1) preparing nano-sintering aids by mechanical mixing Mix uniform composite powder with silicon nitride polyhollow spheres, or prepare composite powders of nano-sintering aids coated silicon nitride polyhollow spheres by chemical co-precipitation method; (2) Design CAD model and slice it Save it as an STL file and import it into the SLS forming equipment; (3) Use the SLS forming equipment to perform laser selective sintering on the composite powder to prepare pre-sintered silicon nitride ceramics; (4) After high-temperature sintering, prepare the porous structure of the CAD model Silicon nitride ceramics. After the composite powder is prepared by the method of the present invention, pre-fired silicon nitride ceramics are prepared by laser selective sintering, and high-porosity silicon nitride ceramics are prepared through a post-processing process, which can form complex structures and form pores without degumming. High rate.
Description
技术领域technical field
本发明属于增材制造技术制备无机非金属陶瓷领域,更具体地,涉及一种基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法。The invention belongs to the field of inorganic non-metallic ceramics prepared by additive manufacturing technology, and more specifically relates to a method for preparing high-porosity silicon nitride ceramics based on laser selective sintering.
背景技术Background technique
氮化硅是一种具有强共价键的非金属无机化合物,具有高强度、高硬度、高弹性模量、低热膨胀系数、自润滑且耐磨损等优异的性能,得到了广泛的关注。其中,多孔氮化硅陶瓷还具有轻质耐热、比表面积高、对气体或液体有选择透过性等一些多孔特性,是“结构-功能”一体化陶瓷材料。未来有望在航天飞行器的天线罩材料上得到应用。Silicon nitride is a non-metallic inorganic compound with strong covalent bonds. It has excellent properties such as high strength, high hardness, high elastic modulus, low thermal expansion coefficient, self-lubrication and wear resistance, and has attracted extensive attention. Among them, porous silicon nitride ceramics also have some porous characteristics such as light weight, heat resistance, high specific surface area, and selective permeability to gas or liquid, and are "structure-function" integrated ceramic materials. It is expected to be applied in the radome material of aerospace vehicles in the future.
目前,多孔氮化硅陶瓷的制备主要采用发泡法、欠烧法、造孔剂法、激光选区烧结等方式。但发泡法制备出的多孔氮化硅陶瓷孔隙结构不可控;欠烧法无法制备出内部结构复杂的多孔氮化硅陶瓷;造孔剂法虽然可以实现孔隙结构的调控,但是造孔剂多采用有机物,需要进行排胶处理且不利于烧结致密化及相转变;激光选区烧结虽然可成形复杂结构的氮化硅陶瓷,但目前多采用低熔点的有机物作为粘结剂,需要进行排胶处理,生产流程较长;且目前激光选区烧结工艺在制备点阵结构等结构复杂的陶瓷试样中由于需要进行排胶处理,容易使复杂结构样品产生变形、开裂、塌陷等问题,难以有效成形孔隙率70%以上的高孔隙率氮化硅陶瓷。At present, the preparation of porous silicon nitride ceramics mainly adopts foaming method, under-fired method, pore-forming agent method, laser selective sintering and other methods. However, the pore structure of the porous silicon nitride ceramics prepared by the foaming method is uncontrollable; The use of organic substances requires debinding treatment and is not conducive to sintering densification and phase transformation; although laser selective sintering can form silicon nitride ceramics with complex structures, at present, organic substances with low melting points are mostly used as binders, which require debinding treatment. , the production process is long; and the current laser selective sintering process requires debinding treatment in the preparation of ceramic samples with complex structures such as lattice structures, which easily causes problems such as deformation, cracking, and collapse of samples with complex structures, and it is difficult to effectively form pores. High porosity silicon nitride ceramics with a rate of more than 70%.
因此,对于激光选区烧结工艺,需要找到一种无需粘结剂即可有效成形复杂结构的高孔隙率氮化硅陶瓷的方法。Therefore, for the selective laser sintering process, it is necessary to find a way to efficiently form complex structures of high-porosity silicon nitride ceramics without binders.
发明内容Contents of the invention
针对现有技术的以上缺陷或改进需求,本发明提供了一种基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法,其目的在于,无需粘结剂即可有效成形复杂结构的高孔隙率(孔隙率70%以上)氮化硅陶瓷,由此解决现有方法激光选区烧结无法成形70%以上孔隙率的氮化硅陶瓷,且需要进行排胶处理,生产流程较长,且对点阵等复杂结构的多孔氮化硅陶瓷成形时易产生变形、开裂、塌陷的技术问题。In view of the above defects or improvement needs of the prior art, the present invention provides a method for preparing high-porosity silicon nitride ceramics based on laser selective sintering, the purpose of which is to effectively form complex structures with high porosity without binders (porosity of more than 70%) silicon nitride ceramics, thus solving the problem that the existing method of laser selective sintering cannot form silicon nitride ceramics with a porosity of more than 70%, and debinding treatment is required, the production process is long, and the lattice The technical problems of deformation, cracking and collapse are easy to occur when forming porous silicon nitride ceramics with complex structures.
为实现上述目的,本发明提供了一种基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法,包括如下步骤:In order to achieve the above object, the present invention provides a method for preparing high-porosity silicon nitride ceramics based on laser selective sintering, comprising the following steps:
(1)采用机械混合法制备纳米烧结助剂和氮化硅聚空心球的混合均匀的复合粉体,或者通过化学共沉淀法制备纳米烧结助剂包覆氮化硅聚空心球的复合粉体;(1) Prepare a homogeneously mixed composite powder of nano-sintering aids and silicon nitride polyhollow spheres by mechanical mixing, or prepare a composite powder of nano-sintering aids coated with silicon nitride polyhollow spheres by chemical co-precipitation ;
(2)设计CAD模型,对该CAD模型进行切片处理后保存为包含CAD模型数据信息的STL文件,将该STL文件导入激光选区烧结成形设备中;(2) Design the CAD model, save the CAD model as an STL file containing the CAD model data information after slicing the CAD model, and import the STL file into the laser selection sintering forming equipment;
(3)将步骤(1)得到的复合粉体铺设于激光选区烧结(SLS)成形设备的粉缸中,设定SLS成形工艺参数,结合步骤(2)中导入的STL文件,进行激光选区烧结,逐层打印,制备出预烧结氮化硅陶瓷;(3) Lay the composite powder obtained in step (1) in the powder cylinder of the laser selective sintering (SLS) forming equipment, set the SLS forming process parameters, and combine the STL file imported in step (2) to perform laser selective sintering , printed layer by layer to prepare pre-sintered silicon nitride ceramics;
(4)对步骤(3)获得的预烧结氮化硅陶瓷在保护气氛下进行高温烧结,制备出所述CAD模型结构的高孔隙率氮化硅陶瓷。(4) Sintering the pre-sintered silicon nitride ceramics obtained in step (3) at a high temperature under a protective atmosphere to prepare the high-porosity silicon nitride ceramics with the CAD model structure.
优选地,所述纳米烧结助剂包括纳米氧化铝、纳米氧化钇、纳米稀土氧化物和纳米二氧化硅中的一种或几种。Preferably, the nano-sintering aid includes one or more of nano-alumina, nano-yttrium oxide, nano-rare earth oxide and nano-silicon dioxide.
优选地,所述纳米稀土氧化物包括氧化镧、氧化钕、氧化铈和氧化镱,所述纳米烧结助剂包括其中的一种或几种纳米稀土氧化物。Preferably, the nanometer rare earth oxides include lanthanum oxide, neodymium oxide, cerium oxide and ytterbium oxide, and the nanometer sintering aid includes one or several nanometer rare earth oxides.
优选地,通过调整所述纳米烧结助剂的加入量和种类,对制备得到的多孔氮化硅陶瓷的微观结构和性能进行调控。Preferably, the microstructure and properties of the prepared porous silicon nitride ceramics are regulated by adjusting the amount and type of the nano-sintering aid.
优选地,步骤(1)中,所述纳米烧结助剂占所述复合粉体的质量分数为5%~30%。Preferably, in step (1), the mass fraction of the nano-sintering aid in the composite powder is 5%-30%.
优选地,步骤(1)中,采用机械混合法时,混粉时间为12~24h。Preferably, in step (1), when the mechanical mixing method is adopted, the powder mixing time is 12-24 hours.
优选地,步骤(1)中,所述化学共沉淀法为:将所述氮化硅聚空心球,加入拟生成所述纳米烧结助剂的盐溶液中进行混合,加入氨水反应完全后,进行抽滤、烘干,并在900~1200℃进行煅烧获得复合粉体。Preferably, in step (1), the chemical co-precipitation method is: adding the silicon nitride polyhollow spheres into the salt solution intended to generate the nano-sintering aid for mixing, and after adding ammonia water to complete the reaction, carry out Suction filtration, drying, and calcination at 900-1200°C to obtain composite powder.
优选地,所述SLS成形工艺参数为:激光功率3~15W,扫描速度10~300mm/s,分层层厚0.1~0.3mm,扫描间距0.01~0.3mm。Preferably, the SLS forming process parameters are: laser power 3-15W, scanning speed 10-300mm/s, layer thickness 0.1-0.3mm, scanning distance 0.01-0.3mm.
优选地,所述高温烧结的工艺参数为:升温速率5~20℃/min,烧结温度为1700~2000℃,保温时间为2~8h。Preferably, the process parameters of the high-temperature sintering are: a heating rate of 5-20° C./min, a sintering temperature of 1700-2000° C., and a holding time of 2-8 hours.
优选地,所述保护气氛为氮气、氩气、氢气中的一种或几种。Preferably, the protective atmosphere is one or more of nitrogen, argon, and hydrogen.
优选地,所述CAD模型为具有内部连通孔结构的蜂窝多孔结构或空间拓扑结构或复杂的功能结构件。Preferably, the CAD model is a honeycomb porous structure or a spatial topological structure or a complex functional structure with an internal interconnected pore structure.
总体而言,通过本发明所构思的以上技术方案与现有技术相比,能够取得下列有益效果:Generally speaking, compared with the prior art, the above technical solutions conceived by the present invention can achieve the following beneficial effects:
1、本发明提供的方法,基于激光选区烧结工结合烧结后处理工艺能够制备复杂结构的孔隙率70%以上的高孔隙率氮化硅陶瓷;该方法采用机械混合法制备纳米烧结助剂-氮化硅聚空心球复合粉体,或者通过化学共沉淀法制备烧结助剂包覆氮化硅聚空心球复合粉体,通过激光选区烧结工艺制备预烧结氮化硅陶瓷,并进一步地采用高温烧结,制备得到微观结构和性能可控的多孔氮化硅陶瓷,可实现各种结构与性能要求的多孔氮化硅陶瓷;该方法在材料配方和多孔陶瓷制备工艺上均具有创新性,无需粘结剂即可有效成形复杂结构的高孔隙率氮化硅陶瓷;无需进行排胶处理,简化了多孔陶瓷制备工艺流程,且有效减少了复杂结构成形时变形、开裂、塌陷的问题。1. The method provided by the present invention can prepare high-porosity silicon nitride ceramics with complex structures with a porosity of more than 70% based on the laser selective sintering process combined with the post-sintering treatment process; the method adopts a mechanical mixing method to prepare nano-sintering aid-nitrogen Silicon nitride polyhollow sphere composite powder, or prepare sintering aid coated silicon nitride polyhollow sphere composite powder by chemical co-precipitation method, prepare pre-sintered silicon nitride ceramics by laser selective sintering process, and further adopt high temperature sintering , to prepare porous silicon nitride ceramics with controllable microstructure and properties, which can realize porous silicon nitride ceramics with various structure and performance requirements; this method is innovative in material formulation and porous ceramic preparation process, and does not require bonding High-porosity silicon nitride ceramics with complex structures can be effectively formed using only a single agent; debinding treatment is not required, which simplifies the preparation process of porous ceramics, and effectively reduces the problems of deformation, cracking, and collapse when complex structures are formed.
2、本发明提供的方法,基于激光选区烧结工艺制备预烧结多孔氮化硅陶瓷,通过调整纳米烧结助剂的加入量和种类以及后处理工艺参数,对制备得到的多孔氮化硅陶瓷的微观结构和性能进行调控,具有宏观多孔结构和微观孔隙结构可控的特点,可实现各种结构与性能要求的多孔氮化硅陶瓷。2. The method provided by the present invention prepares pre-sintered porous silicon nitride ceramics based on the laser selective sintering process. By adjusting the amount and type of nano-sintering aids and the post-treatment process parameters, the microscopic properties of the prepared porous silicon nitride ceramics are improved. It has the characteristics of controllable macroscopic porous structure and microscopic pore structure, and can realize porous silicon nitride ceramics with various structural and performance requirements.
3、本发明提供的方法,能够对点阵等复杂结构的多孔氮化硅陶瓷有效成形,例如具有内部连通孔结构的蜂窝多孔结构或空间拓扑结构或复杂的功能结构件(散热片等),有效减少这些复杂结构成形时变形、开裂、塌陷的问题。3. The method provided by the present invention can effectively form porous silicon nitride ceramics with complex structures such as lattices, such as honeycomb porous structures or spatial topological structures or complex functional structures (radiating fins, etc.) with internal interconnected pore structures, Effectively reduce the problems of deformation, cracking and collapse when these complex structures are formed.
4、本发明提供的方法,无需模具,降低了制造成本;由于无需进行后续排胶,减少了环境污染。4. The method provided by the present invention does not require molds, which reduces the manufacturing cost; since it does not need to carry out subsequent glue removal, environmental pollution is reduced.
附图说明Description of drawings
图1是本发明提供的基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法流程图;Fig. 1 is the flow chart of the method for preparing high-porosity silicon nitride ceramics based on laser selective sintering provided by the present invention;
图2是本发明提供的八面体空间拓扑结构CAD模型示例;Fig. 2 is an example of an octahedron space topology CAD model provided by the present invention;
图3是本发明提供的内部具有连通孔结构的蜂窝多孔结构CAD模型示例;Fig. 3 is the example of the honeycomb porous structure CAD model that the interior provided by the present invention has interconnected pore structure;
图4(a)是本发明实施例1所制备出的预烧结氮化硅陶瓷的微观形貌低倍图;Figure 4(a) is a low magnification view of the microscopic morphology of the pre-sintered silicon nitride ceramic prepared in Example 1 of the present invention;
图4(b)是本发明实施例1所制备出的预烧结氮化硅陶瓷的微观形貌高倍图;Figure 4(b) is a high-magnification view of the microscopic morphology of the pre-sintered silicon nitride ceramic prepared in Example 1 of the present invention;
图5(a)是本发明实施例1所制备出的多孔氮化硅陶瓷的微观形貌低倍图;Figure 5(a) is a low-magnification view of the microscopic morphology of the porous silicon nitride ceramic prepared in Example 1 of the present invention;
图5(b)是本发明实施例1所制备出的多孔氮化硅陶瓷的微观形貌高倍图。Fig. 5(b) is a high-magnification view of the microscopic morphology of the porous silicon nitride ceramic prepared in Example 1 of the present invention.
具体实施方式Detailed ways
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。此外,下面所描述的本发明各个实施方式中所涉及到的技术特征只要彼此之间未构成冲突就可以相互组合。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.
本发明提供了一种基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法,具体为使用纳米烧结助剂作为粘结剂和烧结助剂,基于SLS成形工艺结合CAD模型的切片数据信息,近净成形制备出预烧结多孔氮化硅陶瓷,经过烧结后处理成形多孔氮化硅陶瓷件。如图1所示,其步骤包括:The invention provides a method for preparing high-porosity silicon nitride ceramics based on laser selective sintering, specifically using nano-sintering aids as binders and sintering aids, based on SLS forming technology combined with slice data information of CAD models, nearly Pre-sintered porous silicon nitride ceramics are prepared by net shaping, and the porous silicon nitride ceramics are formed after sintering. As shown in Figure 1, the steps include:
(1)采用机械混合法制备纳米烧结助剂和氮化硅聚空心球的混合均匀的复合粉体,或者通过化学共沉淀法制备纳米烧结助剂包覆氮化硅聚空心球的复合粉体。(1) Prepare a homogeneously mixed composite powder of nano-sintering aids and silicon nitride polyhollow spheres by mechanical mixing, or prepare a composite powder of nano-sintering aids coated with silicon nitride polyhollow spheres by chemical co-precipitation .
氮化硅聚空心球,英文全称Si3N4poly-hollow microspheres,详见论文(Preparation of porous Si3N4ceramics via tailoring solid loading ofSi3N4slurry and Si3N4poly-hollow microsphere content[J].Journal of AdvancedCeramics,2015,4(4):260-266.)。Silicon nitride poly hollow spheres, the English full name is Si 3 N 4 poly-hollow microspheres, see the paper (Preparation of porous Si 3 N 4 ceramics via tailoring solid loading of Si 3 N 4 slurry and Si 3 N 4 poly-hollow microsphere content[ J]. Journal of Advanced Ceramics, 2015, 4(4): 260-266.).
本发明通过调整纳米烧结助剂的种类和加入量,能够控制多孔陶瓷素坯的微观结构与性能;由于烧结助剂对氮化硅陶瓷烧结过程中的致密化和相转变会产生影响,如烧结助剂加入量多,则相转变和致密化速率可能会提高,增加氮化硅陶瓷的密度,但是相应的高温力学性能可能会下降。因此,可以通过调节纳米烧结助剂的加入量和种类最终对氮化硅陶瓷零件的微观结构和性能进行调控。其中,烧结助剂优选为纳米氧化铝、纳米氧化钇、纳米稀土氧化物(氧化镧、氧化钕、氧化铈、氧化镱等)和纳米二氧化硅中的一种或几种。The present invention can control the microstructure and performance of the porous ceramic green body by adjusting the type and amount of nano-sintering aids; since the sintering aids will affect the densification and phase transition in the sintering process of silicon nitride ceramics, such as sintering The addition of a large amount of additives may increase the phase transition and densification rate, increasing the density of silicon nitride ceramics, but the corresponding high-temperature mechanical properties may decrease. Therefore, the microstructure and performance of silicon nitride ceramic parts can be regulated by adjusting the amount and type of nano-sintering aids. Among them, the sintering aid is preferably one or more of nano-alumina, nano-yttrium oxide, nano-rare earth oxides (lanthanum oxide, neodymium oxide, cerium oxide, ytterbium oxide, etc.) and nano-silica.
具体的,机械混合法制备SLS成形用复合粉体,纳米烧结助剂加入量占复合粉体总质量的5%~30%,混粉时间为12~24h。Specifically, the composite powder for SLS forming is prepared by a mechanical mixing method, the amount of the nano-sintering additive accounts for 5% to 30% of the total mass of the composite powder, and the powder mixing time is 12 to 24 hours.
化学共沉淀包覆法制备SLS成形用复合粉体,具体方法为:将基于粉体质量5%~30%的纳米烧结助剂对应的盐溶液与对应质量分数为70~95%的氮化硅陶瓷粉体进行混合,加入氨水反应完全后,进行抽滤、烘干,并在900~1200℃进行煅烧获得复合粉体-包覆的氮化硅陶瓷粉体。The composite powder for SLS forming is prepared by the chemical co-precipitation coating method. The specific method is: the salt solution corresponding to the nano-sintering aid based on the powder mass of 5% to 30% and the corresponding mass fraction of 70 to 95% of silicon nitride The ceramic powders are mixed, and after adding ammonia water to complete the reaction, suction filtration, drying, and calcination at 900-1200° C. are performed to obtain composite powder-coated silicon nitride ceramic powders.
(2)根据需求优化设计复杂结构的多孔氮化硅陶瓷的CAD(Computer AidedDesign,计算机辅助设计)模型,对该CAD模型进行切片处理后保存为包含CAD模型数据信息的STL文件,导入激光选区烧结成形设备中。本发明适用的CAD模型不限制形状、结构和尺寸,根据应用需求也可以优化为内部具有连通孔结构的蜂窝多孔结构或八面体、十二面体等空间拓扑结构或具有复杂结构的功能性器件,如隔热片等。如图2给出了一个面向应用优化的八面体空间拓扑结构CAD模型示例,如图3给出了一个面向应用优化的内部具有连通孔结构的蜂窝多孔结构CAD模型示例。(2) Optimally design the CAD (Computer Aided Design, Computer Aided Design) model of porous silicon nitride ceramics with a complex structure according to the requirements, slice the CAD model and save it as an STL file containing the CAD model data information, and import it into laser selective sintering forming equipment. The applicable CAD model of the present invention does not limit the shape, structure and size, and can also be optimized into a honeycomb porous structure with a connected pore structure inside or a spatial topological structure such as an octahedron or a dodecahedron or a functional device with a complex structure according to application requirements. Such as insulation sheet and so on. Figure 2 shows an example of an application-oriented optimized octahedron spatial topology CAD model, and Figure 3 shows an example of an application-oriented optimized honeycomb porous structure CAD model with interconnected pore structures inside.
STL是最多快速原型系统所应用的标准文件类型。STL是用三角网格来表现三维CAD模型。STL is the standard file type used by most rapid prototyping systems. STL uses triangular meshes to represent 3D CAD models.
(3)选择SLS成形工艺参数,根据步骤(2)中导入的STL文件数据信息,进行激光选区烧结,逐层打印,制备出对应CAD结构的预烧结多孔氮化硅陶瓷。(3) Select the SLS forming process parameters, according to the STL file data information imported in step (2), perform laser selective sintering, and print layer by layer to prepare pre-sintered porous silicon nitride ceramics corresponding to the CAD structure.
具体的,SLS成形工艺参数优选为:激光功率为3~15W,扫描速度为10~300mm/s,分层层厚为0.1~0.3mm,扫描间距为0.01~0.3mm。Specifically, the SLS forming process parameters are preferably as follows: laser power of 3-15W, scanning speed of 10-300mm/s, layer thickness of 0.1-0.3mm, and scanning distance of 0.01-0.3mm.
(4)对步骤(3)制备出的预烧结多孔氮化硅陶瓷进行高温烧结处理后,制备出CAD模型所设计的具有特殊孔隙结构的多孔氮化硅陶瓷件。(4) After the pre-sintered porous silicon nitride ceramic prepared in the step (3) is sintered at high temperature, a porous silicon nitride ceramic part with a special pore structure designed by the CAD model is prepared.
具体的,高温烧结工艺参数优选为:升温速率5~20℃/min,烧结温度为1700~2000℃,保温时间为2~8h,保护气氛为氮气、氩气、氢气中的一种或几种。Specifically, the high-temperature sintering process parameters are preferably: heating rate 5-20°C/min, sintering temperature 1700-2000°C, holding time 2-8h, protective atmosphere of one or more of nitrogen, argon, and hydrogen .
本发明将氮化硅聚空心球作为原料和造孔剂,与纳米烧结助剂进行机械混合或化学共沉淀包覆制备出复合粉体,通过直接激光选区烧结制备出预烧氮化硅陶瓷,并经过后处理工艺制备出氮化硅陶瓷,具有无需排胶、可成形复杂结构、成形件孔隙率高、尺寸精度高等特点。In the present invention, silicon nitride polyhollow spheres are used as raw materials and pore-forming agents, and are mechanically mixed or chemically co-precipitated with nano-sintering aids to prepare composite powders, and pre-fired silicon nitride ceramics are prepared by direct laser selective sintering. And through the post-processing process to prepare silicon nitride ceramics, it has the characteristics of no need to deglue, complex structure can be formed, high porosity of formed parts, high dimensional accuracy and so on.
以下结合附图和实例对本发明提供的基于激光选区烧结制备高孔隙率氮化硅陶瓷的方法进行进一步详细的说明。The method for preparing high-porosity silicon nitride ceramics based on laser selective sintering provided by the present invention will be further described in detail below with reference to the accompanying drawings and examples.
实施例1:Example 1:
(1)本实施例将氮化硅聚空心球和纳米烧结助剂进行化学共沉淀包覆,制备出纳米烧结助剂包覆氮化硅聚空心球的复合粉体;具体地,(1) In this example, silicon nitride polyhollow spheres and nano-sintering aids are chemically co-precipitated and coated to prepare a composite powder of silicon nitride polyhollow spheres coated with nano-sintering aids; specifically,
将93g氮化硅聚空心球和15g硝酸铝、17g硝酸钇配成的盐溶液进行混合,加入氨水至反应完全后,进行抽滤、烘干,并在1000℃进行煅烧获得混合均匀的复合粉体,即包覆的氮化硅陶瓷粉体,其中纳米烧结助剂占复合粉体的质量分数为7%;Mix 93g silicon nitride polyhollow spheres with a salt solution made up of 15g aluminum nitrate and 17g yttrium nitrate, add ammonia water until the reaction is complete, perform suction filtration, dry, and calcinate at 1000°C to obtain a uniformly mixed composite powder Body, that is, coated silicon nitride ceramic powder, wherein the nano-sintering aid accounts for 7% of the mass fraction of the composite powder;
(2)设计面向应用优化的八面体空间拓扑结构CAD模型,并对该CAD模型切片处理转化为STL文件,将该STL文件导入SLS成形设备;(2) Design an application-oriented and optimized octahedral spatial topology CAD model, and convert the CAD model slice into an STL file, and import the STL file into the SLS forming equipment;
(3)在SLS成形设备上,选择下述SLS成形工艺参数成形多孔氮化硅陶瓷素坯,即预烧结氮化硅陶瓷:激光功率9W,扫描速度50mm/s,分层层厚为0.15mm,扫描间距为0.15mm;本实施例所制备出的预烧结氮化硅陶瓷的微观形貌图如图4(a)和图4(b)所示。(3) On the SLS forming equipment, select the following SLS forming process parameters to form porous silicon nitride ceramic green bodies, that is, pre-sintered silicon nitride ceramics: laser power 9W, scanning speed 50mm/s, layer thickness 0.15mm , the scanning distance is 0.15 mm; the microscopic topography of the pre-sintered silicon nitride ceramic prepared in this embodiment is shown in Figure 4(a) and Figure 4(b).
(4)将步骤(3)得到的多孔氮化硅陶瓷素坯在氮气气氛中进行高温烧结,高温烧结工艺参数为5℃/min,升温至1750℃,保温2h,最终制备出孔隙率为75%的多孔Si3N4陶瓷零件。(4) Sinter the porous silicon nitride ceramic green body obtained in step (3) at a high temperature in a nitrogen atmosphere. % porous Si 3 N 4 ceramic parts.
本实施例所制备出的孔隙率为75%的多孔Si3N4陶瓷的微观形貌图如图5(a)和图5(b)所示。实施例2:The microscopic morphology of the porous Si 3 N 4 ceramics prepared in this example with a porosity of 75% is shown in Fig. 5(a) and Fig. 5(b). Example 2:
(1)将70g氮化硅聚空心球、30g纳米氧化镧进行机械混合24h获得复合粉体,其中纳米烧结助剂加入量为总复合粉体质量的30%;(1) Mechanically mixing 70g of silicon nitride polyhollow spheres and 30g of nano-lanthanum oxide for 24 hours to obtain a composite powder, wherein the amount of nano-sintering aid is 30% of the total composite powder mass;
(2)建立面向应用优化的内部具有连通孔结构的蜂窝多孔结构CAD模型,并对该CAD模型切片处理转化为STL文件,将该STL文件导入SLS成形设备;(2) Establish an application-oriented optimized honeycomb porous structure CAD model with interconnected pore structure inside, and convert the CAD model slice into an STL file, and import the STL file into the SLS forming equipment;
(3)在SLS成形设备上,选择下述SLS成形工艺参数成形多孔氮化硅陶瓷素坯,即预烧结氮化硅陶瓷:激光功率12W,扫描速度100mm/s,分层层厚为0.3mm,扫描间距为0.20mm;(3) On the SLS forming equipment, select the following SLS forming process parameters to form porous silicon nitride ceramic green bodies, that is, pre-sintered silicon nitride ceramics: laser power 12W, scanning speed 100mm/s, layer thickness 0.3mm , the scanning distance is 0.20mm;
(4)将步骤(3)得到的多孔氮化硅陶瓷素坯在氩气气氛中进行高温烧结,高温烧结工艺参数为20℃/min,升温至1700℃,保温8h,最终制备出孔隙率为73%的多孔Si3N4陶瓷零件。(4) Sinter the porous silicon nitride ceramic green body obtained in step (3) at high temperature in an argon atmosphere. 73% porous Si 3 N 4 ceramic parts.
实施例3:Example 3:
(1)将95g氮化硅聚空心球、5g纳米二氧化硅进行机械混合12h获得复合粉体,其中纳米烧结助剂加入量为总复合粉体质量的5%;(1) Mechanically mixing 95g of silicon nitride polyhollow spheres and 5g of nano-silicon dioxide for 12 hours to obtain a composite powder, wherein the amount of nano-sintering aid is 5% of the total composite powder mass;
(2)建立面向应用优化的内部具有连通孔结构的蜂窝多孔结构CAD模型,并将该CAD模型切片处理转化为STL文件,将该STL文件导入SLS成形设备;(2) Establish an application-optimized CAD model of a honeycomb porous structure with a connected pore structure inside, and convert the CAD model slice into an STL file, and import the STL file into the SLS forming equipment;
(3)在SLS成形设备上,选择下述SLS成形工艺参数成形多孔氮化硅陶瓷素坯,即预烧结氮化硅陶瓷:激光功率3W,扫描速度10mm/s,分层层厚为0.1mm,扫描间距为0.3mm;(3) On the SLS forming equipment, select the following SLS forming process parameters to form porous silicon nitride ceramic green bodies, that is, pre-sintered silicon nitride ceramics: laser power 3W, scanning speed 10mm/s, layer thickness 0.1mm , the scanning distance is 0.3mm;
(4)将步骤(3)得到的多孔氮化硅陶瓷素坯在氩气气氛中进行高温烧结,高温烧结工艺参数为10℃/min,升温至2000℃,保温4h,最终制备出孔隙率为80%的多孔Si3N4陶瓷零件。(4) Sinter the porous silicon nitride ceramic green body obtained in step (3) at a high temperature in an argon atmosphere. The high temperature sintering process parameter is 10°C/min, the temperature is raised to 2000°C, and the temperature is kept for 4 hours. Finally, a porosity 80% porous Si 3 N 4 ceramic parts.
实施例4:Example 4:
(1)将93g氮化硅聚空心球、64g硝酸铝、72g硝酸钇配成溶液进行混合,加入氨水至反应完全后,进行抽滤、烘干,并在1200℃进行煅烧获得复合粉体,即纳米烧结助剂包覆氮化硅聚空心球的复合粉体,包覆后纳米烧结助剂的加入量占复合粉体质量的30%;(1) Mix 93g silicon nitride polyhollow spheres, 64g aluminum nitrate, and 72g yttrium nitrate into a solution, add ammonia water until the reaction is complete, perform suction filtration, dry, and calcine at 1200°C to obtain a composite powder, That is, the composite powder of silicon nitride polyhollow spheres coated with nano-sintering aids, the amount of nano-sintering aids after coating accounts for 30% of the mass of the composite powder;
(2)建立面向应用优化的八面体空间拓扑结构CAD模型,并将该CAD模型切片处理转化为STL文件,将该STL文件导入SLS成形设备;(2) Establish an application-oriented and optimized octahedral spatial topology CAD model, and convert the CAD model slice into an STL file, and import the STL file into the SLS forming equipment;
(3)在SLS成形设备上,选择下述SLS成形工艺参数成形多孔氮化硅陶瓷素坯:激光功率15W,扫描速度300mm/s,分层层厚为0.20mm,扫描间距为0.01mm;(3) On the SLS forming equipment, select the following SLS forming process parameters to form a porous silicon nitride ceramic green body: laser power 15W, scanning speed 300mm/s, layer thickness 0.20mm, scanning distance 0.01mm;
(4)将步骤(3)得到的多孔氮化硅陶瓷素坯在氢气/氩气混合气氛中进行高温烧结,高温烧结工艺参数为15℃/min,升温至1800℃,保温6h,最终制备出孔隙率为70%的多孔Si3N4陶瓷零件。(4) The porous silicon nitride ceramic green body obtained in step (3) is subjected to high-temperature sintering in a hydrogen/argon mixed atmosphere, the high-temperature sintering process parameter is 15°C/min, the temperature is raised to 1800°C, and the temperature is kept for 6 hours, and finally prepared Porous Si3N4 ceramic parts with 70% porosity .
实施例5:Example 5:
(1)将90g氮化硅聚空心球、5g纳米氧化镱和5g纳米氧化钇进行机械混合18h获得复合粉体;(1) Mechanically mix 90g of silicon nitride polyhollow spheres, 5g of nano-ytterbium oxide and 5g of nano-yttrium oxide for 18 hours to obtain a composite powder;
(2)建立面向应用优化的八面体空间拓扑结构CAD模型,并将该CAD模型切片处理转化为STL文件,将该STL文件导入SLS成形设备;(2) Establish an application-oriented and optimized octahedral spatial topology CAD model, and convert the CAD model slice into an STL file, and import the STL file into the SLS forming equipment;
(3)在SLS成形设备上,选择下述SLS成形工艺参数成形多孔氮化硅陶瓷素坯,即预烧结氮化硅陶瓷:激光功率5W,扫描速度30mm/s,分层层厚为0.10mm,扫描间距为0.05mm;(3) On the SLS forming equipment, select the following SLS forming process parameters to form porous silicon nitride ceramic green bodies, that is, pre-sintered silicon nitride ceramics: laser power 5W, scanning speed 30mm/s, layer thickness 0.10mm , the scanning distance is 0.05mm;
(4)将步骤(3)得到的多孔氮化硅陶瓷素坯在氮气气氛中进行高温烧结,高温烧结工艺参数为5℃/min,升温至1900℃,保温3h,最终制备出孔隙率为83%的多孔Si3N4陶瓷零件。(4) Carry out high-temperature sintering of the porous silicon nitride ceramic green body obtained in step (3) in a nitrogen atmosphere. % porous Si 3 N 4 ceramic parts.
实施例6:Embodiment 6:
(1)将93g氮化硅聚空心球、11g硝酸铝、12g硝酸钇配成溶液进行混合,加入氨水至反应完全后,进行抽滤、烘干,并在900℃进行煅烧获得复合粉体,即包覆的氮化硅陶瓷粉体,包覆后烧结助剂的加入量为总复合粉体质量的5%;(1) Mix 93g of silicon nitride polyhollow spheres, 11g of aluminum nitrate, and 12g of yttrium nitrate into a solution, add ammonia water until the reaction is complete, perform suction filtration, dry, and calcinate at 900°C to obtain a composite powder, That is, for the coated silicon nitride ceramic powder, the amount of sintering aid added after coating is 5% of the total composite powder mass;
(2)建立面向应用优化的八面体空间拓扑结构CAD模型,并对该CAD模型切片处理转化为STL文件,将该STL文件导入SLS成形设备;(2) Establish an application-oriented and optimized octahedron spatial topology CAD model, and convert the CAD model slice into an STL file, and import the STL file into the SLS forming equipment;
(3)在SLS成形设备上,选择下述SLS成形工艺参数成形多孔氮化硅陶瓷素坯:激光功率8W,扫描速度200mm/s,分层层厚为0.30mm,扫描间距为0.10mm;(3) On the SLS forming equipment, select the following SLS forming process parameters to form a porous silicon nitride ceramic green body: laser power 8W, scanning speed 200mm/s, layer thickness 0.30mm, scanning distance 0.10mm;
(4)将步骤(3)得到的多孔氮化硅陶瓷素坯在氮气气氛中进行高温烧结,高温烧结工艺参数为10℃/min,升温至1850℃,保温6h,最终制备出孔隙率为85%的多孔Si3N4陶瓷零件。(4) Carry out high-temperature sintering of the porous silicon nitride ceramic green body obtained in step (3) in a nitrogen atmosphere. % porous Si 3 N 4 ceramic parts.
本领域的技术人员容易理解,以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。It is easy for those skilled in the art to understand that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention, All should be included within the protection scope of the present invention.
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